CN105573059A - Shading device of exposure machine - Google Patents
Shading device of exposure machine Download PDFInfo
- Publication number
- CN105573059A CN105573059A CN201410526683.4A CN201410526683A CN105573059A CN 105573059 A CN105573059 A CN 105573059A CN 201410526683 A CN201410526683 A CN 201410526683A CN 105573059 A CN105573059 A CN 105573059A
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- Prior art keywords
- exposure
- shade
- main
- those
- chopping mechanism
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- 230000007246 mechanism Effects 0.000 claims abstract description 109
- 238000004519 manufacturing process Methods 0.000 description 8
- 238000000034 method Methods 0.000 description 4
- 239000011159 matrix material Substances 0.000 description 2
- 230000003287 optical effect Effects 0.000 description 2
Abstract
The invention discloses a shading device of an exposure machine, which comprises a main shading mechanism and an auxiliary shading mechanism. And a main shading mechanism arranged on the light advancing path. The auxiliary shading mechanism is arranged on the light traveling line and is positioned on one side of the main shading mechanism. Wherein, the shape of the exposure opening formed by the main shading mechanism and the auxiliary shading mechanism corresponds to the shape of the exposure area on the wafer.
Description
Technical field
The present invention relates to a kind of shade, and particularly relate to a kind of shade of exposure bench.
Background technology
In ic manufacturing process, lithographic fabrication process is irradiated the exposure area (shot) on wafer by exposure bench, and optical mask pattern is transferred to the photosensitive film on wafer.
Existing exposure bench can carry out single exposure manufacture craft to the exposure area of rectangle and complete exposure.But, existing exposure bench is when exposing the incomplete rectangular exposed area of Waffer edge, same incomplete rectangular exposed area is at least needed to carry out exposing manufacture craft for more than twice and just can complete exposure, therefore can produce the problem that the time shutter increases and tube core (die) yield reduces.
For existing stepping exposure bench, owing to being adopt the superimposed exposure method carrying out exposing for more than twice manufacture craft to expose same incomplete rectangular exposed area, so exposure passages increases, and increased the time shutter of every wafer.In addition, superimposed exposure method easily produces repeated exposure or unexposed situation at superimposed place, and reduces tube core yield.
Summary of the invention
The object of the present invention is to provide a kind of shade of exposure bench, it effectively can reduce the time shutter and promote tube core yield.
For reaching above-mentioned purpose, the present invention proposes a kind of shade of exposure bench, comprises main chopping mechanism and auxiliary chopping mechanism.Main chopping mechanism, is arranged on light travel path.Auxiliary chopping mechanism to be arranged in light course and to be positioned at the side of main chopping mechanism.Wherein, the shape of the exposure opening formed by main chopping mechanism and auxiliary chopping mechanism corresponds to the shape of the exposure area on wafer.
Described in one embodiment of the invention, in the shade of above-mentioned exposure bench, main chopping mechanism comprises the first support plate, the first driving mechanism and multiple main shadow shield.First driving mechanism is arranged on the first support plate.Main shadow shield is connected to the first driving mechanism.
Described in one embodiment of the invention, in the shade of above-mentioned exposure bench, the first driving mechanism comprises multiple first guide rail and multiple first step motor.First guide rail is arranged on the first support plate.First step motor to be arranged on the first guide rail and to be connected to main shadow shield.
Described in one embodiment of the invention, in the shade of above-mentioned exposure bench, the first driving mechanism also comprises multiple first web member.First step motor is connected by the first web member with main shadow shield.
Described in one embodiment of the invention, in the shade of above-mentioned exposure bench, auxiliary chopping mechanism comprises the second support plate, the second driving mechanism and multiple supplementary sun visor.Second driving mechanism is arranged on the second support plate.Multiple supplementary sun visor is connected to the second driving mechanism.
Described in one embodiment of the invention, in the shade of above-mentioned exposure bench, the second driving mechanism comprises at least one second guide rail, multiple second step motor, multiple 3rd guide rail and multiple 3rd step motor.Second guide rail is arranged on the second support plate.Second step motor is arranged on the second guide rail.3rd guide rail is connected to the second step motor.3rd step motor to be arranged on the 3rd guide rail and to be connected to supplementary sun visor.
