CN105014484A - Magnetic field generation device of magnetorheological polishing equipment - Google Patents
Magnetic field generation device of magnetorheological polishing equipment Download PDFInfo
- Publication number
- CN105014484A CN105014484A CN201510502796.5A CN201510502796A CN105014484A CN 105014484 A CN105014484 A CN 105014484A CN 201510502796 A CN201510502796 A CN 201510502796A CN 105014484 A CN105014484 A CN 105014484A
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- China
- Prior art keywords
- magnetic
- magnetic field
- poles
- generation device
- field generation
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Classifications
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B24—GRINDING; POLISHING
- B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
- B24B1/00—Processes of grinding or polishing; Use of auxiliary equipment in connection with such processes
- B24B1/005—Processes of grinding or polishing; Use of auxiliary equipment in connection with such processes using a magnetic polishing agent
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01F—MAGNETS; INDUCTANCES; TRANSFORMERS; SELECTION OF MATERIALS FOR THEIR MAGNETIC PROPERTIES
- H01F7/00—Magnets
Abstract
The invention discloses a magnetic field generation device of magnetorheological polishing equipment. The magnetic field generation device comprises at least one electromagnetic pole group capable of generating a gradient magnetic field, wherein the electromagnetic pole group is composed of two electromagnetic poles opposite in polarity. According to the two electromagnetic poles forming one electromagnetic pole group, at least two concentric circles are set, and the adjacent annular magnetic poles are opposite in polarity. The magnetic field generation device is used for machining multi-degree of freedom movement workpieces through magnetorheological fluid, the outer surface(s) of one or more workpieces can be polished at the same time while the workpieces are clamped at a time, the outer surfaces of the workpieces can be planer or cambered or complex surfaces. By means of the magnetic field generation device of the magnetorheological polishing equipment, it is tested on trial that the problem that it is difficult to polish complex profile faces can be solved very effectively, the machining procedures of the workpieces can be reduced, and polishing efficiency is improved effectively.
Description
Technical field
The invention belongs to magnetorheological finishing device, be specifically related to a kind of field generator for magnetic of MRF equipment.
Background technology
Along with the continuous progress of present information electronic technology, optical technology, in IT, electron trade, ultra-smooth element application gets more and more, as Sapphire Substrate, monocrystalline silicon surface, cell phone rear cover etc., the manufacturing batch of this class component is large, and its surface will meet ultra-smooth, and glossiness is high, uniform color, without requirements such as scuffings.At present, the polisher lapper on market is all adopt plane to grind principle mutually, and workpiece is stuck in trip heart wheel, under the abrasive action of upper and lower polishing disk, realize polishing.The limitation of this polishing mode is exactly can only processing plane, can not process the curved surfaces such as cambered surface.
Magnetic flow liquid is a kind of intellectual material, is the suspended substance mixed by high permeability, low hysteresis small soft magnetic particles and non-magnetic liquid.It is liquid under normal conditions, when adding loaded magnetic field, liquid-solid phase occurring and becomes, and when the field is removed, the magnetic, solid-liquid phase occurs again and becomes.In certain magnetic field strength range, the apparent viscosity of magnetic flow liquid is relevant with magnetic field intensity, and this phenomenon is called magnetic rheology effect.Utilize the magnetic rheology effect of magnetic flow liquid, agglomeration of abrasive particles can be formed flexible bistrique in polishing area, have bistrique hardness adjustable, abrasive particle is from sharp, and face type such as to post at the advantage, for polishing function admirable.
The hardness of bistrique can be changed by changing magnetic field intensity during existing magnetorheological finishing device polishing operation, due to the limitation of field generator for magnetic structure, the effective polishing area in magnetic field is less, and the Material removal model of whole polishing area is fixing, cannot complete complex-curved polishing.
Summary of the invention
The object of this invention is to provide a kind of Distribution of Magnetic Field even, the effective polishing area in magnetic field is comparatively large, is suitable for the field generator for magnetic of the MRF equipment of the complex-curved polishing of multifreedom motion workpiece.
The field generator for magnetic of MRF equipment provided by the invention, comprise the electromagnetic pole group be made up of opposite polarity two electromagnetic poles that at least one can produce gradient magnetic, the electromagnetic pole forming described electromagnetic pole group adopts at least two concentric circles to arrange and the opposite polarity annular poles of two adjacent poles.
Described annular poles comprises ring-shaped magnetic core, the magnetic core coil be wrapped on ring-shaped magnetic core outer surface, and ring-shaped magnetic core and magnetic core coil are fixed on base plate.
