CN103443032B - The treatment process of development of photoresist waste water - Google Patents
The treatment process of development of photoresist waste water Download PDFInfo
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- CN103443032B CN103443032B CN201280014650.0A CN201280014650A CN103443032B CN 103443032 B CN103443032 B CN 103443032B CN 201280014650 A CN201280014650 A CN 201280014650A CN 103443032 B CN103443032 B CN 103443032B
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- C—CHEMISTRY; METALLURGY
- C02—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F1/00—Treatment of water, waste water, or sewage
- C02F1/42—Treatment of water, waste water, or sewage by ion-exchange
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01D—SEPARATION
- B01D61/00—Processes of separation using semi-permeable membranes, e.g. dialysis, osmosis or ultrafiltration; Apparatus, accessories or auxiliary operations specially adapted therefor
- B01D61/58—Multistep processes
-
- C—CHEMISTRY; METALLURGY
- C02—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F1/00—Treatment of water, waste water, or sewage
- C02F1/44—Treatment of water, waste water, or sewage by dialysis, osmosis or reverse osmosis
- C02F1/441—Treatment of water, waste water, or sewage by dialysis, osmosis or reverse osmosis by reverse osmosis
-
- C—CHEMISTRY; METALLURGY
- C02—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F1/00—Treatment of water, waste water, or sewage
- C02F1/44—Treatment of water, waste water, or sewage by dialysis, osmosis or reverse osmosis
- C02F1/444—Treatment of water, waste water, or sewage by dialysis, osmosis or reverse osmosis by ultrafiltration or microfiltration
-
- C—CHEMISTRY; METALLURGY
- C02—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F3/00—Biological treatment of water, waste water, or sewage
- C02F3/02—Aerobic processes
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01D—SEPARATION
- B01D61/00—Processes of separation using semi-permeable membranes, e.g. dialysis, osmosis or ultrafiltration; Apparatus, accessories or auxiliary operations specially adapted therefor
- B01D61/02—Reverse osmosis; Hyperfiltration ; Nanofiltration
- B01D61/025—Reverse osmosis; Hyperfiltration
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01D—SEPARATION
- B01D61/00—Processes of separation using semi-permeable membranes, e.g. dialysis, osmosis or ultrafiltration; Apparatus, accessories or auxiliary operations specially adapted therefor
- B01D61/14—Ultrafiltration; Microfiltration
- B01D61/147—Microfiltration
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- C—CHEMISTRY; METALLURGY
- C02—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F1/00—Treatment of water, waste water, or sewage
- C02F1/42—Treatment of water, waste water, or sewage by ion-exchange
- C02F2001/425—Treatment of water, waste water, or sewage by ion-exchange using cation exchangers
-
- C—CHEMISTRY; METALLURGY
- C02—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F2103/00—Nature of the water, waste water, sewage or sludge to be treated
- C02F2103/34—Nature of the water, waste water, sewage or sludge to be treated from industrial activities not provided for in groups C02F2103/12 - C02F2103/32
- C02F2103/40—Nature of the water, waste water, sewage or sludge to be treated from industrial activities not provided for in groups C02F2103/12 - C02F2103/32 from the manufacture or use of photosensitive materials
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- C—CHEMISTRY; METALLURGY
- C02—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F2303/00—Specific treatment goals
- C02F2303/20—Prevention of biofouling
-
- C—CHEMISTRY; METALLURGY
- C02—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F3/00—Biological treatment of water, waste water, or sewage
- C02F3/02—Aerobic processes
- C02F3/06—Aerobic processes using submerged filters
-
- C—CHEMISTRY; METALLURGY
- C02—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F3/00—Biological treatment of water, waste water, or sewage
- C02F3/02—Aerobic processes
- C02F3/08—Aerobic processes using moving contact bodies
- C02F3/085—Fluidized beds
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- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02W—CLIMATE CHANGE MITIGATION TECHNOLOGIES RELATED TO WASTEWATER TREATMENT OR WASTE MANAGEMENT
- Y02W10/00—Technologies for wastewater treatment
- Y02W10/10—Biological treatment of water, waste water, or sewage
Abstract
The present invention relates to the treatment process of a kind of development of photoresist waste water, it uses RO device, need not neutralize RO through water with alkaline agent, can prevent or suppress the obstruction of the RO film caused because of foundry loam, and can obtain the RO film of good water quality through water. Development of photoresist waste water need not be carried out pH value adjustment by it, after contacting with Zeo-karb, carries out turbidity removal process by MF film device etc., then to reverse osmosis membrane device water flowing, obtains film through water.
