CN1893000B - Method for manufacturing semiconductor device - Google Patents
Method for manufacturing semiconductor device Download PDFInfo
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- CN1893000B CN1893000B CN2006100997241A CN200610099724A CN1893000B CN 1893000 B CN1893000 B CN 1893000B CN 2006100997241 A CN2006100997241 A CN 2006100997241A CN 200610099724 A CN200610099724 A CN 200610099724A CN 1893000 B CN1893000 B CN 1893000B
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Abstract
The invention relates to a method of manufacturing semiconductor device, which includes steps: forming a crystal semiconductor film on substrate with insulation surface; forming a silicon dioxide containing grid insulation film on the crystal semiconductor film by tetraethoxy silicone; forming grid electrode which is near the crystal semiconductor film, wherein the grid insulation film inserts between the crystal semiconductor film and the grid electrode, the grid electrode contains one material selected form a group consists of tantalum, titanium, tungsten, molybdenum and silicon; introducing impurity element to the crystal semiconductor film by the grid insulation film for forming at least one impurity region in the crystal semiconductor film.
Description
The application is dividing an application of application number is 200410035166.3, the applying date is on March 12nd, 1994 original bill application, and the first of this original bill is JP93-78997 in first to file, and the first applying date formerly is on March 12nd, 1993.
Technical field
The present invention relates to a kind of thin-film transistor (TFT) and manufacturing approach thereof.Can be made on the dielectric substrate such as glass according to thin-film transistor of the present invention, also can be made in as on the substrate of processing by crystalline silicon.Particularly the present invention relates to a kind of thin-film transistor of making through processing steps such as crystallization and thermal annealing activation.
Background technology
Recently, the insulated-gate semiconductor device that comprises a dielectric substrate and be provided with a film active layer (also being referred to as active area sometimes) has above that been carried out research effectively.Particularly, be that great effort has been paid in the research of usually said thin-film transistor (TFT) to the film-type gated transistor.A plurality of TFT are made on the transparent dielectric substrate, mainly are in order to come gating matrix to drive each pixel or the drive circuit of display unit with them.Semi-conductive material and the state used according to TFT can be divided into non-crystalline silicon tft and silicon metal TFT with TFT.
In above-mentioned many TFT, the manufacturing of amorphous TFT can stand the high-temperature technology process.Amorphous TFT drops into practicality already, because when manufacturing them on the large tracts of land substrate, its rate of finished products is high.General inverted ladder type (also the being referred to as bottom gate type) non-crystalline silicon tft that in the non-crystalline silicon tft of reality, adopts.The gate electrode of this type of non-crystalline silicon tft is located at the below of active area.
The processing step of making existing TFT comprises: on a substrate, form a gate electrode; Formation is as the amorphous silicon film and the active layer of gate insulating film; And on amorphous silicon film, form the fine and closely woven silicon fiml of a N type crystallization, so that source and drain region to be set.Yet, owing to the corrosion rate of N type silicon fiml and the amorphous silicon film that is provided with as substrate much at one, so the extra step of this technological requirement for example is provided with a corrosion stop layer and similar layer.
As a kind of measure that overcomes the problems referred to above, a kind of ion doping technology that is used for is provided, high-speed ion directly is injected into the method in formation source and leakage in the amorphous silicon film.
But this method still has unsatisfactory part, because the crystallinity of the ion implanted region that it produces is by obviously damage.The conductivity in these districts is low, thereby still is inappropriate for practicality.Once propose yet, with laser beam and similar luminous energy these districts are annealed, increasing its crystallinity, yet this method is not suitable for batch process.
Present actual useful method is the method that makes recrystallized amorphous siliconization by heating.But this method requires the annealing 600 ℃ or above temperature.Thereby owing to this technology of problem of substrate also is out of favour.More particularly, the alkali-free glass substrate that generally is used for non-crystalline silicon tft promptly begins distortion (like Corning#7059 glass substrate softening point at 593 ℃) under 600 ℃ or lower temperature.600 ℃ annealing glass substrate is shunk or distortion.
And 600 ℃ annealing can damage the characteristic of the previous amorphous silicon of making at low temperatures.More particularly, make active area also stand the crystallization at 600 ℃, and completely lost favourable characteristic, promptly non-crystalline silicon tft no longer has the characteristic of its low-leakage current.This problem requires crystallization process more carrying out (preferably in 50 ℃ of deformation temperatures that is lower than glass or lower again temperature) under the low temperature.
Generally, be in amorphous semiconductor and have low electric field mobility.Thereby they can not be used for the TFT of requirement working at high speed.And the electric field mobility of P type amorphous silicon is extremely low.This just makes the manufacturing of P ditch TFT (PMOS TFT) unworkable.Infer the MOS circuit that can not get complementation with this, because for realizing that CMOS must combine with N ditch TFT (NMOS TFT) by P ditch TFT.
