CN103692331A - Workbench of curved surface polishing machine - Google Patents
Workbench of curved surface polishing machine Download PDFInfo
- Publication number
- CN103692331A CN103692331A CN201310734829.XA CN201310734829A CN103692331A CN 103692331 A CN103692331 A CN 103692331A CN 201310734829 A CN201310734829 A CN 201310734829A CN 103692331 A CN103692331 A CN 103692331A
- Authority
- CN
- China
- Prior art keywords
- workbench
- curved surface
- frame
- chain
- polishing machine
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 238000005498 polishing Methods 0.000 title claims abstract description 84
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 claims description 15
- 238000001816 cooling Methods 0.000 claims description 11
- WYTGDNHDOZPMIW-RCBQFDQVSA-N alstonine Natural products C1=CC2=C3C=CC=CC3=NC2=C2N1C[C@H]1[C@H](C)OC=C(C(=O)OC)[C@H]1C2 WYTGDNHDOZPMIW-RCBQFDQVSA-N 0.000 claims description 9
- 239000000758 substrate Substances 0.000 claims description 6
- 238000009434 installation Methods 0.000 claims description 3
- 238000004519 manufacturing process Methods 0.000 abstract description 6
- 230000033001 locomotion Effects 0.000 abstract description 5
- 230000000694 effects Effects 0.000 abstract description 4
- 230000005540 biological transmission Effects 0.000 abstract description 2
- 238000006073 displacement reaction Methods 0.000 description 6
- 239000012530 fluid Substances 0.000 description 5
- 238000004364 calculation method Methods 0.000 description 3
- 238000010586 diagram Methods 0.000 description 3
- 238000000034 method Methods 0.000 description 3
- 230000001174 ascending effect Effects 0.000 description 2
- 239000011521 glass Substances 0.000 description 2
- 238000000227 grinding Methods 0.000 description 2
- 238000012423 maintenance Methods 0.000 description 2
- 229910021421 monocrystalline silicon Inorganic materials 0.000 description 2
- 239000010453 quartz Substances 0.000 description 2
- 229910052594 sapphire Inorganic materials 0.000 description 2
- 239000010980 sapphire Substances 0.000 description 2
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N silicon dioxide Inorganic materials O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 2
- 239000000498 cooling water Substances 0.000 description 1
- 230000007547 defect Effects 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 238000006062 fragmentation reaction Methods 0.000 description 1
Images
Classifications
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B24—GRINDING; POLISHING
- B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
- B24B9/00—Machines or devices designed for grinding edges or bevels on work or for removing burrs; Accessories therefor
- B24B9/02—Machines or devices designed for grinding edges or bevels on work or for removing burrs; Accessories therefor characterised by a special design with respect to properties of materials specific to articles to be ground
- B24B9/06—Machines or devices designed for grinding edges or bevels on work or for removing burrs; Accessories therefor characterised by a special design with respect to properties of materials specific to articles to be ground of non-metallic inorganic material, e.g. stone, ceramics, porcelain
- B24B9/065—Machines or devices designed for grinding edges or bevels on work or for removing burrs; Accessories therefor characterised by a special design with respect to properties of materials specific to articles to be ground of non-metallic inorganic material, e.g. stone, ceramics, porcelain of thin, brittle parts, e.g. semiconductors, wafers
Landscapes
- Engineering & Computer Science (AREA)
- Chemical & Material Sciences (AREA)
- Ceramic Engineering (AREA)
- Inorganic Chemistry (AREA)
- Mechanical Engineering (AREA)
- Finish Polishing, Edge Sharpening, And Grinding By Specific Grinding Devices (AREA)
Abstract
The invention discloses a workbench of a curved surface polishing machine. The workbench can move horizontally, comprises a frame and is characterized in that guide rails are arranged on the frame, a working platform is mounted on the guide rails via a slider matched with the guide rails and can slide on the guide rails, a chain mounting seat is arranged on the working platform, a horizontal movement driving motor, a driven chain wheel and a driving chain wheel are arranged on the frame, the driving chain wheel is driven by the horizontal movement driving motor, a chain is wound on the driving chain wheel and the driven chain wheel, and two ends of the chain are respectively connected with the chain mounting seat. The workbench has the advantages that the workbench is simple in structure and low in failure rate, can be operated and maintained easily and conveniently and can move stably, equipment is long in service life, the slider is matched with the rails in an inlaid manner, a flexible connection transmission effect can be realized, and accordingly the workbench is excellent in impact resistance; shortcomings of existing polishing modes can be overcome, accordingly, the production efficiency can be greatly improved, and a foundation can be laid for assembly line production.
