DE102005035083B4 - Bond connection system, semiconductor device package and wire bonding method - Google Patents
Bond connection system, semiconductor device package and wire bonding method Download PDFInfo
- Publication number
- DE102005035083B4 DE102005035083B4 DE102005035083A DE102005035083A DE102005035083B4 DE 102005035083 B4 DE102005035083 B4 DE 102005035083B4 DE 102005035083 A DE102005035083 A DE 102005035083A DE 102005035083 A DE102005035083 A DE 102005035083A DE 102005035083 B4 DE102005035083 B4 DE 102005035083B4
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- bond
- single chip
- bonding
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- connection system
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- H01L23/488—Arrangements for conducting electric current to or from the solid state body in operation, e.g. leads, terminal arrangements ; Selection of materials therefor consisting of soldered or bonded constructions
- H01L23/498—Leads, i.e. metallisations or lead-frames on insulating substrates, e.g. chip carriers
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- H01L23/3121—Encapsulations, e.g. encapsulating layers, coatings, e.g. for protection characterised by the arrangement or shape the device being completely enclosed a substrate forming part of the encapsulation
- H01L23/3128—Encapsulations, e.g. encapsulating layers, coatings, e.g. for protection characterised by the arrangement or shape the device being completely enclosed a substrate forming part of the encapsulation the substrate having spherical bumps for external connection
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Abstract
Verbindungssystem
für eine
Halbleiterbauelementpackung mit
– einer Mehrzahl von Bondbereichen
um einen Einzelchipbereich (130) herum zur Verbindung mit einer
jeweiligen einer Mehrzahl von Bondkontaktstellen eines in dem Einzelchipbereich
anzubringenden Einzelchips, wobei ein erster Satz (110a) der Bondbereiche
entlang eines ersten Liniensegments (L1) zur Verbindung mit benachbarten
Bondkontaktstellen des anzubringenden Einzelchips positioniert ist und
ein zweiter Satz (120a) der Bondbereiche entlang eines zweiten Liniensegments
(L2) zur Verbindung mit einer zweiten Mehrzahl von benachbarten
Bondkontaktstellen des anzubringenden Einzelchips positioniert ist,
wobei das erste und das zweite Liniensegment diskontinuierlich sind und
unterschiedliche Abstände
zum Einzelchipbereich aufweisen, und
– einer Mehrzahl von externen
Anschlüssen,
die jeweils mit einem entsprechenden der Mehrzahl von Bondbereichen verbunden
ist,
dadurch gekennzeichnet, dass
– das erste und das zweite
Liniensegment (L1, L2) einander in Richtung des Einzelchipbereichs
wenigstens teilweise überlappen.Connection system for a semiconductor device package with
A plurality of bond areas around a single chip area for connection to a respective one of a plurality of bond pads of a single chip to be mounted in the single die area, a first set of bonding areas along a first line segment for connection to adjacent bond pads of the bond area a single set (120a) of the bond areas is positioned along a second line segment (L2) for connection to a second plurality of adjacent bond pads of the single chip to be attached, the first and second line segments being discontinuous and spaced apart from the single chip area , and
A plurality of external terminals each connected to a corresponding one of the plurality of bonding areas,
characterized in that
- The first and the second line segment (L1, L2) at least partially overlap each other in the direction of the single chip area.
Description
Die Erfindung bezieht sich auf ein Verbindungssystem, das Bondbereiche für eine Halbleiterbauelementpackung beinhaltet, auf eine zugehörige Halbleiterbauelementpackung sowie auf ein Verfahren zum Drahtbonden einer derartigen Packung.The The invention relates to a connection system, the bonding areas for one Semiconductor device package includes, on an associated semiconductor device package and to a method of wire bonding such a package.
Die Anzahl von Transistoren, die auf einem integrierten Schaltkreischip gebildet werden können, nimmt mit dem Trend zu höherer Integration weiter zu. Demgemäß werden integrierte Schaltkreise hochentwickelter und erfordern eine erhöhte Anzahl von Eingabe- und Ausgabe-E/A-Anschlüssen oder -Leitungen. Daher nimmt die Anzahl von Bondkontaktstellen, die an den Kanten der Einzelchips platziert sind, entsprechend zu, was Beschränkungen für das Packen von Chips bedeutet.The Number of transistors on an integrated circuit chip can be formed with the trend to higher Integration continues. Accordingly, become integrated circuits are more sophisticated and require an increased number of Input and Output I / O Ports or lines. Therefore, the number of bond pads, which are placed at the edges of the individual chips, corresponding to, what restrictions for the Packing of chips means.
