DE3618534A1 - Fluid-jet recording head, and recording system containing this fluid-jet recording head - Google Patents

Abstract

The fluid-jet recording head such as, for example, an ink-jet recording head, has fluid channels with fluid outlets, through which a recording fluid is released in the form of a droplet jet, and electricity/heat conversion elements for generating heat, which respond to electrical input signals and thus generate energy for the release of fluid. The electricity/heat conversion element has a heat-generating resistance film which consists of an amorphous material containing hydrogen atoms and/or a substance controlling the electrical conductivity in a matrix of carbon atoms. A recording system having this recording head is also indicated.

Description

The present invention relates to a liquid jet recording head and a liquid jet recording system including this liquid jet recording head.

Among the various recording systems known heretofore, there is one called an "ink jet recording system" The shock-free system is excellent in that it enables high-speed recording on an ordinary sheet of paper, without any substantial noise and without any special fixing treatment being necessary.

Various proposals and improvements have been made in this type of recording system. Some of these suggestions and Improvements have already been made in practice, while others are still in the process of being developed for practical application.

The ink jet recording system uses a recording liquid generally referred to as "ink liquid". Droplets of the recording liquid are formed, which by various methods to the recording body, for example a

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Sheets of paper, fly, so that they are deposited on the recording body and thereby record the desired information.

The applicant has already proposed a new recording system of the ink jet type, which is described in DE-OS 28 43 064 is. This new method is based on the following principle. Thermal impulses are sent as information signals to one in a Chamber contained recording fluid supplied. As a result of the application of the thermal pulse, the ink generates vapor bubbles, which in turn, cause the ink to contract and pressurized so that it is dispensed from the chamber. The recording liquid thus discharged flies in Droplet form against the recording body and is deposited thereon so as to record the inputted information.

This system easily adapts to high speed recording and adjust color record because the creation of a high density group arrangement is possible. Since further this principle by a simpler arrangement than heretofore adopted, the recording head can be made more compact as a whole and easily mass-produced. It should also be noted that the recording head has been improved by effectively using IC and microprocessor technology, which have made remarkable advances may be suitably great in length. Delighted for these reasons This new liquid jet recording system is widely used Use.

This liquid jet recording system mainly has a recording head which is an electrothermal converting element as a means for squeezing out the ink and forming the liquid droplets.

In order to achieve a highly effective introduction of thermal energy into the liquid and a good response behavior of the liquid in with respect to the on / off control of the heat, the electrothermal conversion element is preferably in one with the

S β *

β S

C β β ♦

Discharge opening in communicating heating zone provided so that the element can directly contact the liquid.

The electricity / heat conversion element consists essentially of a heat-generating resistance element which, when supplied generates heat with electrical energy, and a pair of electrodes through which the electrical energy is supplied to the resistance element will.

This direct contact between the electricity / heat conversion element and the recording liquid, however, has the following disadvantages. The direct contact between the Electric / heat conversion element and the liquid can depending cause the electric current to flow through the recording liquid according to the resistivity of the liquid. The electric current flowing in the liquid can cause electrolysis effect of the liquid. There is also a risk of reaction between the heat generating resistance element and the Liquid when the element is activated by the electrical energy supplied to it. Such a reaction can lead to corrosion of the heat-generating element lead to a change in the specific Resistance and / or destruction of the heat-generating element results. It is also possible that the surface the heat-generating element is mechanically eroded or the element tears or breaks due to a mechanical shock that occurs, when the vapor bubbles generated as a result of the action of electrical energy collapse to disappear.

In order to counteract this problem, it has been proposed to bond on the surface of the heat generating element made of an inorganic material excellent in properties required for heat generating resistance such as an alloy such as NiCr or metal such as ZrB ₂ and HfB ₂ to form a protective layer from a material which has high resistance to acid such as SiOp. This protective

3518534

layer is supposed to protect the heat-generating element from direct contact with the recording liquid so as to improve the reliability and durability in long-term use and so to counteract the problems described above.

The liquid jet recording system with a recording head, containing this improved electrothermal converting element shows satisfactory applicability to acid resistance and durability when a liquid with relatively low electrical conductivity, e.g., one with water or an alcohol as a solvent, serves as a colored recording liquid. This recording system however, has often failed to provide sufficient durability and resistance to long-term changes when combined with a Recording liquid is used, which has a high content of Na ions and therefore a high electrical conductivity. For this Basically it was only possible to use this recording system with selected ones Recording liquids, and therefore it was for use in multicolor recording and natural color recording not suitable.

As mentioned above, it would be reliable and durable of the electricity-to-heat converting element can be improved by providing a protective layer on the heat generating element. Actually, however, it is very difficult to mass-produce such a protective layer with a high degree of reproducibility to form, and the protective layers thus produced tend to Defects which undesirably allow the recording liquid to enter the electricity / Penetrate heat conversion element.

This problem is particularly serious with an arrangement known as a "high density multiple orifice" which has a fluid channel or a liquid nozzle having a plurality of heating sections arranged in high density is provided. Such an arrangement

namely, requires numerous electricity-to-heat converting elements corresponding in number to the number of the liquid nozzles be formed at the same time. Therefore, any failure due to a failure of the protective layer causes one An electricity-to-heat converting element poses a serious problem from the viewpoint of the yield of the recording system and the Production costs. Furthermore, the protective layer tends to reduce the thermal response and the heat generation capacity on the inputted to degrade electrical signals.

Under the circumstances, there is an increasing demand for the development of a liquid jet recording system Use of an electricity / heat conversion element without a protective layer, so that the heat generating element is directly exposed to the recording liquid, but the electrothermal conversion element is highly resistant to heat, acid, mechanical shock and electrochemical conversion and is excellent shows thermal response.

Accordingly, it is an object of the invention to provide a liquid jet recording head and a liquid jet -Recording system with such a recording head, which are improved to overcome the problems inherent in the prior art described above.

There is intended to be a liquid jet recording head and a liquid jet recording system having such a recording head can be provided, wherein the liquid jet recording head has a heat generating resistance element which is a high chemical resistance as well as high resistance to electrochemical conversion, acid, mechanical impact and heat shows and wherein the protective layer on the heat generating resistor element is omitted, so that a better thermal response is guaranteed.

Further, a liquid jet recording head and a liquid jet recording system having such a recording head are intended in which the liquid jet recording head contains a heat generating element with excellent controllability of resistance.

Finally, a liquid jet recording head and a liquid jet recording system including the same are intended Recording head can be provided in which the liquid jet recording head has a heat generating resistance element excellent in heat accumulation and heat radiation properties and various desirable properties such as bonding between the substrate and the resistive film, resistance to chemical Reaction, etc.

To this end, according to one aspect of the invention, there is provided a liquid jet recording head comprising at least a liquid outlet for the delivery of a recording liquid for the purpose of forming a jet of droplets of the recording liquid and at least one electrothermal converting element for generating thermal energy and forming the droplets of the recording liquid wherein the electricity / heat converting element has a heat generating resistance film made of a Containing hydrogen atoms in a matrix of carbon atoms, amorphous material. It also becomes a liquid jet recording system in which this recording head is built.

According to another aspect of the invention there is a liquid jet recording head created with at least one liquid drop exit for the delivery of a recording liquid in the form of a jet of recording liquid droplets, at least one liquid passage communicating with the outlet and having a heating section, and at least one electricity / heat conversion corresponding to the heating section

element that generates a heat generated on a substrate Resistance film made of a hydrogen atom in a matrix of carbon atoms containing amorphous material and a pair of electrodes electrically connected to the heat generating resistor film having. It also becomes a liquid jet recording system in which this recording head is built.

The above and other objects, features and advantages of the invention will become apparent from the following description of the preferred Embodiments clearly if these are based on the enclosed Drawing is read.

