CN105150120A - Rigid layer of fixed abrasive polishing roll for Roll-to-Roll chemical-mechanical polishing machine and preparation method of rigid layer - Google Patents
Rigid layer of fixed abrasive polishing roll for Roll-to-Roll chemical-mechanical polishing machine and preparation method of rigid layer Download PDFInfo
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Abstract
The invention discloses a rigid layer of a fixed abrasive polishing roll for a Roll-to-Roll chemical-mechanical polishing machine and a preparation method of the rigid layer. The rigid layer comprises components in percentage by weight as follow: 0.5%-10% of the abrasive, 5%-45% of light-cured resin, 5%-41% of a reactive diluent, 4%-7% of a photoinitiator, 0.05%-5% of an accelerant, 0.05%-3% of a surface performance regulator, 0.05%-5% of an adjuvant, 1%-4% of filler and 0.02% of pigments. The rigid layer of the fixed abrasive polishing roll for the Roll-to-Roll chemical-mechanical polishing machine and the preparation method of the rigid layer have the advantages of simple operation process, low cost, broad market prospect and remarkable economic and social benefits, and facilitates industrialization, popularization and application.
Description
Technical field
The present invention relates to rigid layer of the Ultraprecision Machining, particularly a kind of Roll-to-Roll chemical-mechanical polishing mathing concretion abrasive polishing roll in microelectronics, photoelectron, the manufacture of flexible display substrate and preparation method thereof.
Background technology
Microelectronics, photoelectron, IC manufacturing are one of important symbols of measurement statehood and overall national strength, that the world today is most hotly competitive, development field the most rapidly, the advanced microelectronics of grasp and optoelectronic fabrication techniques is only had effectively to control cost and to expand the scale of production, could survival and development in the market competition of fierceness.Microelectronics and photoelectron advanced person manufacture as the basic industry of national economy, guiding industry, pillar industry and strategic industry, are playing more and more important effect to Chinese national economy, national security, people's lives and social progress.
The flexible display technologies life that improves people just gradually with exchange, and significantly advance information visualization.In recent years, the advantage of Flexible Displays becomes increasingly conspicuous, flexible electronic and the LCD as FPD, OLED compares with plasma display, have ultra-thin, quality is light, durable, storage capacity is large, design freely, deflection, can rolling and the performance such as shock-resistant, be widely used in mobile phone, personal digital assistant PDA, notebook computer, trade mark, secure identity file, e-book, electronic poster, fascia, RF recognition system, sensor, environment shows, medical treatment, general lighting, the industry such as robot sense skin, civilian and military industry, flexible display can also allow display screen more easily become ornament materials, the bendability characteristics of Flexible Displays is utilized to make engineering design be not limited to complanation, the display mode of diversification external form can be realized.
Due to the market prospects that Flexible Displays is huge, research institution and the production firm of many countries and regions put in the research and apply of flexible display technologies, and achieve significant achievement.Current, flexible electronic is also in the eve by industrialization, still also there is a lot of technical bottlenecks, for the stage that material, technique, design etc. are also in research and explore.Flexible display technologies integrates large scale integrated circuit, precision processing technology, photoelectron technology new high-tech industry, relates to the high-tech area that semiconductor, optics, microelectronics, chemical material, precision optical machinery and processing etc. are numerous.
Flexible Displays substrate is the basis of flexibility of research and development display.Flat-panel monitor is all that substrate makes with glass substrate, flexible display is then be substrate with flexible material, it is the same with glass substrate to the surface quality requirements of flexible substrate, surface smoothness and thickness requirement are very strict, realize surface quality and the machining accuracy of flexible substrate, method the most frequently used is at present chemical Mechanical Polishing Technique.
Chemical Mechanical Polishing Technique is considered to the best process taking into account surface roughness and surface smoothness requirement, become hard brittle crystal material, metal material and other material and realized one of most practical technique of surperficial ultra-smooth not damaged processing, and be widely used in the fields such as the photoelectrons such as super large-scale integration, semiconductor lighting, optical glass, FPD, microelectronics, Aero-Space and mechanical engineering.By analysis with research, that chemical Mechanical Polishing Technique may be best suited for and can be used for, in the efficient Ultra-precision Turning of Roll-to-Roll of large-size ultra-thin Flexible Displays substrate surface, obtaining the undamaged finished surface of ultra-smooth completely.
Exploitation flexible display another key factor be its technique may by Sheet-fedbatchprocessing(individual batch production) convert to Roll-to-Rollmanufacturing(volume to volume produce), efficiency improves greatly, means that the cost of display may reduce greatly.Therefore, the task of top priority is that the Roll-to-Roll high benefit installation of research large-size ultra-thin Flexible Displays substrate, equipment and technology and Ultra-precision Turning are theoretical.
Polishing roll is the critical piece in the Roll-to-Roll chemical-mechanical polishing mathing of large-size ultra-thin Flexible Displays substrate, because free abrasive chemical Mechanical Polishing Technique exists a lot of insurmountable problem, in recent years, concretion abrasive chemical Mechanical Polishing Technique, due to its huge superiority, is expected to replace free abrasive chemically mechanical polishing; And the manufacture of concretion abrasive chemically mechanical polishing roller is a difficult problem, and the rigid layer of polishing roll, directly contact with surface of the work, its quality and performance directly affect the material removing rate and surface quality etc. that polishing produces, but at present, also there is no the bibliographical information of the manufacture view about concretion abrasive Roll-to-Roll chemically mechanical polishing roller, more not about the report of concretion abrasive Roll-to-Roll chemically mechanical polishing roller rigid layer manufacture view.
At present, the particular problem of Roll-to-Roll free abrasive chemical Mechanical Polishing Technique existence is as follows:
(1) when Roll-to-Roll polishing machine adopts traditional free abrasive chemical Mechanical Polishing Technique to carry out polishing to ultrathin flexible backing material, cause the inhomogeneities that free abrasive distributes between polishing roll and workpiece, make the material removing rate of workpiece each several part inconsistent, affect surface smoothness.(2) owing to containing abrasive material in polishing fluid, polishing rear portion abrasive particle can be embedded in surface of the work, not easy cleaning.(3) due to polishing fluid complicated component, after polishing, the removing of surface of the work remaining slurry is a difficult problem of cleaning after CMP.(4) concretion abrasive polishing roll easily produces plastic deformation in surface when polishing, and its surface becomes smooth or blockage of the micro orifice gradually, its ability holding polishing fluid and eliminating scrap is reduced, causes material removing rate to decline in time.To need constantly to repair with moistening polishing pad to recover its surface roughness and porous, cause efficiency low.
summary of the invention:
The object of this invention is to provide rigid layer of the Roll-to-Roll chemical-mechanical polishing mathing concretion abrasive polishing roll that a kind of working (machining) efficiency is high, abrasive material utilization rate is high and preparation method thereof.
