DE10340703A1 - Device for vacuum coating substrates used in the production of optoelectronic components comprises a falling and ejecting path for the substrates, and a unit for vacuum coating the substrates during falling and ejecting along the path - Google Patents

Abstract

Device for vacuum coating substrates (3) comprises a falling and ejecting path (28) for the substrates to be coated, and a unit for vacuum coating the substrates during falling and ejecting along the path. Independent claims are also included for the following: (1) Process for vacuum coating substrates; and (2) Coated substrate produced by the above device.

Description

The This invention relates generally to the coating of substrates, in particular The invention relates to a device and a method for seamless Vacuum coating of substrates, as well as a vacuum-coated Substrate.

Ball lenses are used for a large number of optical systems. For example, such lenses are often used as focusing or defocusing elements in fiber optic systems and optoelectronic components. An application for such ball lenses are, for example, optical fiber couplers, as shown in the US 5,768,458 to be discribed. Depending on the requirements, the ball lenses can have sizes in the millimeter or submillimeter range up to diameters of a few centimeters. These lenses are generally a bulk product, which accordingly must be inexpensive and easy to manufacture in large numbers. On the other hand, in order to improve the optical properties of the lenses, on the other hand, surface coatings such as an antireflective coating are often desirable to reduce the attenuation due to reflection loss in an optical transmission device including such lenses.

In the JP 63115101 A describes a coating method for ball lenses, in which a large number of holes is provided in a plate having a slightly smaller diameter than the ball lenses to be coated, wherein the lenses are pressed into the holes and so held for the subsequent coating.

Here However, there is the problem that due to the holder in the holes of the sheet the lenses have a circumferential, uncoated seam. This is particularly disadvantageous in that the lenses with respect to the later Installation due to its spherical Form have no preferred direction. Therefore the probability is very high high, that the Lenses are installed so that the Seam in the optical path is located. This method becomes the more disadvantageous the smaller the lenses are, since the seam is always related to the sphere surface larger area occupies.

Of the The invention is therefore based on the object, the coating of Substrates to improve that such seams are avoided.

These Task is already in the most surprising simple manner by a device according to claim 1 or 17 and a Method according to claim 18 or 37, and a coated substrate according to claim 38 dissolved. advantageous Further developments are the subject of the respective subclaims.

• – eine Fall- oder Wurfstrecke für die zu beschichtenden Substrate, und
• – eine Einrichtung zum Vakuumbeschichten der Substrate während des Falls oder Wurfs entlang der Fall- oder Wurfstrecke umfaßt.

Accordingly, the invention provides an apparatus for seamless vacuum coating of substrates which

• A drop or throw distance for the substrates to be coated, and
• - A device for vacuum coating the substrates during the fall or throw along the fall or litter line comprises.

• – kräftefreien Befördern zumindest eines Substrats entlang einer evakuierten Fall- oder Wurfstrecke und des
• – Vakuumbeschichtens der Substrate während des Falls oder Wurfs entlang der Fall- oder Wurfstrecke.

Accordingly, the method according to the invention, which can be carried out in particular with a device as stated above, comprises the steps of

• - Force-free transport at least one substrate along an evacuated fall or litter line and the
• Vacuum coating of the substrates during the fall or throw along the drop or throw distance.

The force-free carry may in particular include the throwing or dropping of the substrates. By throwing or dropping the substrates on this, while it moves along the drop or throw distance, essentially no powers more, since it is in both cases one completely contactless transport and no inertia and gravitational forces more on the substrate.

Around provide a vacuum in the fall or litter line for the vacuum coating, is a device for evacuating the fall or throwing distance advantageous.

When Vacuum coating methods can without restriction all common ones Coating method by means of a suitably designed vacuum coating device be used. For example, these are the chemical vapor deposition (CVD = "Chemical Vapor Deposition "), which physical vapor deposition ("PVD = Physical Vapor Deposition") or the sputtering of a Coating suitable, however, the method of sputtering sometimes also added under the PVD method.

