CN103698827A - Vertical incidence quartz 1*2 beam-splitting tilted grating for TE (Tangent Elevation) polarization - Google Patents
Vertical incidence quartz 1*2 beam-splitting tilted grating for TE (Tangent Elevation) polarization Download PDFInfo
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- CN103698827A CN103698827A CN201310547673.4A CN201310547673A CN103698827A CN 103698827 A CN103698827 A CN 103698827A CN 201310547673 A CN201310547673 A CN 201310547673A CN 103698827 A CN103698827 A CN 103698827A
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Abstract
The invention discloses a vertical incidence quartz 1*2 beam-splitting tilted grating for TE (Tangent Elevation) polarization with 1550nanometer wavelength. The beam-splitting grating has the grating period of 2108-2010 nanometers, the inclination angle of 20-21 degrees, the ridge depth of 2982-2984 nanometers and the ridge width of 1576-1578 nanometers. When TE polarized light is in a vertical incidence manner, the transmission light is split into two beams of light with equal intensity, the total diffraction efficiency of the two beams of light is more than 95%, and the uniformity is superior to 4%. The quartz 1*2 beam-splitting tilted grating is processed by combining an electron beam direct-write device with micro-electronics deep etching process, is convenient in material selection and low in construction cost, can be subjected to large-scale production and has important practical prospect.
Description
Technical field
The present invention relates to transmission beam-splitting optical grating, particularly a kind of vertical incidence quartz 1 * 2 beam splitting oblique raster of the TE polarization for 1550 nano wave lengths.
Background technology
Beam splitter is the primary element in optical system, has important application in optical system.In optical communication, optical information processing, photonic crystal making, holography etc. system, there is irreplaceable effect.Due to traditional multi-layer film structure beam splitter complex process, cost is expensive, and laser-damaged threshold value is not high, therefore limits the widespread use of multi-layer film structure.Fused quartz is a kind of desirable grating material, and it has high optical quality: not only have stable performance, and have high damage threshold and high-diffraction efficiency.Adopt advanced microelectronic technique, the technological process of making grating is very simple.Therefore, the high-density deeply etched fused quartz oblique raster of etching is with a wide range of applications as novel beam splitting device.For inclination quartz grating, due to its dissymmetrical structure feature, can realize the function of asymmetric beam splitting, can make like this oblique raster be applied in optical system more easily.
The people such as Jijun Feng have designed high-level efficiency transmission-type rectangle fused quartz polarization irrelevant 1 * 2 beam-splitting optical grating under a kind of Bragg angle incident, very high [the technology 1:J.Feng et al. formerly of its diffraction efficiency, Appl.Opt.48,5636-5641 (2009)].Above grating is all based on rectangular configuration, and oblique raster not only can increase the dirigibility of design, can also realize the function of 0 grade of vertical incidence and-1 grade of 1 * 2 beam splitting.
Oblique raster is to utilize microelectronics deep etching technique, the grating with inclination flute profile processing in substrate.The diffraction theory of high density oblique raster, can not be explained by simple scalar optical grating diffraction equation, and must adopt the Maxwell equation of vector form and in conjunction with boundary condition, by the computer program of encoding, accurately calculate result.The people such as Moharam have provided the algorithm [formerly technology 2:M.G.Moharam et al., J.Opt.Soc.Am.A.12,1077 (1995)] of rigorous coupled wave theory, can solve the Diffraction Problems of this class high dencity grating.But as far as we know,, so far, also nobody is given in for conventional 1550 nano wave lengths TE polarization 1 * 2 inclination beam-splitting optical grating of making on fused quartz substrate.
Summary of the invention
The technical problem to be solved in the present invention is to provide a kind of vertical incidence quartz 1 * 2 beam splitting oblique raster of the TE polarization for 1550 nano wave lengths.When TE polarized light is during in vertical incidence, this grating can make incident light be divided into the equicohesive transmitted light of 2 bundle, and total efficiency of this 2 bundle transmitted light is greater than 95%, and homogeneity is better than 4%.Therefore, this beam-splitting optical grating has important practical value.
