CN104152107A - Ceramic material use abrasive - Google Patents
Ceramic material use abrasive Download PDFInfo
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- CN104152107A CN104152107A CN201310174963.9A CN201310174963A CN104152107A CN 104152107 A CN104152107 A CN 104152107A CN 201310174963 A CN201310174963 A CN 201310174963A CN 104152107 A CN104152107 A CN 104152107A
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- abrasive
- stupalith
- forming agent
- water
- boride
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Abstract
The present invention provides a ceramic material use abrasive comprising a film forming agent, an auxiliary film forming agent, abrasive particles, and water. The film forming agent is one or two substances selected from the group consisting of low polyhydric alcohol and alcohol amine, the low polyhydric alcohol is polyol with the number of carbon atoms in 2-5, and comprises two or more hydroxyls, the auxiliary film forming agent is one or two substances selected from the group consisting of borate and lithium chromate, the abrasive particles are a boride. The mass ratio of film forming agent to auxiliary film forming agent to abrasive particles to water is 10-30:0.2-4:0.1-3:70-90. The ceramic material use abrasive is excellent in abrasive effect, suitable for extreme pressure environment, and environmentally-friendly.
Description
Technical field
The present invention relates to a kind of stupalith abrasive, particularly excellent, the water base abrasive of stupalith that is applicable to extreme pressure environment, environmental protection of a kind of grinding effect.
Background technology
Stupalith has the advantages such as high-melting-point, high rigidity, high-wearing feature, resistance to oxidation, and in mechanical industry, the parts easy to wear such as increasing sealing member, bearing, ball valve, cylinder sleeve change by ceramic material processing and manufacturing.Due to the special physical and mechanical properties of stupalith, the main method for grinding that adopts is processed it at present.In method for grinding, attrition process is occupied considerable proportion, and this link is to the working (machining) efficiency of stupalith component and processing quality important.During attrition process, abrasive disk or mill ball and the mutual friction of part to be processed phase, form friction pair, fills play grindings, lubricated, the cooling and abrasive that prevents dust etc. and to act between friction pair.
At present, abrasive is divided into oil base abrasive and water base abrasive two classes substantially.Oil base abrasive, by aviation spirit, kerosene, transformer oil and each vegetable oil, animal oil and hydro carbons, is equipped with some additives and forms.Water base abrasive is formulated by water and various soap agent.Oil base abrasive is mainly viscosity, lubricated and rustless property is better, while so cleaning, must be equipped with organic solvent, has the shortcomings such as environmental pollution and expense are higher.Water base abrasive easy to clean, environmental pollution is less, but a little less than water base abrasive lubricity, easily causes the not smooth of process of lapping, and vibration and noise are larger, and grinding effect is poor.
Summary of the invention
In view of this, be necessary to provide the water base abrasive of stupalith that a kind of grinding effect is excellent, be applicable to extreme pressure environment and environmental protection.
A kind of stupalith abrasive, it contains membrane-forming agent, secondary film formers, abrasive grains and water, described membrane-forming agent is selected from as one or both in lower polyol and hydramine, this lower polyol is the polyvalent alcohol that carbon atom number contains two and above hydroxyl between 2～5, in molecule, described secondary film formers is selected from as one or both in borate and lithium chromate, described abrasive grains is boride, and the mass ratio between this membrane-forming agent, secondary film formers, abrasive grains and water is 10-30:0.2-4:0.1-3:70-90.
The application's stupalith can dissolve each other with water with the lower polyol in abrasive or hydramine, in this lower polyol or alcohol amine molecule, contains a high proportion of hydroxyl, has stronger water-holding power, is conducive to form the lubricant film that includes water and described abrasive grains.In addition this hydramine pH value of adjustable described abrasive also.
Described borate or lithium chromate can be abrasive provide the extreme boundary lubrication performance that meets under high pressure (extreme pressure property: abrasive when carry load and be not extruded the performance of friction surface), other component actings in conjunction in this borate or lithium chromate and abrasive, grinding the good lubricant film of interface formation extreme pressure property, even thereby under extreme pressure environment, also can make that process of lapping is smooth and easy to carry out, thereby improve the surface quality of grinding work-piece.
Described boride has good removal ability, has guaranteed to remove faster speed, has improved mill efficiency.
Compared to existing water base abrasive, between the surface that the application's stupalith can contact with each other in abrasion friction pair with abrasive, form comparatively effectively lubricant film, the frictional force that makes grinding element and be polished between workpiece reduces, reduced and be polished the probability that larger cut appears in workpiece, grinding effect is good, process of lapping is smooth and easy, has realized higher mill efficiency.
