DE3061890D1 - Polymerisable compositions containing sulphoxonium salts and process for the production of high molecular weight products from these compositions by irradiation - Google Patents

Polymerisable compositions containing sulphoxonium salts and process for the production of high molecular weight products from these compositions by irradiation

Info

Publication number
DE3061890D1
DE3061890D1 DE8080810203T DE3061890T DE3061890D1 DE 3061890 D1 DE3061890 D1 DE 3061890D1 DE 8080810203 T DE8080810203 T DE 8080810203T DE 3061890 T DE3061890 T DE 3061890T DE 3061890 D1 DE3061890 D1 DE 3061890D1
Authority
DE
Germany
Prior art keywords
compositions
irradiation
production
molecular weight
high molecular
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
DE8080810203T
Other languages
English (en)
Inventor
George Edward Dr Green
Edward Dr Irving
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
BASF Schweiz AG
Original Assignee
Ciba Geigy AG
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Ciba Geigy AG filed Critical Ciba Geigy AG
Application granted granted Critical
Publication of DE3061890D1 publication Critical patent/DE3061890D1/de
Expired legal-status Critical Current

Links

Classifications

    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08GMACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G8/00Condensation polymers of aldehydes or ketones with phenols only
    • C08G8/28Chemically modified polycondensates
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08GMACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G59/00Polycondensates containing more than one epoxy group per molecule; Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups
    • C08G59/18Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups ; e.g. general methods of curing
    • C08G59/68Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups ; e.g. general methods of curing characterised by the catalysts used
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08GMACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G85/00General processes for preparing compounds provided for in this subclass
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08KUse of inorganic or non-macromolecular organic substances as compounding ingredients
    • C08K5/00Use of organic ingredients
    • C08K5/36Sulfur-, selenium-, or tellurium-containing compounds
    • C08K5/41Compounds containing sulfur bound to oxygen
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004Photosensitive materials
    • G03F7/027Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/028Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
    • G03F7/029Inorganic compounds; Onium compounds; Organic compounds having hetero atoms other than oxygen, nitrogen or sulfur
DE8080810203T 1979-06-19 1980-06-17 Polymerisable compositions containing sulphoxonium salts and process for the production of high molecular weight products from these compositions by irradiation Expired DE3061890D1 (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
GB7921380 1979-06-19
GB8006626 1980-02-27

Publications (1)

Publication Number Publication Date
DE3061890D1 true DE3061890D1 (en) 1983-03-17

Family

ID=26271901

Family Applications (1)

Application Number Title Priority Date Filing Date
DE8080810203T Expired DE3061890D1 (en) 1979-06-19 1980-06-17 Polymerisable compositions containing sulphoxonium salts and process for the production of high molecular weight products from these compositions by irradiation

Country Status (5)

Country Link
US (1) US4299938A (de)
EP (1) EP0022081B1 (de)
CA (1) CA1134537A (de)
DE (1) DE3061890D1 (de)
ES (1) ES492540A0 (de)