Technical solution of the present invention is as follows:
A kind of vertical incidence quartz 1 * 2 beam splitting oblique raster of the TE polarization for 1550 nano wave lengths, its feature is that the grating cycle of this beam-splitting optical grating is 2108～2110 nanometers, pitch angle is 20～21 degree, and ridge is 2982～2984 nanometers deeply, and the wide ratio of ridge is 1576～1578 nanometers.
The grating cycle of best beam-splitting optical grating is 2109 nanometers, and pitch angle is 20.1 degree, and ridge is 2983 nanometers deeply, and the wide ratio of ridge is 1577.5 nanometers.
Technique effect of the present invention is as follows:
Particularly the grating cycle when beam-splitting optical grating is 2109 nanometers, and pitch angle is 20.1 degree, and ridge is 2983 nanometers deeply, and the wide ratio of ridge is 1577.5 nanometers, and the total efficiency of this grating transmitted light is greater than 95%, and homogeneity is better than 4%.Utilize electron-beam direct writing device in conjunction with microelectronics deep etching technique, can be in enormous quantities, produce at low cost, the grating stable performance after etching, reliable, has important practical prospect.That the present invention has is flexible and convenient to use, homogeneity better, diffraction efficiency is compared with advantages of higher, is a kind of ideal diffraction optical element.
Accompanying drawing explanation
Fig. 1 is the geometry of TE polarization high-level efficiency vertical incidence quartz 1 * 2 beam splitting oblique raster of the present invention's 1550 nano wave lengths.
In figure, 1 represents that region 1(refractive index is n
1), 2 represent that region 2(refractive index is n
2), 3 represent incident light, 4,5 represent respectively-1,0 order diffraction light under TE pattern.D is the grating cycle, and h is the grating degree of depth, θ
infor incident angle, φ
sfor pitch angle.
Total Fig. 2 is that 0 ,-1 grade of diffraction efficiency of an embodiment in claimed range of the present invention is with the curve of wavelength variations.
Embodiment
Below in conjunction with embodiment and accompanying drawing, the invention will be further described, but should not limit the scope of the invention with this.
First refer to Fig. 1, Fig. 1 is the geometry of TE polarization orthogonal incident quartz of the present invention 1 * 2 beam splitting oblique raster.In figure, region 1,2 is all uniformly, is respectively air (refractive index n
1=1) and fused quartz (refractive index n
2=1.44462).3 is incident light, and 4 and 5 is emergent light.D is the grating cycle, φ
sfor pitch angle, h is the grating degree of depth, and b is that ridge is wide.TE polarized incident light is corresponding to the direction of vibration of electric field intensity perpendicular to the plane of incidence, and it impinges perpendicularly on grating.As seen from the figure, the present invention is the TE polarization quartz transmission beam splitting skew ray grid of 1550 nano wavebands for wavelength, and the grating cycle of this beam-splitting optical grating is 2108～2110 nanometers, and pitch angle is 20～21 degree, ridge is 2982～2984 nanometers deeply, and the wide ratio of ridge is 1576～1578 nanometers.
Under optical grating construction as shown in Figure 1, the present invention adopts rigorous coupled wave theoretical [formerly technology 2] to calculate quartzy oblique raster in the diffraction efficiency of 1550 nano wavebands.
Table 1 has provided a series of embodiment of the present invention, and in table, d is the grating cycle, φ
sfor pitch angle, h is the grating degree of depth, and b is that ridge is wide, and λ is incident wavelength, and Unifromity is the diffraction homogeneity of 2 ports, and η is diffraction efficiency.Making the process of the present invention for vertical incidence quartz 1 * 2 beam splitting oblique raster of the TE polarization of 1550 nano wave lengths, suitably selective light grid cycle, pitch angle and etching depth just can obtain high-diffraction efficiency and the good transmission 1 * 2 beam-dividing grating of homogeneity in certain bandwidth.
Total Fig. 2 is that 0 ,-1 grade of diffraction efficiency of an embodiment in claimed range of the present invention is with the curve of wavelength variations.
