DE60007287D1 - Verfahren und vorrichtung zum beschichten mittels bogenentladung - Google Patents

Verfahren und vorrichtung zum beschichten mittels bogenentladung

Info

Publication number
DE60007287D1
DE60007287D1 DE60007287T DE60007287T DE60007287D1 DE 60007287 D1 DE60007287 D1 DE 60007287D1 DE 60007287 T DE60007287 T DE 60007287T DE 60007287 T DE60007287 T DE 60007287T DE 60007287 D1 DE60007287 D1 DE 60007287D1
Authority
DE
Germany
Prior art keywords
reactant
plasma
coating
substrate
depositing
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
DE60007287T
Other languages
English (en)
Other versions
DE60007287T2 (de
Inventor
Dominic Iacovangelo
Milton Borst
Calvin Jerabek
Peter Marzano
Lee-Mean Yang
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
SABIC Global Technologies BV
Original Assignee
General Electric Co
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by General Electric Co filed Critical General Electric Co
Publication of DE60007287D1 publication Critical patent/DE60007287D1/de
Application granted granted Critical
Publication of DE60007287T2 publication Critical patent/DE60007287T2/de
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/228—Gas flow assisted PVD deposition
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/24—Vacuum evaporation
    • C23C14/32—Vacuum evaporation by explosion; by evaporation and subsequent ionisation of the vapours, e.g. ion-plating
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/50—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating using electric discharges
    • C23C16/513—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating using electric discharges using plasma jets
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32009—Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
    • H01J37/32422—Arrangement for selecting ions or species in the plasma
DE60007287T 1999-03-17 2000-02-04 Verfahren und vorrichtung zum beschichten mittels bogenentladung Expired - Lifetime DE60007287T2 (de)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US09/271,655 US6365016B1 (en) 1999-03-17 1999-03-17 Method and apparatus for arc plasma deposition with evaporation of reagents
PCT/US2000/003028 WO2000055388A2 (en) 1999-03-17 2000-02-04 Method and apparatus for arc deposition

Publications (2)

Publication Number Publication Date
DE60007287D1 true DE60007287D1 (de) 2004-01-29
DE60007287T2 DE60007287T2 (de) 2004-10-21

Family

ID=23036497

Family Applications (1)

Application Number Title Priority Date Filing Date
DE60007287T Expired - Lifetime DE60007287T2 (de) 1999-03-17 2000-02-04 Verfahren und vorrichtung zum beschichten mittels bogenentladung

Country Status (6)

Country Link
US (1) US6365016B1 (de)
EP (1) EP1161574B1 (de)
JP (1) JP4733273B2 (de)
AT (1) ATE256763T1 (de)
DE (1) DE60007287T2 (de)
WO (1) WO2000055388A2 (de)

