CN103592821A - Novel LED (light-emitting diode) light source system for ultraviolet exposure machine - Google Patents
Novel LED (light-emitting diode) light source system for ultraviolet exposure machine Download PDFInfo
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- CN103592821A CN103592821A CN201310481112.9A CN201310481112A CN103592821A CN 103592821 A CN103592821 A CN 103592821A CN 201310481112 A CN201310481112 A CN 201310481112A CN 103592821 A CN103592821 A CN 103592821A
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Abstract
The invention relates to a novel LED (light-emitting diode) light source system for an ultraviolet exposure machine. The novel LED light source system for the ultraviolet exposure machine comprises a light source mounting rack, wherein the light source mounting rack is successively provided with multiple rows of ultraviolet LED light sources which are arranged at an equal distance; the ultraviolet LED light sources comprise lenses and UVLEDs (ultraviolet light-emitting diode), wherein the LEDs and the lenses of the light sources are arranged into a matrix array, the UVLEDs are high-power LEDs (more than 3W) the optical wavelengths of which are changed according to the different light materials, and the sizes of the diameters of the lenses are changed according to the requirements of the light materials on energy. The novel LED light source system for the ultraviolet exposure machine, which is provided by the invention, has the advantages that the light energy is effectively utilized, an emergent ray achieves the parallel light effect, and the arrangement mode of the lenses is firstly arranged in a malposed lens matrix and is arranged into an array of an area array according to the size of an exposure platform surface; the light source system is applied into the ultraviolet exposure machine, and the light source characteristic requirements of angles of the light sources, the exposure uniformity and an exposure material are greatly improved.
Description
Technical field
The present invention relates to a kind of light-source system of exposure machine, particularly a kind of novel LED ultraviolet exposure machine light-source system.
Background technology
The depth of parallelism of the light shooting angle of ultraviolet light is two important technology indexs of ultraviolet exposure machine with exposure uniformity coefficient.Existing ultraviolet exposure machine because of its purposes different, or high and its complex structure of exposure resolution ratio, luminous energy effect utilization factor is low, energy consumption is high and working service cost is high makes it in the today of advocating energy-conserving and environment-protective, day by day becomes the equipment that need substitute or improve.
Because optical exposure illuminator irradiance is inhomogeneous, cause line weight inhomogeneous, the ill-exposed phenomenons such as the resolution in entire plate is inconsistent, and resolution in raw entire plate is inconsistent occur. this is unallowed in the production run of PCB or liquid crystal display.The optical exposure lighting source of traditional exposure machine adopts metal halide (as mercuric bromide) as being excited to ionize luminescent material more, belong to high-intensity gas discharge lamp, high pressure, high temperature and noxious material are all contained in inside, high-pressure sodium lamp has very strong radiation from long wave ultraviolet to visible ray, but only the optical wavelength of some UVA-UVB section can act on uv-exposure purposes, the radiation of other optical wavelength wave bands all can be distributed in the mode of luminous energy and radiation energy on other objects of space, causes environment temperature to raise; The lighting angle of high-pressure sodium lamp is 360 degree, needs quite large-area reflex housing and larger distance to carry out beam shaping to meet application demand, but can make the loss of light intensity 50-70% of exposure system.In sum, the optical exposure illuminator of traditional exposure machine exists light transmittance efficiency low, and energy consumption is high, and the material that uses is unfavorable for the shortcomings such as environmental protection.And the feature that optical exposure illuminator in the present invention possesses is: use LED as luminophor, being aided with collimation lens and matrix organiser, to realize luminescent light wave long single, utilization ratio of optical energy is high, can reach more than 95%, the use material forming is glass, GaN based semiconductor, the metals such as X alloy; There is the advantages such as environmentally friendly, minimizing power consumption, the saving energy.