Technical scheme of the present invention is, a kind of rigid layer of Roll-to-Roll chemical-mechanical polishing mathing concretion abrasive polishing roll, is characterized in that: the ratio of its component and percentage by weight is as follows:
Abrasive material 0.5% ~ 10%,
Light-cured resin 5% ~ 45%,
Reactive diluent 5% ~ 41%,
Light trigger 4% ~ 7%,
Promoter 0.05% ~ 5%,
Surface property conditioning agent 0.05% ~ 3%,
Adjuvant 0.05% ~ 5%,
Filler 1% ~ 4%,
Pigment 0.02%.
Described abrasive material is one in white fused alumina micro mist, silicon carbide micro-powder, ceria micro mist or diadust or two kinds of mixtures, and the particle diameter of these micro mists is 50nm ~ 56 μm.
Described light-cured resin is modified epoxy acrylate, degree of functionality is greater than 3 urethane acrylate, degree of functionality are greater than one or both the mixture in the polyester acrylate of 3.
Described reactive diluent is one or both the mixture in pentaerythritol triacrylate, tetramethylol methane tetraacrylate, two contracting trimethylolpropane tetra-acrylate, Dipentaerythritol Pentaacrylate, dipentaerythritol acrylate.
Described light trigger is one or both the mixture in 2-hydroxy-2-methyl-1-phenylacetone, 2,4,6-trimethylbenzoy-dipheny phosphine oxides.
Described promoter is one or both the mixture in polydimethyl siloxane fluid, modified polyorganosiloxane.
Described surface property conditioning agent is one or both the mixture in aluminum stearate, tung oil, Tissuemat E, polypropylene wax.
Described adjuvant is 2,6-toluene di-tert-butyl phenol.
Described filler is one or both the mixture in white carbon, kaolin, talcum powder, diatomite.
A preparation method for the rigid layer of Roll-to-Roll chemical-mechanical polishing mathing concretion abrasive polishing roll, is characterized in that it comprises the following steps:
(1) some glasswares and agitator is prepared,
(2) selected abrasive particle, light-cured resin, reactive diluent, light trigger, promoter, surface property conditioning agent, filler, adjuvant, pigment is weighed by certain mass ratio, stand-by;
(3) rigid layer photocuring mould is arranged on the polishing roll of the good elastic layer of photocuring;
(4) first load weighted light-cured resin is poured in agitator, then pour abrasive material into, stir, then pour reactive diluent, light trigger, promoter, surface property conditioning agent, filler, adjuvant, pigment into, fully be uniformly mixed, become the mixture containing abrasive particle;
(5) mixture that step (4) is made is poured in the mounted rigid layer photocuring mould of step (3) institute, and be fully full of the space between mould inner surface and elastic layer;
(6) mould of step (5) and polishing roll are installed on concretion abrasive photo solidification machine together;
(7) start is according to the cure parameter of following photo solidification machine: adjustment polishing roll axis drive motor rotating speed is 50r/min, mould upper surface is 50r/min, set timer 5 minutes apart from light source 20mm, rotary table motor speed, carries out photocuring;
(8) after photo solidification machine is out of service, wait for 5 minutes, take out the polishing roll that photocuring is good, can use;
(9), time if necessary, one deck rigid layer can be solidified again outside rigid layer.
The material of mould may be selected to be inorganic transparent glass material.
Beneficial effect of the present invention:
The present invention can realize:
(1) rigid layer of this concretion abrasive polishing roll ensure that surface smoothness, the material removing rate of processing object.
(2) this concretion abrasive polishing roll is containing the outer surface of abrasive material rigid layer, different shapes can be solidified into by rigid layer photocuring mould (see figure 2), as cylinder boss array configuration, square net array configuration etc., different boss sizes, size of mesh opening can be realized by mould, realize high-efficient high performance processing.
(3) do not need bonding agent between the rigid layer of concretion abrasive polishing pad and elastic layer, take multi-shell curing just can realize every layer between bonding.
(4) when carrying out the Roll-to-Roll chemically mechanical polishing of ultrathin flexible backing material with concretion abrasive polishing roll, not containing abrasive material in polishing fluid, polishing fluid composition becomes simple, after polishing, surface of the work cleaning is simple, in addition, owing to not having abrasive material in polishing fluid, make the material removing rate of workpiece each several part consistent, surface smoothness is high.
(5) when carrying out the Roll-to-Roll chemically mechanical polishing of ultrathin flexible backing material with concretion abrasive polishing roll, pad interface not easily produces plastic deformation, surface pore not easily blocks, and its ability holding polishing fluid and eliminating scrap can not reduce in time, material removing rate uniformity.In addition, do not need trimming polished pad, improve polishing efficiency;
(6) rigid layer of concretion abrasive polishing roll is in polishing process, can not produce swelling because of water suction, and in continuous polishing process, the physicochemical properties of polishing pad itself are stablized.
(7) concretion abrasive polishing pad is in polishing process, and the abrasive particle of abrasive grain layer is uniformly dispersed, and along with exposed abrasive particle is worn, the abrasive particle of nexine is again outside exposed, keeps sharp machinery removal effect always, has the characteristic of self-recision.
The present invention is innovative product that is original, that have independent intellectual property right, and operating process is simple, with low cost, is easy to industrialization and applies, and has wide market prospects, economic benefit and social benefit remarkable.
Accompanying drawing explanation
fig. 1 isconcretion abrasive polishing roll structure chart of the present invention.
Fig. 2 is the rigid layer photocuring mould structure schematic diagram of concretion abrasive polishing roll of the present invention.
Detailed description of the invention
Below in conjunction with drawings and Examples, technical scheme of the present invention is further illustrated.
Example 1:
Foundation structure of the present invention is:
Polishing roll left end support mechanism 1 and polishing roll right-hand member supporting mechanism 5 is respectively equipped with in the both sides of concretion abrasive polishing roll, the outside of concretion abrasive polishing roll 6 is provided with concretion abrasive polishing roll base layer 4, the outside of concretion abrasive polishing roll base layer is provided with elastic layer 3, the outside of elastic layer is provided with rigid layer 2, and the rigid layer photocuring mould 7 of concretion abrasive polishing roll is sleeved on outside elastic layer.
The present invention manufactures and designs a kind of rigid layer of Roll-to-Roll chemical-mechanical polishing mathing concretion abrasive polishing roll, for rough polishing operation, and rigid layer thickness 1.5mm; This concretion abrasive polishing roll diameter 300mm, width is 600mm, as shown in Figure 1.