Described field generator for magnetic is located at below the polishing liquid bath of drum-shaped, is provided with exterior loop in described polishing liquid bath neighboring, the lower plane of described exterior loop and the upper planes align of described annular poles.
Beneficial effect of the present invention:
Structure of the present invention is simple, can realize the adjustment in magnetic line of force direction by changing size of current.Because the iron core in each coil is continuous print, therefore the annular magnetic pole formed after single coil energising, its magnetic field is continuous print at hoop, and magnetic flow liquid can be uniformly distributed along hoop, and workpiece direction of rotation is vertical with magnetic line of force direction, the shearing force that surface of the work is subject to is larger.
The present invention is used for the workpiece of magnetic flow liquid processing multifreedom motion, and under clamped one time, can carry out polishing to the outer surface of one or more workpiece, its outer surface can be plane, cambered surface or complex-curved simultaneously.The present invention is by probationary certificate: can be difficult to the difficult problem of polishing by effectively solution complicated surface, can reduce the operation of work pieces process, effectively improve polishing efficiency.
Technical scheme of the present invention is further illustrated below in conjunction with accompanying drawing.
Accompanying drawing explanation
Fig. 1 is structural representation of the present invention.
Fig. 2 is the top view of Fig. 1.
Fig. 3 is magnetic line of force schematic diagram of the present invention.
Fig. 4 is the schematic diagram of the present invention for processing work plane.
Fig. 5 is the schematic diagram of the present invention for machining curve surface of workpiece.
Detailed description of the invention
See Fig. 1-Fig. 3, field generator for magnetic 6 provided by the invention is located at below the polishing liquid bath 5 of drum-shaped, comprise two (or multiple) concentric circles to arrange and the opposite polarity annular poles of two adjacent poles, every two opposite polarity annular poles form an electromagnetic pole group A, each annular poles comprises ring-shaped magnetic core 602, be wrapped in the magnetic core coil 603 on ring-shaped magnetic core 602 outer surface, ring-shaped magnetic core 602 and magnetic core coil 603 are fixed on base plate 604, protection ring 606 is provided with in the outside of outermost annular poles, be provided with exterior loop 605 in polishing liquid bath 5 neighboring simultaneously, the lower plane of exterior loop 605 and the upper planes align of annular poles.
The energising direction of magnetic core coil 603 and exterior loop 605 is contrary, can form two opposite polarity magnetic poles, in two coils, form gradient magnetic after energising.After exterior loop 605 is energized, the magnetic induction density B of magnetic core coil 603 can be vector superposed, therefore, change the direction (see Fig. 3) that the electric current of exterior loop 605 can regulate the magnetic poles line of force, the requirement of different magnetic field required when can realize processing plane and processing curve.Certain the present invention also can not establish exterior loop 605, can play the effect producing magnetic field in magnetic flow liquid equally, and just effect is not as establishing the good of exterior loop 605.
Field generator for magnetic 6 of the present invention can be used for comprising multiple complex surface such as plane and curved surface to the workpiece of multifreedom motion and carries out polishing.Apply polissoir of the present invention as shown in Figure 4, the workpiece 4 comprising the magnetic flow liquid case 5 be located in frame, be located at revolution deep bid 1 above magnetic flow liquid case 5, be located at the workpiece motion s frame 2 on revolution deep bid 1 and be arranged on by rotating shaft 3 on workpiece motion s frame 2, field generator for magnetic 6 of the present invention is arranged on the bottom of magnetic flow liquid case 5.
After energising, field generator for magnetic 6 produces gradient magnetic in magnetic flow liquid case 5, and magnetic flow liquid, under the effect of gradient magnetic, can form magnetic linkage along magnetic line of force direction, be equivalent to little magnetic bistrique one by one.When artifact-driven mechanism drives workpiece 4 to do multifreedom motion in magnetic flow liquid, workpiece 4 and magnetic flow liquid do relative motion, and magnetic flow liquid can produce removal effect to surface of the work, thus realizes polishing.
By magnetic circuit theorem, two opposite polarity magnetic poles can at gap location leakage field, and therefore leakage field place can produce a gradient magnetic.Because the magnetic conductivity μ of ferromagnetic material is very large, iron core has the effect making magnetic induction flux concentration to oneself inside.The line of magnetic induction not having the current-carrying coil of iron core to produce is that disperse is in whole space; If during same coil on a closed iron core, then not only the numerical value of magnetic flux increases greatly, and the line of magnetic induction is almost along iron core.By Ampère circuital theorem,
n and I in formula
0coil turn and electrical current respectively, B
ifor magnetic induction intensity, l
ifor the length of magnetic path, μ
ifor relative permeability, μ
0for air permeability.Therefore the size that the electrical current of coil and the length of magnetic path can change magnetic induction density B is changed.