Compare with amorphous semiconductor, crystalline semiconductor has higher electric field mobility, thereby is applicable to the TFT of working at high speed.Being also advantageous in that of silicon metal made cmos circuit easily with it, because can not only obtain NMOS TFT by silicon metal, and can also obtain PMOS TFT.Therefore a kind of LCD with the driven with active matrix that is called single chip architecture is proposed, not only in the active matrix part, and at the crystal TFT composition of peripheral circuit (for example drive circuit) by CMOS.Owing to these reasons, make to research and the exploitation of the TFT that uses silicon metal more active recently.
Can obtain silicon metal to amorphous silicon with the high light irradiation that laser or light intensity equate.Yet this technology is inappropriate for batch process; And unstable, because laser output itself is just unstable, also because technical process is too short.
A kind of practicable technology that makes recrystallized amorphous siliconization is to adopt heat treatment, i.e. thermal crystallization recently.This technology can be produced the uniform silicon metal of quality, no matter in batches how.But this technology still has problems, and waits to solve.
Generally, thermal crystallization requires to implement annealing for a long time at about 600 ℃, or up to 1000 ℃ of temperature, or even higher annealing temperature.The back is planted the feasible selection to backing material of technology and is narrowed down, because it can not be applied to the substrate except that quartz substrate, aforesaid processing also has other problems.
Specifically, the technical process of using cheap alkali-free glass substrate (like the Corning#7059 glass substrate) to make TFT comprises:
Deposit one deck amorphous silicon film on substrate;
600 ℃ or higher temperature through 24 hours or chien shih amorphous silicon film crystallization when longer;
Deposit one deck gate insulating film;
Form gate electrode;
Introduce impurity (injecting or ion doping) with ion;
Make the impurity activation of mixing 600 ℃ or higher temperature through 24 hours or longer time annealing;
Form interlevel insulator; And
Formation source and drain region.
In above-mentioned processing step, find that the 6th step was a problem the impurity activation of mixing most.(softening temperature like Corning#7059 glass is 593 ℃) can distortion near 600 ℃ for most of alkali-free glasss.This just means, must consider the contraction of substrate in this step.In second step, i.e. annealing steps, the contraction of substrate is unchallenged, because also on substrate, do not constitute figure.Yet in the 6th step, forming circuit figure on substrate if substrate shrinks, can not carry out mask alignment in several steps of back.This obviously can reduce rate of finished products.This just requires to carry out for the 6th step at a lower temperature, is preferably in than carries out under glass deformation temperature low 50 ℃ or lower again the temperature.
As previously mentioned, use laser can reduce technological temperature.But the poor reliability of this technology because not only laser is unstable, but also since by the position of laser irradiation (source and drain region) with not by the different stress that produce of temperature rise between the position of laser irradiation (active area is the zone below the gate electrode).
Summary of the invention
Thereby use laser to make TFT to be difficult, not find as yet that at present other effective measures overcome these problems.The present invention provides a kind of solution for above-mentioned difficulties.The purpose that is the present invention is to propose a kind of technology that overcomes the problems referred to above and be suitable for producing in batches.
As the result of present inventors' broad research, the crystallization that discovery is essentially the silicon fiml of amorphous can be accelerated by adding micro-catalysis material.According to said method, crystallization can be accomplished in the short time in lower temperature.Preferred catalysis material comprises some simple metal promptly: nickel (Ni), iron (Fe), cobalt (Co) and platinum (Pt), or a kind of compound, and like the silicide of the cited element of this paper.Specifically; Technology according to the present invention comprises: on the amorphous silicon film or under and with it contact form a kind of material that contains the catalytic elements of shapes such as film, particle, agglomerate; And in a suitable temperature; Generally at 580 ℃ or low again, be preferably in 550 ℃ or lowlyer again the material thermal annealings of formation are made it crystallization.Another kind method is, needn't form a kind of material that catalytic elements contacts with amorphous silicon film that contains, and replaces to use such as methods such as ion injections catalytic elements is mixed amorphous silicon film.
Certainly, improve the cycle that the temperature of annealing can shorten crystallization.And, along with the increase of nickel, iron, cobalt or platinum concentration shortened in the cycle of crystallization, the temperature step-down of crystallization.Through deep research, present inventors find, at least a above-mentioned catalytic elements mix concentration 1 * 10
17Cm
-3More than can quicken crystallization, its concentration is preferably in 5 * 10
18Cm
-3Or it is higher.
But above-listed each catalysis material is unfavorable to silicon.Thereby, preferably its concentration is controlled to alap level.Through research, present inventors find that the preferable range of total concentration is 1 * 10
20Cm
-3Or it is low again.Particularly, at active layer, the concentration of catalysis material must control to 1 * 10
18Cm
-3Or below, be preferably lower than 1 * 10
17Cm
-3, be lower than 1 * 10
16Cm
-3Then better.
Description of drawings
Fig. 1 (A)-1 (E) schematically illustrates the resulting sequenced section of structure of technology by one embodiment of the invention (embodiment 1);
Fig. 2 (A)-2 (E) schematically illustrates the resulting sequenced section of structure of technology by another embodiment of the present invention (embodiment 2);
Fig. 3 (A)-3 (E) schematically illustrate by the technology of another embodiment of the present invention (embodiment 3) the sequenced section of structure that arrived; And
Fig. 4 (A)-4 (E) schematically illustrates the resulting sequenced section of structure of technology by another embodiment of the present invention (embodiment 4).