In addition, borate or lithium chromate described in the application also have stronger antibacterial and antiseptic power, make described abrasive be difficult for going mouldy rotten, are easy to deposit.In addition, the application's abrasive is the harmful element such as sulfur-bearing, phosphorus, chlorine not, and the waste liquid after attrition process is little to environmental hazard.
Accompanying drawing explanation
Fig. 1 is the graphic representation that the frictional coefficient of the abrasive of embodiment 1 changes in time.
Fig. 2 is the graphic representation that the frictional coefficient of the abrasive of embodiment 2 changes in time.
Fig. 3 is the graphic representation that the frictional coefficient of the abrasive of embodiment 3 changes in time.
Fig. 4 is the graphic representation that the frictional coefficient of the abrasive of embodiment 4 changes in time.
Fig. 5 is the graphic representation that the frictional coefficient of the abrasive of embodiment 5 changes in time.
Fig. 6 is the graphic representation that the frictional coefficient of the abrasive of embodiment 6 changes in time.
Embodiment
Below by specific embodiment, the application's stupalith is described in detail with abrasive.It should be noted that, described embodiment is only used for illustrating composition, content of described abrasive and preparation method thereof, and limits never in any form the application's protection domain.
Stupalith described in the application contains membrane-forming agent, secondary film formers, abrasive grains and water with abrasive.Described membrane-forming agent is selected from as one or both in lower polyol and hydramine, and described secondary film formers is selected from as one or both in borate and lithium chromate, and described abrasive grains is boride.Mass ratio between this membrane-forming agent, secondary film formers, abrasive grains and water is 10-30:0.2-4:0.1-3:70-90.Preferably, the mass ratio between this membrane-forming agent, secondary film formers, abrasive grains and water is 15-26:0.5-3.5:0.3-3:74-86
Described lower polyol is the polyvalent alcohol that carbon atom number contains two and above hydroxyl between 2～5, in molecule.In the present embodiment, this lower polyol is selected from least one into ethylene glycol, propylene glycol and glycerol.Wherein said propylene glycol is selected from as at least one in 1,2-PD and 1,3-PD.This lower polyol can dissolve each other with water, contains a high proportion of hydroxyl in its molecule, has stronger water-holding power, is conducive to form the lubricant film that includes water and abrasive grains.
Described alcohol ammonia is selected from as any one or a few the mixture in diethanolamine, trolamine, diglycolamine.This hydramine can dissolve each other with water, contains a high proportion of hydroxyl in its molecule, has stronger water-holding power, is conducive to form the lubricant film that includes water and abrasive grains.In addition, this hydramine also has the effect of the pH value that regulates described abrasive.
Described borate is selected from as at least one in lithium tetraborate and potassium tetraborate.This lithium tetraborate, potassium tetraborate or lithium chromate can be boron, potassium element or the elemental lithium that described abrasive provides the extreme boundary lubrication demand meeting under high pressure, other component actings in conjunction in these elements and abrasive, grinding the good lubricant film of interface formation extreme pressure property, even thereby under extreme pressure environment, also can make that process of lapping is smooth and easy to carry out, thereby improve the surface quality of grinding work-piece.
Described boride is at least one in zirconium boride 99.5004323A8ure and titanium boride.Wherein the diameter of particle of this zirconium boride 99.5004323A8ure is 1-2 μ m, and the diameter of particle of titanium boride is 3-5 μ m.This boride has good removal ability, has guaranteed to remove faster speed, has improved mill efficiency.
Described water is preferably deionized water.
When described membrane-forming agent is selected from as lower polyol and hydramine, when secondary film formers is selected from as borate and lithium chromate, the mass ratio between described lower polyol, hydramine, borate, lithium chromate, boride and water is 5-20:5-10:0.1-2:0.1-2:0.1-3:70-90.
Between the surface that the application's stupalith can contact with each other in abrasion friction pair with abrasive, form comparatively effectively lubricant film, the frictional force that makes grinding element and be polished between workpiece reduces, reduced and be polished the probability that larger cut appears in workpiece, grinding effect is good, process of lapping is smooth and easy, has realized higher mill efficiency.
In addition, borate or lithium chromate described in the application also have stronger antibacterial and antiseptic power, make described abrasive be difficult for going mouldy rotten, are easy to deposit.In addition, the application's abrasive is the harmful element such as sulfur-bearing, phosphorus, chlorine not, and the waste liquid after attrition process is little to environmental hazard.