Description
Technical field
The present invention relates to the treatment process of a kind of photo-resist (photoresist) development waste-water, especially relate to a kind for the treatment of process using reverse osmosis membrane device (RO device).
Background technology
During for manufacturing the electronic units etc. such as semiconducter device, liquid-crystal display, printed base plate, the tunicle of photo-resist is formed on the substrates such as wafer (wafer), pattern mask (patternmask) is utilized to irradiate light etc., then, utilize the photo-resist that developing solution dissolution does not need, develop, and then carry out the process such as etching, then, peel off the insoluble photoresist film on substrate. Photo-resist, being divided into exposed portion to be the positive light anti-etching agent of solubility and exposed portion is insoluble negative type photoresist. As the developing solution of positive light anti-etching agent, mainly contain alkaline-based developer. As the developing solution of negative type photoresist, it is mainly organic solvent system developing solution, but also has and use alkaline-based developer person.
As above-mentioned alkaline-based developer, it may also be useful to such as tetraalkylammonium hydroxide (Tetraalkylammoniumhydroxide, TAAH), especially use tetramethyl ammonium hydroxide (Tetramethylammoniumhydroxide, TMAH). In the waste water (development of photoresist waste water) that cleaning step after this development step or development is discharged, usually tetraalkyl ammonium ion containing about tens to 20000ppm respectively, and concentration is generally the quinone two nitrine (quinonediazido) used as resist of about 10��1000ppm and the various resist overburdens being derived from photoresist of the mixture of phenol novolac resin (phenolnovolac) resin or condenses (photolysis type photo-resist) etc.
Patent documentation 1 describes one method, its be in development of photoresist waste liquid add acid, make pH value be reduced to 2��6 precipitation photo-resists after, it may also be useful to RO membrane concentration tetraalkyl ammonium ion and remove precipitate, and concentrated solution is carried out ion-exchange and refines, reclaim TAAH.
Prior art literature
Patent documentation
Patent documentation 1: Japanese Unexamined Patent Publication 2002-253931 publication
Summary of the invention
[inventing the problem to be solved]
In the treatment process of the development of photoresist waste water of above-mentioned patent documentation 1, adding acid, photo-resist is not dissolved, and to RO unit feeding in development of photoresist waste water, membrane sepn is the condensed water containing precipitate and TAAH and passes through water. In this conventional method, have following problem.
() is added acid in development of photoresist waste water and is come adjust ph to 2��6, it is therefore necessary to neutralized through water by RO with alkali, it is necessary to there is alkaline agent (�� Le �� ��).
TAAH concentration height in () development of photoresist waste water, therefore, is easy on RO film and produces foundry loam obturation.
() if preventing foundry loam (slime) inaccessible and adding foundry loam preventing agent on RO device, then can be mixed into foundry loam preventing agent in condensed water, thus be difficult to from condensed water and reclaim TAAH. Therefore, it is difficult to utilize foundry loam preventing agent to prevent RO film inaccessible.
() due to the TAAH concentration height in waste water, a part of TAAH flows out to through in water through RO film. Therefore, RO is low through the water quality treatment of water.
It is an object of the invention to, the treatment process of a kind of development of photoresist waste water solving above-mentioned conventional problem is provided, it uses RO device, RO need not be neutralized through water with alkaline agent, can prevent or suppress the obstruction of the RO film caused because of foundry loam, and the RO film of good water quality can be obtained through water.
[solving the method for problem]
In the treatment process of the development of photoresist waste water of the present invention, after making development of photoresist waste water contact with Zeo-karb, carry out turbidity removal process, then carry out water flowing to reverse osmosis membrane device, obtain film through water.
Also can carry out the pH value adjustment for reducing pH value to process, and above-mentioned development of photoresist waste water is contacted with Zeo-karb.
Also after making above-mentioned development of photoresist waste water contact with Zeo-karb, and before turbidity removal processes, can carry out a biological disposal upon.
Biological treating tank is preferably the carrier fashion of thermopnore carrier or rocking type fixed bed carrier.
