DE3587257T2 - Ylide-pyridinium-polymeren und daraus hergestellte materialien. - Google Patents

Ylide-pyridinium-polymeren und daraus hergestellte materialien.

Info

Publication number
DE3587257T2
DE3587257T2 DE8585106888T DE3587257T DE3587257T2 DE 3587257 T2 DE3587257 T2 DE 3587257T2 DE 8585106888 T DE8585106888 T DE 8585106888T DE 3587257 T DE3587257 T DE 3587257T DE 3587257 T2 DE3587257 T2 DE 3587257T2
Authority
DE
Germany
Prior art keywords
ylide
materials made
pyridinium
polymers
pyridinium polymers
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
DE8585106888T
Other languages
English (en)
Other versions
DE3587257D1 (de
Inventor
Lloyd D Taylor
Michael Karl-Josef Haubs
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Polaroid Corp
Original Assignee
Polaroid Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Polaroid Corp filed Critical Polaroid Corp
Publication of DE3587257D1 publication Critical patent/DE3587257D1/de
Application granted granted Critical
Publication of DE3587257T2 publication Critical patent/DE3587257T2/de
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G18/00—Polymeric products of isocyanates or isothiocyanates
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F246/00—Copolymers in which the nature of only the monomers in minority is defined
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F20/00—Homopolymers and copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical or a salt, anhydride, ester, amide, imide or nitrile thereof
    • C08F20/02—Monocarboxylic acids having less than ten carbon atoms, Derivatives thereof
    • C08F20/10—Esters
    • C08F20/34—Esters containing nitrogen, e.g. N,N-dimethylaminoethyl (meth)acrylate
    • C08F20/36—Esters containing nitrogen, e.g. N,N-dimethylaminoethyl (meth)acrylate containing oxygen in addition to the carboxy oxygen, e.g. 2-N-morpholinoethyl (meth)acrylate or 2-isocyanatoethyl (meth)acrylate
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F20/00—Homopolymers and copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical or a salt, anhydride, ester, amide, imide or nitrile thereof
    • C08F20/02—Monocarboxylic acids having less than ten carbon atoms, Derivatives thereof
    • C08F20/52—Amides or imides
    • C08F20/54—Amides, e.g. N,N-dimethylacrylamide or N-isopropylacrylamide
    • C08F20/60—Amides, e.g. N,N-dimethylacrylamide or N-isopropylacrylamide containing nitrogen in addition to the carbonamido nitrogen
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable
DE8585106888T 1984-06-06 1985-06-05 Ylide-pyridinium-polymeren und daraus hergestellte materialien. Expired - Fee Related DE3587257T2 (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US06/617,726 US4617253A (en) 1984-06-06 1984-06-06 Polymeric pyridinium ylides and products prepared from same

Publications (2)

Publication Number Publication Date
DE3587257D1 DE3587257D1 (de) 1993-05-19
DE3587257T2 true DE3587257T2 (de) 1993-07-29

Family

ID=24474806

Family Applications (1)

Application Number Title Priority Date Filing Date
DE8585106888T Expired - Fee Related DE3587257T2 (de) 1984-06-06 1985-06-05 Ylide-pyridinium-polymeren und daraus hergestellte materialien.

Country Status (7)

Country Link
US (2) US4617253A (de)
EP (1) EP0164100B1 (de)
JP (1) JPS619410A (de)
KR (1) KR910000219B1 (de)
AU (2) AU570116B2 (de)
CA (1) CA1258653A (de)
DE (1) DE3587257T2 (de)

