DE59707065D1 - Lithographie-belichtungseinrichtung - Google Patents

Lithographie-belichtungseinrichtung

Info

Publication number
DE59707065D1
DE59707065D1 DE59707065T DE59707065T DE59707065D1 DE 59707065 D1 DE59707065 D1 DE 59707065D1 DE 59707065 T DE59707065 T DE 59707065T DE 59707065 T DE59707065 T DE 59707065T DE 59707065 D1 DE59707065 D1 DE 59707065D1
Authority
DE
Germany
Prior art keywords
exposure device
lithography exposure
lithography
exposure
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
DE59707065T
Other languages
English (en)
Inventor
Uwe Brauch
Hans Opower
Bernd Hoefflinger
Reinhard Springer
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Deutsches Zentrum fuer Luft und Raumfahrt eV
Institut fuer Mikroelectronik Stuttgart
Original Assignee
STUTTGART MIKROELEKTRONIK
Deutsches Zentrum fuer Luft und Raumfahrt eV
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by STUTTGART MIKROELEKTRONIK, Deutsches Zentrum fuer Luft und Raumfahrt eV filed Critical STUTTGART MIKROELEKTRONIK
Priority to DE59707065T priority Critical patent/DE59707065D1/de
Application granted granted Critical
Publication of DE59707065D1 publication Critical patent/DE59707065D1/de
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70008—Production of exposure light, i.e. light sources
    • G03F7/7005—Production of exposure light, i.e. light sources by multiple sources, e.g. light-emitting diodes [LED] or light source arrays
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70383—Direct write, i.e. pattern is written directly without the use of a mask by one or multiple beams
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70383—Direct write, i.e. pattern is written directly without the use of a mask by one or multiple beams
    • G03F7/704—Scanned exposure beam, e.g. raster-, rotary- and vector scanning
DE59707065T 1996-06-29 1997-06-12 Lithographie-belichtungseinrichtung Expired - Lifetime DE59707065D1 (de)

Priority Applications (1)

Application Number Priority Date Filing Date Title
DE59707065T DE59707065D1 (de) 1996-06-29 1997-06-12 Lithographie-belichtungseinrichtung

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
DE19626176A DE19626176A1 (de) 1996-06-29 1996-06-29 Lithographie-Belichtungseinrichtung und Lithographie-Verfahren
PCT/EP1997/003053 WO1998000760A1 (de) 1996-06-29 1997-06-12 Lithographie-belichtungseinrichtung und lithographie-verfahren
DE59707065T DE59707065D1 (de) 1996-06-29 1997-06-12 Lithographie-belichtungseinrichtung

Publications (1)

Publication Number Publication Date
DE59707065D1 true DE59707065D1 (de) 2002-05-23

Family

ID=7798420

Family Applications (2)

Application Number Title Priority Date Filing Date
DE19626176A Ceased DE19626176A1 (de) 1996-06-29 1996-06-29 Lithographie-Belichtungseinrichtung und Lithographie-Verfahren
DE59707065T Expired - Lifetime DE59707065D1 (de) 1996-06-29 1997-06-12 Lithographie-belichtungseinrichtung

Family Applications Before (1)

Application Number Title Priority Date Filing Date
DE19626176A Ceased DE19626176A1 (de) 1996-06-29 1996-06-29 Lithographie-Belichtungseinrichtung und Lithographie-Verfahren

Country Status (5)

Country Link
US (1) US6002466A (de)
EP (1) EP0907906B1 (de)
JP (1) JP3280037B2 (de)
DE (2) DE19626176A1 (de)
WO (1) WO1998000760A1 (de)