Embodiment
As previously mentioned, present inventors have noticed the effect of catalytic elements, and find to utilize these yuan usually to overcome the problem in the prior art technology.A kind of technology according to embodiment making TFT of the present invention comprises:
Form a gate electrode;
Deposit one gate insulating film;
Deposit one deck amorphous silicon film;
With ion injection or ion doping impurity is introduced in the amorphous silicon film;
On this silicon fiml, form the material film that contains a kind of catalytic elements;
In heat treatment below 500 ℃ or 550 ℃ no longer than making the impurity activation of mixing in 8 hours; And
Formation source and drain electrode.
A kind of technology by another embodiment of the present invention comprises:
Form a gate electrode;
Deposit one deck gate insulating film;
Deposit one deck amorphous silicon film;
With ion injection or ion doping impurity is introduced amorphous silicon film;
With ion injection or ion doping catalytic elements is introduced this silicon fiml;
At 550 ℃ or be lower than 550 ℃ of heat treatments no longer than making the impurity activation of mixing in 8 hours; And
Formation source and drain electrode.
In above-mentioned processing step, the order in the 4th step and a step thereafter is interconvertible.That is, the doping step both can also can carried out thereafter before introducing the catalytic elements step.It mainly is the crystallization that the catalytic elements in introducing source and drain region has been quickened this two district significantly.Therefore be enough to can accomplish activation 550 ℃ or following temperature, generally at 500 ℃ or hang down a little temperature again and carry out.Annealing 8 hours or shorter, generally is annealing 4 hours or shorter enough.Particularly, find that crystallization carries out extremely rapidly when with ion injection or ion doping catalytic elements being introduced silicon fiml, because find that element is to be evenly distributed in the silicon fiml.
In doping impurity, can use mask that catalytic elements is mixed in the silicon fiml.Press self-aligned manner, shine behind from gate electrode and can obtain this mask.
Another kind of technology of making TFT by another embodiment of the present invention comprises:
Deposit one deck amorphous silicon film;
Amorphous silicon film 600 ℃ or the heating of temperature more than it 24 hours or longer, is made its crystallization;
Deposit one deck gate insulating film;
Form a gate electrode;
With ion injection or ion doping impurity is introduced amorphous silicon film;
Deposit one deck contains a kind of film of catalytic elements on silicon fiml;
600 ℃ or its following heat treatment no longer than making the impurity activation of mixing in 8 hours;
Form interlevel insulator; And
Formation source and drain electrode.
Another technology of making TFT by an embodiment of the present invention comprises:
Deposit one deck amorphous silicon film;
600 ℃ or more than it with amorphous silicon film heating 24 hours or longer, make its crystallization;
Deposit one deck gate insulating film;
Form a gate electrode;
With ion injection or ion doping impurity is introduced amorphous silicon film;
With ion injection or ion doping a kind of catalytic elements is introduced this silicon fiml;
600 ℃ or its following heat treatment no longer than making the impurity activation of mixing in 8 hours;
Form interlevel insulator; And
Formation source and drain electrode.
In above-mentioned processing step, the 5th step and its, next step order can be put upside down.That is doping step, both can also can carried out thereafter before introducing the catalytic elements step.It mainly is the crystallization that the catalytic elements in introducing source and drain region has been quickened this two district significantly.Thereby, at 600 ℃ or be enough to below it activate, generally at 550 ℃ or below it.As far as annealing, 8 hours or short, generally with 4 hours or shorter enough.Particularly, when catalytic elements being introduced silicon fiml, find that crystallization carries out extremely rapidly, because find that element is evenly distributed in the silicon fiml with ion injection or ion doping.
Being characterised in that of technology of the present invention, this technology comprise, add the disadvantageous catalytic elements of silicon, but are forced into extremely low-level 1 * 10 in the concentration of active area
18Cm
-3Or below it.That is, all aforementioned technologies include, and when mixing, are that active area provides a mask or gate electrode.Thereby catalytic elements can directly not touch or inject into active area.And keep reliability and the characteristic of TFT not to be weakened.Particularly, with Ni mix its concentration of impurity range be 10 times of active area or more than, set annealing temperature and time more according to qualifications, impurity range is activated and keeps amorphous state simultaneously.Because annealing is accomplished, can not run into the temperature difference that occurs in the laser annealing under heat balance.
The infinite embodiment of following reference does more detailed explanation to the present invention.But should be appreciated that this non-limitation of the present invention.
Fig. 1 representes by the resulting section of structure by the step preface of the technology of one embodiment of the invention.With reference to Fig. 1; On Corning#705 9 glass substrate 1, forming a layer thickness is 3000-8000
tantalum film; And the formation figure, form gate electrode 2.Then; With the anodic oxidation of tantalum film surface, formation thickness be 1000-3000
for example 2000
anode oxide film 3.Then deposited by plasma CVD to a thickness of 1000-5000
For example 1500
silicon nitride film 4.Followed by plasma CVD was deposited thereon to a thickness of 200-1500
eg 500
The intrinsic (I-type) amorphous silicon film.The amorphous silicon film composition that obtains is at last obtained semiconductor regions 5, shown in Fig. 1 (A).