Adopt LED to expose, the mode that exists luminous intensity to change with lighting angle due to LED, its arrangement mode has caused LED may occur that the place that the intensity of light source is strong is over-exposed in exposure, and the problem of the low place under-exposure of the intensity of light source, how to remove to design LED arrangement mode, the homogenising that makes to expose is urgently to be resolved hurrily, adopted in the past under exposure light source, carried out moving exposure simultaneously, easily occur that exposure table top shifts out effective exposure area, or employing exposure light source translation, exposure table top is exposed, both be prone to position to be exposed and shift out the defect of effective exposure area, because the characteristic of all exposing materials is all to need a lasting uniform exposure light source, so the mode of narrow light source rapid scanning does not meet the requirement of exposing material, the qualification rate of product is not high.
In order to solve the deficiency of above-mentioned technology, the object of this invention is to provide a kind of novel LED ultraviolet exposure machine light-source system and LED ultraviolet exposure machine, it effectively raises the uniformity coefficient of proximity large area ultraviolet Uniform Irradiation exposure and the angle of light, and the utilization factor that produces effect of luminous energy.
The technical solution adopted in the present invention is: a kind of novel LED ultraviolet exposure machine light-source system, it comprises light source erecting frame, on described light source erecting frame, arrange the equidistant ultraviolet LED light source of arranging of at least one group of multirow, described ultraviolet LED light source comprises lens and UVLED, the diameter of described lens is φ, K is centre distance poor of the ultraviolet LED light source of the same row of adjacent two row, described lens arrangement forms lens matrix, the line number of described lens matrix is L, K=φ/L, described LED ultraviolet exposure machine light-source system and to be exposed relative the vertically moving of formation.
Described ultraviolet LED light source is irradiated on exposure table top and forms light source irradiation area, in light source irradiation area, be provided with the effective exposure area of to be exposed, described effective exposure area is with respect to the length travel of light source irradiation area, light source irradiation area is greater than effective exposure area, and when mobile effective exposure area all the time in light source irradiation area.
The diameter of described lens is 20mm-80mm.
Horizontal and vertical all alignment of described arbitrary group of ultraviolet LED light source.
The top of described lens is 10mm-800mm to the distance A of exposure table top.
The shooting angle B of described ultraviolet LED light source scioptics is 0-60 degree.
Described LED ultraviolet exposure machine light-source system can transverse shifting.
The optical wavelength range of described UVLED is 250nm-450nm.
The invention has the beneficial effects as follows: adopt special arrangement mode, take that to improve exposure uniformity coefficient and reduce light source dispersion angle be prerequisite, avoid because optical exposure illuminator irradiance is inhomogeneous, cause line weight inhomogeneous, the resolution in entire plate is inconsistent, or has the generation of the phenomenons such as broken string, the ultraviolet exposure machine being applied to by this light-source system, in the angle of light source, exposition uniformity, and exposing material is to there being great raising in the requirement of light source characteristic.
Accompanying drawing explanation
Fig. 1 is arrangement and the mutual relationship figure of lens matrix.
Fig. 2 is the enlarged drawing at I place in Fig. 1.
Fig. 3 is the syntagmatic figure of lens and UVLED.
Fig. 4 is the schematic perspective view of lens support plate.
Fig. 5 is the position relationship schematic diagram of lens, lens support plate and UVLED.
Embodiment
Below in conjunction with accompanying drawing, embodiments of the present invention is further illustrated:
As shown in Figure 1, Figure 2 and Figure 3, a kind of novel LED ultraviolet exposure machine light-source system, it comprises light source erecting frame, on described light source erecting frame, arrange the equidistant ultraviolet LED light source of arranging of at least one group of multirow, described ultraviolet LED light source comprises lens and UVLED, the diameter of described lens is φ, K is centre distance poor of the ultraviolet LED light source of the same row of adjacent two row, described lens arrangement forms lens matrix, the line number of described lens matrix is L, K=φ/L, described LED ultraviolet exposure machine light-source system and to be exposed relative the vertically moving of formation.The centre distance of adjacent two lens of every row is M, and M is more than or equal to φ, and the centre distance of the lens of the same row of adjacent two row is N, and N is more than or equal to φ, the line number L of lens matrix be 3-10 capable between.
