CN103443032A - Treatment method for photoresist development wastewater - Google Patents
Treatment method for photoresist development wastewater Download PDFInfo
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- CN103443032A CN103443032A CN2012800146500A CN201280014650A CN103443032A CN 103443032 A CN103443032 A CN 103443032A CN 2012800146500 A CN2012800146500 A CN 2012800146500A CN 201280014650 A CN201280014650 A CN 201280014650A CN 103443032 A CN103443032 A CN 103443032A
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- C—CHEMISTRY; METALLURGY
- C02—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F1/00—Treatment of water, waste water, or sewage
- C02F1/42—Treatment of water, waste water, or sewage by ion-exchange
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01D—SEPARATION
- B01D61/00—Processes of separation using semi-permeable membranes, e.g. dialysis, osmosis or ultrafiltration; Apparatus, accessories or auxiliary operations specially adapted therefor
- B01D61/58—Multistep processes
-
- C—CHEMISTRY; METALLURGY
- C02—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F1/00—Treatment of water, waste water, or sewage
- C02F1/44—Treatment of water, waste water, or sewage by dialysis, osmosis or reverse osmosis
- C02F1/441—Treatment of water, waste water, or sewage by dialysis, osmosis or reverse osmosis by reverse osmosis
-
- C—CHEMISTRY; METALLURGY
- C02—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F1/00—Treatment of water, waste water, or sewage
- C02F1/44—Treatment of water, waste water, or sewage by dialysis, osmosis or reverse osmosis
- C02F1/444—Treatment of water, waste water, or sewage by dialysis, osmosis or reverse osmosis by ultrafiltration or microfiltration
-
- C—CHEMISTRY; METALLURGY
- C02—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F3/00—Biological treatment of water, waste water, or sewage
- C02F3/02—Aerobic processes
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01D—SEPARATION
- B01D61/00—Processes of separation using semi-permeable membranes, e.g. dialysis, osmosis or ultrafiltration; Apparatus, accessories or auxiliary operations specially adapted therefor
- B01D61/02—Reverse osmosis; Hyperfiltration ; Nanofiltration
- B01D61/025—Reverse osmosis; Hyperfiltration
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01D—SEPARATION
- B01D61/00—Processes of separation using semi-permeable membranes, e.g. dialysis, osmosis or ultrafiltration; Apparatus, accessories or auxiliary operations specially adapted therefor
- B01D61/14—Ultrafiltration; Microfiltration
- B01D61/147—Microfiltration
-
- C—CHEMISTRY; METALLURGY
- C02—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F1/00—Treatment of water, waste water, or sewage
- C02F1/42—Treatment of water, waste water, or sewage by ion-exchange
- C02F2001/425—Treatment of water, waste water, or sewage by ion-exchange using cation exchangers
-
- C—CHEMISTRY; METALLURGY
- C02—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F2103/00—Nature of the water, waste water, sewage or sludge to be treated
- C02F2103/34—Nature of the water, waste water, sewage or sludge to be treated from industrial activities not provided for in groups C02F2103/12 - C02F2103/32
- C02F2103/40—Nature of the water, waste water, sewage or sludge to be treated from industrial activities not provided for in groups C02F2103/12 - C02F2103/32 from the manufacture or use of photosensitive materials
-
- C—CHEMISTRY; METALLURGY
- C02—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F2303/00—Specific treatment goals
- C02F2303/20—Prevention of biofouling
-
- C—CHEMISTRY; METALLURGY
- C02—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F3/00—Biological treatment of water, waste water, or sewage
- C02F3/02—Aerobic processes
- C02F3/06—Aerobic processes using submerged filters
-
- C—CHEMISTRY; METALLURGY
- C02—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F3/00—Biological treatment of water, waste water, or sewage
- C02F3/02—Aerobic processes
- C02F3/08—Aerobic processes using moving contact bodies
- C02F3/085—Fluidized beds
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- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02W—CLIMATE CHANGE MITIGATION TECHNOLOGIES RELATED TO WASTEWATER TREATMENT OR WASTE MANAGEMENT
- Y02W10/00—Technologies for wastewater treatment
- Y02W10/10—Biological treatment of water, waste water, or sewage
Abstract
A treatment method for photoresist development wastewater that uses an RO device, wherein there is no need for neutralizing the RO permeate with an alkaline chemical, blockage of the RO membrane by slime is prevented or limited, and RO membrane permeate of good water quality can be obtained. After being brought into contact with a cation exchange resin without adjusting the pH, the photoresist development wastewater is clarified using an MF membrane device, etc. and then passed through a reverse osmosis membrane device to obtain the membrane permeate.