Resultant substrate surface is covered with photoresist, and from the substrate back exposure, to form the mask 6 consistent with gate electrode figure, shown in Fig. 1 (B).
Use ion doping, use resulting mask 6, phosphorus is injected semiconductor region 5 as impurity.With hydrogen phosphide (PH
3) carrying out ion doping as impurity gas, used accelerating voltage is at 60-90KV, 80KV for example, used dosage is 1 * 10
15-8 * 10
15Cm
-2Scope.In the case, the dosage that mixes of phosphorus is 2 * 10
15Cm
-2Form N type impurity range 7a and 7b with the method, shown in Fig. 1 (C).
Then, injecting nickel with mask 6 through ion doping has left.Used dosage is 2 * 10
13-2 * 10
14Cm
-2, more particularly for example be 5 * 10
13Cm
-2Its result finds the concentration about 5 * 10 of nickel in N type impurity range 26a and 26b
18Cm
-3So just obtained the structure shown in strength 1 (D).
Then, with resulting structures in containing the nitrogen atmosphere that partial pressure is preferably the atmospheric hydrogen of 0.1-1 500 ℃ of annealing 4 hours.With the method activator impurity.Because nickel ion is injected into impurity range in advance, because nickel, finds that the crystallization in these zones has been accelerated to the catalytic action of crystallization.Impurity range 7a and 7b have so just been activated.
Use the thick silicon oxide film 8 of plasma CVD deposit 3000
subsequently; As interlevel insulator; Form contact hole above that with more source and the drain region of TFT; With the multilayer film of metal-containing material such as titanium nitride and aluminium, set up the electrode of band interconnection 9a and 9b.This has just accomplished a complete thin-film transistor, shown in Fig. 1 (E).
Measure the impurity range of the TFT that makes by above-mentioned technology and the nickel concentration of active area with ion microprobe (SIMS).Recording impurity range, to contain nickel concentration be 1 * 10
18-5 * 10
18Cm
-3This detects the limit 1 * 10 with being lower than
16Cm
-3The concentration of active area form tangible contrast.
Fig. 2 representes with the resulting profile that respectively goes on foot the preface structure of an embodiment of the present invention.With reference to Fig. 2; On Corning#7059 glass substrate 11, form thickness and be 3000-8000
for example 5000
tantalum film, and composition forms gate electrode 12.Then; Use anode oxidation method, make the surface of tantalum film form thickness be 1000-3000
for example 2000
anode oxide film.Then, use the plasma CVD method deposition thickness as 1000-5000
for example be 1500
silicon nitride film 14.And then, use above that the plasma CVD deposition thickness as 200-1500
for example be in this example 500
intrinsic (I type) amorphous silicon film.With the amorphous silicon film composition that obtains to obtain semiconductor region 15, shown in Fig. 2 (
).
Lining one deck photoresist on the surface of gained substrate, from the back-exposure of substrate to form and the consistent mask 16 of gate electrode figure shown in Fig. 2 (B).
Through the ion doping method,, make impurity with phosphorus and inject semiconductor region 15 with the mask 16 of gained.With hydrogen phosphide (PH
3) make impurity gas completion ion doping, added accelerating voltage is for example used 80KV at 60-90KV, and dosage is 1 * 10
15-8 * 10
15Cm
-2Mixing the used dosage of phosphorus in this example is 2 * 10
15Cm
-2In this way, N type impurity range 17a and 17b have been formed, shown in Fig. 2 (C).
Then, use sputtering method deposition thickness on whole surface to be 5-200
For example 20
One deck nickel silicide film (be expressed as NiSi with chemical formula
x, X is 04-2.5 for example 2.0 here) and 18.Since resulting film be as thin as about 20
; It seems like some, and unlike continuous film.The outward appearance of film is so unimportant in this example.So just obtained the structure shown in Fig. 2 (D).
Then, resulting structures is annealed in hydrogeneous atmosphere, used temperature is 450 ℃, and 4 hours time, the partial pressure of hydrogen is preferably the 0.1-1 atmospheric pressure.In this way, activator impurity.Because nickel silicide film 18 is deposits in advance,, the crystallization of N type impurity range 17a and 17b is played catalyst action by its diffusion nickle atom.So just quickened the crystallization in these districts, impurity range 17a and 17b are activated.
Subsequently; With plasma CVD deposit one deck 3000
thick silicon oxide film 19 is as interlevel insulator; And form contact hole above that; So that be source and the drain region of TFT,, set up the electrode of band interconnection 20a and 20b with the multilayer film of metal-containing material such as titanium nitride and aluminium.This has just accomplished a complete thin-film transistor, shown in Fig. 2 (E).
Measure the impurity range of the TFT that makes by above-mentioned technology and the concentration of active area nickel with ion microprobe (SIMS).Recording impurity range, to contain nickel concentration be 1 * 10
18-3 * 10
18This with 1 * 10
16-5 * 10
16The active area concentration of scope becomes distinct contrast.