Fig. 1 is a partial view of a recording head according to an embodiment of the present invention;

Fig. 2 is a section on the line U-II of Fig. 1; Fig. 3 is a section on the line III-III of Fig. 2;

Figs. 4 and 5 are partial sections of different examples of an arrangement of the electrothermal converting elements in the Recording head of the invention;

Fig. 6 is a schematic illustration of a deposition system;

Figures 7 and 8 are perspective views shown partially in section Partial views of the recording head according to the present invention Invention;

Figs. 9 to 12 are partial sections of different examples of the recording head of the present invention;

Figs. 13, 15 and 17 are perspective views of various Examples of the arrangement of electricity / heat-u.iiwand-

elements in the recording head of the present invention;

Figs. 14, 16 and 18 are sections of the examples of the arrangements shown in Figs. 13, 15 and 17;

Fig. 19 is a perspective view of a top plate of the recording head of the present invention;

Figs. 20, 21 and 22 are perspective views of various Examples of the recording head of the present invention;

Figure 23 is a perspective view of one of the present invention Inkjet recording system;

Figures 24 through 29 are graphs illustrating the Distribution of the content of hydrogen atoms and / or that of the electrical Conductivity-controlling substance in a heat-generating Show resistance film; and

Fig. 30 is a perspective view of a recording system of the present invention with the wall partially removed.

The invention is described below with reference to the enclosed Drawing fully described.

Referring to Figs. 1 and 2, a heat generating resistive film 14 is used as a constituent part of an electrothermal converting element carried by a substrate 12. On the heat generating resistor film 14, a pair of electrodes 16, 17 are provided. As As can be seen from Fig. 1, a plurality of modules are each composed of the heat generating resistor film 14 and those provided on the film Electrodes 16, 17 arranged next to one another, so that a plurality of effective heat generating zones 18, 18 '. 18 '' are created with are arranged at regular intervals. In the described Embodiment, the electrodes 16 of the modules are connected to a common

Line connected so that they form a common electrode. The arrangement is such that the heat generating zones 18, 18 _'5 18''is independently supplied by the electrodes 16,17 with electric signals so that these zones generate, in a controlled manner heat. It can be seen from FIGS. 2 and 3 that a cover plate 20 with the channels 22, 22 ', 22 "opposite the heat-generating zones 18, 18', 18 '" is attached to the overall body, which is formed by the substrate 12, the heat-generating resistance film 14 and the electrodes 16, 17. The channels extend in the direction of the line H-II in Figure 1, as clearly shown in Figure 3, which is a section along the line III-III of Figure 2. These channels create Liquid passages which are the spaces for containing the recording liquid Each of these liquid passages has a heating portion 24 that gives off heat to the recording liquid in the liquid passage.

Each liquid passage is open at the left end as shown at 26 in FIG. The open end 26 therefore forms a Output for the recording liquid. The other end of the liquid passage, i.e., the right end in Figure 2, communicates with the source of the recording liquid. The order is such that heat generation responsive to an inputted recording signal through the one of the liquid passages connected heat generating zone evaporates the recording liquid in the liquid passage to form vapor bubbles is so as to increase the pressure of the recording liquid and the liquid standing at the outlet 26 through the outlet dispense, as indicated in Figure 2 by the arrow X. As can be understood from this explanation, there is no illustration in FIG the cover plate 20.

Preferably, but not necessarily, the substrate 12 is made of a material with a high level of durability the heat generated during the formation of the heat generating resistor film 14 on the substrate is transferred to this, as well as

also to heat that passes through the shift during operation is produced. The material of the substrate 12 also preferably has a higher electrical resistivity than that on it The heat generating resistance film 14 formed is not essential, however, and the resistivity of the substrate 12 may be be smaller than that of the heat generating resistor film 14 provided that between the substrate 12 and the heat generating resistor film 14 an insulating layer is arranged. The material of the substrate 12 can have a high or a low thermal conductivity have, depending on the conditions under which the liquid jet recording head Applies.

Typical examples of substances usable as the material of the substrate 12 in the invention are inorganic materials, such as glasses, ceramics, silicon and metals, and organic materials such as polyamide resins and polyimide resins.

The heat generating resistance film 14 consists of one amorphous material that contains hydrogen atoms in a matrix of carbon atoms.

The heat generating resistive layer 14 having a matrix of carbon atoms may be any other than hydrogen atoms contain electrical conductivity control substance. the the electrical conductivity controlling substance may be a so-called impurity in the semiconductor field, e.g. P-type impurity that imparts p-conductivity or an η-type impurity that imparts η-conductivity. Examples for the p-type impurity, the Group III elements of the periodic table such as B, Al, Ga, In, Tl, etc. are among them B and Ga are particularly preferred, while examples of η-type impurities are elements of Group V of the Periodic Table are such as P, As, Sb and Bi, among which P and As are most preferred. These elements can be used alone or in combination with one another can be used.

The content of the hydrogen atoms in the heat generating resistor film 14 is preferably in the range of 0.0001 to 30 atomic%, more preferably between O and 20 ₅ OOOB ktofn-% and in the most preferred cases, between 0.001 and 10 atom%, although this content can be selected as desired so that the properties corresponding to the desired requirements are achieved.

The content of the electrical conductivity controlling substance in the heat-generating resistive film 14 is preferably, when the substance is present, between 0.01 and 50,000 atomic ppm, more preferably between 0.5 and 10,000 atom-PPm _5, and in the most preferred cases between 1 and 5000 atomic ppm., although this content can be determined as desired according to the required properties. The above-mentioned ranges of hydrogen atom content are also applicable to the case “where the heat generating resistor film contains the electrical conductivity controlling substance in addition to hydrogen atoms.

The hydrogen atoms and / or the substance controlling the electrical conductivity can move in the direction of the thickness of the heat generating resistive film 14 have an uneven distribution. The ranges given above for the hydrogen atom content and / or the one controlling the electrical conductivity Substance also apply to the case in which the hydrogen atoms and / or the electrical conductivity controlling substance unevenly are distributed. In particular, the distribution of the hydrogen atoms and / or those controlling the electrical conductivity Substance in the direction of the thickness form such a gradient that the content towards the top of the film 14 or vice versa towards the underside of the film, i.e. that adjacent to the substrate 12 Side, increases. Further, the distribution may be such that the content along the thickness of the film 14 is a maximum value or a Has minimum value. Accordingly, the distribution of the content of hydrogen atoms and / or the electrical conductivity itontrol-

lating substance in the direction of the thickness of the heat-generating Resistance film 14 can be appropriately selected so that the desired properties are created.

Figures 24 to 29 show practical examples of distribution patterns the content of hydrogen atoms and / or the electrical Conductivity controlling substance along the thickness of the heat generating resistive film 14 in the recording head of FIG Invention. In these figures, the ordinate axis represents the distance T from the interface between the substrate 12 and the heat generating one Resistance film 14 and the thickness t of the heat generating resistance film 14, while the axis of abscissa represents the content C of hydrogen atoms and / or the electrical conductivity controlling substance. In these figures the scales of the axes are like this varies that emphasizes the properties peculiar to these figures will. Thus, the invention can with the distribution patterns shown in these figures within certain tolerance ranges in the respective Cases are carried out. When the heat generating resistive film 14 hydrogen atoms and the substance that controls electrical conductivity can change the distribution pattern of the Content of hydrogen atoms and the distribution pattern of the content of the conductivity controlling substance are different from each other be. So can other distribution patterns of the hydrogen atoms and the electrical conductivity controlling substance as the patterns shown in these figures serve to achieve the desired properties. The thickness of the heat generating resistor film 14 can be freely selected so that optimal thermal and mechanical properties are achieved.

As stated above, the heat generating resistor film 14 in the recording head of the invention is made of an amorphous one Material containing hydrogen atoms in a matrix of carbon atoms. This amorphous material is hereinafter referred to as "a-C: H", wherein H is hydrogen atoms. The amorphous material a-C: H can be produced by the plasma CVD process, such as glow discharge

drive or by a vacuum deposition process such as by Atomization.