In einem integrierten Schaltkreiseinzelchip sind die Bondkontaktstellen üblicherweise am Umfang des Chips platziert. Der Einzelchip ist an einem Leiterrahmen oder Packungssubstrat angebracht, das wiederum eine Anzahl von Anschlussstiften oder Leitungen zum Verteilen der Signale von der Bondkontaktstelle des Einzelchips zu einer Schaltkreisplatine enthält, an der die Chippackung angebracht ist. Der Leiterrahmen oder das Packungssubstrat beinhalten eine Anzahl von Leitungen, die im Allgemeinen zu den Bondkontaktstellen des Einzelchips justiert sind. Die Leitungen sind über Bonddrähte mit den Bondkontaktstellen gekoppelt.In In an integrated circuit die, the bond pads are common placed on the perimeter of the chip. The single chip is on a lead frame or package substrate, which in turn has a number of pins or lines for distributing the signals from the bond pad of the single chip to a circuit board containing the chip package is appropriate. The leadframe or package substrate include a number of wires, generally to the bond pads of the single chip are adjusted. The lines are over bonding wires with the Coupled bond pads.
Um
einen Kurzschluss von Draht zu Draht in den Eckbereichen zu vermeiden,
wird der Abstand zwischen den Bondkontaktstellen
Eine Bondkonfiguration, auf die sich die Eckenregel anwenden lässt, resultiert jedoch in einer vergrößerten Chipabmessung, wenn die Anzahl an Bondkontaktstellen aufrechterhalten werden soll. Dies steht im Gegensatz zur Designintegration und im Gegensatz zum Fertigungsdurchsatz, bei denen eine optimale "Netto-Einzelchip"-Anzahl oder Anzahl an Chips pro Wafer gewünscht ist. Demgemäß erhöhen sich die Herstellungskosten proportional.A Bond configuration to which the corner rule applies results however, in an enlarged chip size, if the number of bond pads is to be maintained. This is in contrast to design integration and in contrast to manufacturing throughput, where an optimal "net single chip" number or number of Wished chips per wafer is. Accordingly, increase the production costs proportional.
Bei
einem in der Patentschrift
In
der Patentschrift
In
der Offenlegungsschrift
Die Offenlegungsschrift US 2002/0140083 A1 offenbart ein Verbindungssystem zur verkapselten Integration eines Halbleiterchips auf einer Mehrschichtleiterplatte, wobei die Chipanschlüsse über Bonddrähte mit Kontaktstrukturen der Leiterplatte verbunden sind, die auch Durchkontakte beinhalten können.The Laid-open publication US 2002/0140083 A1 discloses a connection system for the encapsulated integration of a semiconductor chip on a multilayer printed circuit board, the chip connections via bonding wires with Contact structures of the circuit board are connected, which also have vias may include.
In
der eingangs genannten Patentschrift
Die Offenlegungsschrift JP 62-185331 A offenbart ein Verbindungssystem für eine Halbleiterbauelementpackung, bei dem ein in einer Öffnung der Packung aufgenommener Chip eine Bondkontaktstellenkonfiguration aufweist, bei der periphere Bondkontaktstellen zwischen je zwei Chipeckbereichen entlang eines Kreisbogens angeordnet sind, während mit einem jeweiligen Eckbereich korrespondierende Bondkontaktstellen in einer Reihe angeordnet sind, die gegenüber dem besagten Kreisbogen zur Chipecke hin versetzt ist. In gleicher Weise sind auf einem die Chipöffnung umgebenden Packungsbereich Bondbereiche, die sich zwischen Eckbereichen der Öffnung befinden, entlang eines jeweiligen Kreisbogens angeordnet, während mit dem jeweiligen Eckbereich korrespondierende Bondbereiche in einer Reihe angeordnet sind, die demgegenüber in chipabgewandter Richtung versetzt ist. Damit soll ein bezüglich des Chipmittelpunktes möglichst strahlenförmiger Verlauf aller die Bondkontaktstellen mit den Bondbereichen verbindenden Bonddrähte erreicht werden.The Laid-open JP 62-185331 A discloses a connection system for one Semiconductor device package in which one in an opening of the Pack received chip a bond pad configuration at the peripheral bond pads between every two Chipeckbereichen are arranged along a circular arc, while with a corresponding corner region corresponding bond pads are arranged in a row opposite to said circular arc for Chip corner is offset. In the same way are on a the chip opening surrounding packing area bonding areas, extending between corner areas the opening are located along a respective arc while using the respective corner region corresponding bond areas in one Row are arranged, in contrast, in the chip away direction is offset. This should be a respect the chip center as possible of radial Course of all the bond pads connecting to the bond areas Bond wires be achieved.
