CN103969958B - A kind of many exposure field splicing system and method - Google Patents
A kind of many exposure field splicing system and method Download PDFInfo
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- CN103969958B CN103969958B CN201310029993.0A CN201310029993A CN103969958B CN 103969958 B CN103969958 B CN 103969958B CN 201310029993 A CN201310029993 A CN 201310029993A CN 103969958 B CN103969958 B CN 103969958B
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Abstract
The invention provides a kind of many exposure field splicing system and method, comprising: mask, described mask is provided with the image varied in size; Multiple lighting unit, the image on mask described in described multiple illumination unit is to form multiple image-generating unit, and each image-generating unit comprises an exposure field; Substrate, is spliced to form splicing view field by multiple exposure field on substrate; Wherein, described exposure field comprises: exposure field PA, corresponding exposure field width PA, exposure field PB, corresponding exposure field width PB, exposure field PC, corresponding exposure field width PC, wherein, and PA & gt; PB & gt; PC, width PA=width PB=width PC.The joining method of exposure field has more dirigibility, according to the different demands of different product to the size of splicing view field, can select different joining methods, provide the splicing market of more splicing sizes.
Description
Technical field
The present invention relates to semiconductor applications, particularly one many exposure field splicing system and method.
Background technology
In semiconductor fabrication, litho machine will strengthen the exposure size of liquid crystal panel, can, by increasing single optical system visual field, multiple small-sized partial projection optical system also can be used to replace the method for single large-scale projection optical system.
In the prior art, use multiple small-sized partial projection optical system constantly can increase the quantity of splicing view field to realize the demand of advanced lines large size panel to replace the method for single large-scale projection optical system, subregional compensation can be carried out to improve picture element to the distortion of mask, substrate again simultaneously, therefore there is obvious advantage, be also widely used.
The patent No. is JPA2001337463, discloses a kind of exposure system during name is called " manufacture method of plate exposure apparatus, plate exposure apparatus ", have employed multiple identical exposure subsystem and splices, and the exposure field size that each exposure subsystem is formed is all identical.
The patent No. is US5579147, name is called in " Scanninglightexposureapparatus " and discloses a kind of exposure system, have employed multiple identical exposure subsystem equally to splice, and the exposure field size that each exposure subsystem is formed is all identical.
In the prior art, the exposure field size that each exposure subsystem is formed is all identical, and joining method is single, cannot combine according to user demand.
Summary of the invention
The invention provides a kind of many exposure field splicing system and method, solve under the constant prerequisite of splicing quantity, formed objects exposure field joining method is single, cannot carry out the problem that combines according to user demand.
The technical scheme that the present invention adopts for its technical matters of solution is:
A kind of many exposure field splicing system, comprising:
Mask, described mask is provided with the image varied in size;
Multiple lighting unit, the image on mask described in described multiple illumination unit is to form multiple image-generating unit, and each image-generating unit comprises an exposure field;
Substrate, is spliced to form splicing view field by multiple exposure field on substrate; Wherein,
Described exposure field comprises: exposure field pa, corresponding exposure field width PA, exposure field pb, corresponding exposure field width PB, exposure field pc, corresponding exposure field width PC, wherein, visual field magnitude relationship is pa>pb>pc; It is width PA=width PB=width PC that visual field width closes.
Optionally, described exposure field is trapezoidal exposure field.
Optionally, in described many exposure field joining method, the quantity of described exposure field is N number of, and N is natural number, N be more than or equal to 5 and N be not 4 multiple.
Optionally, in described many exposure field joining method, described PA, PB and PC meet PB=(PA+PC)/2.
