DE3167592D1 - Negative-working resists for recording high-energy radiation - Google Patents

Negative-working resists for recording high-energy radiation

Info

Publication number
DE3167592D1
DE3167592D1 DE8181104939T DE3167592T DE3167592D1 DE 3167592 D1 DE3167592 D1 DE 3167592D1 DE 8181104939 T DE8181104939 T DE 8181104939T DE 3167592 T DE3167592 T DE 3167592T DE 3167592 D1 DE3167592 D1 DE 3167592D1
Authority
DE
Germany
Prior art keywords
negative
energy radiation
recording high
working resists
resists
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
DE8181104939T
Other languages
English (en)
Inventor
Zoilo Cheng Ho Tan
Frederick Joseph Rauner
Constantine Chris Petropoulos
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Eastman Kodak Co
Original Assignee
Eastman Kodak Co
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Eastman Kodak Co filed Critical Eastman Kodak Co
Application granted granted Critical
Publication of DE3167592D1 publication Critical patent/DE3167592D1/de
Expired legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable
    • G03F7/0388—Macromolecular compounds which are rendered insoluble or differentially wettable with ethylenic or acetylenic bands in the side chains of the photopolymer
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F220/00—Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical or a salt, anhydride ester, amide, imide or nitrile thereof
    • C08F220/02—Monocarboxylic acids having less than ten carbon atoms; Derivatives thereof
    • C08F220/10—Esters
    • C08F220/12—Esters of monohydric alcohols or phenols
    • C08F220/16—Esters of monohydric alcohols or phenols of phenols or of alcohols containing two or more carbon atoms
    • C08F220/18—Esters of monohydric alcohols or phenols of phenols or of alcohols containing two or more carbon atoms with acrylic or methacrylic acids
    • C08F220/1803—C3-(meth)acrylate, e.g. (iso)propyl (meth)acrylate
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F220/00—Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical or a salt, anhydride ester, amide, imide or nitrile thereof
    • C08F220/02—Monocarboxylic acids having less than ten carbon atoms; Derivatives thereof
    • C08F220/10—Esters
    • C08F220/12—Esters of monohydric alcohols or phenols
    • C08F220/16—Esters of monohydric alcohols or phenols of phenols or of alcohols containing two or more carbon atoms
    • C08F220/18—Esters of monohydric alcohols or phenols of phenols or of alcohols containing two or more carbon atoms with acrylic or methacrylic acids
    • C08F220/1804—C4-(meth)acrylate, e.g. butyl (meth)acrylate, isobutyl (meth)acrylate or tert-butyl (meth)acrylate
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F220/00—Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical or a salt, anhydride ester, amide, imide or nitrile thereof
    • C08F220/02—Monocarboxylic acids having less than ten carbon atoms; Derivatives thereof
    • C08F220/10—Esters
    • C08F220/12—Esters of monohydric alcohols or phenols
    • C08F220/16—Esters of monohydric alcohols or phenols of phenols or of alcohols containing two or more carbon atoms
    • C08F220/18—Esters of monohydric alcohols or phenols of phenols or of alcohols containing two or more carbon atoms with acrylic or methacrylic acids
    • C08F220/1807—C7-(meth)acrylate, e.g. heptyl (meth)acrylate or benzyl (meth)acrylate
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F220/00—Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical or a salt, anhydride ester, amide, imide or nitrile thereof
    • C08F220/02—Monocarboxylic acids having less than ten carbon atoms; Derivatives thereof
    • C08F220/10—Esters
    • C08F220/40—Esters of unsaturated alcohols, e.g. allyl (meth)acrylate
DE8181104939T 1980-06-27 1981-06-26 Negative-working resists for recording high-energy radiation Expired DE3167592D1 (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US06/163,470 US4289842A (en) 1980-06-27 1980-06-27 Negative-working polymers useful as electron beam resists

Publications (1)

Publication Number Publication Date
DE3167592D1 true DE3167592D1 (en) 1985-01-17

Family

ID=22590152

Family Applications (1)

Application Number Title Priority Date Filing Date
DE8181104939T Expired DE3167592D1 (en) 1980-06-27 1981-06-26 Negative-working resists for recording high-energy radiation

Country Status (5)

Country Link
US (1) US4289842A (de)
EP (1) EP0043116B1 (de)
JP (1) JPS5752050A (de)
CA (1) CA1161192A (de)
DE (1) DE3167592D1 (de)