Description
Technical field
The present invention relates to the treatment process of a kind of photo-resist (photo resist) development waste-water, especially relate to the treatment process of a kind of use reverse osmosis membrane device (RO device).
Background technology
When manufacturing electronic units such as semiconducter device, liquid-crystal display, printed base plate etc., form the tunicle of photo-resist on the substrates such as wafer (wafer), utilize pattern mask (pattern mask) to irradiate light etc., then, utilize the unwanted photo-resist of developing solution dissolution, developed, and then carry out the processing such as etching, then, peel off the insoluble photoresist film on substrate.Photo-resist, positive light anti-etching agent and exposed portion that to be divided into exposed portion be solubility are insoluble negative type photoresist.Developing solution as positive light anti-etching agent, mainly contain alkaline-based developer.As the developing solution of negative type photoresist, being mainly organic solvent is developing solution, but the alkaline-based developer of use person is also arranged.
As above-mentioned alkaline-based developer, use for example tetraalkylammonium hydroxide (Tetra alkyl ammonium hydroxide, TAAH), especially use tetramethyl ammonium hydroxide (Tetra methyl ammonium hydroxide, TMAH).In the waste water (development of photoresist waste water) that cleaning step after this development step or development is discharged, usually contain respectively about tens to 20000ppm tetraalkyl ammonium ion, and concentration is generally the various resist overburdens that are derived from photoresist of the mixture of quinone two nitrine (quinonediazido) that use as resist of about 10～1000ppm and phenol novolac resin (phenol novolac) resin or condenses (photolysis type photo-resist) etc.
Put down in writing a kind of method in patent documentation 1, it is to add acid in the development of photoresist waste liquid, make pH value be reduced to 2～6 separate out photo-resist after, use RO membrane concentration tetraalkyl ammonium ion and remove precipitate, and concentrated solution is carried out to ion-exchange and make with extra care, reclaim TAAH.
The prior art document
Patent documentation
Patent documentation 1: TOHKEMY 2002-253931 communique
Summary of the invention
[problem that invention will solve]
In the treatment process of the development of photoresist waste water of above-mentioned patent documentation 1, add acid in development of photoresist waste water, photo-resist is not dissolved, and, to the RO unit feeding, membrane sepn is the condensed water that contains precipitate and TAAH and see through water.In this method in the past, have following problem.
(I) added acid and regulated pH value to 2～6 in development of photoresist waste water, therefore, must see through water to RO with alkali and be neutralized, and alkaline agent (ア Le カ リ drug) must be arranged.
TAAH concentration in (II) development of photoresist waste water is high, therefore, is easy to produce the foundry loam obturation on the RO film.
(III) if prevent that foundry loam (slime) is inaccessible and add the foundry loam preventing agent on the RO device, can in condensed water, sneak into the foundry loam preventing agent, thereby be difficult to reclaim TAAH from condensed water.Therefore, be difficult to utilize the foundry loam preventing agent to prevent RO film obturation.
, because the TAAH concentration in waste water is high, the part of TAAH sees through the RO film and flows out to through in water (IV).Therefore, RO is low through the water quality treatment of water.
The object of the invention is to, a kind for the treatment of process that has solved the development of photoresist waste water of above-mentioned problem in the past is provided, it uses the RO device, see through water with RO in need not coming with alkaline agent, can prevent or suppress the obstruction of the RO film that causes because of foundry loam, and the RO film that can obtain good water quality sees through water.
[solving the method for problem]
In the treatment process of development of photoresist waste water of the present invention, after making development of photoresist waste water and Zeo-karb contacts, carry out the turbidity removal processing, then to the reverse osmosis membrane device, carry out water flowing, obtain film and see through water.
Also can carry out processing for reducing the pH value adjustment of pH value, and above-mentioned development of photoresist waste water is contacted with Zeo-karb.
Also can be after making above-mentioned development of photoresist waste water and Zeo-karb contact, and, before turbidity removal is processed, carried out a biological disposal upon.
Biological treating tank is the carrier fashion of thermopnore carrier or rocking type fixed bed carrier preferably.
