DE3265338D1 - Semiconductor laser having at least two radiation beams, and method of manufacturing same - Google Patents
Semiconductor laser having at least two radiation beams, and method of manufacturing sameInfo
- Publication number
- DE3265338D1 DE3265338D1 DE8282200293T DE3265338T DE3265338D1 DE 3265338 D1 DE3265338 D1 DE 3265338D1 DE 8282200293 T DE8282200293 T DE 8282200293T DE 3265338 T DE3265338 T DE 3265338T DE 3265338 D1 DE3265338 D1 DE 3265338D1
- Authority
- DE
- Germany
- Prior art keywords
- semiconductor laser
- manufacturing same
- radiation beams
- beams
- radiation
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S5/00—Semiconductor lasers
- H01S5/40—Arrangement of two or more semiconductor lasers, not provided for in groups H01S5/02 - H01S5/30
- H01S5/4025—Array arrangements, e.g. constituted by discrete laser diodes or laser bar
- H01S5/4031—Edge-emitting structures
- H01S5/4043—Edge-emitting structures with vertically stacked active layers
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
NL8101409A NL8101409A (nl) | 1981-03-23 | 1981-03-23 | Halfgeleiderlaser met tenminste twee stralingsbundels, en werkwijze ter vervaardiging daarvan. |
Publications (1)
Publication Number | Publication Date |
---|---|
DE3265338D1 true DE3265338D1 (en) | 1985-09-19 |
Family
ID=19837208
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
DE8282200293T Expired DE3265338D1 (en) | 1981-03-23 | 1982-03-08 | Semiconductor laser having at least two radiation beams, and method of manufacturing same |
Country Status (7)
Country | Link |
---|---|
US (1) | US4476563A (de) |
EP (1) | EP0061220B1 (de) |
JP (1) | JPS57169291A (de) |
CA (1) | CA1173549A (de) |
DE (1) | DE3265338D1 (de) |
IE (1) | IE53373B1 (de) |
NL (1) | NL8101409A (de) |
Families Citing this family (27)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
NL8104068A (nl) * | 1981-09-02 | 1983-04-05 | Philips Nv | Halfgeleiderlaser. |
NL8200414A (nl) * | 1982-02-04 | 1983-09-01 | Philips Nv | Halfgeleiderinrichting voor het opwekken van ten minste twee stralingsbundels, en werkwijze ter vervaardiging daarvan. |
FR2525033B1 (fr) * | 1982-04-08 | 1986-01-17 | Bouadma Noureddine | Laser a semi-conducteur a plusieurs longueurs d'onde independantes et son procede de realisation |
US4517667A (en) * | 1982-06-10 | 1985-05-14 | Xerox Corporation | Direct read after write optical disk system |
US4603421A (en) * | 1982-11-24 | 1986-07-29 | Xerox Corporation | Incoherent composite multi-emitter laser for an optical arrangement |
JPS59123289A (ja) * | 1982-12-28 | 1984-07-17 | Matsushita Electric Ind Co Ltd | 半導体レ−ザアレイ装置 |
US4637122A (en) * | 1983-09-19 | 1987-01-20 | Honeywell Inc. | Integrated quantum well lasers for wavelength division multiplexing |
JPS6167286A (ja) * | 1984-09-07 | 1986-04-07 | Sharp Corp | 半導体レ−ザアレイ素子 |
US4605942A (en) * | 1984-10-09 | 1986-08-12 | At&T Bell Laboratories | Multiple wavelength light emitting devices |
US4747110A (en) * | 1985-02-13 | 1988-05-24 | Matsushita Electric Industrial Co., Ltd. | Semiconductor laser device capable of emitting laser beams of different wavelengths |
US4740978A (en) * | 1985-03-14 | 1988-04-26 | Max-Planck-Gesellschaft Zur Foerderung Der Wissenschaften E.V. | Integrated quantum well lasers having uniform thickness lasing regions for wavelength multiplexing |
JPS61287289A (ja) * | 1985-06-14 | 1986-12-17 | Sharp Corp | 光メモリ用半導体レ−ザ装置 |
JPS6395682A (ja) * | 1986-10-09 | 1988-04-26 | Mitsubishi Electric Corp | 端面発光素子 |
