DE10196442T1 - Bis (4-mercaptophenyl)sulfidderivate und Verfahren zur Herstellung derselben sowie elektronische Komponente - Google Patents
Bis (4-mercaptophenyl)sulfidderivate und Verfahren zur Herstellung derselben sowie elektronische KomponenteInfo
- Publication number
- DE10196442T1 DE10196442T1 DE10196442T DE10196442T DE10196442T1 DE 10196442 T1 DE10196442 T1 DE 10196442T1 DE 10196442 T DE10196442 T DE 10196442T DE 10196442 T DE10196442 T DE 10196442T DE 10196442 T1 DE10196442 T1 DE 10196442T1
- Authority
- DE
- Germany
- Prior art keywords
- mercaptophenyl
- bis
- producing
- same
- electronic component
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
- C07C323/00—Thiols, sulfides, hydropolysulfides or polysulfides substituted by halogen, oxygen or nitrogen atoms, or by sulfur atoms not being part of thio groups
- C07C323/10—Thiols, sulfides, hydropolysulfides or polysulfides substituted by halogen, oxygen or nitrogen atoms, or by sulfur atoms not being part of thio groups containing thio groups and singly-bound oxygen atoms bound to the same carbon skeleton
- C07C323/18—Thiols, sulfides, hydropolysulfides or polysulfides substituted by halogen, oxygen or nitrogen atoms, or by sulfur atoms not being part of thio groups containing thio groups and singly-bound oxygen atoms bound to the same carbon skeleton having the sulfur atom of at least one of the thio groups bound to a carbon atom of a six-membered aromatic ring of the carbon skeleton
- C07C323/19—Thiols, sulfides, hydropolysulfides or polysulfides substituted by halogen, oxygen or nitrogen atoms, or by sulfur atoms not being part of thio groups containing thio groups and singly-bound oxygen atoms bound to the same carbon skeleton having the sulfur atom of at least one of the thio groups bound to a carbon atom of a six-membered aromatic ring of the carbon skeleton with singly-bound oxygen atoms bound to acyclic carbon atoms of the carbon skeleton
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01C—RESISTORS
- H01C7/00—Non-adjustable resistors formed as one or more layers or coatings; Non-adjustable resistors made from powdered conducting material or powdered semi-conducting material with or without insulating material
- H01C7/003—Thick film resistors
- H01C7/005—Polymer thick films
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
- C07C323/00—Thiols, sulfides, hydropolysulfides or polysulfides substituted by halogen, oxygen or nitrogen atoms, or by sulfur atoms not being part of thio groups
- C07C323/10—Thiols, sulfides, hydropolysulfides or polysulfides substituted by halogen, oxygen or nitrogen atoms, or by sulfur atoms not being part of thio groups containing thio groups and singly-bound oxygen atoms bound to the same carbon skeleton
- C07C323/11—Thiols, sulfides, hydropolysulfides or polysulfides substituted by halogen, oxygen or nitrogen atoms, or by sulfur atoms not being part of thio groups containing thio groups and singly-bound oxygen atoms bound to the same carbon skeleton having the sulfur atoms of the thio groups bound to acyclic carbon atoms of the carbon skeleton
- C07C323/12—Thiols, sulfides, hydropolysulfides or polysulfides substituted by halogen, oxygen or nitrogen atoms, or by sulfur atoms not being part of thio groups containing thio groups and singly-bound oxygen atoms bound to the same carbon skeleton having the sulfur atoms of the thio groups bound to acyclic carbon atoms of the carbon skeleton the carbon skeleton being acyclic and saturated
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F22/00—Homopolymers and copolymers of compounds having one or more unsaturated aliphatic radicals each having only one carbon-to-carbon double bond, and at least one being terminated by a carboxyl radical and containing at least one other carboxyl radical in the molecule; Salts, anhydrides, esters, amides, imides or nitriles thereof
