CN104238281A - Light beam stabilization device and light beam stabilization method applied to long distance - Google Patents
Light beam stabilization device and light beam stabilization method applied to long distance Download PDFInfo
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- CN104238281A CN104238281A CN201410468136.5A CN201410468136A CN104238281A CN 104238281 A CN104238281 A CN 104238281A CN 201410468136 A CN201410468136 A CN 201410468136A CN 104238281 A CN104238281 A CN 104238281A
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Abstract
The invention discloses a light beam stabilization device and a light beam stabilization method applied to long distance. The light beam stabilization device comprises a light beam initial stabilization unit and a light beam refined stabilization unit arranged in a transmission light path between a light source and a subsequent optical system. According to the device and the method disclosed by the invention, light beams with large-scale position offset and orientation offset can be stabilized rapidly and highly precisely during long-distance transmission of the light beams.
Description
Technical field
The present invention relates to the beamstability of litho machine, particularly one and be applied to remote light beam stabilizing device and antihunt means.
Background technology
Beamstability technology is widely used in space optical communication, the high-end fields such as litho machine.In space optical communication, the skew of transmitting terminal beam-pointing is excessive, can cause the failure of intercommunication; In litho machine application, sensing and the inplace stability of illuminating bundle largely govern photoetching quality, affect the yields of photofabricated product, are therefore necessary to introduce beamstability technology, the sensing of light beam and position skew are maintained within controlled range.
In general, the excimer laser in main flow litho machine is positioned on another ground far away of distance exposure system of photo-etching machine position.So, there is following reason and result in the light-beam position incided in the exposure system of photo-etching machine deviation larger with pointing to existence: the position of excimer laser self output beam and sensing existence drift; Light beam is through the long range propagation (20 meters) of multiple catoptron; Relative displacement between excimer laser and the different grounds residing for exposure system of photo-etching machine.
In existing beamstability technology, many employings light-beam position detection optical system and the light-beam position adjustment System be made up of two electric reflector mirrors form light beam stabilizing device, and the electric reflector mirror rotated at two orthogonal directionss only according to the output of light-beam position detection optical system and by control two is by light-beam position and point in the marginal error that is remedied to and specifies.
First technology " a kind of for the light beam stabilizing device in lithographic equipment " (Chinese patent, application number: 201010582736) propose use three pieces of catoptrons and one can carry out far field, near field light beam position sensing light path to carry out the technical scheme of beamstability.Carrying out in beamstability process, the program must could by the sensing of light beam and position stability at expectation state by the translation action of regulating device of reflecting mirror and spinning movement conbined usage.Therefore, regulating device of reflecting mirror not only comprises rotational motion mechanism, also must have the straight-line motion mechanism that accomplish linear moves, this makes the structure of whole beamstability system quite complicated, and the volume with the electric reflector mirror regulating device of structure of linear motion is comparatively large, is also not easy to install.
As mentioned above, incide the light-beam position in exposure system of photo-etching machine and point to and may there is larger deviation.The sensing of excimer laser is in sub-milliradian magnitude, and its change in location is in submillimeter magnitude.Suppose that excimer laser is 20 meters apart from the distance of the illuminator in exposure system of photo-etching machine, when the sensing of excimer laser changes to-0.5mrad from+0.5mrad, the light-beam position so incided bottom the illuminator in exposure system of photo-etching machine is changed to 20mm.Namely the sensing change that visible exposure light source is so little causes facula position change so greatly in the bottom of exposure system.The change that facula position is so large will very easily exceed the photosurface of photodetector in light-beam position detection optical system, thus result in the failure of beamstability.And excimer laser and exposure system are in different grounds and distant, and the sensing of light beam and position also may be disturbed in transmitting procedure.
Meanwhile, position correction amount larger in beamstability system makes electric reflector mirror need larger adjustment amount, this execution time that will increase needed for electric reflector mirror, governs the closed-loop bandwidth of whole systems stabilisation.Meanwhile, electric reflector mirror performs an action in a big way, can bring the decline performing precision, and then affect the lasting accuracy of a whole set of systems stabilisation.
Summary of the invention
The present invention is intended to overcome the above-mentioned deficiency in first technology, proposes one and is applied to remote light beam stabilizing device and antihunt means.Utilize the present invention described light beam stabilizing device and method, can realize carrying out quick, high-precision stablizing to the light beam of the large scale position occurred during light beam long range propagation and sensing side-play amount.
