DE3889953D1 - Verfahren und Zusammensetzung zum Trocknen von gasförmigen Wasserstoffhalogeniden. - Google Patents

Verfahren und Zusammensetzung zum Trocknen von gasförmigen Wasserstoffhalogeniden.

Info

Publication number
DE3889953D1
DE3889953D1 DE3889953T DE3889953T DE3889953D1 DE 3889953 D1 DE3889953 D1 DE 3889953D1 DE 3889953 T DE3889953 T DE 3889953T DE 3889953 T DE3889953 T DE 3889953T DE 3889953 D1 DE3889953 D1 DE 3889953D1
Authority
DE
Germany
Prior art keywords
halide
functional groups
gaseous hydrogen
pendant functional
compounds
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
DE3889953T
Other languages
English (en)
Other versions
DE3889953T2 (de
Inventor
Glenn M Tom
Duncan W Brown
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Millipore Investment Holdings Ltd
Original Assignee
Novapure Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Novapure Corp filed Critical Novapure Corp
Publication of DE3889953D1 publication Critical patent/DE3889953D1/de
Application granted granted Critical
Publication of DE3889953T2 publication Critical patent/DE3889953T2/de
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C01—INORGANIC CHEMISTRY
    • C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
    • C01B7/00—Halogens; Halogen acids
    • C01B7/19—Fluorine; Hydrogen fluoride
    • C01B7/191—Hydrogen fluoride
    • C01B7/195—Separation; Purification
    • C01B7/197—Separation; Purification by adsorption
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01D—SEPARATION
    • B01D53/00—Separation of gases or vapours; Recovering vapours of volatile solvents from gases; Chemical or biological purification of waste gases, e.g. engine exhaust gases, smoke, fumes, flue gases, aerosols
    • B01D53/26—Drying gases or vapours
    • B01D53/28—Selection of materials for use as drying agents
    • C—CHEMISTRY; METALLURGY
    • C01—INORGANIC CHEMISTRY
    • C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
    • C01B7/00—Halogens; Halogen acids
    • C01B7/01—Chlorine; Hydrogen chloride
    • C01B7/07—Purification ; Separation
    • C01B7/0706—Purification ; Separation of hydrogen chloride
    • C01B7/0718—Purification ; Separation of hydrogen chloride by adsorption
    • C—CHEMISTRY; METALLURGY
    • C01—INORGANIC CHEMISTRY
    • C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
    • C01B7/00—Halogens; Halogen acids
    • C01B7/09—Bromine; Hydrogen bromide
    • C01B7/093—Hydrogen bromide
    • C—CHEMISTRY; METALLURGY
    • C01—INORGANIC CHEMISTRY
    • C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
    • C01B7/00—Halogens; Halogen acids
    • C01B7/13—Iodine; Hydrogen iodide
    • C01B7/135—Hydrogen iodide
    • C—CHEMISTRY; METALLURGY
    • C01—INORGANIC CHEMISTRY
    • C01G—COMPOUNDS CONTAINING METALS NOT COVERED BY SUBCLASSES C01D OR C01F
    • C01G1/00—Methods of preparing compounds of metals not covered by subclasses C01B, C01C, C01D, or C01F, in general
    • C01G1/06—Halides
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S34/00—Drying and gas or vapor contact with solids
    • Y10S34/01—Absorbents and adsorbents
DE3889953T 1987-03-24 1988-03-18 Verfahren und Zusammensetzung zum Trocknen von gasförmigen Wasserstoffhalogeniden. Expired - Fee Related DE3889953T2 (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US07/029,631 US4853148A (en) 1987-03-24 1987-03-24 Process and composition for drying of gaseous hydrogen halides

Publications (2)

Publication Number Publication Date
DE3889953D1 true DE3889953D1 (de) 1994-07-14
DE3889953T2 DE3889953T2 (de) 1994-09-15

Family

ID=21850045

Family Applications (1)

Application Number Title Priority Date Filing Date
DE3889953T Expired - Fee Related DE3889953T2 (de) 1987-03-24 1988-03-18 Verfahren und Zusammensetzung zum Trocknen von gasförmigen Wasserstoffhalogeniden.

