DE3372383D1 - Method for growing gaas single crystal by using floating zone - Google Patents
Method for growing gaas single crystal by using floating zoneInfo
- Publication number
- DE3372383D1 DE3372383D1 DE8383108312T DE3372383T DE3372383D1 DE 3372383 D1 DE3372383 D1 DE 3372383D1 DE 8383108312 T DE8383108312 T DE 8383108312T DE 3372383 T DE3372383 T DE 3372383T DE 3372383 D1 DE3372383 D1 DE 3372383D1
- Authority
- DE
- Germany
- Prior art keywords
- single crystal
- gaas single
- floating zone
- growing gaas
- growing
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C30—CRYSTAL GROWTH
- C30B—SINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
- C30B13/00—Single-crystal growth by zone-melting; Refining by zone-melting
- C30B13/16—Heating of the molten zone
- C30B13/20—Heating of the molten zone by induction, e.g. hot wire technique
-
- C—CHEMISTRY; METALLURGY
- C30—CRYSTAL GROWTH
- C30B—SINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
- C30B13/00—Single-crystal growth by zone-melting; Refining by zone-melting
-
- C—CHEMISTRY; METALLURGY
- C30—CRYSTAL GROWTH
- C30B—SINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
- C30B13/00—Single-crystal growth by zone-melting; Refining by zone-melting
- C30B13/08—Single-crystal growth by zone-melting; Refining by zone-melting adding crystallising materials or reactants forming it in situ to the molten zone
-
- C—CHEMISTRY; METALLURGY
- C30—CRYSTAL GROWTH
- C30B—SINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
- C30B29/00—Single crystals or homogeneous polycrystalline material with defined structure characterised by the material or by their shape
- C30B29/10—Inorganic compounds or compositions
- C30B29/40—AIIIBV compounds wherein A is B, Al, Ga, In or Tl and B is N, P, As, Sb or Bi
- C30B29/42—Gallium arsenide
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T117/00—Single-crystal, oriented-crystal, and epitaxy growth processes; non-coating apparatus therefor
- Y10T117/10—Apparatus
- Y10T117/1004—Apparatus with means for measuring, testing, or sensing
- Y10T117/1008—Apparatus with means for measuring, testing, or sensing with responsive control means
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T117/00—Single-crystal, oriented-crystal, and epitaxy growth processes; non-coating apparatus therefor
- Y10T117/10—Apparatus
- Y10T117/1024—Apparatus for crystallization from liquid or supercritical state
- Y10T117/1076—Apparatus for crystallization from liquid or supercritical state having means for producing a moving solid-liquid-solid zone
- Y10T117/1088—Apparatus for crystallization from liquid or supercritical state having means for producing a moving solid-liquid-solid zone including heating or cooling details
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP57149747A JPS6041036B2 (ja) | 1982-08-27 | 1982-08-27 | GaAs浮遊帯融解草結晶製造装置 |
Publications (1)
Publication Number | Publication Date |
---|---|
DE3372383D1 true DE3372383D1 (en) | 1987-08-13 |
Family
ID=15481886
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
DE8383108312T Expired DE3372383D1 (en) | 1982-08-27 | 1983-08-24 | Method for growing gaas single crystal by using floating zone |
Country Status (5)
Country | Link |
---|---|
US (1) | US4619811A (de) |
EP (1) | EP0102054B1 (de) |
JP (1) | JPS6041036B2 (de) |
CA (1) | CA1228525A (de) |
DE (1) | DE3372383D1 (de) |
Families Citing this family (9)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS6345198A (ja) * | 1986-04-23 | 1988-02-26 | Sumitomo Electric Ind Ltd | 多元系結晶の製造方法 |
JPH0696478B2 (ja) * | 1989-01-26 | 1994-11-30 | 科学技術庁無機材質研究所長 | 単結晶自動育成法 |
