CN105093844B - Exposure method and exposure device - Google Patents
Exposure method and exposure device Download PDFInfo
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- CN105093844B CN105093844B CN201510232828.4A CN201510232828A CN105093844B CN 105093844 B CN105093844 B CN 105093844B CN 201510232828 A CN201510232828 A CN 201510232828A CN 105093844 B CN105093844 B CN 105093844B
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Abstract
The present invention provides a kind of exposure method and exposure device, can suppress to damage in substrate and mask, and make substrate have desired curvature.Including following process：Substrate (3) is placed on the process on multiple bellowss (17)；By the way that the inside of bellows (17) is vacuumized, so that the upper end (17a) of bellows (17) is adsorbed in the lower surface (3a) of substrate (3) and shunk, by the way that substrate (3) to be pressed on to the bearing-surface (19a) of supporting member (19), so that substrate (3) has the process of curvature corresponding with the position relationship of multiple bearing-surfaces (19a).
Description
Technical field
The present invention relates to exposure method and exposure device.
Background technology
In the past, as exposure device, it is known that exposure device include：Pedestal, the substrate being exposed is configured in the pedestal
Top；And exposure light source, light is irradiated to substrate by it across mask.In such exposure device, formed on mask
There is predetermined pattern.Also, by the way that light is irradiated into substrate across the mask, so as to transfer pattern to substrate.
Herein, substrate is not necessarily substrate that is flat, being especially in progress in flow chart, the feelings deformed
Condition is more.In the case of such substrate is uneven, it is impossible to substrate is suitably adsorbed in pedestal (such as work piece holder), exposure essence
Degree is possible to deteriorate.
Therefore, as shown in figure 15, in the base board exposure device of patent document 1, first, adhered to using in lower surface 202
Mask film 100M upper ledge 200 is fixed with to press membranaceous substrate 100W.Thus, substrate 100W warpage, wrinkle are eliminated,
Make substrate 100W flat on the upper surface 102 of lower frame 100.Then, vacuumized by using vacuum absorption device 120, so that
Substrate 100W is adsorbed to the upper surface 102 for being fixed on lower frame 100.
In addition, as shown in figure 16, the exposure device of patent document 2 has：Substrate supporting platform 312, its supporting substrates 311；
And hollow seal member 313, it is extended in the way of being surrounded around by substrate 311.Light is loaded on seal member 313 to cover
Mould 306.Pressure feed is empty to the 1st surrounded by substrate supporting platform 312 and substrate 311 and seal member 313 and photomask 306
Between 327 and the hollow inside of seal member 313 be the 2nd space 328.Also, by suitably setting the value of the pressure, so that real
Photomask 306 is now set integrally equably to be close to throughout the surface of substrate 311.In addition, being formed with substrate supporting platform 312 multiple
Suction hole 325, by applying negative pressure to suction hole 325, so as to adsorb and keep substrate 311.
Prior art literature
Patent document
Patent document 1：Japanese Unexamined Patent Publication 2001-209192 publications
Patent document 2：Japanese Unexamined Patent Publication 2004-54255 publications
The content of the invention
The present invention technical problem to be solved
But, in the invention of patent document 1 and 2, due to needing substrate is contacted with mask, therefore, it is possible in base
The contact surface of plate and mask is damaged.
In addition, more than substrate, it is also possible to there is the uneven situation of mask, in such cases it need making base
It is exposed after the shape of plate is corresponding with the shape of mask.But, patent document 1 and 2, which is only described, makes substrate flat, and difficult
With the such state of affairs of correspondence.
The present invention is to complete in view of the foregoing, and its object is to provide to suppress to occur on substrate and mask
The exposure method and exposure device for damaging and making substrate that there is desired curvature.Make that " substrate, which has, to be expected in addition, described
Curvature " also comprising making substrate curvature make the flat situation of substrate for zero.
Technical teaching for solving the problem was
The above-mentioned purpose of the present invention is reached by following constituting.
(1) a kind of exposure method,
The pedestal being disposed above with the substrate being exposed,
The exposure method includes：Light from exposure light source is irradiated to the substrate to be exposed across mask
Process,
The exposure method is characterised by,
The upper surface of the pedestal is provided with multiple grooves,
Bellows is configured with the inside of the groove, the bellows is flexible freely in above-below direction, and the ripple
The upper end of pipe is protruded upward than the upper surface of the pedestal,
In the inside of the groove, the supporting member with bearing-surface is provided with inside or outside the bellows,
The upper surface of the bearing-surface and the pedestal is located on the same face or positioned at the position than the upper surface by the top,
The exposure method includes following process：
By the process on the substrate-placing to multiple bellowss；And
By the way that the inside of the bellows is vacuumized, so that the upper end of the bellows is adsorbed under the substrate
Surface and shrink, by the way that the substrate to be pressed on to the bearing-surface of the supporting member so that the substrate have with it is many
The process of the corresponding curvature of position relationship of the individual bearing-surface.
(2) exposure method as described in (1), it is characterised in that
The bearing-surface of multiple supporting members is located on the same face with the upper surface of the pedestal,
The exposure method includes following process：
By the process on the substrate-placing to multiple bellowss；And
By the way that the inside of the bellows is vacuumized, so that the upper end of the bellows is adsorbed under the substrate
Surface and shrink, by the way that the substrate to be pressed on to the bearing-surface of the supporting member, so that by the substrate with plane
Fixed process.
(3) exposure method as described in (2), it is characterised in that
The pedestal is the work piece holder that the multiple vacuum tanks that can be vacuumized are formed with the upper surface,
The exposure method includes：By the way that multiple vacuum tanks are vacuumized, so that the lower surface of the substrate be inhaled
The process of the attached upper surface for being fixed on the work piece holder.
