CN105319856A - Exposure system being adjustable in exposure intensity - Google Patents
Exposure system being adjustable in exposure intensity Download PDFInfo
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- CN105319856A CN105319856A CN201410298957.9A CN201410298957A CN105319856A CN 105319856 A CN105319856 A CN 105319856A CN 201410298957 A CN201410298957 A CN 201410298957A CN 105319856 A CN105319856 A CN 105319856A
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- light
- reflector element
- optical devices
- exposure
- lens
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Abstract
The invention provides an exposure system which includes a light source device, a control device, a light distribution device, a first optical device, a second optical device and a lens array device. The control device generates a control signal. The light distribution device receives a light generated from the light source device and is provided with a plurality of reflective units, each of which has a plurality of reflective lens. The control signal from the control device controls the reflective lens in each reflective unit to move to adjust the light into a plurality of corresponding distribution lights and regulate the intensity of the distribution lights. The lens array device includes a plurality of lenses which are corresponding to the reflective units in the light distribution device in a one-to-one manner. The exposure system can control the reflective lens in the reflective units to regulate the intensity of the distribution lights by means of the control signal.
Description
Technical field
The present invention is relevant with exposure system, refers to a kind of exposure system of adjustable exposure intensity especially.
Background technology
As the U.S.'s No. 6876494 Patent Case, it discloses a kind of imaging device (imagingformingapparatus).Multiple pixel cells of one light allotment element of this patent are the micro lens of corresponding micro-lens array one to one, so, by the light of light allotment element reflects, after passing through micro-lens array, the intensity of light is all identical, and can not control the intensity of light, that is, can only control during exposure operation whether to expose workplace, and the exposure intensity of the every bit of uncontrollable plane of exposure.
In addition, to strengthen the exposure intensity of workplace, tradition can only by changing the light intensity of light source or changing the time shutter.Select the light intensity changing light source must improve the power of light source, so not only can increase cost, also can cause and control upper inconvenience.Select to change the time shutter, then can increase the time of exposure operation.
Summary of the invention
Because above-mentioned disappearance, the invention provides a kind of exposure system, it can control the exposure intensity of workplace, and does not need the power and the increase time shutter that change light source, and can effectively improve exposure operation efficiency.Moreover exposure system of the present invention also can provide the exposure of different exposure intensity for the every bit of workplace.
Exposure system of the present invention comprises a light supply apparatus, a control device, a light deployment device, one first optical devices, one second optical devices and a lens array device.Light supply apparatus produces a light.Control device produces one and controls signal.Light deployment device receives light, and has multiple reflector element.Each reflector element has multiple catoptron, and controls the catoptron running of each reflector element according to control signal.Light is deployed into corresponding multiple allotment light by this several reflector element respectively, and adjusts the intensity of this several allotment light.Lens array device between first and second optical devices, and has multiple lens.The reflector element of these several lens corresponding light deployment device one to one.Wherein, this several allotment light of this several reflector element allotment is sequentially by lens and second optical devices of the first optical devices, lens array device.
So, exposure system of the present invention can control the mirror tilt running of each reflector element by control signal, and then reach the intensity of adjustment allotment light, and control signal can the intensity of allotment light of each reflector element of unit control reflection, therefore, exposure system of the present invention not only can control the exposure intensity of workplace, also can provide the exposure of different exposure intensity for the every bit of workplace.
About the detailed configuration of exposure system provided by the present invention, feature or use-pattern, described in describing in detail in follow-up embodiment.But have in field of the present invention and usually know that the knowledgeable should be able to understand, this detailed description and the specific embodiment implemented cited by the present invention, only for illustration of the present invention, and be not used to limit patent claim of the present invention.
Accompanying drawing explanation
Fig. 1 is the schematic diagram of exposure system of the present invention.
Fig. 2 is the close-up schematic view that in Fig. 1, exposure system omits light supply apparatus and control device.
Fig. 3 is the schematic diagram of light deployment device in Fig. 1.
Fig. 4 is the close-up schematic view in Fig. 3.
Fig. 5 A is the schematic diagram of a catoptron start of a wherein reflector element in Fig. 3.