TE polarization high-level efficiency inclination quartz transmission beam-splitting optical grating of the present invention, utilize electron-beam direct writing device in conjunction with microelectronics deep etching technique, can be in enormous quantities, produce at low cost, grating stable performance after etching, reliable, there is important practical prospect, have flexible and convenient to use, homogeneity better, diffraction efficiency is compared with advantages of higher, is a kind of ideal diffraction optical element.
During table 1TE polarized light vertical incidence, wavelength is that the 1550nm time is in total diffraction efficiency and the homogeneity of 2 ports.
Claims (2)
1. vertical incidence quartz 1 * 2 beam splitting oblique raster for the TE polarization of 1550 nano wave lengths, the grating cycle that it is characterized in that this beam-splitting optical grating is 2108～2110 nanometers, pitch angle is 20～21 degree, and ridge is 2982～2984 nanometers deeply, and ridge is wide is 1576～1578 nanometers.
2. vertical incidence quartz 1 * 2 beam splitting oblique raster of TE polarization according to claim 1, is characterized in that the grating cycle of described beam-splitting optical grating is 2109 nanometers, and pitch angle is 20.1 degree, and ridge is 2983 nanometers deeply, and ridge is wide is 1577.5 nanometers.
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| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201310547673.4A CN103698827A (en) | 2013-11-06 | 2013-11-06 | Vertical incidence quartz 1*2 beam-splitting tilted grating for TE (Tangent Elevation) polarization |
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| CN201310547673.4A CN103698827A (en) | 2013-11-06 | 2013-11-06 | Vertical incidence quartz 1*2 beam-splitting tilted grating for TE (Tangent Elevation) polarization |
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Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN105652507A (en) * | 2016-02-29 | 2016-06-08 | 广东小天才科技有限公司 | Film-plated polarized display screen, mobile terminal and production method of film-plated polarized display screen |
| CN112394436A (en) * | 2020-11-25 | 2021-02-23 | 中国科学院上海光学精密机械研究所 | Asymmetric structure all-dielectric reflection type beam combination grating with 1064-nanometer waveband |
Citations (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| EP1341026A2 (en) * | 2002-02-28 | 2003-09-03 | Canon Kabushiki Kaisha | Beam splitting element and optical apparatus using it |
| US6927891B1 (en) * | 2002-12-23 | 2005-08-09 | Silicon Light Machines Corporation | Tilt-able grating plane for improved crosstalk in 1×N blaze switches |
| CN103364856A (en) * | 2013-07-09 | 2013-10-23 | 中国科学院上海光学精密机械研究所 | TE (Transverse Electric) polarized vertical-incidence negative-level-one high-efficiency inclined-transmission quartz grating |
-
2013
- 2013-11-06 CN CN201310547673.4A patent/CN103698827A/en active Pending
Patent Citations (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| EP1341026A2 (en) * | 2002-02-28 | 2003-09-03 | Canon Kabushiki Kaisha | Beam splitting element and optical apparatus using it |
| US6927891B1 (en) * | 2002-12-23 | 2005-08-09 | Silicon Light Machines Corporation | Tilt-able grating plane for improved crosstalk in 1×N blaze switches |
| CN103364856A (en) * | 2013-07-09 | 2013-10-23 | 中国科学院上海光学精密机械研究所 | TE (Transverse Electric) polarized vertical-incidence negative-level-one high-efficiency inclined-transmission quartz grating |
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN105652507A (en) * | 2016-02-29 | 2016-06-08 | 广东小天才科技有限公司 | Film-plated polarized display screen, mobile terminal and production method of film-plated polarized display screen |
| CN112394436A (en) * | 2020-11-25 | 2021-02-23 | 中国科学院上海光学精密机械研究所 | Asymmetric structure all-dielectric reflection type beam combination grating with 1064-nanometer waveband |
| CN112394436B (en) * | 2020-11-25 | 2021-07-06 | 中国科学院上海光学精密机械研究所 | Asymmetric structure all-dielectric reflection type beam combination grating with 1064-nanometer waveband |
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Application publication date: 20140402 |