CN103969958A - Multi-exposure visual field splicing system and method - Google Patents
Multi-exposure visual field splicing system and method Download PDFInfo
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Abstract
The present invention provides a multi-exposure visual field splicing system and a method. The system comprises: a mask, wherein the mask is provided with images with different sizes; a plurality of illumination units, wherein the plurality of the illumination units irradiate the images on the mask so as to form a plurality of imaging units, and each imaging unit comprises an exposure visual field; and a substrate, wherein the plurality of the exposure visual fields are spliced on the substrate to form a splicing visual field, the exposure visual fields comprise an exposure visual field PA, a corresponding exposure visual field width PA, an exposure visual field PB, a corresponding exposure visual field width PB, an exposure visual field PC and a corresponding exposure visual field width PC, PA is more than PB, PB is more than PC, and the width PA, the width PB and the width PC are equal. According to the present invention, the exposure visual field splicing method is flexible, different splicing methods can be selected according to different requirements of different products on the splicing visual field size, and the splicing market with more splicing sizes is provided.
Description
Technical field
The present invention relates to semiconductor applications, particularly a kind of many exposure video mosaic systems and method.
Background technology
In semiconductor fabrication, litho machine will strengthen the exposure size of liquid crystal panel, can, by increasing single optical system visual field, also can replace by multiple small-sized partial projection optical systems the method for single large-scale projection optical system.
In the prior art, realize the demand of advanced lines large size panel by the quantity that multiple small-sized partial projection optical systems replace the method for single large-scale projection optical system can constantly increase splicing view field, can carry out subregional compensation to the distortion of mask, substrate again and improve picture element simultaneously, therefore there is obvious advantage, be also widely used.
The patent No. is JPA2001337463, and name is called in " manufacture method of plate exposure apparatus, plate exposure apparatus " and discloses a kind of exposure system, has adopted multiple identical exposure subsystems to splice, and the exposure visual field size that each exposure subsystem forms is all identical.
The patent No. is US5579147, name is called in " Scanning light exposure apparatus " and discloses a kind of exposure system, adopted equally multiple identical exposure subsystems to splice, and the exposure visual field size that each exposure subsystem forms is all identical.
In the prior art, the exposure visual field size that each exposure subsystem forms is all identical, and joining method is single, cannot combine according to user demand.
Summary of the invention
The invention provides a kind of many exposure video mosaic systems and method, solved and spliced under the constant prerequisite of quantity, formed objects exposure field stitching method is single, the problem that cannot combine according to user demand.
The present invention is for the technical scheme that its technical matters of solution adopts:
A kind of many exposure video mosaic systems, comprising:
Mask, described mask is provided with the image varying in size;
Multiple lighting units, the image described in described multiple illumination unit on mask is to form multiple image-generating units, and each image-generating unit comprises an exposure visual field;
Substrate is spliced to form splicing view field by multiple exposures visual field on substrate; Wherein,
Described exposure visual field comprises: exposure visual field PA, and corresponding exposure visual field width PA, exposure visual field PB, corresponding exposure visual field width PB, exposure visual field PC, corresponding exposure visual field width PC, wherein, PA>PB>PC; Width PA=width PB=width PC.
Optionally, described exposure visual field is trapezoidal exposure visual field.
Optionally, in described many exposures field stitching method, the quantity of described exposure visual field is N, and N is natural number, N be more than or equal to 5 and N be not 4 multiple.
Optionally, in described many exposures field stitching method, described PA, PB and PC meet PB=(PA+PC)/2.
Optionally, in described many exposures field stitching method, in the time that the quantity N of described exposure visual field is odd number, by following formula, described exposure field stitching is formed to three kinds of different splicing view fields:
(N-1)/4*PA+(N+1)/2*PB+(N-1)/4*PC；
(N-1)/4*PA+(N-1)/2*PB+((N-1)/4+1)*PC；
((N-1)/4+1)*PA+(N-1)/2*PB+(N-1)/4*PC。
Optionally, in described many exposures field stitching method, when the quantity N of described exposure visual field is even number, by following formula, described exposure field stitching is formed to two kinds of different splicing view fields:
(N/4+1/2)*PA+N/2*PB+(N/4-1/2)*PC；
(N/4-1/2)*PA+N/2*PB+(N/4+1/2)*PC。
Meanwhile, the present invention also provides a kind of many exposures field stitching method that adopts described exposure video mosaic system, comprising:
The image varying in size is set on mask;
Form multiple image-generating units by the image on mask described in multiple illumination unit, each image-generating unit comprises an exposure visual field;
Described multiple exposures visual field is spliced to form to splicing view field on substrate; Wherein,
Described exposure visual field comprises: exposure visual field PA, corresponding exposure visual field width PA, exposure visual field PB, corresponding exposure visual field width PB, exposure visual field PC, corresponding exposure visual field width PC, wherein, PA>PB>PC, width PA=width PB=width PC.