Fig. 5 B figure is the schematic diagram that in Fig. 5 A, catoptron reflection ray exposes the workplace of base material.
Fig. 6 A is the schematic diagram of five catoptron starts of a wherein reflector element in Fig. 3.
Fig. 6 B is the schematic diagram that in Fig. 6 A, catoptron reflection ray exposes the workplace of base material.
Fig. 7 A is the schematic diagram of the full reflection mirror start of a wherein reflector element in Fig. 3.
Fig. 7 B is the schematic diagram that in Fig. 7 A, catoptron reflection ray exposes the workplace of base material.
Embodiment
Below, hereby coordinate and respectively graphicly enumerate corresponding preferred embodiment to the composition component of exposure system of the present invention and reach effect to explain.The component of right each graphic middle exposure system, size and outward appearance are only used for technical characteristic of the present invention is described, but not are construed as limiting the present invention.
As shown in Fig. 1 and 2, exposure system 10 of the present invention comprises light supply apparatus 11, control device 12, light deployment device 13,1 first optical devices 14,1 second optical devices 15 and a lens array device 16.
Light supply apparatus 11 produces a light L, and comprise light-emitting component 111, light alignment clamp 112 and a reverberator 113.Light-emitting component 111 produces light L, and light alignment clamp 112 receives light L, and light is deployed into a parallel rays L
p, that is, light alignment clamp 112 can control the projecting direction of light L, and light alignment clamp 112 can be optical lens, optical fiber assembly etc.Reverberator 113 receives parallel rays L
p, and by parallel rays L
preflection, in this embodiment, reverberator 113 is catoptrons.
Control device 12 produces a control signal, and in this embodiment, control device can be computing machine or other specialized equipments.
Light deployment device 13 is numerical digit microreflection mirror element (digitalmicromirrordevice, DMD), and in order to receive light L
r, and there is multiple reflector element 131.This several reflector element 131 controls light L by the control signal of control device 12
rprojecting direction, and then respectively by light L
rbe deployed into corresponding multiple allotment light L
m, and adjust this several allotment light L
mlight intensity, detailed light intensity control mode please Rong Hou state.
The allotment light L that first optical devices 14 reflect in order to allocate reflector element 131
m, and allotment light L
mby the first optical devices 14, in this embodiment, the first optical devices 14 form by one first optical lens 141 and one second optical lens 142.Wherein, the first optical lens 141 allotment light L that reflector element 131 can be reflected
mthe second optical lens 142 is projected to after focusing, finally, allotment light L
mjust outwards project after again being focused on by the second optical lens 142.
Second optical devices 15 have one the 3rd optical lens 151 and one the 4th optical lens 152.
Lens array device 16 is micro-lens arrays (micro-lensarray, MLA), and between the first optical devices 14 and the second optical devices 15, and there are multiple lens 161.These several lens 161 are one to one to should the reflector element 131 of light deployment device 13.Wherein, the allotment light L of reflector element 131 reflection
msequentially by the first optical devices 14, lens array device 16 and the second optical devices 15, finally, ray cast will be allocated on a workplace 20, to carry out exposure operation to part workplace 20 needing be exposed by the 3rd and the 4th optical lens 151,152 of the second optical devices 15.
In this embodiment, workplace 20 can be the surface of the base material of printed circuit board (PCB) or an electrically-conductive backing plate etc., and the conductive path of printed circuit board (PCB) or electrically-conductive backing plate can make by exposure system of the present invention, and control the live width of conductive path, and conductive path can be two dimension or three-dimensional structure.
As shown in figs. 3 and 4, light deployment device 13 has multiple catoptron 132, and each catoptron 132 can control its pendulum angle by control signal, the pendulum angle of each catoptron 132, in the scope of positive and negative 12 degree, controls allotment light and whether enters the first optical devices.But along with technical development, the pendulum angle of the catoptron 132 of light deployment device 13 can be larger, therefore pendulum angle is not as limit.