Optionally, in described many exposure field joining method, when the quantity N of described exposure field is odd number, described exposure field is spliced to form three kinds of different splicing view fields by following formula:
(N-1)/4*PA+(N+1)/2*PB+(N-1)/4*PC；
(N-1)/4*PA+(N-1)/2*PB+((N-1)/4+1)*PC；
((N-1)/4+1)*PA+(N-1)/2*PB+(N-1)/4*PC。
Optionally, in described many exposure field joining method, when the quantity N of described exposure field is even number, described exposure field is spliced to form two kinds of different splicing view fields by following formula:
(N/4+1/2)*PA+N/2*PB+(N/4-1/2)*PC；
(N/4-1/2)*PA+N/2*PB+(N/4+1/2)*PC。
Meanwhile, the present invention also provides a kind of many exposure field joining method adopting described exposure field splicing system, comprising:
Mask arranges the image varied in size;
Form multiple image-generating unit by the image on mask described in multiple illumination unit, each image-generating unit comprises an exposure field;
Described multiple exposure field is spliced to form splicing view field on substrate; Wherein,
Described exposure field comprises: exposure field pa, corresponding exposure field width PA, exposure field pb, corresponding exposure field width PB, exposure field pc, corresponding exposure field width PC, wherein, visual field magnitude relationship is PA>PB>PC, and it is width PA=width PB=width PC that visual field width closes.
Optionally, described exposure field is trapezoidal exposure field.
Optionally, at described many exposure field joining method, the quantity of described exposure field is N number of, and N is natural number, N be more than or equal to 5 and N be not 4 multiple.
Optionally, at described many exposure field joining method, described PA, PB and PC meet PB=(PA+PC)/2.
Optionally, at described many exposure field joining method, when the quantity N of described exposure field is odd number, described exposure field is spliced to form three kinds of different splicing view fields by following formula:
(N-1)/4*PA+(N+1)/2*PB+(N-1)/4*PC；
(N-1)/4*PA+(N-1)/2*PB+((N-1)/4+1)*PC；
((N-1)/4+1)*PA+(N-1)/2*PB+(N-1)/4*PC。
Optionally, at described many exposure field joining method, when the quantity N of described exposure field is even number, described exposure field is spliced to form two kinds of different splicing view fields by following formula:
(N/4+1/2)*PA+N/2*PB+(N/4-1/2)*PC；
(N/4-1/2)*PA+N/2*PB+(N/4+1/2)*PC。
Implement one many exposure field splicing system of the present invention and method, there is following beneficial effect: the joining method of exposure field has more dirigibility, can according to the different demands of different product to the size of splicing view field, select different joining methods, provide the splicing market of more splicing sizes.
Accompanying drawing explanation
Below in conjunction with drawings and Examples, the invention will be further described, in accompanying drawing:
Fig. 1 is the structural representation of many exposure field splicing system of the embodiment of the present invention;
Fig. 2 is the image-generating unit of the embodiment of the present invention and the structural representation of exposure field;
Fig. 3 is the structural representation of many exposure field joining method of the embodiment of the present invention 1;
Fig. 4 is the structural representation of many exposure field joining method of the embodiment of the present invention 2;
Fig. 5 is the structural representation of many exposure field joining method of the embodiment of the present invention 3;
Fig. 6 is the structural representation of many exposure field joining method of the embodiment of the present invention 4;
Fig. 7 is the structural representation of many exposure field joining method of the embodiment of the present invention 5.
Embodiment
The one many exposure field splicing system proposed the present invention below in conjunction with the drawings and specific embodiments and method are described in further detail.According to the following describes and claims, advantages and features of the invention will be clearer.It should be noted that, accompanying drawing all adopts the form that simplifies very much and all uses non-ratio accurately, only in order to object that is convenient, the aid illustration embodiment of the present invention lucidly.
As depicted in figs. 1 and 2, a kind of many exposure field splicing system, comprising:
Mask 1, described mask 1 is provided with the image varied in size;
Multiple lighting unit 2, described multiple lighting unit 2 irradiates image on described mask 1 to form multiple image-generating unit 3, and each image-generating unit 3 comprises an exposure field 5;
Substrate 4, is spliced to form splicing view field by multiple exposure field 5 on substrate; Wherein,
Described exposure field 5 comprises: exposure field pa, corresponding exposure field width PA, exposure field pb, corresponding exposure field width PB, exposure field pc, corresponding exposure field width PC, wherein, visual field magnitude relationship is pa>pb>pc; It is width PA=width PB=width PC that visual field width closes.Described exposure field width be exposure field in the plane of scanning motion, along perpendicular to the width that etching system direction of scanning is formed, developed width or the mean breadth of exposure field can be got.
