CN1324331C - 相邻点图案之间无重叠或无过大距离的图案数据的产生 - Google Patents
相邻点图案之间无重叠或无过大距离的图案数据的产生 Download PDFInfo
- Publication number
- CN1324331C CN1324331C CNB028175336A CN02817533A CN1324331C CN 1324331 C CN1324331 C CN 1324331C CN B028175336 A CNB028175336 A CN B028175336A CN 02817533 A CN02817533 A CN 02817533A CN 1324331 C CN1324331 C CN 1324331C
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- China
- Prior art keywords
- coordinate
- reverberator
- pattern
- equipment
- produce
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- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
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Classifications
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- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
- G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on liquid crystals, e.g. single liquid crystal display cells
- G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
- G02F1/1333—Constructional arrangements; Manufacturing methods
- G02F1/1335—Structural association of cells with optical devices, e.g. polarisers or reflectors
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B5/00—Optical elements other than lenses
- G02B5/08—Mirrors
- G02B5/10—Mirrors with curved faces
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
-
- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
- G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on liquid crystals, e.g. single liquid crystal display cells
- G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
- G02F1/1333—Constructional arrangements; Manufacturing methods
- G02F1/1335—Structural association of cells with optical devices, e.g. polarisers or reflectors
- G02F1/133553—Reflecting elements
Abstract
Description
Claims (40)
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP272165/2001 | 2001-09-07 | ||
JP2001272165 | 2001-09-07 |
Publications (2)
Publication Number | Publication Date |
---|---|
CN1554029A CN1554029A (zh) | 2004-12-08 |
CN1324331C true CN1324331C (zh) | 2007-07-04 |
Family
ID=19097575
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
CNB028175336A Expired - Lifetime CN1324331C (zh) | 2001-09-07 | 2002-09-05 | 相邻点图案之间无重叠或无过大距离的图案数据的产生 |
Country Status (7)
Country | Link |
---|---|
US (3) | US7612847B2 (zh) |
EP (1) | EP1429159A4 (zh) |
JP (1) | JP4309265B2 (zh) |
KR (1) | KR100675077B1 (zh) |
CN (1) | CN1324331C (zh) |
TW (1) | TW567392B (zh) |
WO (1) | WO2003023462A1 (zh) |
Families Citing this family (15)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
TW567392B (en) * | 2001-09-07 | 2003-12-21 | Nec Corp | Device for generating ragged pattern data in random arrangement, computer program, mask and manufacturing device, light reflection member manufacturing device, liquid crystal manufacturing device, liquid crystal display device, portable terminal device |
JP4512378B2 (ja) * | 2004-02-02 | 2010-07-28 | 住友化学株式会社 | 拡散反射板の製造方法 |
JP2006133625A (ja) * | 2004-11-09 | 2006-05-25 | Nec Lcd Technologies Ltd | 反射板及び該反射板を備える液晶表示装置 |
US7670726B2 (en) * | 2006-07-20 | 2010-03-02 | Zhijian Lu | Optical diffusers, photomasks and their methods of fabrication |
JP4883525B2 (ja) | 2006-08-02 | 2012-02-22 | Nltテクノロジー株式会社 | 反射板及び液晶表示装置 |
US8068136B2 (en) * | 2007-05-16 | 2011-11-29 | Honeywell International Inc. | Method and system for determining angular position of an object |
US7593829B2 (en) * | 2007-05-16 | 2009-09-22 | Honeywell International Inc. | Method for generating pseudo-random pattern designs for optical position determination systems |
KR101115095B1 (ko) * | 2009-03-03 | 2012-02-16 | 주식회사 엘지화학 | 불규칙한 분포의 구형 패턴을 갖는 확산 필름의 설계 방법 |
US8494221B2 (en) * | 2011-04-28 | 2013-07-23 | Honeywell International Inc. | Inverse star tracker using psuedo-random overlapping circles |