Intend the mixture of preparation 1000g:
(1) some glasswares and agitator is prepared,
(2) the white fused alumina abrasive material of 100g particle diameter 36 μm is weighed respectively, the urethane acrylate (aromatic series) that the urethane acrylate (aliphatic) that 200g degree of functionality is 6,150g degree of functionality are 6,50g degree of functionality are the polyester acrylate of 4,200g dipentaerythritol acrylate, 150g bis-contracting trimethylolpropane tetra-acrylate, 40g2-hydroxy-2-methyl-1-phenylacetone, 20g modified polyorganosiloxane, 30g aluminum stearate, 40g2,6-toluene di-tert-butyl phenol, 18g, diatomite, 2g, iron oxide red.
(3) (see figure 1) on polishing roll rigid layer photocuring mould (see figure 2) being arranged on the good elastic layer (3) of photocuring;
(4) cure parameter of photo solidification machine is adjusted: adjustment polishing roll axis drive motor rotating speed is 50r/min, mould upper surface is 50r/min, set timer 5 minutes apart from light source 20mm, rotary table motor speed;
(5) by load weighted 200g degree of functionality be 6 urethane acrylate (aliphatic), 150g degree of functionality be 6 urethane acrylate (aromatic series), 50g degree of functionality be 4 polyester acrylate pour in agitator, then the white fused alumina abrasive material of 100g particle diameter 36 μm is poured into, stir, pour reactive diluent, light trigger, promoter, surface property conditioning agent, filler, adjuvant, pigment again into, fully be uniformly mixed, become the mixture containing abrasive particle;
(6) mixture that step (5) is made is poured in the mounted rigid layer photocuring mould (see figure 2) of step (3) institute, and be fully full of the space between mould inner surface and elastic layer;
(7) mould of step (6) and polishing roll are installed on concretion abrasive photo solidification machine together;
(8) photocuring is carried out in start;
(9) after photo solidification machine is out of service, wait for 5 minutes, take out the polishing roll rigid layer that photocuring is good, can use;
Example 2: the rigid layer manufacturing and designing a kind of Roll-to-Roll chemical-mechanical polishing mathing concretion abrasive polishing roll, for rough polishing operation, rigid layer thickness 1.5mm; This concretion abrasive polishing roll diameter 300mm, width is 600mm, as shown in Figure 1.
Intend the mixture of preparation 1000g:
(1) some glasswares and agitator is prepared,
(2) the white fused alumina abrasive material of 70g particle diameter 14 μm is weighed respectively; the urethane acrylate (aromatic series) that the urethane acrylate (aliphatic) that 150g degree of functionality is 4,150g degree of functionality are 4,120g degree of functionality are the polyester acrylate of 4; 360g pentaerythritol triacrylate; 40g2-hydroxy-2-methyl-1-phenylacetone, 10g2; 4; 6-trimethylbenzoy-dipheny phosphine oxide; 5g polydimethyl siloxane fluid, 20g modified polyorganosiloxane; 25g Tissuemat E; 30g2; 6-toluene di-tert-butyl phenol, 18g talcum powder, 2g pigment yellow (PY129).
(3) (see figure 1) on polishing roll rigid layer photocuring mould (see figure 2) being arranged on the good elastic layer (3) of photocuring;
(4) cure parameter of photo solidification machine is adjusted: adjustment polishing roll axis drive motor rotating speed is 50r/min, mould upper surface is 50r/min, set timer 5 minutes apart from light source 20mm, rotary table motor speed;
(5) by load weighted 150g degree of functionality be 4 urethane acrylate (aliphatic), 150g degree of functionality be 4 urethane acrylate (aromatic series), 120g degree of functionality be 4 polyester acrylate pour in agitator, then the white fused alumina abrasive material of 70g particle diameter 14 μm is poured into, stir, pour reactive diluent, light trigger, promoter, surface property conditioning agent, filler, adjuvant, pigment again into, fully be uniformly mixed, become the mixture containing abrasive particle;
(6) mixture that step (5) is made is poured in the mounted rigid layer photocuring mould (see figure 2) of step (3) institute, and be fully full of the space between mould inner surface and elastic layer;
(7) mould of step (6) and polishing roll are installed on concretion abrasive photo solidification machine together;
(8) photocuring is carried out in start;
(9) after photo solidification machine is out of service, wait for 5 minutes, take out the polishing roll rigid layer that photocuring is good, can use;
Example 3: the rigid layer manufacturing and designing a kind of Roll-to-Roll chemical-mechanical polishing mathing concretion abrasive polishing roll, for rough polishing operation, rigid layer thickness 1.5mm; This concretion abrasive polishing roll diameter 300mm, width is 600mm, as shown in Figure 1.
Intend the mixture of preparation 1000g:
(1) some glasswares and agitator is prepared,
(2) the white fused alumina abrasive material of 60g particle diameter 7 μm is weighed respectively, 150g degree of functionality is the urethane acrylate (aliphatic) of 4, 150g degree of functionality is the urethane acrylate (aromatic series) of 4, 120g modified epoxy acrylate, 200g pentaerythritol triacrylate, 170g tetramethylol methane tetraacrylate, 40g2-hydroxy-2-methyl-1-phenylacetone, 10g2, 4, 6-trimethylbenzoy-dipheny phosphine oxide, 10g polydimethyl siloxane fluid, 20g modified polyorganosiloxane, 15g aluminum stearate, 5g tung oil, 20g2, 6-toluene di-tert-butyl phenol, 18g talcum powder, 10g kaolin, 2g phthalocyanine blue (PB15).
(3) (see figure 1) on polishing roll rigid layer photocuring mould (see figure 2) being arranged on the good elastic layer (3) of photocuring;
(4) cure parameter of photo solidification machine is adjusted: adjustment polishing roll axis drive motor rotating speed is 50r/min, mould upper surface is 50r/min, set timer 5 minutes apart from light source 20mm, rotary table motor speed;
(5) by load weighted 150g degree of functionality be 4 urethane acrylate (aliphatic), 150g degree of functionality be 4 urethane acrylate (aromatic series), 120g modified epoxy acrylate pour in agitator, then the white fused alumina abrasive material of 60g particle diameter 7 μm is poured into, stir, pour reactive diluent, light trigger, promoter, surface property conditioning agent, filler, adjuvant, pigment again into, fully be uniformly mixed, become the mixture containing abrasive particle;
(6) mixture that step (5) is made is poured in the mounted rigid layer photocuring mould (see figure 2) of step (3) institute, and be fully full of the space between mould inner surface and elastic layer;
(7) mould of step (6) and polishing roll are installed on concretion abrasive photo solidification machine together;
(8) photocuring is carried out in start;
(9) after photo solidification machine is out of service, wait for 5 minutes, take out the polishing roll rigid layer that photocuring is good, can use;
Example 4: the rigid layer manufacturing and designing a kind of Roll-to-Roll chemical-mechanical polishing mathing concretion abrasive polishing roll, throws operation for essence, rigid layer thickness 1.5mm; This concretion abrasive polishing roll diameter 300mm, width is 600mm, as shown in Figure 1.
