CN104238281B - It is applied to remote light beam stabilizing device and beamstability method - Google Patents
It is applied to remote light beam stabilizing device and beamstability method Download PDFInfo
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- CN104238281B CN104238281B CN201410468136.5A CN201410468136A CN104238281B CN 104238281 B CN104238281 B CN 104238281B CN 201410468136 A CN201410468136 A CN 201410468136A CN 104238281 B CN104238281 B CN 104238281B
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Abstract
One is applied to remote light beam stabilizing device and antihunt means, including stablizing unit at the beginning of light beam in the transmission light path being placed between light source and subsequent optical system and light beam essence stablizes unit.The present invention can realize carrying out quick, high-precision stable to the light beam of the large scale position occurred during light beam long range propagation and sensing side-play amount.
Description
Technical field
The present invention relates to the beamstability of litho machine, particularly one and be applied to remote light beam stabilizing device and steady
Determine method.
Background technology
Beamstability technology is widely used in the high-end fields such as space optical communication, litho machine.In space optical communication,
It is excessive that transmitting terminal light beam points to skew, can cause the failure of intercommunication；In litho machine is applied, illuminating bundle
Point to and positional stability largely govern photoetching quality, affect the yields of photofabricated product, it is therefore necessary to
Introduce beamstability technology, sensing and the position of light beam are offset within maintaining controlled range.
In general, what the excimer laser in main flow litho machine was positioned at away from exposure system of photo-etching machine position farther out is another
On one ground.So, there is following reason and result in the light-beam position inciding in exposure system of photo-etching machine and refer to
To there is bigger deviation: the position of excimer laser self output beam and sensing exist drift；Light beam is through many
The long range propagation (20 meters) of individual speculum；Excimer laser and the different grounds residing for exposure system of photo-etching machine
Between relative displacement.
In existing beamstability technology, use light-beam position detection optical systems and by two electric reflector mirrors more
The light-beam position of composition adjusts system and constitutes light beam stabilizing device, according to the output of light-beam position detection optical system also
By controlling what light-beam position and pointing to was remedied to specify by the two electric reflector mirrors rotated at two orthogonal directions only
In marginal error.
First technology " a kind of light beam stabilizing device in lithographic equipment " (Chinese patent, application number:
201010582736) propose use three pieces of speculums and one can carry out far field, the light of near field light beam position sensing
Road carries out the technical scheme of beamstability.During carrying out beamstability, speculum must be regulated by the program
The translation action of device and spinning movement are used in combination could be by stable to the sensing of light beam and position at expectation state.Cause
This, regulating device of reflecting mirror not only comprises rotational motion mechanism, it is necessary to had the linear motion machine of linear motion
Structure, this makes the structure of whole beamstability system considerably complicated, and, with the electric reverse of structure of linear motion
The volume penetrating mirror adjusting means is relatively big, is also not easy to install.
As it has been described above, the light-beam position incided in exposure system of photo-etching machine and sensing there may be bigger deviation.
The sensing of excimer laser is in sub-milliradian magnitude, and its change in location is in submillimeter magnitude.Assume quasi-molecule
The distance of illuminator in laser instrument distance exposure system of photo-etching machine is 20 meters, when excimer laser sensing from
+ 0.5mrad changes to-0.5mrad, then incide the light beam position bottom the illuminator in exposure system of photo-etching machine
Put and be changed to 20mm.The sensing change that visible exposure light source is the least i.e. causes the biggest in the bottom of exposure system
Facula position change.The change that facula position is the biggest will be easily beyond photoelectricity in light-beam position detection optical system
The photosurface of detector, thus result in the failure of beamstability.And, at excimer laser and exposure system
In different ground and distant, the sensing of light beam and position also may be disturbed in transmitting procedure.