- C08F22/10—Esters
- C08F22/12—Esters of phenols or saturated alcohols
- C08F22/24—Esters containing sulfur
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01B—CABLES; CONDUCTORS; INSULATORS; SELECTION OF MATERIALS FOR THEIR CONDUCTIVE, INSULATING OR DIELECTRIC PROPERTIES
- H01B3/00—Insulators or insulating bodies characterised by the insulating materials; Selection of materials for their insulating or dielectric properties
- H01B3/18—Insulators or insulating bodies characterised by the insulating materials; Selection of materials for their insulating or dielectric properties mainly consisting of organic substances
- H01B3/30—Insulators or insulating bodies characterised by the insulating materials; Selection of materials for their insulating or dielectric properties mainly consisting of organic substances plastics; resins; waxes
- H01B3/301—Macromolecular compounds obtained by reactions forming a linkage containing sulfur with or without nitrogen, oxygen or carbon in the main chain of the macromolecule, not provided for in group H01B3/302
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01B—CABLES; CONDUCTORS; INSULATORS; SELECTION OF MATERIALS FOR THEIR CONDUCTIVE, INSULATING OR DIELECTRIC PROPERTIES
- H01B3/00—Insulators or insulating bodies characterised by the insulating materials; Selection of materials for their insulating or dielectric properties
- H01B3/18—Insulators or insulating bodies characterised by the insulating materials; Selection of materials for their insulating or dielectric properties mainly consisting of organic substances
- H01B3/30—Insulators or insulating bodies characterised by the insulating materials; Selection of materials for their insulating or dielectric properties mainly consisting of organic substances plastics; resins; waxes
- H01B3/44—Insulators or insulating bodies characterised by the insulating materials; Selection of materials for their insulating or dielectric properties mainly consisting of organic substances plastics; resins; waxes vinyl resins; acrylic resins
- H01B3/442—Insulators or insulating bodies characterised by the insulating materials; Selection of materials for their insulating or dielectric properties mainly consisting of organic substances plastics; resins; waxes vinyl resins; acrylic resins from aromatic vinyl compounds
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01C—RESISTORS
- H01C17/00—Apparatus or processes specially adapted for manufacturing resistors
- H01C17/06—Apparatus or processes specially adapted for manufacturing resistors adapted for coating resistive material on a base
- H01C17/065—Apparatus or processes specially adapted for manufacturing resistors adapted for coating resistive material on a base by thick film techniques, e.g. serigraphy
- H01C17/06506—Precursor compositions therefor, e.g. pastes, inks, glass frits
- H01C17/06573—Precursor compositions therefor, e.g. pastes, inks, glass frits characterised by the permanent binder
- H01C17/06586—Precursor compositions therefor, e.g. pastes, inks, glass frits characterised by the permanent binder composed of organic material
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01G—CAPACITORS; CAPACITORS, RECTIFIERS, DETECTORS, SWITCHING DEVICES OR LIGHT-SENSITIVE DEVICES, OF THE ELECTROLYTIC TYPE
- H01G4/00—Fixed capacitors; Processes of their manufacture
- H01G4/002—Details
- H01G4/018—Dielectrics
- H01G4/06—Solid dielectrics
- H01G4/14—Organic dielectrics
- H01G4/18—Organic dielectrics of synthetic material, e.g. derivatives of cellulose
Applications Claiming Priority (5)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2000-222712 | 2000-07-24 | ||