Described ultraviolet LED light source is irradiated on exposure table top and forms light source irradiation area, in light source irradiation area, be provided with the effective exposure area of to be exposed, described effective exposure area is with respect to the length travel of light source irradiation area, and when mobile effective exposure area all the time in light source irradiation area.The area of the light source irradiation area that the light scioptics matrix of UVLED forms is greater than the area of effective exposure area, and effective exposure area be positioned at light source irradiation area within and length travel relatively.Effective exposure area is the rectangular area of 100 square millimeters to 40000 square millimeters, and effective exposure area becomes length travel to coordinate with respect to lens matrix, and when it is subjected to displacement, effective exposure area is all the time within the scope in lens matrix, guarantee that effective exposure area is always in effective exposure status, avoided issuable effective exposure area in the past to leave lens matrix region, made its exposure insufficient.
UVLED(ultraviolet LED) be a kind of of LED, it is the invisible light of single wavelength, generally below 400nm, by specialized designs, make UVLED can send a complete continuous ultraviolet light belt, meet edge sealing, the need of production in the fields such as printing, line source has the life-span of overlength, cold light source, non-thermal radiation, life-span is not is not opened and closed times influence, energy is high, irradiate and evenly enhance productivity, not safer than traditional light source containing Toxic material, more environmental protection, ultraviolet LED adopts great power LED (more than 3W), its optical wavelength range is 250nm-450nm, according to the difference of exposing material, and the UVLED of selection different wave length.
Referring to Fig. 4 and Fig. 5, lens scioptics support plate is fixed on UVLED upper end, forms ultraviolet LED light source.
After the light source matrix that this lens matrix forms adds longitudinal scanning, uniformity coefficient can bring up to 85% from 10%, the length of longitudinal scanning is how much multiples of single lens diameter and the product S(scanning distance of line number L)=φ * L, its sweep velocity arranges according to the characteristic of exposing material.Wherein exposing material is the liquid ink of photosensitive dry film and sensitization, can repeatedly move around simultaneously, and mobile number of times >=1.
The diameter of described lens is 20mm-80mm, and the diameter of lens changes the demand difference of energy according to exposing material, and the most effectively utilizes luminous energy, and makes emergent ray reach the effect of directional light.Strengthened the range of choice of lens, can carry out light source arrangement according to the size of lens diameter, adopt large diameter lens, can effectively reduce the densely distributed degree of light source, reduce the use amount of light source, cost-saving, and in order to strengthen its exposure intensity, can select the lens of minor diameter, improve its distribution of light sources closeness, strengthen exposure intensity simultaneously, exposure efficiency is improved.
Horizontal and vertical all alignment of described arbitrary group of ultraviolet LED light source, form all horizontal and vertical alignment of arbitrary array such as the first array, the second array, the 3rd array.
Described lens adopt high borosilicate, quartz glass or other uvioresistant optics glass to make, the light-source system that adopts the technical program to arrange, its choice for lens is strengthened, and does not need, as the lens that must adopt certain material to make in the past, to have improved its range of application.
The top of described lens is 10mm-800mm to the distance A of exposure table top.
The shooting angle B of described ultraviolet LED light source scioptics is 0-60 degree.
By setting shooting angle, diameter and the lens top of lens to the distance of exposure table top, can make resolution reach 0.5mil.
Described LED ultraviolet exposure machine light-source system can transverse shifting.By this light-source system of transverse shifting, can make uniformity coefficient bring up to 95% from 85%, meet greatly the technological requirement in the fields such as PCB printed circuit board, FPCB flexible PCB touch-screen, glass substrate, semiconductor carrier plate and printing screen plate making.