The method of forming the resistive layer 14 of a-C: H by the glow discharge method basically includes the steps placing the substrate in a deposition chamber with internal Negative pressure and the introduction of a material gas capable of supplying carbon atoms C and one capable of supplying hydrogen atoms H capable material gas into the separation chamber, being in the separation chamber by means of high frequency ovens or microwaves glow discharge is performed, thereby forming an a-C: H film on the substrate 12. The speed of introduction of the H material gas can be changed with time if an uneven distribution of the hydrogen atoms H is required.

On the other hand, the formation takes place of the resistive film 14 of aC: H by sputtering by a process _s which basically the steps of introducing the substrate 12 into a deposition chamber in which a vacuum atmosphere of an inert gas such as Ar, He or a mixture thereof , and performing sputtering on a target composed of the carbon atoms C while the H material gas for supplying the hydrogen atoms H is being introduced. The rate of introduction of the Η gas can be varied over time in order to achieve a certain gradient, ie an uneven distribution of the hydrogen atoms H.

The amorphous material serving as the material of the heat generating resistive film 14 in the recording head of the invention may contain an electrical conductivity controlling substance in addition to hydrogen atoms in a carbon matrix. This amorphous material is hereinafter referred to as "aC: H (p _s n)", in which H represents hydrogen atoms, while (p _s n) represents the substance controlling the electrical conductivity. The amorphous material aC: H (p, n) can by a plasma CVD method ₅ such as a

Glow discharge process, or by a vacuum deposition process, such as atomization.

The method of forming the resistive layer 14 of a-C: H (p, n) by the glow discharge method basically includes the steps of introducing the substrate into a deposition chamber under reduced internal pressure and introducing one for delivery gas material capable of carbon atoms C, one for delivery gas material capable of hydrogen atoms H and one for delivery of the substance that controls the electrical conductivity Gas material into the deposition chamber, while in the chamber by high frequency waves or microwaves a glow discharge is made, whereby on the substrate 12 an a-C: H (p, n) film is formed. The rate of introduction of at least one of the Η-material and (p, n) -material gases can be varied over time if an uneven distribution of the hydrogen atoms H and / or the substance (p, n) is sought.

On the other hand, the formation of the resistance film 14 of a-C: H (p, n) is carried out by sputtering by a method that is basically the steps of placing the substrate 12 in a deposition chamber in which an inert gas such as Ar, He or their Mixture, formed negative pressure atmosphere is maintained, and the implementation of the atomization on one by the carbon atoms C comprises formed target, while the H material gas for supplying the hydrogen atoms H and the (p, n) material gas for supplying the the electrical conductivity controlling substance (p, n) in the chamber to be introduced. The rate of introduction of the H material gas and / or the rate of introduction of the (p, n) material gas can be varied over time in order to obtain a certain gradient, i.e. an uneven distribution of the Hydrogen atoms H and / or those controlling the electrical conductivity Substance.

In the methods explained above, the material gases to supply the carbon atoms (C), the hydrogen atoms (H) and the substance that controls the electrical conductivity (p, n) Substances that are in gaseous form under normal pressure or substances that can be gasified under a reduced pressure.

The material for supplying the carbon atoms (C) may include saturated hydrocarbons having 1 to 5 carbon atoms, ethylenic hydrocarbons having 2 to 5 carbon atoms, acetylenic hydrocarbons having 2 to 4 carbon atoms, and aromatic hydrocarbons. Practical examples of saturated hydrocarbons are methane (CH ₄ ), ftthane (C ₂ H ₅ ), propane (C ₃ H ₃ ), η-butane (nCH, ₀ ) and pentane (C ₅ H ₁₂ ). Practical examples of ethylenic hydrocarbons are ethylene (C ₂ H ₄ ), propylene (C ₃ H ₅ ), butene-1 (C ₄ H ₈ ), butene-2 (C ₄ H ₃ ), isobutylene (C ₄ H ₃ ) and Pentene (C ₅ H ₁₀ ). Practical examples of acetylenic hydrocarbons are acetylene (C ₂ H ₂ ), methyl _{acetylene (C 3} H ₄ ) and butyne (C ₄ H ₅ ). A practical example of an aromatic hydrocarbon is benzene

The materials for supplying the hydrogen atoms H include hydrogen gas and the above-mentioned hydrocarbons such as saturated hydrocarbons, ethylenic hydrocarbons, acetylenic hydrocarbons and aromatic hydrocarbons, which serve as a material for supplying carbon atoms C.

Examples of the material for supplying the electrical conductivity controlling substance are as follows. To supply atoms of group III, in particular boron atoms, boron hydrides, such as B ₂ H ₅ , BJ ^ -ins BJ ₉₅ ^B cHii » ^B ß ^H io ⁵ B ₅ H ₁₂ and B ₅ H ₁₄ , and boron halides can be used in a suitable manner ., such as BF ₃ , BCl ₃ and BBr ₃ , serve. Materials such as AlCl ₃ , GaCl ₃₉ Ga (CH ₃ J ₃ , InCl ₃ and TlCl ₃ are useful for introducing other Group III atoms.

For the supply of atoms of group V, in particular phosphorus, phosphorus hydrides, such as PH ₃ and P ₂ H ₄ , and phosphorus halides, such as PH.J, PF ₃ , PF ₅ , PCl _35, PCl ₅ , PBr-, PBr ^ and PJ suitable. Materials such as AsH,., AsF,., AsCl-, AsBr ₃ , AsF ₅ , SbH ₃ , SbF ₃ , SbF ₅ , SbCl ₃ , SbCl ₅ , BiH ₃ , BiCl ₃ and BiBr ₃ are used to introduce other atoms of the group V suitable.

These materials can be used alone or in combination with one another can be used.

In the method of forming the heat generating resistor film described above, the amounts of the in the resistor film to be formed can be varied 14 contained hydrogen atoms and the substance controlling the electrical conductivity as well as the properties of the resistance film 14 by appropriately selecting factors such as Substrate temperature, feed rates of material gases, electrical discharge power and pressure in the deposition chamber, to be controlled.

When it is desired to obtain a heat generating resistive film 14 in which hydrogen atoms or electrical conductivity is desired controlling substance or both have an uneven distribution in the direction of the film thickness, it is preferable to vary the rate or rates of introduction of the hydrogen atoms and / or the one controlling the electrical conductivity Substance over time by means of a control valve or other suitable means.

The substrate temperature is preferably selected in the range between 20 and 1500 ^° C., more preferably between 30 and 1200 ^° C. and in the most preferred cases between 50 and 1100 ^° C.

The feed rate of the material gas becomes appropriate is selected in consideration of the heat generating property of the film and the film forming speed.

The electric discharge power is preferably in the range of 0.001 to 20 W / cm ^2, more preferably between 0.01 and 15 W / cm ^2, and in the most preferred cases between O _5, 05 and 10 W / cm ^2.

Finally, the pressure in the separation chamber is preferably

-4
wise in the range between 10 and 10 Torr, in particular between

_2
see 10 and 5 torr.

The resistive film made by the method described above of the recording head of the invention has properties similar to those of diamond. For example, the Vickers hardness is of this film in the range of 1800 to 5000. The chemical resistance and the heat resistance are due to the hydrogen atoms excellent. Furthermore, the (controllability of the resistance improved by the presence of the substance controlling the electrical conductivity.

The heat generating one used in the recording head of the invention Resistive film does not require a protective layer on the film as it has a long durability against mechanical impacts and shows high durability. Therefore, the liquid jet recording head including this heat generating resistive film allows the invention has a high performance of heat transfer to the recording liquid due to the input Signal, so that a high thermal response characteristic is achieved will. This in turn improves the flying characteristics of the droplets due to the signals applied to the recording head.