Der Erfindung liegt als technisches Problem die Bereitstellung eines Verbindungssystems, einer zugehörigen Halbleiterbauelementpackung und eines zugehörigen Drahtbondverfahrens zugrunde, die in der Lage sind, wenigstens teilweise die vorstehend erwähnten Schwierigkeiten des Standes der Technik zu vermeiden und durch die insbesondere die Bondwinkel der Bonddrähte innerhalb akzeptabler Grenzen gehalten werden, ohne eine Vergrößerung der Einzelchipabmessung zu verursachen.Of the Invention is the technical problem of providing a Connection system, an associated Semiconductor device package and an associated Drahtbondverfahrens based, which are capable, at least in part, of the difficulties mentioned above to avoid the prior art and by the particular the bond angles of the bonding wires within acceptable limits without increasing the size of the single-chip to cause.
Die Erfindung löst dieses Problem durch die Bereitstellung eines Verbindungssystems mit den Merkmalen von Anspruch 1, 2 oder 5, einer Halbleiterbauelementpackung mit den Merkmalen von Anspruch 22 und eines Drahtbondverfahrens mit den Merkmalen von Anspruch 27.The Invention solves this problem by providing a connection system with the features of claim 1, 2 or 5, a semiconductor device package with the features of claim 22 and a wire bonding method with the features of claim 27.
Vorteilhafte Ausführungsformen der Erfindung sind in den Unteransprüchen angegeben.advantageous embodiments The invention are specified in the subclaims.
Gemäß der Erfindung beinhalten Leiterrahmen und Packungssubstrate Leitungen, Leitungsbondbereiche oder Bondfinger, die so angeordnet werden können, dass Bondkontaktstellenkonfigurationen mit gleichmäßigem Rastermaß selbst in den Eckbereichen des Einzelchips aufgenommen werden. Auf diese Weise kann das Auftreten von Kurzschlüssen zwischen benachbarten Bonddrähten reduziert oder eliminiert werden, und die Bauelement-Nettoeinzelchipanzahl während der Herstellung kann erhöht werden.In accordance with the invention, leadframes and package substrates include leads, lead bonds, or bonding fingers that may be arranged to accept even pitch bond pad configurations even in the corner regions of the die. In this way, the occurrence of short circuits between adjacent bonding wires can be reduced or eliminated, and the components The net single chip number during production can be increased.
Vorteilhafte, nachfolgend beschriebene Ausführungsformen der Erfindung und die zu deren besserem Verständnis oben beschriebenen herkömmlichen Ausführungsformen sind in den Zeichnungen dargestellt, in denen zeigen:Advantageous, Embodiments described below of the invention and the conventional ones described above for their better understanding embodiments are shown in the drawings, in which:
Eine
Mehrzahl von Verbindungsstegen
Das
gezeigte Beispiel beinhaltet 256 Leitungen
In
Die Liniensegmente L1 und L2 werden auf dem Fachgebiet als "Führungslinien" bezeichnet und können Liniensegmente beinhalten, die entlang gerader Linien liegen, oder können optional eine Serie von Liniensegmenten beinhalten, die unter verschiedenen Winkeln verlaufen. Alternativ können die Führungslinien entlang eines Segments einer Kurve, einer sinusförmigen oder "Spline"-Kurve oder eines Bogens, wie eines parabelförmigen, elliptischen oder kreisförmigen Bogens liegen. Der Ausdruck "Führungslinie", wie er hierin verwendet ist, umfasst diese und verschiedene andere Typen von Kurven und Liniensegmenten.The Line segments L1 and L2 are referred to in the art as "leader lines" and may be line segments include along straight lines, or may be optional include a series of line segments that are under different Angles go. Alternatively you can the guidelines along a segment of a curve, a sinusoidal or "spline" curve, or an arc, like a parabolic, elliptical or circular Bow lie. The term "leader" as used herein is, includes these and various other types of curves and Line segments.