• – eine Einrichtung zum chemischen Dampfphasenabscheiden einer Beschichtung,
• – eine Einrichtung zum physikalischen Dampfphasenabscheiden einer Beschichtung, oder
• – eine Einrichtung zum Aufsputtern einer Beschichtung umfassen.

Accordingly, the device for vacuum coating the substrates can advantageously be at least one of the devices:

• A device for chemical vapor deposition of a coating,
• A device for physical vapor deposition of a coating, or
• - Include a means for sputtering a coating.

A preferred embodiment The invention provides, the substrates by means of plasma-enhanced chemical Coat vapor deposition. Particularly advantageous can while the plasma by irradiation of electromagnetic waves in at least one area of the fall or throw distance by means of a Device for generating electromagnetic waves, such as done by microwaves. Preference is given to frequencies in one Range from 200 MHz to 3GHHz used. It is aimed at the Choice of the appropriate frequency also according to which frequency bands postal allowed are. For example, here is a frequency of 2.45 GHz and is widely used for Microwave applications used.

Advantageous It may also be when the device for generating electromagnetic Waves a device for generating pulsed electromagnetic Waves covered. By introducing pulsed waves into at least one area the falling or throwing distance becomes a good exchange during the pauses in the pulse of process gases allows so that the enrichment undesirable Reaction products in the plasma is suppressed.

With Advantage can also according to one further embodiment the invention electromagnetic waves on at least two Einkoppelstellen the fall or throw track supplied including the device for generating electromagnetic waves corresponding at least two coupling points for coupling electromagnetic May have waves in the fall or throw distance. This is for example Cheap, for a more even energy distribution provide the electromagnetic field in the fall or litter line, as this is possible with a single coupling point.

According to one embodiment The invention relates to plasma enhanced chemical vapor deposition a plasma in at least two areas of the fall or throw distance generated. When passing the fall or throw it passes through Substrate so, for example, sequentially at least two plasma areas. This can be advantageous, for example, if along a longer throw or falling distance does not create a single plasma region is practicable.

Especially for one equipped for coating by means of chemical vapor deposition inventive device It is advantageous if the device and a device for supplying process gas includes. By feeding of process gas while The coating process is also a good replacement of the process gas provided.

Around a good distribution of the process gas along the fall or throw distance to reach, the means for supplying process gas can also at least two along the case or Have inlet lances arranged so that on at least two points of fall or throw process gas is supplied. Also can while different inlet nozzles process gases different To bring together. In this way, then along the fall or throw the Gas composition vary so that during the coating process the composition of the deposited material changes. In order to can already with a single pass through a fall or throw distance a coating with varierender layer composition in the direction perpendicular to the substrate surface be generated.

According to one embodiment invention, the substrate passes at least twice or throw. This is beneficial, among other things, to layers With a layer thickness to be deposited on the substrates, the can not be achieved with a single pass a throw distance. For this purpose, a substrate, for example, a fall or throw distance happen at least twice. Also, the device of the invention have at least two fall or throw lines. These can then be passed sequentially from a substrate for coating. Of course you can too in such an embodiment the Device with multiple fall or throw lines the substrates one Traverse the track at least twice.

through of the invention particularly advantageous also multi-layer coatings on a substrate be applied. This is for example for many types of functional layers, such as anti-reflection coatings advantageous. So can with Each coating process layers of different refractive indices are applied to obtain such an anti-reflection layer.

A multilayer coating can be produced, for example, by the substrate undergoes at least two fall or throw distances, in which different coatings are deposited, such as by the respective process gases different Have compositions. But also already different Layers when passing a single fall or throw distance are deposited when, for example, the composition of the process gas varies along this route.

There the coated substrates after passing the drop or throw distance have a significant speed, it is still beneficial if the substrates after passing the fall or throw distance be collected gently by a catcher to damage the Avoid substrates.