However, the invention includes a protective coating on the heat-generating resistive film provided that the Protective layer does not significantly affect the response. In fact, the protective layer is essential when the recording liquid is electrically conductive so that any short-circuiting of the electrical current between the two electrodes through the Liquid is avoided.

361853Λ

In the electricity-to-heat converting element described above the heat generating resistor film is formed on the substrate and covered by the electrodes. However, this is not the case essential, and the arrangement can also be such that the electrodes are sandwiched between the substrate and the heat generating resistor film. Figure 4 shows a modified version, in which the electrodes 16 and 17 are formed directly on the substrate 12 and covered with the heat generating resistor film 14 are.

Although the substrate 12 has been explained as being of a single body, that employed in the invention can be used Substrate 12 can be a composite body. Figure 5 shows an example of such a composite substrate. This substrate accordingly has a base part 12a and a surface layer 12b formed on the base part 12a.

The base part 12a can consist of the same material as the substrate material explained with reference to FIGS. 1 to 3, while the surface layer 12b can be formed from a material which shows a higher affinity for the resistive film 14 to be formed thereon. Thus, the surface layer 12b can be made of a amorphous material can be formed with a matrix of carbon atoms or a suitable known oxide. The surface layer 12b can in the same manner as in the above-mentioned formation of the heat generating resistance layer by deposition on the base part 12a can be formed from a suitable material.

The surface layer 12b may be a glazing layer of a ordinary glass or - if the base part is made of a metal, an oxide layer can be created by oxidizing the surface of a such metal base is formed.

The electrodes 16 and 17 can be made of any suitable material with the required conductivity, for example metals,

such as Au, Cu, Al, Ag and Ni.

The recording head of the invention can be manufactured by the following method using an apparatus which shown by way of example in FIG. 6 and the formation of the heat generating Resistance film adapted by deposition on the substrate surface is.

Referring to Fig. 6, the apparatus for forming the heat generating resistor film has the following components: a deposition chamber 1101; Gas cylinders 1102 to 1106; Mass flow controllers 1107 to 1111; Intake valves 1112 to 1116; Exhaust valves 1117 to 1121; Gas cylinder valves 1122 through 1126; Outlet pressure gauges 1127 to 1131; an auxiliary valve 1132; a lever 1133; a main valve 1134; a leak valve 1135; a vacuum meter 1136; a substrate 1137 on which the heat generating resistor film is to be formed; a heater 1138; a substrate holder 1139; a high voltage electric supply unit 1140; an electrode 1141; and a shutter 1142. The number 1142-1 denotes a target _s which can be attached to the electrode 1141, when the atomization are conducted sol I.

To form the heat generating resistor film having a matrix of carbon atoms and containing hydrogen atoms, that is, a heat generating resistor film having the composition of the aC: H type, the process can be as follows. The gas cylinder 1102 is filled with CH ^ gas (99.9 % or higher purity) diluted with Ar gas, while the gas cylinder 1103 is filled with C ₂ Hg-GaS (99.9 % or higher purity), which is also diluted with Ar gas. Before the gases from these cylinders are allowed to flow into the separation chambers 1101, the operator ensures that the valves 1122 to 1126 of all gas cylinders 1102 to 1106 are closed and the inlet valves 1112 to 1116, the outlet valves 1117 to 1121 and the auxiliary valve 1132 are open . Then, the operator opens the Hauptventi] 1134 _s ra the deposition chamber 1101 and the attached gas lines to

evacuate. When the reading on the 1136 vacuum gauge is 1.5 x 10 ~ Torr has reached, it closes the auxiliary valve 1132, the inlet valves 1112 to 1116 and the outlet valves 1117 to 1121. Then the Valves of the gas bottles containing the gases to be used are opened, so that these gases are introduced into the deposition chamber 1101 will.

If the resistive film from a-C: H with this apparatus after the glow discharge process, the process can be like follows expire.

As a first stage, the valve 1122 is opened to discharge CH 4 gas from the gas cylinder 1102, the pressure indicated by the discharge pressure valve 1127 being regulated ^{to 1 kg / cm 2.} The inlet valve 1112 is then gradually opened to allow the gas to flow into the mass flow controller 1107. Then, the exhaust valve 1117 and the auxiliary valve 1132 are gradually opened to introduce CH. Gas into the deposition chamber 1101. In the meantime, the operator sets the mass flow controller 1107 to the desired flow rate of the CH 2 gas, as does the opening of the main valve 1134, taking into account the display of the vacuum gauge 1136, so that a desired pressure is maintained in the separation chamber 1101. After the heater 1138 has been switched on to heat the substrate 1137 located on the haler 1139 to the desired temperature, the shutter 1142 is opened to start the glow discharge in the deposition chamber 1101.

In order to achieve an uneven distribution of the H in the resistor film consisting of a-C: H, the opening of the Exhaust valve 1117 varied by hand or by an external drive motor so that the flow rate of the CH. Gas is changed along a predetermined rate of change curve, thereby changing the content of Η atoms in the product film 14 is reached in the direction of its thickness.

When the resistive film of a-C: H by the sputtering method is formed with the above-mentioned apparatus, the process can be as follows.

A piece of graphite 1142-1 of high purity is first placed as a target on electrode 1141, to which an electrical High-voltage supply unit 1140, a high voltage can be applied. Then the CH. Gas from bottle 1102 is used is introduced into the deposition chamber 1101 at a desired flow rate as in the film formation by glow discharge the case is. Then the shutter 1142 is opened and the power supply unit 1140 is switched on, whereby on the target 1142-1 is sputtered. Meanwhile, the substrate 1137 is heated to the desired temperature by the heater 1138 heated and held on this, and the opening of the main valve 1134 is adjusted to the desired pressure in the deposition chamber as in film formation by glow discharge.

In order to achieve a non-uniform distribution of the H in the resistance film of a-C: H, the opening of the outlet valve 1117 varies so that the flow rate of the CH. gas changes along a predetermined rate of change curve, so that as in the film formation by glow discharge in the product film 14 a variable content of H atoms is set in the direction of thickness.

In order to obtain a heat-generating resistance film from the aC: H (p, n) system with a matrix of carbon atoms and a content of hydrogen atoms and a substance that controls the electrical conductivity, the gas cylinder 1102 with CH "gas (99.9 % or higher purity) which is diluted with Ar gas, while the gas cylinder 1103 _{is filled with PH 3} -GaS (99.9 % or higher purity) which is also diluted with Ar gas. Similarly, the bottle 1104 is filled with BJ-L gas (99.9 % or higher purity) diluted with Ar gas. Before allowing the gases from these bottles to flow into the separation chamber 1101,

The operator ensures that valves 1122 through 1126 of all gas bottles 1102 to 1106 are closed and that the inlet valves 1112 to 1116, the outlet valves 1117 to 1121 and the auxiliary valve 1132 are open. Then the operator opens the main valve 1134 to the deposition chamber 1101 and the connected Evacuate gas lines. Then when the 1136 vacuum gauge reads 1.5-10 "Torr, the auxiliary valve 1132, the inlet valves 1112 to 1116 and the outlet valves 1117 to 1121 are closed. Then the valves are the ones to be used Gas cylinders containing gases are opened so that these gases are introduced into the deposition chamber 1101.

When the resistor film of a-C: H (p, n) is formed with this apparatus by the glow discharge method, the method proceed as follows.