Optionally, described exposure visual field is trapezoidal exposure visual field.
Optionally, at described many exposures field stitching method, the quantity of described exposure visual field is N, and N is natural number, N be more than or equal to 5 and N be not 4 multiple.
Optionally, at described many exposures field stitching method, described PA, PB and PC meet PB=(PA+PC)/2.
Optionally, at described many exposures field stitching method, in the time that the quantity N of described exposure visual field is odd number, by following formula, described exposure field stitching is formed to three kinds of different splicing view fields:
(N-1)/4*PA+(N+1)/2*PB+(N-1)/4*PC；
(N-1)/4*PA+(N-1)/2*PB+((N-1)/4+1)*PC；
((N-1)/4+1)*PA+(N-1)/2*PB+(N-1)/4*PC。
Optionally, at described many exposures field stitching method, when the quantity N of described exposure visual field is even number, by following formula, described exposure field stitching is formed to two kinds of different splicing view fields:
(N/4+1/2)*PA+N/2*PB+(N/4-1/2)*PC；
(N/4-1/2)*PA+N/2*PB+(N/4+1/2)*PC。
Implement one of the present invention expose video mosaic system and method more, there is following beneficial effect: the joining method of exposure visual field has more dirigibility, can be according to different product the big or small different demands to splicing view field, select different joining methods, the splicing market of more splicing sizes is provided.
Brief description of the drawings
Below in conjunction with drawings and Examples, the invention will be further described, in accompanying drawing:
Fig. 1 is the structural representation of many exposures video mosaic system of the embodiment of the present invention;
Fig. 2 is the image-generating unit of the embodiment of the present invention and the structural representation of exposure visual field;
Fig. 3 is the structural representation of many exposures field stitching method of the embodiment of the present invention 1;
Fig. 4 is the structural representation of many exposures field stitching method of the embodiment of the present invention 2;
Fig. 5 is the structural representation of many exposures field stitching method of the embodiment of the present invention 3;
Fig. 6 is the structural representation of many exposures field stitching method of the embodiment of the present invention 4;
Fig. 7 is the structural representation of many exposures field stitching method of the embodiment of the present invention 5.
Embodiment
Expose video mosaic system and method for one the present invention being proposed below in conjunction with the drawings and specific embodiments is described in further detail more.According to the following describes and claims, advantages and features of the invention will be clearer.It should be noted that, accompanying drawing all adopts very the form of simplifying and all uses non-ratio accurately, only in order to convenient, the object of the aid illustration embodiment of the present invention lucidly.
As depicted in figs. 1 and 2, a kind of many exposure video mosaic systems, comprising:
Mask 1, described mask 1 is provided with the image varying in size;
Multiple lighting units 2, described multiple lighting units 2 irradiate image on described mask 1 to form multiple image-generating units 3, and each image-generating unit 3 comprises an exposure visual field 5;
Substrate 4 is spliced to form splicing view field by multiple exposures visual field 5 on substrate; Wherein,
Described exposure visual field 5 comprises: exposure visual field PA, and corresponding exposure visual field width PA, exposure visual field PB, corresponding exposure visual field width PB, exposure visual field PC, corresponding exposure visual field width PC, wherein, PA>PB>PC; Width PA=width PB=width PC.Described exposure visual field width, for exposure visual field is in the plane of scanning motion, along perpendicular to the width forming on etching system direction of scanning, can be got developed width or the mean breadth of exposure visual field.
Further, described exposure visual field 5 is trapezoidal exposure visual field, and described exposure visual field width is the mean breadth of trapezoidal exposure visual field.
Further, the quantity of described exposure visual field 5 is N, and N is natural number, N be more than or equal to 5 and N be not 4 multiple, do not meet this condition, even if each visual field varies in size, can not form the combination of multiple visual field.
Further, for meeting field stitching condition, described PA, PB and PC, PB=(PA+PC)/2.