Families Citing this family (37)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6233039B1 (en) * 1997-06-05 2001-05-15 Texas Instruments Incorporated Optical illumination system and associated exposure apparatus
DE19922941A1 (de) * 1999-05-14 2000-11-30 Epigenomics Gmbh Vorrichtung und Verfahren zur photolithographischen Belichtung von biologischen Stoffen
WO2000072092A1 (de) 1999-05-19 2000-11-30 Deutsches Zentrum für Luft- und Raumfahrt e.V. Lithographie-belichtungseinrichtung und lithographie-verfahren
DE19923444C2 (de) * 1999-05-21 2003-01-02 J Brugger Verfahren zur Herstellung einer lichttransparenten Sondenspitze
TW498184B (en) * 1999-06-04 2002-08-11 Asm Lithography Bv Method of manufacturing a device using a lithographic projection apparatus, and device manufactured in accordance with said method
US6901090B1 (en) * 1999-09-10 2005-05-31 Nikon Corporation Exposure apparatus with laser device
US20020111969A1 (en) * 2000-09-28 2002-08-15 Halstead Robert H. System and method for processing graphical objects for layout using an elastic difference operation
DE10116059B4 (de) * 2001-03-30 2007-03-01 Tesa Scribos Gmbh Lithograph mit bewegter Linse und Verfahren zum Herstellen digitaler Hologramme in einem Speichermedium
JP4273291B2 (ja) * 2001-08-17 2009-06-03 株式会社オーク製作所 多重露光描画装置および多重露光描画方法
CN1791839A (zh) * 2001-11-07 2006-06-21 应用材料有限公司 光点格栅阵列光刻机
DE10160917A1 (de) * 2001-12-07 2003-06-26 Kleo Halbleitertechnik Gmbh Lithografiebelichtungseinrichtung
US7012270B2 (en) * 2002-03-15 2006-03-14 Tsinghua University Photolithography system having multiple adjustable light sources
JP3938714B2 (ja) * 2002-05-16 2007-06-27 大日本スクリーン製造株式会社 露光装置
DE10242142A1 (de) * 2002-09-03 2004-03-25 Kleo Halbleitertechnik Gmbh & Co Kg Verfahren und Vorrichtung zum Herstellen von belichteten Strukturen
AU2003297588A1 (en) 2002-12-02 2004-06-23 3M Innovative Properties Company Illumination system using a plurality of light sources
JP4083100B2 (ja) * 2003-09-22 2008-04-30 株式会社Ｓｏｋｕｄｏ 周縁部露光装置
US7250611B2 (en) * 2003-12-02 2007-07-31 3M Innovative Properties Company LED curing apparatus and method
US7329887B2 (en) 2003-12-02 2008-02-12 3M Innovative Properties Company Solid state light device
WO2005057669A2 (en) * 2003-12-02 2005-06-23 3M Innovative Properties Company Irradiation apparatus
US7403680B2 (en) * 2003-12-02 2008-07-22 3M Innovative Properties Company Reflective light coupler
US7456805B2 (en) 2003-12-18 2008-11-25 3M Innovative Properties Company Display including a solid state light device and method using same
US7133118B2 (en) * 2004-02-18 2006-11-07 Asml Netherlands, B.V. Lithographic apparatus and device manufacturing method
US7253881B2 (en) * 2004-12-29 2007-08-07 Asml Netherlands Bv Methods and systems for lithographic gray scaling
DE102006008075A1 (de) 2005-04-19 2006-10-26 Kleo Halbleitertechnik Gmbh & Co Kg Belichtungsanlage
DE102006008080A1 (de) * 2006-02-22 2007-08-30 Kleo Maschinenbau Ag Belichtungsanlage
DE102006059818B4 (de) 2006-12-11 2017-09-14 Kleo Ag Belichtungsanlage
EP2017833A1 (de) * 2007-07-16 2009-01-21 Nederlandse Organisatie voor toegepast- natuurwetenschappelijk onderzoek TNO Gescanntes Schreiben eines Belichtungsmusters auf einem Substrat
DE102008018763A1 (de) 2008-04-14 2009-11-05 Kristin Bartsch Lithografiebelichtungseinrichtung
DE102009032210B4 (de) 2009-07-03 2011-06-09 Kleo Ag Bearbeitungsanlage
JP5579278B2 (ja) * 2010-02-23 2014-08-27 エーエスエムエル ネザーランズ ビー．ブイ． リソグラフィ装置
WO2011104171A1 (en) * 2010-02-23 2011-09-01 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
NL2007789A (en) * 2010-12-08 2012-06-11 Asml Netherlands Bv Lithographic apparatus and device manufacturing method.
JP5689539B2 (ja) 2010-12-20 2015-03-25 エーエスエムエル ネザーランズ ビー．ブイ． リソグラフィ装置においてパターニングデバイスを制御する方法、デバイス製造方法、及びリソグラフィ装置
DE102011081247A1 (de) * 2011-08-19 2013-02-21 Carl Zeiss Smt Gmbh Belichtungsanlage und Verfahren zur strukturierten Belichtung einer lichtempfindlichen Schicht
TWI484307B (zh) * 2012-10-29 2015-05-11 Nat Univ Tsing Hua 以光纖作為空間濾波器與擴束器之雷射干涉微影設備
CN112987501B (zh) * 2019-12-17 2023-01-24 苏州苏大维格科技集团股份有限公司 直写光刻系统和直写光刻方法
KR20240013769A (ko) * 2021-05-25 2024-01-30 어플라이드 머티어리얼스, 인코포레이티드 증가된 디지털 포토리소그래피 정밀도를 위한 브릿지 보강재들