As a first stage, the valve 1122 is opened to release the CH ₄ gas from the gas cylinder 1102, the valve 1123 is opened to release the ΡΗ -, / Ar gas from the gas cylinder 1103, and thereby the outlet pressure meters 1127 and 1128 displayed pressures were regulated ^{to 1 kg / cm 2.} Then, the inlet valves 1112 and 1113 are gradually opened to allow the gases to flow into the mass flow regulators 1107 and 1108. Then, the exhaust valves 1117, 1118 and the auxiliary valve 1132 are gradually opened to introduce the CH. Gas and the ΡΗ, / Ar gas into the deposition chamber 1101. In the meantime, the operator sets the mass flow controllers 1107, 1108 to the desired ratio of the flow rates of the CH./Ar gas and the PH_ / Ar gas, and he also sets the opening of the main valve 1134 taking into account the reading on the vacuum gauge 1136 so that that a desired pressure is maintained in the deposition chamber 1101. Then, the heater 1138 is turned on to heat the substrate 1137 on the holder 1137 to a desired temperature, and thereafter the shutter 1142 is opened to start a glow discharge in the deposition chamber 1101.

In order to achieve a non-uniform distribution of the H atoms and / or the substance controlling the electrical conductivity in the resistive film consisting of aC: H (p, n), the opening of the outlet valve 1117 and / or that of the outlet valve 1118 must be grounded by hand or through an external drive motor so varied that the flow rate of CH "/ Ar gas and / or the ΡΗ ,, / Ar-gas along a predetermined change rate curves change _s whereby in the product film 14, a variable in the direction of film thickness content of Η atoms and / or on the substance that controls the electrical conductivity.

When the resistive film of a-C: H (p, n) with the above-mentioned If apparatus is formed by atomization, the procedure can be as follows.

A graphite piece 1142-1 of high purity is first placed as a target on the electrode 1141, which is controlled by an electrical High-voltage supply unit 1140 can be supplied with a high voltage. Then CH - gas and PH ~ / Ar gas from the Bottles 1102 and 1103 at a desired flow rate introduced into the deposition chamber 1101 as was the case with film formation by glow discharge. Then the The shutter 1142 is opened and the power supply 1140 is switched on, whereby the sputtering takes place on the target 1142-1. In the meantime, the substrate 1137 is heated to and maintained at the desired temperature by the heater 1138, and the opening The main valve 1134 is set to the desired pressure in the deposition chamber, as is done during film formation Glow discharge was the case.

To achieve an uneven distribution of the H atoms and / or the substance controlling the electrical conductivity in the resistor film consisting of a-C: H (p, n) the openings of the outlet valve 1117 and / or that of the outlet valve 1118 varies so that the flow rate of the CH "/ Ar gas and /

or that of the PH_ / Ar gas along predetermined rate of change curves changes so that, as in the case of film formation by glow discharge, the product film 14 changes in the direction of its thickness the content of Η atoms and / or the substance controlling the electrical conductivity occurs.

The electricity-to-heat converting element shown in the figures The type shown in FIGS. 1 to 3 for use in the liquid jet recording head of the invention is produced by referring to the Substrate forms the heat generating resistor film in the manner described above, on the heat generating resistor film conductive layers such as an Au layer and an Al layer as Forms electrodes and the patterning of the conductive layers and the heat-generating resistor film by known photolithographic Procedure. If necessary, a protective layer covering the heat generating resistor film and the electrodes becomes educated.

On the other hand, it becomes the electricity / heat converting element of the type shown in Figure 4 for use in the liquid jet recording head of the invention formed by first forming a conductive layer on the substrate a photolithographic technique patterning the conductive Layer makes and forms the heat-generating resistor film by glow discharge or sputtering as explained above.

The cover plate of the recording head is made of a similar material as the substrate. The channels are through a suitable process, such as mechanical milling using a micro-milling cutter, chemical etching, etc. If a light-sensitive Glass is used as the material, the channels can be formed by exposure in the desired pattern and subsequent development will.

The connection of the cover plate to the substrate follows by bonding with an adhesive, after a sufficient positional Alignment is done. Some types of material for the cover plate allow the cover plate to be connected to the substrate To achieve fusion welding.

In the embodiment of the liquid jet recording head described here the outlet 26 of the recording liquid is formed at one end of each channel 22 which is the ink chamber limited in the cover plate 20, as is shown for the typical case in FIG. However, this position of the outlet of the recording liquid does not exclude other positions, and so does the outlet for the recording liquid can also be applied to the surface of the Cover plate 20 may be formed, as shown in FIG. In this case, the end openings of each can be the ink chamber limiting channel serve as a recording fluid inlet, through which the recording liquid is introduced into the liquid passage, and the recording liquid is jet output through output 26 as shown by arrow Y. In this case, of course, each channel can have its own End closed so that the liquid is introduced through the open end of each channel.

A modification of the liquid jet recording head of the described embodiment will be explained below.

According to FIG. 9, which is a section along the line IX-IX of FIG. 8, the cover plate 20, unless the channels exist, is kept in contact with the substrate of the electricity / heat conversion element. The heating sections 24 formed along the relevant channels are therefore insulated from one another by the webs 30 which are formed by the sections of the cover plate which come into contact with the substrate. In the arrangement shown in FIG. 9, the heat-generating zones 18 are provided in the relevant channels near the outlets 26.

Figs. 10 and 12 are sections of various examples of the recording head of the described embodiment according to FIG Line IX-IX of FIG. 8.

In the recording head shown in Figure 10, the lands 30 do not contact the substrate 12, so that the heat generating Zones 18 corresponding heating sections 24 are in communication with one another. That is, the liquid passages are not like in Figure 9 shown independently, but adjacent fluid passages are in communication with each other.

In the recording head shown in Fig. 11, the ridges 30 are not formed in the cover plate 20 but in the substrate. Therefore, the heating portions 24 communicate with each other as in the recording head shown in FIG Case is. Therefore, in this case too, adjacent liquid passages are in communication with one another.

The recording head shown in Fig. 12, unlike the recording heads of Figs. 10 and 11, does not have a land. In this In this case, therefore, the liquid passage is formed by an ink chamber which is common to all heating sections 24.

The various examples shown in Figs. 9 to 12 are the modifications of the recording head shown in Fig. 8 can also be implemented in the liquid jet recording head of the type shown in FIG.

The presence of the webs 30 is not essential. The bars can also be omitted, provided that the range and the target of the flying droplets does not leave a predetermined tolerance range, although it is true that the Direction, speed and strength of the liquid jet through the liquid standing in the adjacent liquid outlets to be influenced. However, the formation of ridges is preferred to

mutual influences between adjacent liquid outlets to decrease and improve the efficiency of energy conversion. It is clear to the person skilled in the art that the webs are integral with the Lid plate can be formed or as an independent body can be formed, which then in an expedient manner on the cover plate be attached. The flat cover plate can be made of the same material as the cover plate discussed above with channels. Cured photosensitive resin films can serve as the material of the webs and the cover plate.

From the foregoing description, it can be seen that the present invention is a liquid jet recording head with a built-in electricity / heat conversion element with a heat generating resistance film made of a hydrogen atom in a matrix of carbon atoms containing amorphous material as well as a liquid jet recording system, in that this recording head is integrated. The heat generating resistor film made of the above-mentioned amorphous material shows one high chemical resistance, excellent resistance to electrochemical reactions and oxidation as well as excellent resistance to mechanical shock and heat and therefore high thermal response and durability. Further, it is easy according to the present invention, the heat generating To form resistance film.

It should be noted that the regulation of the electrical Resistance is facilitated in the embodiment which, in addition to the hydrogen atoms, also has an electrical conductivity Contains controlling substance.

It is thus possible to realize a high-frequency response characteristic and excellent reliability in the liquid jet recording.

It is also possible to have various desirable properties such as heat accumulation ability, heat radiation ability, affinity between substrate and resistance film and resistance to chemical reaction with the recording liquid, thus easy to achieve a non-uniform distribution of the content of hydrogen atoms and / or the content of the electrical conductivity controlling substance.

Practical examples of the liquid jet recording head according to the invention are described below.