Meanwhile, the present invention also provides a kind of many exposure field stitching methods, comprising:
The image varying in size is set on mask;
Form multiple image-generating units by the image on mask described in multiple illumination unit, each image-generating unit comprises an exposure visual field;
Described multiple exposures visual field is spliced to form to splicing view field on substrate; Wherein,
Described exposure visual field comprises: exposure visual field PA, and corresponding exposure visual field width PA, exposure visual field PB, corresponding exposure visual field width PB, exposure visual field PC, corresponding exposure visual field width PC, wherein, PA>PB>PC; Width PA=width PB=width PC.
Further, the quantity of described exposure visual field is N, and N is natural number, N be more than or equal to 5 and N be not 4 multiple.
Further, described PA, PB and PC meet PB=(PA+PC)/2.
[embodiment 1]
As shown in Figure 3, much more a kind of exposure field stitching methods, form Bu Tong big or small exposure visual field of tri-kinds of PA, PB and PC, wherein, described width PA=width PB=width PC,, PA=100mm, PB=130mm, PC=160mm.
When exposure visual field quantity N=5 time,
By 1 PA, 2 PB, 2 PC splice, the size of splicing view field: 1*PA+2*PB+2*PC=1*160+2*130+2*100=620mm.
[embodiment 2]
As shown in Figure 4, much more a kind of exposure field stitching methods, form Bu Tong big or small exposure visual field of tri-kinds of PA, PB and PC, wherein, and described width PA=width PB=width PC, PA=100mm, PB=130mm, PC=160mm.
When exposure visual field quantity N=5 time,
By 1 PA, 3 PB, 1 PC splices, the size of splicing view field: 1*PA+3*PB+1*PC=1*160+3*130+1*100=650mm.
[embodiment 3]
As shown in Figure 5, much more a kind of exposure field stitching methods, form Bu Tong big or small exposure visual field of tri-kinds of PA, PB and PC, wherein, and described width PA=width PB=width PC, PA=100mm, PB=130mm, PC=160mm.
When exposure visual field quantity N=5 time,
By 2 PA, 2 PB, 1 PC splices, the size of splicing view field: 2*PA+2*PB+1*PC=2*160+2*130+1*100=680mm.
Can be drawn by [embodiment 1], [embodiment 2] and [embodiment 3], in the time that the quantity N of described exposure visual field is odd number, by following formula, described exposure field stitching be formed to three kinds of different splicing view fields:
(N-1)/4*PA+(N+1)/2*PB+(N-1)/4*PC；
(N-1)/4*PA+(N-1)/2*PB+((N-1)/4+1)*PC；
((N-1)/4+1)*PA+(N-1)/2*PB+(N-1)/4*PC。
[embodiment 4]
As shown in Figure 6, much more a kind of exposure field stitching methods, form Bu Tong big or small exposure visual field of tri-kinds of PA, PB and PC, wherein, and width PA=width PB=width PC, PA=100mm, PB=130mm, PC=160mm.
When exposure visual field quantity N=6 time,
By 1 PA, 3 PB, 2 PC splice, the size of splicing view field: 1*PA+3*PB+2*PC=1*160+3*130+2*100=810mm.
[embodiment 5]
As shown in Figure 7, much more a kind of exposure field stitching methods, form Bu Tong big or small exposure visual field of tri-kinds of PA, PB and PC, wherein, and width PA=width PB=width PC, PA=100mm, PB=130mm, PC=160mm.
When exposure visual field quantity N=6 time,
By 2 PA, 3 PB, 1 PC splices, and the size of splicing view field is: 2*PA+3*PB+1*PC=2*160+3*130+1*100=750mm.
By [embodiment 4] and [embodiment 5] can draw when the quantity N of described exposure visual field be even number and N while not being 4 multiple, by following formula, described exposure field stitching is formed to two kinds of different splicing view fields:
(N/4+1/2)*PA+N/2*PB+(N/4-1/2)*PC；
(N/4-1/2)*PA+N/2*PB+(N/4+1/2)*PC。
By said structure, use the exposure visual fields of different sizes to splice, can realize the big or small splicing view field of multiple difference, the present invention only for example 5,6 exposure visual fields splice, but the scope of application of the present invention is not limited to particular exposure visual field number.
Foregoing description is only the description to preferred embodiment of the present invention, the not any restriction to the scope of the invention, and any change, modification that the those of ordinary skill in field of the present invention does according to above-mentioned disclosure, all belong to the protection domain of claims.