Embodiment 3
Fig. 3 representes with the prepared profile that respectively goes on foot the preface structure of the technology of another embodiment of the present invention.With reference to Fig. 3; On a Corning#7059 glass substrate 110, form the thick silicon oxide film 111 of one deck 2000
, as counterdie with sputtering method.Then; Use plasma CVD above that deposition thickness be 500-1500
, for example 1500
intrinsic (I type) amorphous silicon film.Then, in blanket of nitrogen, annealed 48 hours for 600 ℃, make the amorphous silicon film crystallization.After the annealing; Silicon fiml is constituted figure forms island silicon area 112, with the sputtering method silicon oxide film 113 that deposit one deck 1000
is thick above that as gate insulating film.Sputtering technology is in the atmosphere that contains oxygen and argon, to carry out with the target of silica as sputter, and argon is not higher than 0.5 to the ratio of oxygen, for example is below 0.1 or 0.1.In technical process, substrate temperature remains on 200-400 ℃, for example 350 ℃.
Then, use decompression CVD deposition thickness as 6000-8000
for example 6000
phosphorous silicon fiml as 0.1-2%.The step of silicon oxide deposition film step best and the deposit silicon fiml is carried out continuously.The silicon fiml composition of gained is formed gate electrode 114, shown in Fig. 3 (A).
Then, use plasma doping, make mask, phosphorus is introduced silicon area as impurity with gate electrode.With hydrogen phosphide (PH
3) as impurity gas, mix, used accelerating voltage is 60-90KV, for example is 80KV, used dosage is 1 * 10
15-8 * 10
15Cm
-2The phosphorus dosage that is mixed in the present embodiment is 2 * 10
15Cm
-2In this way, N type impurity range 115a and 115b have been formed, shown in Fig. 3 (B).
Silicon oxide film 113 on the corrosion impurity range uses the sputtering method deposition thickness to be 5-200 on whole surface to expose impurity range 115
, for example 20
Nickel silicide film (use chemical formula NiSi
xExpression, X is 0.4-2.5 here, for example 2.0) 116.Since the film of gained be approximately 20
thin; It seems like granule, unlike continuous film.In this example, the outward appearance of this film is so unimportant.So just obtained the structure shown in Fig. 3 (C).
Then, put into blanket of nitrogen to resulting structures and anneal 4 hours with activator impurity at 500 ℃.Because nickel diffuses into N type impurity range 115a and 115b from the nickel silicide film above that of deposit in advance, find to have quickened the generation of crystallization through annealing.In this way, impurity range 115a and 115b have been activated.Resulting structures is shown in Fig. 3 (D).
Then; With the thick silicon oxide film 117 of plasma CVD deposit 6000
as interlayer insulating film; Using metal-containing material to leave contact hole above that, is the source of TFT and the electrode that the drain region forms band interconnection 118a and 118b like the multilayer film of titanium nitride and aluminium.At last, resulting structures was annealed 30 minutes at 350 ℃ in 1 atmospheric nitrogen atmosphere.So just accomplished a complete thin-film transistor, shown in Fig. 3 (E).
Measure the source of the TFT that makes by above-mentioned technology and the concentration of drain region and active area nickel with ion microprobe (SIMS).The nickel concentration that contains in discovery source and drain region is 1 * 10
18-5 * 10
18Cm
-3This detects the limit 1 * 10 with being lower than
16Cm
-3The concentration of active area become striking contrast.
Fig. 4 representes with the prepared agent face figure that respectively goes on foot the preface structure of the technology of another embodiment of the present invention.With reference to Fig. 4; On a Corning#7059 glass substrate 29, form the thick silicon oxide film of one deck 2000
with sputtering method and make counterdie.Then; With plasma CVD deposit one deck intrinsic (I type) amorphous silicon film above that; Its thickness is in 500-1500
scope, for example 1500
.Then, in blanket of nitrogen,, make the amorphous silicon film crystallization 600 ℃ of annealing 48 hours.After the annealing, the silicon fiml composition is formed island silicon fiml 22.
Then, use plasma CVD, use tetrem oxosilane (TEOS, Si (OC
2H
5)
4) and oxygen as raw material deposit one deck 1000
The silicon oxide film of depositing 23 is as gate insulating film.So in the original gas material, add trichloroethylene.Before thin film deposition began, to the logical oxygen of reaction chamber, when total pressure is remained on 5Pa, underlayer temperature was 300 ℃ with the flow of 400SCCM (per minute standard cubic centimeter), and when applying the RF power of 150W, in reaction chamber, produced plasma.This state kept 10 minutes.Then, to be respectively 300SCCM, the flow of 15SCCM and 2SCCM feeds oxygen, TEOS and trichloroethylene to reaction chamber, the silicon oxide deposition film.During deposition film, make underlayer temperature, RF power and total pressure remain on 300 ℃, 75W and 5Pa respectively.When accomplishing thin film deposition, feeding pressure to reaction chamber is the hydrogen of 100Torr, to accomplish 350 ℃ hydrogen annealing 35 minutes.