(4) exposure method as described in (3), it is characterised in that
The area of upper surface of total area than the work piece holder of multiple vacuum tanks is big.
(5) exposure method as described in (3) or (4), it is characterised in that
It is formed with the bottom of the vacuum tank multiple prominent with the height roughly the same with the depth of the vacuum tank
Rise.
(6) exposure method as described in (1), it is characterised in that
Multiple supporting members are able to lift in above-below direction while the bellows is kept,
The exposure method includes following process：
By rising multiple supporting members, so that the bearing-surface of the supporting member is in the upper table than the pedestal
Locate process in the same plane mutually by the top in face；
By the process on the substrate-placing to multiple bellowss；
By the way that the inside of the bellows is vacuumized, so that the upper end of the bellows is adsorbed under the substrate
Surface and shrink, by the way that the substrate to be pressed on to the bearing-surface of the supporting member, so that the substrate is plane
Process；And
Decline the supporting member, and the process for making the lower surface of the substrate be close to the upper surface of the pedestal.
(7) exposure method as described in (6), it is characterised in that
The pedestal is the work piece holder that the multiple vacuum tanks that can be vacuumized are formed with the upper surface,
The exposure method includes：By the way that multiple vacuum tanks are vacuumized, so that the lower surface of the substrate be inhaled
The process of the attached upper surface for being fixed on the work piece holder.
(8) exposure method as described in (7), it is characterised in that
The area of upper surface of total area than the work piece holder of multiple vacuum tanks is big.
(9) exposure method as described in (7) or (8), it is characterised in that
It is formed with the bottom of the vacuum tank multiple prominent with the height roughly the same with the depth of the vacuum tank
Rise.
(10) exposure method as described in (1), it is characterised in that
Multiple supporting members are able to lift in above-below direction while the bellows is kept,
The exposure method includes following process：
By rising multiple supporting members, so that the bearing-surface of the supporting member is in the upper table than the pedestal
Locate process in the same plane mutually by the top in face；
By the process on the substrate-placing to multiple bellowss；And
By the way that the inside of the bellows is vacuumized, so that the upper end of the bellows is adsorbed under the substrate
Surface and shrink, by the way that the substrate to be pressed on to the bearing-surface of the supporting member, so that the substrate is plane
Process.
(11) exposure method as described in (10), it is characterised in that
With the sensor measured to the distance from the upper surface of the pedestal to the lower surface of the substrate,
The exposure method includes：Based on the positional information of the substrate obtained by the sensor, make multiple described
Supporting member is lifted, and it is plane process to make the substrate.
(12) exposure method as described in (1), it is characterised in that
Multiple supporting members are able to lift in above-below direction while the bellows is kept,
The exposure method includes following process：
By rising multiple supporting members, so that the bearing-surface of the supporting member is in the upper table than the pedestal
Locate to be located at the above-below direction for causing the respective bearing-surface and the lower surface of the mask by the top apart from roughly the same in face
The process of position；
By the process on the substrate-placing to multiple bellowss；And
By the way that the inside of the bellows is vacuumized, so that the upper end of the bellows is adsorbed under the substrate
Surface and shrink, by the way that the substrate to be pressed on to the bearing-surface of the supporting member so that the substrate have with it is many
The corresponding curvature of position relationship of the individual bearing-surface, makes the upper and lower of the upper surface of the substrate and the lower surface of the mask
To apart from uniform process.
(13) exposure method as described in (1), it is characterised in that
Multiple supporting members are able to lift in above-below direction while the bellows is kept,
The exposure method includes following process：
By rising multiple supporting members, so that the bearing-surface of the supporting member is in the upper table than the pedestal
Locate process in the same plane mutually by the top in face；
Make at least one process risen or fallen among multiple supporting members；
By the process on the substrate-placing to multiple bellowss；And
By the way that the inside of the bellows is vacuumized, so that the upper end of the bellows is adsorbed under the substrate
Surface and shrink, by the way that the substrate to be pressed on to the bearing-surface of the supporting member so that with local deformation
The corresponding position of the substrate changes the height of the bearing-surface, the substrate is had desired curvature, makes described
The process of substrate Local warping.
(14) a kind of exposure device, it includes：
Pedestal, the substrate being exposed is disposed above；And
Exposure light source, it light shines the substrate across mask,
The exposure device is characterised by,
The upper surface of the pedestal is provided with multiple grooves,
Bellows is configured with the inside of the groove, the bellows is flexible freely in above-below direction, the bellows
Upper end protruded upward than the upper surface of the pedestal,
In the inside of the groove, the supporting member with bearing-surface is provided with inside or outside the bellows,
The upper surface of the bearing-surface and the pedestal is located on the same face or positioned at the position than the upper surface by the top,
The inside of the bellows can be vacuumized.
(15) exposure device as described in (14), it is characterised in that
The pedestal is the work piece holder that the multiple vacuum tanks that can be vacuumized are formed with the upper surface.
(16) exposure device as described in (14) or (15), it is characterised in that
Multiple supporting members are able to while the bellows is kept in above-below direction lifting.
(17) exposure device as described in (15), it is characterised in that
The area of upper surface of total area than the work piece holder of multiple vacuum tanks is big.
(18) exposure device as described in (17), it is characterised in that being formed with the bottom of the vacuum tank has and institute
State multiple projections of the roughly the same height of depth of vacuum tank.
Invention effect
According to the exposure method and exposure device of the present invention, by the way that the inside of bellows is vacuumized, so that bellows
Upper end be adsorbed in lower surface and the contraction of substrate, by the way that the substrate to be pressed on to the bearing-surface of supporting member, so as to
Enough make substrate that there is curvature corresponding with the position relationship of multiple bearing-surfaces.Even if in addition, not making mask with substrate as existing skill
Art document is contacted like that, also substrate can be made to have desired curvature, therefore, it is possible to suppress to damage on mask and substrate
Wound.