Examples:

Examples of the liquid jet recording head of the invention and a comparative example were made using the Electricity / heat conversion elements placed according to the following procedures.

No. 7059 glass manufactured by Corning Glass Works was used as the substrate material. A surface layer of thermally oxidized SiOj, in a thickness of 5 µm, was used as a heat accumulation layer educated. In each case, there was a heat generating one on the substrate Resistance layer and electrodes were formed, and a protective layer was formed as necessary. The layered ones Structures made of heat-generating resistance film, electrodes and Protective layers were made in the following three types A, B and C.

The heat generating resistive film was deposited on the surface by the deposition system discussed above in connection with FIG Substrate formed. The deposition conditions were given in Tables 1, 2, 4, 5, 7 and 9. In particular, the in Examples shown in Tables 1, 4, 7 and 9 are produced by glow discharge, while the examples shown in Tables 2 and 5 and the comparative example were formed by sputtering. In the

36Ί8534

For the production of the examples given in Tables 2 and 5, graphite (99.9 % purity) was used as the target material, while the spray for the production of the comparative _{example HfB?} used as target material.

The method carried out under the same conditions Comparative Example was used for comparison, in a first case (aC: H) _s a second case (aC: H with uneven H-distribution) ₃ a third case (aC: H (p, n)) and in a fourth case (aC: H (p _s n) with non-uniform (p, n} distribution).

During the deposition, gas flow rates and other conditions as shown in Tables I _5, 2, 4, 5, 7 and 9 were observed so that heat-generating resistor films having the thicknesses shown in Tables 3, 6, 8 and 10 were formed.

Then, on the heat generating resistor film after An Al layer is formed by electron beam process, and by photolithographic process Technique, a resist pattern was formed. Using this resist pattern, the Al layer was etched so that several pairs of electrodes formed. Then was done by photolithographic Technique another resist pattern was formed, and unnecessary parts of the heat generating resistor film were etched with an etching liquid of the HF system removed. Accordingly, a plurality of heat generating resistance elements were formed, each of which a heat-generating zone from part of the heat-generating resistance film of 40 pm χ 200 μm and electrodes deposited thereon would have. The density of the heat generating zone was 8 per millimeter.

Then, a layer of photosensitive polyimide (trade name Photoneece) was formed by the spin coating method. After a 1-hour pre-cure at 80 ⁰ C, the heat generating element was exposed using an aligner, and then developed to n as an opening for a window "of each

To form heat generating zone. Finally, the heat generating element was post-cured for 30 minutes at 140 ⁰ C and 1 hour at 400 ° C, whereby the series of electrical / thermal converting elements has been completed.

The resistance values of the heat generating zones in the various electricity-to-heat conversion elements manufactured by the method described above are given in Tables 3, 6, 8 and The photosensitive polyimide served as any Prevent electrolysis of the Al electrode in the ink.

The row arrangement of the electricity-to-heat converting elements thus completed is in schematic perspective View in Figure 13 and in a schematic sectional view in Figure shown. In these figures, reference numeral 28 denotes a polyimide layer.

Type B.

A heat-generating resistive film could be on anyone Substrate in the same manner as for Type A under the deposition conditions shown in Tables 1, 2, 4, 5, 7 and 9 are formed. During the deposition, the gas flow rates were and other factors as specified in Tables 1, 2, 4, 5, 7 and 9 are observed so that the heat-generating Resistance films in the various in Tables 6, and 10 specified thicknesses were formed.

Then was on the heat generating resistor film through the electron beam method formed an Au layer and it a resist pattern was formed by the photolithographic technique. Using this resist pattern, the Au layer was etched to form a plurality of pairs of electrodes. Then was done by photolithographic Technique, another resist pattern was formed, and the unnecessary parts of the heat generating resistor film were made etched away with a liquid from the HF system. Accordingly was

formed a plurality of heat generating resistance elements each of which had a heat generating region composed of a part of the heat generating resistance film as large as 40 µm 200 µm and electrodes deposited thereon. The density of the heat generating zones was 8 per millimeter. The resistances of the heat generating zones in the various electrothermal converting elements produced by the above-described method are shown in Tables 3, _3, 6, 8 and 10 as in the case of Type A. The structure of the row of electricity / heat conversion elements thus completed is shown in the schematic perspective view in FIG. 15 and in the schematic sectional view in FIG.

An Al layer was formed on the substrate by the electron beam method, and a resist pattern was formed thereon by the photolithographic technique. Using this resist pattern, a plurality of pairs of electrodes were formed on the Al layer. Then, a heat generating resistor film was formed on the Al layer. This could be done using the same procedure as for type A. The deposition conditions as shown in Tables 1, 2, 4, 5, 7 and 9 were followed so that the heat generating resistor film was formed in various thicknesses as shown in Tables 3, 6, 8 and 10. Then, another resist pattern was formed by the photolithography technique, and the unnecessary part of the heat generating resistor film was removed by an etching liquid of the HF system. Accordingly, there were formed heat generating resistor elements each having a heat generating region composed of a part of the heat generating resistor film as large as 40 µm 200 µm and electrodes deposited thereon. The density of the heat-generating zones was 8 per mm. In this case, the Al electrodes were effectively protected by the heat generating resistor film, so that it was not necessary to form a protective film for the electrodes. The resistance values of the heat witnesses

Zones of the electricity-to-heat conversion elements formed by the method described above are as given in the case of type A in Tables 3, 6, 8 and 10. The structure of the so educated The series of electricity / heat conversion elements is shown in the schematic perspective illustration in FIG. 17 and in the schematic sectional view shown in Figure 18.

Liquid jet recording heads have been manufactured using the electrothermal converting elements disclosed in US Pat formed by the various methods described above. Broadly, there have been two types of recording heads produced, namely type I in the structure shown in FIG. 7 and type II in the structure shown in FIG. The recording head Type I was made by two different processes. The recording head manufactured by the first method is referred to as type 1-1, while the recording head manufactured by the second method is referred to as type 1-2 will.

The manufacturing processes were as follows.

Type I-1

Referring to Figure 19, became a sheet of glass 40 a cover plate 20 is formed with channels. A plurality of channels 22 intended to form the fluid passages, each of which 40 pm wide and 40 μm deep, and a groove 42, which has a common, to form the ink chamber communicating with the liquid passages were made by a micromill in the Glass plate 40 formed, whereby the cover plate equipped with channels 20 was completed.

The top plate 20 was then attached to each row of the electrothermal converting elements formed by the methods described above connected so that the heat generating zones in the electricity / heat conversion elements on the channels 22

are aligned so that the fluid passages and the common ink chamber are formed. Then there were ink inlet tubes 44 connected to the kit for introducing an ink into the common ink chamber, creating an integral Recording head 46 was formed.

Type 1-2

Every electrothermal conversion element was coated with a photosensitive film 50 which is one of Tokyo Oka Kogyo film manufactured under the trade name Ordyl was. The coated member was then exposed through an aligner and developed so that the film 50 was a predetermined one Pattern was formed. Then was a glass plate 54, the also with a photosensitive film 52 of the same Material as the film 50 was coated adhered to the patterned film on the electrothermal transducer. The body so formed was then mechanically cut, such as by dicing, to provide the liquid outlets 26 to expose. Then, ink introduction tubes 44 for introducing an ink from a source (not shown) were cut on the Assembly, thereby forming an integral recording head 56 as shown in the schematic perspective view is shown in FIG.