Technical solution of the present invention is as follows:
One is applied to remote light beam stabilizing device, be characterised in that and comprise light beam just stabilization element and light beam essence stabilization element, described light beam just stabilization element comprises the first electric reflector mirror, first spectroscope and the first light velocity measurement subelement, the first described light velocity measurement subelement comprises beam-pointing optical path and the first photodetector, described light beam essence stabilization element comprises the second electric reflector mirror, 3rd electric reflector mirror, second spectroscope, second light velocity measurement subelement, second light velocity measurement subelement comprises the 3rd spectroscope, second optical path and the second photodetector, 3rd optical path and the 3rd photodetector, along the first electric reflector mirror that light path input direction is described successively, first spectroscope, incident light is divided into reflected light and transmitted light by the first described spectroscope, described beam-pointing optical path and the first described photodetector successively along reflected light direction, the second described electric reflector mirror successively along transmitted light direction, 3rd electric reflector mirror, second spectroscope, described transmitted light is further divided into the second reflected light and the second transmitted light by this second spectroscope, this second transmitted light is for exporting light, the 3rd described spectroscope successively along the second reflected light direction, second optical path and the second photodetector, the 3rd described optical path and the 3rd photodetector successively in the described the 3rd spectroscopical reflected light direction.
Stationary mirror is provided with between the first described spectroscope and the second described electric reflector mirror.
Use the method for above-mentioned light beam stabilizing device stable light-beam, the method comprises the steps:
1) by described light beam, just stabilization element and described light beam essence stabilization element are placed in the transmission light path between light source and subsequent optical system;
2) light beam stabilizing device described in startup;
3) judge that the light beam two dimension of the source ends that the light velocity measurement subelement in the first stabilization element of light beam records is pointed to:
Suppose that the first stable threshold scope of light beam just stabilization element sensing is in the x direction [Tinit_x_pnt0, Tinit_x_pnt1], light beam just stabilization element sensing in y-direction just stable threshold scope is [Tinit_y_pnt0, Tinit_y_pnt1], if the beam-pointing that the first light velocity measurement subelement records has been within the scope of the first stable threshold of above-mentioned sensing, then the first electric reflector mirror will keep static; If the sensing of light beam exceeds any one sensing above-mentioned just stable threshold scope, the first then described electric reflector mirror will move the sensing of the light beam changed through light beam just stabilization element outgoing in 2 orthogonal directions according to the output of current first light velocity measurement subelement, be all within the scope of the first stable threshold of above-mentioned sensing until the light beam two dimension of the source ends recorded by the first light velocity measurement subelement is pointed to;
4) judge the position being incident to the light beam of back-end optical system of the second light velocity measurement subelement output in light beam essence stabilization element and point to numerical value:
Suppose that light beam essence stabilization element sensing essence stable threshold scope is in the x direction [Tult_x_pnt0, Tult_x_pnt1], light beam essence stabilization element sensing essence stable threshold scope is in y-direction [Tult_y_pnt0, Tult_y_pnt1]; Light beam essence stabilization element position essence stable threshold scope is in the x direction [Tult_x_pos0, Tult_x_pos1], light beam essence stabilization element position essence stable threshold scope is in y-direction [Tult_y_pos0, Tult_y_pos1], if the position and pointing to being incident to the light beam of back-end optical system be all in point in smart stable threshold and within the scope of the essence stable threshold of position time, then the second electric reflector mirror of the smart stabilization element of light beam and the 3rd electric reflector mirror will keep static; If be incident to the position of the light beam of back-end optical system and point to beyond the smart stable threshold scope of sensing and position essence stable threshold scope, then the second electric reflector mirror and the 3rd electric reflector mirror change the position through the light beam of light beam essence stabilization element outgoing and sensing by rotating in 2 orthogonal directions according to the output of current second light velocity measurement subelement, until the light-beam position being incident to back-end optical system recorded by the second light velocity measurement subelement and sensing have been within the scope of above-mentioned sensing essence stable threshold and within the scope of the essence stable threshold of position.
With compared with first technology, the present invention has the following advantages:
(1) for light beam after long range propagation, the facula position side-play amount of the back-end optical system that incides caused due to the reason such as light source and environment is large, thus very easily exceed the investigative range of light-beam position detection optical system and result in the phenomenon of beamstability failure, the present invention proposes a kind of light beam stabilizing device based on complex controll and method, namely first use light beam just stabilization element the sensing of the outgoing beam being positioned at the light source in light beam long range propagation source is stabilized in a very little scope, ensure that the investigative range inciding light beam position sensing optical system of can not drifting about out with the position of the hot spot of light source back-end optical system relatively far apart, thus for more stable be incident to the light beam of back-end optical system position and sensing provide guarantee, also solve the contradiction of investigative range and the detector precision existed in detector type selecting simultaneously.