Brief description of the drawings
Fig. 1 is Fig. 2 I-I section view direction views.
Fig. 2 is the sectional view of the exposure device of the 1st embodiment.
Fig. 3 is the sectional view of the exposure device of the 1st embodiment.
Fig. 4 is the sectional view of the exposure device of the 1st embodiment.
Fig. 5 is the sectional view of the exposure device of the 2nd embodiment.
Fig. 6 is the sectional view of the exposure device of the 2nd embodiment.
Fig. 7 is the sectional view of the exposure device of the 2nd embodiment.
Fig. 8 is the sectional view of the exposure device of the 2nd embodiment.
Fig. 9 is the sectional view of the exposure device of the 3rd embodiment.
Figure 10 is the sectional view of the exposure device of the 3rd embodiment.
Figure 11 is the sectional view of the exposure device of the 4th embodiment.
Figure 12 is the sectional view of the exposure device of the 5th embodiment.
Figure 13 is the top view of the exposure device of the 6th embodiment.
Figure 14 (a) is the top view of the exposure device of the 7th embodiment, and (b) is the XIV-XIV sectional views of (a).
Figure 15 (A)~(D) is the figure of the step of exposure for the base board exposure device for showing patent document 1.
Figure 16 is the sectional view for the exposure device for showing patent document 2.
Description of reference numerals
1 exposure device
3 substrates
3a lower surfaces
5 masks
10 work piece holders (pedestal)
11 upper surfaces
13 vacuum tanks
14 groove vacuum tanks
15 grooves
17 bellowss
17a upper ends
19 supporting members
19a bearing-surfaces
20 connectivity slots
21 drive mechanisms
30 wall portions
31 the 1st wall portions
32 the 2nd wall portions
33 the 3rd wall portions
34 the 4th wall portions
35 the 5th wall portions
114 projections
Embodiment
Hereinafter, using the exposure device and exposure method of brief description of the drawings embodiments of the present invention.
(the 1st embodiment)
As shown in Figures 1 and 2, the exposure device 1 of present embodiment includes：Work piece holder 10 (pedestal), the base being exposed
Plate 3 is configured in the top of the work piece holder 10；And exposure light source (not shown), it is by light across mask irradiation (not shown)
To substrate 3.In addition, in the way of figure 2 illustrates being protruded downward by central part warpage substrate 3, still, this embodiment party
The exposure device 1 of formula can be applied to the substrate 3 of arbitrary shape, for example, substrate 3 can also be convex upward with central part
The shape of the mode warpage gone out.
The section viewed from above of the upper surface 11 of work piece holder 10 is substantially square shape.Four in upper surface 11
The corner in direction and central part this at five, be formed with the groove 15 that section viewed from above is substantially square shape.In addition, work
The upper surface 11 of part fixture 10, the cross sectional shape of groove 15 are not limited to substantially square shape as shown in Figure 1, can make
For arbitrary shape, for example, it is also possible to become circular, rectangle.
Approximate centre in the inside of groove 15 is configured with the retractile hollow bellows 17 of above-below direction.Certainly
By length when, the upper end 17a of bellows 17 is protruded upward than the upper surface 11 of work piece holder 10.In addition, in groove 15
Portion, supporting member 19 is internally provided with bellows 17, and the supporting member 19 has the branch that substrate 3 can be supported on to top
Bearing surface 19a.The supporting member 19 of present embodiment is the bar-like member extended upward from the bottom surface of groove 15, with work piece holder
10 are integrally formed.The bearing-surface 19a of supporting member 19 is located on the same face with the upper surface 11 of work piece holder 10.In addition,
The bearing-surface 19a of supporting member 19 is provided with the connectivity slot 20 connected with vacuum plant (not shown), can be by bellows 17
Inside is vacuumized.
Connect and can vacuumize with vacuum plant (not shown) multiple are formed with the upper surface 11 of work piece holder 10
Vacuum tank 13.Multiple vacuum tanks 13 are configured between the peripheral part of upper surface 11 and groove 15 with mesh-shape.In addition, vacuum
Groove 13 has the groove vacuum tank 14 connected with groove 15 in the inside of work piece holder 10.In addition, it is not necessary to set groove true
Dead slot 14, in the case where being not provided with groove vacuum tank 14, as long as making the composition that groove 15 can be vacuumized independently.
In the exposure device 1 so constituted, following such exposure method is used.First, as shown in figure 3, by substrate 3
Configuration is on multiple bellowss 17.Now, bellows 17 stretches according to the shape of substrate 3, the upper end of all bellows 17
17a is close to the lower surface 3a of substrate 3.
Next, by the way that the inside of bellows 17 is vacuumized via connectivity slot 20, so that the upper end 17a of bellows 17
The lower surface 3a of substrate 3 is fixed in absorption.After further the inside of bellows 17 is vacuumized, as shown in figure 4, bellows 17 is received
Contract (decline), the substrate 3 that the bellows 17 adsorbs fixation also declines.Because the substrate 3 that have dropped is pressed against multiple supportings
The bearing-surface 19a of part 19 and the upper surface 11 of work piece holder 10, thus it is possible to make substrate 3 have and these multiple bearing-surfaces
19a and the corresponding curvature of the position relationship of upper surface 11.In the present embodiment, due to multiple bearing-surface 19a and upper surface 11
It is in the same plane, so, the curvature of substrate 3 is zero, can be in planely fixed by substrate 3.
Then, by the way that multiple vacuum tanks 13 (groove vacuum tank 14) are vacuumized, so that multiple bearing-surface 19a will be close to
And the upper surface 11 of work piece holder 10 is fixed in the lower surface 3a absorption of the substrate 3 of upper surface 11.So, substrate 3 is made to be flat
Planar and reliably absorption be fixed on after the upper surface 11 of work piece holder 10, by by the light from exposure light source across
Mask is irradiated to substrate 3, so as to be exposed.