Described in one embodiment of the invention, in the shade of above-mentioned exposure bench, the second driving mechanism also comprises multiple second web member.3rd step motor is connected by the second web member with supplementary sun visor.
Described in one embodiment of the invention, in the shade of above-mentioned exposure bench, exposure area can be incomplete rectangular exposed area or rectangular exposed area.
Described in one embodiment of the invention, in the shade of above-mentioned exposure bench, auxiliary chopping mechanism can be positioned at main chopping mechanism away from or near the side of light source.
Described in one embodiment of the invention, in the shade of above-mentioned exposure bench, exposure bench can be stepping exposure bench.
Based on above-mentioned, in the shade of exposure bench proposed by the invention, due to the shape that the shape of the exposure opening formed by main chopping mechanism and auxiliary chopping mechanism can be made to correspond to the exposure area on wafer, so to the incomplete rectangular exposed area on wafer and rectangular exposed area, all as long as carrying out single exposure manufacture craft can complete exposure, therefore effectively can reduce the time shutter and promote tube core yield.
For above-mentioned feature and advantage of the present invention can be become apparent, special embodiment below, and the accompanying drawing appended by coordinating is described in detail below.
Accompanying drawing explanation
Fig. 1 is the outboard profile of the shade of the exposure bench of one embodiment of the invention;
Fig. 2 is the front elevation of the main chopping mechanism in the shade of the exposure bench of one embodiment of the invention;
Fig. 3 is the front elevation of the auxiliary chopping mechanism in the shade of the exposure bench of one embodiment of the invention;
Fig. 4 is the top view of the wafer of one embodiment of the invention;
Fig. 5 is the front elevation of main chopping mechanism when forming the exposure opening of the shape corresponding to rectangular exposed area in Fig. 2;
Fig. 6 is the front elevation of auxiliary chopping mechanism when forming the exposure opening of the shape corresponding to incomplete rectangular exposed area in Fig. 3.
Symbol description
100: shade
102: main chopping mechanism
104: auxiliary chopping mechanism
106: the first support plates
108: the first driving mechanisms
110a, 110b, 110c, 110d: main shadow shield
112a, 112b: the first guide rail
114a, 114b, 114c, 114d: the first step motor
116a, 116b, 116c, 116d: the first web member
118: the second support plates
120: the second driving mechanisms
122a, 122b, 122c, 122d: supplementary sun visor
124: the second guide rails
126a, 126b: the second step motor
128a, 128b: the 3rd guide rail
130a, 130b, 130c, 130d: the 3rd step motor
132a, 132b, 132c, 132d: the second web member
134,136: exposure opening
200: light source
202: light travel path
300: wafer
302: exposure area
304: photosensitive film
306: incomplete rectangular exposed area
308: rectangular exposed area
X: axle
Y: axle
X1, X2, X3, Y1, Y2, Y3, Y4: direction
Embodiment
Fig. 1 is the outboard profile of the shade of the exposure bench of one embodiment of the invention.Fig. 2 is the front elevation of the main chopping mechanism in the shade of the exposure bench of one embodiment of the invention.Fig. 3 is the front elevation of the auxiliary chopping mechanism in the shade of the exposure bench of one embodiment of the invention.Fig. 4 is the top view of the wafer of one embodiment of the invention.Fig. 5 is the front elevation of main chopping mechanism when forming the rectangle exposure opening of the shape corresponding to exposure area in Fig. 2.Fig. 6 is the front elevation of auxiliary chopping mechanism when forming the exposure opening of the shape corresponding to incomplete rectangular exposed area in Fig. 3.
Referring to Fig. 1 to Fig. 4, the shade 100 of exposure bench, comprises main chopping mechanism 102 and auxiliary chopping mechanism 104.Exposure bench can irradiate the exposure area 302 of wafer 300, and optical mask pattern is transferred to the photosensitive film 304 on wafer 300.Exposure area 302 can be incomplete rectangular exposed area 306 or rectangular exposed area 308.Exposure bench can be stepping exposure bench.
