CN1595625A - 减少SiGe衬底上应变Si中N+扩散的方法 - Google Patents
减少SiGe衬底上应变Si中N+扩散的方法 Download PDFInfo
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- CN1595625A CN1595625A CNA2004100624730A CN200410062473A CN1595625A CN 1595625 A CN1595625 A CN 1595625A CN A2004100624730 A CNA2004100624730 A CN A2004100624730A CN 200410062473 A CN200410062473 A CN 200410062473A CN 1595625 A CN1595625 A CN 1595625A
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- 229910000577 Silicon-germanium Inorganic materials 0.000 title claims abstract description 47
- 239000000758 substrate Substances 0.000 title claims abstract description 39
- 238000009792 diffusion process Methods 0.000 title claims abstract description 18
- 238000000034 method Methods 0.000 title claims description 31
- 239000012535 impurity Substances 0.000 claims abstract description 30
- 229910052710 silicon Inorganic materials 0.000 claims description 16
- 230000015572 biosynthetic process Effects 0.000 claims description 13
- 238000002347 injection Methods 0.000 claims description 11
- 239000007924 injection Substances 0.000 claims description 11
- 239000010703 silicon Substances 0.000 claims description 10
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 claims description 9
- 238000000137 annealing Methods 0.000 claims description 8
- 239000004065 semiconductor Substances 0.000 claims description 8
- 239000011261 inert gas Substances 0.000 claims description 7
- 229910052757 nitrogen Inorganic materials 0.000 claims description 7
- 238000002513 implantation Methods 0.000 claims description 5
- 230000009467 reduction Effects 0.000 claims description 5
- 238000004519 manufacturing process Methods 0.000 claims description 3
- 230000003647 oxidation Effects 0.000 claims 1
- 238000007254 oxidation reaction Methods 0.000 claims 1
- 238000005468 ion implantation Methods 0.000 abstract description 3
- 229910052698 phosphorus Inorganic materials 0.000 description 3
- 239000011248 coating agent Substances 0.000 description 2
- 238000000576 coating method Methods 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- 230000007246 mechanism Effects 0.000 description 2
- 230000004044 response Effects 0.000 description 2
- 125000006850 spacer group Chemical group 0.000 description 2
- 208000032750 Device leakage Diseases 0.000 description 1
- 230000004913 activation Effects 0.000 description 1
- 230000008901 benefit Effects 0.000 description 1
- 230000007547 defect Effects 0.000 description 1
- 230000002950 deficient Effects 0.000 description 1
- 230000001934 delay Effects 0.000 description 1
- 238000009826 distribution Methods 0.000 description 1
- 239000007943 implant Substances 0.000 description 1
- 239000000463 material Substances 0.000 description 1
- 230000013011 mating Effects 0.000 description 1
- 238000004151 rapid thermal annealing Methods 0.000 description 1
- 230000008439 repair process Effects 0.000 description 1
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having at least one potential-jump barrier or surface barrier, e.g. PN junction, depletion layer or carrier concentration layer
- H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having at least one potential-jump barrier or surface barrier, e.g. PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic System or AIIIBV compounds with or without impurities, e.g. doping materials
- H01L21/26—Bombardment with radiation
- H01L21/263—Bombardment with radiation with high-energy radiation
- H01L21/265—Bombardment with radiation with high-energy radiation producing ion implantation
- H01L21/26506—Bombardment with radiation with high-energy radiation producing ion implantation in group IV semiconductors
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having at least one potential-jump barrier or surface barrier, e.g. PN junction, depletion layer or carrier concentration layer
- H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having at least one potential-jump barrier or surface barrier, e.g. PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic System or AIIIBV compounds with or without impurities, e.g. doping materials
- H01L21/26—Bombardment with radiation
- H01L21/263—Bombardment with radiation with high-energy radiation
- H01L21/265—Bombardment with radiation with high-energy radiation producing ion implantation
- H01L21/26506—Bombardment with radiation with high-energy radiation producing ion implantation in group IV semiconductors
- H01L21/26513—Bombardment with radiation with high-energy radiation producing ion implantation in group IV semiconductors of electrically active species