The Catcher can advantageously a nachbiebiges collecting material, such as a soft pad or soft fiber material which the substrates then after passing the fall or throw distance can land softly.

The Collecting device may also include a lifting device. These can be carried along with the direction of movement of a substrate, to catch the substrate so gently. For example, such Hubeinrichtung an electromagnetic lifting device, such as according to the principle of a loudspeaker. The movement of Lifting device can also be actively controlled to active to adjust the movement to the moment of impact. For example can be the time of passing a certain position of the Fall or litter line detected and the movement of the lifter using this detected data to be controlled. Also can additionally the Speed detected be able to extrapolate the time of impact exactly. Suitable for Data Acquisition For example, one or more light barriers.

According to one more another embodiment of the invention the catcher a conveyor belt. This can be formed be that it in the impact area with at least one movement component moved along the direction of movement of the substrate, so that it also the impact speed of the substrate on the catcher is reduced.

Around long coating times with at the same time compact construction of the To achieve device it is also advantageous if the litter of the substrate by a correspondingly formed device a Coating also made in the area of the movement reversal point is because the substrate is slow in the area around this point emotional.

The The invention also provides a method for seamless vacuum coating before, in which a substrate is guided along a spiral spiral path, wherein the substrate rolls along a spiral helix guide while it is is vacuum-coated in the course of rolling on the spiral path.

• – eine Beschichtungsstrecke mit einer Spiralwendel-Führung, entlang welcher Substrate führbar sind, sowie
• – einer Einrichtung zur Vakuumbeschichtung von auf der Spiralwendel-Führung rollenden Substraten. Diese Ausführungsform der Erfindung ist besonders für die Beschichtung kugelförmiger Substrate geeignet.

A corresponding device according to the invention comprises

• - A coating path with a spiral helical guide, along which substrates are feasible, as well as
• - A device for vacuum coating of rolling on the spiral spiral guide substrates. This embodiment of the invention is particularly suitable for the coating of spherical substrates.

By the rolling of the substrate along a spiral path results a resulting extra Rotation in the direction perpendicular to the rolling direction, so that in the course the Abrollvorgangs avoided shadowing of surface parts of the substrates becomes. Accordingly, with this embodiment of the invention, a seamless coating allows.

These embodiment The invention can be applied to the device for vacuum coating advantageous in an analogous manner as above with respect to the device and the Method for vacuum coating during contactless, force-free promotion the substrates in free fall or litter has been described, further developed be. It is accordingly the case or throwing distance by a Replaced coating line with spiral spiral guide. Especially the apparatus may also include means for evacuating the coating line, and a device for supplying, as described above process gas exhibit.

One Coated according to the invention Substrate, which in particular with a as described above Device according to the invention or with the method according to the invention can be prepared, accordingly has a vacuum coating on which seamless the surface surrounding the substrate. The coating can be multi-layered in particular be. This is cheap, for example to provide an anti-reflection layer on the substrate. A preferred embodiment It provides a coating with six layers. With such Coating can be done with proper matching of refractive indices the individual layers a particularly good anti-reflection can be achieved.

Next Antireflection coatings can alternatively or additionally, other functional layers on the substrate, such as an anti-scratch coating by vacuum coating be deposited.

As a substrate, for example, a variety of optical elements, such as lenses, in particular spherical lenses or prisms are suitable. However, the invention is not limited to the coating of optical substrates. On the contrary, substrates for non-optical applications can also be invented According coated according to.

The The invention will be described in more detail below with reference to preferred embodiments and with reference to the accompanying drawings. there like reference numerals refer to like or equivalent Parts. Show it:

1 a view of a first embodiment of a device according to the invention for vacuum coating of substrates,

2 a schematic view of another embodiment of a device according to the invention,

3A to 3C Embodiments for collecting devices of a device according to the invention,

4A and 4B two embodiments of a device according to the invention with reversal point of the trajectory of the substrates within the throwing distance,

5 an embodiment of a combined throwing and collecting device,

6 an embodiment of a device according to the invention with helical-spiral guidance of the substrates,

7 an embodiment of a device according to the invention with multiple drop sections, and

8A and 8B Cross sections through two embodiments of a substrate coated according to the invention.