Gemäß der Erfindung
ist das erste Liniensegment oder die erste Führungslinie von Bondbereichen
der Leitung
Die
erste und die zweite Führungslinie
sind außerdem
in dem Sinn diskontinuierlich, dass sie sich an ihren Endpunkten
nicht schneiden. Die äußerste Leitung
Die
Leitungen
Leitungen
der zweiten Gruppe
Eine
Orientierung des Bondbereichs der Leitung
Die übrigen Bondspitzen
Um
in dieser Konfiguration ein Drahtbonden zu erreichen, wird für die zum
Bonden der ersten Leitungsgruppe
Auf
diese Weise weisen alle Leitungen der ersten Gruppe
Zu
Die
Bondfinger
Wie
bei den vorstehend beschriebenen Leiterrahmen-Ausführungsformen
wird zum Erzielen einer Drahtbondverbindung in der vorliegen den
substratbasierten Konfiguration bewirkt, dass die zum Bonden der
ersten Durchkontaktgruppe
Auf diese Weise enthalten alle Leitungen der ersten Gruppe 1G und der zweiten Gruppe 2G Bondfinger, die relativ zu ihren zugehörigen Bondkontaktstellen so positioniert sind, dass sie innerhalb des maximal akzeptablen Bondwinkels der Packungs-/Einzelchipkombination liegen. Die Notwendigkeit zum Anwenden der Eckenregel auf den Einzelchip ist somit eliminiert, und eine maximale Verwendung der Bondkontaktstellen auf dem Einzelchip kann realisiert werden, und somit kann bewirkt werden, dass der Einzelchip eine kleinere Fläche aufweist. Gleichzeitig sind die Leitungen außerdem derart orientiert, dass die Längsachse des Segments, auf dem der Bondbereich auf der Leitung platziert ist, in Richtung der zugehörigen Bondkontaktstelle in einer "einander gegenüberliegenden" Konfiguration weist, was zu einer stärkeren Drahtleitungsbondverbindung führt, wie vorstehend beschrieben.On this way all lines of the first group 1G and the second group 2G bond fingers relative to their associated bond pads are positioned so that they are within the maximum acceptable Bond angles of the pack / single chip combination are. The need to apply the corner rule to the single chip is thus eliminated, and maximum use of bond pads on the single chip be realized, and thus can be effected that the single chip a smaller area having. At the same time, the lines are also oriented such that the longitudinal axis of the segment on which the bond area is placed on the line is, in the direction of the associated Bond contact point in a "each other opposite "configuration, what a stronger one Wireline bond leads, as described above.
Die
Ein
typischer Packungsprozess für
eine auf einem Leiterrahmen basierende Packung, wie die vorstehend
unter Bezugnahme auf
Während des Schritts des Drahtbondens gemäß der vorliegenden Erfindung wird eine Hochgeschwindigkeits-Drahtsteppmaschine verwendet. Eine Kapillare aus Golddraht wird durch ein Schweißbrennverfahren an der Zielbondkontaktstelle angebracht, wobei eine geschmolzene Materialkugel von einem ersten Ende des Drahts auf der Bondkontaktstelle aufgebracht wird und der Draht so geformt oder mit ihm eine Schleife gebildet wird, dass er sich zu dem Bondbereich der Leitung des Leiterrahmens oder dem Bondfinger des leitfähigen Pfades auf dem Substrat erstreckt. Das zweite Ende des Drahts wird durch eine Steppbondverbindung zum Beispiel unter Verwendung von Ultraschallbondtechniken rasch an den Bondbereich gebondet. Nach dem Bonden wird der Draht "abgezwickt" oder abgebrochen, und die nächste Bondprozedur beginnt.During the step of wire bonding according to the present invention, a high-speed wire-stitching machine is used. A capillary of gold wire is attached to the target bond pad by a welding process wherein a molten ball of material is applied from a first end of the wire to the bond pad and the wire is formed or looped with it to form the bond region of the lead of the lead Lead frame or the bonding finger of the conductive path on the Substrate extends. The second end of the wire is rapidly bonded to the bond area by a stitchbonded connection using, for example, ultrasonic bonding techniques. After bonding, the wire is "pinched off" or broken off and the next bonding procedure begins.