[invention effect]
In the present invention, first make development of photoresist waste water contact with Zeo-karb, the TAAH of the TMAH etc. in this waste water is adsorbed in this Zeo-karb. By fractionation by adsorption TAAH from this waste water, reduce the pH value of the water after cationic exchange, photo-resist is precipitated out. Processed the photo-resist removing precipitation by turbidity removal, turbidity removal is processed water to RO unit feeding. And then, this RO device is taken out as process water through water. For condensed water, condensed water treatment unit is utilized to process.
So, removed the water after TAAH and photo-resist to RO unit feeding, therefore, flow into RO device TOC(total organic carbon: TotalOrganicCarbon) constituent concentration become low, can prevent or suppress the foundry loam on RO film to produce.
In addition, the TAAH concentration in RO water supply is lower, and therefore RO is good through the water quality of water through also not leaking TAAH, RO in water completely or almost. Moreover, in a general case, the pH value of the process water of above-mentioned Zeo-karb is about 5��8, need not carry out alkaline agent neutralization.
By tetraalkyl ammonium ion (TAA will be adsorbed with+) Zeo-karb carry out manipulation of regeneration, reclaim TAA+��
By after making photo-resist contact with Zeo-karb, and before turbidity removal processes, carry out a biological disposal upon, decompose dissolved organic matter, it is to increase RO is through the water quality of water.
By biological treating tank being set to thermopnore carrier or the carrier fashion of rocking type fixed bed carrier, prevent the obturation owing to photo-resist precipitate causes.
Accompanying drawing explanation
Fig. 1 is the skeleton diagram that embodiment 1 is described.
Fig. 2 is the skeleton diagram that comparative example 1 is described.
Fig. 3 is the skeleton diagram that comparative example 2 is described.
Fig. 4 is the skeleton diagram that embodiment 2 is described.
Fig. 5 is the skeleton diagram that embodiment 3 is described.
Fig. 6 is the skeleton diagram that embodiment 4 is described.
Embodiment
Below, the present invention will be described in more detail.
The present invention using the development of photoresist waste water containing TAAH as handling object. Resist is made up of resist polymkeric substance, sensitizer, solvent, additive. As resist polymkeric substance, can enumerate, such as phenolic varnish (novolac) to be resin, phenol (phenol) be resin, poly-be resin to hydroxyl vinylbenzene (polyparahydroxystyrene). These materials, in the neutral region of pH value, are insoluble in water. The development of photoresist waste water of the handling object of the present invention, containing above-mentioned resist polymkeric substance.
As TAAH, can enumerate: tetramethyl ammonium hydroxide (TMAH), tetraethylammonium hydroxide base ammonium, tetrapropylammonium hydroxide, tetrabutylammonium, hydroxide methyl triethyl ammonium, hydroxide ethyl ammonium, dimethyl diethyl ammonium, hydroxide (2-hydroxyethyl) ammonium, triethyl (2-hydroxyethyl) ammonium, dimethyl two (2-hydroxyethyl) ammonium, hydroxide diethyl two (2-hydroxyethyl) ammonium, hydroxide methyl three (2-hydroxyethyl) ammonium, hydroxide ethyl three (2-hydroxyethyl) ammonium, hydroxide four (2-hydroxyethyl) ammonium etc. wherein, it is preferable that the material insoluble when pH value is less than 11, it is particularly preferred to TMAH.
Moreover, under usual situation, TAAH concentration in development of photoresist waste water is the concentration of 200��30000mg/L(TOC is 100��150000mg/L) left and right, if the waste water of the TAAH concentration of this scope of the present invention or TOC concentration, then all can fully process. The pH value of this development of photoresist waste water is about more than 10 mostly.
In the present invention, by this development of photoresist waste water, the pH value for reducing pH value need not be carried out and adjusts, such as, directly or as required filter, such as, by utilizing UF(ultrafiltration: after Ultrafiltration) membrane filtration etc. remove turbidity composition, contact with Zeo-karb, make TAA+It is adsorbed in Zeo-karb. SV(sludge settling ratio now: sludgevolume) etc. treatment condition, can test according to the TAAH concentration etc. in waste water, and suitably determined. Moreover, it is preferred that selecting after contacting with Zeo-karb, the TOC concentration in water is the condition of 1��below 20mg/L left and right.
Being processed by this cationic exchange, remove TAAH, reduce the pH value of water, usual pH value is 4��9, it is particularly preferred to be about 5��8. Therefore, photo-resist contained in waste water is at least partially, normally most of insoluble and precipitate out.