1 shows a first embodiment of one as a whole by the reference numeral 1 designated device according to the invention for vacuum coating of substrates 3 ,

The device 1 has a fall distance 28 for the substrates to be coated 3 and a device for vacuum coating the substrates during the fall or throw along the drop distance.

In the 1 The illustrated embodiment of the invention is specially designed for plasma assisted chemical vapor deposition (PECVD).

In the case route 28 a gas atmosphere of low density is generated in which a plasma is generated by the action of electromagnetic waves. The substrates 3 fall at the in 1 shown free of force in the free fall through the fall distance and the plasma generated therein, so that when passing through the plasma, a CVD coating is deposited. Since the substrates are in the free fall without any contact with a support or support, the CVD coating without formation of a seam or other open surface area on the entire surface of the substrate 3 deposited.

Accordingly, the vacuum coating device comprises means for generating electromagnetic waves. This in turn comprises a plurality of microwave radiators 11 to 15 with microwave heads 16 to 20 , The microwave heads may for example be equipped with magnetrons for generating microwaves. The frequency of the microwave field generated by these can be, for example, 2.45 GHz.

The microwave radiators are along the drop or throw distance 28 arranged, wherein the electromagnetic waves generated by these coupling points 210 to 214 be supplied to the case route. This allows a relatively uniform field distribution within the fall distance 28 be generated to produce a large-volume plasma.

On the other hand, the microwave heads can also be operated so that they serve in conjunction with the decoupling points distributed along the fall distance as a means for generating a plasma in several areas of the drop distance, so that the substrates on the way through the drop distance corresponding to multiple plasma areas 6 to 10 traverse.

For the CVD coating, the device comprises 1 also a device for supplying process gas. This comprises the arranged at several points along the fall line inlet nozzles 271 to 275 by which during the vacuum coating of the substrates of the drop distance 28 Process gas is supplied. In this case, individual or grouped in inlet nozzles of the fall distance 28 Process gases supply different composition, so that, accordingly, the composition of the deposited coating material in the course of the coating process during the free fall of the substrates 3 through the drop route 28 changes.

The device also has an in 1 not shown device for evacuating the fall distance 28 on, with which via the inlet nozzles 271 to 275 supplied process gas again is dissipated.

The substrates are according to this embodiment of the device according to the invention of the drop distance by a conveyor belt 23 fed, which over a above the throwing distance 28 located roller rotates. The substrates thus roll off the conveyor belt and thereby receive during the free fall through the drop distance 28 an additional twist, whereby a particularly uniform coating can be achieved.

The substrates 3 are traversed by traversing the trajectory with one as a whole 30 designated catcher. This has electromagnetically controlled catcher 32 on, which are arranged on a transport device. The collectors each comprise a lifting device, which moves in the direction of movement of the substrates during the impact time and thus the impact velocity of the substrates 3 reduced. This gently absorbs the substrates and prevents damage. The electromagnetically controlled Auffänger can advantageously in a simple manner by a in the case of distance 28 arranged light barrier 33 which are controlled by a falling substrate 3 is triggered.

The impact area of the catcher may in particular also be equipped with a resilient material on which the substrates 3 be collected softly.

According to a further embodiment of the invention, no lifting device is provided, but the substrates only land on a resilient material, such as a suitable cushion, which is arranged for example on a transport device to transport away the landed substrates. This is advantageous, for example, if the impact velocity is not too high and / or the substrates 3 are relatively small, so that it can be dispensed with the additional effort of a lifting device.