Country Status (6)

Country Link
US (1) US4853148A (de)
EP (1) EP0283965B1 (de)
JP (1) JPH0761416B2 (de)
AT (1) ATE106855T1 (de)
DE (1) DE3889953T2 (de)
ES (1) ES2056846T3 (de)

Families Citing this family (35)

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Publication number Priority date Publication date Assignee Title
US4761395A (en) * 1987-03-24 1988-08-02 Advanced Technology Materials, Inc. Process and composition for purifying arsine, phosphine, ammonia, and inert gases to remove Lewis acid and oxidant impurities therefrom
US5094830A (en) * 1987-03-24 1992-03-10 Novapure Corporation Process for removal of water and silicon mu-oxides from chlorosilanes
US5151395A (en) * 1987-03-24 1992-09-29 Novapure Corporation Bulk gas sorption and apparatus, gas containment/treatment system comprising same, and sorbent composition therefor
US5637544A (en) * 1991-06-06 1997-06-10 Arizona Board Of Regents On Behalf Of The University Of Arizona Reactive membrane for filtration and purification of gases of impurities and method utilizing the same
GB9224594D0 (en) * 1991-12-10 1993-01-13 Ici Plc Water separation process
US5260585A (en) * 1992-06-12 1993-11-09 Novapure Corporation Endpoint and/or back diffusion gas impurity detector, and method of using the same
US5853678A (en) * 1993-03-17 1998-12-29 Nipon Sanso Corporation Method for removing hydrides, alkoxides and alkylates out of a gas using cupric hydroxide
US5359787A (en) * 1993-04-16 1994-11-01 Air Products And Chemicals, Inc. High purity bulk chemical delivery system
US5385689A (en) * 1993-06-29 1995-01-31 Novapure Corporation Process and composition for purifying semiconductor process gases to remove Lewis acid and oxidant impurities therefrom
US5885845A (en) * 1993-12-22 1999-03-23 Nippon Sanso Corporation Method for detecting inorganic hydrides, inorganic halides and organometallic compounds in a gas using copper hydroxide
US5730181A (en) * 1994-07-15 1998-03-24 Unit Instruments, Inc. Mass flow controller with vertical purifier
US5693306A (en) * 1994-11-28 1997-12-02 Mitsui Toatsu Chemicals, Inc. Production process for refined hydrogen iodide
EP0828548B1 (de) * 1995-05-03 2003-01-22 Pall Corporation Reaktive filtereinrichtung für gase mit sperrfilter
US6221822B1 (en) 1995-10-30 2001-04-24 Tomah Products, Inc. Detergent compositions having polyalkoxylated amine foam stabilizers
JPH11139805A (ja) * 1997-07-29 1999-05-25 Millipore Corp ハロゲン化水素から水分を除去するための組成物とその方法
US5910292A (en) * 1997-08-19 1999-06-08 Aeronex, Inc. Method for water removal from corrosive gas streams
US5958356A (en) * 1997-11-05 1999-09-28 Air Products And Chemicals, Inc. Method for removal of moisture from gaseous HCl
US6077487A (en) * 1997-11-05 2000-06-20 Millipore Corporation Process and apparatus of removing metal carbonyls and moisture from a gas
US6033460A (en) * 1998-04-29 2000-03-07 Millipore Corporation Reactive matrix for removing moisture from a fluorine containing gas and process
US6221132B1 (en) 1999-10-14 2001-04-24 Air Products And Chemicals, Inc. Vacuum preparation of hydrogen halide drier
US7465692B1 (en) 2000-03-16 2008-12-16 Pall Corporation Reactive media, methods of use and assemblies for purifying
US7832550B2 (en) * 2001-07-17 2010-11-16 American Air Liquide, Inc. Reactive gases with concentrations of increased stability and processes for manufacturing same
US20030017359A1 (en) * 2001-07-17 2003-01-23 American Air Liquide, Inc. Increased stability low concentration gases, products comprising same, and methods of making same
WO2003008664A2 (en) * 2001-07-17 2003-01-30 L'air Liquide-Societe Anonyme A Directoire Et Conseil De Surveillance Pour L'etude Et L'exploitation Des Procedes Georges Claude Method of making a passivated surface
US6425265B1 (en) 2001-09-26 2002-07-30 Praxair Technology, Inc. Process and apparatus for purifying hydrogen bromide
EP1512000A1 (de) * 2002-05-29 2005-03-09 L'air liquide, Société anonyme à Directoire et Conseil de Surveillance pour l'Etude et l'Exploitation des Procédés G. Claude Sauergas und matrixgas enthaltende zusammensetzungen mit reduzierter feuchtigkeit, diese zusammensetzungen enthaltende herstellungsartikel und verfahren zu ihrer herstellung
US7446078B2 (en) 2002-07-09 2008-11-04 Air Products And Chemicals, Inc. Adsorbent for water removal from ammonia
US6709487B1 (en) 2002-10-22 2004-03-23 Air Products And Chemicals, Inc. Adsorbent for moisture removal from fluorine-containing fluids
GB0412105D0 (en) * 2004-05-29 2004-06-30 Warner Noel A Recovery of steel from contaminated scrap
JP4637178B2 (ja) * 2004-09-21 2011-02-23 ヴィヴェス，ホアン イグレシアス 赤外線を用いた粉末材料の造粒及び／又は乾燥方法及び装置
KR101387865B1 (ko) * 2006-06-16 2014-04-22 주식회사 엘지화학 기재 내 존재하는 수분을 제거하는 방법
US8268284B2 (en) * 2008-01-31 2012-09-18 Nippoh Chemicals Co., Ltd. System and method for producing iodine compound
WO2009096447A1 (ja) 2008-01-31 2009-08-06 Nippoh Chemicals Co., Ltd. 無機ヨウ化物、その製造方法およびその製造システム
US8142549B2 (en) * 2008-03-26 2012-03-27 Matheson Tri-Gas, Inc. Purification of fluorine containing gases and systems and materials thereof
JP6826049B2 (ja) * 2015-12-22 2021-02-03 昭和電工株式会社 塩化水素混合物の製造方法

