CN103983609A - Transparent material refractive index and thickness measuring device and measuring method based on spectrum interference - Google Patents
Transparent material refractive index and thickness measuring device and measuring method based on spectrum interference Download PDFInfo
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- CN103983609A CN103983609A CN201410197325.3A CN201410197325A CN103983609A CN 103983609 A CN103983609 A CN 103983609A CN 201410197325 A CN201410197325 A CN 201410197325A CN 103983609 A CN103983609 A CN 103983609A
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- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
- G01N21/17—Systems in which incident light is modified in accordance with the properties of the material investigated
- G01N21/41—Refractivity; Phase-affecting properties, e.g. optical path length
- G01N21/45—Refractivity; Phase-affecting properties, e.g. optical path length using interferometric methods; using Schlieren methods
Abstract
The invention belongs to the technical field of optical material measurement, and specifically discloses a transparent material index and thickness measuring device and measuring method based on spectrum interference. The measuring device comprises a low coherence degree light source, a beam splitter, an F-P cavity composed of two flat glass sheets, a two-dimensional sample platform, a sample to be measured, a focusing lens, a coupling optical fiber, a spectrum meter, and a computer. The measuring method comprises the following steps: adjusting the F-P cavity so as to make the incident lights vertically enter the device, inserting a sample to be measured into the cavity, making the light beams vertically radiate the surface of the sample, measuring the spectrum data before the sample is inserted into the cavity and the spectrum data after the sample is inserted into the cavity, and finally calculating out the geometrical thickness (d) and group velocity refractive index (ng) of the sample. The measuring device is simple in structure. The measuring method has the advantages of convenient operation and high measurement precision. It is easy to make the system into a compact and portable device.
Description
Technical field
The invention belongs to optical material field of measuring technique, be specifically related to a kind of optically transparent material refractive index and measurer for thickness and measuring method.
Background technology
The geometric thickness of optical material, refractive index is the important parameter of material application, the measurement of these parameters has been proposed to many methods, but existing method all comes with some shortcomings.As some method based on time domain scanning, need mobile example or condenser lens, this can make measuring speed slow, and increase system simultaneously regulates difficulty.In the measuring method of some frequency domain OCT, due to the existence of reference arm, make measuring system relative volume larger.
Summary of the invention
The object of the present invention is to provide a kind of simple in structure, optically transparent material refractive index and method for measuring thickness and device that measurement performance is good.Measuring system can realize miniaturization and portable.
Measuring method and the device of optical material thickness provided by the invention and refractive index, be based on frequency domain spectral measurement, need not mechanical scanning mechanism.
Optically transparent material refractive index provided by the invention and measurer for thickness, comprise a low degree of coherence light source 1, beam splitter (unpolarized spectroscope) 2, two blocks of sheet glass 3 and 4 in formation F-P chamber, two dimension sample stage 5, testing sample 6, condenser lens 7, coupled fiber 8, spectrometer 9, computing machine 10; Wherein, two blocks of sheet glass 3 in low degree of coherence light source 1, unpolarized spectroscope 2, F-P chamber and 4, two-dimentional sample stage 5, condenser lens 7 is separately fixed on work top, relatively independent; Coupled fiber 8 is directly connected with spectrometer 9, and spectrometer 9 is connected to carry out data transmission with computing machine 10 by data bus.
This measurement mechanism can be measured geometric thickness d and the group velocity refractive index n of transparent optical material simultaneously
g.
In the present invention, described low degree of coherence light source 1 can adopt white light LEDs, or adopts visible and near infrared broad band laser diode (LD).
In the present invention, two blocks of sheet glass, 3 and 4 inside surfaces in F-P chamber, without plated film, maybe can plate the anti-film of increasing lower than 50%.
In the present invention, described collector lens 7 can adopt achromat.
In the present invention, described coupled fiber 8 can adopt single-mode fiber.
In the present invention, described spectrometer 9 can adopt Visible-to-Near InfaRed band spectrum measuring instrument.
The measurement optical material thickness that the present invention proposes and the method for refractive index, for based on frequency domain spectroscopic methodology.