And then the present invention is in transmission light path and close back-end optical arrangement adjacent uses light beam essence stabilization element to control accurately the position of light beam and sensing, thus ensure that the light-beam position inciding back-end optical system can reach higher precision with pointing to.
(2) present invention employs the light beam stabilizing device of complex controll, have three electric reflector mirrors and carry out collaborative work in different phase, reduce the adjustment amount of single motor catoptron, avoid the rotation that it carries out wide-angle, more effectively can improve precision and the bandwidth of beamstability system.
(3) the present invention only adopts the electric reflector mirror with two-dimensional quadrature direction rotating function, does not use straight line stepping unit, reduces the complexity of whole apparatus structure, reduces spatial volume, is beneficial to the system integration.
Accompanying drawing explanation
Fig. 1 is the device schematic diagram of the embodiment of the present invention 1.
Fig. 2 is the device schematic diagram of the embodiment of the present invention 2.
Fig. 3 is the beamstability method flow diagram that application light beam stabilizing device of the present invention is implemented.
Embodiment
Below in conjunction with drawings and Examples, the invention will be further described, but should not limit the scope of the invention with this.
Refer to Fig. 1, Fig. 1 is a kind of structural representation being applied to remote light beam stabilizing device embodiment 1 of the present invention, can find out, the present invention is applied to remote light beam stabilizing device and comprises described light beam just stabilization element 1 and described light beam essence stabilization element 2.
Described light beam just stabilization element 1 comprises described electric reflector mirror 101, described spectroscope 102 and described light velocity measurement subelement 11.Described light velocity measurement subelement 11 comprises described beam-pointing optical path 111 and described photodetector 112.
The emergent light of light source 0 is introduced into light beam just stabilization element 1, and first incides on electric reflector mirror 101, is irradiated on spectroscope 102 after the reflection of this electric reflector mirror 101.The a part of light beam be irradiated on spectroscope 102 is entered into the first light velocity measurement subelement 11 by reflection, and another part light beam enters into light beam essence stabilization element 2 through spectroscope 102.The light beam incided in the first light velocity measurement subelement 11 will shine directly on photodetector 112 after optical path 111.The rotation that electric reflector mirror 101 will carry out according to the output of the first light velocity measurement subelement 11 on two-dimensional quadrature direction, thus reach the object controlling light beam just stabilization element outgoing beam sensing.
As can be seen from Figure 1, the emergent light of the first stabilization element 1 of light beam enters into light beam essence stabilization element 2.
Described light beam essence stabilization element 2 comprises the second electric reflector mirror 201, the 3rd electric reflector mirror 202, second spectroscope 203 and the second light velocity measurement subelement 21.Described light velocity measurement subelement 21 comprises the 3rd described spectroscope 204, the second described optical path 211 and the second described photodetector 212, and comprises the 3rd described optical path 221 and the 3rd described photodetector 222.The rotation that second electric reflector mirror 201 and the 3rd electric reflector mirror 202 will carry out according to the output of described light velocity measurement subelement 21 on two-dimensional quadrature direction, thus reach the object controlling light beam essence stabilization element outgoing beam position and sensing, ensure that the position of the light beam inciding back-end optical system and sensing are stabilized in needs numerically accurately with this.
Refer to Fig. 2, compared to Figure 1, add the stationary mirror 3 for light path of transferring in fig. 2, with this ensure the direction of the light beam inciding back-end optical system and light source exit direction basically identical.Due to the existence of stationary mirror 3, result in the arrangement of the light beam stabilizing device in Fig. 1 slightly different from the arrangement of the light beam stabilizing device in Fig. 2, but the method for work of the light beam stabilizing device of these two kinds of arrangement modes is identical.
Refer to Fig. 3, the beamstability method flow diagram that Fig. 3 is application light beam stabilizing device of the present invention and implements, concrete beamstability method is as follows.
(1) first judge that the light beam two dimension of the source ends that the first light velocity measurement subelement 11 in the first stabilization element of light beam records is pointed to:
Suppose that the first stable threshold scope of light beam just stabilization element sensing is in the x direction [Tinit_x_pnt0, Tinit_x_pnt1], light beam just stabilization element sensing in y-direction just stable threshold scope is [Tinit_y_pnt0, Tinit_y_pnt1].If the beam-pointing that the first light velocity measurement subelement 11 records has been within the scope of the first stable threshold of above-mentioned sensing, then the first electric reflector mirror 101 will keep static.
