DE3787035T2 - Optisches Projektionssystem für Präzisionskopien. - Google Patents

Optisches Projektionssystem für Präzisionskopien.

Info

Publication number
DE3787035T2
DE3787035T2 DE87103472T DE3787035T DE3787035T2 DE 3787035 T2 DE3787035 T2 DE 3787035T2 DE 87103472 T DE87103472 T DE 87103472T DE 3787035 T DE3787035 T DE 3787035T DE 3787035 T2 DE3787035 T2 DE 3787035T2
Authority
DE
Germany
Prior art keywords
copies
precision
projection system
optical projection
optical
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
DE87103472T
Other languages
English (en)
Other versions
DE3787035D1 (de
Inventor
Takeo Satoh
Nobuhiro Araki
Koichi Kawata
Noboru Nomura
Atushi Ueno
Shotaro Yoshida
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Panasonic Holdings Corp
Original Assignee
Matsushita Electric Industrial Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from JP5405186A external-priority patent/JPS62210415A/ja
Priority claimed from JP61159055A external-priority patent/JPS6314113A/ja
Application filed by Matsushita Electric Industrial Co Ltd filed Critical Matsushita Electric Industrial Co Ltd
Application granted granted Critical
Publication of DE3787035D1 publication Critical patent/DE3787035D1/de
Publication of DE3787035T2 publication Critical patent/DE3787035T2/de
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B17/00—Systems with reflecting surfaces, with or without refracting elements
    • G02B17/08—Catadioptric systems
    • G02B17/0884—Catadioptric systems having a pupil corrector
    • G02B17/0888—Catadioptric systems having a pupil corrector the corrector having at least one aspheric surface, e.g. Schmidt plates
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B17/00—Systems with reflecting surfaces, with or without refracting elements
    • G02B17/08—Catadioptric systems
    • G02B17/0836—Catadioptric systems using more than three curved mirrors
    • G02B17/084—Catadioptric systems using more than three curved mirrors on-axis systems with at least one of the mirrors having a central aperture
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B17/00—Systems with reflecting surfaces, with or without refracting elements
    • G02B17/08—Catadioptric systems
    • G02B17/0892—Catadioptric systems specially adapted for the UV
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70225—Optical aspects of catadioptric systems, i.e. comprising reflective and refractive elements
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70233—Optical aspects of catoptric systems, i.e. comprising only reflective elements, e.g. extreme ultraviolet [EUV] projection systems
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70308—Optical correction elements, filters or phase plates for manipulating imaging light, e.g. intensity, wavelength, polarisation, phase or image shift
DE87103472T 1986-03-12 1987-03-11 Optisches Projektionssystem für Präzisionskopien. Expired - Fee Related DE3787035T2 (de)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP5405186A JPS62210415A (ja) 1986-03-12 1986-03-12 精密複写用投影光学系
JP61159055A JPS6314113A (ja) 1986-07-07 1986-07-07 微細パタ−ン投影光学系

Publications (2)

Publication Number Publication Date
DE3787035D1 DE3787035D1 (de) 1993-09-23
DE3787035T2 true DE3787035T2 (de) 1994-03-10

Family

ID=26394795

Family Applications (1)

Application Number Title Priority Date Filing Date
DE87103472T Expired - Fee Related DE3787035T2 (de) 1986-03-12 1987-03-11 Optisches Projektionssystem für Präzisionskopien.

Country Status (3)

Country Link
US (1) US4861148A (de)
EP (1) EP0237041B1 (de)
DE (1) DE3787035T2 (de)