Description
Technical field
The present invention relates to a kind of curved surface polishing machine, the workbench of curved surface polishing machine for a kind of ultra-thin, fragility workpiece specifically, particularly relates to the workbench of the workpiece use curved surface polishing machines such as a kind of as glass, sapphire, piezoelectric quartz, monocrystalline silicon piece.
Background technology
, fragility workpiece ultra-thin in order to make becomes smooth, transparent as the surface of the workpiece such as glass, sapphire, piezoelectric quartz, monocrystalline silicon piece, and has gloss, conventionally to its surface, need carry out polishing.At present, the basic structure of the existing curved surface polishing machine that uses is upper dish (polishing disk), lower disc, and polishing disk is rotated, and the workbench that is placed with workpiece is lower wall polishing disk reverse rotation relatively, the one, increase grinding speed, the 2nd, make workpiece polishing even.Simultaneously, in whole motion process, because the contact area of polishing disk and workbench remains unchanged, so when press polish is worked, cylinder can apply constant pressure to the workpiece on workbench by polishing disk, to guarantee keeping constant pressure between polishing disk and workpiece.But, because polishing disk, workbench are all rotated, in the outer ring of polishing disk, workbench and inner ring on-line velocity, there are differences, cause like this polishing uniformity of workpiece on workbench poor, on workpiece, leave blemishes, as polishing line etc., affect polishing effect and efficiency.
Summary of the invention
The workbench that the object of this invention is to provide a kind of curved surface polishing machine moving horizontally,, when polishing disk is rotated, the workbench that is placed with workpiece is that lower wall moves horizontally.
The present invention adopts following technical scheme to realize its goal of the invention, a kind of workbench of curved surface polishing machine, it comprises frame, frame is provided with guide rail, workbench is arranged on guide rail by the slide block coordinating with guide rail, workbench can be slided on guide rail, workbench is provided with chain mount pad, frame is provided with and moves horizontally drive motors, driven sprocket, by the drive sprocket that moves horizontally drive motors and drive, chain is on drive sprocket and driven sprocket, and two ends are connected with chain mount pad respectively.
Workbench of the present invention is square.
For workpiece is had, stablize good polishing effect, workbench of the present invention is provided with the adsorbing mechanism that workbench is carried out to cooling cooling body and installation workpiece.
Cooling body of the present invention comprises the serpentine waterways being located in workbench, the water supply connector being communicated with serpentine waterways, water out adapter, water inlet pipe, outlet pipe are arranged on drag chain and are connected with water supply connector, water out adapter respectively, drag chain one end is fixed in frame, and the other end is fixed on workbench; Described adsorbing mechanism comprises the vacuum air-channel that is located in workbench, is arranged on the vacuum cup being communicated with vacuum air-channel on workbench.
On workbench of the present invention, have tank and air drain, and seal by shrouding, thereby form serpentine waterways and vacuum air-channel; Be provided with substrate with the corresponding position of vacuum air-channel, vacuum cup is installed on substrate.
Owing to adopting technique scheme, the present invention has realized goal of the invention preferably, and it is simple in structure, Operation and Maintenance is simple and convenient, failure rate is low, service life of equipment are long, and slide block embeds and coordinates with track, mobile steady, and transmission, for flexibly connecting, possesses good impact resistance; Meanwhile, overcome the defect that existing polishing exists, greatly improved production efficiency and laid the foundation for realizing streamline production.
Accompanying drawing explanation
Fig. 1 is structural representation of the present invention;
Fig. 2 is electric control theory schematic diagram of the present invention;
Fig. 3 is the calculating schematic diagram (workbench displacement H is less than or equal to the radius R of polishing disk) of the working face of polishing disk of the present invention and the approximate contact area S of workpiece;
Fig. 4 is the calculating schematic diagram (workbench displacement H is greater than the radius R of polishing disk) of the working face of polishing disk of the present invention and the approximate contact area S of workpiece;
Fig. 5 is tonnage curve map of the present invention.
The specific embodiment
Below in conjunction with drawings and Examples, the invention will be further described.