Intend the mixture of preparation 1000g:
(1) some glasswares and agitator is prepared,
(2) CeO of 50g particle diameter 3.5 μm is weighed respectively
2abrasive material, urethane acrylate (aromatic series), 220g modified epoxy acrylate that the urethane acrylate (aliphatic) that 100g degree of functionality is 4,100g degree of functionality are 4,200g dipentaerythritol acrylate, 170g tetramethylol methane tetraacrylate, 60g2-hydroxy-2-methyl-1-phenylacetone, 20g polydimethyl siloxane fluid, 10g modified polyorganosiloxane, 5g white carbon, 5g tung oil, 20g2,6-toluene di-tert-butyl phenol, 28g talcum powder, 2g chrome oxide green.
(3) (see figure 1) on polishing roll rigid layer photocuring mould (see figure 2) being arranged on the good elastic layer (3) of photocuring;
(4) cure parameter of photo solidification machine is adjusted: adjustment polishing roll axis drive motor rotating speed is 50r/min, mould upper surface is 50r/min, set timer 5 minutes apart from light source 20mm, rotary table motor speed;
(5) by load weighted 100g degree of functionality be 4 urethane acrylate (aliphatic), 100g degree of functionality be 4 urethane acrylate (aromatic series), 220g modified epoxy acrylate pour in agitator, then pour the CeO of 50g particle diameter 3.5 μm into
2abrasive material, stirs, then pours reactive diluent, light trigger, promoter, surface property conditioning agent, filler, adjuvant, pigment into, is fully uniformly mixed, becomes the mixture containing abrasive particle;
(6) mixture that step (5) is made is poured in the mounted rigid layer photocuring mould (see figure 2) of step (3) institute, and be fully full of the space between mould inner surface and elastic layer;
(7) mould of step (6) and polishing roll are installed on concretion abrasive photo solidification machine together;
(8) photocuring is carried out in start;
(9) after photo solidification machine is out of service, wait for 5 minutes, take out the polishing roll rigid layer that photocuring is good, can use;
Example 5: the rigid layer manufacturing and designing a kind of Roll-to-Roll chemical-mechanical polishing mathing concretion abrasive polishing roll, throws operation for essence, rigid layer thickness 1.5mm; This concretion abrasive polishing roll diameter 300mm, width is 600mm, as shown in Figure 1.
Intend the mixture of preparation 1000g:
(1) some glasswares and agitator is prepared,
(2) silicon carbide abrasive of 40g particle diameter 0.5 μm is weighed respectively, 240g degree of functionality is polyester acrylate, the 200g modified epoxy acrylate of 4,200g dipentaerythritol acrylate, 180g bis-contracting trimethylolpropane tetra-acrylate, 60g2-hydroxy-2-methyl-1-phenylacetone, 10g polydimethyl siloxane fluid, 20g modified polyorganosiloxane, 5g aluminum stearate, 5g tung oil, 15g2,6-toluene di-tert-butyl phenol, 15g talcum powder, 8g diatomite, 2g is solid orange G(PO13 forever).
(3) (see figure 1) on polishing roll rigid layer photocuring mould (see figure 2) being arranged on the good elastic layer (3) of photocuring;
(4) cure parameter of photo solidification machine is adjusted: adjustment polishing roll axis drive motor rotating speed is 50r/min, mould upper surface is 50r/min, set timer 5 minutes apart from light source 20mm, rotary table motor speed;
(5) by load weighted 240g degree of functionality be 4 polyester acrylate, 200g modified epoxy acrylate pour in agitator, then the silicon carbide abrasive of 40g particle diameter 0.5 μm is poured into, stir, pour reactive diluent, light trigger, promoter, surface property conditioning agent, filler, adjuvant, pigment again into, fully be uniformly mixed, become the mixture containing abrasive particle;
(6) mixture that step (5) is made is poured in the mounted rigid layer photocuring mould (see figure 2) of step (3) institute, and be fully full of the space between mould inner surface and elastic layer;
(7) mould of step (6) and polishing roll are installed on concretion abrasive photo solidification machine together;
(8) photocuring is carried out in start;
(9) after photo solidification machine is out of service, wait for 5 minutes, take out the polishing roll rigid layer that photocuring is good, can use;
Example 6: the rigid layer manufacturing and designing a kind of Roll-to-Roll chemical-mechanical polishing mathing concretion abrasive polishing roll, throws operation for essence, rigid layer thickness 1.5mm; This concretion abrasive polishing roll diameter 300mm, width is 600mm, as shown in Figure 1.
Intend the mixture of preparation 1000g:
(1) some glasswares and agitator is prepared,
(2) diamond abrasive of 5g particle diameter 0.05 μm is weighed respectively; 410g modified epoxy acrylate, 210g dipentaerythritol acrylate, 200g Dipentaerythritol Pentaacrylate, 50g2-hydroxy-2-methyl-1-phenylacetone, 20g2; 4; 6-trimethylbenzoy-dipheny phosphine oxide, 20g polydimethyl siloxane fluid, 20g modified polyorganosiloxane, 5g polypropylene wax; 25g2; 6-toluene di-tert-butyl phenol, 15g talcum powder, 18g white carbon, 2g permanent violet RL(PV23).
(3) (see figure 1) on polishing roll rigid layer photocuring mould (see figure 2) being arranged on the good elastic layer (3) of photocuring;
(4) cure parameter of photo solidification machine is adjusted: adjustment polishing roll axis drive motor rotating speed is 50r/min, mould upper surface is 50r/min, set timer 5 minutes apart from light source 20mm, rotary table motor speed;
(5) load weighted 410g modified epoxy acrylate is poured in agitator, then the diamond abrasive of 5g particle diameter 0.05 μm is poured into, stir, pour reactive diluent, light trigger, promoter, surface property conditioning agent, filler, adjuvant, pigment again into, fully be uniformly mixed, become the mixture containing abrasive particle;
(6) mixture that step (5) is made is poured in the mounted rigid layer photocuring mould (see figure 2) of step (3) institute, and be fully full of the space between mould inner surface and elastic layer;
(7) mould of step (6) and polishing roll are installed on concretion abrasive photo solidification machine together;
(8) photocuring is carried out in start;
(9) after photo solidification machine is out of service, wait for 5 minutes, take out the polishing roll rigid layer that photocuring is good, can use;
Example 7: the rigid layer manufacturing and designing a kind of Roll-to-Roll chemical-mechanical polishing mathing concretion abrasive polishing roll, for rough polishing operation, rigid layer thickness 1.5mm; This concretion abrasive polishing roll diameter 300mm, width is 600mm, as shown in Figure 1.