Therefore, in the present invention, the water containing this precipitate directly or is carried out a biological disposal upon, and then, carries out turbidity removal process, and removes precipitate. By carrying out a biological disposal upon, the not removed dissolved organic matters such as RO or UF are decomposed, it is to increase RO is through the water quality of water. As the mode of biological treatment, it is preferable that the carrier fashion that the obturation that resist precipitate causes can not be produced of so-called thermopnore or rocking type fixed bed (bed that a part for the carrier of such as restrict shape, plate shape etc. is fixed in groove). PH value during biological treatment, it is preferred that biology is easy to the pH value of breeding, namely about 4��9.
As the device processed for this turbidity removal, UF film device, the micro-filter of MF(: Microfiltration can be enumerated) film device, filtration unit, aggegation settler, settler, aggegation suspension device, suspension device etc., it is preferred that UF film device or MF film device. Moreover, due to a part of gelatinizing of the resist of precipitation, and through MF film, therefore compared with MF film, it is preferable that molecular weight cut-off (molecularweightcutoff) is less than 500,000, the UF film of such as 100,000��about 500,000.
Before carrying out this turbidity removal and processing, it is preferable that pH value is adjusted to 4��9, makes photo-resist precipitate precipitate out.
This turbidity removal is processed water to RO unit feeding, it is separated into condensed water with through water. Lower to the TAAH concentration in the water supply of RO device, therefore, RO does not leak completely or almost through TAAH in water, and RO is good through the water quality of water. In addition, owing to the TOC concentration in RO water supply is lower, therefore, it is possible to prevent or suppress the foundry loam of RO film to produce. Even if generation foundry loam, it is possible to add foundry loam preventing agent and prevent foundry loam. RO, not through RO film, is not affected by this foundry loam preventing agent through the water quality of water.
The photo-resist constituent concentration that RO supplies water is lower, therefore, the pH value that RO supplies water is not particularly limited.
About RO condensed water, process by drainage treatment equipment.
The TAA of absorption on Zeo-karb+, by being undertaken regenerating reclaiming by this Zeo-karb.
[embodiment]
Embodiment and comparative example are below described.
[embodiment 1]
As shown in Figure 1, using containing as the TMAH of TAAH, pH value be 11, the development of photoresist waste water (waste water of electronic component manufacturing step) of TOC concentration to be 126mg/L, electric conductivity be 46mS/m, in the condition of SV32, water flowing is carried out to Zeo-karb (CER) tower, then, to MF film device (Millipore company manufacture HAWP(trade name)) water flowing carries out turbidity removal. The pH value of this MF film process water is 5, it is not necessary to utilize neutralizing agent to carry out neutralizing treatment. This MF film is processed water to RO device (the ES-20(trade name that day east electrician (company) manufactures)) supply, obtain through water. Zeo-karb is processed water, MF film process water and RO and is shown in table 1 through the TOC concentration of water and electric conductivity. Moreover, RO supplies water the BOD(biochemical oxygen demand (BOD) of (i.e. MF film process water): biochemicaloxygendemand) for below 5.0ppm, MFF value be 1.04.
MFF value be the membrane filterability (fouling membrane) of the water as membrane separation (film for feedwater) index and value. This MFF values determination method is as follows.
() carries out aggegation process by Beaker Test (jartest), obtains the aggegation process water of more than 1000ml.
Aggegation is processed water and leaves standstill 30 minutes by (), and aggegation flocs unit (flocculation) is precipitated.
() is by the aggegation process water No.5A(5 ��m of hole of ()) filter paper slow filtration from supernatant liquor, the aggegation process water containing aggegation flocs unit the most at last all filters.
() respectively gets 500ml from the filtrate of more than the 1000ml obtained, and is respectively charged in two graduated cylinders.
() is by the 500ml filtrate of first graduated cylinder, it may also be useful to aperture is 0.45 ��m, diameter be 47mm soluble cotton manufacture membrane filter, at 66kPa(500mmHg) under carry out filtration under diminished pressure, measure the time T1 required for this filtration. Then, the 500ml filtrate of another one graduated cylinder is carried out filtration under diminished pressure equally, measure the time T2 required for filtration now.
() calculates MFF value with following formula.
MFF=T2/T1
MFF value is more close to about 1.00, and more can being evaluated as film for feedwater is the water of good water quality, is the water being difficult to polluted membrane. Generally speaking, MFF value less than 1.1 is suitable as film for feedwater. Such as, the MFF of tap water (Japan's wood county wild wood raised path between farm fields raised path between farm fields water) is 1.03��1.06, is on average 1.05.