As described above, can be by the way that the inside of bellows 17 be taken out according to the exposure device 1 of present embodiment
Vacuum, so that the upper end 17a of bellows 17 is adsorbed in the lower surface 3a of substrate 3 and shunk, and by the way that substrate 3 is pressed on
The bearing-surface 19a of supporting member 19, so that substrate has curvature corresponding with multiple bearing-surface 19a position relationship.In addition,
It can also make substrate 3 that there is desired curvature even if not making mask be contacted with substrate 3 as prior art literature, therefore, it is possible to
Suppression is damaged on mask and substrate 3.
Particularly, the bearing-surface 19a of supporting member 19 is by the way that the inside of bellows 17 is vacuumized so that bellows 17
Upper end 17a be adsorbed in the lower surface 3a of substrate 3 and shrink, by the way that substrate 3 to be pressed to the bearing-surface 19a of supporting member 19,
So as to by substrate 3 in plane fixed.
Moreover, by the way that the multiple vacuum tanks 13 being arranged on work piece holder 10 are vacuumized, so as to by under substrate 3
Surface 3a reliably adsorbs the upper surface 11 for being fixed on work piece holder 10, make substrate 3 and mask distance it is uniform after, precision
It is exposed well.
In addition, the inside of the bellows 17 carried out via connectivity slot 20 is vacuumized and (the groove vacuum tank of vacuum tank 13
14) vacuumize is not necessarily required to carry out with this order, also can also carry out simultaneously.In addition, groove 15, bellows 17 and supporting
The position of the grade of part 19 and quantity are not limited, as long as considering rigidity of substrate 3 etc. suitably to set.In addition, configuration branch
As long as the inside of the position groove 15 of bearing portion part 19, is also not necessarily limited to inside or the bellows 17 of bellows 17
Outside.
In addition, be the composition that multiple vacuum tanks 13 are formed with work piece holder 10 in the above-described embodiment, but
It is that the present invention is not limited to this composition, vacuum tank 13 can also be not provided with.In this case, also can be by by bellows 17
Inside vacuumize so that the upper end 17a of bellows 17 is adsorbed in the lower surface 3a of substrate 3 and shunk, and substrate 3 is pressed
It is pressed on the bearing-surface 19a of supporting member 19 and the upper surface 11 of work piece holder 10.
(the 2nd embodiment)
Next, the exposure device 1 of the 2nd embodiment of the explanation present invention.Further, since the exposure dress of present embodiment
Put 1 basic composition is become it is identical with the 1st embodiment, so being described in detail for different parts, for phase
Same part, marks identical reference and simultaneously omits the description.
As shown in figure 5, the multiple supporting members 19 and work piece holder 10 of present embodiment are separate, multiple supporting members
19 are able to while bellows 17 are supported in above-below direction lifting.Driving is linked with the bottom of each supporting member 19
Mechanism 21, using the drive mechanism 21, supporting member 19 is driven in above-below direction.As drive mechanism 21, such as ball is illustrated
Leading screw, line motor, cylinder etc..
In the exposure device 1 so constituted, following such exposure method is used.First, as shown in figure 5, passing through profit
Multiple supporting members 19 are made to increase with multiple drive mechanisms 21, so that bearing-surface 19a is in the upper surface 11 than work piece holder 10
Locate to be located on substantially same plane mutually by the top.
Then, as shown in fig. 6, substrate 3 is configured on multiple bellowss 17.Now, bellows 17 correspond to substrate 3
Shape and stretch, the upper end 17a of bellows 17 is close to the lower surface 3a of substrate 3.
Next, by the way that the inside of bellows 17 is vacuumized via connectivity slot 20, so that the upper end 17a of bellows 17
The lower surface 3a of substrate 3 is fixed in absorption.After further the inside of bellows 17 is vacuumized, as shown in fig. 7, bellows 17 is received
Contracting, the substrate 3 that the bellows 17 adsorbs fixation also declines.Because the substrate 3 that have dropped is pressed against multiple supporting members 19
Bearing-surface 19a, thus it is possible to make substrate 3 have curvature corresponding with these multiple bearing-surface 19a position relationship.At this
In embodiment, because multiple bearing-surface 19a are in the same plane, so, the curvature vanishing of substrate 3 can make substrate 3
To be plane.
Next, as shown in figure 8, declining supporting member 19 using drive mechanism 21, to make bearing-surface 19a and workpiece
The upper surface 11 of fixture 10 is in the same plane, the lower surface 3a of substrate 3 is close to the upper surface 11 of work piece holder 10.
Then, by the way that multiple vacuum tanks 13 (groove vacuum tank 14) are vacuumized, so that multiple bearing-surface 19a will be close to
And the upper surface 11 of work piece holder 10 is fixed in the lower surface 3a absorption of the substrate 3 on upper surface 11.So, the substrate 3 is made to be in
Planely reliably absorption be fixed on after the upper surface 11 of work piece holder 10, by by the light from exposure light source across
Mask is irradiated to substrate 3, so as to be exposed.
As described above, according to the exposure device 1 of present embodiment, it can also obtain same with the 1st embodiment
The effect of sample.
In addition, in the present embodiment, due to multiple supporting members 19 be able to while bellows 17 are supported
Above-below direction is lifted, thus it is possible to the big substrate 3 of corresponding deformation.That is, when substrate 3 is placed on multiple line pipes 17, pass through
The bearing-surface 19a of each supporting member 19 height is changed to height corresponding with the deformation of substrate 3 in advance, so as to right
Big substrate 3 should be deformed.