Intend the mixture of preparation 1000g:
(1) some glasswares and agitator is prepared,
(2) the white fused alumina abrasive material of 50g particle diameter 36 μm, the Ceria abrasive of 50g particle diameter 36 μm is weighed respectively, the urethane acrylate (aromatic series) that the urethane acrylate (aliphatic) that 200g degree of functionality is 6,200g degree of functionality are 6,200g pentaerythritol triacrylate, 150g bis-contracting trimethylolpropane tetra-acrylate, 40g2-hydroxy-2-methyl-1-phenylacetone, 20g modified polyorganosiloxane, 15g aluminum stearate, 15g polypropylene wax, 40g2,6-toluene di-tert-butyl phenol, 8g white carbon, 10g diatomite, 2g iron oxide red.
(3) (see figure 1) on polishing roll rigid layer photocuring mould (see figure 2) being arranged on the good elastic layer (3) of photocuring;
(4) cure parameter of photo solidification machine is adjusted: adjustment polishing roll axis drive motor rotating speed is 50r/min, mould upper surface is 50r/min, set timer 5 minutes apart from light source 20mm, rotary table motor speed;
(5) by load weighted 200g degree of functionality be 6 urethane acrylate (aliphatic), 200g degree of functionality be 6 urethane acrylate (aromatic series) pour in agitator, then the white fused alumina abrasive material of 50g particle diameter 36 μm and the Ceria abrasive of 50g particle diameter 36 μm is poured into, stir, pour reactive diluent, light trigger, promoter, surface property conditioning agent, filler, adjuvant, pigment again into, fully be uniformly mixed, become the mixture containing abrasive particle;
(6) mixture that step (5) is made is poured in the mounted rigid layer photocuring mould (see figure 2) of step (3) institute, and be fully full of the space between mould inner surface and elastic layer;
(7) mould of step (6) and polishing roll are installed on concretion abrasive photo solidification machine together;
(8) photocuring is carried out in start;
(9) after photo solidification machine is out of service, wait for 5 minutes, take out the polishing roll rigid layer that photocuring is good, can use;
Example 8: the rigid layer manufacturing and designing a kind of Roll-to-Roll chemical-mechanical polishing mathing concretion abrasive polishing roll, for rough polishing operation, rigid layer thickness 1.5mm; This concretion abrasive polishing roll diameter 300mm, width is 600mm, as shown in Figure 1.
Intend the mixture of preparation 1000g:
(1) some glasswares and agitator is prepared,
(2) the white fused alumina abrasive material of 35g particle diameter 14 μm, the silicon carbide abrasive of 35g particle diameter 14 μm is weighed respectively; 420g degree of functionality is the polyester acrylate of 4; 200g pentaerythritol triacrylate, 160g Dipentaerythritol Pentaacrylate; 40g2-hydroxy-2-methyl-1-phenylacetone, 10g2; 4; 6-trimethylbenzoy-dipheny phosphine oxide; 5g polydimethyl siloxane fluid, 20g modified polyorganosiloxane; 15g tung oil, 10g Tissuemat E; 30g2; 6-toluene di-tert-butyl phenol, 10g white carbon, 8g kaolin, 2g pigment yellow (PY129).
(3) (see figure 1) on polishing roll rigid layer photocuring mould (see figure 2) being arranged on the good elastic layer (3) of photocuring;
(4) cure parameter of photo solidification machine is adjusted: adjustment polishing roll axis drive motor rotating speed is 50r/min, mould upper surface is 50r/min, set timer 5 minutes apart from light source 20mm, rotary table motor speed;
(5) by load weighted 150g degree of functionality be 4 urethane acrylate (aliphatic), 150g degree of functionality be 4 urethane acrylate (aromatic series), 120g degree of functionality be 4 polyester acrylate pour in agitator, then the silicon carbide abrasive of the white fused alumina abrasive material of 35g particle diameter 14 μm, 35g particle diameter 14 μm is poured into, stir, pour reactive diluent, light trigger, promoter, surface property conditioning agent, filler, adjuvant, pigment again into, fully be uniformly mixed, become the mixture containing abrasive particle;
(6) mixture that step (5) is made is poured in the mounted rigid layer photocuring mould (see figure 2) of step (3) institute, and be fully full of the space between mould inner surface and elastic layer;
(7) mould of step (6) and polishing roll are installed on concretion abrasive photo solidification machine together;
(8) photocuring is carried out in start;
(9) after photo solidification machine is out of service, wait for 5 minutes, take out the polishing roll rigid layer that photocuring is good, can use;
Example 9: the rigid layer manufacturing and designing a kind of Roll-to-Roll chemical-mechanical polishing mathing concretion abrasive polishing roll, for rough polishing operation, rigid layer thickness 1.5mm; This concretion abrasive polishing roll diameter 300mm, width is 600mm, as shown in Figure 1.
Intend the mixture of preparation 1000g:
(1) some glasswares and agitator is prepared,
(2) the white fused alumina abrasive material of 50g particle diameter 7 μm is weighed respectively, the diamond abrasive that 10g particle diameter is 7 μm, 150g degree of functionality is the urethane acrylate (aliphatic) of 4, 150g degree of functionality is the urethane acrylate (aromatic series) of 4, 120g modified epoxy acrylate, 200g pentaerythritol triacrylate, 170g Dipentaerythritol Pentaacrylate, 40g2-hydroxy-2-methyl-1-phenylacetone, 10g2, 4, 6-trimethylbenzoy-dipheny phosphine oxide, 10g polydimethyl siloxane fluid, 20g modified polyorganosiloxane, 15g polypropylene wax, 5g tung oil, 20g2, 6-toluene di-tert-butyl phenol, 18g talcum powder, 10g kaolin, 2g phthalocyanine blue (PB15).