Further, described exposure field 5 is trapezoidal exposure field, and described exposure field width is the mean breadth of trapezoidal exposure field.
Further, the quantity of described exposure field 5 is N number of, and N is natural number, N be more than or equal to 5 and N be not 4 multiple, do not meet this condition, even if each visual field varies in size, the combination of multiple visual field can not be formed.
Further, for meeting field stitching condition, described PA, PB and PC, PB=(PA+PC)/2.
Meanwhile, the present invention also provides a kind of many exposure field joining method, comprising:
Mask arranges the image varied in size;
Form multiple image-generating unit by the image on mask described in multiple illumination unit, each image-generating unit comprises an exposure field;
Described multiple exposure field is spliced to form splicing view field on substrate; Wherein,
Described exposure field comprises: exposure field pa, corresponding exposure field width PA, exposure field pb, corresponding exposure field width PB, exposure field pc, corresponding exposure field width PC, wherein, visual field magnitude relationship is pa>pb>pc; It is width PA=width PB=width PC that visual field width closes.
Further, the quantity of described exposure field is N number of, and N is natural number, N be more than or equal to 5 and N be not 4 multiple.
Further, described PA, PB and PC meet PB=(PA+PC)/2.
[embodiment 1]
As shown in Figure 3, a kind of many exposure field joining method, forms the exposure field of pa, pb and pc tri-kinds of different sizes, wherein, described width PA=width PB=width PC, PA=100mm, PB=130mm, PC=160mm.
As the quantity N=5 of exposure field,
By 1 PA, 2 PB, 2 PC splice, the size of splicing view field: 1*PA+2*PB+2*PC=1*160+2*130+2*100=620mm.
[embodiment 2]
As shown in Figure 4, a kind of many exposure field joining method, forms the exposure field of pa, pb and pc tri-kinds of different sizes, wherein, and described width PA=width PB=width PC, PA=100mm, PB=130mm, PC=160mm.
As the quantity N=5 of exposure field,
By 1 PA, 3 PB, 1 PC splices, the size of splicing view field: 1*PA+3*PB+1*PC=1*160+3*130+1*100=650mm.
[embodiment 3]
As shown in Figure 5, a kind of many exposure field joining method, forms the exposure field of pa, pb and pc tri-kinds of different sizes, wherein, and described width PA=width PB=width PC, PA=100mm, PB=130mm, PC=160mm.
As the quantity N=5 of exposure field,
By 2 PA, 2 PB, 1 PC splices, the size of splicing view field: 2*PA+2*PB+1*PC=2*160+2*130+1*100=680mm.
Can be drawn by [embodiment 1], [embodiment 2] and [embodiment 3], when the quantity N of described exposure field is odd number, described exposure field is spliced to form three kinds of different splicing view fields by following formula:
(N-1)/4*PA+(N+1)/2*PB+(N-1)/4*PC；
(N-1)/4*PA+(N-1)/2*PB+((N-1)/4+1)*PC；
((N-1)/4+1)*PA+(N-1)/2*PB+(N-1)/4*PC。
[embodiment 4]
As shown in Figure 6, a kind of many exposure field joining method, forms the exposure field of pa, pb and pc tri-kinds of different sizes, wherein, and width PA=width PB=width PC, PA=100mm, PB=130mm, PC=160mm.
As the quantity N=6 of exposure field,
By 1 PA, 3 PB, 2 PC splice, the size of splicing view field: 1*PA+3*PB+2*PC=1*160+3*130+2*100=810mm.
[embodiment 5]
As shown in Figure 7, a kind of many exposure field joining method, forms the exposure field of pa, pb and pc tri-kinds of different sizes, wherein, and width PA=width PB=width PC, PA=100mm, PB=130mm, PC=160mm.
As the quantity N=6 of exposure field,
By 2 PA, 3 PB, 1 PC splices, and the size of splicing view field is: 2*PA+3*PB+1*PC=2*160+3*130+1*100=750mm.
Can draw when the quantity N of described exposure field is even number and N is not the multiple of 4 by [embodiment 4] and [embodiment 5], described exposure field is spliced to form two kinds of different splicing view fields by following formula:
(N/4+1/2)*PA+N/2*PB+(N/4-1/2)*PC；
(N/4-1/2)*PA+N/2*PB+(N/4+1/2)*PC。
By said structure, use the exposure field of different size to splice, can realize multiple different size splicing view field, the present invention's 5,6 exposure field of only illustrating are spliced, but the scope of application of the present invention is not limited to particular exposure visual field number.