Subsequently; With the sputtering method deposition thickness at 3000-8000
, for example be 6000
tantalum film.Can use titanium, tungsten, molybdenum or silicon to replace tantalum.Yet this film must have sufficiently high heat resistance, handles with the activation of withstanding afterwards.Two step depositing steps of silicon oxide film 23 and tantalum film preferably carry out continuously.The tantalum film composition is formed the gate electrode 24 of TFT.With tantalum film surface anodic oxidation, form oxide layer 25 in its surface again.Anodic oxidation is in the ethylene glycol solution of the Tartaric acid that contains 1-5%, to carry out.So obtain 2000
thick oxide layer, like Fig. 4 (A).
Use plasma doping with gate electrode as mask, phosphorus is injected silicon area as impurity.With hydrogen phosphide (PH
3) carry out doping process as impurity gas, used accelerating voltage 80KV.In this example, with 2 * 10
15Cm
-2Dosage mix phosphorus.In this way, N type impurity range 26a and 26b have been formed.Can see that the impurity range of setting up in this situation 26 has departed from gate electrode 24, shown in Fig. 4 (B).
Then, make mask with ion doping with gate electrode and inject nickel ion.Introduce the used dosage of nickel 2 * 10
13-2 * 10
14Cm
-2Scope, for example more specifically use 5 * 10
13Cm
-2Its result finds that the concentration of nickel in N type impurity range 26a6 and 26b is approximately 5 * 10
18Cm
-3So obtain the structure shown in Fig. 4 (C).
Then the structure of gained was annealed 4 hours at 500 ℃ in blanket of nitrogen, with activator impurity.Because nickel ion is injected into N type impurity range 26a and 26b in advance, find because nickel to the catalytic action of crystallization, has quickened the carrying out that recrystallizes in these zones.So impurity range 26a and 26b are activated.Resulting structures is shown in Fig. 4 (D).
Subsequently; Make raw material with TEOS; With the thick silicon oxide film 27 of plasma CVD deposit 2000
as interlevel insulator; Form contact hole above that, use the multilayer film of metal-containing material such as titanium nitride and aluminium to be the source of TFT and the electrode of drain region formation band interconnection 28a and 28b.So accomplished complete semiconductor circuit, shown in Fig. 4 (E).
Find the thin-film transistor of making like this, when gate voltage was 10V, its field-effect mobility was at 70-100cm
2/ Vs scope, when apply to grid-during 20V voltage, its threshold voltage is 2.5-4.0V, leakage current is 10
13A or lower.
The present invention with the impurity activation of mixing, has improved the output of thin-film transistor by in during 4 hours weak point under 500 ℃ low temperature.Thereby the present invention provides a kind of method that solves the prior art problem; Because in 600 ℃ or the high-temperature technology that carried out more than it; Run into the serious like this problem of glass substrate distortion, realized that under above-mentioned low like this temperature crystallization avoided glass substrate to shrink and crooked.
Above-named advantage of the present invention also comprises can the large-area substrate of single treatment.More particularly, be cut into a plurality of semiconductor circuits (like matrix circuit) by the large tracts of land substrate.Thereby can reduce the single cost of circuit significantly.When being applied to the production of LCD, can boost productivity and improve the performance of display according to technology of the present invention.By above-mentioned visible, the present invention can be widely used in commercial production.
Although at length narrated the present invention with reference to concrete embodiment, those skilled in the art should understand, and does not break away from spirit of the present invention and category and can carry out variation miscellaneous and remodeling.
Claims (12)
1. method of making semiconductor device may further comprise the steps:
On insulating surface, form amorphous silicon film;
Thereby make the amorphous silicon film crystallization form crystal silicon film;
Use tetrem oxosilane and oxygen on said crystal silicon film, to form silicon oxide film as gate insulating film;
On said gate insulating film, form gate electrode, said gate electrode comprises a kind of material of from the group that tantalum, titanium, tungsten, molybdenum and silicon constitute, selecting at least;
Pass said gate insulating film introducing impurity and in said crystal silicon film, form two impurity ranges;
With concentration at 1x10
17Cm
-3Above catalytic elements is introduced two impurity ranges;
On said gate electrode, form dielectric film;
Two contact holes of said dielectric film and said silicon oxide film are passed in formation; And
The multilayer film that utilization comprises metal material is that the electrode corresponding, the band interconnection in said two contact holes is passed in each formation in two impurity ranges.
2. method according to claim 1, wherein said impurity is phosphorus.
3. method according to claim 1, wherein said gate insulating film forms through plasma CVD.