(3) (see figure 1) on polishing roll rigid layer photocuring mould (see figure 2) being arranged on the good elastic layer (3) of photocuring;
(4) cure parameter of photo solidification machine is adjusted: adjustment polishing roll axis drive motor rotating speed is 50r/min, mould upper surface is 50r/min, set timer 5 minutes apart from light source 20mm, rotary table motor speed;
(5) by load weighted 150g degree of functionality be 4 urethane acrylate (aliphatic), 150g degree of functionality be 4 urethane acrylate (aromatic series), 120g modified epoxy acrylate pour in agitator, then the diamond abrasive of the white fused alumina abrasive material of 50g particle diameter 7 μm, 10g particle diameter 7 μm is poured into, stir, pour reactive diluent, light trigger, promoter, surface property conditioning agent, filler, adjuvant, pigment again into, fully be uniformly mixed, become the mixture containing abrasive particle;
(6) mixture that step (5) is made is poured in the mounted rigid layer photocuring mould (see figure 2) of step (3) institute, and be fully full of the space between mould inner surface and elastic layer;
(7) mould of step (6) and polishing roll are installed on concretion abrasive photo solidification machine together;
(8) photocuring is carried out in start;
(9) after photo solidification machine is out of service, wait for 5 minutes, take out the polishing roll rigid layer that photocuring is good, can use;
Example 10: the rigid layer manufacturing and designing a kind of Roll-to-Roll chemical-mechanical polishing mathing concretion abrasive polishing roll, throws operation for essence, rigid layer thickness 1.5mm; This concretion abrasive polishing roll diameter 300mm, width is 600mm, as shown in Figure 1.
Intend the mixture of preparation 1000g:
(1) some glasswares and agitator is prepared,
(2) silicon carbide abrasive of 40g particle diameter 3.5 μm, the diamond abrasive of 10g particle diameter 3.5 μm is weighed respectively, 420g modified epoxy acrylate, 200g bis-contracting trimethylolpropane tetra-acrylate, 170g tetramethylol methane tetraacrylate, 60g2-hydroxy-2-methyl-1-phenylacetone, 20g polydimethyl siloxane fluid, 10g modified polyorganosiloxane, 5g white carbon, 5g tung oil, 20g2,6-toluene di-tert-butyl phenol, 28g talcum powder, 2g chrome oxide green.
(3) (see figure 1) on polishing roll rigid layer photocuring mould (see figure 2) being arranged on the good elastic layer (3) of photocuring;
(4) cure parameter of photo solidification machine is adjusted: adjustment polishing roll axis drive motor rotating speed is 50r/min, mould upper surface is 50r/min, set timer 5 minutes apart from light source 20mm, rotary table motor speed;
(5) load weighted 420g modified epoxy acrylate is poured in agitator, then the diamond abrasive of the silicon carbide abrasive of 40g particle diameter 3.5 μm, 10g particle diameter 3.5 μm is poured into, stir, pour reactive diluent, light trigger, promoter, surface property conditioning agent, filler, adjuvant, pigment again into, fully be uniformly mixed, become the mixture containing abrasive particle;
(6) mixture that step (5) is made is poured in the mounted rigid layer photocuring mould (see figure 2) of step (3) institute, and be fully full of the space between mould inner surface and elastic layer;
(7) mould of step (6) and polishing roll are installed on concretion abrasive photo solidification machine together;
(8) photocuring is carried out in start;
(9) after photo solidification machine is out of service, wait for 5 minutes, take out the polishing roll rigid layer that photocuring is good, can use;
Example 11: the rigid layer manufacturing and designing a kind of Roll-to-Roll chemical-mechanical polishing mathing concretion abrasive polishing roll, throws operation for essence, rigid layer thickness 1.5mm; This concretion abrasive polishing roll diameter 300mm, width is 600mm, as shown in Figure 1.
Intend the mixture of preparation 1000g:
(1) some glasswares and agitator is prepared,
(2) Ceria abrasive of 30g particle diameter 0.5 μm, the diamond abrasive of 10g particle diameter 0.5 μm is weighed respectively, 440g degree of functionality is the urethane acrylate of 4,200g dipentaerythritol acrylate, 180g tetramethylol methane tetraacrylate, 60g2-hydroxy-2-methyl-1-phenylacetone, 10g polydimethyl siloxane fluid, 20g modified polyorganosiloxane, 5g Tissuemat E, 5g polypropylene wax, 15g2,6-toluene di-tert-butyl phenol, 15g talcum powder, 8g diatomite, 2g is solid orange G(PO13 forever).
(3) (see figure 1) on polishing roll rigid layer photocuring mould (see figure 2) being arranged on the good elastic layer (3) of photocuring;
(4) cure parameter of photo solidification machine is adjusted: adjustment polishing roll axis drive motor rotating speed is 50r/min, mould upper surface is 50r/min, set timer 5 minutes apart from light source 20mm, rotary table motor speed;
(5) urethane acrylate being 4 by load weighted 440g degree of functionality is poured in agitator, then the diamond abrasive of the Ceria abrasive of 30g particle diameter 0.5 μm, 10g particle diameter 0.5 μm is poured into, stir, pour reactive diluent, light trigger, promoter, surface property conditioning agent, filler, adjuvant, pigment again into, fully be uniformly mixed, become the mixture containing abrasive particle;
(6) mixture that step (5) is made is poured in the mounted rigid layer photocuring mould (see figure 2) of step (3) institute, and be fully full of the space between mould inner surface and elastic layer;
(7) mould of step (6) and polishing roll are installed on concretion abrasive photo solidification machine together;
(8) photocuring is carried out in start;
(9) after photo solidification machine is out of service, wait for 5 minutes, take out the polishing roll rigid layer that photocuring is good, can use;
Example 12: the rigid layer manufacturing and designing a kind of Roll-to-Roll chemical-mechanical polishing mathing concretion abrasive polishing roll, for rough polishing operation, rigid layer thickness 1.5mm; This concretion abrasive polishing roll diameter 300mm, width is 600mm, as shown in Figure 1.
Intend the mixture of preparation 1000g:
(1) some glasswares and agitator is prepared,
(2) Ceria abrasive of 35g particle diameter 14 μm, the silicon carbide abrasive of 35g particle diameter 14 μm is weighed respectively; 420g degree of functionality is the polyester acrylate of 4; 360g dipentaerythritol acrylate; 40g2-hydroxy-2-methyl-1-phenylacetone, 10g2; 4; 6-trimethylbenzoy-dipheny phosphine oxide; 5g polydimethyl siloxane fluid, 20g modified polyorganosiloxane; 15g tung oil, 10g Tissuemat E; 30g2; 6-toluene di-tert-butyl phenol, 10g white carbon, 8g kaolin, 2g pigment yellow (PY129).