Families Citing this family (52)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6261694B1 (en) 1999-03-17 2001-07-17 General Electric Company Infrared reflecting coatings
US6793775B2 (en) * 2001-03-13 2004-09-21 Mikhail I. Gouskov Multiple torch—multiple target method and apparatus for plasma outside chemical vapor deposition
WO2002087787A1 (en) * 2001-04-30 2002-11-07 University Of Virginia Patent Foundation Method and apparatus for efficient application of substrate coating
JP4738636B2 (ja) * 2001-05-29 2011-08-03 株式会社テクノ菱和 防爆型無発塵イオナイザー
JP2003011661A (ja) * 2001-06-25 2003-01-15 Exatec Llc 自動車用固定グレイジングを提供するためのパネルおよび方法
US6660538B2 (en) * 2001-10-29 2003-12-09 Energy Photovoltaics Non-contacting deposition control of chalcopyrite thin films
DE10153760A1 (de) * 2001-10-31 2003-05-22 Fraunhofer Ges Forschung Verfahren zur Herstellung einer UV-absorbierenden transparenten Abriebschutzschicht
FR2842536B1 (fr) * 2002-07-19 2005-06-03 Commissariat Energie Atomique Reacteur electrolytique
US6740586B1 (en) * 2002-11-06 2004-05-25 Advanced Technology Materials, Inc. Vapor delivery system for solid precursors and method of using same
US6890656B2 (en) 2002-12-20 2005-05-10 General Electric Company High rate deposition of titanium dioxide
US7163749B2 (en) * 2002-12-20 2007-01-16 General Electric Company Process for depositing finely dispersed organic-inorganic films and articles made therefrom
EP1597409A1 (de) * 2003-02-20 2005-11-23 General Electric Company Vorrichtung und verfahren zur grossflächenbeschichtung auf ebenen oberflächen
CA2460296C (en) * 2003-05-23 2012-02-14 Sulzer Metco Ag A hybrid method for the coating of a substrate by a thermal application of the coating
US7282244B2 (en) * 2003-09-05 2007-10-16 General Electric Company Replaceable plate expanded thermal plasma apparatus and method
US20110104381A1 (en) * 2004-01-15 2011-05-05 Stefan Laure Plasma Treatment of Large-Scale Components
WO2005087978A1 (en) * 2004-03-09 2005-09-22 Exatec, Llc Plasma coating system for non-planar substrates
DE102004014618B3 (de) * 2004-03-23 2005-11-10 Eads Space Transportation Gmbh Elektrothermisches Impuls-Triebwerk
US7300617B2 (en) * 2004-05-13 2007-11-27 David Gerling Method of making fusion cast articles
US20090123662A1 (en) * 2005-04-11 2009-05-14 Stefan Laure Plasma Coating Device and Method
JP4122048B2 (ja) * 2005-08-29 2008-07-23 松下電器産業株式会社 蒸着ヘッド装置及び蒸着塗布方法
JP2007191761A (ja) * 2006-01-19 2007-08-02 Idemitsu Kosan Co Ltd 積層構造、それを用いた電気回路用電極及びその製造方法
US8082878B2 (en) * 2006-04-20 2011-12-27 Saint-Gobain Glass France Thermal evaporation apparatus, use and method of depositing a material
CA2582312C (en) * 2006-05-05 2014-05-13 Sulzer Metco Ag A method for the manufacture of a coating
US7939181B2 (en) 2006-10-11 2011-05-10 Oerlikon Trading Ag, Trubbach Layer system with at least one mixed crystal layer of a multi-oxide
US20100323126A1 (en) * 2007-02-26 2010-12-23 Dr. Laure Plasmatechnologie Gmnh Apparatus and Method for Plasma-Assisted Coating and Surface Treatment of Voluminous Parts
US9173967B1 (en) 2007-05-11 2015-11-03 SDCmaterials, Inc. System for and method of processing soft tissue and skin with fluids using temperature and pressure changes
US8481449B1 (en) 2007-10-15 2013-07-09 SDCmaterials, Inc. Method and system for forming plug and play oxide catalysts
US8168268B2 (en) * 2008-12-12 2012-05-01 Ovishinsky Innovation, LLC Thin film deposition via a spatially-coordinated and time-synchronized process
DE102009010497A1 (de) * 2008-12-19 2010-08-05 J-Fiber Gmbh Mehrdüsiger rohrförmiger Plasma-Abscheidebrenner zur Herstellung von Vorformen als Halbzeuge für optische Fasern
JP5507882B2 (ja) * 2009-05-08 2014-05-28 国立大学法人茨城大学 酸化亜鉛透明導電膜の製造方法及びこの方法を実施するための製造装置
US8803025B2 (en) 2009-12-15 2014-08-12 SDCmaterials, Inc. Non-plugging D.C. plasma gun
US9126191B2 (en) 2009-12-15 2015-09-08 SDCmaterials, Inc. Advanced catalysts for automotive applications
US8652992B2 (en) 2009-12-15 2014-02-18 SDCmaterials, Inc. Pinning and affixing nano-active material
US8043954B1 (en) 2010-03-30 2011-10-25 Primestar Solar, Inc. Methods of forming a conductive transparent oxide film layer for use in a cadmium telluride based thin film photovoltaic device
US8525019B2 (en) 2010-07-01 2013-09-03 Primestar Solar, Inc. Thin film article and method for forming a reduced conductive area in transparent conductive films for photovoltaic modules
US8580353B2 (en) * 2010-07-08 2013-11-12 Applied Vacuum Coating Technologies Co., Ltd. Method for treating surface of glass substrate and apparatus for performing same
US8669202B2 (en) 2011-02-23 2014-03-11 SDCmaterials, Inc. Wet chemical and plasma methods of forming stable PtPd catalysts
US8541069B2 (en) * 2011-04-11 2013-09-24 United Technologies Corporation Method of guided non-line of sight coating
KR101879175B1 (ko) * 2011-10-20 2018-08-20 삼성전자주식회사 화학 기상 증착 장치
US9511352B2 (en) 2012-11-21 2016-12-06 SDCmaterials, Inc. Three-way catalytic converter using nanoparticles
US9156025B2 (en) 2012-11-21 2015-10-13 SDCmaterials, Inc. Three-way catalytic converter using nanoparticles
CN105592921A (zh) 2013-07-25 2016-05-18 Sdc材料公司 用于催化转化器的洗涂层和经涂覆基底及其制造和使用方法
DE102013219199A1 (de) * 2013-09-24 2015-03-26 Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V. Neues Bewitterungsverfahren für Proben
JP2016536120A (ja) 2013-10-22 2016-11-24 エスディーシーマテリアルズ， インコーポレイテッド ヘビーデューティディーゼルの燃焼機関のための触媒デザイン
KR20160074574A (ko) 2013-10-22 2016-06-28 에스디씨머티리얼스, 인코포레이티드 희박 NOx 트랩의 조성물
EP3119500A4 (de) 2014-03-21 2017-12-13 SDC Materials, Inc. Zusammensetzungen für passive nox-adsorptionssysteme
AT517694B1 (de) * 2015-11-12 2017-04-15 Inocon Tech Ges M B H Vorrichtung und Verfahren zum Aufbringen einer Beschichtung
WO2017095561A1 (en) * 2015-12-04 2017-06-08 Applied Materials, Inc. Advanced coating method and materials to prevent hdp-cvd chamber arcing
CN109477204B (zh) * 2016-05-10 2020-10-23 应用材料公司 操作沉积设备的方法和沉积设备
DE102017003042B3 (de) 2017-03-29 2018-08-16 Rodenstock Gmbh Gradienten-Hartschicht mit sich änderndem E-Modul
US10612122B2 (en) * 2017-08-25 2020-04-07 Vladimir E. Belashchenko Plasma device and method for delivery of plasma and spray material at extended locations from an anode arc root attachment
US10707477B2 (en) * 2017-09-15 2020-07-07 Dyson Technology Limited High energy density multilayer battery cell with thermally processed components and method for making same