Family Cites Families (16)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
NL7515092A (nl) * 1974-12-26 1976-06-29 Personal Communications Inc Verlichtingsinrichting.
US4393387A (en) * 1979-09-14 1983-07-12 Canon Kabushiki Kaisha Beam recording apparatus effecting the recording by a plurality of beams
US4541712A (en) * 1981-12-21 1985-09-17 Tre Semiconductor Equipment Corporation Laser pattern generating system
US4577926A (en) * 1983-09-30 1986-03-25 International Business Machines Corporation Fiber optic writing head
US5091744A (en) * 1984-02-13 1992-02-25 Canon Kabushiki Kaisha Illumination optical system
DE3624163C2 (de) * 1985-07-24 2001-05-17 Ateq Corp Gerät zur Erzeugung eines Musters auf einem eine strahlungsempfindliche Schicht aufweisenden Werkstück
US4947186A (en) * 1988-09-22 1990-08-07 The Aerospace Corporation Apparatus and method for a UV laser image recorder
US5223693A (en) * 1990-04-28 1993-06-29 Mitsubishi Denki Kabushiki Kaisha Optical machining apparatus
DE4022732A1 (de) * 1990-07-17 1992-02-20 Micronic Laser Systems Ab Auf einem lichtempfindlich beschichteten substrat durch fokussierte laserstrahlung hergestellte struktur sowie verfahren und vorrichtung zu ihrer herstellung
US5121256A (en) * 1991-03-14 1992-06-09 The Board Of Trustees Of The Leland Stanford Junior University Lithography system employing a solid immersion lens
DK69492D0 (da) * 1992-05-26 1992-05-26 Purup Prepress As Apparat til exponering af et medie, apparat til punktexponering af et medie, samt en indretning til fastholdelse af et medie
US5339737B1 (en) * 1992-07-20 1997-06-10 Presstek Inc Lithographic printing plates for use with laser-discharge imaging apparatus
JP3052587B2 (ja) * 1992-07-28 2000-06-12 日本電気株式会社 露光装置
US5892611A (en) * 1993-08-11 1999-04-06 Asahi Kogaku Kogyo Kabushiki Kaisha Laser drawing apparatus
EP0655707A1 (de) * 1993-11-25 1995-05-31 Think Laboratory Co., Ltd. Belichtungsvorrichtung unter Verwendung von Halbleiterlasern
JP3384880B2 (ja) * 1994-08-05 2003-03-10 三菱電機株式会社 写真製版における焦点合わせ方法

Also Published As

Publication number Publication date
WO1998000760A1 (de) 1998-01-08
EP0907906A1 (de) 1999-04-14
JP3280037B2 (ja) 2002-04-30
EP0907906B1 (de) 2002-04-17
DE19626176A1 (de) 1998-01-08
JP2000507749A (ja) 2000-06-20
US6002466A (en) 1999-12-14

Similar Documents

Publication Publication Date Title
DE59707065D1 (de) Lithographie-belichtungseinrichtung
DE69522422T2 (de) Belichtungsvorrichtung
DE69725479D1 (de) Mehrstrahl-Belichtungseinrichtung
DE69728948D1 (de) Projektionsbelichtungsapparat
DE69725244D1 (de) Entwicklungsvorrichtung
KR960008429A (ko) 노광 장치
DE69424138D1 (de) Projektionsbelichtungsvorrichtung
DE69719253D1 (de) Entwicklungsvorrichtung
DE69726660D1 (de) Projektionsvorrichtung
DE69711157D1 (de) Belichtungsapparat
PT1078349E (pt) Dispositivo de exposicao
DE69727016D1 (de) Belichtungsapparat
DE69723370D1 (de) Mehrstrahl-Belichtungseinrichtung
DE69822004D1 (de) Belichtungsvorrichtung
DE69718602D1 (de) Entwicklungsvorrichtung
DE69630548D1 (de) Belichtungsvorrichtung
DE69736022D1 (de) Belichtungsapparat
DE69727739D1 (de) Belichtungsgerät
DE69515831T2 (de) Belichtungsapparat
DE69621660D1 (de) Photographisches Belichtungsgerät
DE69516644D1 (de) Belichtungsapparat
DE69715676D1 (de) Fotoresistschichttragender Film
DE69904881T2 (de) Projektionsbelichtungsgerät
DE69507357D1 (de) Belichtungsgerät
DE29602738U1 (de) Belichtungseinrichtung

Legal Events

Date Code Title Description
8364 No opposition during term of opposition
8327 Change in the person/name/address of the patent owner

Owner name: DEUTSCHES ZENTRUM F. LUFT- UND RAUMFAHRT E.V., DE

Owner name: INSTITUT F. MIKROELEKTRONIK STUTTGART STIFTUNG, DE