CN1706566B - Ultraviolet cleaner - Google Patents
Ultraviolet cleaner Download PDFInfo
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- CN1706566B CN1706566B CN 200410025023 CN200410025023A CN1706566B CN 1706566 B CN1706566 B CN 1706566B CN 200410025023 CN200410025023 CN 200410025023 CN 200410025023 A CN200410025023 A CN 200410025023A CN 1706566 B CN1706566 B CN 1706566B
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- cooling
- reflecting plate
- ultraviolet
- cleaning device
- reative cell
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Abstract
The ultraviolet cleaner is used in surface cleaning and modification of body. It includes reactor with air outlet connected to air pipe for leading air out of the reactor and air inlet for leading air into the chamber after cooling, work bench inside the reactor for bearing body, one or several ultraviolet discharge tubes inside the reactor to emit ultraviolet ray of wavelength shorter than 280 nm. The present invention has increased ozone concentration and lowered reactor temperature and can clean the surface of body and improve the surface contact performance effectively.
Description
Technical field
The relevant a kind of ultraviolet cleaning device of the present invention, the ultraviolet cleaning device that especially relevant a kind of ozone that utilizes ultraviolet ray and produced by ultraviolet ray irradiation air cleans.
Background technology
Usually, in the manufacturing of the semiconductor devices of needs raising yield rate, liquid crystal display cells, optical goods, need clean with the spot of removing surface of the work and then property, the tack of improving its surface its surface.Traditional technology is used wet-cleaning, imposes soup on the surface of work its spot with working surface is reacted, and under such traditional handicraft, needs the soup residue of working surface is cleaned after it reacts.In the process of cleaning, can produce new pollution.Produced the treatment technology of dry method optical surface on this basis.The progress of low pressure UV discharge tube exploitation because high-power superelevation is exerted oneself in recent years, and along with the ultra micro refinement of products such as microelectronics, in the manufacture process of products such as microelectronics, ultraprecise device, by the ozone of short wavelength ultraviolet and generation thereof the surface of its product is carried out that ultraprecise cleans or the then practicability of the dry type optical surface treatment technology of property, tack of improving its surface is made progress very soon.As the substitute technology in fluorine Lyons, the optical surface cleaning technique will replace the cleaning technique of wet method gradually.
Yet, in existing dry method is cleaned, still there is following problem:
1, the illumination of UV is little, can not concentrate a large amount of ultraviolet rays to carry out surface clean.
2, ozone concentration is low, can't give full play to the superpower oxidation of ozone.
3, ozone skewness, inhomogeneous to the effect of surface clean.
4, the heating temp height exerts an influence to handling object.
5, the ozone discharge rate is big, will consider adverse effect that personnel's environment is on every side produced after the discharge, sometimes even need eliminate with measures such as activated carbon.
Therefore, need that development is a kind of can to overcome above shortcoming, effectively to article surface clean also can improve simultaneously its surface then cleaning of property, tack be set to current industry and be badly in need of.
Summary of the invention
The object of the present invention is to provide ultraviolet cleaning device, it is the article-cleaning surface effectively, improves then property of its surface simultaneously, tack.
The object of the present invention is achieved like this: a kind of ultraviolet cleaning device, being used for body surface cleans and modification, it is characterized in that: comprise reative cell, be arranged at the workbench that is used for carrying object of reative cell, have one or more ultraviolet discharge pipes in the reative cell, discharge tube can radiate the following ultraviolet ray of wavelength 280NM, one side of reative cell has the gas outlet and links to each other so that the air in the reative cell is derived with wireway, and the cooling back imports reative cell once more from the air inlet of opposite side.
The present invention also has following feature: described ultraviolet discharge pipe also can be halogen or mix halogen excimer body discharge tube.
Another feature of the present invention is that described discharge tube can be straight type, also can be " W " or " N " or " U " font shape, and discharge tube can close-up, side row or tiltedly row to increase illumination.
Another feature of the present invention is that described discharge tube top further is provided with the cooling reflecting plate, and above-mentioned cooling reflecting plate has gas port and cooling pipe.