As seen from Figure 1, Figure 2, a kind of workbench of curved surface polishing machine, it comprises frame 1, frame 1 is provided with guide rail 10, workbench 8 is arranged on guide rail 10 by the slide block 9 coordinating with guide rail 10, workbench 8 can be slided on guide rail 10, workbench 8 is provided with chain mount pad 21, frame 1 is provided with and moves horizontally drive motors 12, driven sprocket 15, by the drive sprocket 13 that moves horizontally drive motors 12 and drive, chain 14 is on drive sprocket 13 and driven sprocket 15, and two ends are connected with chain mount pad 21 respectively.Simple for controlling, the movement of workbench 8 of the present invention is horizontal linear uniform motion.
For workpiece 17 is had, stablize good polishing effect, workbench 8 of the present invention is provided with the adsorbing mechanism that workbench 8 is carried out to cooling cooling body and installation workpiece 17.
Cooling body of the present invention comprises the serpentine waterways 19 being located in workbench 8, the water supply connector, the water out adapter that are communicated with serpentine waterways 19, water inlet pipe, outlet pipe are arranged on drag chain and are connected with water supply connector, water out adapter respectively, drag chain one end is fixed in frame 1, and the other end is fixed on workbench 8; Described adsorbing mechanism comprises the vacuum air-channel 20 that is located in workbench 8, is arranged on the vacuum cup being communicated with vacuum air-channel 20 on workbench 8.
On workbench 8 of the present invention, have tank and air drain, and seal by shrouding 11, thereby form serpentine waterways 19 and vacuum air-channel 20; Be provided with substrate 18 with the corresponding position of vacuum air-channel 20, on substrate 18, vacuum cup be installed.
For polishing disk 16 is revolved round the sun in rotation, polishing disk 16 of the present invention is arranged in mounting disc 7, and polishing disk 16 is driven by the polishing motor 3 being arranged on elevator platform 5, and described mounting disc 7 is driven by the revoluting motor 6 being arranged on elevator platform 5.Described polishing disk 16 is 2～8, and the polishing disk 16 of the present embodiment is 3, and the driving shaft of polishing disk 16 connects with the main shaft of polishing motor 3 by gear train.
For keeping 16 pairs of workpiece 17 of polishing disk to apply the pressure of setting, frame 1 is provided with and realizes the dynamic pressurized device that 16 pairs of workpiece 17 of polishing disk apply setting pressure, in the horizontal linear moving process of described dynamic pressurized device busy platform 8, by the 16 pairs of workpiece of polishing disk 17 that are arranged on elevator platform 5, keep applying the pressure of setting, thereby realize the polishing to workpiece 17.Dynamic pressurized device of the present invention comprises and is arranged on the lift cylinder 2 of being controlled by PLC in frame 1, the displacement transducer of testing platform 8 displacements, and the cylinder block of lift cylinder 2 is arranged in frame 1, and the piston rod of lift cylinder 2 is connected with elevator platform 5; PLC is the contact area with workpiece 17 according to the displacement calculation polishing disk 16 of workbench 8, and passing ratio reversal valve is determined the ascending, descending control to lift cylinder 2, realizes the pressure that 16 pairs of workpiece 17 of polishing disk apply setting.
From Fig. 3, Fig. 4, simple for calculating, the pressure that 16 pairs of workpiece 17 of polishing disk of the present invention apply setting is P=(F-G)/S, F is the pressure that polishing disk 16 imposes on workpiece, G is the weight of elevator platform 5, and S is the contact area of working face and the workpiece 17 of polishing disk 16; The contact area approximate calculation of the working face of described polishing disk 16 and workpiece 17 is:
In formula, S represents the approximate contact area of polishing disk 16 and workpiece 17, and R represents the radius of polishing disk 16, and H represents the relative shift of workbench 8, R >=H, cos α=(R-H)/R; Or
In formula, S represents the approximate contact area of polishing disk 16 and workpiece 17, and R represents the radius of polishing disk 16, and H represents the relative shift of workbench 8, H > R, cos α=(H-R)/R.
The present embodiment is provided with lift cylinder 2 in frame 1, the piston rod of lift cylinder 2 is connected with elevator platform 5, the polishing disk 16 of the present embodiment is 6, by mounting disc 7, be arranged on elevator platform 5 respectively, and driven by polishing motor 3, the centre bore on polishing disk 16 is connected with polishing fluid part flow arrangement 4 respectively; Described mounting disc 7 is driven by the revoluting motor 6 being arranged on elevator platform 5.