Electrified wire can produce magnetic field therein with around in addition, according to Biot-Savart law,
magnetic induction density B is first magnetic induction intensity that each current elements Idl produces
vector superposed.Therefore, the magnetic induction intensity in MRF magnetic field is the magnetic induction intensity that each cartridge produces
vector superposed, namely
the large I changing field supply changes magnetic induction intensity
direction, thus realize magnetic induction intensity
direction adjustable.
By Biot-Sa farr's law, magnetic induction intensity is the multiplication cross that current elements and footpath are vowed, is axial vector, changes the direction that can change magnetic induction intensity that footpath is vowed.Footpath can be changed in each cartridge chamfering to vow, thus the direction of magnetic induction intensity can be changed.
The present embodiment, by controlling different servomotors, realizes the motion of the different free degree of workpiece, can any two interlocks between revolution, rotation, oscillating motion, also can independently moving, also can three motions link simultaneously.As shown in Figure 4, can the plane of processing work 4 when the deep bid 1 that revolves round the sun revolves round the sun and links with the rotation of workpiece motion s frame 2 drive shaft 3; As shown in Figure 5, when the deep bid 1 that revolves round the sun revolves round the sun, to wave with workpiece motion s frame 2 when (or workpiece motion s frame 2 waves, rotating shaft 3 rotation) links can the curved surface of processing work 4.
As can be seen here, when workpiece and magnetic flow liquid generation relative motion, the spinning motion of workpiece can realize the polishing of plane, and the oscillating motion of workpiece can realize the polishing of curved surface or facade, and the revolution motion of workpiece spindle can realize the uniformity of polishing.
Claims (3)
1. the field generator for magnetic of a MRF equipment, it is characterized in that comprising the electromagnetic pole group be made up of opposite polarity two electromagnetic poles that at least one can produce gradient magnetic, the electromagnetic pole forming described electromagnetic pole group adopts at least two concentric circles to arrange and the opposite polarity annular poles of two adjacent poles.
2. the field generator for magnetic of MRF equipment according to claim 1, it is characterized in that described annular poles comprises ring-shaped magnetic core, the magnetic core coil be wrapped on ring-shaped magnetic core outer surface, ring-shaped magnetic core and magnetic core coil are fixed on base plate.
3. the field generator for magnetic of MRF equipment according to claim 1 and 2, it is characterized in that described field generator for magnetic is located at below the polishing liquid bath of drum-shaped, exterior loop is provided with, the lower plane of described exterior loop and the upper planes align of described annular poles in described polishing liquid bath neighboring.
Priority Applications (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201510502796.5A CN105014484A (en) | 2015-08-17 | 2015-08-17 | Magnetic field generation device of magnetorheological polishing equipment |
| US15/536,282 US20170352460A1 (en) | 2015-08-17 | 2016-10-17 | Magnetic field generation apparatus of magnetorheological polishing device |
| PCT/CN2016/102291 WO2017028824A1 (en) | 2015-08-17 | 2016-10-17 | Magnetic field generation apparatus of magnetorheological finishing device |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201510502796.5A CN105014484A (en) | 2015-08-17 | 2015-08-17 | Magnetic field generation device of magnetorheological polishing equipment |
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| Publication Number | Publication Date |
|---|---|
| CN105014484A true CN105014484A (en) | 2015-11-04 |
Family
ID=54404971
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201510502796.5A Pending CN105014484A (en) | 2015-08-17 | 2015-08-17 | Magnetic field generation device of magnetorheological polishing equipment |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN105014484A (en) |
Cited By (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO2017028824A1 (en) * | 2015-08-17 | 2017-02-23 | 宇环数控机床股份有限公司 | Magnetic field generation apparatus of magnetorheological finishing device |