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having at least one potential-jump barrier or surface barrier, e.g. PN junction, depletion layer or carrier concentration layer
- H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having at least one potential-jump barrier or surface barrier, e.g. PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic System or AIIIBV compounds with or without impurities, e.g. doping materials
- H01L21/26—Bombardment with radiation
- H01L21/263—Bombardment with radiation with high-energy radiation
- H01L21/265—Bombardment with radiation with high-energy radiation producing ion implantation
- H01L21/26566—Bombardment with radiation with high-energy radiation producing ion implantation of a cluster, e.g. using a gas cluster ion beam
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/70—Manufacture or treatment of devices consisting of a plurality of solid state components formed in or on a common substrate or of parts thereof; Manufacture of integrated circuit devices or of parts thereof
- H01L21/77—Manufacture or treatment of devices consisting of a plurality of solid state components or integrated circuits formed in, or on, a common substrate
- H01L21/78—Manufacture or treatment of devices consisting of a plurality of solid state components or integrated circuits formed in, or on, a common substrate with subsequent division of the substrate into plural individual devices
- H01L21/82—Manufacture or treatment of devices consisting of a plurality of solid state components or integrated circuits formed in, or on, a common substrate with subsequent division of the substrate into plural individual devices to produce devices, e.g. integrated circuits, each consisting of a plurality of components
- H01L21/822—Manufacture or treatment of devices consisting of a plurality of solid state components or integrated circuits formed in, or on, a common substrate with subsequent division of the substrate into plural individual devices to produce devices, e.g. integrated circuits, each consisting of a plurality of components the substrate being a semiconductor, using silicon technology
- H01L21/8232—Field-effect technology
- H01L21/8234—MIS technology, i.e. integration processes of field effect transistors of the conductor-insulator-semiconductor type
- H01L21/8238—Complementary field-effect transistors, e.g. CMOS
- H01L21/823814—Complementary field-effect transistors, e.g. CMOS with a particular manufacturing method of the source or drain structures, e.g. specific source or drain implants or silicided source or drain structures or raised source or drain structures
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L29/00—Semiconductor devices adapted for rectifying, amplifying, oscillating or switching, or capacitors or resistors with at least one potential-jump barrier or surface barrier, e.g. PN junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof ; Multistep manufacturing processes therefor
- H01L29/02—Semiconductor bodies ; Multistep manufacturing processes therefor
- H01L29/06—Semiconductor bodies ; Multistep manufacturing processes therefor characterised by their shape; characterised by the shapes, relative sizes, or dispositions of the semiconductor regions ; characterised by the concentration or distribution of impurities within semiconductor regions
- H01L29/10—Semiconductor bodies ; Multistep manufacturing processes therefor characterised by their shape; characterised by the shapes, relative sizes, or dispositions of the semiconductor regions ; characterised by the concentration or distribution of impurities within semiconductor regions with semiconductor regions connected to an electrode not carrying current to be rectified, amplified or switched and such electrode being part of a semiconductor device which comprises three or more electrodes
- H01L29/1025—Channel region of field-effect devices
- H01L29/1029—Channel region of field-effect devices of field-effect transistors
- H01L29/1033—Channel region of field-effect devices of field-effect transistors with insulated gate, e.g. characterised by the length, the width, the geometric contour or the doping structure
- H01L29/1054—Channel region of field-effect devices of field-effect transistors with insulated gate, e.g. characterised by the length, the width, the geometric contour or the doping structure with a variation of the composition, e.g. channel with strained layer for increasing the mobility
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L29/00—Semiconductor devices adapted for rectifying, amplifying, oscillating or switching, or capacitors or resistors with at least one potential-jump barrier or surface barrier, e.g. PN junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof ; Multistep manufacturing processes therefor