Family Cites Families (57)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3312659A (en) 1967-04-04 Catalytic preparation of polycarbon- ates from bisphenol and a carbonate precursor
US3220973A (en) 1965-11-30 Cross-linked polycarbonate resinous compositions
US3161615A (en) 1957-02-05 1964-12-15 Gen Electric Resinous copolymeric polycarbonate of a mixture of dihydric phenols
US3313777A (en) 1959-12-18 1967-04-11 Eastman Kodak Co Linear polyesters and polyester-amides from 2, 2, 4, 4-tetraalkyl-1, 3-cyclobutanediols
US3312660A (en) 1962-07-03 1967-04-04 Union Carbide Corp Process for preparing polycarbonates by self-condensation of bisphenol dichloroformate
US3576656A (en) 1968-03-11 1971-04-27 Nasa Stabilized zinc oxide coating compositions
US3625848A (en) 1968-12-26 1971-12-07 Alvin A Snaper Arc deposition process and apparatus
US3666614A (en) 1969-06-24 1972-05-30 Union Carbide Corp Glass-polycarbonate resin laminates
US3989672A (en) 1972-10-30 1976-11-02 General Electric Company Process for preparing aromatic carbonate polymers
US4224378A (en) 1978-11-01 1980-09-23 General Electric Company Abrasion resistant organopolysiloxane coated polycarbonate article
US4210699A (en) 1978-11-01 1980-07-01 General Electric Company Abrasion resistant silicone coated polycarbonate article
US4200681A (en) 1978-11-13 1980-04-29 General Electric Company Glass coated polycarbonate articles
US4194038A (en) 1979-01-25 1980-03-18 Allied Chemical Corporation Poly(ester-carbonates) from dicarboxylic acid chlorides
US4242381A (en) 1979-04-18 1980-12-30 General Electric Company Method of providing a polycarbonate article with a uniform and durable silica filled organopolysiloxane coating
JPS5691437A (en) * 1979-12-26 1981-07-24 Nippon Hoso Kyokai <Nhk> Preparation of metallized element
DE3014258A1 (de) 1980-04-14 1981-10-15 Heinrich Dr. 6236 Eschborn Winter Verfahren zum aufbringen von metallischen, metalloidischen oder keramischen schichten mit verbesserten strukturellen eigenschaften durch plasmaspruehen
US4454275A (en) 1981-02-20 1984-06-12 General Electric Company Flame retardant copolyester-carbonate compositions
US5096558A (en) * 1984-04-12 1992-03-17 Plasco Dr. Ehrich Plasma - Coating Gmbh Method and apparatus for evaporating material in vacuum
JPS61268356A (ja) * 1985-01-09 1986-11-27 Nippon Denso Co Ltd 触媒担体へのアルミナの担持方法
US4929322A (en) * 1985-09-30 1990-05-29 Union Carbide Corporation Apparatus and process for arc vapor depositing a coating in an evacuated chamber
US4842941A (en) 1987-04-06 1989-06-27 General Electric Company Method for forming abrasion-resistant polycarbonate articles, and articles of manufacture produced thereby
JPH0770058B2 (ja) * 1987-04-16 1995-07-31 富士写真フイルム株式会社 磁気記録媒体の製造方法及び製造装置
CA1264025A (en) 1987-05-29 1989-12-27 James A.E. Bell Apparatus and process for coloring objects by plasma coating
NL8701530A (nl) 1987-06-30 1989-01-16 Stichting Fund Ond Material Werkwijze voor het behandelen van oppervlakken van substraten met behulp van een plasma en reactor voor het uitvoeren van die werkwijze.
US5051308A (en) 1987-08-24 1991-09-24 General Electric Company Abrasion-resistant plastic articles
JPH0832958B2 (ja) 1987-08-24 1996-03-29 ゼネラル・エレクトリック・カンパニイ 耐摩耗性プラスチック物品の製造法
US4927704A (en) 1987-08-24 1990-05-22 General Electric Company Abrasion-resistant plastic articles and method for making them
ES2022946T5 (es) * 1987-08-26 1996-04-16 Balzers Hochvakuum Procedimiento para la aportacion de capas sobre sustratos.