If the sensing of light beam exceeds any one sensing above-mentioned just stable threshold scope, then the first electric reflector mirror 101 of the first stabilization element of light beam will move the sensing of the light beam changed through light beam just stabilization element outgoing in 2 orthogonal directions according to the output of current first light velocity measurement subelement 11, all be within the scope of the first stable threshold of above-mentioned sensing until the light beam two dimension of the source ends recorded by the first light velocity measurement subelement 11 is pointed to.
(2) judge the position being incident to the light beam of back-end optical system that the second light velocity measurement subelement 21 in light beam essence stabilization element exports and point to numerical value: supposing that light beam essence stabilization element sensing essence stable threshold scope is in the x direction [Tult_x_pnt0, Tult_x_pnt1], light beam essence stabilization element sensing essence stable threshold scope is in y-direction [Tult_y_pnt0, Tult_y_pnt1]; Light beam essence stabilization element position essence stable threshold scope is in the x direction [Tult_x_pos0, Tult_x_pos1], and light beam essence stabilization element position essence stable threshold scope is in y-direction [Tult_y_pos0, Tult_y_pos1].If the position and pointing to being incident to the light beam of back-end optical system be all in point in smart stable threshold and within the scope of the essence stable threshold of position time, then the secondth electric reflector mirror 201 of the smart stabilization element of light beam and the 3rd electric reflector mirror 202 will keep static.
If be incident to the position of the light beam of back-end optical system and point to beyond the smart stable threshold scope of sensing and position essence stable threshold scope, then light beam essence the second electric reflector mirror 201 of stabilization element and the 3rd electric reflector mirror 202 change the position through the light beam of light beam essence stabilization element outgoing and sensing by rotating in 2 orthogonal directions according to the output of current second light velocity measurement subelement 21, until the light-beam position being incident to back-end optical system recorded by the second light velocity measurement subelement 21 and pointing to has been within the scope of above-mentioned sensing essence stable threshold and within the scope of the essence stable threshold of position.
(3) repeat above-mentioned steps (1) and step (2), the quick, high-precision stable of the light beam of transmission range far away can be realized.
Visible, owing to using light beam just stabilization element, namely occur at transmitting beam facula position that the front position place of the beam Propagation light path of less drift value carries out beamstability, inhibit the drift value of beam Propagation light path rear end facula position, also make only to use at the back-end location place of beam Propagation light path light beam essence stabilization element to carry out the beamstability of little side-play amount.So, the photodetector used in whole light beam stabilizing device and electric reflector mirror are all little strokes and high-precision.So with compared with first technology, one of the present invention is applied to remote light beam stabilizing device and method and has that stabilized speed is fast, precision is high, advantages of simple structure and simple, can be widely used in being similar in the optical device of the long transmission distance such as litho machine.
Claims (3)
1. one kind is applied to remote light beam stabilizing device, be characterised in that and comprise light beam just stabilization element (1) and light beam essence stabilization element (2), described light beam just stabilization element (1) comprises the first electric reflector mirror (101), first spectroscope (102) and the first light velocity measurement subelement (11), the first described light velocity measurement subelement (11) comprises beam-pointing optical path (111) and the first photodetector (112), described light beam essence stabilization element (2) comprises the second electric reflector mirror (201), 3rd electric reflector mirror (202), second spectroscope (203), second light velocity measurement subelement (21), second light velocity measurement subelement (21) comprises the 3rd spectroscope (204), second optical path (211) and the second photodetector (212), 3rd optical path (221) and the 3rd photodetector (222), along the first electric reflector mirror (101) that light path input direction is described successively, first spectroscope (102), incident light is divided into reflected light and transmitted light by described the first spectroscope (102), described beam-pointing optical path (111) and described the first photodetector (112) successively along reflected light direction, the second described electric reflector mirror (201) successively along transmitted light direction, 3rd electric reflector mirror (202), second spectroscope (203), described transmitted light is further divided into the second reflected light and the second transmitted light by this second spectroscope (203), this second transmitted light is for exporting light, the 3rd described spectroscope (204) successively along the second reflected light direction, second optical path (211) and the second photodetector (212), the 3rd described optical path (221) and the 3rd photodetector (222) successively in the reflected light direction of the 3rd described spectroscope (204).