[invention effect]
In the present invention, at first make development of photoresist waste water contact with Zeo-karb, the TAAH of TMAH in this waste water etc. is adsorbed in to this Zeo-karb.By fractionation by adsorption TAAH from this waste water, the pH value of the water after the reduction cationic exchange, separate out photo-resist.Process to remove the photo-resist of separating out by turbidity removal, turbidity removal is processed to water to the RO unit feeding.And then, this RO device is seen through to water and take out as processing water.For condensed water, utilize the condensed water treatment unit to be processed.
So, to the RO unit feeding, removed the water after TAAH and photo-resist, therefore, flowed into the TOC(total organic carbon of RO device: Total Organic Carbon) constituent concentration step-down, the foundry loam that can prevent or suppress on the RO film produces.
In addition, the TAAH concentration during RO supplies water is lower, so RO sees through in water and also do not leak TAAH fully or almost, and it is good that RO sees through the water quality of water.Moreover under common situation, the pH value of the processing water of above-mentioned Zeo-karb is 5～8 left and right, need not carry out the alkaline agent neutralization.
Can be by absorption being had to tetraalkyl ammonium ion (TAA
+) Zeo-karb carry out manipulation of regeneration, reclaim TAA
+.
Can be by after making photo-resist and Zeo-karb contact, and, before turbidity removal is processed, carried out a biological disposal upon, decompose dissolved organic matter, improve the water quality that RO sees through water.
Can, by biological treating tank being made as to the carrier fashion of thermopnore carrier or rocking type fixed bed carrier, prevent the obturation caused due to the photo-resist precipitate.
The accompanying drawing explanation
Fig. 1 is the skeleton diagram of explanation embodiment 1.
Fig. 2 is the skeleton diagram of explanation comparative example 1.
Fig. 3 is the skeleton diagram of explanation comparative example 2.
Fig. 4 is the skeleton diagram of explanation embodiment 2.
Fig. 5 is the skeleton diagram of explanation embodiment 3.
Fig. 6 is the skeleton diagram of explanation embodiment 4.
Embodiment
Below, the present invention will be described in more detail.
The present invention will contain the development of photoresist waste water of TAAH as processing object.Resist consists of resist polymkeric substance, sensitizer, solvent, additive.As the resist polymkeric substance, can enumerate, for example phenolic varnish (novolac) be resin, phenol (phenol) be resin, poly-to oxybenzene ethene (polyparahydroxystyrene), be resin.These materials, at pH value neutral region, be insoluble in water.The development of photoresist waste water of processing object of the present invention, contain above-mentioned resist polymkeric substance.
As TAAH, can enumerate: tetramethyl ammonium hydroxide (TMAH), tetraethyl ammonium hydroxide, tetrapropylammonium hydroxide, tetrabutylammonium, hydroxide methyl triethyl ammonium, hydroxide trimethylammonium ethyl ammonium, hydroxide dimethyl diethyl ammonium, hydroxide trimethylammonium (2-hydroxyethyl) ammonium, hydroxide triethyl (2-hydroxyethyl) ammonium, hydroxide dimethyl two (2-hydroxyethyl) ammonium, hydroxide diethyl two (2-hydroxyethyl) ammonium, hydroxide methyl three (2-hydroxyethyl) ammonium, hydroxide ethyl three (2-hydroxyethyl) ammonium, hydroxide four (2-hydroxyethyl) ammonium etc.Wherein, in the pH value, be preferably 11 insoluble material when following, particularly preferably TMAH.
Moreover, usually under situation, the concentration that TAAH concentration in development of photoresist waste water is 200～30000mg/L(TOC is 100～150000mg/L) left and right, if the waste water of the TAAH concentration of this scope of the present invention or TOC concentration all can fully be processed.The pH value of this development of photoresist waste water is left and right more than 10 mostly.
In the present invention, need not, by this development of photoresist waste water, carry out adjusting for reducing the pH value of pH value, for example, filter directly or as required, such as by utilizing the UF(ultrafiltration: Ultrafiltration) after membrane filtration etc. is removed turbid matter composition, contact with Zeo-karb, make TAA
+be adsorbed in Zeo-karb.SV(sludge settling ratio now: sludge volume) treatment condition such as, can be tested according to TAAH concentration in waste water etc., and suitably be determined.Moreover, preferably be chosen in after Zeo-karb contacts the condition that the TOC concentration in water is the following left and right of 1～20mg/L.