2 shows a further embodiment of the invention. The construction of in 2 illustrated device 1 resembles the in 1 shown embodiment. Unlike the one based on 1 the apparatus shown fall the substrates 3 not through a fall course but through a throwing distance 28 thrown upwards. These are throwing equipment 29 provided which the substrates 3 give the required impulse to the throwing distance 28 traverse against the gravitational effect. The throwing equipment 29 are shown arranged on a carousel-like transport device. However, it will be apparent to those skilled in the art that such arrangement is merely exemplary and a variety of other arrangements and constructions are possible.

While crossing the throw 28 become the substrates 3 then coated in the same way as by means of an in 1 shown embodiment.

The catcher 30 is due to the upward movement of the substrates in the throwing distance 28 accordingly above the throwing distance 28 arranged.

The substrates 3 be from the catcher 30 just caught behind the reversal point. Due to this arrangement, the substrates have only a small impulse when collecting, so that according to this embodiment of the invention, an active collecting device is not provided. Rather, the catcher includes 30 Here, for example, a conveyor belt 34 , which with a resilient collecting material 37 is provided and on which the substrates land soft. To a parabolic trajectory 47 the substrates 3 in the device 1 to allow, for example, a catch on the top of a conveyor belt 34 allowed to allow, can the throwing distance 28 also be arranged slightly inclined.

In 3A schematically is another embodiment of a collecting device 30 which is set up, free-falling substrates 3 catch. This embodiment includes a roll 24 guided conveyor belt 34 with Aufschängern arranged thereon. As catchers serve catchment funnels 36 into which the substrates 3 after leaving the fall course 22 fall. The conveyor belt 34 has a point of impact of the substrates 3 towards rising slope. As a result, the collectors have a higher vertical speed at the point of impact than at the other end of the transport path. The rate of revolution of the conveyor belt can then be adjusted so that the vertical speed nearly matches the falling speed of the substrates at the point of impact, so that the substrates gently land in the receivers. Those in the funnels 36 landed substrates 3 can then at the end of the transport route on a guide rail 40 be discontinued, say, by the funnels 36 movably arranged on the band and over a stop 38 be tilted. Instead of the catchment funnel 36 However, the band can also have, for example, suitable ribs as a catcher.

3B shows a modification of the in 3A shown catcher 30 , At the in 3B variant shown is the conveyor belt 34 It also elastic and is between two tension rollers 43 and the upper roll 24 stretched.

This can be done in this area between the roles 43 and the upper roll 24 an even higher vertical speed of the catcher can be achieved.

3C schematically shows another variant. Here, the substrates are first of Auffängern a fast band 34 collected and then via a distribution device 45 then on slower bands 351 . 352 and 353 distributed.

In the 4A and 4B are two further embodiments of a device according to the invention 1 shown. In both embodiments of the device, the substrates become 3 along a trajectory 47 through a throw 28 thrown. The discharge and collection points are at a similar or substantially the same height.

In contrast to the embodiments described above, here the device is designed such that the trajectory of the substrates within the fall or litter path includes a movement reversal point. In the area of the trajectory around this point, the vertical speed of the substrates is small, so that here a long residence time is achieved, so that a comparatively thick coating can be deposited. At the in 4A In this case, the movement reversal point in the plasma region is shown 8th and at the in 4B illustrated embodiment in the plasma region 8th , Unlike in the 4A and 4B this can be represented by the microwave radiators 11 to 15 in 4A , respectively 11 to 14 in 4B However, plasma generated in a single contiguous area in the litter line 28 to be available.

At the in 4A The device shown are the substrates 3 by way of example by means of a running rail 40 to a throwing device 29 transported and from the throwing device 29 through the throwing track 28 thrown. After a force-free transport in free flight and during which successful vacuum coating, the substrates 3 again from a catcher 30 collected and forwarded by means of another transport rail. The trajectory 47 Here is a throw parabola, the throw distance is adjusted according to this trajectory.