Please refer to Fig. 1, Fig. 2 and Fig. 4, main chopping mechanism 102 can be arranged on the light travel path 202 of light source 200.Main chopping mechanism 102 can be used for forming exposure opening, and the shape of the exposure opening formed may correspond to the shape of the rectangular exposed area 308 on wafer 300.In the present embodiment, it is consistent in fact that " correspondence " in shape means shape, but may have the difference on multiplying power or direction according to the design of lens.Have in this technical field and usually know that the knowledgeable can adjust multiplying power or direction according to demand.Main chopping mechanism 102 can comprise the first support plate 106, first driving mechanism 108 and main shadow shield 110a, 110b, 110c, 110d.
First driving mechanism 108 is arranged on the first support plate 106.For example, the first driving mechanism 108 can comprise first guide rail 112a, 112b and first step motor 114a, 114b, 114c, 114d.In addition, the first driving mechanism 108 also can comprise first web member 116a, 116b, 116c, 116d.
First guide rail 112a, 112b is arranged on the first support plate 106.First guide rail 112a, 112b can be arranged along the X-direction of X-Y plane coordinate system and Y direction respectively.
First step motor 114a, 114b to be arranged on the first guide rail 112a and to be connected to main shadow shield 110a, 110b.First step motor 114a, 114b can make winner shadow shield 110a, 110b move in the X-axis direction.First step motor 114c, 114d to be arranged on the first guide rail 112b and to be connected to main shadow shield 110c, 110d.First step motor 114c, 114d can make winner shadow shield 110c, 110d move in the Y-axis direction.First step motor 114a, 114b, 114c, 114d can be connected respectively by first web member 116a, 116b, 116c, 116d with main shadow shield 110c, 110d, 110c, 110d.Thus, main shadow shield 110c, 110d, 110c, 110d can be connected to the first driving mechanism 108.
But main chopping mechanism 102 is not limited to above-described embodiment, as long as main chopping mechanism 102 can form the exposure opening of the shape corresponding to the rectangular exposed area 308 on wafer 300.Have in this technical field and usually know that the knowledgeable can according to the demand in design from the aspect of the main chopping mechanism 102 of Row sum-equal matrix.With regard to above-described embodiment, there is in this technical field type of drive, shape, quantity and the set-up mode of usually knowing the main shadow shield of the knowledgeable's adjustable, also the quantity and set-up mode etc. of adjustable first guide rail and the first step motor.
Please refer to Fig. 1, Fig. 3 and Fig. 4, auxiliary chopping mechanism 104 to be arranged in light course 202 and to be positioned at the side of main chopping mechanism 102.In this embodiment, be that the side away from light source 200 being positioned at main chopping mechanism 102 for auxiliary chopping mechanism 104 is described.In another embodiment, auxiliary chopping mechanism 104 also can be positioned at the side of the close light source 200 of main chopping mechanism 102.
Auxiliary chopping mechanism 104 can be used for modifying the exposure opening formed by main chopping mechanism 102, the shape of the exposure opening therefore formed with auxiliary chopping mechanism 104 by main chopping mechanism 102 may correspond to the shape of the exposure area 302 on wafer 300, as the shape of incomplete rectangular exposed area 306 or the shape of rectangular exposed area 308.Auxiliary chopping mechanism 104 can comprise second support plate 118, second driving mechanism 120 and supplementary sun visor 122a, 122b, 122c, 122d.
Second driving mechanism 120 is arranged on the second support plate 118.For example, the second driving mechanism 120 can comprise at least one second guide rail 124, second step motor 126a, 126b, the 3rd guide rail 128a, 128b and the 3rd step motor 130a, 130b, 130c, 130d.In addition, the second driving mechanism 120 also can comprise second web member 132a, 132b, 132c, 132d.
Second guide rail 124 is arranged on the second support plate 118.Second guide rail 124 can be arranged along the X-direction of X-Y plane coordinate system respectively.Second step motor 126a, 126b is arranged on the second guide rail 124.
3rd guide rail 128a, 128b is connected to second step motor 126a, 126b.3rd guide rail 128a, 128b can be arranged along the Y direction of X-Y plane coordinate system respectively.