4. method of making semiconductor device may further comprise the steps:
On insulating surface, form amorphous silicon film;
Thereby make the amorphous silicon film crystallization form crystal silicon film;
Use tetrem oxosilane and oxygen on said crystal silicon film, to form silicon oxide film as gate insulating film;
On said gate insulating film, form gate electrode, said gate electrode comprises a kind of material of from the group that tantalum, titanium, tungsten, molybdenum and silicon constitute, selecting at least;
Pass said gate insulating film introducing impurity and in said crystal silicon film, form two impurity ranges;
With concentration at 1x10
17Cm
-3Above catalytic elements is introduced two impurity ranges;
On said gate electrode, use the tetrem oxosilane to form dielectric film;
Two contact holes of said dielectric film and said silicon oxide film are passed in formation; And
The multilayer film that utilization comprises metal material is that the electrode corresponding, the band interconnection in said two contact holes is passed in each formation in two impurity ranges.
5. method according to claim 4, wherein said impurity is phosphorus.
6. method according to claim 4, wherein said gate insulating film forms through plasma CVD.
7. method of making semiconductor device may further comprise the steps:
On insulating surface, form amorphous silicon film;
Thereby make the amorphous silicon film crystallization form crystal silicon film;
Use tetrem oxosilane and oxygen on said crystal silicon film, to form silicon oxide film as gate insulating film;
On said gate insulating film, form gate electrode, said gate electrode comprises a kind of material of from the group that tantalum, titanium, tungsten, molybdenum and silicon constitute, selecting at least;
Pass said gate insulating film introducing impurity and in said crystal silicon film, form two impurity ranges;
With concentration at 1x10
17Cm
-3Above catalytic elements is introduced two impurity ranges;
In nitrogen atmosphere, introduce the said impurity in the said crystal silicon film through heat activation;
On said gate electrode, form dielectric film;
Two contact holes of said dielectric film and said silicon oxide film are passed in formation; And
The multilayer film that utilization comprises metal material is that the electrode corresponding, the band interconnection in said two contact holes is passed in each formation in two impurity ranges.
8. method according to claim 7, wherein said impurity is phosphorus.
9. method according to claim 7, wherein said gate insulating film forms through plasma CVD.
10. method of making semiconductor device may further comprise the steps:
On substrate, form first silicon oxide film,
On said first silicon oxide film, form amorphous silicon film;
Thereby make the amorphous silicon film crystallization form crystal silicon film;
Use tetrem oxosilane and oxygen on said crystal silicon film, to form second silicon oxide film as gate insulating film;
On said gate insulating film, form gate electrode, said gate electrode comprises a kind of material of from the group that tantalum, titanium, tungsten, molybdenum and silicon constitute, selecting at least;
Pass said gate insulating film introducing impurity and in said crystal silicon film, form two impurity ranges;
With concentration at 1x10
17Cm
-3Above catalytic elements is introduced two impurity ranges;
On said gate electrode, form dielectric film;
Two contact holes of said dielectric film and said second silicon oxide film are passed in formation; And
The multilayer film that utilization comprises metal material is that the electrode corresponding, the band interconnection in said two contact holes is passed in each formation in two impurity ranges.
11. method according to claim 10, wherein said impurity is phosphorus.
12. method according to claim 10, wherein said gate insulating film forms through plasma CVD.
Applications Claiming Priority (4)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP78998/1993 | 1993-03-12 | ||
| JP78997/1993 | 1993-03-12 | ||
| JP07899893A JP3637069B2 (en) | 1993-03-12 | 1993-03-12 | Method for manufacturing semiconductor device |
| JP05078997A JP3137797B2 (en) | 1993-03-12 | 1993-03-12 | Thin film transistor and manufacturing method thereof |
Related Parent Applications (2)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN2004100351663A Division CN1542929B (en) | 1993-03-12 | 1994-03-12 | Process for fabricating Semiconductor device |
| CN94104268A Division CN1095204C (en) | 1993-03-12 | 1994-03-12 | Transistor and process for fabricating the same |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| CN1893000A CN1893000A (en) | 2007-01-10 |
| CN1893000B true CN1893000B (en) | 2012-06-27 |
Family
ID=13677539
Family Applications (3)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN2006100997260A Expired - Fee Related CN1893001B (en) | 1993-03-12 | 1994-03-12 | Method for manufacturing semiconductor device |
| CN2006100997241A Expired - Lifetime CN1893000B (en) | 1993-03-12 | 1994-03-12 | Method for manufacturing semiconductor device |
| CN2006100997256A Expired - Lifetime CN1893118B (en) | 1993-03-12 | 1994-03-12 | Thin film transistor |