Meanwhile, bigger in beamstability system position correction amount makes electric reflector mirror need bigger tune
Whole amount, this, by increasing the execution time needed for electric reflector mirror, governs the closed-loop bandwidth of whole systems stabilisation.With
Time, the execution action in a big way of electric reflector mirror then can bring the decline performing precision, and then impact is a whole set of steady
Determine the lasting accuracy of system.
Summary of the invention
It is contemplated that overcome the above-mentioned deficiency in first technology, propose one and be applied to remote light beam stabilizing device
And antihunt means.Utilize the present invention described light beam stabilizing device and method, can realize light beam long range propagation
Time occur large scale position and point to side-play amount light beam carry out quick, high-precision stable.
The technical solution of the present invention is as follows:
One is applied to remote light beam stabilizing device, is characterised by including stablizing unit at the beginning of light beam and light beam essence is steady
Cell, stablizes unit at the beginning of described light beam and includes the first electric reflector mirror, the first spectroscope and the first light velocity measurement
Subelement, the first described light velocity measurement subelement includes that light beam points to optical path and the first photodetector, institute
The light beam essence stated is stablized unit and is included the second electric reflector mirror, the 3rd electric reflector mirror, the second spectroscope, the second light
Bundle measures subelement, and the second light velocity measurement subelement includes the 3rd spectroscope, the second optical path and the second smooth electrical resistivity survey
Surveying device, the 3rd optical path and the 3rd photodetector, be the first described electric reverse along light path input direction successively
Penetrating mirror, the first spectroscope, incident light is divided into reflection light and transmission light by the first described spectroscope, along reflection light side
To being that described light beam points to optical path and the first described photodetector successively, along transmission light direction it is successively
Described the second electric reflector mirror, the 3rd electric reflector mirror, the second spectroscope, this second spectroscope is by described saturating
Penetrating light and be further divided into the second reflection light and the second transmission light, this second transmission light is output light, along the second reflection light direction
It is described the 3rd spectroscope, the second optical path and the second photodetector successively, at the 3rd described spectroscope
Reflection light direction be the 3rd described optical path and the 3rd photodetector successively.
It is provided with stationary mirror between the first described spectroscope and the second described electric reflector mirror.
The method using above-mentioned light beam stabilizing device stable light-beam, the method comprises the steps:
1) unit will be stablized at the beginning of described light beam and described light beam essence is stablized unit and is placed in light source and subsequent optical system
Between transmission light path in；
2) light beam stabilizing device described in startup；
3) judge that the light beam two dimension of the source ends that the light velocity measurement subelement stablizing in unit at the beginning of light beam records is pointed to:
Assume to stablize at the beginning of light beam unit sensing in the x direction just stable threshold scope be [Tinit_x_pnt0,
Tinit_x_pnt1], stablizing unit sensing in y-direction just stable threshold scope at the beginning of light beam is
[Tinit_y_pnt0, Tinit_y_pnt1], if the light beam that records of the first light velocity measurement subelement point to already at
In the range of above-mentioned sensing just stable threshold, then the first electric reflector mirror will keep static；If the sensing of light beam exceeds
Any of the above described one is pointed to just stable threshold scope, then the first described electric reflector mirror will be according to current first light beam
Measure the output of subelement to move in 2 orthogonal directions the finger to change light beam through stablizing unit outgoing at the beginning of light beam
To, the most it is at the beginning of above-mentioned sensing until the light beam two dimension of the source ends recorded by the first light velocity measurement subelement is pointed to
Till in the range of stable threshold；
4) judge that light beam essence stablizes the light being incident to back-end optical system of the second light velocity measurement subelement output in unit
The position of bundle and sensing numerical value:
Assume light beam essence stablize unit sensing essence stable threshold scope in the x direction be [Tult_x_pnt0,
Tult_x_pnt1], light beam essence stablize unit sensing essence stable threshold scope in y-direction be [Tult_y_pnt0,
Tult_y_pnt1]；Light beam essence stablize unit position essence stable threshold scope in the x direction be [Tult_x_pos0,
Tult_x_pos1], light beam essence stablize unit position essence stable threshold scope in y-direction be [Tult_y_pos0,
Tult_y_pos1], if the position being incident to the light beam of back-end optical system has the most been in sensing essence with sensing and has stablized threshold
In the range of value and position essence stable threshold in the range of time, then light beam essence stablizes the second electric reflector mirror and the 3rd of unit
Electric reflector mirror will keep static；If being incident to the position of the light beam of back-end optical system and pointing to beyond pointing to essence
Stable threshold scope and position essence stable threshold scope, then the second electric reflector mirror and the 3rd electric reflector mirror are by basis
The output of current second light velocity measurement subelement rotates in 2 orthogonal directions stablizes unit through light beam essence go out to change
The position of the light beam penetrated and sensing, until the back-end optical system that is incident to recorded by the second light velocity measurement subelement
Light-beam position and point to be in the range of above-mentioned sensing essence stable threshold and in the range of the essence stable threshold of position till.