At the in 4B In the embodiment shown, a substantially parabolic or very pointed parabola is used. This is a combined throw and catcher 31 provided with which the substrates are both thrown up, and collected again. Thereby every plasma area becomes 6 to 9 , or the plasma present in the throwing distance traversed twice. The feeding and the removal of the substrates 3 is done by way of example also by conveyor rails 40 and 41 , Of course, other suitable facilities can be used for the transport and removal.

In 5 is a possible embodiment of a combined throw and catcher 31 shown, for example, in the basis of 4B explained embodiment of the device according to the invention can be used. The litter and catcher 31 can also be used as a pure catcher 30 or as a pure throwing device 29 be used and also also represents a mechanical lifting device.

A carrier 53 the device 31 is with two eccentrics 50 . 51 connected. The carrier 53 has storage troughs 55 on, in which the substrates 3 be recorded. By the rotation of the eccentric 50 . 51 a substrate lying in a storage trough is thrown up, after which it can be coated in free, force and non-contact flight. The movement of the eccentric can now be adapted so that the carrier 53 when collecting the returning substrate just substantially the maximum vertical speed, so that the substrate is gently collected.

In addition, the device can 31 also be designed so that the substrate 3 when catching in a dump other than the trough from which it was thrown. Thus, the substrate moves successively from trough to trough, as the trajectory 47 is shown schematically. In this way it can also be achieved in a simple manner that a substrate passes several times, or at least twice a fall or throw distance. This way can work on a substrate 3 Even a thicker coating can be deposited, if the deposition rate is not sufficient for a single traversing.

In 6 is an embodiment of a device according to the invention 1 with spiral spiral guiding the substrates 3 shown. This embodiment of a device according to the invention is similar in construction to the device for vacuum coating, as the embodiments described above. Instead of a fall or throwing distance, the in 6 dargestelte embodiment, however, a coating line 25 with a spiral spiral guide 63 on. To cover as few areas of the substrate surface, the spiral helix guide points 63 For example, two parallel spiral strands 65 . 66 on.

The device for vacuum coating is analogous to that of the 1 and 2 explained embodiment executed. Accordingly, the vacuum coating device comprises micro wave radiators 11 to 15 with microwave heads 16 to 20 , The microwave radiators 11 to 15 are doing along along the coating line 25 distributed coupling points 210 to 214 connected.

Furthermore, a device for supplying process gas is present, which along the coating path 25 arranged gas inlet nozzles 271 to 274 includes.

For coating, the substrates roll 3 along the spiral spiral guide 63 on the spiral strands 65 . 66 down while in the microwave 11 to 15 generated plasma are coated.

Compared to the embodiments described above with coating of the substrates in free fall or throw is in the embodiment of the 6 the residence time of the substrates 3 significantly longer in the plasma, whereby a thicker layer can be deposited even on a single pass.

7 represents a further embodiment of a device according to the invention for seamless vacuum coating, with which a multiple coating can be made. This embodiment of the device according to the invention 1 exemplifies three fall routes 280 . 281 . 282 on which the substrates pass successively. Of course, such an embodiment may also have two or more than three fall distances.

The substrates 3 become the first fall range 280 with a conveyor belt 23 fed and provided when falling through with a first layer of a coating. At the bottom of the first drop route 280 become the substrates 3 then with a first catcher 301 collected and with a conveyor 59 a second case route 281 wherein a second layer of the coating is deposited. The substrates are then collected at the end of the second fall distance by a second catcher.

This process is then repeated for a third layer of the coating by means of a second conveyor 60 , another fall route 282 and a third catcher 303 , From the third reception facility 303 The substrates are then finally for removal on a track 41 set. The process gases in the individual drop sections may in particular have different compositions, so that the deposited layers differ in their composition.

It is obvious to the person skilled in the art that this is based on 6 described method also with successive throwing distances, such as those based on the 2 . 4A and 4B can be performed in an analogous manner. In addition, instead of a fall distance, a coating line with spiral spiral guide can be used.