In addition, the pendulum angle of catoptron 132 is relevant with the setting position of the first optical devices 14, second optical devices 15 and lens array modules 16, so the present invention is not restricted catoptron 132 pendulum angle more.
Especially, the catoptron 132 of light deployment device 13 is distinguished into multiple reflector element 131 (the division scope as heavy line in figure) by the present invention in advance, also just represent that each reflector element 131 has multiple catoptron 132, in this embodiment, each reflector element 131 illustrates for 9 (3*3) individual catoptron 131.Wherein, heavy line is in order to illustrate that feature of the present invention illustrates especially, and in fact light deployment device 13 does not have heavy line.
The control signal of control device controls the pendulum angle of 9 catoptrons 132 of each reflector element 131 simultaneously, reaches the object of the light intensity controlling allotment light.
Referring again to Fig. 2, if when the size of each catoptron 132 is 13.6 microns of (um) * 13.6 microns (um), represent, each reflector element 131 is of a size of 40.8 microns (um) * 40.8 microns (um), therefore, if the first optical devices 14 are the ratios of adopting 1:1, namely allocate light L
mwhen being all identical by the incidence surface of the first optical devices 14 and the ratio of exiting surface, now, lens 161 size of lens array device 16 can be selected to be 40.8 microns (um) * 40.8 microns (um).In the same manner, if the first optical devices 14 are the ratios adopting 1:2, namely light L is allocated
mby being exaggerated 2 times than regular meeting after the exiting surface of the first optical devices 14, lens 161 size of lens array device 16 now should be selected to be 81.6 microns (um) * 81.6 microns (um).So, the selection of the first optical devices 14 is lens 161 size Selection that directly can have influence on back lens array apparatus 16.Moreover only explain with two kinds of ratios here, in fact, the first optical devices 14 also can be other ratios, therefore are not limited with above-mentioned.
By the allotment light L of each lens 161
mcontrol exposure area to the every bit of workplace 20 and conductive path live width by the second optical devices 15, in this embodiment, the second optical devices 15 amplify exposure area.It should be noted that and add man-hour when high precision will be carried out to conductive path, can select to reduce exposure area, but lower accuracy to be carried out to conductive path add man-hour, then can select to amplify exposure area.
The mode controlling the catoptron of this several reflector element owing to controlling signal is identical, therefore, only illustrates for a wherein reflector element subsequently.Wherein, in Fig. 5 A to Fig. 7 A, catoptron there is the expression of circle by light reflection to the first optical devices, contrary, there is no the then expression of circle by outside light reflection to the first optical devices, but in fact, circle is not present on catoptron.
As shown in Fig. 5 A and Fig. 5 B, when light reflection is entered the first optical devices by one of them catoptron 132a controlling signal control reflector element 131, after other catoptrons 132b is then outer by light reflection to the first optical devices, the allotment light entering the first optical devices just can expose (as dotted line scope in figure) the workplace 20 of base material, and the exposure (i.e. exposure intensity) of allotment light is now the most weak.
As shown in Fig. 6 A and Fig. 6 B, when light reflection is entered the first optical devices by wherein five the catoptron 132a controlling signal control reflector element 131, after other catoptrons 132b is then outer by light reflection to the first optical devices, the allotment light entering the first optical devices just can expose (as dotted line scope in figure) the workplace 20 of base material, and the exposure (i.e. exposure intensity) of the allotment light that base material is now subject to is strong than in Fig. 5 B.
As shown in figs. 7 a and 7b, after light reflection is entered the first optical devices by the full reflection mirror 132a controlling signal control reflector element 131, the allotment light entering the second optical devices just can expose (as dotted line scope in figure) the workplace 20 of base material, and the exposure (i.e. exposure intensity) of allotment light is now the strongest.
So, exposure system of the present invention just can control the running of the catoptron of each reflector element by control signal, and adjusts exposure intensity with gently anticipating, and without the need to increasing extra light source cost and can not the time shutter being increased.In addition, although only illustrate for a reflector element in preferred embodiment, but in fact, control signal and also can control the allotment light that this several reflector element reflects varying strength respectively, such as part reflector element is controlled so as to as the most heavy exposure amount in Fig. 7 B, part reflector element then not the amount of being exposed (namely reflector element do not reflect produce allotment light), part reflector element produces as the exposure in Fig. 5 B again, therefore, exposure system of the present invention can provide different exposures to the every bit of workplace.