Type II

A cover plate 20 was formed which has liquid outlets 26 in its main surface. In particular, the cover plate 20 was made of a stainless steel plate in which the channels were formed, for example, by etching. A sample of photosensitive film manufactured by Hitachi Chemical Co., Ltd. is manufactured under the trade name PHT-145ft-50 _s formed on the precious steel plate, and by a Elektroformierverfahren a Ni plating layer was formed. The liquid outlets 26 were formed in places where the photosensitive film pattern existed. The thus formed cover plate 20 wu.-de

with an adhesive to the row of electricity / heat conversion elements glued in such a way that the heat-generating zones are aligned with the liquid outlets 26. That Electric / heat converting element has been mechanically punched beforehand in order to supply ink to the common ink chamber in the cover plate 20 to allow. Then, an ink introduction tube 60 for introducing an ink was made a source (not shown) to the underside of the electrothermal conversion element connected, resulting in an integral recording head 62 as shown in the schematic perspective view of Figure 22 is shown. In FIG. 22, the number 64 designates recesses which are between the Create ridges in adjacent liquid outlets. Thus, after the formation of the ridges, the type II recording head can either the construction shown in FIG. 9 or the construction shown in FIG. 10 or even the construction shown in FIG that works without bars.

Thus, there are three types A, B and C in the series arrangement of the electrothermal converting elements and three Types 1-1, 1-2 and II of the construction of the recording head available, and various combinations of these types are possible.

Among these various combinations, a combination of the type A electrical / heat converting element and of the 1-1 type recording head structure was subjected to a durability test which will be explained below.

A lead board was attached to the recording head formed by the type A structure and the type I structure to complete the recording head unit. The lead board had electrode leads (not shown) attached to the associated heat-generating zones corresponding, independent electrodes 17 were connected,

and an electrode lead (not shown) to the electrode 16, which was common to all heat generating zones.

Using this recording head unit, there was assembled a liquid jet recording system which is shown in the schematic perspective view in FIG. As can be seen from this figure, this uses Liquid jet recording system includes the following parts: the recording head unit 70; a carriage 72 supporting the recording head unit 70; Guide body 74 for guidance the reciprocating motion of carriage 72; and a roller 76. Numeral 78 denotes one held on the roller 76 Recording medium such as printing paper.

The recording head unit 70 is oriented so that the recording liquid outlets in the direction of arrow Z. are directed so that the droplets of the recording liquid can fly in the direction of arrow Z and in the form of dots are deposited on the recording medium 78 located on the roller 76. The main scanning is carried out by drive of the recording head unit 70 by a suitable drive means along the guide bodies 74 during the auxiliary scanning takes place so that the roller 76 is rotated by another suitable drive means about the axis of the shaft 77, wherein the inputted information through the liquid points on the recording medium to be recorded.

A test was made using this liquid jet recording system performed under the following conditions.

There were square wave impulses generating the heat Zones fed. The pulse width was 10 psec and the period was 200 μsee. The voltage level of the pulse was 1.2 times the minimum boiling point at which bubbles are generated

began in the ink. Accordingly, the voltage of the pulse became Chosen to 24 V if the minimum boiling temperature corresponded to 20 V. The composition of the ink used was as follows. Water 68 parts by weight

DÄG (diethylene glycol) 30 parts by weight black dye 2 parts by weight

The test operation of the recording system was carried out using the above-mentioned ink and among those mentioned above Conditions. The durability was tested for various samples, and the results of the tests are shown in Tables 3, 6, 8 and 10. The evaluation of the durability is made by counting the number of electrical pulses given by the recording head withstands. The characters "o" and "x" in these days

barks indicate that the recording head repeated 10 or more Can withstand pulse cycles or that the recording head can withstand 10 cycles or less.

From these tables it can be seen that the liquid jet recording head according to the present invention is opposite that of Comparative Example is excellent in durability and recording property. Although the result of the with the combination of type A and type 1-1 has been specifically described, were similarly excellent results of the liquid jet recording head of the invention also achieved with combinations of the other types.

3018534

Table 1

example
No. Reaction gas Type A / B Ratio A / B Throughput
lot
(SCCM) Electr.
power
(W / cm ² ) Substrate
temperature
( ⁰ C) Substrate
material PI CH ₄ 1 50 0.8 350 Glass P-2 ^C 2 ^H 6 1 50 1.5 350 Glass P-3 CH ₄ 1 50 0.8 350 Si P-4 ^C 2 ^H 6 1 50 1.5 350 Si

Table 2

example
No. Reaction gas Ratio A / B Throughput
lot
(SCCM) Electr.
power
(W / cm ² ) Substrate
temperature
( ⁰ C) Substrate
material S-I Type A / B 1 50 13th 350 Glass S-2 H ₂ 1 50 13th 350 Si Reference
example H ₂ 1 20th 1.6 200 Si Ar

ORjGINAL! MSPEC-TED

Table 3

Example no. thickness
O
(A) resistance
.. (&). durability PI 1000 205 O P-2 1000 205 O P-3 1000 205 O P-4 1000 205 O S-I 1000 205 O S-2 1000 205 O Reference example 1500 120 X
I.

Table 4

example
No. Reaction gas Ratio A / B Throughput
lot
(SCCM) Electr.
power
(W / cm ² ) Substrate
temperature
( ⁰ C) Substrate
material P-5 Type A / B 1 50 ■ * 20 0.8 350 Glass P-6 CH ₄ 1 50 ^ 20 1.5 350 Glass P-7 ^C 2 ^H 6 1 20 + 50 0.8 350 Glass P-8 CH ₄ 1 20 * 50 1.5 350 Glass P-9 ^C 2 ^H 6 1 50 * 20 0.8 350 Si P-IO CH ₄ 1 50 * 20 1.5 350 Si P-Il ^C 2 ^H 6 1 20 * 50 0.8 350 Si P-12 CH ₄ 1 20 * 50 1.5 350 Si ^C 2 ^H 6

Table 5

example
No. Reaction gas Ratio A / B Throughput
lot
(SCCM) Electr.
power
(W / cm ² ) Substrate
temperature
( ⁰ C) Substrate
material S-3 Type A / B 1 20 ■ * 10 13th 350 Glass S-4 H ₂ 1 20 + 10 13th 350 Si Reference
example H ₂ 1 20th 1.5 200 Si Ar

Table 6

Example no. thickness
O
(A) resistance
(ß.) durability P-5 1000 230 O P-6 1000 230 O P-7 1000 230 O P-8 1000 230 O P-9 1000 230 O P-IO 1000 230 O P-Il 1000 230 O P-12 1000 230 O S-3 1000 230 O S-4 1000 230 O Reference example 1500 120 X

Table 7

example
No. Reaction gas Ratio A / B Throughput
lot
(SCCM) Electr.
power
(W / cm ² ) Substrate
temperature
( ⁰ C) Substrate
material P-13 Type A / B ° ' ⁵ -5
1-10 ^D 50
125 1.5 350 Glass P-14 CH / Ar
PH ^ / Ar 0.5 _ ₅
1-10 50
125 1.5 350 Glass P-15 CH./Ar
B _? H _fi / Ar 0.5 ₅
1-10 50
125 1.5 350 Si P-16 CH./Ar
PH ^ / Ar 0.5 ₅
1-10 ^D 50
125 1.5 350 Si CH./Ar
B _? fl _fi / Ar

Table 8

Example no. thickness
O
(A) resistance
(£) durability P-13 1000 180 O P-14 1000 180 O P-15 1000 180 O P-16 1000 180 O Reference example 1500 120 X

Table 9

example
No. Reaction gas Ratio A / B Throughput
lot
(SCCM) Electr.
power
(W / cm ² ) Substrate »
temperature
( ⁰ C) Substrate
material P-17 Type A / B 0.5 _ ₅
1-10 ^b 50 ■ * 30
125 1.5 350 Glass P-18 CH./Ar
PH ^ / Ar 0.5 ₅
MO ^b 50 ^ 30
125 1.5 350 Glass P-19 CfWAr
B, H; / Ar 0.5 _ ₅
1-10 ^b 50
125 1.5 * 1.6 350 Glass P-20 CH./Ar
PH ^ / Ar 0.5 _ ₅ la 1.5-1.6 350 Glass P-21 CH./Ar
B _? H ^ / Ar 0.5 _ ₅
1-10 ^p 50 -v 30
125 1.5 350 Si P-22 CH./Ar
PH ^ / Ar 0.5 ₅
1-10 ^b 50 ■ »30
125 1.5 350 Si P-23 CH./Ar
B ₉ HZ / Ar 0.5 _ ₅
1.10 ^b 50
125 1.5 * 1.6 350 Si P-24 CH./Ar
PH ₃ / Ar 0.5 _ ₅
1-10 ^ö 50
125 1.5 * 1.6 350 Si CH./Ar
B ₂ Hg / Ar

Table 10

Example no. thickness
O
(A) resistance
(Ä) durability P-17 1000 205 O P-18 1000 205 O P-19 1000 205 O P-20 1000 205 O P-21 1000 205 O P-22 1000 205 O P-23 1000 205 O P-24 1000 205 O Reference example 1500 120 X

A practical embodiment of a liquid jet recording system the invention incorporating the described liquid jet recording head will be described below. Figure 30 is a perspective view of a liquid jet recording system of the present invention with the wall partially cut away.