Frequency domain spectral technique is a kind of spectral interation technique of low degree of coherence light wave bag, by the interference spectrum of measuring is carried out to Fourier conversion, can obtain participating in the relative optical path difference of the two ripple bags of interfering, and wherein comprises thickness and refractive index information.
When measurement, first optical material to be measured is made parallel tabular, as testing sample; Before testing sample is put into measurement mechanism sample stage, make measurement mechanism initialization, make incident light and F-P chamber face vertical incidence; Measure reflectance spectrum, it is carried out to Fourier conversion, obtain the light path OPD of cavity
c; Then testing sample is put into sample stage, and make the vertical sample surfaces of incident light. measuring system reflectance spectrum; Systematic reflection spectrum is carried out to Fourier conversion, obtain three peaks, corresponding to sample front and rear surfaces in F-P chamber, and the light path of two air layers:
oPD s , OPD a1 , OPD a2 ; According to this tittle, can obtain the group index n of sample
gand thickness d:
。
Measurement mechanism of the present invention is simple in structure, without the reference arm of conventional Michelson interferometer, only utilizes monochromatic light road, and therefore more miniaturization of system, can realize portable. and in addition, measuring process is easy and simple to handle, and measuring accuracy is high.
Brief description of the drawings
Fig. 1 is measurement mechanism diagram of the present invention.
The interference spectrum in F-P chamber and Fourier Transformation Graphs thereof when Fig. 2 is n.s..
Fig. 3 is interference spectrum and the Fourier Transformation Graphs thereof adding after sample.
Number in the figure: 1 is low degree of coherence light source, and 2 is beam splitter, 3 and 4 for forming two blocks of sheet glass in F-P chamber, and 5 is two-dimentional sample stage, and 6 is testing sample, and 7 is condenser lens, and 8 is coupled fiber, and 9 is spectrometer, and 10 is computing machine 10.
Embodiment
Taking the ITO electro-conductive glass commonly used as example, measure its refractive index and thickness below.
Light source is semiconductor GaAs laser instrument, works under subthreshold value, at visible ray 648-668nm wave band.
F-P chamber is regulated and is formed by the glass substrate of two eyeglasses.Substrate surface is plated film not.
Ito glass to be measured is put into before system sample stage, and system initialization makes incident light and F-P chamber face vertical incidence; Measure reflectance spectrum, it is carried out to Fourier conversion, as shown in Figure 2.The light path that in figure, the peak of ' C ' label is cavity; Then put into ito glass sample, and make the vertical sample surfaces of incident light; Measuring system reflectance spectrum; Systematic reflection spectrum is carried out to Fourier conversion, as shown in Figure 3, obtain three peaks " S ", " a1 " and " a2 ", corresponding to sample front and rear surfaces in F-P chamber, and the light path of two air layers: OPD
s, OPD
a1, OPD
a2.According to this tittle, can obtain the group index n of sample
gand thickness d.Through the mean value of repeatedly measuring be:
OPD
C=1017.6±0.3?μm?,?OPD
S=1088.6±0.8?μm?,?OPD
a1=121.4±0.3?μm?,?OPD
a2=188.2±0.2?μm
Can obtain: thickness of sample:
Group index:
Above-mentioned thickness miking, result is: 713 ± 3 both relative errors of μ m. are: 0.007.Therefore, the method is feasible.
Advantage of the present invention:
1, measuring speed is fast: the present invention is based on frequency domain measurement system, and no-raster parts, thereby measuring speed is fast.
2, system is simple, adopts monochromatic light line structure, and system element is few, and without reference arm, system is easy to miniaturization, portability and all solid stateization, is connected with spectrometer by interface.
3. easily carry out wave band expansion.Light source of the present invention can adopt LED or the semiconductor laser of different-waveband, thereby can carry out the parameter measurement of different-waveband.
Claims (7)
1. refractive index of transparent materials and the measurer for thickness based on spectral interference, it is characterized in that: comprise a low degree of coherence light source (1), beam splitter (2), two blocks of sheet glass (3,4) in the F-P chamber forming, two-dimentional sample stage (5), testing sample (6), condenser lens (7), coupled fiber (8), spectrometer (9), computing machine (10); Wherein, two blocks of sheet glass (3) in low degree of coherence light source (1), beam splitter (2), F-P chamber and (4), two-dimentional sample stage (5), condenser lens (7) is separately fixed on work top, relatively independent; Coupled fiber (8) is directly connected with spectrometer (9), and spectrometer (9) is connected to carry out data transmission with computing machine (10) by data bus.