DE58909180D1 (de) * 1988-03-23 1995-05-24 Balzers Hochvakuum Verfahren und Anlage zur Beschichtung von Werkstücken.
DE3821131A1 (de) 1988-06-23 1989-12-28 Bayer Ag Verfahren zur herstellung von kunststofformkoerpern mit verbesserter witterungsbestaendigkeit
US4948485A (en) 1988-11-23 1990-08-14 Plasmacarb Inc. Cascade arc plasma torch and a process for plasma polymerization
US5152866A (en) * 1989-01-13 1992-10-06 Hughes Aircraft Company Plasma/radiation assisted molecular beam epitaxy method
US5009922A (en) * 1989-03-02 1991-04-23 Ashahi Glass Company, Ltd. Method of forming a transparent conductive film
US5104634A (en) * 1989-04-20 1992-04-14 Hercules Incorporated Process for forming diamond coating using a silent discharge plasma jet process
EP0460206A1 (de) 1989-12-22 1991-12-11 General Electric Company Polyestercarbonatzusammensetzung
US5126030A (en) * 1990-12-10 1992-06-30 Kabushiki Kaisha Kobe Seiko Sho Apparatus and method of cathodic arc deposition
DE69227109T2 (de) 1991-02-05 1999-02-18 Sun Smart Inc Durchsichtiges, uv absorbierendes sonnenschutzmittel und verfahren zu dessen herstellung
US5156882A (en) 1991-12-30 1992-10-20 General Electric Company Method of preparing UV absorbant and abrasion-resistant transparent plastic articles
CH687111A5 (de) * 1992-05-26 1996-09-13 Balzers Hochvakuum Verfahren zum Erzeugen einer Niederspannungsentladung, Vakuumbehandlungsanlage hierfuer sowie Anwendung des Verfahrens.
US5480722A (en) 1992-07-03 1996-01-02 Asahi Glass Company Ltd. Ultraviolet ray absorbent glass and method for preparing the same
US5302271A (en) * 1992-08-25 1994-04-12 Northeastern University Anodic vacuum arc deposition system
US5441624A (en) * 1992-08-25 1995-08-15 Northeastern University Triggered vacuum anodic arc
DE4235199C1 (de) 1992-10-19 1993-04-22 Fraunhofer-Gesellschaft Zur Foerderung Der Angewandten Forschung Ev, 8000 Muenchen, De
DE4236264C1 (de) 1992-10-27 1993-09-02 Fraunhofer-Gesellschaft Zur Foerderung Der Angewandten Forschung Ev, 80636 Muenchen, De
US5298587A (en) 1992-12-21 1994-03-29 The Dow Chemical Company Protective film for articles and method
JPH06330326A (ja) 1993-03-26 1994-11-29 Shin Etsu Chem Co Ltd シリカ薄膜の製造方法
ATE181938T1 (de) 1993-04-27 1999-07-15 Teijin Chemicals Ltd Modifiziertes aromatisches polycarbonat harz und modifiziertes phenol zu seine herstellung
US5433786A (en) 1993-08-27 1995-07-18 The Dow Chemical Company Apparatus for plasma enhanced chemical vapor deposition comprising shower head electrode with magnet disposed therein
US5691010A (en) * 1993-10-19 1997-11-25 Sanyo Electric Co., Ltd. Arc discharge plasma CVD method for forming diamond-like carbon films
US5480527A (en) * 1994-04-25 1996-01-02 Vapor Technologies, Inc. Rectangular vacuum-arc plasma source
US5571332A (en) 1995-02-10 1996-11-05 Jet Process Corporation Electron jet vapor deposition system
KR100418145B1 (ko) 1995-10-13 2005-01-31 다우 글로벌 테크놀로지스 인크. 피복된플라스틱기판을포함하는적층물
US5827580A (en) * 1996-03-27 1998-10-27 Regents Of The University Of California Low temperature formation of electrode having electrically conductive metal oxide surface
US5952061A (en) * 1996-12-27 1999-09-14 Stanley Electric Co., Ltd. Fabrication and method of producing silicon films
US6110544A (en) * 1997-06-26 2000-08-29 General Electric Company Protective coating by high rate arc plasma deposition
US6213049B1 (en) 1997-06-26 2001-04-10 General Electric Company Nozzle-injector for arc plasma deposition apparatus
US5976636A (en) * 1998-03-19 1999-11-02 Industrial Technology Research Institute Magnetic apparatus for arc ion plating