Family Applications Before (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN2006100997260A Expired - Fee Related CN1893001B (en) | 1993-03-12 | 1994-03-12 | Method for manufacturing semiconductor device |
Family Applications After (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN2006100997256A Expired - Lifetime CN1893118B (en) | 1993-03-12 | 1994-03-12 | Thin film transistor |
Country Status (2)
| Country | Link |
|---|---|
| JP (1) | JP3137797B2 (en) |
| CN (3) | CN1893001B (en) |
Families Citing this family (17)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP3255942B2 (en) * | 1991-06-19 | 2002-02-12 | 株式会社半導体エネルギー研究所 | Method for manufacturing inverted staggered thin film transistor |
| US5569936A (en) * | 1993-03-12 | 1996-10-29 | Semiconductor Energy Laboratory Co., Ltd. | Semiconductor device employing crystallization catalyst |
| JP3535205B2 (en) * | 1993-03-22 | 2004-06-07 | 株式会社半導体エネルギー研究所 | Method for manufacturing thin film transistor |
| US6884698B1 (en) | 1994-02-23 | 2005-04-26 | Semiconductor Energy Laboratory Co., Ltd. | Method for manufacturing semiconductor device with crystallization of amorphous silicon |
| JP3190520B2 (en) * | 1994-06-14 | 2001-07-23 | 株式会社半導体エネルギー研究所 | Semiconductor device and manufacturing method thereof |
| US6300659B1 (en) | 1994-09-30 | 2001-10-09 | Semiconductor Energy Laboratory Co., Ltd. | Thin-film transistor and fabrication method for same |
| US7075002B1 (en) | 1995-03-27 | 2006-07-11 | Semiconductor Energy Laboratory Company, Ltd. | Thin-film photoelectric conversion device and a method of manufacturing the same |
| US6541793B2 (en) | 1997-05-30 | 2003-04-01 | Semiconductor Energy Laboratory Co., Ltd. | Thin-film transistor and semiconductor device using thin-film transistors |
| JP3376247B2 (en) * | 1997-05-30 | 2003-02-10 | 株式会社半導体エネルギー研究所 | Thin film transistor and semiconductor device using thin film transistor |
| JP3844561B2 (en) | 1997-06-10 | 2006-11-15 | 株式会社半導体エネルギー研究所 | Method for manufacturing semiconductor device |
| US6501094B1 (en) * | 1997-06-11 | 2002-12-31 | Semiconductor Energy Laboratory Co., Ltd. | Semiconductor device comprising a bottom gate type thin film transistor |
| JP3592535B2 (en) | 1998-07-16 | 2004-11-24 | 株式会社半導体エネルギー研究所 | Method for manufacturing semiconductor device |
| JP4493741B2 (en) | 1998-09-04 | 2010-06-30 | 株式会社半導体エネルギー研究所 | Method for manufacturing semiconductor device |
| KR100473997B1 (en) * | 2000-10-06 | 2005-03-07 | 엘지.필립스 엘시디 주식회사 | A method of fabricating the same |
| JP4968982B2 (en) * | 2000-12-15 | 2012-07-04 | 株式会社半導体エネルギー研究所 | Method for manufacturing semiconductor device |
| SG160191A1 (en) | 2001-02-28 | 2010-04-29 | Semiconductor Energy Lab | Semiconductor device and manufacturing method thereof |
| KR100731750B1 (en) | 2005-06-23 | 2007-06-22 | 삼성에스디아이 주식회사 | Fabricating Method of TFT and Fabricating Method of Organic Electroluminescence Display Device using the same |
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|---|---|---|---|---|
| US4746628A (en) * | 1983-08-26 | 1988-05-24 | Sharp Kabushiki Kaisha | Method for making a thin film transistor |
| US4943837A (en) * | 1987-03-11 | 1990-07-24 | Hitachi, Ltd. | Thin film semiconductor device and method of fabricating the same |
| US5037766A (en) * | 1988-12-06 | 1991-08-06 | Industrial Technology Research Institute | Method of fabricating a thin film polysilicon thin film transistor or resistor |
| US5064775A (en) * | 1990-09-04 | 1991-11-12 | Industrial Technology Research Institute | Method of fabricating an improved polycrystalline silicon thin film transistor |
Family Cites Families (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| GB8606045D0 (en) * | 1986-03-12 | 1986-04-16 | Emi Plc Thorn | Gas sensitive device |
-
1993
- 1993-03-12 JP JP05078997A patent/JP3137797B2/en not_active Expired - Fee Related
-
1994
- 1994-03-12 CN CN2006100997260A patent/CN1893001B/en not_active Expired - Fee Related
- 1994-03-12 CN CN2006100997241A patent/CN1893000B/en not_active Expired - Lifetime
- 1994-03-12 CN CN2006100997256A patent/CN1893118B/en not_active Expired - Lifetime
Patent Citations (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US4746628A (en) * | 1983-08-26 | 1988-05-24 | Sharp Kabushiki Kaisha | Method for making a thin film transistor |
| US4943837A (en) * | 1987-03-11 | 1990-07-24 | Hitachi, Ltd. | Thin film semiconductor device and method of fabricating the same |
| US5037766A (en) * | 1988-12-06 | 1991-08-06 | Industrial Technology Research Institute | Method of fabricating a thin film polysilicon thin film transistor or resistor |
| US5064775A (en) * | 1990-09-04 | 1991-11-12 | Industrial Technology Research Institute | Method of fabricating an improved polycrystalline silicon thin film transistor |
Also Published As
| Publication number | Publication date |
|---|---|
| JP3137797B2 (en) | 2001-02-26 |
| CN1893118A (en) | 2007-01-10 |
| CN1893118B (en) | 2010-05-12 |
| CN1893001B (en) | 2011-10-05 |
| CN1893000A (en) | 2007-01-10 |
| JPH06267978A (en) | 1994-09-22 |
| CN1893001A (en) | 2007-01-10 |
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