3rd step motor 130a, 130b to be arranged on the 3rd guide rail 128a and to be connected to supplementary sun visor 122a, 122b.3rd step motor 130a, 130b can make supplementary sun visor 122a, 122b move in the Y-axis direction respectively.3rd step motor 130c, 130d to be arranged on the 3rd guide rail 128b and to be connected to supplementary sun visor 122c, 122d.3rd step motor 130c, 130d can make supplementary sun visor 122c, 122d move in the Y-axis direction respectively.3rd step motor 130a, 130b, 130c, 130d can be connected respectively by second web member 132a, 132b, 132c, 132d with supplementary sun visor 122a, 122b, 122c, 122d.Thus, supplementary sun visor 122a, 122b, 122c, 122d can be connected to the second driving mechanism 120.
In addition, drive the 3rd guide rail 128a, 128b respectively by second step motor 126a, 126b, and supplementary sun visor 122a, 122b, 122c, 122d can be moved in the X-axis direction.
But, auxiliary chopping mechanism 104 is not limited to above-described embodiment, as long as auxiliary chopping mechanism 104 can be used for modifying the exposure opening formed by main chopping mechanism 102, and makes the shape of the exposure opening formed with auxiliary chopping mechanism 104 by main chopping mechanism 102 may correspond to the shape of the exposure area 302 on wafer 300.Have in this technical field and usually know that the knowledgeable can assist the aspect of chopping mechanism 104 from Row sum-equal matrix according to the demand in design.With regard to above-described embodiment, there is type of drive, shape, quantity and the set-up mode of usually knowing the knowledgeable's adjustable supplementary sun visor, also the quantity and set-up mode etc. of adjustable second guide rail, the second step motor, the 3rd guide rail and the 3rd step motor in this technical field.
Then, for the shade 100 of the exposure bench of above-described embodiment, illustrate and form by main chopping mechanism 102 and auxiliary chopping mechanism 104 method exposing opening.
Referring to Fig. 2 to Fig. 5, when shade 100 will form the exposure opening 134 corresponding to the shape of rectangular exposed area 308, by the first driving mechanism 108, main shadow shield 110a, 110b, 110c, 110d moved to the position in Fig. 5 from the position Fig. 2 and form exposure opening 134.In detail, first driving mechanism 108 to make flowing mode as follows: make first step motor 114a, 114b, 114c, 114d respectively along X1 direction, X2 direction, Y1 direction, Y2 direction move, and adjust main shadow shield 110a, 110b position in the X-axis direction and adjust main shadow shield 110c, 110d position in the Y-axis direction, until the shape of exposure opening 134 corresponds to the shape of rectangular exposed area 308.Now, owing to not needing to use auxiliary chopping mechanism 104 to modify the exposure opening 134 formed by main chopping mechanism 102, as long as therefore assist 122a, 122b, 122c, 122d in chopping mechanism 104 to be positioned at the position can not covering exposure opening 134.
In like manner, in other embodiments, if the rectangular exposed area 308 on wafer 300 has other shapes, in order to make the shape of exposure opening 134 corresponding with the rectangular exposed area 308 of various shape, by adjusting the position of main shadow shield 110a, 110b, 110c, 110d of main chopping mechanism 102, and form the exposure opening 134 of various shape.
Referring to Fig. 2 to Fig. 6, when shade 100 will form the exposure opening 136 corresponding to the shape of incomplete rectangular exposed area 306, formed except exposure opening 134 except main shadow shield 110a, 110b, 110c, 110d being moved to the position in Fig. 5 from the position Fig. 2 by the first driving mechanism 108, more by the second driving mechanism 120, supplementary sun visor 122c, 122d moved to the position in Fig. 6 from the position Fig. 3 and the shape of exposure opening 134 is modified, and then forming exposure opening 136.In detail, second driving mechanism 120 to make flowing mode as follows: the second step motor 126b is moved along X3 direction, and adjust supplementary sun visor 122c, 122d position in the X-axis direction, and the 3rd step motor 130c, 130d is moved along Y3 direction and Y4 direction respectively, and adjust supplementary sun visor 122c, 122d position in the Y-axis direction, until the shape of exposure opening 136 corresponds to the shape of incomplete rectangular exposed area 306.