FR2605801B1 (fr) * | 1986-10-23 | 1989-03-03 | Menigaux Louis | Procede de fabrication d'une structure semi-conductrice susceptible d'effet laser multi-longueurs d'onde, et dispositif obtenu |
US4843031A (en) * | 1987-03-17 | 1989-06-27 | Matsushita Electric Industrial Co., Ltd. | Method of fabricating compound semiconductor laser using selective irradiation |
JPH0620154B2 (ja) * | 1988-03-05 | 1994-03-16 | 鐘淵化学工業株式会社 | 半導体装置の製法 |
JP2686764B2 (ja) * | 1988-03-11 | 1997-12-08 | 国際電信電話株式会社 | 光半導体素子の製造方法 |
US5038185A (en) * | 1989-11-30 | 1991-08-06 | Xerox Corporation | Structurally consistent surface skimming hetero-transverse junction lasers and lateral heterojunction bipolar transistors |
US5048040A (en) * | 1990-03-08 | 1991-09-10 | Xerox Corporation | Multiple wavelength p-n junction semiconductor laser with separated waveguides |
US5071786A (en) * | 1990-03-08 | 1991-12-10 | Xerox Corporation | Method of making multiple wavelength p-n junction semiconductor laser with separated waveguides |
FR2684237B1 (fr) * | 1991-11-22 | 1993-12-24 | Thomson Hybrides | Circuit integre de lasers semiconducteurs et procede de realisation de ce circuit. |
JPH0696468A (ja) * | 1992-09-14 | 1994-04-08 | Canon Inc | 光記録再生装置及び半導体レーザアレイ |
US5319655A (en) * | 1992-12-21 | 1994-06-07 | Xerox Corporation | Multiwavelength laterally-injecting-type lasers |
JP2004328011A (ja) * | 1998-12-22 | 2004-11-18 | Sony Corp | 半導体発光装置の製造方法 |
JP4821829B2 (ja) * | 1998-12-22 | 2011-11-24 | ソニー株式会社 | 半導体発光装置の製造方法 |
KR100988083B1 (ko) * | 2003-06-03 | 2010-10-18 | 삼성전자주식회사 | 반도체 레이저 소자 |
US7310358B2 (en) * | 2004-12-17 | 2007-12-18 | Palo Alto Research Center Incorporated | Semiconductor lasers |
Family Cites Families (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5751276B2 (de) * | 1973-10-23 | 1982-11-01 | ||
US4326176A (en) * | 1976-04-16 | 1982-04-20 | Hitachi, Ltd. | Semiconductor laser device |
US4199385A (en) * | 1977-09-21 | 1980-04-22 | International Business Machines Corporation | Method of making an optically isolated monolithic light emitting diode array utilizing epitaxial deposition of graded layers and selective diffusion |
US4185256A (en) * | 1978-01-13 | 1980-01-22 | Xerox Corporation | Mode control of heterojunction injection lasers and method of fabrication |
JPS54107689A (en) * | 1978-02-10 | 1979-08-23 | Nec Corp | Semiconductor laser element |
JPS55165691A (en) * | 1979-06-13 | 1980-12-24 | Nec Corp | Compound semiconductor laser element |
US4280108A (en) * | 1979-07-12 | 1981-07-21 | Xerox Corporation | Transverse junction array laser |
-
1981
- 1981-03-23 NL NL8101409A patent/NL8101409A/nl not_active Application Discontinuation
-
1982
- 1982-02-25 US US06/352,502 patent/US4476563A/en not_active Expired - Fee Related
- 1982-03-08 DE DE8282200293T patent/DE3265338D1/de not_active Expired
- 1982-03-08 EP EP82200293A patent/EP0061220B1/de not_active Expired
- 1982-03-18 CA CA000398701A patent/CA1173549A/en not_active Expired
- 1982-03-22 IE IE653/82A patent/IE53373B1/en unknown
- 1982-03-23 JP JP57046139A patent/JPS57169291A/ja active Pending
Also Published As
Publication number | Publication date |
---|---|
IE53373B1 (en) | 1988-10-26 |
NL8101409A (nl) | 1982-10-18 |
EP0061220B1 (de) | 1985-08-14 |
CA1173549A (en) | 1984-08-28 |
JPS57169291A (en) | 1982-10-18 |
EP0061220A1 (de) | 1982-09-29 |
IE820653L (en) | 1982-09-23 |
US4476563A (en) | 1984-10-09 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
8364 | No opposition during term of opposition | ||
8339 | Ceased/non-payment of the annual fee |