Compared with prior art, the invention has the beneficial effects as follows: because the air that is mixed with ozone that will derive of wireway imports reative cell once more, thereby density of ozone strengthens, and minimizing is overflowed the external world and caused influence to the nearside human body; The ultraviolet discharge pipe can be put the ultraviolet ray of two kinds of wavelength simultaneously and closely arrange, and can increase illumination and ozone concentration; The cooling reflecting plate can be collected ozone and cooling, and the air of Dao Ruing also can the cooling discharge pipe and the temperature of reative cell once more.Ultraviolet cleaning device of the present invention is high to the surface clean cleannes of workpiece, can membranaceous spot be cleaned to below the monolayer.
Description of drawings
Fig. 1 is the floor map of the present invention's ultraviolet ray cleaning device.
Fig. 2 is the enlarged drawing of the cooling reflecting plate shown in Fig. 1 of the present invention.
Fig. 3 A, 3B, 3C are that the present invention cools off three kinds of formations of reflecting plate.
Fig. 4 is a discharge tube close-up mode schematic diagram.
Fig. 5 is that discharge tube is tiltedly arranged the mode schematic diagram.
Fig. 6 A-Fig. 6 D is the schematic diagram of the various planforms of discharge tube.
The specific embodiment
Below in conjunction with drawings and Examples the present invention is further described.
See also shown in Figure 1, the present invention's ultraviolet ray cleaning device, being used for body surface cleans and modification, comprise reative cell 1, run through the workbench 2 that reative cell 1 is used to carry workpiece, have a plurality of ultraviolet discharge pipes 3 in the reative cell 1, discharge tube 3 can radiate the ultraviolet ray of wavelength 253.7 and 184.9NM simultaneously, and its photon energy is respectively 472KJ/mol and 647KJ/mol, can cut off most molecule combinations.Above-mentioned workbench 2 is a conveyer belt, and it drives by two runners, and workpiece is after being placed on the workbench 2, because the mobile of conveyer belt enters in the reative cell 1 work.The turnover of conveyer belt all offers opening on the two sides of reative cell 1 for convenience.One side of reative cell 1 has gas outlet 11 and links to each other so that the air in the reative cell 1 is derived with wireway 4, and the air inlet 13 from opposite side after cooling device 501 coolings of bleeding imports reative cell 1 once more.Above-mentioned ultraviolet discharge pipe 3 upper portion respectively are provided with a cooling reflecting plate 5.See also first embodiment shown in Fig. 2 and Fig. 3 A, have a cooling pipe 51 on the above-mentioned cooling reflecting plate 5, it is the plane that is parallel to reflecting plate 5, and is and is provided with crooked the connection, is filled with cooling fluid in the cooling pipe 51.Be provided with cooling liquid inlet 511 and cooling liquid outlet 512 in the appropriate location, edge of reflecting plate 5.The gap of corresponding cooling pipe 51 positions is provided with some first gas port 53 and second gas ports 54 that vertically run through this cooling reflecting plate on described cooling reflecting plate 5.First gas port is extended with conduit and outstanding cooling reflecting plate 5 downwards.First gas port 53 compiles connection via first air inlet pipe 531, and first air inlet pipe 531 connects air inlet 13, and then is connected with the cooling device 501 of bleeding.Second gas port 54 directly and reative cell 1 is communicated with and connection wireway 4.For making the gas of sending from first air inlet pipe 531 evenly can on first air inlet pipe 531, install control valve additional.
Referring to Fig. 3 B second embodiment, second gas port 54 compiles connection via the second snorkel 541` ', and the second snorkel 541` connects the cooling device 501 of bleeding.Remaining design is identical with first embodiment.
Referring to Fig. 3 C the 3rd embodiment, the gap of corresponding cooling pipe 51 positions is provided with some this cooling reflecting plate half admittance pore 54` that vertically do not run through on the described cooling reflecting plate 5 again.Half admittance pore 54` is via the ventilation cooling tube of establishing in the cooling reflecting plate 5 541 " to be compiled connection, and connects the cooling device 501 of bleeding." and cooling pipe 51 is not located at same plane in order to avoid the cooling tube 541 of ventilating.