In like manner, when exposing the incomplete rectangular exposed area 306 of other shapes on wafer 300, in order to make the shape of exposure opening 136 corresponding with the incomplete rectangular exposed area 306 of various shape, by the position of the position of main shadow shield 110a, 110b, 110c, 110d and supplementary sun visor 122a, 122b, 122c, 122d of auxiliary chopping mechanism 104 that adjust main chopping mechanism 102, and form the exposure opening 136 of various shape.
Based on above-mentioned known, by the shade 100 of the exposure bench of above-described embodiment, the shape of the exposure opening 134,136 formed with auxiliary chopping mechanism 104 by main chopping mechanism 102 can be made to correspond respectively to the shape of the exposure area 302 on wafer 300, so to the incomplete rectangular exposed area 306 on wafer 300 and rectangular exposed area 308, all as long as carrying out single exposure manufacture craft can complete exposure, therefore effectively can reduce the time shutter.In addition, when the shade 100 of the exposure bench by above-described embodiment exposes, owing to not needing to carry out superimposed exposure, therefore can avoid producing repeated exposure or unexposed situation, and then can effectively promote tube core yield.
In sum, the shade of the exposure bench of above-described embodiment at least has features.Shade due to the exposure bench of above-described embodiment can make the shape of formed exposure opening correspond to the shape of each exposure area on wafer, as long as so carry out single exposure manufacture craft can complete exposure, therefore effectively can reduce the time shutter and promote tube core yield.
Although disclose the present invention in conjunction with above embodiment; but itself and be not used to limit the present invention; have in any art and usually know the knowledgeable; without departing from the spirit and scope of the present invention; a little change and retouching can be done, therefore being as the criterion of should defining with the claim of enclosing of protection scope of the present invention.
Claims (10)
1. a shade for exposure bench, comprising:
Main chopping mechanism, is arranged on a smooth travel path; And
Auxiliary chopping mechanism, to be arranged in this light course and to be positioned at the side of this main chopping mechanism, wherein
Formed by this main chopping mechanism and this auxiliary chopping mechanism one shape exposing opening corresponds to the shape of the exposure area on a wafer.
2. the shade of exposure bench as claimed in claim 1, wherein this main chopping mechanism comprises:
First support plate;
First driving mechanism, is arranged on this first support plate; And
Multiple main shadow shield, is connected to this first driving mechanism.
3. the shade of exposure bench as claimed in claim 2, wherein this first driving mechanism comprises:
Multiple first guide rail, is arranged on this first support plate; And
Multiple first step motor, to be arranged on those first guide rails and to be connected to those main shadow shields.
4. the shade of exposure bench as claimed in claim 3, wherein this first driving mechanism also comprises multiple first web member, and those first step motor are connected by those first web members with those main shadow shields.
5. the shade of exposure bench as claimed in claim 1, wherein this auxiliary chopping mechanism comprises:
Second support plate;
Second driving mechanism, is arranged on this second support plate; And
Multiple supplementary sun visor, is connected to this second driving mechanism.
6. the shade of exposure bench as claimed in claim 5, wherein this second driving mechanism comprises:
At least one second guide rail, is arranged on this second support plate;
Multiple second step motor, is arranged on those second guide rails;
Multiple 3rd guide rail, is connected to those the second step motor; And
Multiple 3rd step motor, to be arranged on those the 3rd guide rails and to be connected to those supplementary sun visors.
7. the shade of exposure bench as claimed in claim 6, wherein this second driving mechanism also comprises multiple second web member, and those the 3rd step motor are connected by those second web members with those supplementary sun visors.
8. the shade of exposure bench as claimed in claim 1, wherein this exposure area comprises incomplete rectangular exposed area or rectangular exposed area.
9. the shade of exposure bench as claimed in claim 1, wherein this auxiliary chopping mechanism be positioned at this main chopping mechanism away from or near the side of light source.
10. the shade of exposure bench as claimed in claim 1, wherein this exposure bench comprises stepping exposure bench.