Stupalith described in the application can be made by following methods with abrasive:
According to described mass ratio, first weigh membrane-forming agent, be poured in container (not shown), then add deionized water, this container is placed on the magnetic stirring apparatus that power is about 350 watts, adds while stirring described secondary film formers, then add abrasive grains, until stir, obtain described abrasive.
Certainly, also can prepare by other means described abrasive.For example, can first membrane-forming agent, secondary film formers, abrasive grains be joined in deionized water according to proportioning, then stir.When large usage quantity, can utilize high-power mixer or ram pump to stir.
Below in conjunction with 1～6 pair of the application's abrasive of embodiment, be further described (ginseng table 1).The preparation method of the abrasive of this embodiment 1～6 is the same.This embodiment 1～6 is intended to illustrate composition and the content thereof of each abrasive." surplus " that in table 1, occur refers to the residual content that in abrasive, each component total content is 100%.
The composition of the abrasive of table 1 embodiment 1～6 and content thereof
Performance Detection
Utilize the cmp polishing machine (model: CP4) at room temperature the abrasive of embodiment 1～6 is ground to test successively of U.S. Brooker company.Adopt urethane grinding and polishing pad, test pressure is 80N, and the test duration is 30 minutes, and abrasive flow is 80mL/min, and the rotating speed of grinding and polishing pad is 120 turn/per minutes (rpm), and the rotating speed that is polished workpiece (as shown in table 2) is 100rpm.Test gained frictional coefficient curve is respectively as shown in Fig. 1～6, and the average friction coefficient of the abrasive obtaining according to the frictional coefficient curve of Fig. 1～6 is joined table 2.Table 2 is polished the surface roughness value of workpiece after also having provided and having ground.
The average friction coefficient of the abrasive of table 2 embodiment 1～6
By Fig. 1～6 and table 2, can be found out, the abrasive of the embodiment of the present application 1～6 is when being applied to grinding and polishing pad and be polished the friction pair of workpiece composition, and frictional coefficient curve is steady, and frictional coefficient is lower, after grinding, is polished workpiece surface quality better.
In sum; although the present invention be have been described in detail by specific embodiments of the invention; but persons skilled in the art should be understood that; above-described embodiment is only the description to the application's preferred embodiment; but not restriction to the application's protection domain; persons skilled in the art are in the disclosed technical scope of the application, and the variation that can expect easily, all within the application's protection domain.
Claims (10)
1. a stupalith abrasive, it is characterized in that: this stupalith contains membrane-forming agent with abrasive, secondary film formers, abrasive grains, and water, described membrane-forming agent is selected from as one or both in lower polyol and hydramine, this lower polyol is that carbon atom number is between 2～5, the polyvalent alcohol that contains two and above hydroxyl in molecule, described secondary film formers is selected from as one or both in borate and lithium chromate, described abrasive grains is boride, this membrane-forming agent, secondary film formers, mass ratio between abrasive grains and water is 10-30:0.2-4:0.1-3:70-90.
2. stupalith abrasive as claimed in claim 1, is characterized in that: the mass ratio between described membrane-forming agent, secondary film formers, abrasive grains and water is 15-26:0.5-3.5:0.3-3:74-86.
3. stupalith abrasive as claimed in claim 1, is characterized in that: described lower polyol is selected from as at least one in ethylene glycol, propylene glycol and glycerol.
4. stupalith abrasive as claimed in claim 3, is characterized in that: wherein said propylene glycol is selected from as at least one in 1,2-PD and 1,3-PD.
5. stupalith abrasive as claimed in claim 1, is characterized in that: described alcohol ammonia is selected from as any one or a few in diethanolamine, trolamine, diglycolamine.
6. stupalith abrasive as claimed in claim 1, is characterized in that: described borate is selected from as at least one in lithium tetraborate and potassium tetraborate.
7. stupalith abrasive as claimed in claim 1, is characterized in that: described boride is at least one in zirconium boride 99.5004323A8ure and titanium boride, and wherein the diameter of particle of zirconium boride 99.5004323A8ure is 1-2 μ m, and the diameter of particle of titanium boride is 3-5 μ m.
8. stupalith abrasive as claimed in claim 1, it is characterized in that: described membrane-forming agent is selected from as lower polyol and hydramine, secondary film formers is selected from as borate and lithium chromate, and the mass ratio between described lower polyol, hydramine, borate, lithium chromate, boride and water is 5-20:5-10:0.1-2:0.1-2:0.1-3:70-90.
9. the stupalith abrasive as described in any one in claim 1,2 or 8, is characterized in that: described water is deionized water.