[comparative example 1]
Identical with embodiment 1, development of photoresist waste water is processed according to the working order same with above-mentioned patent documentation 1.
As shown in Figure 2, that is, it is after 6 by this waste water sulfuric acid adjust ph, carries out water flowing to above-mentioned MF film device, to above-mentioned RO device water flowing. RO supplies water and RO is shown in table 1 through the TOC concentration of water and electric conductivity. Moreover, the BOD that RO supplies water is 77ppm.
Table 1
As mentioned above, it is necessary, according to embodiment 1 it will be seen that compared with comparative example 1, RO water supply and RO are obviously excellent through TOC concentration and the BOD concentration of water, and RO is good through the water quality of water, and the foundry loam that also can prevent RO film produces.
[comparative example 2]
As shown in Figure 3, in comparative example 1, except carrying out turbidity removal without MF film, all the other carry out equally, are processed by development of photoresist waste water, but RO film produces inaccessible. The RO of comparative example 2 supplies water, and membrane filterability difference is to the degree that can not measure MFF value.
[embodiment 2]
As shown in Figure 4, in embodiment 1, except replacing MF film with the UF film of molecular weight cut-off 300,000, all the other carry out all equally, are processed by development of photoresist waste water, and the cleaning frequency of result RO film is 9 months is once enough. Moreover, in above-described embodiment 1, the cleaning frequency of RO film be 3 months once. Therefore, as turbidity removal film, compared with MF film, it is preferable that UF film.
The RO of embodiment 2 is 1.0mg/L through the TOC concentration of water.
[embodiment 3]
As shown in Figure 5, in example 2, after being carried out a biological disposal upon by Zeo-karb process water, carrying out beyond UF film process, all the other process equally. Biological treating tank is thermopnore mode. Its result is that to pass through the TOC concentration of water be 0.5mg/L to RO, lower than embodiment 2. The water that passes through of this water quality can be used for manufacturing pure water. This biological treating tank, during more than two weeks, it does not have occur to have operated inaccessiblely.
[embodiment 4]
As shown in Figure 6, in embodiment 3, except biological treating tank is not thermopnore biological treating tank, but beyond fixed bed biological treating tank, all the other have processed all equally. Under this situation, adhering to resist on the bio-carrier layer of biological treating tank, during about two weeks, biological treating tank there occurs obturation.
Those skilled in the art clearly, although using specific mode to invention has been detailed explanation, but when not deviateing the intent of the present invention and scope, can carry out various change.
Moreover, the Japanese patent application (Japanese Patent Application 2011-064368) that the application proposed according on March 23rd, 2011 proposes, and now its entirety is quoted by way of reference so far.
Claims (6)
1. the treatment process of a development of photoresist waste water, it is characterised in that,
It is after making development of photoresist waste water contact with Zeo-karb, be supplied to when pH value is 5��8 molecular weight cut-off be 100,000��500,000 ultra-filtration membrane carry out turbidity removal process, then to reverse osmosis membrane device water flowing, obtain film through water,
Further, the pH value of development of photoresist waste water is more than 10, the concentration of tetraalkylammonium hydroxide is 200��30000mg/L, the concentration of TOC is 100��150000mg/L,
Further, cationic exchange process after the pH value of water be 5��8, the concentration of TOC be 1��20mg/L,
Further, containing resist polymkeric substance in development of photoresist waste water, this resist polymkeric substance is selected from phenolic varnish system resin, benzene phenol resin, gathers hydroxyl phenylethylene resin series.
2. the treatment process of development of photoresist waste water as claimed in claim 1, wherein, need not carry out the pH value adjustment for reducing pH value and process, development of photoresist waste water is contacted with Zeo-karb.
3. the treatment process of development of photoresist waste water as claimed in claim 1, wherein, photo-resist is the material insoluble when pH value is less than 11.
4. the treatment process of development of photoresist waste water as claimed in claim 2, wherein, photo-resist is the material insoluble when pH value is less than 11.
5. the treatment process of development of photoresist waste water as according to any one of Claims 1 to 4, wherein, after contacting with Zeo-karb, and before turbidity removal processes, carries out a biological disposal upon.
6. the treatment process of development of photoresist waste water as claimed in claim 5, wherein, it may also be useful to thermopnore carrier or rocking type fixed bed carrier, carry out above-mentioned biological treatment.