Process by this cationic exchange, remove TAAH, reduce the pH value of water, the pH value is 4～9 usually, is particularly preferably 5～8 left and right.Therefore, at least a portion of contained photo-resist in waste water, normally most of insoluble and separate out.
Therefore, in the present invention, the water that contains this precipitate directly or carried out a biological disposal upon, then, carries out the turbidity removal processing, and removes precipitate.By being carried out a biological disposal upon, the not removed dissolved organic matter such as RO or UF is decomposed, improve the water quality that RO sees through water.As the mode of biological treatment, the carrier fashion that can not produce the obturation that the resist precipitate causes of preferred so-called thermopnore or rocking type fixed bed (part such as the carrier of rope shape, plate shape etc. is fixed in the bed in groove).PH value during biological treatment, the preferably biological pH value that is easy to breeding, i.e. 4～9 left and right.
As the device of processing for this turbidity removal, can enumerate UF film device, MF(micro-filtration: Microfiltration) film device, filtration unit, coagulation sedimentation device, settler, aggegation levitation device, levitation device etc., preferably UF film device or MF film device.Moreover, due to a part of gelatinizing of the resist of separating out, and see through the MF film, therefore with the MF film, compare, preferably molecular weight cut-off (molecular weight cutoff) is below 500,000, for example the UF film of 100,000～500,000 left and right.
Before carrying out this turbidity removal processing, preferably the pH value is adjusted into to 4～9, the photo-resist precipitate is separated out.
This turbidity removal is processed to water to the RO unit feeding, be separated into condensed water and see through water.TAAH concentration in the water supply of RO device is lower, and therefore, RO sees through TAAH in water and do not leak fully or almost, and RO is good through the water quality of water.In addition, because the TOC concentration in RO water supply is lower, therefore, the foundry loam that also can prevent or suppress the RO film produces.Even the generation foundry loam, also can add the foundry loam preventing agent and prevent foundry loam.This foundry loam preventing agent does not see through the RO film, RO is seen through to the not impact of water quality of water.
The photo-resist constituent concentration that RO supplies water is lower, and therefore, the pH value that RO is supplied water is not particularly limited.
About the RO condensed water, can be processed by drainage treatment equipment.
The TAA adsorbed on Zeo-karb
+, can be by this Zeo-karb be regenerated to reclaim.
[embodiment]
Embodiment and comparative example below are described.
[embodiment 1]
As shown in Figure 1, to contain TMAH, pH value as TAAH and be 11, TOC concentration is the development of photoresist waste water (waste water of electronic component manufacturing step) that 126mg/L, electric conductivity are 46mS/m, condition at SV32, carry out water flowing to Zeo-karb (CER) tower, then, to MF film device (Millipore company manufacture HAWP(trade name)) water flowing carries out turbidity removal.The pH value that this MF film is processed water is 5, needn't utilize neutralizing agent to carry out neutralizing treatment.This MF film is processed to water to RO device (the ES-20(trade name of day eastern electrician (company) manufacture)) supply with, obtain and see through water.Zeo-karb is processed to water, MF film to be processed TOC concentration and the conductivity meter that water and RO see through water and is shown in table 1.Moreover the BOD(biochemical oxygen demand (BOD) of RO water supply (being that the MF film is processed water): biochemical oxygen demand), for below 5.0ppm, the MFF value is 1.04.
The MFF value be water as membrane separation (film is for feedwater) membrane filterability (film contaminative) index and value.This MFF values determination method is as follows.
(I) tested (jar test) by beaker and carried out the aggegation processing, obtains the above aggegation of 1000ml and processes water.
(II) processes water standing 30 minutes by aggegation, makes aggegation flocs unit (flocculation) precipitation.
(III) processes water with No.5A(5 μ m hole by the aggegation of (II)) filter paper starts slow filtration from supernatant liquor, and the aggegation processing water that contains the most at last the aggegation flocs unit is all filtered.
Respectively get 500ml (IV) filtrate more than obtained 1000ml, be respectively charged in two graduated cylinders.
(V) by the 500ml filtrate of first graduated cylinder, and using aperture is 0.45 μ m, and the membrane filter that the soluble cotton that diameter is 47mm is manufactured, at 66kPa(500mmHg) under carry out filtration under diminished pressure, measure this and filter needed time T 1.Then, the 500ml filtrate of another one graduated cylinder is similarly carried out to filtration under diminished pressure, measure the needed time T 2 of filtration now.