Farther can also in the individual coating steps different coating methods be applied. So can in this way, for example by means of PVD deposited layers with Layers, which were produced by means of CVD, can be combined.

The 8A and 8B show two embodiments according to the invention coated substrates 3 , It shows 8A a coated ball lens and 8B a coated prism. The substrates 3 the lens and the prism have a coating 68 on which was deposited by means of vacuum coating. The coating of the ball lens also has, by way of example, six layers 69 to 74 of which adjacent layers differ in their composition and refractive index, so that an effective anti-reflection layer is provided. This in 8B shown prism has a corresponding four-layer vacuum coating 68 with layers 69 to 72 on, which also serves for the anti-reflection.

The several layers 69 to 74 , respectively 69 to 72 the coating 68 can be sequentially deposited in a single fall or throw distance or in a coating path with spiral helical guide. Likewise, several routes, as exemplified in 6 shown in series, each to individual layers of the coating 68 deposit.

The vacuum coating applied in this way 68 surrounds due to the manufacturing process, or due to the properties and design of the device according to the invention 1 seamless the surface 2 of the substrate 3 ,

1

contraption for seamless vacuum coating

3

substrate workpiece

4

Surface of 3

6 7, 8, 9, 10

plasma region

11 12, 13, 14, 15

microwave radiators

16 17, 18, 19, 20

microwave head

210-214

coupling- for electromagnetic waves

23

conveyor belt

24

role

25

coating line

271, 272, 273, 274, 275

Gas inlet nozzles

28 280, 281

Case- or throw

29

throwing device

30 301, 302, 303

catcher

 31

combined Throwing / sump

32

Electromagnetically controlled collector of 30

33

photocell

34 351, 352, 353

Conveyor belt, transport chain from 30

36

Collection cup from 30

37

compliant collecting material

38

attack

40 41

rails

43

idler

45

distribution facility

47

trajectory

50, 51

eccentric

53

carrier

55

storage depression

57 58

Conveyor

63

Spiral coil guide

65, 66

Spiral strands of 63

68

coating

69-74

Layers of 68

Claims (42)