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2011-064368 | 2011-03-23 | ||
| JP2011064368 | 2011-03-23 | ||
| PCT/JP2012/056365 WO2012128119A1 (en) | 2011-03-23 | 2012-03-13 | Treatment method for photoresist development wastewater |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| CN103443032A CN103443032A (en) | 2013-12-11 |
| CN103443032B true CN103443032B (en) | 2016-06-01 |
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| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201280014650.0A Expired - Fee Related CN103443032B (en) | 2011-03-23 | 2012-03-13 | The treatment process of development of photoresist waste water |
Country Status (5)
| Country | Link |
|---|---|
| JP (1) | JPWO2012128119A1 (en) |
| KR (1) | KR20130125387A (en) |
| CN (1) | CN103443032B (en) |
| TW (1) | TWI457290B (en) |
| WO (1) | WO2012128119A1 (en) |
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| JP2021171704A (en) * | 2020-04-24 | 2021-11-01 | ニプロ株式会社 | Waste fluid pretreatment method and pretreatment system |
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| US5439564A (en) * | 1992-11-10 | 1995-08-08 | Tama Chemicals Co. Ltd. | Method of processing organic quaternary ammonium hydroxide-containing waste liquid |
| CN1504414A (en) * | 2002-11-29 | 2004-06-16 | 长濑产业株式会社 | Regeneration device and method for waste developing solution |
| JP2006095363A (en) * | 2004-09-28 | 2006-04-13 | Kurita Water Ind Ltd | Treatment apparatus of wastewater containing organic nitrogen compound |
| CN101111804A (en) * | 2004-11-30 | 2008-01-23 | 株式会社德山 | Method for treating development waste liquid |
| JP2009233607A (en) * | 2008-03-27 | 2009-10-15 | Kurita Water Ind Ltd | Method and apparatus for recovering phosphoric acid from phosphoric acid-containing water |
| JP2010017614A (en) * | 2008-07-08 | 2010-01-28 | Kurita Water Ind Ltd | Method and apparatus for treating organic wastewater |
Family Cites Families (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2730610B2 (en) * | 1992-11-10 | 1998-03-25 | 多摩化学工業株式会社 | Method for treating wastewater containing organic quaternary ammonium hydroxide |
| JP3671644B2 (en) * | 1998-01-05 | 2005-07-13 | オルガノ株式会社 | Photoresist developing waste liquid recycling method and apparatus |
| TWI399360B (en) * | 2009-07-14 | 2013-06-21 | Recovery equipment for tetramethylammonium hydroxide and its method |
-
2012
- 2012-03-13 KR KR20137022233A patent/KR20130125387A/en not_active Application Discontinuation
- 2012-03-13 JP JP2013505909A patent/JPWO2012128119A1/en active Pending
- 2012-03-13 WO PCT/JP2012/056365 patent/WO2012128119A1/en active Application Filing
- 2012-03-13 CN CN201280014650.0A patent/CN103443032B/en not_active Expired - Fee Related
- 2012-03-20 TW TW101109490A patent/TWI457290B/en not_active IP Right Cessation
Patent Citations (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US5439564A (en) * | 1992-11-10 | 1995-08-08 | Tama Chemicals Co. Ltd. | Method of processing organic quaternary ammonium hydroxide-containing waste liquid |
| CN1504414A (en) * | 2002-11-29 | 2004-06-16 | 长濑产业株式会社 | Regeneration device and method for waste developing solution |
| JP2006095363A (en) * | 2004-09-28 | 2006-04-13 | Kurita Water Ind Ltd | Treatment apparatus of wastewater containing organic nitrogen compound |
| CN101111804A (en) * | 2004-11-30 | 2008-01-23 | 株式会社德山 | Method for treating development waste liquid |
| JP2009233607A (en) * | 2008-03-27 | 2009-10-15 | Kurita Water Ind Ltd | Method and apparatus for recovering phosphoric acid from phosphoric acid-containing water |
| JP2010017614A (en) * | 2008-07-08 | 2010-01-28 | Kurita Water Ind Ltd | Method and apparatus for treating organic wastewater |
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| WO2012128119A1 (en) | 2012-09-27 |
| KR20130125387A (en) | 2013-11-18 |
| CN103443032A (en) | 2013-12-11 |
| JPWO2012128119A1 (en) | 2014-07-24 |
| TW201245053A (en) | 2012-11-16 |
| TWI457290B (en) | 2014-10-21 |
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