When the present invention works, manipulator moves to vacuum cup by workpiece 17, under the control of PLC, workbench 8 is by moving horizontally at the uniform velocity traveling priority of drive motors 12 drive levels, according to the pressure of setting, PLC is the contact area S with workpiece 17 according to the displacement approximate calculation polishing disk 16 of workbench 8, passing ratio reversal valve is determined the ascending, descending control to lift cylinder 2, polishing disk 16 revolves round the sun by mounting disc 7 in rotation, workpiece 17 is carried out to polishing, Figure 5 shows that tonnage curve map of the present invention.
Because polishing disk 16 be take the speed High Rotation Speed (existing polishing velocity is 300 revs/min of left and right) of 1000 revs/min of left and right, produce a large amount of heats, therefore, emulsus polishing fluid enters respectively the centre bore of polishing disk 16 and flows out through polishing fluid part flow arrangement 4 and carries out cooling to workpiece 17, simultaneously, cooling water also carries out cooling to workbench 8, the best effort environment when keeping polishing operation is between 25 ± 5 ℃.
Polishing fluid part flow arrangement 4 of the present invention comprises feed tube, shunting main chamber, and shunting main chamber connects with the main shaft of polishing motor 3, and shunting main chamber connects with the centre bore of polishing disk 16 by isocon; Feed tube and shunting are sealed by seal between main chamber, isocon and the centre bore of polishing disk 16, to guarantee that polishing disk 16 does not spill at rotation emulsus polishing fluid when revolving round the sun.
The present invention is when polishing disk 16 is rotated, and the workbench 8 that is placed with workpiece 17 carries out horizontal linear and moves, and meanwhile, polishing disk 16 revolves round the sun by mounting disc 7 in rotation.Like this, the one, due to the intermittent operation of being finished to of workpiece 17, cool time is longer, can effectively prevent workpiece 17 fragmentations that heat concentrations causes, thus polishing disk 16 can be rotated with a fair speed, thereby realize high speed polishing operation; The 2nd, because the horizontal linear of workbench 8 moves, avoided the linear velocity difference of workpiece 17 long-time grindings, thereby improved finished product rate; The 3rd, because the shape of workpiece 17 is with square in the majority, workbench 8 can be arranged to square, makes the space availability ratio of workbench 8 high, has reduced the requirement to pendulum; The 4th, the workpiece on workbench 8 only has part all the time in polishing disk 16 times, when " stir-fry machine " phenomenon occurs, only has the workpiece 17 under polishing disk 16 to be damaged, thereby has reduced the loss that " stir-fry machine " brings to processing; Meanwhile, the present invention has greatly improved production efficiency and has laid the foundation for realizing streamline production, and burnishing device rational and compact, Operation and Maintenance are simple and convenient, failure rate is low, service life of equipment are long.
Claims (5)
1. the workbench of a curved surface polishing machine, it comprises frame, it is characterized in that frame is provided with guide rail, workbench is arranged on guide rail by the slide block coordinating with guide rail, workbench can be slided on guide rail, and workbench is provided with chain mount pad, and frame is provided with and moves horizontally drive motors, driven sprocket, by the drive sprocket that moves horizontally drive motors and drive, chain is on drive sprocket and driven sprocket, and two ends are connected with chain mount pad respectively.
2. the workbench of curved surface polishing machine according to claim 1, is characterized in that described workbench is square.
3. according to the workbench of curved surface polishing machine described in claim 1 or 2, it is characterized in that described workbench is provided with the adsorbing mechanism that workbench is carried out to cooling cooling body and installation workpiece.
4. the workbench of curved surface polishing machine according to claim 3, it is characterized in that described cooling body comprises the serpentine waterways being located in workbench, the water supply connector being communicated with serpentine waterways, water out adapter, water inlet pipe, outlet pipe are arranged on drag chain and are connected with water supply connector, water out adapter respectively, drag chain one end is fixed in frame, and the other end is fixed on workbench; Described adsorbing mechanism comprises the vacuum air-channel that is located in workbench, is arranged on the vacuum cup being communicated with vacuum air-channel on workbench.