Please cooperate and consult Fig. 1 and Fig. 4, in order to increase the illumination of discharge tube 3, the discharge tube 3 in reative cell 1 is closely arranged side by side, and the effect that ultraviolet ray is cleaned strengthens.Also may increase simultaneously the amount of the ozone of generation.
Please cooperate and consult Fig. 1 and shown in Figure 5, discharge tube 3 can also adopt oblique row's mode, with discharge tube 3 oblique settings, thereby further increases the illumination of discharge tube 3.
See also shown in Fig. 6 A, 6B, 6C and the 6D, it shown in the figure different types of structure of discharge tube 3, discharge tube 3 can adopt linear pattern, also can adopt the structure setting of " W " or " U " or " N " type, it is tightr that discharge tube 3 is arranged, and can select different discharge tube 3 as required.
Ultraviolet cleaning device of the present invention has been adopted above-mentioned setting, workpiece is sent in the reative cell 1 by conveyer belt shone the surface of solids by UV, and the pollutant organic molecule of surface of the work is in conjunction with being cut off by strong luminous energy.Because the following ultraviolet ray of wavelength 200NM can be decomposed oxygen molecule, generates ozone.Ozone has extremely strong oxidation, so the cleaning action of ultraviolet cleaning and ozone is arranged in these cases simultaneously.In the cleaning of optical surface, ultraviolet ray and ozone and use than independent effect ultraviolet ray shine or the ozone oxidation effect far better, can produce the effect that multiplies each other.
Through the air in the ultraviolet ray irradiation reative cell 1, the air that contains ozone that produces tentatively cools off and guides it to enter wireway 4 through supercooling reflecting plate 5, wireway 4 enters reative cell 1 by first air inlet pipe 531 in external world's circulation after the cooling through outside air or water again.Like this, air is through the repeatedly concentration increase of irradiation back ozone, and cooled air also can cool off cooling reflecting plate 5 and ultraviolet discharge pipe 3.And above-mentioned discharge tube 3 is closely arranged, and stronger illumination can be provided, and also can increase the effect of cleaning.In addition, the ozone recycled for multiple times can make overflows extraneous ozone minimizing, and a spot of ozone can not cause big injury to human body, so can directly discharge the external world, makes it be decomposed to form oxygen in air.
In addition, described workbench is a conveyer belt, and the both sides of above-mentioned reative cell have opening so that the conveyer belt turnover.Also can be a drawer type conveyer, and a side of above-mentioned reative cell also opening is arranged so that the drawer turnover.In addition, be provided with cooling device below the described workbench.
In sum, the present invention has finished designer's purpose, and is high to the surface clean cleannes of workpiece, can membranaceous spot be cleaned to below the monolayer.
Claims (9)
1. ultraviolet cleaning device, being used for body surface cleans and modification, it is characterized in that: comprise reative cell, be arranged at the workbench that is used for carrying object of reative cell, have one or more ultraviolet discharge pipes in the reative cell, discharge tube can radiate the following ultraviolet ray of wavelength 280NM, the discharge tube top is provided with the cooling reflecting plate, the cooling reflecting plate has gas port and cooling pipe, one side of reative cell has the gas outlet and links to each other so that the air in the reative cell is derived with wireway, and the cooling back imports reative cell once more from the air inlet of opposite side.
2. ultraviolet cleaning device as claimed in claim 1 is characterized in that: described one or more ultraviolet discharge pipes are halogens or mix halogen excimer body discharge tube.
3. ultraviolet cleaning device as claimed in claim 2 is characterized in that: described one or more ultraviolet discharge Guan Weizhi types, or be " W " or " N " or " U " font shape.
4. ultraviolet cleaning device as claimed in claim 3 is characterized in that: be close-up or side row or oblique row during a plurality of arrangement of described ultraviolet discharge pipe.
5. ultraviolet cleaning device as claimed in claim 1, it is characterized in that: the cooling pipe on the described cooling reflecting plate is the plane that is parallel to reflecting plate, and be and be provided with crooked the connection, and be provided with the outlet of cooling tube import and cooling tube in the appropriate location, edge of reflecting plate, be filled with cooling fluid in the cooling pipe of cooling reflecting plate.
