DE2862036D1 - Metal glas film - Google Patents
Metal glas filmInfo
- Publication number
- DE2862036D1 DE2862036D1 DE7878101634T DE2862036T DE2862036D1 DE 2862036 D1 DE2862036 D1 DE 2862036D1 DE 7878101634 T DE7878101634 T DE 7878101634T DE 2862036 T DE2862036 T DE 2862036T DE 2862036 D1 DE2862036 D1 DE 2862036D1
- Authority
- DE
- Germany
- Prior art keywords
- glass film
- metal glass
- metal
- film
- glass
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C22—METALLURGY; FERROUS OR NON-FERROUS ALLOYS; TREATMENT OF ALLOYS OR NON-FERROUS METALS
- C22C—ALLOYS
- C22C45/00—Amorphous alloys
- C22C45/04—Amorphous alloys with nickel or cobalt as the major constituent
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/0021—Reactive sputtering or evaporation
- C23C14/0036—Reactive sputtering
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C30/00—Coating with metallic material characterised only by the composition of the metallic material, i.e. not characterised by the coating process
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01C—RESISTORS
- H01C7/00—Non-adjustable resistors formed as one or more layers or coatings; Non-adjustable resistors made from powdered conducting material or powdered semi-conducting material with or without insulating material
- H01C7/006—Thin film resistors
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01F—MAGNETS; INDUCTANCES; TRANSFORMERS; SELECTION OF MATERIALS FOR THEIR MAGNETIC PROPERTIES
- H01F10/00—Thin magnetic films, e.g. of one-domain structure
- H01F10/08—Thin magnetic films, e.g. of one-domain structure characterised by magnetic layers
- H01F10/10—Thin magnetic films, e.g. of one-domain structure characterised by magnetic layers characterised by the composition
- H01F10/12—Thin magnetic films, e.g. of one-domain structure characterised by magnetic layers characterised by the composition being metals or alloys
- H01F10/13—Amorphous metallic alloys, e.g. glassy metals
- H01F10/131—Amorphous metallic alloys, e.g. glassy metals containing iron or nickel
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T428/00—Stock material or miscellaneous articles
- Y10T428/31504—Composite [nonstructural laminate]
- Y10T428/31511—Of epoxy ether
- Y10T428/31515—As intermediate layer
- Y10T428/31522—Next to metal
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US05/866,115 US4231816A (en) | 1977-12-30 | 1977-12-30 | Amorphous metallic and nitrogen containing alloy films |
Publications (1)
Publication Number | Publication Date |
---|---|
DE2862036D1 true DE2862036D1 (de) | 1982-11-04 |
Family
ID=25346935
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
DE7878101634T Expired DE2862036D1 (de) | 1977-12-30 | 1978-12-09 | Metal glas film |
Country Status (4)
Country | Link |
---|---|
US (1) | US4231816A (de) |
EP (1) | EP0002712B1 (de) |
JP (1) | JPS6044381B2 (de) |
DE (1) | DE2862036D1 (de) |
Families Citing this family (53)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS56136948A (en) * | 1980-03-28 | 1981-10-26 | Hitachi Ltd | Amorphous alloy for magnetic head core |
JPS5719361A (en) * | 1980-07-11 | 1982-02-01 | Hitachi Ltd | Amorphous alloy for core of magnetic head and magnetic head for video using it |
JPS57149706A (en) * | 1981-03-12 | 1982-09-16 | Tdk Corp | Magnetic recording medium |
JPH06104870B2 (ja) * | 1981-08-11 | 1994-12-21 | 株式会社日立製作所 | 非晶質薄膜の製造方法 |
US4834816A (en) * | 1981-08-21 | 1989-05-30 | Allied-Signal Inc. | Metallic glasses having a combination of high permeability, low coercivity, low ac core loss, low exciting power and high thermal stability |