Contraption ( 1 ) for seamless vacuum coating of substrates ( 3 ), which - a fall or throw ( 28 . 281 . 282 ) for the substrates to be coated ( 3 ), and - means for vacuum coating the substrates during the fall or throw along the drop or throw distance. Device according to claim 1, characterized in that the device comprises means for evacuating the drop or litter line ( 28 . 281 . 282 ). Device according to claim 1 or 2, characterized in that the device for vacuum coating the substrates of at least one of the institutions: - An institution for chemical vapor deposition of a coating, - An institution for physical vapor deposition of a coating, and - An institution for sputtering a coating. Device according to a the preceding claims, characterized in that the Device for vacuum coating the substrates means for plasma-assisted chemical vapor deposition. Device according to claim 4, characterized in that the Device for plasma-assisted chemical vapor deposition means for generating electromagnetic waves. Device according to claim 5, characterized in that the Device for generating electromagnetic waves means for generating pulsed electromagnetic waves. Device according to claim 5 or 6, characterized in that the means for generating electromagnetic waves at least two coupling points for coupling electromagnetic waves in the fall or litter line has. Device according to a the claims 4 to 6, characterized in that the means for plasma-assisted chemical Vapor deposition, a means for generating a plasma in at least two areas of the fall or litter line includes. Device according to a the preceding claims, characterized by a device for supplying process gas. Device according to claim 9, characterized in that the Device for feeding of process gas has at least two along the fall or throw track arranged inlet nozzles. Device according to a the preceding claims, characterized by at least two fall or throw distances. Device according to one of the preceding claims, characterized by a collecting device ( 30 ) for the substrates ( 3 ). Apparatus according to claim 12, characterized in that the collecting device ( 30 ) comprises a compliant catching material. Device according to claim 12 or 13, characterized in that the collecting device ( 30 ) comprises a lifting device. Device according to one of claims 12 to 14, characterized in that the collecting device ( 30 ) comprises a conveyor belt. Device according to a preceding An Claims, characterized in that the device is designed so that the trajectory of the substrates within the fall or litter path includes a movement reversal point. Device for seamless vacuum coating of in particular spherical substrates ( 3 ), comprising: a coating line having a helical guide along which substrates can be guided, and a device for vacuum coating of substrates rolling on the spiral spiral guide. Method for nightless vacuum coating of substrates ( 3 ), in particular feasible with a device according to any one of claims 1 to 16, comprising the steps of - forces conveyed at least one substrate along an evacuated falling or throwing distance and the - vacuum coating of the substrates during the fall or throw along the fall or throw distance , Method according to claim 18, characterized in that the Step of the force-free conveying the throwing or dropping of a substrate. Method according to one the claims 18 or 19, characterized in that the step of vacuum coating a substrate at least one of the steps - chemical Vapor deposition of a coating, - physical vapor deposition a coating, - sputtering a coating. Method according to one the claims 18 to 20, characterized in that the step of vacuum coating of a substrate, the step of plasma enhanced chemical vapor deposition includes. Method according to claim 21, characterized in that the Step of plasma assisted chemical vapor deposition the step of inducing electromagnetic Waves in at least a portion of the fall or litter line includes. Method according to claim 22, characterized in that electromagnetic Waves at at least two Einkoppelstellen the fall or throw supplied become. Method according to claim 22 or 23, characterized in that in at least one area the fall or throw distance pulsed electromagnetic waves are introduced. Method according to one the claims 21 to 24, wherein in at least two areas of the fall or throw distance a plasma is generated. Method according to one the claims 18 to 25, characterized in that during the step of vacuum coating the substrate of the fall or throw process gas is supplied. Method according to claim 26, characterized in that at least two points of fall or throw process gas is supplied. Method according to one the claims 18 to 27, characterized in that the substrate at least twice pass a drop or throw. Method according to one the claims 18 to 28, characterized in that the substrate at least two Fall or throw distances happens. Method according to one the claims 18 to 29, characterized in that the step of vacuum coating of the substrate, the step of depositing a multilayer coating includes. Method according to one of Claims 18 to 30, characterized in that the substrate has at least two fall or throw lines ( 280 . 281 ) happens, in which different coatings are deposited. Method according to one of claims 18 to 31, characterized in that the substrate after passing the falling or throwing distance ( 28 . 280 . 281 ) by means of a collecting device ( 30 ) is caught. A method according to claim 32, characterized in that the substrate is supported on a resilient collecting material ( 37 ) are caught. Process according to Claim 32 or 33, characterized in that the substrate ( 3 ) are collected by means of a lifting device or a conveyor belt. Method according to claim 34, characterized in that the Lifting device is actively controlled. Method according to one of Claims 18 to 35, characterized in that the trajectory of the substrate constitutes the point of reversal of movement closes. Process for the seamless vacuum coating of in particular spherical substrates ( 3 ), in particular by means of a device according to claim 17, wherein at least one substrate ( 3 ) is guided along a helical path, wherein the substrate ( 3 ) rolls along the spiral spiral guide while being vacuum-coated in the course of rolling on the spiral path. Coated substrate ( 3 ), in particular coatable with a device according to one of claims 1 to 17 or with a method according to one of claims 18 to 37, which comprises a vacuum coating ( 68 ), which seamlessly the surface ( 2 ) of the substrate ( 3 ) surrounds. Coated substrate according to claim 37, characterized that this Substrate a multilayer coating, in particular a coating with six layers. Coated substrate according to claim 37 or 38, characterized characterized in that Substrate has an anti-reflection coating. Coated substrate according to one of claims 37 to 40, characterized in that the substrate has an anti-scratch coating. Coated substrate according to one of claims 37 to 41, characterized in that the substrate a lens, a ball lens or a prism.