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| TW103132628A TWI550362B (en) | 2014-09-22 | 2014-09-22 | Light shading device of exposure machine |
| TW103132628 | 2014-09-22 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| CN105573059A true CN105573059A (en) | 2016-05-11 |
| CN105573059B CN105573059B (en) | 2018-07-06 |
Family
ID=55883348
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201410526683.4A Active CN105573059B (en) | 2014-09-22 | 2014-10-09 | Shading device of exposure machine |
Country Status (2)
| Country | Link |
|---|---|
| CN (1) | CN105573059B (en) |
| TW (1) | TWI550362B (en) |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN106773336A (en) * | 2017-01-03 | 2017-05-31 | 京东方科技集团股份有限公司 | A kind of shade, multi-model set product light orientation equipment and its control method |
| CN114326321A (en) * | 2021-12-13 | 2022-04-12 | 复旦大学附属中山医院 | Auxiliary exposure device for western blot strip |
Families Citing this family (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| TWI709190B (en) * | 2019-06-14 | 2020-11-01 | 財團法人國家實驗研究院 | Structure and exposure method applied to exposure machine |
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|---|---|---|---|---|
| US6325516B1 (en) * | 1994-02-14 | 2001-12-04 | Nippon Kogaku Kk | Exposure apparatus and field stop thereof |
| JP2003005346A (en) * | 2001-06-21 | 2003-01-08 | Toshiba Corp | Method and device for manufacturing mask |
| CN102466963A (en) * | 2010-11-12 | 2012-05-23 | 北京京东方光电科技有限公司 | Mask and method for mask exposure |
| US20130162965A1 (en) * | 2011-12-26 | 2013-06-27 | Samsung Display Co., Ltd. | Exposure apparatus |
| CN104102094A (en) * | 2014-06-27 | 2014-10-15 | 京东方科技集团股份有限公司 | Mask baffle plate and fabrication method thereof |
Family Cites Families (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2006140314A (en) * | 2004-11-12 | 2006-06-01 | Nikon Corp | Driver and exposure device |
| WO2007145139A1 (en) * | 2006-06-16 | 2007-12-21 | Nikon Corporation | Variable slit device, illuminating device, exposure device, exposure method, and method of manufacturing device |
| US20090123874A1 (en) * | 2007-11-14 | 2009-05-14 | Tadashi Nagayama | Exposure method, exposure apparatus, and method for manufacturing device |
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2014
- 2014-09-22 TW TW103132628A patent/TWI550362B/en active
- 2014-10-09 CN CN201410526683.4A patent/CN105573059B/en active Active
Patent Citations (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US6325516B1 (en) * | 1994-02-14 | 2001-12-04 | Nippon Kogaku Kk | Exposure apparatus and field stop thereof |
| JP2003005346A (en) * | 2001-06-21 | 2003-01-08 | Toshiba Corp | Method and device for manufacturing mask |
| CN102466963A (en) * | 2010-11-12 | 2012-05-23 | 北京京东方光电科技有限公司 | Mask and method for mask exposure |
| US20130162965A1 (en) * | 2011-12-26 | 2013-06-27 | Samsung Display Co., Ltd. | Exposure apparatus |
| CN104102094A (en) * | 2014-06-27 | 2014-10-15 | 京东方科技集团股份有限公司 | Mask baffle plate and fabrication method thereof |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN106773336A (en) * | 2017-01-03 | 2017-05-31 | 京东方科技集团股份有限公司 | A kind of shade, multi-model set product light orientation equipment and its control method |
| CN114326321A (en) * | 2021-12-13 | 2022-04-12 | 复旦大学附属中山医院 | Auxiliary exposure device for western blot strip |
Also Published As
| Publication number | Publication date |
|---|---|
| CN105573059B (en) | 2018-07-06 |
| TWI550362B (en) | 2016-09-21 |
| TW201612649A (en) | 2016-04-01 |
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Effective date of registration: 20190625 Address after: Hsinchu Science Park, Taiwan, China Patentee after: Lijing Jicheng Electronic Manufacturing Co., Ltd. Address before: Hsinchu Science Park, Taiwan, China Patentee before: Powerflash Technology Corporation |
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