Claims (12)
1. the video mosaic system of exposure more than, is characterized in that, comprising:
Mask, described mask is provided with the image varying in size;
Multiple lighting units, the image described in described multiple illumination unit on mask is to form multiple image-generating units, and each image-generating unit comprises an exposure visual field;
Substrate is spliced to form splicing view field by multiple exposures visual field on substrate; Wherein,
Described exposure visual field comprises: exposure visual field PA, and corresponding exposure visual field width PA, exposure visual field PB, corresponding exposure visual field width PB, exposure visual field PC, corresponding exposure visual field width PC, wherein, PA>PB>PC; Width PA=width PB=width PC.
2. many exposure field stitching methods according to claim 1, is characterized in that, described exposure visual field is trapezoidal exposure visual field.
3. many exposure field stitching methods according to claim 1, is characterized in that, the quantity of described exposure visual field is N, and N is natural number, N be more than or equal to 5 and N be not 4 multiple.
4. many exposure field stitching methods according to claim 3, is characterized in that, described PA, PB and PC meet PB=(PA+PC)/2.
5. many exposure field stitching methods according to claim 4, is characterized in that, in the time that the quantity N of described exposure visual field is odd number, by following formula, described exposure field stitching are formed to three kinds of different splicing view fields:
(N-1)/4*PA+(N+1)/2*PB+(N-1)/4*PC；
(N-1)/4*PA+(N-1)/2*PB+((N-1)/4+1)*PC；
((N-1)/4+1)*PA+(N-1)/2*PB+(N-1)/4*PC。
6. many exposure field stitching methods according to claim 4, is characterized in that, when the quantity N of described exposure visual field is even number, by following formula, described exposure field stitching are formed to two kinds of different splicing view fields:
(N/4+1/2)*PA+N/2*PB+(N/4-1/2)*PC；
(N/4-1/2)*PA+N/2*PB+(N/4+1/2)*PC。
7. the many exposures field stitching method that adopts exposure video mosaic system as claimed in claim 1, is characterized in that, comprising:
The image varying in size is set on mask;
Form multiple image-generating units by the image on mask described in multiple illumination unit, each image-generating unit comprises an exposure visual field;
Described multiple exposures visual field is spliced to form to splicing view field on substrate; Wherein,
Described exposure visual field comprises: exposure visual field PA, corresponding exposure visual field width PA, exposure visual field PB, corresponding exposure visual field width PB, exposure visual field PC, corresponding exposure visual field width PC, wherein, PA>PB>PC, width PA=width PB=width PC.
8. many exposure field stitching methods according to claim 7, is characterized in that, described exposure visual field is trapezoidal exposure visual field.
9. many exposure field stitching methods according to claim 7, is characterized in that, the quantity of described exposure visual field is N, and N is natural number, N be more than or equal to 5 and N be not 4 multiple.
10. many exposure field stitching methods according to claim 9, is characterized in that, described PA, PB and PC meet PB=(PA+PC)/2.
11. many exposure field stitching methods according to claim 10, is characterized in that, in the time that the quantity N of described exposure visual field is odd number, by following formula, described exposure field stitching are formed to three kinds of different splicing view fields:
(N-1)/4*PA+(N+1)/2*PB+(N-1)/4*PC；
(N-1)/4*PA+(N-1)/2*PB+((N-1)/4+1)*PC；
((N-1)/4+1)*PA+(N-1)/2*PB+(N-1)/4*PC。
12. many exposure field stitching methods according to claim 10, is characterized in that, when the quantity N of described exposure visual field is even number, by following formula, described exposure field stitching are formed to two kinds of different splicing view fields:
(N/4+1/2)*PA+N/2*PB+(N/4-1/2)*PC；
(N/4-1/2)*PA+N/2*PB+(N/4+1/2)*PC。
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| CN106227002A (en) * | 2016-09-21 | 2016-12-14 | 中山新诺科技股份有限公司 | A kind of method improving the efficiency adjusting splicing and multiplying power size |
| CN113835308A (en) * | 2021-09-23 | 2021-12-24 | 上海度宁科技有限公司 | Splicing exposure method, device and system |
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| CN103969958B (en) | 2016-03-30 |
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Address after: 201203 Pudong New Area East Road, No. 1525, Shanghai Patentee after: Shanghai microelectronics equipment (Group) Limited by Share Ltd Address before: 201203 Pudong New Area East Road, No. 1525, Shanghai Patentee before: Shanghai Micro Electronics Equipment Co., Ltd. |