In addition, in a same manner as in the first embodiment, vacuum tank 13 can also be not necessarily set in the present embodiment, in the feelings
, also can be by the way that the inside of bellows 17 be vacuumized, so that the upper end 17a of bellows 17 is adsorbed under substrate 3 under condition
Surface 3a and shrink, substrate 3 is pressed on to the bearing-surface 19a of supporting member 19 and the upper surface 11 of work piece holder 10.
(the 3rd embodiment)
Next, the exposure device 1 of the 3rd embodiment of the explanation present invention.As shown in figure 9, the exposure of present embodiment
(the reference picture 5 of exposure device 1 of the embodiment of device 1 and the 2nd.) difference be, do not form vacuum tank in work piece holder 10
13 (groove vacuum tanks 14).In addition, in fig. 9 it is shown that with the substrate 3 of central part convex mode warpage upward.
In the exposure device 1 so constituted, following such exposure method is used.First, as shown in figure 9, passing through profit
Multiple supporting members 19 are made to increase with multiple drive mechanisms 21, so that bearing-surface 19a is in the upper surface 11 than work piece holder 10
Locate to be located on substantially same plane mutually by the top.
Then, substrate 3 is configured on multiple bellowss 17.Now, bellows 17 correspond to the shape of substrate 3 and stretch
Contracting, the upper end 17a of bellows 17 is close to the lower surface 3a of substrate 3.
Next, by the way that the inside of bellows 17 is vacuumized via connectivity slot 20, so that the upper end 17a of bellows 17
The lower surface 3a of substrate 3 is fixed in absorption.After further the inside of bellows 17 is vacuumized, as shown in Figure 10, bellows 17
Shrink, the substrate 3 that the bellows 17 adsorbs fixation also declines.Because the substrate 3 that have dropped is pressed against multiple supporting members
19 bearing-surface 19a, thus it is possible to make substrate 3 that there is curvature corresponding with these multiple bearing-surface 19a position relationship.
In present embodiment, because multiple bearing-surface 19a are in the same plane, so, the curvature vanishing of substrate 3 can make base
Plate 3 is plane.
Herein, it can also set to being surveyed from lower surface 3a of the upper surface 11 of work piece holder 10 to substrate 3 distance
The sensor (not shown) of amount.In this case as well, it is possible to which the positional information based on the substrate 3 obtained by the sensor, is utilized
Multiple drive mechanisms 21 lift multiple supporting members 19, and it is plane to make substrate 3.Due to so correcting multiple supports
The process of the position of part 19, so as to reliably make substrate 3 be plane.
So, substrate 3 is made to be the above-below direction between upper surface that is plane and making substrate 3 and the lower surface of mask 5
After L is uniform, by the way that the light from exposure light source is irradiated into substrate 3 across mask, so as to be exposed.
As described above, according to the exposure device 1 of present embodiment, even if being formed not on work piece holder 10 true
Dead slot 13 (groove vacuum tank 14), also can precision be exposed well, can reduce the cost of manufacture of device.In addition,
In the case that the precision of the flatness of the upper surface 11 of work piece holder 10 is bad, it can also correspond to.Others constitute and
Effect is same with above-mentioned embodiment.
(the 4th embodiment)
Next, the exposure device 1 of the 4th embodiment of the explanation present invention.As shown in figure 11, the exposure of present embodiment
The basic composition of device 1 is identical with the 3rd embodiment.Hereinafter, illustrate that it is not flat to be used for correspondence in such exposure device 1
Warpage mask 5 exposure method.Shown in Figure 11 with the mask 5 of central part convex mode warpage downward.
First, multiple supporting members 19 is increased by using multiple drive mechanisms 21, make bearing-surface 19a than workpiece clamp
Place correspond to the shape of mask 5, positioned at the lower surface for causing each bearing-surface 19a and mask 5 by the top for the upper surface 11 of tool 10
Above-below direction apart from position roughly the same M.That is, compared with the bearing-surface 19a positioned at center, the bearing-surface positioned at corner is made
19a is above.
Then, substrate 3 is configured on multiple bellowss 17.Now, bellows 17 correspond to the shape of substrate 3 and stretch
Contracting, the upper end 17a of all bellowss 17 is close to the lower surface 3a of substrate 3.
Next, by the way that the inside of bellows 17 is vacuumized via connectivity slot 20, so that the upper end 17a of bellows 17
The lower surface of substrate 3 is fixed in absorption.After further the inside of bellows 17 is vacuumized, as shown in figure 11, bellows 17 is received
Contracting, the substrate 3 that the bellows 17 adsorbs fixation also declines.Because the substrate 3 that have dropped is pressed against multiple supporting members 19
Bearing-surface 19a, thus it is possible to make substrate 3 have curvature corresponding with these multiple bearing-surface 19a position relationship.That is, energy
It is with the shape of central part convex mode warpage downward enough to make substrate 3.
So, the above-below direction between the lower surface of the upper surface of substrate 3 and mask 5 is made passes through after L is uniform
Light from exposure light source is irradiated to substrate 3 across mask, so as to be exposed.
In addition, in a same manner as in the third embodiment, can also be provided for from the upper surface 11 of work piece holder 10 to substrate 3
Lower surface 3a the sensor (not shown) that measures of above-below direction distance.In this case as well, it is possible to should based on utilizing
The positional information for the substrate 3 that sensor is obtained, lifts multiple supporting members 19 so that under the upper surface of substrate 3 and mask 5
Above-below direction between surface becomes uniform apart from L.
As described above, it not is flat warpage even in using according to the exposure device 1 of present embodiment
In the case of mask 5, also can precision be exposed well.Others are constituted and effect is same with above-mentioned embodiment.