Families Citing this family (24)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4706167A (en) * 1983-11-10 1987-11-10 Telemark Co., Inc. Circuit wiring disposed on solder mask coating
DE3527889A1 (de) * 1985-08-03 1987-02-05 Basf Ag Photoreaktive polymere fuer die herstellung von reliefstrukturen
US4910268A (en) * 1987-04-22 1990-03-20 Shiro Kobayashi Acryl type macromonomer having a polyethyleneimine derivative chain and process for producing the same, as well as graft polymer having a polyethyleneimine derivative chain as the graft chain and process for producing the same
DE3806088A1 (de) * 1988-02-26 1989-09-07 Basf Ag Photoreaktive polymere und verfahren zur herstellung eines zweilagenresists
US5158682A (en) * 1989-04-13 1992-10-27 Polysep Surface Technologies Inc. Separation media containing acyl diazepines
US5159039A (en) * 1989-04-13 1992-10-27 Polysep Surface Technologies Inc. Separation media containing acyl diazepines
EP0695437A1 (de) * 1991-12-30 1996-02-07 The Dow Chemical Company Fotohärtbare zusammensetzungen
US5705585A (en) * 1993-06-30 1998-01-06 Arqule, Inc. Aminimide-containing molecules and materials as molecular recognition agents
US7034110B2 (en) 1994-01-05 2006-04-25 Arqule, Inc. Method of identifying chemical compounds having selected properties for a particular application
JPH09507852A (ja) * 1994-01-05 1997-08-12 アーキュール，インコーポレーテッド 特定の性質を有するポリマーの製造方法
US5734082A (en) * 1994-10-20 1998-03-31 Arqule Inc. Hydroxyethyl aminimides
US5712171A (en) * 1995-01-20 1998-01-27 Arqule, Inc. Method of generating a plurality of chemical compounds in a spatially arranged array
WO1996031263A1 (en) * 1995-04-06 1996-10-10 Arqule, Inc. Method for rapid purification, analysis and characterization of collections of chemical compounds
US5962412A (en) * 1996-06-10 1999-10-05 Arqule, Inc. Method of making polymers having specific properties
JP4023867B2 (ja) * 1997-05-09 2007-12-19 沖電気工業株式会社 レジスト用感光性樹脂組成物
WO2000034267A1 (fr) * 1998-12-04 2000-06-15 Takeda Chemical Industries, Ltd. Procede de production d'un compose d'amide cyclique
US6704113B1 (en) * 2000-03-28 2004-03-09 Juliusz W. Adamczuk Non-destructive surface inspection and profiling
JP2004311957A (ja) * 2003-03-26 2004-11-04 Seiko Epson Corp デバイスとその製造方法及び電気光学装置並びに電子機器
CN102169995B (zh) 2006-12-15 2014-09-24 东京应化工业株式会社 负极基材
TWI384594B (zh) * 2008-06-05 2013-02-01 Unimicron Technology Corp 內埋式線路結構的製程
US8388824B2 (en) * 2008-11-26 2013-03-05 Enthone Inc. Method and composition for electrodeposition of copper in microelectronics with dipyridyl-based levelers
US9193874B2 (en) 2012-07-16 2015-11-24 Empire Technology Development Llc Self-renewing hydrophilic organic coatings
US9493670B2 (en) * 2013-04-18 2016-11-15 Empire Technology Development Llc Coatings that provide hydrophilic surface
JP7125751B2 (ja) * 2018-11-01 2022-08-25 学校法人 関西大学 化合物およびその合成方法ならびに重合体およびその合成方法

Family Cites Families (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US2718516A (en) * 1952-11-08 1955-09-20 Rohm & Haas Isocyanato esters of acrylic, methacrylic, and crotonic acids
NL227112A (de) * 1954-03-26
DE1227241B (de) * 1964-07-16 1966-10-20 Bayer Ag Verfahren zur Herstellung von Acrylnitril-Copolymerisaten
US3641145A (en) * 1967-08-23 1972-02-08 Ashland Oil Inc Vinyl aromatic aminimides
GB1240709A (en) * 1968-07-18 1971-07-28 Ciba Ltd Curable compositions containing an epoxide resin and a copolymer of an olefine hydrocarbon with an olefine ester
GB1465905A (en) * 1973-11-30 1977-03-02 Ici Ltd Ammonioamidates
FR2253011A1 (en) * 1973-11-30 1975-06-27 Ici Ltd Ammonio-amidates for modifying polymers or polymer surfaces - are prepd. from hydrazides pref. prepd. in situ from quaternary hydrazines
DE2456893A1 (de) * 1974-12-02 1976-08-12 Siemens Ag Speicherelement
US4282201A (en) * 1979-02-02 1981-08-04 Alza Corporation Pharmaceutical comprising drug and polymer
DE3130545C2 (de) * 1981-08-01 1986-05-07 Basf Farben + Fasern Ag, 2000 Hamburg Selbstvernetzendes Kunstharz
JPS61278577A (ja) * 1985-06-05 1986-12-09 Mitsubishi Rayon Co Ltd 紫外線硬化型インキ組成物

Also Published As

Publication number Publication date
JPS619410A (ja) 1986-01-17
EP0164100A3 (en) 1987-08-05
EP0164100A2 (de) 1985-12-11
DE3587257D1 (de) 1993-05-19
AU4330985A (en) 1985-12-12
AU591373B2 (en) 1989-11-30
AU570116B2 (en) 1988-03-03
US4617253A (en) 1986-10-14
KR860000323A (ko) 1986-01-28
EP0164100B1 (de) 1993-04-14
KR910000219B1 (ko) 1991-01-23
US4670528A (en) 1987-06-02
AU1029088A (en) 1988-04-28
CA1260649C (de) 1989-09-26
JPH0548270B2 (de) 1993-07-21
CA1258653A (en) 1989-08-22

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Legal Events

Date Code Title Description
8364 No opposition during term of opposition
8339 Ceased/non-payment of the annual fee