Family Cites Families (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3067009A (en) * 1959-04-28 1962-12-04 Nat Distillers Chem Corp Method of separation of hydrogen halides from mixtures containing same
US3146061A (en) * 1959-04-28 1964-08-25 Nat Distillers Chem Corp Method for separation of hydrogen halides from mixtures containing same
US3997652A (en) * 1969-09-24 1976-12-14 Teller Environmental Systems, Inc. Selective chromatographic separation
JPS5715840A (en) * 1980-07-01 1982-01-27 Mitsubishi Electric Corp Hygroscopic agent
GB2090841A (en) * 1981-01-13 1982-07-21 Ici Plc A magnesium-containing Ziegler-Natta catalyst component
US4603148A (en) * 1983-05-12 1986-07-29 Hercules Incorporated Macroreticulate polymer scavengers for the removal of impurities from inert fluids
US4477425A (en) * 1983-12-15 1984-10-16 Florida Progress Corporation Production of anhydrous hydrogen fluoride from low-grade metallic fluorides and sulfuric acid
GB2188043B (en) * 1986-03-19 1989-11-15 Hercules Inc Water scavengers for hydrochloric acid streams

Also Published As

Publication number Publication date
EP0283965B1 (de) 1994-06-08
JPS63256120A (ja) 1988-10-24
JPH0761416B2 (ja) 1995-07-05
EP0283965A3 (en) 1990-07-25
EP0283965A2 (de) 1988-09-28
US4853148A (en) 1989-08-01
DE3889953T2 (de) 1994-09-15
ATE106855T1 (de) 1994-06-15
ES2056846T3 (es) 1994-10-16

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Legal Events

Date Code Title Description
8364 No opposition during term of opposition
8327 Change in the person/name/address of the patent owner

Owner name: MILLIPORE INVESTMENT HOLDINGS LTD., WILMINGTON, DE

8339 Ceased/non-payment of the annual fee