When the shooting angle of ultraviolet LED light source scioptics is 0 while spending, must make this light-source system walk crosswise movement, improve it and irradiate uniformity coefficient, and transverse shifting distance is single lens diameter Φ, its transverse shifting speed is determined according to the technological requirement of the characteristic of exposing material and wiring board, its transverse shifting speed, from 1mm/s to 1000mm/s, can repeatedly move around, mobile number of times >=1.
Adopt special arrangement mode to add and make the effective exposure area design in exposure status all the time, take that to improve exposure uniformity coefficient and reduce light source dispersion angle be prerequisite, avoid because optical exposure illuminator irradiance is inhomogeneous, cause line weight inhomogeneous, resolution in entire plate is inconsistent, or there is a generation of the phenomenons such as broken string, the ultraviolet exposure machine being applied to by this light-source system, angle at light source, exposition uniformity, and exposing material is to there being great raising in the requirement of light source characteristic.
Below described embodiment is only the preferred embodiment of the present invention by reference to the accompanying drawings, and the not restriction to protection scope of the present invention, any improvement of doing based on spirit of the present invention all ought to be within protection domain of the present invention.
Claims (8)
1. a novel LED ultraviolet exposure machine light-source system, it comprises light source erecting frame, it is characterized in that: on described light source erecting frame, arrange the equidistant ultraviolet LED light source of arranging of at least one group of multirow, described ultraviolet LED light source comprises lens and UVLED, the diameter of described lens is φ, K is centre distance poor of the ultraviolet LED light source of the same row of adjacent two row, described lens arrangement forms lens matrix, the line number of described lens matrix is L, K=φ/L, described LED ultraviolet exposure machine light-source system and to be exposed relative the vertically moving of formation.
2. a kind of novel LED ultraviolet exposure machine light-source system according to claim 1, it is characterized in that, described ultraviolet LED light source is irradiated on exposure table top and forms light source irradiation area, in light source irradiation area, be provided with the effective exposure area of to be exposed, described effective exposure area is with respect to the length travel of light source irradiation area, light source irradiation area is greater than effective exposure area, and when mobile effective exposure area all the time in light source irradiation area.
3. a kind of novel LED ultraviolet exposure machine light-source system according to claim 1, is characterized in that, the diameter of described lens is 20mm-80mm.
4. a kind of novel LED ultraviolet exposure machine light-source system according to claim 1, is characterized in that, horizontal and vertical all alignment of described arbitrary group of ultraviolet LED light source.
5. according to a kind of novel LED ultraviolet exposure machine light-source system described in claim 1 or 3, it is characterized in that, the top of described lens is 10mm-800mm to the distance A of exposure table top.
6. a kind of novel LED ultraviolet exposure machine light-source system according to claim 1, is characterized in that, the shooting angle B of described ultraviolet LED light source scioptics is 0-60 degree.
7. a kind of novel LED ultraviolet exposure machine light-source system according to claim 1, is characterized in that, described LED ultraviolet exposure machine light-source system can transverse shifting.
8. a kind of New LED ultraviolet exposure machine light-source system according to claim 1, is characterized in that, the optical wavelength range of described UVLED is 250nm-450nm.