(VI) calculates the MFF value with following formula.
MFF＝T2/T1
The MFF value more approaches 1.00 left and right, and more can be evaluated as film is the water of good water quality for feedwater, is the water that is difficult to polluted membrane.Generally speaking, the MFF value is suitable as film for feedwater below 1.1.For example, the MFF of tap water (the wild wooden raised path between farm fields raised path between farm fields water in Tochigi County, Japan) is 1.03～1.06, average out to 1.05.
[comparative example 1]
Identical with embodiment 1, by development of photoresist waste water according to being processed with the same working order of above-mentioned patent documentation 1.
That is, as shown in Figure 2, after this waste water is 6 with the sulphur acid for adjusting pH value, carry out water flowing to above-mentioned MF film device, to the water flowing of above-mentioned RO device.TOC concentration and conductivity meter that RO water supply and RO see through water are shown in table 1.Moreover the BOD that RO supplies water is 77ppm.
Table 1
As mentioned above, known according to embodiment 1, with comparative example 1, to compare, TOC concentration and BOD concentration that RO water supply and RO see through water are obviously excellent, and RO is good through the water quality of water, and also can prevent that the foundry loam of RO film from producing.
[comparative example 2]
As shown in Figure 3, in comparative example 1, except carry out turbidity removal without the MF film, all the other similarly carry out, and development of photoresist waste water is processed, but the RO film produce obturation.The RO of comparative example 2 supplies water, the poor degree to not measuring the MFF value of membrane filterability.
[embodiment 2]
As shown in Figure 4, in embodiment 1, except the UF film with molecular weight cut-off 300,000 replaces the MF film, all the other all similarly carry out, and development of photoresist waste water is processed, and the cleaning frequency of RO film is within 9 months, to be once enough as a result.Moreover, in above-described embodiment 1, the cleaning frequency of RO film be 3 months once.Therefore, as the turbidity removal film, with the MF film, compare, preferably the UF film.
The TOC concentration that the RO of embodiment 2 sees through water is 1.0mg/L.
[embodiment 3]
As shown in Figure 5, in embodiment 2, after Zeo-karb processing water is carried out a biological disposal upon, carry out beyond the processing of UF film, all the other are processed equally.Biological treating tank is the thermopnore mode.Consequently RO is 0.5mg/L through the TOC concentration of water, lower than embodiment 2.The water that sees through of this water quality can be used for manufacturing pure water.This biological treating tank during more than two weeks, does not occur to turn round inaccessiblely.
[embodiment 4]
As shown in Figure 6, in embodiment 3, except biological treating tank is not the thermopnore biological treating tank, but, beyond the fixed bed biological treating tank, all the other are all similarly processed.Under this situation, on the bio-carrier layer of biological treating tank, adhere to resist, during about two weeks, obturation has occurred in biological treating tank.
Those skilled in the art are clear and definite, although use specific mode to have been described in detail the present invention, under the situation that does not depart from the intent of the present invention and scope, can carry out various variations.
Moreover the application proposes according to the Japanese patent application (Japanese Patent Application 2011-064368) that on March 23rd, 2011 proposes, the mode showed its integral body is by reference quoted so far.
Claims (6)
1. the treatment process of a development of photoresist waste water, is characterized in that, it,, after making development of photoresist waste water and Zeo-karb contacts, carries out the turbidity removal processing, then to the water flowing of reverse osmosis membrane device, obtains film and see through water.
2. the treatment process of development of photoresist waste water as claimed in claim 1, wherein, need not carry out processing for reducing the pH value adjustment of pH value, and development of photoresist waste water is contacted with Zeo-karb.
3. the treatment process of development of photoresist waste water as claimed in claim 1 or 2, wherein, photo-resist is to be 11 insoluble materials when following in the pH value.
4. the treatment process of development of photoresist waste water as described as any one in claim 1～3, wherein, separator for removing dirt is ultra-filtration membrane.
5. the treatment process of development of photoresist waste water as described as any one in claim 1～4, wherein, with after Zeo-karb contacts, and, before turbidity removal is processed, carried out a biological disposal upon.
6. the treatment process of development of photoresist waste water as claimed in claim 5, wherein, used thermopnore carrier or rocking type fixed bed carrier, carries out above-mentioned biological treatment.