(the 5th embodiment)
Next, the exposure device 1 of the 5th embodiment of the explanation present invention.As shown in figure 12, the exposure of present embodiment
The basic composition of device 1 is identical with the 3rd and the 4th embodiment.In such exposure device 1, illustrate to make the Local warping of substrate 3
Method.The exposure device 1 of present embodiment for before exposure have local deformation substrate 3 be it is suitable, can be in school
Just it is exposed after the deformation of the substrate 3.
First, multiple supporting members 19 is increased by using multiple drive mechanisms 21, make bearing-surface 19a than workpiece clamp
Locate by the top in the same plane mutually in the upper surface 11 of tool 10.And then, make at least one among multiple supporting members 19
(in fig. 12, the supporting member 19 on right side) rises.
Then, substrate 3 is configured on multiple bellowss 17.Now, bellows 17 correspond to the shape of substrate 3 and stretch
Contracting, the upper end 17a of all bellowss 17 is close to the lower surface 3a of substrate 3.
Next, by the way that the inside of bellows 17 is vacuumized via connectivity slot 20, so that the upper end 17a of bellows 17
The lower surface 3a of substrate 3 is fixed in absorption.After further the inside of bellows 17 is vacuumized, as shown in figure 12, bellows 17
Shrink, the substrate 3 that the bellows 17 adsorbs fixation also declines.The substrate 3 that have dropped is pressed against multiple supporting members 19
Bearing-surface 19a.Now, the bearing-surface in the position change supporting member 19 corresponding with the substrate 3 with local deformation is passed through
19a height, so as to make substrate 3 that there is desired curvature.That is, make the Local warping of substrate 3, make substrate 3 in Figure 12
The shape that right-hand end is bent upward.
So, after the Local warping of substrate 3 is made, by the way that the light from exposure light source is irradiated into substrate across mask
3, so as to be exposed.
As described above, according to the exposure device 1 of present embodiment, it is capable of the local deformation of correction substrate 3.
Others are constituted and effect is same with above-mentioned embodiment.
In addition, in the present embodiment, at least one for making among multiple supporting members 19 rises to make substrate 3 is local to stick up
Song, still, it goes without saying that can also decline at least one supporting member 19.
(the 6th embodiment)
Next, the exposure device 1 of the 6th embodiment of the explanation present invention.In addition, the exposure device of present embodiment with
The composition substantially of above-mentioned embodiment is identical, therefore, is described in detail for different parts, for identical part,
Mark identical reference and omit the description.
As shown in figure 13, it is substantially square shape that the work piece holder 10 of the exposure device 1 of present embodiment is viewed from above.
It is formed with this 9 positions of the midpoint in the corner of the four direction of work piece holder 10, center and each side viewed from above for substantially
Circular groove 15.In addition to shape and number except groove 15, following wall portions 30 and vacuum tank 13, the structure of present embodiment
Into same with the composition in above-mentioned embodiment.In addition, the shape of work piece holder 10 viewed from above is not limited to Figure 13
Shown such substantially square shape, can become arbitrary shape.In addition, the shape of groove 15 viewed from above is not limited
Due to circular as shown in Figure 13, arbitrary shape can be become.
In the present embodiment, the top of work piece holder 10 is made up of wall portion 30, and the wall portion 30 is by the 1st~the 5th wall portion 31
~35 are constituted.1st wall portion 31 viewed from above is circular, and groove 15 is internally formed at it.Therefore, the 1st wall portion 31 with it is recessed
The quantity of groove 15 is all 9.2nd wall portion 32 is connected to each other by the 1st adjacent wall portion 31, is provided with 12.Also, by 4 the 1st
Wall portion 31 and by this 4 the 1st wall portions 31 4 the 2nd wall portions 32 connected to each other formed 4 region S1 of substantially square shape~
S4。
In regional S1~S4, the 3rd~the 5th wall portion 33~35 is formed with.3rd wall portion 33 is along 4 the 1st and the
The hollow shape of the inner peripheral surface of 2 wall portions 31,32.4th wall portion 34 forms the inside in the 3rd wall portion 33, is along the 3rd wall portion 33
The hollow shape of inner peripheral surface.5th wall portion 35 forms the inside in the 4th wall portion 34, is along the hollow of the inner peripheral surface of the 4th wall portion 34
Shape.So, 4 the 1st and the 2nd wall portions 31,32 and the 3rd wall portion 33 and the 4th wall portion 34 and the 5th wall portion 35 are shape similar mutually
Shape.
Also, between the 1st and the 2nd wall portion 31,32 and the 3rd wall portion 33, between the 3rd wall portion 33 and the 4th wall portion 34, the 4th
Between the wall portion 35 of wall portion 34 and the 5th and the 5th wall portion 35 inside, be respectively formed with vacuum tank 13.
By the way that so the top (upper surface 11) of work piece holder 10 is dividedly constituted using multiple wall portions 31~35, so that
Reduce the area (total areas of multiple upper surfaces of wall portion 31~35) of the upper surface 11 of work piece holder 10, make multiple vacuum tanks
13 total area (area viewed from above) increase.Thereby, it is possible to improve the absorption by multiple vacuum tanks 13 to substrate 3
Power.In order that multiple vacuum tanks 13 more reliably sorbing substrate 3, preferably make total area of multiple vacuum tanks 13 compare work piece holder
The area of 10 upper surface 11 is big.
In addition, by the way that the 1st and the 2nd wall portion 31,32 and the 3rd wall portion 33 and the 4th wall portion 34 and the 5th wall portion 35 are become mutually
Mutually similar shape, so that the 1st~the 5th wall portion 31~35 (upper surface 11 of work piece holder 10) being capable of equably supporting substrates 3.
It is concavo-convex thereby, it is possible to prevent from producing on the substrate 3 being adsorbed when vacuumizing.