Compared with in first technology, the invention have the advantages that
(1) for light beam after long range propagation, rear end is incided due to what the reason such as light source and environment caused
The facula position side-play amount of optical system is big, thus easily beyond light-beam position detection optical system investigative range and
Result in the phenomenon that beamstability is failed, the present invention proposes a kind of light beam stabilizing device based on complex controll and side
Method, i.e. first by stablizing the finger of outgoing beam that unit will be located in the light source in light beam long range propagation source at the beginning of light beam
To stable a scope the least, it is ensured that incide hot spot with light source back-end optical system relatively far apart
Position will not drift out the investigative range of light-beam position detection optical system, thus for being the most stably incident to after
Position and the sensing of the light beam of end optical system provide guarantee, also solve present on detector type selecting simultaneously
Investigative range and the contradiction of detector precision.
And then, the present invention uses light beam essence to stablize unit to light beam in transmission light path and near back-end optical arrangement adjacent
Position and sensing be accurately controlled, thus ensure that light-beam position and the sensing inciding back-end optical system
Higher precision can be reached.
(2) present invention employs the light beam stabilizing device of complex controll, have three electric reflector mirrors in different phase
Carry out collaborative work, reduce the adjustment amount of single motor speculum, it is to avoid it carries out the rotation of wide-angle, can
More effectively to improve precision and the bandwidth of beamstability system.
(3) present invention is only with having the electric reflector mirror of two-dimensional quadrature direction rotating function, does not use straight line stepping
Unit, reduces the complexity of whole apparatus structure, reduces spatial volume, the beneficially system integration.
Accompanying drawing explanation
Fig. 1 is the device schematic diagram of the embodiment of the present invention 1.
Fig. 2 is the device schematic diagram of the embodiment of the present invention 2.
Fig. 3 is the beamstability method flow diagram applying light beam stabilizing device of the present invention to implement.
Detailed description of the invention
The invention will be further described with embodiment below in conjunction with the accompanying drawings, but should not limit the protection of the present invention with this
Scope.
Referring to Fig. 1, Fig. 1 is that a kind of structure being applied to remote light beam stabilizing device embodiment 1 of the present invention is shown
It is intended to, it can be seen that the present invention is applied to remote light beam stabilizing device and includes stablizing at the beginning of described light beam unit 1
Unit 2 is stablized with described light beam essence.
Stablize unit 1 at the beginning of described light beam and include described electric reflector mirror 101, described spectroscope 102 and described
Light velocity measurement subelement 11.Described light velocity measurement subelement 11 includes that described light beam points to optical path 111
With described photodetector 112.
The emergent light of light source 0 is introduced at the beginning of light beam stablizes unit 1, and first incides on electric reflector mirror 101,
It is irradiated on spectroscope 102 after this electric reflector mirror 101 reflects.The a part of light being irradiated on spectroscope 102
Bundle is reflected in the first light velocity measurement subelement 11, and another part light beam enters into light through spectroscope 102
Bundle essence is stablized in unit 2.Inciding the light beam in the first light velocity measurement subelement 11 will be straight after optical path 111
Connect and be irradiated on photodetector 112.Electric reflector mirror 101 is by the output according to the first light velocity measurement subelement 11
Carry out the rotation on two-dimensional quadrature direction, thus reach to control to stablize at the beginning of light beam the purpose that unit outgoing beam points to.