- H01L29/66—Types of semiconductor device ; Multistep manufacturing processes therefor
- H01L29/66007—Multistep manufacturing processes
- H01L29/66075—Multistep manufacturing processes of devices having semiconductor bodies comprising group 14 or group 13/15 materials
- H01L29/66227—Multistep manufacturing processes of devices having semiconductor bodies comprising group 14 or group 13/15 materials the devices being controllable only by the electric current supplied or the electric potential applied, to an electrode which does not carry the current to be rectified, amplified or switched, e.g. three-terminal devices
- H01L29/66409—Unipolar field-effect transistors
- H01L29/66477—Unipolar field-effect transistors with an insulated gate, i.e. MISFET
- H01L29/6656—Unipolar field-effect transistors with an insulated gate, i.e. MISFET using multiple spacer layers, e.g. multiple sidewall spacers
Abstract
Description
Claims (20)
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US10/605,108 | 2003-09-09 | ||
US10/605,108 US7410846B2 (en) | 2003-09-09 | 2003-09-09 | Method for reduced N+ diffusion in strained Si on SiGe substrate |
Publications (2)
Publication Number | Publication Date |
---|---|
CN1595625A true CN1595625A (zh) | 2005-03-16 |
CN1309035C CN1309035C (zh) | 2007-04-04 |
Family
ID=34225870
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
CNB2004100624730A Expired - Fee Related CN1309035C (zh) | 2003-09-09 | 2004-07-08 | 减少SiGe衬底上应变Si中N+扩散的方法 |
Country Status (2)
Country | Link |
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US (3) | US7410846B2 (zh) |
CN (1) | CN1309035C (zh) |
Cited By (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN102263099A (zh) * | 2010-05-24 | 2011-11-30 | 中国科学院微电子研究所 | 3d集成电路及其制造方法 |
US8541305B2 (en) | 2010-05-24 | 2013-09-24 | Institute of Microelectronics, Chinese Academy of Sciences | 3D integrated circuit and method of manufacturing the same |
CN103620394A (zh) * | 2011-04-15 | 2014-03-05 | 原子能和代替能源委员会 | 确定填隙氧浓度的方法 |
CN106298476A (zh) * | 2015-06-01 | 2017-01-04 | 中国科学院微电子研究所 | 一种半导体器件的制造方法 |
Families Citing this family (5)
Publication number | Priority date | Publication date | Assignee | Title |
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US7247535B2 (en) * | 2004-09-30 | 2007-07-24 | Texas Instruments Incorporated | Source/drain extensions having highly activated and extremely abrupt junctions |
KR100863687B1 (ko) * | 2007-05-17 | 2008-10-16 | 주식회사 동부하이텍 | 반도체 소자 및 반도체 소자의 제조 방법 |
JP2009272509A (ja) * | 2008-05-09 | 2009-11-19 | Advanced Lcd Technologies Development Center Co Ltd | 光照射装置、結晶化装置、結晶化方法、およびデバイス |
CN103187285B (zh) * | 2011-12-29 | 2015-06-03 | 中芯国际集成电路制造(上海)有限公司 | 半导体结构及其形成方法 |
US20210098651A1 (en) * | 2018-03-12 | 2021-04-01 | Institute Of Semiconductors, Chinese Academy Of Sciences | Silicon-based direct bandgap light-emitting material and preparation method thereof, and on-chip light-emitting device |
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-
2005
- 2005-02-15 US US11/057,129 patent/US7345329B2/en not_active Expired - Fee Related
- 2005-11-22 US US11/283,882 patent/US7297601B2/en not_active Expired - Fee Related
Cited By (9)
Publication number | Priority date | Publication date | Assignee | Title |
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CN102263099A (zh) * | 2010-05-24 | 2011-11-30 | 中国科学院微电子研究所 | 3d集成电路及其制造方法 |
WO2011147061A1 (zh) * | 2010-05-24 | 2011-12-01 | 中国科学院微电子研究所 | 3d集成电路及其制造方法 |
CN102263099B (zh) * | 2010-05-24 | 2013-09-18 | 中国科学院微电子研究所 | 3d集成电路及其制造方法 |
US8541305B2 (en) | 2010-05-24 | 2013-09-24 | Institute of Microelectronics, Chinese Academy of Sciences | 3D integrated circuit and method of manufacturing the same |
CN103620394A (zh) * | 2011-04-15 | 2014-03-05 | 原子能和代替能源委员会 | 确定填隙氧浓度的方法 |
CN103620394B (zh) * | 2011-04-15 | 2015-11-25 | 原子能和代替能源委员会 | 确定填隙氧浓度的方法 |
US9274072B2 (en) | 2011-04-15 | 2016-03-01 | Commissariat à l'Energie Atomique et aux Energies Alternatives | Method for determining interstitial oxygen concentration |
CN106298476A (zh) * | 2015-06-01 | 2017-01-04 | 中国科学院微电子研究所 | 一种半导体器件的制造方法 |
CN106298476B (zh) * | 2015-06-01 | 2019-07-12 | 中国科学院微电子研究所 | 一种半导体器件的制造方法 |
Also Published As
Publication number | Publication date |
---|---|
CN1309035C (zh) | 2007-04-04 |
US20050054145A1 (en) | 2005-03-10 |
US7297601B2 (en) | 2007-11-20 |
US7345329B2 (en) | 2008-03-18 |
US20060073649A1 (en) | 2006-04-06 |
US20050145992A1 (en) | 2005-07-07 |
US7410846B2 (en) | 2008-08-12 |
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