In addition, multiple vacuum tanks 13 can both interlink in the bottom of work piece holder 10 and connect with same vacuum plant
It is logical, each it can also be connected with independent vacuum plant.In addition, wall portion 30 is not limited to be made up of the 1st~the 5th wall portion 31~35
Composition, other wall portions can also be further set in the inside of the 5th wall portion 35.
(the 7th embodiment)
Next, the exposure device 1 of the 7th embodiment of the explanation present invention.Further, since the exposure dress of present embodiment
Put identical with the basic composition of the 6th embodiment, therefore, described in detail for different parts, for identical portion
Point, mark identical reference and omit the description.
Multiple projections with the height roughly the same with the depth of the vacuum tank 13 are formed with the bottom of vacuum tank 13
114.The shape of projection 114 viewed from above is not limited to substantially square shape as shown in Figure 14, can become for example
The arbitrary shape such as circle, rectangle.In addition, the shape of the upper surface of projection 114 is not limited to planar shaped as shown in Figure 14
Shape or such as barrel surface like that with substrate 3 carry out linear contact lay as shape, as sphere with substrate 3 carry out point
The such shape of contact.
So, by setting multiple projections 114 in the bottom of vacuum tank 113, so that projection 114 is equal together with upper surface 11
Etc. ground supporting substrates 3.It is concavo-convex therefore, it is possible to prevent from producing on the substrate 3 being adsorbed when vacuumizing.
In addition, the application is based on Japanese patent application 2014-096930, in October, 2014 filed in 8 days Mays in 2014
Japanese patent application 2014- filed in Japanese patent application 2014-219827 filed in 29 days and 29 days October in 2014
219842, it is incorporated herein its content as reference.
In addition, the present invention is not limited to above-mentioned embodiment, it can suitably be changed, be improved.
Claims (18)
1. a kind of exposure method,
The pedestal being disposed above with the substrate being exposed,
The exposure method includes：The work that across mask the light from exposure light source is irradiated into the substrate to be exposed
Sequence,
The exposure method is characterised by,
The upper surface of the pedestal is provided with multiple grooves,
Bellows is configured with the inside of the groove, the bellows is flexible freely in above-below direction, and the bellows
Upper end is protruded upward than the upper surface of the pedestal,
In the inside of the groove, the supporting member with bearing-surface is provided with inside or outside the bellows, it is described
The upper surface of bearing-surface and the pedestal is located on the same face or positioned at the position than the upper surface by the top, and the supporting
Position of the face positioned at the upper end than the bellows on the lower,
The exposure method includes following process：
By the process on the substrate-placing to multiple bellowss；And
By the way that the inside of the bellows is vacuumized, so that the upper end of the bellows is adsorbed in the lower surface of the substrate
And shrink, by the way that the substrate to be pressed on to the bearing-surface of the supporting member, so that the substrate has and multiple institutes
The process for stating the corresponding curvature of position relationship of bearing-surface.
2. exposure method as claimed in claim 1, it is characterised in that
The bearing-surface of multiple supporting members is located on the same face with the upper surface of the pedestal,
The exposure method includes following process：
By the process on the substrate-placing to multiple bellowss；And
By the way that the inside of the bellows is vacuumized, so that the upper end of the bellows is adsorbed in the lower surface of the substrate
And shrink, by the way that the substrate to be pressed on to the bearing-surface of the supporting member, so that by the substrate with plane fixation
Process.
3. exposure method as claimed in claim 2, it is characterised in that
The pedestal is the work piece holder that the multiple vacuum tanks that can be vacuumized are formed with the upper surface,
The exposure method includes：By the way that multiple vacuum tanks are vacuumized, so that the lower surface of the substrate is adsorbed into solid
Due to the process of the upper surface of the work piece holder.
4. exposure method as claimed in claim 3, it is characterised in that
The area of upper surface of total area than the work piece holder of multiple vacuum tanks is big.
5. the exposure method as described in claim 3 or 4, it is characterised in that
Multiple projections with the height roughly the same with the depth of the vacuum tank are formed with the bottom of the vacuum tank.
6. exposure method as claimed in claim 1, it is characterised in that
Multiple supporting members are able to lift in above-below direction while the bellows is kept,
The exposure method includes following process：
By rising multiple supporting members, so that the bearing-surface of the supporting member is leaned in the upper surface than the pedestal
Process in the same plane mutually at top；
By the process on the substrate-placing to multiple bellowss；
By the way that the inside of the bellows is vacuumized, so that the upper end of the bellows is adsorbed in the lower surface of the substrate
And shrink, by the way that the substrate to be pressed on to the bearing-surface of the supporting member, so that the substrate is plane work
Sequence；And
Decline the supporting member, and the process for making the lower surface of the substrate be close to the upper surface of the pedestal.
7. exposure method as claimed in claim 6, it is characterised in that
The pedestal is the work piece holder that the multiple vacuum tanks that can be vacuumized are formed with the upper surface,
The exposure method includes：By the way that multiple vacuum tanks are vacuumized, so that the lower surface of the substrate is adsorbed into solid
Due to the process of the upper surface of the work piece holder.
8. exposure method as claimed in claim 7, it is characterised in that
The area of upper surface of total area than the work piece holder of multiple vacuum tanks is big.
9. exposure method as claimed in claim 7 or 8, it is characterised in that
Multiple projections with the height roughly the same with the depth of the vacuum tank are formed with the bottom of the vacuum tank.
10. exposure method as claimed in claim 1, it is characterised in that
Multiple supporting members are able to lift in above-below direction while the bellows is kept,
The exposure method includes following process：
By rising multiple supporting members, so that the bearing-surface of the supporting member is leaned in the upper surface than the pedestal
Process in the same plane mutually at top；
By the process on the substrate-placing to multiple bellowss；And
By the way that the inside of the bellows is vacuumized, so that the upper end of the bellows is adsorbed in the lower surface of the substrate
And shrink, by the way that the substrate to be pressed on to the bearing-surface of the supporting member, so that the substrate is plane work
Sequence.