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US5572375A (en) * 1990-08-03 1996-11-05 Crabtree, Iv; Allen F. Method and apparatus for manipulating, projecting and displaying light in a volumetric format
US5136413A (en) * 1990-11-05 1992-08-04 Litel Instruments Imaging and illumination system with aspherization and aberration correction by phase steps
US5291339A (en) * 1990-11-30 1994-03-01 Olympus Optical Co., Ltd. Schwarzschild optical system
US5212588A (en) * 1991-04-09 1993-05-18 The United States Of America As Represented By The United States Department Of Energy Reflective optical imaging system for extreme ultraviolet wavelengths
US5173801A (en) * 1991-08-16 1992-12-22 Hughes Aircraft Company Wide field of view afocal three-mirror anastigmat
US5361292A (en) * 1993-05-11 1994-11-01 The United States Of America As Represented By The Department Of Energy Condenser for illuminating a ring field
US5392119A (en) * 1993-07-13 1995-02-21 Litel Instruments Plate correction of imaging systems
WO1996007075A1 (en) * 1993-07-13 1996-03-07 Litel Instruments, Inc. Corrector plate correction of extant imaging systems for approaching diffraction limit
US5548444A (en) * 1994-07-06 1996-08-20 Hughes Danbury Optical Systems, Inc. Optical beam homogenizing apparatus and method
US5581413A (en) * 1994-11-30 1996-12-03 Texas Instruments Incorporated Optical guide for increasing printer image width
US5870235A (en) * 1996-04-03 1999-02-09 Science Applications International Corporation Energy-efficient headlamp
US6157498A (en) 1996-06-19 2000-12-05 Nikon Corporation Dual-imaging optical system
US5847879A (en) * 1997-02-26 1998-12-08 Raytheon Company Dual wavelength wide angle large reflective unobscured system
US5828455A (en) * 1997-03-07 1998-10-27 Litel Instruments Apparatus, method of measurement, and method of data analysis for correction of optical system
US5978085A (en) * 1997-03-07 1999-11-02 Litel Instruments Apparatus method of measurement and method of data analysis for correction of optical system
GB9711366D0 (en) * 1997-06-02 1997-07-30 Pilkington Perkin Elmer Ltd Optical imaging system
US5903386A (en) * 1998-01-20 1999-05-11 Northrop Grumman Corporation Tilted primary clamshell lens laser scanner
US6356345B1 (en) 1998-02-11 2002-03-12 Litel Instruments In-situ source metrology instrument and method of use
WO1999052004A1 (fr) 1998-04-07 1999-10-14 Nikon Corporation Appareil et procede d'exposition a projection, et systeme optique reflechissant a refraction
DE19923609A1 (de) * 1998-05-30 1999-12-02 Zeiss Carl Fa Ringfeld-4-Spiegelsysteme mit konvexem Primärspiegel für die EUV-Lithographie
US6577443B2 (en) 1998-05-30 2003-06-10 Carl-Zeiss Stiftung Reduction objective for extreme ultraviolet lithography
US6741338B2 (en) 1999-02-10 2004-05-25 Litel Instruments In-situ source metrology instrument and method of use
KR100854052B1 (ko) * 1999-12-29 2008-08-26 칼 짜이스 에스엠테 아게 인접한 비구면 렌즈 표면을 구비한 투사 대물 렌즈
TW538256B (en) * 2000-01-14 2003-06-21 Zeiss Stiftung Microlithographic reduction projection catadioptric objective
JP2001228401A (ja) * 2000-02-16 2001-08-24 Canon Inc 投影光学系、および該投影光学系による投影露光装置、デバイス製造方法
JP4245286B2 (ja) * 2000-10-23 2009-03-25 株式会社ニコン 反射屈折光学系および該光学系を備えた露光装置
US7261983B2 (en) * 2000-12-08 2007-08-28 Litel Instruments Reference wafer and process for manufacturing same
US6699627B2 (en) 2000-12-08 2004-03-02 Adlai Smith Reference wafer and process for manufacturing same
US7871002B2 (en) * 2000-12-08 2011-01-18 Litel Instruments Method and apparatus for self-referenced wafer stage positional error mapping
US7099011B2 (en) 2000-12-08 2006-08-29 Litel Instruments Method and apparatus for self-referenced projection lens distortion mapping
US6734971B2 (en) 2000-12-08 2004-05-11 Lael Instruments Method and apparatus for self-referenced wafer stage positional error mapping
US6573986B2 (en) 2000-12-08 2003-06-03 Litel Instruments Method and apparatus for self-referenced projection lens distortion mapping
DE10139177A1 (de) * 2001-08-16 2003-02-27 Zeiss Carl Objektiv mit Pupillenobskuration
