CN1350193A - Phase-shifting filter for projecting etching imaging - Google Patents
Phase-shifting filter for projecting etching imaging Download PDFInfo
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- CN1350193A CN1350193A CN 00116190 CN00116190A CN1350193A CN 1350193 A CN1350193 A CN 1350193A CN 00116190 CN00116190 CN 00116190 CN 00116190 A CN00116190 A CN 00116190A CN 1350193 A CN1350193 A CN 1350193A
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- phase
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- projection
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Abstract
The present invention relates to a projection photo-etching image phase-shifting filter equipment, consisting of light source, condenser group, imaging objective and silicon wafer, which is characterized by that on the pupil surface position of projection photo-etching objective a complete transparent phase-shifting filter plate capable of phase-shifting and filtering image light, so that it can ensure that the image light can not be blocked, and can raise image contrast, and can further raise the photo-etching resolution power of short wavelength large-aperture projection iming system, and can greately raise projection image photo-etching resolution power and increase depth of focus.
Description
The present invention is a kind of phase-shifting filter for projecting etching imaging, belongs to IC production equipment wafer stepper machine high resolution projection imaging technical field.
In recent years, in order to improve IC production equipment wafer stepper machine photolithography resolution, usually adopt short wavelength, large-numerical aperture and phase shifting mask and off-axis illumination technology, after digging the various potentiality of having use up these raising photolithography resolution technology, abroad begun to sacrifice the imaging light intensity, in illuminator, place filtering light hurdle, again the picture on light hurdle is projected on the pupil plane of object lens, improve existing projecting etching imaging image contrast with this approximate pupil filtering method, reach the raising photolithography resolution.Obviously the filter effect of this approximate filtering method is bad, and structure is also very complicated, and again because this method is a kind of net amplitude filtering, retaining removes a large amount of low frequency imagings, has reduced the imaging light intensity significantly.
The objective of the invention is to overcome above-mentioned the deficiencies in the prior art, and provide a kind of phase-shifting filter for projecting etching imaging, on the light projection photoetching objective lens pupil plane, directly add complete printing opacity phase-shift filtering plate, both guaranteed that imaging was not stopped, can improve image contrast again, improve the projection imaging photolithography resolution significantly, simultaneously also increasing depth of focus significantly.
Purpose of the present invention can realize by following technical measures: be made of ellipsoidal mirror, lighting source, condenser group, mask plate, image-forming objective lens and silicon chip, the front focal plane position of back focal plane of before image-forming objective lens, organizing and back group, be the pupil plane position of imaging object lens, place the phase-shift filtering plate that can carry out phase-shift filtering to imaging.
The present invention also can be realized by following technical measures: be positioned on the quartz base plate of the phase-shift filtering plate on the pupil plane, be manufactured with the annular rete such as garden such as phase shift such as grade of 10 °-350 ° of complete printing opacity phase shifts, its garden ring inside radius r
1=(0.10-0.48) R, garden ring external radius r
2=(0.52-0.90) R, R is the full radius of phase-shift filtering plate.
The present invention compared with prior art has the following advantages:
1, on projection imaging lithographic objective pupil plane, directly is added in the phase-shift filtering plate of making to have annular complete printing opacity rete in garden on the quartz base plate, imaging is not stopped, but change pupil function, thereby change the optical system transport function, the frequency spectrum transport property is improved, improve the projection imaging contrast, both overcome the deficiency of the low exposure of off-axis illumination and phase shifting mask tolerance limit, high proximity effect, also overcome with approximate pupil filtering, filter effect is bad, retaining removes most of low frequency imaging again, the shortcoming that the powerful width of cloth of imaging is reduced;
2, bring into play many focal planes complex effect and edge simultaneously and strengthen phase effect, further excavated the photolithography resolution ability of short wavelength's large-numerical aperture projection imaging system, improve projection imaging photolithography resolution and increasing depth of focus significantly significantly;
3, in the projection imaging etching system, add this phase-shift filtering plate, can keep former projection imaging system technical parameter constant, when manufacturing and designing object lens, just consider to add, then more simple and convenient.
Description of drawings:
Fig. 1 is the scantling plan of phase-shifting filter for projecting etching imaging.
Fig. 2 is the structural drawing of phase-shift filtering plate.
Fig. 3 is phase-shift filtering plate transmittance curve figure.