| CN107424720A (en) * | 2017-08-08 | 2017-12-01 | 北京交通大学 | Electric control permanent magnet formula field generator for magnetic for magnetorheological plane polishing |
| CN107481832A (en) * | 2017-08-04 | 2017-12-15 | 北京交通大学 | Electric control permanent magnet formula field generator for magnetic for magnetorheological plane polishing |
| CN109285431A (en) * | 2018-11-02 | 2019-01-29 | 安徽新华学院 | A kind of demonstration Biot-Sa farr's law experimental system and experimental method |
| CN111347295A (en) * | 2020-03-27 | 2020-06-30 | 台州学院 | Surface polishing device for inner container of pressure cooker |
Citations (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH08510695A (en) * | 1993-06-04 | 1996-11-12 | バイロコープ サイエンティフィク，インコーポレイティド | Magnetorheological polishing apparatus and method |
| US20050026544A1 (en) * | 2003-01-16 | 2005-02-03 | Elledge Jason B. | Carrier assemblies, polishing machines including carrier assemblies, and methods for polishing micro-device workpieces |
| CN201841443U (en) * | 2010-10-14 | 2011-05-25 | 浙江工业大学 | Magnetorheological jet polishing device |
| CN103273385A (en) * | 2013-06-09 | 2013-09-04 | 湖南大学 | Surface contact magneto-rheological flat polishing device and method with uniform magnetic field |
| CN203413016U (en) * | 2013-08-09 | 2014-01-29 | 谭苹 | Magneto-rheological elastomer double-ejection rod and single-annular membrane type damper |
| CN104533947A (en) * | 2015-01-05 | 2015-04-22 | 山东大学 | Annular magnetic pole structure and axial magnetic bearing provided with same |
| CN204935273U (en) * | 2015-08-17 | 2016-01-06 | 宇环数控机床股份有限公司 | The field generator for magnetic of MRF equipment |
-
2015
- 2015-08-17 CN CN201510502796.5A patent/CN105014484A/en active Pending
Patent Citations (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH08510695A (en) * | 1993-06-04 | 1996-11-12 | バイロコープ サイエンティフィク，インコーポレイティド | Magnetorheological polishing apparatus and method |
| US20050026544A1 (en) * | 2003-01-16 | 2005-02-03 | Elledge Jason B. | Carrier assemblies, polishing machines including carrier assemblies, and methods for polishing micro-device workpieces |
| CN201841443U (en) * | 2010-10-14 | 2011-05-25 | 浙江工业大学 | Magnetorheological jet polishing device |
| CN103273385A (en) * | 2013-06-09 | 2013-09-04 | 湖南大学 | Surface contact magneto-rheological flat polishing device and method with uniform magnetic field |
| CN203413016U (en) * | 2013-08-09 | 2014-01-29 | 谭苹 | Magneto-rheological elastomer double-ejection rod and single-annular membrane type damper |
| CN104533947A (en) * | 2015-01-05 | 2015-04-22 | 山东大学 | Annular magnetic pole structure and axial magnetic bearing provided with same |
| CN204935273U (en) * | 2015-08-17 | 2016-01-06 | 宇环数控机床股份有限公司 | The field generator for magnetic of MRF equipment |
Non-Patent Citations (1)
| Title |
|---|
| 郭忠达: "环带磁场在磁流变抛光技术中的应用", 《西安工业大学学报》 * |
Cited By (8)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO2017028824A1 (en) * | 2015-08-17 | 2017-02-23 | 宇环数控机床股份有限公司 | Magnetic field generation apparatus of magnetorheological finishing device |
| CN107481832A (en) * | 2017-08-04 | 2017-12-15 | 北京交通大学 | Electric control permanent magnet formula field generator for magnetic for magnetorheological plane polishing |
| CN107481832B (en) * | 2017-08-04 | 2023-07-25 | 北京交通大学 | Electric control permanent magnet type magnetic field generating device for magnetorheological plane polishing |
| CN107424720A (en) * | 2017-08-08 | 2017-12-01 | 北京交通大学 | Electric control permanent magnet formula field generator for magnetic for magnetorheological plane polishing |
| CN107424720B (en) * | 2017-08-08 | 2023-08-22 | 江西德义半导体科技有限公司 | Electric control permanent magnet type magnetic field generating device for magnetorheological plane polishing |
| CN109285431A (en) * | 2018-11-02 | 2019-01-29 | 安徽新华学院 | A kind of demonstration Biot-Sa farr's law experimental system and experimental method |
| CN109285431B (en) * | 2018-11-02 | 2023-11-21 | 安徽新华学院 | Experimental system and experimental method for demonstrating Biaoo-Safire law |
| CN111347295A (en) * | 2020-03-27 | 2020-06-30 | 台州学院 | Surface polishing device for inner container of pressure cooker |
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Application publication date: 20151104 |