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DE3620254C2 (de) * 1985-06-18 1994-05-05 Canon Kk Durch Strahlen mit wirksamer Energie härtbare Harzmischung
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DE3621477A1 (de) * 1985-06-26 1987-01-08 Canon Kk Durch strahlen mit wirksamer energie haertbare harzmischung
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US4849320A (en) * 1986-05-10 1989-07-18 Ciba-Geigy Corporation Method of forming images
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US4857437A (en) * 1986-12-17 1989-08-15 Ciba-Geigy Corporation Process for the formation of an image
GB2241194B (en) * 1990-02-06 1994-07-27 Honda Motor Co Ltd Method for molding fiber-reinforced resin
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US6528235B2 (en) 1991-11-15 2003-03-04 Shipley Company, L.L.C. Antihalation compositions
US6472128B2 (en) 1996-04-30 2002-10-29 Shipley Company, L.L.C. Antihalation compositions
US6773864B1 (en) 1991-11-15 2004-08-10 Shipley Company, L.L.C. Antihalation compositions
US6165697A (en) 1991-11-15 2000-12-26 Shipley Company, L.L.C. Antihalation compositions
DE4217688A1 (de) * 1992-05-29 1993-12-02 Basf Lacke & Farben Durch Einwirkung von Strahlung vernetzendes Gemisch und dessen Verwendung zur Herstellung hochtemperaturbeständiger Reliefstrukturen
US6824879B2 (en) 1999-06-10 2004-11-30 Honeywell International Inc. Spin-on-glass anti-reflective coatings for photolithography
EP1190277B1 (de) 1999-06-10 2009-10-07 AlliedSignal Inc. Spin-on-glass antireflektionsbeschichtungen aufweisender halbleiter für photolithographie
GB9921779D0 (en) * 1999-09-16 1999-11-17 Ciba Sc Holding Ag UV-Curable compositions
JP2001089639A (ja) * 1999-09-24 2001-04-03 Mitsubishi Heavy Ind Ltd エネルギー線硬化樹脂組成物
CA2412574A1 (en) * 2000-07-11 2002-01-17 Zhi Xin Li High functional polymers
JP2003105077A (ja) * 2001-09-28 2003-04-09 Brother Ind Ltd 活性エネルギー線硬化型組成物、それを含有するインク及びそのインクを使用するプリンタ
US20030218269A1 (en) * 2001-09-28 2003-11-27 Brother Kogyo Kabushiki Kaisha Image-receiving layer composition and overcoat layer composition for ink-jet recording
KR20040075866A (ko) 2001-11-15 2004-08-30 허니웰 인터내셔날 인코포레이티드 포토리소그래피용 스핀-온 무반사 코팅
JP2003212965A (ja) * 2002-01-28 2003-07-30 Brother Ind Ltd 活性エネルギー線硬化型組成物
DE10227807A1 (de) * 2002-06-21 2004-01-22 Honeywell Specialty Chemicals Seelze Gmbh Silylalkylester von Anthracen- und Phenanthrencarbonsäuren
WO2005041255A2 (en) 2003-08-04 2005-05-06 Honeywell International, Inc. Coating composition optimization for via fill and photolithography applications and methods of preparation thereof
US8053159B2 (en) 2003-11-18 2011-11-08 Honeywell International Inc. Antireflective coatings for via fill and photolithography applications and methods of preparation thereof
JP4585234B2 (ja) * 2003-11-19 2010-11-24 パナソニック株式会社 プラズマディスプレイパネルの再生方法
JP2007523974A (ja) * 2004-01-27 2007-08-23 チバ スペシャルティ ケミカルズ ホールディング インコーポレーテッド 熱安定性のカチオン光硬化性組成物
US7014895B1 (en) 2004-11-17 2006-03-21 Illinois Tool Works, Inc. Ultraviolet (UV) post cure heat transfer label, method of making and using same
US8642246B2 (en) 2007-02-26 2014-02-04 Honeywell International Inc. Compositions, coatings and films for tri-layer patterning applications and methods of preparation thereof
US7955782B2 (en) * 2008-09-22 2011-06-07 Honeywell International Inc. Bottom antireflective coatings exhibiting enhanced wet strip rates, bottom antireflective coating compositions for forming bottom antireflective coatings, and methods for fabricating the same
US8557877B2 (en) 2009-06-10 2013-10-15 Honeywell International Inc. Anti-reflective coatings for optically transparent substrates
US9310676B2 (en) 2009-08-21 2016-04-12 Basf Se Apparatus and method for a sub microscopic and optically variable image carrying device
KR101813298B1 (ko) 2010-02-24 2017-12-28 바스프 에스이 잠재성 산 및 그의 용도
US8864898B2 (en) 2011-05-31 2014-10-21 Honeywell International Inc. Coating formulations for optical elements
US9994538B2 (en) 2015-02-02 2018-06-12 Basf Se Latent acids and their use
JP6803842B2 (ja) 2015-04-13 2020-12-23 ハネウェル・インターナショナル・インコーポレーテッドHoneywell International Inc. オプトエレクトロニクス用途のためのポリシロキサン製剤及びコーティング
US10662281B2 (en) * 2015-09-25 2020-05-26 Cytec Industrial Materials (Derby) Limited Composite panel material
WO2021124114A1 (en) 2019-12-18 2021-06-24 3M Innovative Properties Company Composition including unsaturated polyester resin, epoxy resin, and photoinitiator and method of using the same

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Also Published As

Publication number Publication date
EP0022081B1 (de) 1983-02-09
EP0022081A1 (de) 1981-01-07
US4299938A (en) 1981-11-10
ES8105343A1 (es) 1981-06-01
CA1134537A (en) 1982-10-26
ES492540A0 (es) 1981-06-01

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Legal Events

Date Code Title Description
8327 Change in the person/name/address of the patent owner

Owner name: CIBA SPECIALTY CHEMICALS HOLDING INC., BASEL, CH

8339 Ceased/non-payment of the annual fee