Although, in the present embodiment, each reflector element explains for 9 catoptrons, but in practice, the number of mirrors of each reflector element can be adjusted, such as minimum two catoptrons or 16 (i.e. 4*4) individual catoptron etc., therefore, the number of mirrors of each reflector element is not to be limited described in this, as long as and minimum two catoptrons.
In addition, the composition of the first optical devices is not limited with aforementioned two optical lenses, and the composition of the second optical devices is not also limited with aforesaid two optical lenses, because, the fundamental purpose of first and second optical devices be do exposure area amplification and reduce, and make the allotment light of this several reflector element allotment can enter the lens of corresponding lens array device smoothly, and provide corresponding exposure and exposure area to the every bit of workplace, therefore, the composition of first and second optical devices and quantity are not depicted as limit with this preferred embodiment.
Comprehensively above-mentioned, exposure system of the present invention can effectively by the reflector element controlling signal control light deployment device, and make allotment light that different light intensities can be utilized to carry out exposure operation to the conducting wire of base material, and improves the resolution of conducting wire.
Finally, again emphasize, the present invention, in front taking off composed component disclosed in embodiment, is only and illustrates, be not used for limiting the protection domain of this case, substituting or change of other equivalence elements, also should be this case claim and contained.
Claims (5)
1. an exposure system, is characterized in that, comprising:
One light supply apparatus, produces a light;
One control device, produces one and controls signal;
One light deployment device, receive this light, and there is multiple reflector element, each reflector element has multiple catoptron, and the catoptron running of each reflector element is controlled according to this control signal, this light is deployed into corresponding multiple allotment light by this several reflector element respectively, and adjusts the light intensity of this several allotment light;
One first optical devices;
One second optical devices; And
One lens array device, between these first optical devices and this second optical devices, and has multiple lens, is one to one to should the reflector element of light deployment device; Wherein, this several allotment light system of this several reflector element allotment is sequentially by lens and this second optical devices of these first optical devices, this lens array device.
2. exposure system according to claim 1, is characterized in that, this light deployment device is a numerical digit microreflection mirror element.
3. exposure system according to claim 1, is characterized in that, this lens array device is a micro-lens array.
4. exposure system according to claim 1, it is characterized in that, this light supply apparatus comprises a light-emitting component, a light alignment clamp and a reverberator, this light-emitting component produces this light, this light alignment clamp receives this light, and this light is deployed into a parallel rays, this reverberator receives this parallel rays, and reflexes to this light deployment device.
5. exposure system according to claim 1, is characterized in that, the control signal of this control device controls the pendulum angle of the catoptron of each reflector element.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201410298957.9A CN105319856A (en) | 2014-06-27 | 2014-06-27 | Exposure system being adjustable in exposure intensity |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201410298957.9A CN105319856A (en) | 2014-06-27 | 2014-06-27 | Exposure system being adjustable in exposure intensity |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN105319856A true CN105319856A (en) | 2016-02-10 |
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| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201410298957.9A Pending CN105319856A (en) | 2014-06-27 | 2014-06-27 | Exposure system being adjustable in exposure intensity |
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Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN107193185A (en) * | 2016-03-14 | 2017-09-22 | 东京毅力科创株式会社 | Auxiliary exposure device |
Citations (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN1658072A (en) * | 2004-02-18 | 2005-08-24 | Asml荷兰有限公司 | Lithographic apparatus and device manufacturing method |
-
2014
- 2014-06-27 CN CN201410298957.9A patent/CN105319856A/en active Pending
Patent Citations (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN1658072A (en) * | 2004-02-18 | 2005-08-24 | Asml荷兰有限公司 | Lithographic apparatus and device manufacturing method |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN107193185A (en) * | 2016-03-14 | 2017-09-22 | 东京毅力科创株式会社 | Auxiliary exposure device |
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Application publication date: 20160210 |
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