JP2000-222713 | 2000-07-24 | ||
JP2000222713A JP3441425B2 (ja) | 2000-07-24 | 2000-07-24 | コンデンサ |
JP2000222712A JP2002037770A (ja) | 2000-07-24 | 2000-07-24 | ビス(4−メルカプトフェニル)スルフィド誘導体およびその製造方法 |
PCT/JP2001/006315 WO2002008180A1 (fr) | 2000-07-24 | 2001-07-23 | Derives de sulfure de bis(4-mercaptophenyle), son procede de preparation et composants electroniques |
Publications (2)
Publication Number | Publication Date |
---|---|
DE10196442T1 true DE10196442T1 (de) | 2003-07-10 |
DE10196442B4 DE10196442B4 (de) | 2011-03-31 |
Family
ID=26596572
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
DE10196442T Expired - Fee Related DE10196442B4 (de) | 2000-07-24 | 2001-07-23 | Elektronische Komponente mit einem dielektrischen Film aus wenigstens einem Bis(4-mercaptophenyl)-sulfidderivat |
Country Status (8)
Country | Link |
---|---|
US (1) | US7006344B2 (de) |
KR (1) | KR100556214B1 (de) |
CN (1) | CN1214005C (de) |
DE (1) | DE10196442B4 (de) |
GB (1) | GB2388840B (de) |
MY (1) | MY141740A (de) |
TW (1) | TWI245034B (de) |
WO (1) | WO2002008180A1 (de) |
Families Citing this family (10)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
WO2008101806A2 (en) * | 2007-02-20 | 2008-08-28 | Basf Se | High refractive index monomers, compositions and uses thereof |
CN102385985A (zh) * | 2011-08-05 | 2012-03-21 | 贵州大学 | 金属薄膜电容及其制备方法 |
SG11201507619PA (en) | 2013-03-15 | 2015-10-29 | Ct For Drug Res And Dev | Cytotoxic and anti-mitotic compounds, and methods of using the same |
CN106255513B (zh) | 2013-12-27 | 2022-01-14 | 酵活有限公司 | 用于药物偶联物的含磺酰胺连接系统 |
CA2960899C (en) | 2014-09-17 | 2021-08-17 | Zymeworks Inc. | Cytotoxic and anti-mitotic compounds, and methods of using the same |
JP6005313B1 (ja) * | 2016-02-10 | 2016-10-12 | 古河電気工業株式会社 | 導電性接着フィルムおよびこれを用いたダイシング・ダイボンディングフィルム |
JP6005312B1 (ja) | 2016-02-10 | 2016-10-12 | 古河電気工業株式会社 | 導電性接着フィルムおよびこれを用いたダイシング・ダイボンディングフィルム |
JP5989928B1 (ja) | 2016-02-10 | 2016-09-07 | 古河電気工業株式会社 | 導電性接着フィルムおよびこれを用いたダイシング・ダイボンディングフィルム |
JP5972489B1 (ja) | 2016-02-10 | 2016-08-17 | 古河電気工業株式会社 | 導電性接着フィルムおよびこれを用いたダイシング・ダイボンディングフィルム |
JP5972490B1 (ja) | 2016-02-10 | 2016-08-17 | 古河電気工業株式会社 | 導電性接着剤組成物ならびにこれを用いた導電性接着フィルムおよびダイシング・ダイボンディングフィルム |
Family Cites Families (32)
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US2636022A (en) * | 1950-09-14 | 1953-04-21 | Sprague Electric Co | Dielectric compositions |
US4046744A (en) * | 1976-07-28 | 1977-09-06 | Rohm And Haas Company | Thermosetting coatings based on ketoxime-blocked isocyanates and oxazolidines |
JPS57187327A (en) | 1981-05-13 | 1982-11-18 | Toray Ind Inc | Poly-p-phenylene sulfide film |
EP0147696B1 (de) | 1983-12-19 | 1991-07-10 | SPECTRUM CONTROL, INC. (a Pennsylvania corporation) | Miniaturisierter monolithischer Mehrschichtkondensator sowie Gerät und Verfahren zur Herstellung |
US5125138A (en) * | 1983-12-19 | 1992-06-30 | Spectrum Control, Inc. | Miniaturized monolithic multi-layer capacitor and apparatus and method for making same |
JPS61272917A (ja) * | 1985-05-29 | 1986-12-03 | 東レ株式会社 | コンデンサ |
JPS6331929A (ja) | 1986-07-25 | 1988-02-10 | Toshiba Corp | 部品の間歇供給装置 |
US5013823A (en) * | 1988-12-02 | 1991-05-07 | Kureha Kagaku Kogyo K.K. | Poly(arylene sulfide) sheet and production process thereof |
JPH02247212A (ja) | 1989-03-20 | 1990-10-03 | Showa Denko Kk | 硬化性組成物 |
JPH02258819A (ja) | 1989-03-31 | 1990-10-19 | Showa Denko Kk | 新規な重合性単量体 |
US5191061A (en) * | 1990-10-24 | 1993-03-02 | Misubishi Petrochemical Co., Ltd. | Resin for high-refraction lens containing a sulfur-containing aromatic(meth)acrylate and a mercapto compound |
JPH06151652A (ja) | 1992-11-16 | 1994-05-31 | Nitto Denko Corp | 半導体装置 |
JPH06291346A (ja) | 1993-04-02 | 1994-10-18 | Toray Ind Inc | 光起電力素子 |