Also Published As

Publication number Publication date
WO2000055388A2 (en) 2000-09-21
JP4733273B2 (ja) 2011-07-27
EP1161574A1 (de) 2001-12-12
EP1161574B1 (de) 2003-12-17
ATE256763T1 (de) 2004-01-15
WO2000055388A3 (en) 2001-06-28
US6365016B1 (en) 2002-04-02
DE60007287T2 (de) 2004-10-21
JP2003518553A (ja) 2003-06-10

Similar Documents

Publication Publication Date Title
DE60007287T2 (de) Verfahren und vorrichtung zum beschichten mittels bogenentladung
ATE148507T1 (de) Vorrichtung und verfahren zum beschichten von substraten mittels plasmaentladung
EP1509332B2 (de) Aufbringen eines beschichtungsmaterials auf ein substrat
MX9701062A (es) Proceso y aparato para la deposicion de plasma por chorro.
US4988422A (en) Process and apparatus for depositing coatings of high electrical resistance by cathode sputtering
TR200400076T4 (tr) Bir kılıf oluşturmaya yarayan metot ve aparat
TW200605194A (en) Method and apparatus of distributed plasma processing system for conformal ion stimulated nanoscale deposition process
KR101682155B1 (ko) 기판 처리 장치
DE69823532D1 (de) Plasma unterstütze chemische dampfabscheidung aus rohstoffen mit niedrigem dampfdruck
TW347416B (en) Post treatment method for in-situ cleaning
WO2005045873A3 (en) Plasma processing system and plasma treatment process
DE60122747D1 (de) Feldemissionsvorrichtung mit kohlenstoffhaltigen spitzen
TW358963B (en) Method and apparatus for depositing deep UV photoresist films
ATE181116T1 (de) Verfahren und vorrichtung zur behandlung von substratoberflächen
TW200514145A (en) Method and apparatus for depositing materials with tunable optical properties and etching characteristics
DE102008044024A1 (de) Beschichtungsverfahren sowie Beschichtungsvorrichtung
DE50106975D1 (de) Verfahren und vorrichtung zur beschichtung von substraten
KR20170075163A (ko) 가스분사부 및 이를 구비하는 원자층 증착장치
US3966999A (en) Method of processing an organic high molecular weight film
KR920002169B1 (ko) 플라즈마 증착방법과 이에 적합한 장치
DE19853121C1 (de) Verfahren und Einrichtung zur Behandlung eines Substrates in einem Hochfrequenzplasma und Anwendung der Einrichtung
EP1921659A3 (de) System und Verfahren zur Steuerung der elektromagnetischen Strahlung während einer PECVD-Entladungsprozesses
RU2095466C1 (ru) Устройство для получения алмазоподобного покрытия
JP3291088B2 (ja) 被膜形成方法
WO2002098583A3 (en) Method for plasma deposition of polymer coatings

Legal Events

Date Code Title Description
8364 No opposition during term of opposition
8327 Change in the person/name/address of the patent owner

Owner name: SABIC INNOVATIVE PLASTICS IP B.V., BERGEN OP Z, NL

8328 Change in the person/name/address of the agent

Representative=s name: PATENT- UND RECHTSANWAELTE BARDEHLE, PAGENBERG, DO