(3) (see figure 1) on polishing roll rigid layer photocuring mould (see figure 2) being arranged on the good elastic layer (3) of photocuring;
(4) cure parameter of photo solidification machine is adjusted: adjustment polishing roll axis drive motor rotating speed is 50r/min, mould upper surface is 50r/min, set timer 5 minutes apart from light source 20mm, rotary table motor speed;
(5) by load weighted 150g degree of functionality be 4 urethane acrylate (aliphatic), 150g degree of functionality be 4 urethane acrylate (aromatic series), 120g degree of functionality be 4 polyester acrylate pour in agitator, then the silicon carbide abrasive of the Ceria abrasive of 35g particle diameter 14 μm, 35g particle diameter 14 μm is poured into, stir, pour reactive diluent, light trigger, promoter, surface property conditioning agent, filler, adjuvant, pigment again into, fully be uniformly mixed, become the mixture containing abrasive particle;
(6) mixture that step (5) is made is poured in the mounted rigid layer photocuring mould (see figure 2) of step (3) institute, and be fully full of the space between mould inner surface and elastic layer;
(7) mould of step (6) and polishing roll are installed on concretion abrasive photo solidification machine together;
(8) photocuring is carried out in start;
(9) after photo solidification machine is out of service, wait for 5 minutes, take out the polishing roll rigid layer that photocuring is good, can use;
Example 13: the rigid layer manufacturing and designing a kind of Roll-to-Roll chemical-mechanical polishing mathing concretion abrasive polishing roll, for rough polishing operation, rigid layer thickness 1.5mm; This concretion abrasive polishing roll diameter 300mm, width is 600mm, as shown in Figure 1.
Intend the mixture of preparation 1000g:
(1) some glasswares and agitator is prepared,
(2) the white fused alumina abrasive material of 50g particle diameter 7 μm is weighed respectively, the diamond abrasive that 10g particle diameter is 7 μm, 150g degree of functionality is the urethane acrylate (aliphatic) of 4, 150g degree of functionality is the urethane acrylate (aromatic series) of 4, 120g modified epoxy acrylate, 370g tetramethylol methane tetraacrylate, 40g2-hydroxy-2-methyl-1-phenylacetone, 10g2, 4, 6-trimethylbenzoy-dipheny phosphine oxide, 10g polydimethyl siloxane fluid, 20g modified polyorganosiloxane, 15g polypropylene wax, 5g tung oil, 20g2, 6-toluene di-tert-butyl phenol, 18g talcum powder, 10g kaolin, 2g phthalocyanine blue (PB15).
(3) (see figure 1) on polishing roll rigid layer photocuring mould (see figure 2) being arranged on the good elastic layer (3) of photocuring;
(4) cure parameter of photo solidification machine is adjusted: adjustment polishing roll axis drive motor rotating speed is 50r/min, mould upper surface is 50r/min, set timer 5 minutes apart from light source 20mm, rotary table motor speed;
(5) by load weighted 150g degree of functionality be 4 urethane acrylate (aliphatic), 150g degree of functionality be 4 urethane acrylate (aromatic series), 120g modified epoxy acrylate pour in agitator, then the diamond abrasive of the white fused alumina abrasive material of 50g particle diameter 7 μm, 10g particle diameter 7 μm is poured into, stir, pour reactive diluent, light trigger, promoter, surface property conditioning agent, filler, adjuvant, pigment again into, fully be uniformly mixed, become the mixture containing abrasive particle;
(6) mixture that step (5) is made is poured in the mounted rigid layer photocuring mould (see figure 2) of step (3) institute, and be fully full of the space between mould inner surface and elastic layer;
(7) mould of step (6) and polishing roll are installed on concretion abrasive photo solidification machine together;
(8) photocuring is carried out in start;
(9) after photo solidification machine is out of service, wait for 5 minutes, take out the polishing roll rigid layer that photocuring is good, can use;
Example 14: the rigid layer manufacturing and designing a kind of Roll-to-Roll chemical-mechanical polishing mathing concretion abrasive polishing roll, throws operation for essence, rigid layer thickness 1.5mm; This concretion abrasive polishing roll diameter 300mm, width is 600mm, as shown in Figure 1.
Intend the mixture of preparation 1000g:
(1) some glasswares and agitator is prepared,
(2) silicon carbide abrasive of 40g particle diameter 3.5 μm, the diamond abrasive of 10g particle diameter 3.5 μm is weighed respectively, 420g modified epoxy acrylate, 370g bis-contracting trimethylolpropane tetra-acrylate, 60g2-hydroxy-2-methyl-1-phenylacetone, 20g polydimethyl siloxane fluid, 10g modified polyorganosiloxane, 5g white carbon, 5g tung oil, 20g2,6-toluene di-tert-butyl phenol, 28g talcum powder, 2g chrome oxide green.
(3) (see figure 1) on polishing roll rigid layer photocuring mould (see figure 2) being arranged on the good elastic layer (3) of photocuring;
(4) cure parameter of photo solidification machine is adjusted: adjustment polishing roll axis drive motor rotating speed is 50r/min, mould upper surface is 50r/min, set timer 5 minutes apart from light source 20mm, rotary table motor speed;
(5) load weighted 420g modified epoxy acrylate is poured in agitator, then the diamond abrasive of the silicon carbide abrasive of 40g particle diameter 3.5 μm, 10g particle diameter 3.5 μm is poured into, stir, pour reactive diluent, light trigger, promoter, surface property conditioning agent, filler, adjuvant, pigment again into, fully be uniformly mixed, become the mixture containing abrasive particle;
(6) mixture that step (5) is made is poured in the mounted rigid layer photocuring mould (see figure 2) of step (3) institute, and be fully full of the space between mould inner surface and elastic layer;
(7) mould of step (6) and polishing roll are installed on concretion abrasive photo solidification machine together;
(8) photocuring is carried out in start;
(9) after photo solidification machine is out of service, wait for 5 minutes, take out the polishing roll rigid layer that photocuring is good, can use;
Example 15: the rigid layer manufacturing and designing a kind of Roll-to-Roll chemical-mechanical polishing mathing concretion abrasive polishing roll, throws operation for essence, rigid layer thickness 1.5mm; This concretion abrasive polishing roll diameter 300mm, width is 600mm, as shown in Figure 1.
Intend the mixture of preparation 1000g:
(1) some glasswares and agitator is prepared,
(2) diamond abrasive of 5g particle diameter 0.05 μm is weighed respectively; 410g modified epoxy acrylate, 410g Dipentaerythritol Pentaacrylate, 70g2; 4; 6-trimethylbenzoy-dipheny phosphine oxide, 20g polydimethyl siloxane fluid, 20g modified polyorganosiloxane, 5g polypropylene wax; 25g2; 6-toluene di-tert-butyl phenol, 15g talcum powder, 18g white carbon, 2g permanent violet RL(PV23).