JPH0729874B2 (ja) * | 1989-11-04 | 1995-04-05 | コマツ電子金属株式会社 | 多結晶シリコン製造装置の芯線間接続用ブリッジ |
JP2002005745A (ja) * | 2000-06-26 | 2002-01-09 | Nec Corp | 温度測定装置、および温度測定方法 |
CN107223168B (zh) * | 2015-02-05 | 2019-11-05 | 美国陶氏有机硅公司 | 用于宽能带隙晶体的种晶升华的炉 |
JP5926432B1 (ja) * | 2015-10-01 | 2016-05-25 | 伸 阿久津 | 単結晶製造装置および単結晶製造方法 |
CN211999987U (zh) * | 2020-04-17 | 2020-11-24 | 中国电子科技南湖研究院 | 一种制备大尺寸单晶的装置 |
JP2023524962A (ja) | 2020-05-06 | 2023-06-14 | 眉山博雅新材料股▲ふん▼有限公司 | 結晶の製造装置及び成長方法 |
CN111254486A (zh) * | 2020-05-06 | 2020-06-09 | 眉山博雅新材料有限公司 | 一种晶体制备装置 |
Family Cites Families (17)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE1212495B (de) * | 1955-07-28 | 1966-03-17 | Siemens Ag | Vorrichtung zum tiegellosen Zonenschmelzen von Halbleiterstaeben und Verfahren zu deren Betrieb |
US2897329A (en) * | 1957-09-23 | 1959-07-28 | Sylvania Electric Prod | Zone melting apparatus |
US2905798A (en) * | 1958-09-15 | 1959-09-22 | Lindberg Eng Co | Induction heating apparatus |
US3136876A (en) * | 1960-10-26 | 1964-06-09 | Clevite Corp | Indicator and control system |
FR1277869A (fr) * | 1961-01-23 | 1961-12-01 | Raytheon Co | Procédé pour chauffer de la matière fondue et la maintenir suspendue sans contact étranger |
BE626374A (de) * | 1961-12-22 | |||
FR1370638A (fr) * | 1963-05-22 | 1964-08-28 | Siemens Ag | Procédé pour l'affinage d'arséniure de gallium et dispositif pour la mise en oeuvre de ce procédé |
US3260573A (en) * | 1963-06-26 | 1966-07-12 | Siemens Ag | Zone melting gallium in a recycling arsenic atmosphere |
US3446602A (en) * | 1965-11-13 | 1969-05-27 | Nippon Electric Co | Flame fusion crystal growing employing vertically displaceable pedestal responsive to temperature |
DE1519902C3 (de) * | 1966-09-24 | 1975-07-10 | Siemens Ag, 1000 Berlin Und 8000 Muenchen | Vorrichtung zum tiegelfreien Zonenschmelzen eines kristallinen Stabes, insbesondere Halbleiterstabes |
US3642443A (en) * | 1968-08-19 | 1972-02-15 | Ibm | Group iii{14 v semiconductor twinned crystals and their preparation by solution growth |
US3857990A (en) * | 1972-04-06 | 1974-12-31 | Massachusetts Inst Technology | Heat pipe furnace |
US4190486A (en) * | 1973-10-04 | 1980-02-26 | Hughes Aircraft Company | Method for obtaining optically clear, high resistivity II-VI, III-V, and IV-VI compounds by heat treatment |
US3936346A (en) * | 1973-12-26 | 1976-02-03 | Texas Instruments Incorporated | Crystal growth combining float zone technique with the water cooled RF container method |
JPS5122883A (en) * | 1974-08-20 | 1976-02-23 | Mitsubishi Chem Ind | Ll22 amino 44 kuroro 44 pentensanno seizoho |
DE3007394A1 (de) * | 1980-02-27 | 1981-09-03 | Siemens AG, 1000 Berlin und 8000 München | Verfahren und vorrichtung zum tiegelfreien zonenschmelzen eines siliciumstabes |
DE3007377A1 (de) * | 1980-02-27 | 1981-09-03 | Siemens AG, 1000 Berlin und 8000 München | Verfahren und vorrichtung zum tiegelfreien zonenschmelzen eines siliciumstabes |
-
1982
- 1982-08-27 JP JP57149747A patent/JPS6041036B2/ja not_active Expired
-
1983
- 1983-08-18 CA CA000434887A patent/CA1228525A/en not_active Expired
- 1983-08-24 EP EP83108312A patent/EP0102054B1/de not_active Expired
- 1983-08-24 DE DE8383108312T patent/DE3372383D1/de not_active Expired
-
1985
- 1985-09-17 US US06/777,004 patent/US4619811A/en not_active Expired - Lifetime
Also Published As
Publication number | Publication date |
---|---|
CA1228525A (en) | 1987-10-27 |
EP0102054B1 (de) | 1987-07-08 |
JPS6041036B2 (ja) | 1985-09-13 |
EP0102054A1 (de) | 1984-03-07 |
JPS5939797A (ja) | 1984-03-05 |
US4619811A (en) | 1986-10-28 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
8364 | No opposition during term of opposition |