2. be according to claim 1ly applied to remote light beam stabilizing device, it is characterized in that being provided with stationary mirror (3) between described the first spectroscope (102) and the second described electric reflector mirror (201).
3. use the method for light beam stabilizing device stable light-beam according to claim 1, it is characterized in that the method comprises the steps:
1) by described light beam, just stabilization element and described light beam essence stabilization element are placed in the transmission light path between light source and subsequent optical system;
2) light beam stabilizing device described in startup;
3) judge that the light beam two dimension of the source ends that the light velocity measurement subelement (1) in the first stabilization element of light beam records is pointed to:
Suppose that the first stable threshold scope of light beam just stabilization element sensing is in the x direction [Tinit_x_pnt0, Tinit_x_pnt1], light beam just stabilization element sensing in y-direction just stable threshold scope is [Tinit_y_pnt0, Tinit_y_pnt1], if the beam-pointing that the first light velocity measurement subelement (11) records has been within the scope of the first stable threshold of above-mentioned sensing, then the first electric reflector mirror (101) will keep static; If the sensing of light beam exceeds any one sensing above-mentioned just stable threshold scope, the first then described electric reflector mirror (101) will move the sensing of the light beam changed through light beam just stabilization element outgoing in 2 orthogonal directions according to the output of current first light velocity measurement subelement (11), be all within the scope of the first stable threshold of above-mentioned sensing until the light beam two dimension of the source ends recorded by the first light velocity measurement subelement (11) is pointed to;
4) to judge in light beam essence stabilization element the position being incident to the light beam of back-end optical system that exports of the second light velocity measurement subelement (21) and point to numerical value:
Suppose that light beam essence stabilization element sensing essence stable threshold scope is in the x direction [Tult_x_pnt0, Tult_x_pnt1], light beam essence stabilization element sensing essence stable threshold scope is in y-direction [Tult_y_pnt0, Tult_y_pnt1]; Light beam essence stabilization element position essence stable threshold scope is in the x direction [Tult_x_pos0, Tult_x_pos1], light beam essence stabilization element position essence stable threshold scope is in y-direction [Tult_y_pos0, Tult_y_pos1], if the position and pointing to being incident to the light beam of back-end optical system be all in point in smart stable threshold and within the scope of the essence stable threshold of position time, then the second electric reflector mirror (201) of the smart stabilization element of light beam and the 3rd electric reflector mirror (202) will keep static; If be incident to the position of the light beam of back-end optical system and point to beyond the smart stable threshold scope of sensing and position essence stable threshold scope, then the second electric reflector mirror (201) and the 3rd electric reflector mirror (202) change the position through the light beam of light beam essence stabilization element outgoing and sensing by rotating in 2 orthogonal directions according to the output of current second light velocity measurement subelement (21), until the light-beam position being incident to back-end optical system recorded by the second light velocity measurement subelement (21) and sensing have been within the scope of above-mentioned sensing essence stable threshold and within the scope of the essence stable threshold of position.
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Cited By (1)
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| CN108037575A (en) * | 2017-12-29 | 2018-05-15 | 武汉光谷航天三江激光产业技术研究院有限公司 | A kind of light beam is directed toward stability contorting simulator and method |
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| US6704340B2 (en) * | 2001-01-29 | 2004-03-09 | Cymer, Inc. | Lithography laser system with in-place alignment tool |
| CN101487983A (en) * | 2009-02-18 | 2009-07-22 | 上海微电子装备有限公司 | Light beam transmission apparatus and method |
| CN102566318A (en) * | 2012-02-12 | 2012-07-11 | 中国科学院光电技术研究所 | Light beam transmission stabilizing device |
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| US6704340B2 (en) * | 2001-01-29 | 2004-03-09 | Cymer, Inc. | Lithography laser system with in-place alignment tool |
| CN101487983A (en) * | 2009-02-18 | 2009-07-22 | 上海微电子装备有限公司 | Light beam transmission apparatus and method |
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| CN108037575A (en) * | 2017-12-29 | 2018-05-15 | 武汉光谷航天三江激光产业技术研究院有限公司 | A kind of light beam is directed toward stability contorting simulator and method |
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Effective date of registration: 20190925 Address after: Room 601-10, 6th floor, No. 2, Jingyuan Beijie, Beijing Economic and Technological Development Zone, Daxing District, Beijing, 100176 Patentee after: Beijing Guowang Optical Technology Co., Ltd. Address before: 800-211 201800 post office box, Shanghai, Shanghai, Jiading District Patentee before: Shanghai Optical Precision Machinery Inst., Chinese Academy of Sciences |