Foregoing description is only the description to present pre-ferred embodiments, any restriction not to the scope of the invention, and any change that the those of ordinary skill in field of the present invention does according to above-mentioned disclosure, modification, all belong to the protection domain of claims.
Claims (12)
1. the splicing system of exposure field more than, is characterized in that, comprising:
Mask, described mask is provided with the image varied in size;
Multiple lighting unit, the image on mask described in described multiple illumination unit is to form multiple image-generating unit, and each image-generating unit comprises an exposure field;
Substrate, is spliced to form splicing view field by multiple exposure field on substrate; Wherein,
Described exposure field comprises: exposure field pa, corresponding exposure field width PA, exposure field pb, corresponding exposure field width PB, exposure field pc, corresponding exposure field width PC, wherein, visual field magnitude relationship is pa>pb>pb; It is width PA=width PB=width PC that visual field width closes.
2. many exposure field splicing system according to claim 1, is characterized in that, described exposure field is trapezoidal exposure field.
3. many exposure field splicing system according to claim 1, is characterized in that, the quantity of described exposure field is N number of, and N is natural number, N be more than or equal to 5 and N be not 4 multiple.
4. many exposure field splicing system according to claim 3, is characterized in that, described PA, PB and PC meet PB=(PA+PC)/2.
5. many exposure field splicing system according to claim 4, is characterized in that, when the quantity N of described exposure field is odd number, described exposure field is spliced to form three kinds of different splicing view fields by following formula:
(N-1)/4*PA+(N+1)/2*PB+(N-1)/4*PC；
(N-1)/4*PA+(N-1)/2*PB+((N-1)/4+1)*PC；
((N-1)/4+1)*PA+(N-1)/2*PB+(N-1)/4*PC。
6. many exposure field splicing system according to claim 4, is characterized in that, when the quantity N of described exposure field is even number, described exposure field is spliced to form two kinds of different splicing view fields by following formula:
(N/4+1/2)*PA+N/2*PB+(N/4-1/2)*PC；
(N/4-1/2)*PA+N/2*PB+(N/4+1/2)*PC。
7. adopt many exposure field joining method of many exposure field splicing system as claimed in claim 1, it is characterized in that, comprising:
Mask arranges the image varied in size;
Form multiple image-generating unit by the image on mask described in multiple illumination unit, each image-generating unit comprises an exposure field;
Described multiple exposure field is spliced to form splicing view field on substrate; Wherein,
Described exposure field comprises: exposure field pa, corresponding exposure field width PA, exposure field pb, corresponding exposure field width PB, exposure field pc, corresponding exposure field width PC, wherein, visual field magnitude relationship is pa>pb>pc, and it is width PA=width PB=width PC that visual field width closes.
8. many exposure field joining method according to claim 7, is characterized in that, described exposure field is trapezoidal exposure field.
9. many exposure field joining method according to claim 7, is characterized in that, the quantity of described exposure field is N number of, and N is natural number, N be more than or equal to 5 and N be not 4 multiple.
10. many exposure field joining method according to claim 9, is characterized in that, described PA, PB and PC meet PB=(PA+PC)/2.