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Cited By (11)
| Publication number | Priority date | Publication date | Assignee | Title |
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| CN103913956A (en) * | 2014-03-10 | 2014-07-09 | 东莞科视自动化科技有限公司 | Energy-saving environment-friendly type UVLED exposure machine uniformity automatic detecting method and equipment |
| CN105629680A (en) * | 2016-03-30 | 2016-06-01 | 昆山尊宸电子有限公司 | UV-LED mixed wavelength light source system for exposure machine |
| CN105759571A (en) * | 2016-05-13 | 2016-07-13 | 京东方科技集团股份有限公司 | Ultraviolet light mask device and use method thereof |
| CN106406033A (en) * | 2015-07-30 | 2017-02-15 | 赵南稙 | Uv led light source module unit for exposure photolithography process and exposure photolithography apparatus used the same |
| CN106773549A (en) * | 2017-01-21 | 2017-05-31 | 南京新趋势光电有限公司 | A kind of high uniformity LED directional lights ultraviolet exposure machine light-source system |
| CN106873317A (en) * | 2017-05-02 | 2017-06-20 | 成都恒坤光电科技有限公司 | A kind of planar exposure system and exposure component |
| CN106907586A (en) * | 2017-05-02 | 2017-06-30 | 成都恒坤光电科技有限公司 | A kind of strip-shaped light source, flat light source and the exposure component using the flat light source |
| CN107450283A (en) * | 2017-09-25 | 2017-12-08 | 北京京圳永达科技有限公司 | LED light polyplant and parallel exposing machine |
| CN108286682A (en) * | 2018-02-12 | 2018-07-17 | 丁强 | Enhance the integrated module and strip-shaped light source of UVLED radiation peak intensity |
| EP3498386A1 (en) * | 2015-06-03 | 2019-06-19 | Koninklijke Philips N.V. | Safety improvements for uv radiation in aquatic applications |
| CN113126456A (en) * | 2021-05-06 | 2021-07-16 | 艾斯尔光电(南通)有限公司 | Photomask exposure developing process |
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| Publication number | Priority date | Publication date | Assignee | Title |
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| CN103913956B (en) * | 2014-03-10 | 2016-02-24 | 东莞科视自动化科技有限公司 | Energy saving and environment friendly UVLED exposure machine uniformity coefficient automatic testing method and equipment |
| CN103913956A (en) * | 2014-03-10 | 2014-07-09 | 东莞科视自动化科技有限公司 | Energy-saving environment-friendly type UVLED exposure machine uniformity automatic detecting method and equipment |
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| CN106406033A (en) * | 2015-07-30 | 2017-02-15 | 赵南稙 | Uv led light source module unit for exposure photolithography process and exposure photolithography apparatus used the same |
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| CN105629680A (en) * | 2016-03-30 | 2016-06-01 | 昆山尊宸电子有限公司 | UV-LED mixed wavelength light source system for exposure machine |
| US10261420B2 (en) | 2016-05-13 | 2019-04-16 | Boe Technology Group Co., Ltd. | UV mask device and method for using the same |
| CN105759571A (en) * | 2016-05-13 | 2016-07-13 | 京东方科技集团股份有限公司 | Ultraviolet light mask device and use method thereof |
| CN106773549A (en) * | 2017-01-21 | 2017-05-31 | 南京新趋势光电有限公司 | A kind of high uniformity LED directional lights ultraviolet exposure machine light-source system |
| CN106773549B (en) * | 2017-01-21 | 2024-02-27 | 南京新趋势光电有限公司 | High-uniformity LED parallel light ultraviolet exposure machine light source system |
| CN106873317A (en) * | 2017-05-02 | 2017-06-20 | 成都恒坤光电科技有限公司 | A kind of planar exposure system and exposure component |
| CN106907586A (en) * | 2017-05-02 | 2017-06-30 | 成都恒坤光电科技有限公司 | A kind of strip-shaped light source, flat light source and the exposure component using the flat light source |
| CN107450283A (en) * | 2017-09-25 | 2017-12-08 | 北京京圳永达科技有限公司 | LED light polyplant and parallel exposing machine |
| CN108286682A (en) * | 2018-02-12 | 2018-07-17 | 丁强 | Enhance the integrated module and strip-shaped light source of UVLED radiation peak intensity |
| CN113126456A (en) * | 2021-05-06 | 2021-07-16 | 艾斯尔光电(南通)有限公司 | Photomask exposure developing process |
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Address after: 325000 Main Building, 700 Wenzhou Avenue, Wenzhou Economic and Technological Development Zone, Wenzhou City, Zhejiang Province Patentee after: Zhejiang Eurovision Television Technology Co., Ltd. Address before: Room G-502, Standard Workshop Phase III, No. 10 District, Wenzhou High-tech Industrial Park, Zhejiang Province Patentee before: Zhejiang Ousut Technology Co., Ltd. |
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