FR2512070A1 (fr) * | 1981-09-03 | 1983-03-04 | Commissariat Energie Atomique | Couche de chrome de haute durete, capable de resister a la fois a l'usure, a la deformation, a la fatigue des surfaces et a la corrosion |
US4645715A (en) * | 1981-09-23 | 1987-02-24 | Energy Conversion Devices, Inc. | Coating composition and method |
JPS58190815A (ja) * | 1982-04-30 | 1983-11-07 | Futaba Corp | 遷移元素けい化物非晶質膜 |
US4450206A (en) * | 1982-05-27 | 1984-05-22 | Allegheny Ludlum Steel Corporation | Amorphous metals and articles made thereof |
DE3442009A1 (de) * | 1983-11-18 | 1985-06-05 | Nippon Steel Corp., Tokio/Tokyo | Amorphes legiertes band mit grosser dicke und verfahren zu dessen herstellung |
JPS60152651A (ja) * | 1984-01-20 | 1985-08-10 | Res Dev Corp Of Japan | 窒素を含む非晶質合金およびその製造方法 |
JPS60220913A (ja) * | 1984-04-18 | 1985-11-05 | Sony Corp | 磁性薄膜 |
JPS6169932A (ja) * | 1984-09-14 | 1986-04-10 | Univ Osaka | 格子欠陥を用いた化学反応による金属間化合物のアモルフアス化促進方法 |
JPS6169931A (ja) * | 1984-09-14 | 1986-04-10 | Univ Osaka | 化学反応による金属間化合物のアモルフアス化方法 |
JPS61108113A (ja) * | 1984-10-31 | 1986-05-26 | Nec Home Electronics Ltd | 薄膜非晶質軟磁性材料構造体 |
GB2167448B (en) * | 1984-11-02 | 1988-10-19 | Hitachi Ltd | Perpendicular magnetic recording medium |
US4663193A (en) * | 1984-12-26 | 1987-05-05 | Hitachi Metals, Ltd. | Process for manufacturing magnetic recording medium |
US4797527A (en) * | 1985-02-06 | 1989-01-10 | Kanegafuchi Kagaku Kogyo Kabushiki Kaisha | Electrode for electric discharge machining and method for producing the same |
JPH0744109B2 (ja) * | 1985-10-16 | 1995-05-15 | ソニー株式会社 | 軟磁性薄膜 |
JPS62208412A (ja) * | 1986-03-07 | 1987-09-12 | Hitachi Ltd | 磁気記録媒体およびその製造方法 |
DE3707522A1 (de) * | 1986-03-12 | 1987-09-24 | Matsushita Electric Ind Co Ltd | Magnetischer nitridfilm |
JPS62210607A (ja) * | 1986-03-12 | 1987-09-16 | Matsushita Electric Ind Co Ltd | 軟磁性合金膜及びその形成法 |
JP2790451B2 (ja) * | 1987-04-10 | 1998-08-27 | 松下電器産業株式会社 | 窒素を含む軟磁性合金膜 |
US4904543A (en) * | 1987-04-23 | 1990-02-27 | Matsushita Electric Industrial Co., Ltd. | Compositionally modulated, nitrided alloy films and method for making the same |
JPH0817129B2 (ja) * | 1987-04-23 | 1996-02-21 | 松下電器産業株式会社 | 磁性合金膜とその製造方法 |
JPS63312965A (ja) * | 1987-06-16 | 1988-12-21 | Meidensha Electric Mfg Co Ltd | 高耐食性コ−テイング材 |
JPH0827927B2 (ja) * | 1987-07-09 | 1996-03-21 | 富士通株式会社 | 磁気記録媒体 |
US4863810A (en) * | 1987-09-21 | 1989-09-05 | Universal Energy Systems, Inc. | Corrosion resistant amorphous metallic coatings |
FR2622337B1 (fr) * | 1987-10-27 | 1995-06-16 | Thomson Csf | Tete d'enregistrement/lecture video, procede de realisation et appareil mettant en oeuvre ce procede |
US4939041A (en) * | 1989-07-11 | 1990-07-03 | The United States Of America As Represented By The Secretary Of The Navy | Metal film coatings on amorphous metallic alloys |
EP0422760A1 (de) * | 1989-10-12 | 1991-04-17 | Mitsubishi Rayon Co., Ltd | Amorphe legierung und Verfahren zu ihrer Herstellung |
DE69101726T2 (de) * | 1990-02-16 | 1994-08-11 | Matsushita Electric Ind Co Ltd | Weichmagnetische Dünnschichten aus Legierung und Magnetköpfe daraus. |
US5439754A (en) * | 1990-07-05 | 1995-08-08 | Kabushiki Kaisha Toshiba | Ferromagnetic film, method of manufacturing the same, and magnetic head |
JP2789806B2 (ja) * | 1990-09-28 | 1998-08-27 | 松下電器産業株式会社 | 軟磁性窒化合金膜の作製方法 |
DE4034034A1 (de) * | 1990-10-26 | 1992-05-14 | Leybold Ag | Verfahren zum beschichten eines wenig korrosionsbestaendigen substrats |
US5407548A (en) * | 1990-10-26 | 1995-04-18 | Leybold Aktiengesellschaft | Method for coating a substrate of low resistance to corrosion |
US5226975A (en) * | 1991-03-20 | 1993-07-13 | Cummins Engine Company, Inc. | Plasma nitride chromium plated coating method |