US7262398B2 (en) * 2001-09-20 2007-08-28 Litel Instruments Method and apparatus for self-referenced dynamic step and scan intra-field scanning distortion
US7136144B2 (en) * 2001-09-20 2006-11-14 Litel Instruments Method and apparatus for self-referenced dynamic step and scan intra-field lens distortion
US6906303B1 (en) 2001-09-20 2005-06-14 Litel Instruments Method and apparatus for self-referenced dynamic step and scan intra-field scanning distortion
US6906780B1 (en) 2001-09-20 2005-06-14 Litel Instruments Method and apparatus for self-referenced dynamic step and scan intra-field lens distortion
US7268360B2 (en) * 2001-09-20 2007-09-11 Litel Instruments Method and apparatus for self-referenced dynamic step and scan intra-field scanning distortion
US7265829B2 (en) * 2002-12-17 2007-09-04 Molecular Devices Corporation Reflective optic system for imaging microplate readers
JP4241281B2 (ja) * 2003-09-17 2009-03-18 キヤノン株式会社 露光装置
US8208198B2 (en) 2004-01-14 2012-06-26 Carl Zeiss Smt Gmbh Catadioptric projection objective
US6983215B2 (en) * 2003-12-02 2006-01-03 Mks Instruments, Inc. RF metrology characterization for field installation and serviceability for the plasma processing industry
US7466489B2 (en) * 2003-12-15 2008-12-16 Susanne Beder Projection objective having a high aperture and a planar end surface
JP5102492B2 (ja) * 2003-12-19 2012-12-19 カール・ツァイス・エスエムティー・ゲーエムベーハー 結晶素子を有するマイクロリソグラフィー投影用対物レンズ
US20080151364A1 (en) 2004-01-14 2008-06-26 Carl Zeiss Smt Ag Catadioptric projection objective
US7463422B2 (en) * 2004-01-14 2008-12-09 Carl Zeiss Smt Ag Projection exposure apparatus
CN102169226B (zh) 2004-01-14 2014-04-23 卡尔蔡司Smt有限责任公司 反射折射投影物镜
WO2005098504A1 (en) 2004-04-08 2005-10-20 Carl Zeiss Smt Ag Imaging system with mirror group
US7088427B2 (en) * 2004-04-20 2006-08-08 Litel Instruments Apparatus and method for high resolution in-situ illumination source measurement in projection imaging systems
US7126668B2 (en) * 2004-04-28 2006-10-24 Litel Instruments Apparatus and process for determination of dynamic scan field curvature
US7671979B2 (en) * 2004-04-28 2010-03-02 Litel Instruments Apparatus and process for determination of dynamic lens field curvature
US7053979B2 (en) * 2004-05-12 2006-05-30 Litel Instruments Process for amelioration of scanning synchronization error
KR101376931B1 (ko) 2004-05-17 2014-03-25 칼 짜이스 에스엠티 게엠베하 중간이미지를 갖는 카타디옵트릭 투사 대물렌즈
JP2006119490A (ja) * 2004-10-25 2006-05-11 Canon Inc 反射屈折型投影光学系及び当該反射屈折型投影光学系を有する露光装置、デバイス製造方法
DE102005042005A1 (de) * 2004-12-23 2006-07-06 Carl Zeiss Smt Ag Hochaperturiges Objektiv mit obskurierter Pupille
US7817246B2 (en) * 2006-06-21 2010-10-19 Asml Netherlands B.V. Optical apparatus
US20080112927A1 (en) * 2006-10-23 2008-05-15 Genegrafts Ltd. Cells and methods utilizing same for modifying the electrophysiological function of excitable tissues
FR2910978B1 (fr) * 2006-12-28 2009-07-31 Commissariat Energie Atomique Systeme optique de traitement d'un faisceau lumineux
DE102007051669A1 (de) 2007-10-26 2009-04-30 Carl Zeiss Smt Ag Abbildende Optik, Projektionsbelichtungsanlage für die Mikrolithographie mit einer derartigen abbildenden Optik sowie Verfahren zur Herstellung eines mikrostrukturierten Bauteils mit einer derartigen Projektionsbelichtungsanlage
DE102008033340B3 (de) * 2008-07-16 2010-04-08 Carl Zeiss Smt Ag Abbildende Optik
CN102770087A (zh) * 2009-09-14 2012-11-07 纪念斯隆-凯特林癌症中心 用于在微创手术中为组织的切割、切除和消融提供激光引导和聚焦的设备、系统及方法
DE102011076752A1 (de) * 2011-05-31 2012-12-06 Carl Zeiss Smt Gmbh Abbildende Optik
CN102981255B (zh) * 2011-09-07 2016-04-20 上海微电子装备有限公司 一种大视场投影物镜
US11561476B1 (en) * 2021-07-10 2023-01-24 Kenneth Carlisle Johnson UV lithography system

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Also Published As

Publication number Publication date
EP0237041A3 (en) 1989-05-03
US4861148A (en) 1989-08-29
DE3787035D1 (de) 1993-09-23
EP0237041B1 (de) 1993-08-18
EP0237041A2 (de) 1987-09-16

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Legal Events

Date Code Title Description
8364 No opposition during term of opposition
8339 Ceased/non-payment of the annual fee