As can be seen from Figure 1, stablize the emergent light of unit 1 at the beginning of light beam to enter into light beam essence and stablize in unit 2.
Described light beam essence is stablized unit 2 and is included the second electric reflector mirror the 201, the 3rd electric reflector mirror 202, second
Spectroscope 203 and the second light velocity measurement subelement 21.Described light velocity measurement subelement 21 includes described the 3rd
Spectroscope 204, the second described optical path 211 and the second described photodetector 212, and include described
The 3rd optical path 221 and the 3rd described photodetector 222.Second electric reflector mirror 201 and the 3rd electricity
Dynamic speculum 202 will carry out the rotation on two-dimensional quadrature direction according to the output of described light velocity measurement subelement 21,
Thus reach to control light beam essence and stablize the purpose of unit outgoing beam position and sensing, ensure that with this and incide rear end
The position of the light beam of optical system and sensing are being needed numerically by accurate stablizing.
Refer to Fig. 2, compared to Figure 1, add the stationary mirror 3 for light path of transferring in fig. 2, with this
The direction of the light beam that back-end optical system is incided in guarantee is basically identical with light source exit direction.Due to stationary mirror
The existence of 3, the arrangement of the arrangement and the light beam stabilizing device in Fig. 2 that result in the light beam stabilizing device in Fig. 1 is omited
There is difference, but the method for work of the light beam stabilizing device of both arrangement modes is identical.
Referring to Fig. 3, Fig. 3 is to apply light beam stabilizing device of the present invention and the beamstability method flow diagram implemented, tool
The beamstability method of body is as follows.
(1) light of the source ends that the first light velocity measurement subelement 11 stablizing in unit at the beginning of light beam records is first determined whether
Shu Erwei points to:
Assume to stablize at the beginning of light beam unit sensing in the x direction just stable threshold scope be [Tinit_x_pnt0,
Tinit_x_pnt1], stablizing unit sensing in y-direction just stable threshold scope at the beginning of light beam is
[Tinit_y_pnt0,Tinit_y_pnt1].Locate if the light beam that the first light velocity measurement subelement 11 records points to
In the range of above-mentioned sensing just stable threshold, then the first electric reflector mirror 101 will keep static.
If the sensing of light beam points to just stable threshold scope beyond any of the above described one, then stablize the of unit at the beginning of light beam
One electric reflector mirror 101 will move in 2 orthogonal directions according to the output of current first light velocity measurement subelement 11
To change the sensing of the light beam through stablizing unit outgoing at the beginning of light beam, until recorded by the first light velocity measurement subelement 11
The light beam two dimension of source ends is pointed to till being the most in the range of above-mentioned sensing just stable threshold.
(2) judge light beam essence stablize in unit second light velocity measurement subelement 21 output be incident to back-end optical
The position of the light beam of system and sensing numerical value: assume that light beam essence stablizes unit sensing essence stable threshold in the x direction
Scope is [Tult_x_pnt0, Tult_x_pnt1], and light beam essence is stablized unit sensing essence in y-direction and stablized threshold
Value scope is [Tult_y_pnt0, Tult_y_pnt1]；It is stable that light beam essence stablizes unit position essence in the x direction
Threshold range is [Tult_x_pos0, Tult_x_pos1], and it is steady that light beam essence stablizes unit position essence in y-direction
Determining threshold range is [Tult_y_pos0, Tult_y_pos1].If being incident to the position of the light beam of back-end optical system
With point to the most be in sensing essence stable threshold in the range of and position essence stable threshold in the range of time, then light beam essence is stable
Secondth electric reflector mirror 201 of unit and the 3rd electric reflector mirror 202 will keep static.