10. stupalith abrasive as claimed in claim 1, is characterized in that: the frictional coefficient of described abrasive is 0.14-0.3.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201310174963.9A CN104152107B (en) | 2013-05-13 | 2013-05-13 | Ceramic material grinding agent |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201310174963.9A CN104152107B (en) | 2013-05-13 | 2013-05-13 | Ceramic material grinding agent |
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| Publication Number | Publication Date |
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| CN104152107A true CN104152107A (en) | 2014-11-19 |
| CN104152107B CN104152107B (en) | 2016-08-17 |
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| Application Number | Title | Priority Date | Filing Date |
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| CN201310174963.9A Expired - Fee Related CN104152107B (en) | 2013-05-13 | 2013-05-13 | Ceramic material grinding agent |
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| CN (1) | CN104152107B (en) |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN107286908A (en) * | 2017-06-22 | 2017-10-24 | 合肥汇之新机械科技有限公司 | A kind of high temperature resistant grinding agent of industrial robot and preparation method thereof |
| CN115627153A (en) * | 2022-10-19 | 2023-01-20 | 中国兵器科学研究院宁波分院 | Water-based grinding fluid for boron carbide ceramic balls and preparation method thereof |
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| CN1063713A (en) * | 1991-07-26 | 1992-08-19 | 第一汽车制造厂工艺研究所 | Long lifetime centrallubrication synthesis type cutting fluid |
| JP2001200298A (en) * | 2000-01-19 | 2001-07-24 | Nitivy Co Ltd | Sponge for cleaning containing abrasive material |
| US20020095871A1 (en) * | 2000-10-16 | 2002-07-25 | Mcardle James L. | Method of making ceramic aggregate particles |
| CN1371528A (en) * | 1999-08-17 | 2002-09-25 | 日立化成工业株式会社 | Polishing compound for chemimachanical polishing and method for polishing substrate |
| US7683098B2 (en) * | 1996-09-03 | 2010-03-23 | Ppg Industries Ohio, Inc. | Manufacturing methods for nanomaterial dispersions and products thereof |
| CN102102008A (en) * | 2009-12-18 | 2011-06-22 | 安集微电子（上海）有限公司 | Water-based glass grinding fluid and using method thereof |
| WO2011152356A1 (en) * | 2010-06-03 | 2011-12-08 | 旭硝子株式会社 | Polishing agent and polishing method |
| CN103045165A (en) * | 2012-11-28 | 2013-04-17 | 大连大友高技术陶瓷有限公司 | Ceramic grinding agent |
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2013
- 2013-05-13 CN CN201310174963.9A patent/CN104152107B/en not_active Expired - Fee Related
Patent Citations (8)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN1063713A (en) * | 1991-07-26 | 1992-08-19 | 第一汽车制造厂工艺研究所 | Long lifetime centrallubrication synthesis type cutting fluid |
| US7683098B2 (en) * | 1996-09-03 | 2010-03-23 | Ppg Industries Ohio, Inc. | Manufacturing methods for nanomaterial dispersions and products thereof |
| CN1371528A (en) * | 1999-08-17 | 2002-09-25 | 日立化成工业株式会社 | Polishing compound for chemimachanical polishing and method for polishing substrate |
| JP2001200298A (en) * | 2000-01-19 | 2001-07-24 | Nitivy Co Ltd | Sponge for cleaning containing abrasive material |
| US20020095871A1 (en) * | 2000-10-16 | 2002-07-25 | Mcardle James L. | Method of making ceramic aggregate particles |
| CN102102008A (en) * | 2009-12-18 | 2011-06-22 | 安集微电子（上海）有限公司 | Water-based glass grinding fluid and using method thereof |
| WO2011152356A1 (en) * | 2010-06-03 | 2011-12-08 | 旭硝子株式会社 | Polishing agent and polishing method |
| CN103045165A (en) * | 2012-11-28 | 2013-04-17 | 大连大友高技术陶瓷有限公司 | Ceramic grinding agent |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN107286908A (en) * | 2017-06-22 | 2017-10-24 | 合肥汇之新机械科技有限公司 | A kind of high temperature resistant grinding agent of industrial robot and preparation method thereof |
| CN115627153A (en) * | 2022-10-19 | 2023-01-20 | 中国兵器科学研究院宁波分院 | Water-based grinding fluid for boron carbide ceramic balls and preparation method thereof |
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| Publication number | Publication date |
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| CN104152107B (en) | 2016-08-17 |
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Granted publication date: 20160817 Termination date: 20190513 |