11. exposure method as claimed in claim 10, it is characterised in that
With the sensor measured to the distance from the upper surface of the pedestal to the lower surface of the substrate,
The exposure method includes：Based on the positional information of the substrate obtained by the sensor, make multiple supportings
Part is lifted, and makes the substrate be plane process.
12. exposure method as claimed in claim 1, it is characterised in that
Multiple supporting members are able to lift in above-below direction while the bellows is kept,
The exposure method includes following process：
By rising multiple supporting members, so that the bearing-surface of the supporting member is leaned in the upper surface than the pedestal
It is located at top so that the above-below direction of the respective bearing-surface and the lower surface of the mask is apart from roughly the same position
Process；
By the process on the substrate-placing to multiple bellowss；And
By the way that the inside of the bellows is vacuumized, so that the upper end of the bellows is adsorbed in the lower surface of the substrate
And shrink, by the way that the substrate to be pressed on to the bearing-surface of the supporting member, so that the substrate has and multiple institutes
State the corresponding curvature of position relationship of bearing-surface, make the above-below direction of the upper surface of the substrate and the lower surface of the mask away from
From uniform process.
13. exposure method as claimed in claim 1, it is characterised in that
Multiple supporting members are able to lift in above-below direction while the bellows is kept,
The exposure method includes following process：
By rising multiple supporting members, so that the bearing-surface of the supporting member is leaned in the upper surface than the pedestal
Process in the same plane mutually at top；
Make at least one process risen or fallen among multiple supporting members；
By the process on the substrate-placing to multiple bellowss；And
By the way that the inside of the bellows is vacuumized, so that the upper end of the bellows is adsorbed in the lower surface of the substrate
And shrink, by the way that the substrate to be pressed on to the bearing-surface of the supporting member so that with described in local deformation
The corresponding position of substrate changes the height of the bearing-surface, the substrate is had desired curvature, makes the substrate
The process of Local warping.
14. a kind of exposure device, it includes：
Pedestal, the substrate being exposed is disposed above；And
Exposure light source, it light shines the substrate across mask,
The exposure device is characterised by,
The upper surface of the pedestal is provided with multiple grooves,
Be configured with bellows in the inside of the groove, the bellows is flexible freely in above-below direction, the bellows it is upper
The upper surface than the pedestal is held to protrude upward,
In the inside of the groove, the supporting member with bearing-surface is provided with inside or outside the bellows, it is described
The upper surface of bearing-surface and the pedestal is located on the same face or positioned at the position than the upper surface by the top, and the supporting
Position of the face positioned at the upper end than the bellows on the lower,
The inside of the bellows can be vacuumized.
15. exposure device as claimed in claim 14, it is characterised in that
The pedestal is the work piece holder that the multiple vacuum tanks that can be vacuumized are formed with the upper surface.
16. the exposure device as described in claims 14 or 15, it is characterised in that
Multiple supporting members are able to while the bellows is kept in above-below direction lifting.
17. exposure device as claimed in claim 15, it is characterised in that
The area of upper surface of total area than the work piece holder of multiple vacuum tanks is big.
18. exposure device as claimed in claim 17, it is characterised in that
Multiple projections with the height roughly the same with the depth of the vacuum tank are formed with the bottom of the vacuum tank.
Applications Claiming Priority (6)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2014-096930 | 2014-05-08 | ||
| JP2014096930 | 2014-05-08 | ||
| JP2014-219842 | 2014-10-29 | ||
| JP2014-219827 | 2014-10-29 | ||
| JP2014219827 | 2014-10-29 | ||
| JP2014219842 | 2014-10-29 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| CN105093844A CN105093844A (en) | 2015-11-25 |
| CN105093844B true CN105093844B (en) | 2017-09-22 |
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| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201510232828.4A Active CN105093844B (en) | 2014-05-08 | 2015-05-08 | Exposure method and exposure device |
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|---|---|
| JP (1) | JP6535206B2 (en) |
| CN (1) | CN105093844B (en) |
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| US9960070B2 (en) * | 2014-12-06 | 2018-05-01 | Kla-Tencor Corporation | Chucking warped wafer with bellows |
| TWI630059B (en) * | 2015-12-25 | 2018-07-21 | 日商三星鑽石工業股份有限公司 | Substrate adsorption device and workbench |
| CN107561870A (en) * | 2016-06-30 | 2018-01-09 | 上海微电子装备（集团）股份有限公司 | A kind of sports platform adsorbent equipment and lithographic equipment |
| JP6680649B2 (en) * | 2016-08-29 | 2020-04-15 | 日本特殊陶業株式会社 | Vacuum suction member |
| US10468288B2 (en) * | 2016-10-19 | 2019-11-05 | Kla-Tencor Corporation | Methods and systems for chucking a warped wafer |
| KR102556329B1 (en) * | 2016-12-15 | 2023-07-17 | 세메스 주식회사 | Vacuum chuck supporting semiconductor substrate |
| JP6867226B2 (en) * | 2017-05-01 | 2021-04-28 | 日本特殊陶業株式会社 | Vacuum suction member |
| JP7021969B2 (en) * | 2018-02-09 | 2022-02-17 | 日本特殊陶業株式会社 | Vacuum suction member and vacuum suction method |
| NL2021006B1 (en) * | 2018-05-29 | 2019-12-04 | Suss Microtec Lithography Gmbh | Holding apparatus and method for holding a substrate |
| CN114265287A (en) * | 2022-02-07 | 2022-04-01 | 广东科视光学技术股份有限公司 | Single-side digital photoetching system |
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| CN105093844A (en) | 2015-11-25 |
| JP2016085439A (en) | 2016-05-19 |
| JP6535206B2 (en) | 2019-06-26 |
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