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2011-064368 | 2011-03-23 | ||
| JP2011064368 | 2011-03-23 | ||
| PCT/JP2012/056365 WO2012128119A1 (en) | 2011-03-23 | 2012-03-13 | Treatment method for photoresist development wastewater |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| CN103443032A true CN103443032A (en) | 2013-12-11 |
| CN103443032B CN103443032B (en) | 2016-06-01 |
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ID=46879271
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| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201280014650.0A Expired - Fee Related CN103443032B (en) | 2011-03-23 | 2012-03-13 | The treatment process of development of photoresist waste water |
Country Status (5)
| Country | Link |
|---|---|
| JP (1) | JPWO2012128119A1 (en) |
| KR (1) | KR20130125387A (en) |
| CN (1) | CN103443032B (en) |
| TW (1) | TWI457290B (en) |
| WO (1) | WO2012128119A1 (en) |
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| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2021171704A (en) * | 2020-04-24 | 2021-11-01 | ニプロ株式会社 | Waste fluid pretreatment method and pretreatment system |
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| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US5439564A (en) * | 1992-11-10 | 1995-08-08 | Tama Chemicals Co. Ltd. | Method of processing organic quaternary ammonium hydroxide-containing waste liquid |
| CN1504414A (en) * | 2002-11-29 | 2004-06-16 | 长濑产业株式会社 | Regeneration device and method for waste developing solution |
| JP2006095363A (en) * | 2004-09-28 | 2006-04-13 | Kurita Water Ind Ltd | Treatment apparatus of wastewater containing organic nitrogen compound |
| CN101111804A (en) * | 2004-11-30 | 2008-01-23 | 株式会社德山 | Method for treating development waste liquid |
| JP2009233607A (en) * | 2008-03-27 | 2009-10-15 | Kurita Water Ind Ltd | Method and apparatus for recovering phosphoric acid from phosphoric acid-containing water |
| JP2010017614A (en) * | 2008-07-08 | 2010-01-28 | Kurita Water Ind Ltd | Method and apparatus for treating organic wastewater |
Family Cites Families (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2730610B2 (en) * | 1992-11-10 | 1998-03-25 | 多摩化学工業株式会社 | Method for treating wastewater containing organic quaternary ammonium hydroxide |
| JP3671644B2 (en) * | 1998-01-05 | 2005-07-13 | オルガノ株式会社 | Photoresist developing waste liquid recycling method and apparatus |
| TWI399360B (en) * | 2009-07-14 | 2013-06-21 | Recovery equipment for tetramethylammonium hydroxide and its method |
-
2012
- 2012-03-13 WO PCT/JP2012/056365 patent/WO2012128119A1/en active Application Filing
- 2012-03-13 KR KR20137022233A patent/KR20130125387A/en not_active Application Discontinuation
- 2012-03-13 CN CN201280014650.0A patent/CN103443032B/en not_active Expired - Fee Related
- 2012-03-13 JP JP2013505909A patent/JPWO2012128119A1/en active Pending
- 2012-03-20 TW TW101109490A patent/TWI457290B/en not_active IP Right Cessation
Patent Citations (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US5439564A (en) * | 1992-11-10 | 1995-08-08 | Tama Chemicals Co. Ltd. | Method of processing organic quaternary ammonium hydroxide-containing waste liquid |
| CN1504414A (en) * | 2002-11-29 | 2004-06-16 | 长濑产业株式会社 | Regeneration device and method for waste developing solution |
| JP2006095363A (en) * | 2004-09-28 | 2006-04-13 | Kurita Water Ind Ltd | Treatment apparatus of wastewater containing organic nitrogen compound |
| CN101111804A (en) * | 2004-11-30 | 2008-01-23 | 株式会社德山 | Method for treating development waste liquid |
| JP2009233607A (en) * | 2008-03-27 | 2009-10-15 | Kurita Water Ind Ltd | Method and apparatus for recovering phosphoric acid from phosphoric acid-containing water |
| JP2010017614A (en) * | 2008-07-08 | 2010-01-28 | Kurita Water Ind Ltd | Method and apparatus for treating organic wastewater |
Also Published As
| Publication number | Publication date |
|---|---|
| CN103443032B (en) | 2016-06-01 |
| TWI457290B (en) | 2014-10-21 |
| KR20130125387A (en) | 2013-11-18 |
| WO2012128119A1 (en) | 2012-09-27 |
| JPWO2012128119A1 (en) | 2014-07-24 |
| TW201245053A (en) | 2012-11-16 |
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