5. the workbench of curved surface polishing machine according to claim 4, is characterized in that having tank and air drain on described workbench, and seals by shrouding, thereby forms serpentine waterways and vacuum air-channel; Be provided with substrate with the corresponding position of vacuum air-channel, vacuum cup is installed on substrate.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201310734829.XA CN103692331B (en) | 2013-12-27 | 2013-12-27 | The workbench of curved surface polishing machine |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201310734829.XA CN103692331B (en) | 2013-12-27 | 2013-12-27 | The workbench of curved surface polishing machine |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| CN103692331A true CN103692331A (en) | 2014-04-02 |
| CN103692331B CN103692331B (en) | 2016-07-13 |
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Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201310734829.XA Active CN103692331B (en) | 2013-12-27 | 2013-12-27 | The workbench of curved surface polishing machine |
Country Status (1)
| Country | Link |
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| CN (1) | CN103692331B (en) |
Cited By (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN104551935A (en) * | 2014-12-26 | 2015-04-29 | 张现柱 | Automatic polisher for arc panel |
| CN106141918A (en) * | 2015-05-13 | 2016-11-23 | 信越化学工业株式会社 | The preparation method of substrate |
| CN106181681A (en) * | 2016-08-31 | 2016-12-07 | 天通银厦新材料有限公司 | Accurate sanding apparatus is used in a kind of sapphire processing |
| CN109524285A (en) * | 2017-09-19 | 2019-03-26 | 中国电子科技集团公司第四十八研究所 | A kind of ion beam etching equipment |
| WO2020073413A1 (en) * | 2018-10-10 | 2020-04-16 | 东旭集团有限公司 | Polishing machine for concave surface of curved glass |
Citations (6)
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| US6193588B1 (en) * | 1998-09-02 | 2001-02-27 | Micron Technology, Inc. | Method and apparatus for planarizing and cleaning microelectronic substrates |
| CN201070735Y (en) * | 2007-08-07 | 2008-06-11 | 霍秀荣 | Polishing machine |
| CN101244539A (en) * | 2007-12-29 | 2008-08-20 | 浙江工业大学 | Polisher for free curve flexibility of mold |
| CN101407040A (en) * | 2008-11-11 | 2009-04-15 | 广东工业大学 | Face lapping mill with abrasive disk cooling mechanism |
| CN201664877U (en) * | 2010-04-07 | 2010-12-08 | 吴航武 | Full-automatic iron plate polishing machine |
| CN203680007U (en) * | 2013-12-27 | 2014-07-02 | 湖南宇晶机器股份有限公司 | Working platform of cambered polishing machine |
-
2013
- 2013-12-27 CN CN201310734829.XA patent/CN103692331B/en active Active
Patent Citations (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US6193588B1 (en) * | 1998-09-02 | 2001-02-27 | Micron Technology, Inc. | Method and apparatus for planarizing and cleaning microelectronic substrates |
| CN201070735Y (en) * | 2007-08-07 | 2008-06-11 | 霍秀荣 | Polishing machine |
| CN101244539A (en) * | 2007-12-29 | 2008-08-20 | 浙江工业大学 | Polisher for free curve flexibility of mold |
| CN101407040A (en) * | 2008-11-11 | 2009-04-15 | 广东工业大学 | Face lapping mill with abrasive disk cooling mechanism |
| CN201664877U (en) * | 2010-04-07 | 2010-12-08 | 吴航武 | Full-automatic iron plate polishing machine |
| CN203680007U (en) * | 2013-12-27 | 2014-07-02 | 湖南宇晶机器股份有限公司 | Working platform of cambered polishing machine |
Cited By (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN104551935A (en) * | 2014-12-26 | 2015-04-29 | 张现柱 | Automatic polisher for arc panel |
| CN106141918A (en) * | 2015-05-13 | 2016-11-23 | 信越化学工业株式会社 | The preparation method of substrate |
| CN106181681A (en) * | 2016-08-31 | 2016-12-07 | 天通银厦新材料有限公司 | Accurate sanding apparatus is used in a kind of sapphire processing |
| CN109524285A (en) * | 2017-09-19 | 2019-03-26 | 中国电子科技集团公司第四十八研究所 | A kind of ion beam etching equipment |
| CN109524285B (en) * | 2017-09-19 | 2021-06-11 | 中国电子科技集团公司第四十八研究所 | Ion beam etching equipment |
| WO2020073413A1 (en) * | 2018-10-10 | 2020-04-16 | 东旭集团有限公司 | Polishing machine for concave surface of curved glass |
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| Publication number | Publication date |
|---|---|
| CN103692331B (en) | 2016-07-13 |
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Application publication date: 20140402 Assignee: Hunan Yiyuan New Material Technology Co.,Ltd. Assignor: HUNAN YUJING MACHINE INDUSTRIAL Co.,Ltd. Contract record no.: X2023980050763 Denomination of invention: Worktable of curved surface polishing machine Granted publication date: 20160713 License type: Common License Record date: 20231213 |