2. refractive index of transparent materials and the measurer for thickness based on spectral interference according to claim 1, is characterized in that: described low degree of coherence light source (1) is white light LEDs, or is visible and near infrared broad band laser diode.
3. refractive index of transparent materials and the measurer for thickness based on spectral interference according to claim 1, is characterized in that: two blocks of sheet glass (3,4) inside surface in described F-P chamber is without plated film, or plating is lower than 50% the anti-film of increasing.
4. refractive index of transparent materials and the measurer for thickness based on spectral interference according to claim 1, is characterized in that: described collector lens (7) is achromat.
5. refractive index of transparent materials and the measurer for thickness based on spectral interference according to claim 1, is characterized in that: described coupled fiber (8) is single-mode fiber.
6. refractive index of transparent materials and the measurer for thickness based on spectral interference according to claim 1, is characterized in that: described optical spectrum instrumentation (9) is Visible-to-Near InfaRed band spectrum measuring instrument.
7. the refractive index of transparent materials based on measurement mechanism described in claim 1 and method for measuring thickness, is characterized in that concrete steps are:
(1) optical material to be measured is made parallel tabular, as testing sample;
(2) measurement mechanism initialization, makes incident light and F-P chamber face vertical incidence; Measure reflectance spectrum, it is carried out to Fourier conversion, obtain the light path OPD of cavity
c;
(3) then testing sample is put into sample stage, and make the vertical sample surfaces of incident light, measuring system reflectance spectrum; Systematic reflection spectrum is carried out to Fourier conversion, obtain three peaks, corresponding to sample front and rear surfaces in F-P chamber, and the light path of two air layers:
oPD s , OPD a1 , OPD a2 ;
(4) calculate the group index n of sample
gand thickness d:
。
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|---|---|---|---|
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Cited By (6)
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| CN105157585A (en) * | 2015-09-22 | 2015-12-16 | 中国科学院上海技术物理研究所 | Standard interference piece fitting method capable of acquiring film thickness and refractivity simultaneously |
| CN106908002A (en) * | 2017-04-19 | 2017-06-30 | 张家港市欧微自动化研发有限公司 | A kind of measuring method based on spectral interference device |
| CN106918576A (en) * | 2017-04-26 | 2017-07-04 | 广东工业大学 | A kind of non-contact type thin film temperature refraction rate measurement apparatus and method |
| CN107548448A (en) * | 2015-07-31 | 2018-01-05 | 惠普深蓝有限责任公司 | The calculating of thickness degree |
| CN108413872A (en) * | 2018-04-10 | 2018-08-17 | 天津科技大学 | Three-dimensional dimension precision measurement method based on Fabry-Perot multiple-beam interference |
| CN113175887A (en) * | 2021-05-17 | 2021-07-27 | 苏州中科行智智能科技有限公司 | Device and method for measuring thickness and refractive index of thin film |
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| CN107548448A (en) * | 2015-07-31 | 2018-01-05 | 惠普深蓝有限责任公司 | The calculating of thickness degree |
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| CN106908002A (en) * | 2017-04-19 | 2017-06-30 | 张家港市欧微自动化研发有限公司 | A kind of measuring method based on spectral interference device |
| CN106908002B (en) * | 2017-04-19 | 2019-10-01 | 泰州阿法光电科技有限公司 | A kind of measurement method based on spectral interference device |
| CN106918576A (en) * | 2017-04-26 | 2017-07-04 | 广东工业大学 | A kind of non-contact type thin film temperature refraction rate measurement apparatus and method |
| CN108413872A (en) * | 2018-04-10 | 2018-08-17 | 天津科技大学 | Three-dimensional dimension precision measurement method based on Fabry-Perot multiple-beam interference |
| CN108413872B (en) * | 2018-04-10 | 2020-03-10 | 天津科技大学 | Three-dimensional size precision measurement method based on Fabry-Perot multi-beam interference |
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