DE3469324D1 - Image-forming process - Google Patents

Image-forming process

Info

Publication number
DE3469324D1
DE3469324D1 DE8484810037T DE3469324T DE3469324D1 DE 3469324 D1 DE3469324 D1 DE 3469324D1 DE 8484810037 T DE8484810037 T DE 8484810037T DE 3469324 T DE3469324 T DE 3469324T DE 3469324 D1 DE3469324 D1 DE 3469324D1
Authority
DE
Germany
Prior art keywords
image
forming process
forming
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
DE8484810037T
Other languages
English (en)
Inventor
Edward Dr Irving
Terence James Smith
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Novartis AG
Original Assignee
Ciba Geigy AG
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from GB838302160A external-priority patent/GB8302160D0/en
Priority claimed from GB838323448A external-priority patent/GB8323448D0/en
Application filed by Ciba Geigy AG filed Critical Ciba Geigy AG
Application granted granted Critical
Publication of DE3469324D1 publication Critical patent/DE3469324D1/de
Expired legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable
DE8484810037T 1983-01-26 1984-01-20 Image-forming process Expired DE3469324D1 (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
GB838302160A GB8302160D0 (en) 1983-01-26 1983-01-26 Production of images
GB838323448A GB8323448D0 (en) 1983-09-01 1983-09-01 Production of images

Publications (1)

Publication Number Publication Date
DE3469324D1 true DE3469324D1 (en) 1988-03-17

Family

ID=26285031

Family Applications (1)

Application Number Title Priority Date Filing Date
DE8484810037T Expired DE3469324D1 (en) 1983-01-26 1984-01-20 Image-forming process

Country Status (6)

Country Link
US (1) US4546067A (de)
EP (1) EP0115471B1 (de)
CA (1) CA1212856A (de)
DE (1) DE3469324D1 (de)
ES (1) ES8407599A1 (de)
HK (1) HK70190A (de)

Families Citing this family (17)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB8402937D0 (en) * 1984-02-03 1984-03-07 Ciba Geigy Ag Production of images
US5194365A (en) * 1985-06-19 1993-03-16 Ciba-Geigy Corporation Method for forming images
CH678897A5 (de) * 1986-05-10 1991-11-15 Ciba Geigy Ag
GB8822145D0 (en) * 1988-09-21 1988-10-26 Ciba Geigy Ag Method
US5747223A (en) * 1988-12-30 1998-05-05 International Business Machines Corporation Composition for photoimaging
US6180317B1 (en) 1988-12-30 2001-01-30 International Business Machines Corporation Composition for photoimaging
US5026624A (en) * 1989-03-03 1991-06-25 International Business Machines Corporation Composition for photo imaging
US5264325A (en) * 1988-12-30 1993-11-23 International Business Machines Corporation Composition for photo imaging
US5439766A (en) * 1988-12-30 1995-08-08 International Business Machines Corporation Composition for photo imaging
US5304457A (en) * 1989-03-03 1994-04-19 International Business Machines Corporation Composition for photo imaging
US5426164A (en) * 1992-12-24 1995-06-20 The Dow Chemical Company Photodefinable polymers containing perfluorocyclobutane groups
US5439779A (en) * 1993-02-22 1995-08-08 International Business Machines Corporation Aqueous soldermask
ATE203553T1 (de) * 1996-03-22 2001-08-15 Vantico Ag Einkomponentenepoxidharz verarbeitungsmaterial
KR19980048361A (ko) * 1996-12-17 1998-09-15 손욱 광배향성 조성물, 이로부터 형성되는 배향막과 이 배향막을 구비한 액정표시소자
US8232092B2 (en) * 2005-08-09 2012-07-31 Maxwell Sensors, Inc. Apparatus and method for digital magnetic beads analysis
US7858307B2 (en) * 2005-08-09 2010-12-28 Maxwell Sensors, Inc. Light transmitted assay beads
WO2010042745A1 (en) * 2008-10-08 2010-04-15 Applied Biocode Inc. Biocompatible and photocurable polymers

Family Cites Families (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
NL283978A (de) * 1961-10-05 1900-01-01
DE1572061C3 (de) * 1966-01-07 1974-11-07 Kalle Ag, 6202 Wiesbaden-Biebrich Lichtempfindliche Kopierschicht
DE1572062C3 (de) * 1966-01-07 1974-11-07 Kalle Ag, 6202 Wiesbaden-Biebrich Lichtempfindliche Kopierschicht
DE1595581A1 (de) * 1966-01-07 1970-04-30 Hoechst Ag Verfahren zur Herstellung von Polyaethern
NL6809002A (de) * 1967-07-06 1969-01-08
GB1346768A (en) * 1970-08-11 1974-02-13 Ciba Geigy Uk Ltd Curable epoxide resin compositions
US3726679A (en) * 1971-06-30 1973-04-10 Ibm Light sensitive epoxy formulation
GB1512814A (en) * 1975-08-13 1978-06-01 Ciba Geigy Ag Epoxide resins
US4291118A (en) * 1979-12-26 1981-09-22 W. R. Grace & Co. Relief imaging liquids

Also Published As

Publication number Publication date
EP0115471A2 (de) 1984-08-08
US4546067A (en) 1985-10-08
ES529130A0 (es) 1984-10-01
EP0115471A3 (en) 1985-08-21
HK70190A (en) 1990-09-14
EP0115471B1 (de) 1988-02-10
CA1212856A (en) 1986-10-21
ES8407599A1 (es) 1984-10-01

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Legal Events

Date Code Title Description
8364 No opposition during term of opposition
8339 Ceased/non-payment of the annual fee