Während des Gießschritts wird zum Beispiel im Fall einer auf einem Leiterrahmen basierenden Packung eine EMC-Verbindung durch eine Gießöffnung mit einem hohen Druck, zum Beispiel 2 Tonnen/mm2, in das Komponentengebiet eingebracht. Wenn das Material die Gießform füllt, wird Luft durch Ecken der Gießform geblasen. Nach dem Härten der Gießform werden Leitungen außerhalb des Leiterrahmens getrimmt, zum Beispiel unter Verwendung eines Dambar-Prozesses. Die externen Leitungen werden dann plattiert, zum Beispiel unter Verwendung von SnPb- oder SnAgCu-Materialien. Während des Bildungsprozesses werden die freiliegenden, getrimmten und plattierten Leitungen zum Löten an eine Leiterplatte oder ein Substrat in eine geeignete Form stempelgepresst.For example, during the casting step, in the case of a leadframe-based package, an EMC bond is introduced into the component area through a high-pressure pouring port, for example, 2 tons / mm 2 . As the material fills the mold, air is blown through corners of the mold. After curing the mold, leads outside the leadframe are trimmed, for example, using a dambar process. The external leads are then plated, for example using SnPb or SnAgCu materials. During the formation process, the exposed, trimmed, and plated leads are die-stamped into a suitable shape for soldering to a printed circuit board or substrate.
Claims (28)
Applications Claiming Priority (4)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
KR1020040058070A KR100642748B1 (en) | 2004-07-24 | 2004-07-24 | Lead frame and package substrate, and package using the same |
KR10-2004-0058070 | 2004-07-24 | ||
US11/084529 | 2005-03-18 | ||
US11/084,529 US7566954B2 (en) | 2004-07-24 | 2005-03-18 | Bonding configurations for lead-frame-based and substrate-based semiconductor packages |
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DE102005035083A1 DE102005035083A1 (en) | 2006-03-16 |
DE102005035083B4 true DE102005035083B4 (en) | 2007-08-23 |
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DE102005035083A Active DE102005035083B4 (en) | 2004-07-24 | 2005-07-20 | Bond connection system, semiconductor device package and wire bonding method |
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JP2009200253A (en) * | 2008-02-21 | 2009-09-03 | Powertech Technology Inc | Semiconductor device |
JP6164895B2 (en) * | 2013-04-02 | 2017-07-19 | ルネサスエレクトロニクス株式会社 | Manufacturing method of semiconductor device |
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EP0015111B1 (en) * | 1979-02-23 | 1982-12-15 | AMP INCORPORATED (a New Jersey corporation) | Lead frame and housing for integrated circuit |
DE19704343A1 (en) * | 1997-02-05 | 1998-08-20 | Siemens Ag | Assembly method for semiconductor components |
US5923092A (en) * | 1996-06-13 | 1999-07-13 | Samsung Electronics, Co., Ltd. | Wiring between semiconductor integrated circuit chip electrode pads and a surrounding lead frame |
US5952710A (en) * | 1996-10-09 | 1999-09-14 | Oki Electric Industry Co., Ltd. | Semiconductor device and method of manufacturing same |
US20020140083A1 (en) * | 2001-03-27 | 2002-10-03 | Nec Corporation | Semiconductor device haivng resin-sealed area on circuit board thereof |
Family Cites Families (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS62185331A (en) * | 1986-02-10 | 1987-08-13 | Sumitomo Electric Ind Ltd | Semiconductor device |
JP3046630B2 (en) * | 1991-02-26 | 2000-05-29 | 株式会社日立製作所 | Semiconductor integrated circuit device |
JPH11284006A (en) * | 1998-03-31 | 1999-10-15 | Fujitsu Ltd | Semiconductor device |
JP2003264268A (en) * | 2002-03-08 | 2003-09-19 | Toshiba Corp | Semiconductor device and lead frame therefor |
-
2005
- 2005-07-20 DE DE102005035083A patent/DE102005035083B4/en active Active
- 2005-07-25 JP JP2005214783A patent/JP4699829B2/en active Active
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---|---|---|---|---|
EP0015111B1 (en) * | 1979-02-23 | 1982-12-15 | AMP INCORPORATED (a New Jersey corporation) | Lead frame and housing for integrated circuit |
US5923092A (en) * | 1996-06-13 | 1999-07-13 | Samsung Electronics, Co., Ltd. | Wiring between semiconductor integrated circuit chip electrode pads and a surrounding lead frame |
US5952710A (en) * | 1996-10-09 | 1999-09-14 | Oki Electric Industry Co., Ltd. | Semiconductor device and method of manufacturing same |
DE19704343A1 (en) * | 1997-02-05 | 1998-08-20 | Siemens Ag | Assembly method for semiconductor components |
US20020140083A1 (en) * | 2001-03-27 | 2002-10-03 | Nec Corporation | Semiconductor device haivng resin-sealed area on circuit board thereof |
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JP 62-185331 A. In: Pat. Abstr. of Japan |
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JP4699829B2 (en) | 2011-06-15 |
DE102005035083A1 (en) | 2006-03-16 |
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