11. many exposure field joining methods according to claim 10, is characterized in that, when the quantity N of described exposure field is odd number, described exposure field are spliced to form three kinds of different splicing view fields by following formula:
(N-1)/4*PA+(N+1)/2*PB+(N-1)/4*PC；
(N-1)/4*PA+(N-1)/2*PB+((N-1)/4+1)*PC；
((N-1)/4+1)*PA+(N-1)/2*PB+(N-1)/4*PC。
12. many exposure field joining methods according to claim 10, is characterized in that, when the quantity N of described exposure field is even number, described exposure field are spliced to form two kinds of different splicing view fields by following formula:
(N/4+1/2)*PA+N/2*PB+(N/4-1/2)*PC；
(N/4-1/2)*PA+N/2*PB+(N/4+1/2)*PC。
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| CN106227002B (en) * | 2016-09-21 | 2018-01-23 | 中山新诺科技股份有限公司 | A kind of method for the efficiency for improving adjustment splicing and multiplying power size |
| CN113835308A (en) * | 2021-09-23 | 2021-12-24 | 上海度宁科技有限公司 | Splicing exposure method, device and system |
Citations (11)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US5579147A (en) * | 1993-12-08 | 1996-11-26 | Nikon Corporation | Scanning light exposure apparatus |
| US5912726A (en) * | 1994-10-28 | 1999-06-15 | Nikon Corporation | Projection exposure apparatus and method having a positional deviation detection system that employs light from an exposure illumination system |
| JP3316760B2 (en) * | 2001-05-17 | 2002-08-19 | 株式会社ニコン | Scanning exposure method |
| TW520526B (en) * | 2000-05-22 | 2003-02-11 | Nikon Corp | Exposure apparatus, method for manufacturing thereof, method for exposing and method for manufacturing micro-device |
| WO2008065977A1 (en) * | 2006-11-27 | 2008-06-05 | Nikon Corporation | Exposure method, pattern forming method, exposure device, and device manufacturing method |
| CN101294804A (en) * | 2008-06-20 | 2008-10-29 | 北京大学 | Digital airborne photography system |
| CN100524024C (en) * | 2002-05-22 | 2009-08-05 | 尼康株式会社 | Exposure method, exposure apparatus and element mfg. method |
| CN101611352A (en) * | 2007-01-04 | 2009-12-23 | 株式会社尼康 | Projecting optical device, exposure method and device manufacturing method |
| CN101644884A (en) * | 2009-07-13 | 2010-02-10 | 浙江大学 | Splicing view field stereoscopic three-dimensional display device and method thereof |
| CN101918897A (en) * | 2007-12-20 | 2010-12-15 | 株式会社尼康 | Exposure method, exposure apparatus, and method for producing device |
| CN102821238A (en) * | 2012-03-19 | 2012-12-12 | 北京泰邦天地科技有限公司 | Wide-field ultra-high-resolution imaging system |
Family Cites Families (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US5729331A (en) * | 1993-06-30 | 1998-03-17 | Nikon Corporation | Exposure apparatus, optical projection apparatus and a method for adjusting the optical projection apparatus |
-
2013
- 2013-01-25 CN CN201310029993.0A patent/CN103969958B/en active Active
Patent Citations (11)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US5579147A (en) * | 1993-12-08 | 1996-11-26 | Nikon Corporation | Scanning light exposure apparatus |
| US5912726A (en) * | 1994-10-28 | 1999-06-15 | Nikon Corporation | Projection exposure apparatus and method having a positional deviation detection system that employs light from an exposure illumination system |
| TW520526B (en) * | 2000-05-22 | 2003-02-11 | Nikon Corp | Exposure apparatus, method for manufacturing thereof, method for exposing and method for manufacturing micro-device |
| JP3316760B2 (en) * | 2001-05-17 | 2002-08-19 | 株式会社ニコン | Scanning exposure method |
| CN100524024C (en) * | 2002-05-22 | 2009-08-05 | 尼康株式会社 | Exposure method, exposure apparatus and element mfg. method |
| WO2008065977A1 (en) * | 2006-11-27 | 2008-06-05 | Nikon Corporation | Exposure method, pattern forming method, exposure device, and device manufacturing method |
| CN101611352A (en) * | 2007-01-04 | 2009-12-23 | 株式会社尼康 | Projecting optical device, exposure method and device manufacturing method |
| CN101918897A (en) * | 2007-12-20 | 2010-12-15 | 株式会社尼康 | Exposure method, exposure apparatus, and method for producing device |
| CN101294804A (en) * | 2008-06-20 | 2008-10-29 | 北京大学 | Digital airborne photography system |
| CN101644884A (en) * | 2009-07-13 | 2010-02-10 | 浙江大学 | Splicing view field stereoscopic three-dimensional display device and method thereof |
| CN102821238A (en) * | 2012-03-19 | 2012-12-12 | 北京泰邦天地科技有限公司 | Wide-field ultra-high-resolution imaging system |
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