Families Citing this family (15)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5120634A (en) * 1982-08-25 1992-06-09 Fujitsu Limited Method for forming patterned resist layer on semiconductor body
JPS5946643A (ja) * 1982-09-09 1984-03-16 Fuji Photo Film Co Ltd 感光性平版印刷版
CA1225789A (en) * 1983-02-15 1987-08-18 Zoilo C. Tan Electron-beam and x-ray sensitive polymers and resists
DE3333861A1 (de) * 1983-09-20 1985-04-04 Max-Planck-Gesellschaft zur Förderung der Wissenschaften e.V., 3400 Göttingen Strahlungsempfindliches polymermaterial
JPS6057331U (ja) * 1983-09-27 1985-04-22 三晃装設工業株式会社 ダクトレス焼肉テ−ブル
US4571375A (en) * 1983-10-24 1986-02-18 Benedikt George M Ring-opened polynorbornene negative photoresist with bisazide
JPS6131327U (ja) * 1984-07-30 1986-02-25 株式会社 桜 焼肉器
JPS61240032A (ja) * 1985-04-18 1986-10-25 Daito:Kk ガスクツキングテ−ブル
DE3684745D1 (de) * 1985-08-29 1992-05-14 Du Pont Photopolymerisierbare zusammensetzung mit dizyklopentylacrylat oder methacrylat enthaltenden acrylcopolymeren.
US4696990A (en) * 1986-03-31 1987-09-29 Eastman Kodak Company Novel photocrosslinkable liquid crystalline polymers
US4743531A (en) * 1986-11-21 1988-05-10 Eastman Kodak Company Dye sensitized photographic imaging system
US4795692A (en) * 1987-02-02 1989-01-03 Eastman Kodak Company Negative-working polymers useful as X-ray or E-beam resists
US4859572A (en) * 1988-05-02 1989-08-22 Eastman Kodak Company Dye sensitized photographic imaging system
GB9406815D0 (en) * 1994-04-06 1994-05-25 Ici Plc Polymer
JP7370341B2 (ja) * 2018-12-26 2023-10-27 株式会社クラレ 塗工性に優れる組成物

Family Cites Families (15)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US2202846A (en) * 1936-05-02 1940-06-04 Goodrich Co B F Copolymers of polyallyl esters and polymerizable unsaturated compounds
US3376138A (en) * 1963-12-09 1968-04-02 Gilano Michael Nicholas Photosensitive prepolymer composition and method
GB1248569A (en) * 1967-12-04 1971-10-06 Agfa Gevaert Photopolymerisation of ethylenically unsaturated organic compounds
GB1263294A (en) * 1968-01-15 1972-02-09 Union Carbide Corp Radiation-convertible polymers
US3501445A (en) * 1968-02-28 1970-03-17 Celanese Corp Polyacrylate thickeners and copolymers used to produce same
US3556793A (en) * 1968-05-22 1971-01-19 Gaf Corp Novel substituted allyl polymer derivatives useful as photoresists
US3894163A (en) * 1971-03-08 1975-07-08 Western Electric Co Additives to negative photoresists which increase the sensitivity thereof
US3813264A (en) * 1972-03-22 1974-05-28 Calgon Corp Electroconductive paper
IT989772B (it) 1972-10-06 1975-06-10 Ford Motor Co Materiale di rivestimento induribi le mediante irradiamento e metodo per la sua applicazione
JPS5319205B2 (de) 1973-03-27 1978-06-20
JPS576578B2 (de) * 1973-11-05 1982-02-05
JPS5242083B2 (de) * 1974-02-20 1977-10-22
US4123276A (en) * 1974-02-28 1978-10-31 Fuji Photo Film Co., Ltd. Photosensitive composition
DE2547792C3 (de) * 1974-10-25 1978-08-31 Hitachi, Ltd., Tokio Verfahren zur Herstellung eines Halbleiterbauelementes
US4054233A (en) * 1976-05-05 1977-10-18 Eastman Kodak Company Fluid container for photographic processing material

Also Published As

Publication number Publication date
EP0043116A2 (de) 1982-01-06
JPS5752050A (en) 1982-03-27
CA1161192A (en) 1984-01-24
JPS6248819B2 (de) 1987-10-15
US4289842A (en) 1981-09-15
EP0043116B1 (de) 1984-12-05
EP0043116A3 (en) 1982-06-09

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Legal Events

Date Code Title Description
8339 Ceased/non-payment of the annual fee