(3) (see figure 1) on polishing roll rigid layer photocuring mould (see figure 2) being arranged on the good elastic layer (3) of photocuring;
(4) cure parameter of photo solidification machine is adjusted: adjustment polishing roll axis drive motor rotating speed is 50r/min, mould upper surface is 50r/min, set timer 5 minutes apart from light source 20mm, rotary table motor speed;
(5) load weighted 410g modified epoxy acrylate is poured in agitator, then the diamond abrasive of 5g particle diameter 0.05 μm is poured into, stir, pour reactive diluent, light trigger, promoter, surface property conditioning agent, filler, adjuvant, pigment again into, fully be uniformly mixed, become the mixture containing abrasive particle;
(6) mixture that step (5) is made is poured in the mounted rigid layer photocuring mould (see figure 2) of step (3) institute, and be fully full of the space between mould inner surface and elastic layer;
(7) mould of step (6) and polishing roll are installed on concretion abrasive photo solidification machine together;
(8) photocuring is carried out in start;
(9) after photo solidification machine is out of service, wait for 5 minutes, take out the polishing roll rigid layer that photocuring is good, can use;
After rigid layer photocuring is good, take off polishing roll, unload rigid layer photocuring mould (see figure 2).Concretion abrasive polishing roll has just created.The concretion abrasive polishing roll manufactured is installed on Roll-to-Roll chemical-mechanical polishing mathing, according to the burnishing parameters adjusted, just can starts shooting and carry out chemically mechanical polishing.
Should be understood that, for those of ordinary skills, can be improved according to the above description or convert, and all these improve and convert the protection domain that all should belong to claims of the present invention.
Claims (10)
1. a Roll-to-Roll chemical-mechanical polishing mathing rigid layer for concretion abrasive polishing roll, is characterized in that: the ratio of its component and percentage by weight is as follows:
Abrasive material 0.5% ~ 10%,
Light-cured resin 5% ~ 45%,
Reactive diluent 5% ~ 41%,
Light trigger 4% ~ 7%,
Promoter 0.05% ~ 5%,
Surface property conditioning agent 0.05% ~ 3%,
Adjuvant 0.05% ~ 5%,
Filler 1% ~ 4%,
Pigment 0.02%.
2. the rigid layer of a kind of Roll-to-Roll chemical-mechanical polishing mathing concretion abrasive polishing roll according to claim 1, it is characterized in that: described abrasive material is one in white fused alumina micro mist, silicon carbide micro-powder, ceria micro mist or diadust or two kinds of mixtures, and the particle diameter of these micro mists is 50nm ~ 56 μm.
3. the rigid layer of a kind of Roll-to-Roll chemical-mechanical polishing mathing concretion abrasive polishing roll according to claim 1, is characterized in that: described light-cured resin is modified epoxy acrylate, degree of functionality is greater than 3 urethane acrylate, degree of functionality are greater than one or both the mixture in the polyester acrylate of 3.
4. the rigid layer of a kind of Roll-to-Roll chemical-mechanical polishing mathing concretion abrasive polishing roll according to claim 1, is characterized in that: described reactive diluent is one or both the mixture in pentaerythritol triacrylate, tetramethylol methane tetraacrylate, two contracting trimethylolpropane tetra-acrylate, Dipentaerythritol Pentaacrylate, dipentaerythritol acrylate.
5. the rigid layer of a kind of Roll-to-Roll chemical-mechanical polishing mathing concretion abrasive polishing roll according to claim 1; it is characterized in that: described light trigger is 2-hydroxy-2-methyl-1-phenylacetone, 2; one or both mixture in 4,6-trimethylbenzoy-dipheny phosphine oxide.
6. the rigid layer of a kind of Roll-to-Roll chemical-mechanical polishing mathing concretion abrasive polishing roll according to claim 1, is characterized in that: described promoter is one or both the mixture in polydimethyl siloxane fluid, modified polyorganosiloxane.
7. the rigid layer of a kind of Roll-to-Roll chemical-mechanical polishing mathing concretion abrasive polishing roll according to claim 1, is characterized in that: described surface property conditioning agent is one or both the mixture in aluminum stearate, tung oil, Tissuemat E, polypropylene wax.
8. the rigid layer of a kind of Roll-to-Roll chemical-mechanical polishing mathing concretion abrasive polishing roll according to claim 1, is characterized in that: described adjuvant is 2,6-toluene di-tert-butyl phenol.
9. the rigid layer of a kind of Roll-to-Roll chemical-mechanical polishing mathing concretion abrasive polishing roll according to claim 1, is characterized in that: described filler is one or both the mixture in white carbon, kaolin, talcum powder, diatomite.
10. the preparation method of polishing pad according to claim 1, is characterized in that it comprises the following steps:
(1) some glasswares and agitator is prepared,
(2) selected abrasive particle, light-cured resin, reactive diluent, light trigger, promoter, surface property conditioning agent, filler, adjuvant, pigment is weighed by certain mass ratio, stand-by;
(3) rigid layer photocuring mould is arranged on the polishing roll of the good elastic layer of photocuring;
(4) first load weighted light-cured resin is poured in agitator, then pour abrasive material into, stir, then pour reactive diluent, light trigger, promoter, surface property conditioning agent, filler, adjuvant, pigment into, fully be uniformly mixed, become the mixture containing abrasive particle;
(5) mixture that step (4) is made is poured in the mounted rigid layer photocuring mould of step (3) institute, and be fully full of the space between mould inner surface and elastic layer;
(6) mould of step (5) and polishing roll are installed on concretion abrasive photo solidification machine together;
(7) start is according to the cure parameter of following photo solidification machine: adjustment polishing roll axis drive motor rotating speed is 50r/min, mould upper surface is 50r/min, set timer 5 minutes apart from light source 20mm, rotary table motor speed, carries out photocuring;
(8) after photo solidification machine is out of service, wait for 5 minutes, take out the polishing roll that photocuring is good, can use.
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| CN107932352A (en) * | 2017-12-13 | 2018-04-20 | 河北思瑞恩新材料科技有限公司 | A kind of soft coated substrate grinding tool and its formula and preparation method |
| CN112059931A (en) * | 2020-09-02 | 2020-12-11 | 东莞金太阳研磨股份有限公司 | Polishing grinding tool and preparation method thereof |
| CN112643559A (en) * | 2020-12-25 | 2021-04-13 | 郑州磨料磨具磨削研究所有限公司 | Composite resin binder superhard grinding wheel and preparation method thereof |
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