US5232566A (en) * | 1991-05-14 | 1993-08-03 | International Business Machines Corporation | Underlayer doping in thin film magnetic recording media |
JP2677721B2 (ja) * | 1991-05-15 | 1997-11-17 | 功二 橋本 | 高耐食アモルファス合金 |
JPH0517890A (ja) * | 1991-07-10 | 1993-01-26 | Limes:Kk | 電解電極材及びその製造方法 |
JPH07114165B2 (ja) * | 1991-11-28 | 1995-12-06 | 株式会社アモルファス・電子デバイス研究所 | 非晶質磁性薄膜 |
JPH0644516A (ja) * | 1992-07-24 | 1994-02-18 | Matsushita Electric Ind Co Ltd | 磁気ヘッド |
JP2780588B2 (ja) * | 1993-01-14 | 1998-07-30 | 松下電器産業株式会社 | 積層型磁気ヘッドコア |
US6416880B1 (en) | 1993-12-09 | 2002-07-09 | Seagate Technology, Llc | Amorphous permalloy films and method of preparing the same |
US6706156B1 (en) * | 1996-09-06 | 2004-03-16 | Seagate Technology Llc | Method of making an improved MR sensor |
JP4142753B2 (ja) | 1996-12-26 | 2008-09-03 | 株式会社東芝 | スパッタターゲット、スパッタ装置、半導体装置およびその製造方法 |
GB2353293A (en) * | 1999-08-18 | 2001-02-21 | Rtc Systems Ltd | FeXN deposition process based on helicon sputtering |
US6623566B1 (en) * | 2001-07-30 | 2003-09-23 | The United States Of America As Represented By The Secretary Of The Air Force | Method of selection of alloy compositions for bulk metallic glasses |
US9103022B2 (en) * | 2007-10-01 | 2015-08-11 | Southwest Research Institute | Amorphous aluminum alloy coatings |
JP5270647B2 (ja) | 2010-12-06 | 2013-08-21 | 信越化学工業株式会社 | スパッタリング成膜用珪素ターゲットおよび珪素含有薄膜の成膜方法 |
US20160160331A1 (en) * | 2013-07-12 | 2016-06-09 | Hewlett-Packard Development Company, L.P. | Amorphous thin metal film |
US10177310B2 (en) | 2014-07-30 | 2019-01-08 | Hewlett Packard Enterprise Development Lp | Amorphous metal alloy electrodes in non-volatile device applications |
CN107663620B (zh) * | 2017-09-11 | 2020-04-28 | 北京工业大学 | 一种用于制备金属基隔热涂层的复合材料 |
Family Cites Families (11)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
NL262066A (de) * | 1960-06-30 | |||
FR1299153A (fr) * | 1961-06-27 | 1962-07-20 | Sperry Rand Corp | Procédé de fabrication de pellicules magnétiques |
GB1023150A (en) * | 1962-09-18 | 1966-03-23 | Gevaert Photo Prod Nv | Magnetic signal carrier |
US3427154A (en) * | 1964-09-11 | 1969-02-11 | Ibm | Amorphous alloys and process therefor |
JPS4942468B2 (de) * | 1971-11-04 | 1974-11-15 | ||
US3965463A (en) * | 1972-08-29 | 1976-06-22 | International Business Machines Corporation | Apparatus using amorphous magnetic compositions |
US3856513A (en) * | 1972-12-26 | 1974-12-24 | Allied Chem | Novel amorphous metals and amorphous metal articles |
JPS601371B2 (ja) * | 1974-07-20 | 1985-01-14 | 新日本製鐵株式会社 | 非晶質合金の製造方法 |
JPS5812728B2 (ja) * | 1974-12-10 | 1983-03-10 | 富士写真フイルム株式会社 | ジキキロクバイタイノ セイホウ |
US4038073A (en) * | 1976-03-01 | 1977-07-26 | Allied Chemical Corporation | Near-zero magnetostrictive glassy metal alloys with high saturation induction |
US4030892A (en) * | 1976-03-02 | 1977-06-21 | Allied Chemical Corporation | Flexible electromagnetic shield comprising interlaced glassy alloy filaments |
-
1977
- 1977-12-30 US US05/866,115 patent/US4231816A/en not_active Expired - Lifetime
-
1978
- 1978-11-02 JP JP53134636A patent/JPS6044381B2/ja not_active Expired
- 1978-12-09 DE DE7878101634T patent/DE2862036D1/de not_active Expired
- 1978-12-09 EP EP19780101634 patent/EP0002712B1/de not_active Expired
Also Published As
Publication number | Publication date |
---|---|
EP0002712A3 (en) | 1979-07-25 |
US4231816A (en) | 1980-11-04 |
EP0002712B1 (de) | 1982-09-15 |
JPS5494428A (en) | 1979-07-26 |
JPS6044381B2 (ja) | 1985-10-03 |
EP0002712A2 (de) | 1979-07-11 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
8339 | Ceased/non-payment of the annual fee |