TWI495158B (zh) * | 2011-08-31 | 2015-08-01 | Asahi Kasei E Materials Corp | An optical substrate, a semiconductor light-emitting element, an embossing mold, and an exposure apparatus |
KR101278347B1 (ko) * | 2012-08-22 | 2013-06-25 | 주식회사 세코닉스 | 비정형 패턴을 갖는 광학필름 및 그 제조방법 |
TWI623776B (zh) | 2012-12-17 | 2018-05-11 | Lg伊諾特股份有限公司 | 設計光學基板的方法 |
KR101480892B1 (ko) * | 2014-11-13 | 2015-01-13 | 아이벡스랩 주식회사 | 인증 패턴 결정 방법 및 그 방법을 이용한 결제 방법 |
CN107025106B (zh) * | 2016-11-02 | 2020-08-04 | 阿里巴巴集团控股有限公司 | 一种图形绘制方法及装置 |
US10885233B2 (en) | 2018-04-23 | 2021-01-05 | Milliken & Company | Systems and methods for generating textiles with repeating patterns |
Citations (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS59208536A (ja) * | 1983-05-12 | 1984-11-26 | Canon Inc | フオ−カシングスクリ−ンの製造方法 |
JPH09292504A (ja) * | 1996-02-27 | 1997-11-11 | Sharp Corp | 反射板及びその作製方法及びその反射板を用いた反射型液晶表示装置 |
US5733710A (en) * | 1991-12-03 | 1998-03-31 | Asahi Kogaku Kogyo Kabushiki Kaisha | Method for manufacturing a master die for a diffusion plate and diffusion plate manufactured by said method |
CN1266254A (zh) * | 1999-03-04 | 2000-09-13 | 三星电子株式会社 | 反射型液晶显示器及其制造方法 |
JP2000338480A (ja) * | 1999-05-28 | 2000-12-08 | Kyocera Corp | 反射型液晶表示装置の製法 |
Family Cites Families (21)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4061820A (en) * | 1976-04-07 | 1977-12-06 | Oxford Chemicals, Incorporated | Self-adhering material |
US4574311A (en) * | 1985-04-04 | 1986-03-04 | Thinking Machines Corporation | Random array sensing devices |
US5119235A (en) | 1989-12-21 | 1992-06-02 | Nikon Corporation | Focusing screen and method of manufacturing same |
JP3375352B2 (ja) | 1991-12-03 | 2003-02-10 | ペンタックス株式会社 | 拡散板および拡散板用母型の作製方法 |
US5965327A (en) | 1991-12-03 | 1999-10-12 | Asahi Kogaku Kogyo Kaisha | Method for manufacturing a master die for a diffusion plate and diffusion manufactured by said method |
USD331665S (en) * | 1992-10-02 | 1992-12-15 | Kimberly-Clark Corporation | Embossed tissue |
JP2912176B2 (ja) | 1994-12-28 | 1999-06-28 | 日本電気株式会社 | 反射型液晶表示装置 |
US5965235A (en) * | 1996-11-08 | 1999-10-12 | The Procter & Gamble Co. | Three-dimensional, amorphous-patterned, nesting-resistant sheet materials and method and apparatus for making same |
US6219113B1 (en) * | 1996-12-17 | 2001-04-17 | Matsushita Electric Industrial Co., Ltd. | Method and apparatus for driving an active matrix display panel |
US6717578B1 (en) * | 1998-02-17 | 2004-04-06 | Sun Microsystems, Inc. | Graphics system with a variable-resolution sample buffer |
US6421052B1 (en) * | 1999-04-09 | 2002-07-16 | The Procter & Gamble Company | Method of seaming and expanding amorphous patterns |
JP3892715B2 (ja) * | 2000-12-26 | 2007-03-14 | 株式会社東芝 | 液晶表示装置 |
KR100768271B1 (ko) * | 2001-03-22 | 2007-10-17 | 삼성전자주식회사 | 모아레 현상을 제거하기 위한 반사형 액정표시어셈블리에서의 조명방법, 이를 적용한 반사형 액정표시어셈블리, 이들에 적용된 광 공급 유닛, 이에 적용된 광분포 변경 유닛의 제조방법 |
TW567392B (en) * | 2001-09-07 | 2003-12-21 | Nec Corp | Device for generating ragged pattern data in random arrangement, computer program, mask and manufacturing device, light reflection member manufacturing device, liquid crystal manufacturing device, liquid crystal display device, portable terminal device |
JP2003122267A (ja) * | 2001-10-04 | 2003-04-25 | Koninkl Philips Electronics Nv | 光反射体及びそれを用いた表示装置 |
US7173659B2 (en) * | 2001-12-13 | 2007-02-06 | International Business Machines Corporation | System and method for anti-moire imaging |
US7277143B2 (en) * | 2002-09-20 | 2007-10-02 | Hitachi Displays, Ltd. | Translucent reflective type liquid crystal display |
ATE423991T1 (de) * | 2004-01-05 | 2009-03-15 | Tpo Hong Kong Holding Ltd | Reflektive struktur und bildanzeigeeinrichtung |
JP2005321610A (ja) * | 2004-05-10 | 2005-11-17 | Alps Electric Co Ltd | 反射型双安定ネマティック液晶表示装置 |
JP4768393B2 (ja) * | 2005-10-21 | 2011-09-07 | Nec液晶テクノロジー株式会社 | 液晶表示装置およびその製造方法 |