6. ultraviolet cleaning device as claimed in claim 5, it is characterized in that: the gap of corresponding cooling pipe position is provided with some first gas port and second gas ports that vertically run through this cooling reflecting plate on the described cooling reflecting plate, and first gas port on the described cooling reflecting plate is extended with conduit and outstanding cooling reflecting plate downwards.
7. ultraviolet cleaning device as claimed in claim 6 is characterized in that: first gas port compiles connection via first air inlet pipe, and first air inlet pipe connects the cooling device of bleeding.
8. ultraviolet cleaning device as claimed in claim 7 is characterized in that: second gas port compiles connection via second snorkel, and second snorkel connects the cooling device of bleeding.
9. ultraviolet cleaning device as claimed in claim 4 is characterized in that: the gap that corresponding cooling tube is led the position on the described cooling reflecting plate is provided with some this cooling reflecting plate half admittance pores that vertically do not run through.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN 200410025023 CN1706566B (en) | 2004-06-09 | 2004-06-09 | Ultraviolet cleaner |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN 200410025023 CN1706566B (en) | 2004-06-09 | 2004-06-09 | Ultraviolet cleaner |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| CN1706566A CN1706566A (en) | 2005-12-14 |
| CN1706566B true CN1706566B (en) | 2010-04-07 |
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Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN 200410025023 Expired - Fee Related CN1706566B (en) | 2004-06-09 | 2004-06-09 | Ultraviolet cleaner |
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| Country | Link |
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| CN (1) | CN1706566B (en) |
Families Citing this family (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN102466400B (en) * | 2010-11-19 | 2014-04-02 | 志圣科技（广州）有限公司 | Cooling device of ultraviolet multi-layer furnace |
| CN102436138B (en) * | 2011-07-12 | 2014-04-02 | 上海华力微电子有限公司 | Ultraviolet mask plate dry cleaning equipment |
| CN103337450B (en) * | 2013-06-18 | 2016-03-02 | 上海交通大学 | UV/ozone surface clean and oxidation modification vacuum equipment and using method thereof |
| CN103894377B (en) * | 2013-12-25 | 2017-07-21 | 韦小凤 | A kind of ultraviolet light and plasma combined cleaning device |
| CN108015075A (en) * | 2017-03-02 | 2018-05-11 | 上海继伟制药设备有限公司 | Vessel-cleaning machine |
Citations (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US5261965A (en) * | 1992-08-28 | 1993-11-16 | Texas Instruments Incorporated | Semiconductor wafer cleaning using condensed-phase processing |
| US6015503A (en) * | 1994-06-14 | 2000-01-18 | Fsi International, Inc. | Method and apparatus for surface conditioning |
| CN1269602A (en) * | 2000-04-11 | 2000-10-11 | 北京高力通科技开发公司 | Ultraviolet surface cleaning machine |
| CN1440817A (en) * | 2002-02-28 | 2003-09-10 | 王文阁 | Multifunctional cleaning sterilizer |
| US6631726B1 (en) * | 1999-08-05 | 2003-10-14 | Hitachi Electronics Engineering Co., Ltd. | Apparatus and method for processing a substrate |
-
2004
- 2004-06-09 CN CN 200410025023 patent/CN1706566B/en not_active Expired - Fee Related
Patent Citations (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US5261965A (en) * | 1992-08-28 | 1993-11-16 | Texas Instruments Incorporated | Semiconductor wafer cleaning using condensed-phase processing |
| US6015503A (en) * | 1994-06-14 | 2000-01-18 | Fsi International, Inc. | Method and apparatus for surface conditioning |
| US6631726B1 (en) * | 1999-08-05 | 2003-10-14 | Hitachi Electronics Engineering Co., Ltd. | Apparatus and method for processing a substrate |
| CN1269602A (en) * | 2000-04-11 | 2000-10-11 | 北京高力通科技开发公司 | Ultraviolet surface cleaning machine |
| CN1440817A (en) * | 2002-02-28 | 2003-09-10 | 王文阁 | Multifunctional cleaning sterilizer |
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| Publication number | Publication date |
|---|---|
| CN1706566A (en) | 2005-12-14 |
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Granted publication date: 20100407 Termination date: 20100609 |