US5859145A (en) * | 1993-07-13 | 1999-01-12 | Chevron Chemical Company | Compositions having ethylenic backbone and benzylic, allylic, or ether-containing side-chains, oxygen scavenging compositions containing same, and process for making these compositions by esterification or transesterification of a polymer melt |
EP0952466A3 (de) * | 1994-10-18 | 2000-05-03 | Mitsubishi Rayon Co., Ltd. | Linsenrasterscheibe |
JP3557012B2 (ja) * | 1994-11-01 | 2004-08-25 | 住友精化株式会社 | 硬化性樹脂組成物 |
JPH08157320A (ja) | 1994-12-06 | 1996-06-18 | Mitsui Toatsu Chem Inc | 歯科用材料及び歯科用樹脂組成物 |
US5880170A (en) * | 1996-03-13 | 1999-03-09 | Tokuyama Corporation | Photopolymerizable composition and transparent cured product thereof |
JP3509468B2 (ja) | 1996-05-31 | 2004-03-22 | 三菱化学株式会社 | 透明導電性シート |
JP3482815B2 (ja) | 1996-05-31 | 2004-01-06 | 三菱化学株式会社 | 透明導電性シート |
JPH1039111A (ja) * | 1996-07-22 | 1998-02-13 | Nippon Sheet Glass Co Ltd | 平板型マイクロレンズ |
JPH10151676A (ja) | 1996-11-25 | 1998-06-09 | Mitsubishi Chem Corp | 光硬化させた架橋樹脂シートの切断方法 |
JP3391677B2 (ja) | 1997-11-18 | 2003-03-31 | 松下電器産業株式会社 | 積層体及びコンデンサ |
JPH11322897A (ja) | 1998-05-20 | 1999-11-26 | Nippon Kayaku Co Ltd | 光カチオン重合性エポキシ樹脂系固形組成物及び物品 |
JP2000218738A (ja) | 1999-02-01 | 2000-08-08 | Toray Ind Inc | 二軸配向ポリフェニレンスルフィド積層フィルムおよびそれを用いてなるコンデンサ |
JP3785012B2 (ja) | 1999-03-24 | 2006-06-14 | 富士通株式会社 | 感光性高誘電体組成物、その組成物からなる感光性高誘電体膜のパターン形成方法、及びその組成物を用いて製造したコンデンサ内蔵型多層回路基板 |
JP2001064364A (ja) | 1999-08-26 | 2001-03-13 | Hitachi Chem Co Ltd | 封止用エポキシ樹脂成形材料及び電子部品装置 |
JP2001064363A (ja) | 1999-08-26 | 2001-03-13 | Hitachi Chem Co Ltd | 封止用エポキシ樹脂成形材料及び電子部品装置 |
JP2001310911A (ja) * | 2000-04-28 | 2001-11-06 | Sumitomo Seika Chem Co Ltd | 誘電体形成物質及び誘電体フィルム |
JP2002020508A (ja) | 2000-07-04 | 2002-01-23 | Toray Ind Inc | ポリフェニレンスルフィドフィルムおよびコンデンサー |
JP2002037770A (ja) | 2000-07-24 | 2002-02-06 | Matsushita Electric Ind Co Ltd | ビス(4−メルカプトフェニル)スルフィド誘導体およびその製造方法 |
US6541591B2 (en) * | 2000-12-21 | 2003-04-01 | 3M Innovative Properties Company | High refractive index microreplication resin from naphthyloxyalkylmethacrylates or naphthyloxyacrylates polymers |
-
2001
- 2001-07-20 TW TW090117780A patent/TWI245034B/zh not_active IP Right Cessation
- 2001-07-23 US US10/332,548 patent/US7006344B2/en not_active Expired - Lifetime
- 2001-07-23 CN CNB018159621A patent/CN1214005C/zh not_active Expired - Fee Related
- 2001-07-23 GB GB0303935A patent/GB2388840B/en not_active Expired - Fee Related
- 2001-07-23 KR KR1020037001024A patent/KR100556214B1/ko not_active IP Right Cessation
- 2001-07-23 DE DE10196442T patent/DE10196442B4/de not_active Expired - Fee Related
- 2001-07-23 WO PCT/JP2001/006315 patent/WO2002008180A1/ja active IP Right Grant
- 2001-07-24 MY MYPI20013497A patent/MY141740A/en unknown
Also Published As
Publication number | Publication date |
---|---|
GB2388840B (en) | 2004-09-08 |
KR20030029634A (ko) | 2003-04-14 |
TWI245034B (en) | 2005-12-11 |
CN1461296A (zh) | 2003-12-10 |
US7006344B2 (en) | 2006-02-28 |
CN1214005C (zh) | 2005-08-10 |
US20030189808A1 (en) | 2003-10-09 |
KR100556214B1 (ko) | 2006-03-03 |
GB0303935D0 (en) | 2003-03-26 |
DE10196442B4 (de) | 2011-03-31 |
WO2002008180A1 (fr) | 2002-01-31 |
GB2388840A (en) | 2003-11-26 |
MY141740A (en) | 2010-06-15 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
8110 | Request for examination paragraph 44 | ||
8127 | New person/name/address of the applicant |
Owner name: PANASONIC CORP., KADOMA, OSAKA, JP |
|
R020 | Patent grant now final | ||
R020 | Patent grant now final |
Effective date: 20110817 |
|
R119 | Application deemed withdrawn, or ip right lapsed, due to non-payment of renewal fee | ||
R119 | Application deemed withdrawn, or ip right lapsed, due to non-payment of renewal fee |
Effective date: 20150203 |