The invention will be further described below in conjunction with drawings and Examples:
As shown in Figure 1: phase-shifting filter for projecting etching imaging is made of the front and back mirror group 6,8 and the silicon chip 9 of ellipsoidal mirror 1, lighting source 2, integral mirror group 3, condenser group 4, mask plate 5, phase-shift filtering plate 7, projection imaging object lens.Lighting source 2 is by ellipsoidal mirror 1 reflection and optically focused, light is accumulated on the integral mirror group 3, the light that each integral mirror on the integral mirror group 3 is sent is by condenser group 4 optically focused, even lighted mask 5, and front and back mirror group 6,8 and the phase-shift filtering plate 7 of the ultra tiny mask graph on the mask plate 5 by the projection imaging object lens images on the silicon chip 9.The filtering level of phase-shift filtering plate 7 is organized 6 back focal plane before being positioned at image-forming objective lens, also is positioned at the front focal plane of back group 8, i.e. on the imaging objective lens pupil face, can obtain the frequency spectrum of mask graph on this face.Because the adding of the phase-shift filtering plate of complete printing opacity rete is arranged, imaging is not stopped, but change the pupil function of projection imaging optical system, thereby change the optical system transport function, carry out the spectrum modulation of imaging system, the frequency spectrum transport property is improved, also bring into play many Jiao and complex effect and edge enhancing phase effect simultaneously, further excavate the photolithography resolution ability of short wavelength's large-numerical aperture projection imaging system, improve image contrast, improve projection imaging photolithography resolution and increasing depth of focus significantly significantly.
As shown in Figures 2 and 3: the phase shift garden annular rete 11 that waits that the complete printing opacity phase shift that phase-shift filtering plate 7 is made above by quartz base plate 10 and its is 10 °-350 ° constitutes, and the amplitude transmittance value T of rete 11 is equivalent to negative value, garden ring inside radius r
1=(0.10-0.48) R, garden ring external radius r
2=(0.52-0.90) R, R is the full radius of phase-shift filtering plate in the formula.Because rete 11 complete printing opacities, imaging can not stopped to weaken after by rete.
Claims (3)
1, the phase-shifting filter for projecting etching imaging that constitutes by ellipsoidal mirror (1), lighting source (2), condenser group (4), mask plate (5), projection imaging object lens and silicon chip (9), it is characterized in that: the front focal plane position of the back focal plane of group (6) and back group (8) before image-forming objective lens, be the pupil plane position of imaging object lens, placement can be carried out the phase-shift filtering plate (7) of phase-shift filtering to imaging.
2, phase-shifting filter for projecting etching imaging as claimed in claim 1 is characterized in that being positioned on the quartz base plate (10) of the phase-shift filtering plate (7) on the pupil plane, is manufactured with the annular rete (11) such as garden such as phase shift such as grade of 10 °-350 ° of complete printing opacity phase shifts.
3, as claim 1 and 2 described phase-shifting filter for projecting etching imaging, its feature also is the complete printing opacity garden annular phase shift rete (11) on phase-shift filtering plate (7) quartz base plate (10), its garden ring inside radius r
1=(0.10-0.48) R, garden ring external radius r
2=(0.52-0.90) R, R is the full radius of phase-shift filtering plate (7).
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN 00116190 CN1350193A (en) | 2000-10-20 | 2000-10-20 | Phase-shifting filter for projecting etching imaging |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN 00116190 CN1350193A (en) | 2000-10-20 | 2000-10-20 | Phase-shifting filter for projecting etching imaging |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN1350193A true CN1350193A (en) | 2002-05-22 |
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ID=4585604
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN 00116190 Pending CN1350193A (en) | 2000-10-20 | 2000-10-20 | Phase-shifting filter for projecting etching imaging |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN1350193A (en) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US7876417B2 (en) | 2003-05-30 | 2011-01-25 | Omnivision Technologies, Inc. | Lithographic systems and methods with extended depth of focus |
-
2000
- 2000-10-20 CN CN 00116190 patent/CN1350193A/en active Pending
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US7876417B2 (en) | 2003-05-30 | 2011-01-25 | Omnivision Technologies, Inc. | Lithographic systems and methods with extended depth of focus |
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| C06 | Publication | ||
| PB01 | Publication | ||
| C02 | Deemed withdrawal of patent application after publication (patent law 2001) | ||
| WD01 | Invention patent application deemed withdrawn after publication |