This recording system has two recording head units 70 which are mounted side by side on a carriage 72 and are attached by holder 71. Each recording head unit 70 is detachable and freely available so that it can be discarded when the recording liquid therein is used up.

A wire 82 running around the disks 80 and 81 is included both ends connected to the respective side surfaces of the carriage 72. The disk 81 is driven by a motor 84. The arrangement is such that when the engine 84 is operated, the carriage 72 is pulled over the wire 82 so that it moves in Figure 30 along the guide body 74 to the left and right.

The roller 76 is carried by a rotating shaft 77 which is in turn driven by another motor 86 via a gear mechanism 88 to feed the recording medium 78 .

During operation, electrical signals corresponding to the information to be recorded are passed through a flexible conductor track 90 fed to the recording head units 70 so that they can remove the droplets of the recording liquid as through the Arrows Z indicated radiate toward the recording medium, whereby the information is recorded on the recording medium will.

It goes without saying that the recording head may be a full-line head which extends over the entire length of the recording or printing line. In such a case it is different than in the embodiment shown in Fig. 30, it is not necessary to use a mechanism for driving the recording head.

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Claims (31)

Claims 1. A liquid jet recording head having at least one liquid outlet for discharging a recording liquid for the formation of a jet of droplets of this liquid, characterized in that for the formation of the recording liquid droplets at least one electrothermal conversion element serves as a heat generating resistance film made of a hydrogen Atoms in a matrix of carbon atoms containing, amorphous Material consists. 2. A liquid jet recording head according to claim 1, characterized in that the amorphous material of the heat generating Resistance film also controls the electrical conductivity Contains substance. 3. A liquid jet recording head according to claim 1, characterized in that the hydrogen atoms in the direction of thickness Dresdner Bank (Manchen) Account 3939 844 Deutsche Bank (Munich) Account 2861060 Post office (Munich) account 670-43-804 of the resistive film are unevenly distributed. 4. Liquid jet recording head according to claim 2, characterized in that the hydrogen atoms and / or the electrical conductivity-controlling substance in the direction of the Thickness of the resistive film are unevenly distributed. 5. Liquid jet recording head according to claim 2 or 4, characterized in that the electrical conductivity controlling substance an element from group III or the Group V of the Periodic Table is. 6. A liquid jet recording head according to any one of Claims 1 to 5, characterized in that the content of hydrogen atoms is in the range from 0.0001 to 30 atom%. 7. A liquid jet recording head according to any one of Claims 2 and 4 to 6, characterized in that the content of the electrical conductivity controlling substance in the area from 0.01 to 50,000 atomic ppm. 8. liquid jet recording head according to any one of claims 1 to 7, characterized in that the electricity / The heat conversion element further comprises a protective layer. 9. A liquid jet recording head according to any one of claims 1 to 8, characterized in that a plurality of Recording liquid outlets is provided. 10. Liquid jet recording head according to any one of Claims 1 to 9, characterized in that several electricity / heat conversion elements are provided. 11. Liquid jet recording system with at least a liquid jet recording head according to any one of claims 1 to 10. 12. A liquid jet recording head having at least one liquid drop exit for discharging a recording liquid to form a jet of droplets of this liquid, thereby marked that with the liquid drop outlet at least one liquid channel is connected to a heating section and at least one electricity-to-heat converting element in the heating section is equivalent to, that is, a heat generating resistor film formed on a substrate and composed of a hydrogen atom in a matrix of carbon atoms containing amorphous material and a pair of electrodes electrically connected to the resistive film. 13. A liquid jet recording head according to claim 12, characterized in that the amorphous material of the heat generating resistive film further has an electrical conductivity controlling one Contains substance. 14. Liquid jet recording head according to claim 12 or 13, characterized in that the hydrogen atoms in the direction the thickness of the resistor film are unevenly distributed. 15. A liquid jet recording head according to claim 14, characterized in that the uneven distribution of the hydrogen atoms have a higher hydrogen atom concentration in the area near the substrate than in the area remote from the substrate shows. 16. A liquid jet recording head according to claim 14, characterized in that the uneven distribution of hydrogen atoms in the area near the substrate results in a smaller hydrogen atom concentration than in the area remote from the substrate. 17. A liquid jet recording head according to claim 14, characterized in that the uneven distribution of hydrogen atoms in the direction of the thickness of the heat generating resistor film has a maximum value. 18. Liquid jet recording head according to claim 14, characterized in that the uneven distribution of the hydrogen a tome has a minimum value in the direction of the thickness of the heat generating resistor film. 19. Liquid jet recording head according to claim 13, characterized in that the hydrogen atoms and / or the electrical conductivity-controlling substance in the direction of the Thickness of the resistive film are unevenly distributed. 20. A liquid jet recording head according to claim 19, characterized in that the uneven distribution of the hydrogen atoms and / or the electrical conductivity controlling Substance in the area near the substrate has a higher concentration of hydrogen atoms and / or of the electrical conductivity controlling substance than in the area remote from the substrate shows. 21. A liquid jet recording head according to claim 19, characterized in that the uneven distribution of hydrogen atoms and / or the electrical conductivity controlling substance has a smaller concentration in the region near the substrate the hydrogen atoms and / or the electrical conductivity controlling substance than in the area remote from the substrate. 22. A liquid jet recording head according to claim 19, characterized in that the uneven distribution of the hydrogen atoms and / or the electrical conductivity controlling Substance in the direction of the thickness of the heat-generating resistance layer has a maximum value. 23 liquid jet recording head according to claim 19, characterized in that the uneven distribution of the hydrogen atoms and / or those controlling electrical conductivity Substance has a minimum value in the direction of the thickness of the heat generating resistance layer. 24. A liquid jet recording head according to any one of Claims 12 to 23, characterized in that several liquid channels and several recording liquid outlets corresponding to the liquid channels are provided. 25. A liquid jet recording head according to any one of Claims 12 to 23, characterized in that several recording liquid outlets are connected to a single common fluid channel. 26. A liquid jet recording head according to claim 24, characterized in that the liquid channels are connected to a single common liquid chamber. 27. A liquid jet recording head according to claim 24, characterized in that the heating portions of the associated Fluid channels are interconnected. 28. A liquid jet recording head according to any one of claims 12 to 27, characterized in that the heat generating Resistance film is formed on the substrate and the pair of electrodes is formed overlying the heat generating resistor film. 29. A liquid jet recording head according to any one of Claims 12 to 27, characterized in that the pair of electrodes are formed on the substrate and the heat-generating resistor film is designed to lie on top of the pair of electrodes. 30. A liquid jet recording head according to claim 28, characterized in that at least one pair of electrodes is covered by a protective layer. 31. A liquid jet recording system having a liquid jet recording head according to one of claims 12 to 30.