JP2010080280A (ja) * | 2008-09-26 | 2010-04-08 | Sony Corp | 面光源装置及び表示装置 |
-
2002
- 2002-09-04 TW TW091120140A patent/TW567392B/zh not_active IP Right Cessation
- 2002-09-05 US US10/487,496 patent/US7612847B2/en active Active
- 2002-09-05 JP JP2003527470A patent/JP4309265B2/ja not_active Expired - Lifetime
- 2002-09-05 KR KR1020047003409A patent/KR100675077B1/ko not_active IP Right Cessation
- 2002-09-05 WO PCT/JP2002/009012 patent/WO2003023462A1/ja active Application Filing
- 2002-09-05 CN CNB028175336A patent/CN1324331C/zh not_active Expired - Lifetime
- 2002-09-05 EP EP02767890A patent/EP1429159A4/en not_active Withdrawn
-
2009
- 2009-04-02 US US12/384,267 patent/US7855766B2/en not_active Expired - Fee Related
- 2009-08-07 US US12/462,710 patent/US7787079B2/en not_active Expired - Fee Related
Patent Citations (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS59208536A (ja) * | 1983-05-12 | 1984-11-26 | Canon Inc | フオ−カシングスクリ−ンの製造方法 |
US5733710A (en) * | 1991-12-03 | 1998-03-31 | Asahi Kogaku Kogyo Kabushiki Kaisha | Method for manufacturing a master die for a diffusion plate and diffusion plate manufactured by said method |
JPH09292504A (ja) * | 1996-02-27 | 1997-11-11 | Sharp Corp | 反射板及びその作製方法及びその反射板を用いた反射型液晶表示装置 |
CN1266254A (zh) * | 1999-03-04 | 2000-09-13 | 三星电子株式会社 | 反射型液晶显示器及其制造方法 |
JP2000338480A (ja) * | 1999-05-28 | 2000-12-08 | Kyocera Corp | 反射型液晶表示装置の製法 |
Also Published As
Publication number | Publication date |
---|---|
KR100675077B1 (ko) | 2007-01-29 |
US20090228539A1 (en) | 2009-09-10 |
EP1429159A4 (en) | 2008-07-16 |
EP1429159A1 (en) | 2004-06-16 |
US20090322757A1 (en) | 2009-12-31 |
US20040239844A1 (en) | 2004-12-02 |
CN1554029A (zh) | 2004-12-08 |
US7787079B2 (en) | 2010-08-31 |
KR20040044864A (ko) | 2004-05-31 |
WO2003023462A1 (fr) | 2003-03-20 |
US7855766B2 (en) | 2010-12-21 |
JP4309265B2 (ja) | 2009-08-05 |
TW567392B (en) | 2003-12-21 |
JPWO2003023462A1 (ja) | 2004-12-24 |
US7612847B2 (en) | 2009-11-03 |
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Legal Events
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C06 | Publication | ||
PB01 | Publication | ||
C10 | Entry into substantive examination | ||
SE01 | Entry into force of request for substantive examination | ||
C14 | Grant of patent or utility model | ||
GR01 | Patent grant | ||
ASS | Succession or assignment of patent right |
Free format text: FORMER OWNER: NEC LIQUID CRYSTAL TECHNOLOGY CO., LTD. Owner name: NEC LIQUID CRYSTAL TECHNOLOGY CO., LTD. Free format text: FORMER OWNER: NIPPON ELECTRIC CO., LTD. Effective date: 20100415 |
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C41 | Transfer of patent application or patent right or utility model | ||
COR | Change of bibliographic data |
Free format text: CORRECT: ADDRESS; FROM: TOKYO, JAPAN TO: KANAGAWA PREFECTURE, JAPAN COUNTY |
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TR01 | Transfer of patent right |
Effective date of registration: 20100415 Address after: Kanagawa, Japan Patentee after: NEC LCD Technologies, Ltd. Address before: Tokyo, Japan Co-patentee before: NEC LCD Technologies, Ltd. Patentee before: NEC Corp. |
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C56 | Change in the name or address of the patentee |
Owner name: NLT TECHNOLOGIES, LTD. Free format text: FORMER NAME: NEC LCD TECH CORP. |
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CP01 | Change in the name or title of a patent holder |
Address after: Kanagawa, Japan Patentee after: NLT TECHNOLOGIES, Ltd. Address before: Kanagawa, Japan Patentee before: NEC LCD Technologies, Ltd. |
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CX01 | Expiry of patent term |
Granted publication date: 20070704 |
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CX01 | Expiry of patent term |