If being incident to the position of the light beam of back-end optical system and pointing to beyond pointing to essence stable threshold scope and position
Essence stable threshold scope, then light beam essence stablizes the second electric reflector mirror 201 and the 3rd electric reflector mirror 202 of unit
To rotate in 2 orthogonal directions to change through light beam essence according to the output of current second light velocity measurement subelement 21
Stablize position and the sensing of the light beam of unit outgoing, until by the second light velocity measurement subelement 21 record be incident to after
The light-beam position of end optical system and point to and be in the range of above-mentioned sensing essence stable threshold and position essence stable threshold
Till in the range of.
(3) repeat the above steps (1) and step (2), can realize light beam quick, high of remote transmission range
Stablizing of precision.
Visible, stablize unit owing to using at the beginning of light beam, the light of less drift value i.e. occurs at transmitting beam facula position
Carry out beamstability at the front position of bundle transmission light path, inhibit beam Propagation light path rear end hot spot
The drift value of position, also makes only to use light beam essence to stablize unit at the back-end location of beam Propagation light path and carries out
The beamstability of little side-play amount.So, the photodetector used in whole light beam stabilizing device and electricity
Dynamic speculum is all little stroke and high-precision.So, compared with in first technology, one of the present invention is applied to long distance
From light beam stabilizing device and method have that stabilized speed is fast, precision is high, advantages of simple structure and simple, be broadly applicable
In the optical device being similar to the long transmission distance such as litho machine.
Claims (1)
1. the method using light beam stabilizing device stable light-beam, this light beam stabilizing device, including stable at the beginning of light beam
Unit (1) and light beam essence are stablized and are stablized unit (1) at the beginning of unit (2), described light beam and include the first electric reflector
Mirror (101), the first spectroscope (102) and the first light velocity measurement subelement (11), the first described light velocity measurement
Subelement (11) includes that light beam points to optical path (111) and the first photodetector (112), described light beam
Essence is stablized unit (2) and is included the second electric reflector mirror (201), the 3rd electric reflector mirror (202), the second spectroscope
(203), the second light velocity measurement subelement (21), the second light velocity measurement subelement (21) include the 3rd spectroscope (204),
Second optical path (211) and the second photodetector (212), the 3rd optical path (221) and the 3rd photoelectricity
Detector (222), is described the first electric reflector mirror (101), the first spectroscope along light path input direction successively
(102), incident light is divided into reflection light and transmission light by described the first spectroscope (102), depends on along reflection light direction
Secondary is that described light beam points to optical path (111) and described the first photodetector (112), along transmission light side
To being described the second electric reflector mirror (201), the 3rd electric reflector mirror (202), the second spectroscope (203) successively,
Described transmission light is further divided into the second reflection light and the second transmission light, this second transmission by this second spectroscope (203)
Light is output light, is described the 3rd spectroscope (204), the second optical path (211) successively along the second reflection light direction
With the second photodetector (212), the reflection light direction at the 3rd described spectroscope (204) is described successively
3rd optical path (221) and the 3rd photodetector (222), it is characterised in that the method comprises the steps:
1) unit will be stablized at the beginning of described light beam and described light beam essence is stablized unit and is placed in light source and subsequent optical system
Between transmission light path in；
2) light beam stabilizing device described in startup；
3) judge that the light beam two dimension of the source ends that the light velocity measurement subelement (1) stablizing in unit at the beginning of light beam records refers to
To:
Assume to stablize at the beginning of light beam unit sensing in the x direction just stable threshold scope be [Tinit_x_pnt0,
Tinit_x_pnt1], stablizing unit sensing in y-direction just stable threshold scope at the beginning of light beam is
[Tinit_y_pnt0, Tinit_y_pnt1], if the light beam that the first light velocity measurement subelement (11) records has pointed to
In the range of being in above-mentioned sensing just stable threshold, then the first electric reflector mirror (101) will keep static；If light
The sensing of bundle points to just stable threshold scope, then the first described electric reflector mirror (101) beyond any of the above described one
To move in 2 orthogonal directions to change through light beam according to the output of current first light velocity measurement subelement (11)
Just stablize the sensing of the light beam of unit outgoing, until the source ends recorded by the first light velocity measurement subelement (11)
Light beam two dimension is pointed to till being the most in the range of above-mentioned sensing just stable threshold；
4) judge that what light beam essence stablized that the second light velocity measurement subelement (21) in unit exports is incident to back-end optical system
The position of the light beam of system and sensing numerical value:
Assume light beam essence stablize unit sensing essence stable threshold scope in the x direction be [Tult_x_pnt0,
Tult_x_pnt1], light beam essence stablize unit sensing essence stable threshold scope in y-direction be [Tult_y_pnt0,
Tult_y_pnt1]；Light beam essence stablize unit position essence stable threshold scope in the x direction be [Tult_x_pos0,
Tult_x_pos1], light beam essence stablize unit position essence stable threshold scope in y-direction be [Tult_y_pos0,
Tult_y_pos1], if the position being incident to the light beam of back-end optical system has the most been in sensing essence with sensing and has stablized threshold
In the range of value and position essence stable threshold in the range of time, then light beam essence stablizes the second electric reflector mirror (201) of unit
To keep static with the 3rd electric reflector mirror (202)；If being incident to position and the sensing of the light beam of back-end optical system
Beyond pointing to essence stable threshold scope and position essence stable threshold scope, then the second electric reflector mirror (201) and the
Three electric reflector mirrors (202) will be according to the output of current second light velocity measurement subelement (21) at two orthogonal directions
Position and the sensing of the light beam of unit outgoing is stablized in upper rotation with change through light beam essence, until by the second light velocity measurement
The light-beam position being incident to back-end optical system that unit (21) records and sensing have been in above-mentioned sensing essence and have stablized threshold
In the range of value and position essence stable threshold in the range of till.
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| CN108037575B (en) * | 2017-12-29 | 2020-11-13 | 武汉光谷航天三江激光产业技术研究院有限公司 | Light beam pointing stability control simulation device and method |
Citations (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US6704340B2 (en) * | 2001-01-29 | 2004-03-09 | Cymer, Inc. | Lithography laser system with in-place alignment tool |
| CN101487983A (en) * | 2009-02-18 | 2009-07-22 | 上海微电子装备有限公司 | Light beam transmission apparatus and method |
| CN102566318A (en) * | 2012-02-12 | 2012-07-11 | 中国科学院光电技术研究所 | Light beam transmission stabilizing device |
-
2014
- 2014-09-15 CN CN201410468136.5A patent/CN104238281B/en active Active
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| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US6704340B2 (en) * | 2001-01-29 | 2004-03-09 | Cymer, Inc. | Lithography laser system with in-place alignment tool |
| CN101487983A (en) * | 2009-02-18 | 2009-07-22 | 上海微电子装备有限公司 | Light beam transmission apparatus and method |
| CN102566318A (en) * | 2012-02-12 | 2012-07-11 | 中国科学院光电技术研究所 | Light beam transmission stabilizing device |
Non-Patent Citations (1)
| Title |
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| 光刻机照明系统中光束稳定技术研究;鲍建飞等;《中国激光》;20120930;第39卷(第9期);全文 * |
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Effective date of registration: 20190925 Address after: Room 601-10, 6th floor, No. 2, Jingyuan Beijie, Beijing Economic and Technological Development Zone, Daxing District, Beijing, 100176 Patentee after: Beijing Guowang Optical Technology Co., Ltd. Address before: 800-211 201800 post office box, Shanghai, Shanghai, Jiading District Patentee before: Shanghai Optical Precision Machinery Inst., Chinese Academy of Sciences |
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