CN103347363A - 间断粒子源 - Google Patents

间断粒子源 Download PDF

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CN103347363A
CN103347363A CN2013102405385A CN201310240538A CN103347363A CN 103347363 A CN103347363 A CN 103347363A CN 2013102405385 A CN2013102405385 A CN 2013102405385A CN 201310240538 A CN201310240538 A CN 201310240538A CN 103347363 A CN103347363 A CN 103347363A
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negative electrode
acceleration region
roll booster
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CN103347363B (zh
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肯尼思.加尔
格里特.T.兹沃克
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Maisheng Medical Equipment Co Ltd
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Mevion Medical Systems Inc
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Abstract

一种同步回转加速器包括用于向一腔提供磁场的磁性结构,用于向该腔提供等离子体柱的粒子源,其中该粒子源具有外壳以保持该等离子体柱,其中该外壳在加速区域处间断从而露出该等离子体柱。电压源配置成向该腔提供射频(RF)电压以在该加速区域处加速来自该等离子体柱的粒子。

Description

间断粒子源
本申请是申请日为2008年11月25日、申请号为200880125918.1、发明名称为“间断粒子源”的发明专利申请的分案申请。
技术领域
本专利申请描述了一种带有粒子源的粒子加速器,该粒子源在一加速区域被间断。
背景技术
为将带电粒子加速至高能,已开发出许多类型的粒子加速器。一种类型的粒子加速器是回转加速器。回转加速器藉由向真空室中的一个或多个D形电极施加交变电压而在轴向磁场中使带电粒子加速。名称D形电极(dee)是对早期回转加速器中电极形状的描述,虽然在某些回转加速器中其可能不像字母D。因加速粒子而产生的螺旋形路径垂直于磁场。在粒子以螺旋的方式向外离开时,在D形电极之间的间隙处施加一加速电场。该射频(RF)电压在D形电极之间的间隙两端形成一交变电场。将该RF电压和因此得到的电场同步化于磁场中的带电粒子的轨道周期,使得在粒子重复跨越间隙时被射频波形加速。粒子的能量增加到极大地超过所施加的RF电压的峰值电压的能量水平。当带电粒子加速时,其质量因相对论效应而增长。因此,带电粒子的加速改变了间隙处的相(phase)匹配。
目前所采用的两类回转加速器为等时型回转加速器和同步回转加速器,以不同的方式克服所加速粒子的相对质量增加这一挑战。等时型回转加速器将恒定频率的电压与随半径增加的磁场一起使用以保持正常的加速。同步回转加速器使用具有增加半径的降低磁场来提供轴向聚焦并且改变加速电压的频率以匹配由带电粒子的相对速度所引起的质量增加。
发明内容
总体地,本专利申请记载一种同步回转加速器,包括磁性结构,用于向一腔提供磁场;以及粒子源,用于向该腔提供等离子体柱。该粒子源具有外壳以保持该等离子体柱。该外壳在加速区域处间断从而露出该等离子体柱。电压源配置成向该腔提供射频(RF)电压以在该加速区域处加速来自该等离子体柱的粒子。上述同步回转加速器可包括一个或多个下述特征,单独或组合。
该磁场大于2特斯拉(T),粒子可从该等离子体柱以逐渐增加的半径采用螺旋的方式向外加速。该外壳包括两部分,这两部分在该加速区域处完全分离开从而露出该等离子体柱。该电压源可包括电连接到交变电压的第一D形电极(Dee)和电连接为接地的第二D形电极。该粒子源的至少一部分可穿过第二D形电极。该同步回转加速器可包括加速区域中的止挡,该止挡可用于阻挡来自该等离子体柱的至少一些粒子的加速。该止挡大致正交于该加速区域,并且可配置成阻挡来自于该等离子体柱的特定相的粒子。
该同步回转加速器可包括阴极,用于产生等离子体柱。该阴极可操作用于使电压脉冲化以使气体电离,从而产生等离子体柱。该阴极可配置成以约1kv到4kv之间的电压形成脉冲。该阴极不需要由外部热源加热。该同步回转加速器可包括电路,用于将来自RF电压的电压耦合到至少一个阴极。该电路包括电容电路。
该磁性结构包括磁轭。该电压源可包括电连接到交变电压的第一D形电极和电连接到接地的第二D形电极。该第一D形电极和该第二D形电极可形成可调节的共振电路。施加该磁场的该腔可包括容纳该可调节共振电路的共振腔。
总体地,这一专利申请也记载一种粒子加速器,包括:管,容纳气体;第一阴极,邻近于该管的第一端;以及第二阴极,邻近于该管的第二端。该第一阴极和该第二阴极向该管施加电压以由该气体形成等离子体柱。可从该等离子体柱中抽取粒子以进行加速。电路配置成将来自外部射频(RF)场的能量耦合到至少一个阴极。上述粒子加速器可包括一个或多个下述特征,单独或组合。
该管可在加速区域处间断,在该加速区域处从等离子体柱抽取粒子。该第一阴极和第二阴极不需要由外部热源加热。该第一阴极可处于该加速区域的不同于第二阴极的侧部上。
该粒子加速器可包括电压源,用于提供RF场。该RF场可用于在该加速区域处加速来自该等离子体柱的粒子。该能量可包括由该电压源所提供的该RF场的一部分。该电路包括电容器,用于将来自于外部场的能量耦合至第一阴极和第二阴极中的至少一个。
该管可包括在加速区域的间断点处完全分离开的第一部分和第二部分。该粒子加速器可包括在加速区域处的止挡。该止挡可用于阻挡至少一个相的粒子进行进一步加速。
该粒子加速器可包括电压源,用于向等离子体柱提供RF场。该RF场可用于在加速区域处加速来自等离子体柱的粒子。该RF场可包括小于15kv的电压。磁轭可用于提供跨过该加速区域的磁场。该磁场可大于约2特斯拉(T)。
总体地,该专利申请也记载一种粒子加速器,包括:Penning离子真空计(PIG)源,其包括在加速区域处至少部分分离开的第一管部和第二管部。该第一管部以及该第二管部用于包括延伸跨过该加速区域的等离子体柱。该电压源用于在加速区域处提供一电压。该电压用于在加速区域处使粒子加速离开该等离子体柱。上述粒子加速器可包括一个或多个下述特征,单独或组合。
第一管部和第二管部可以彼此完全地分离开。可选择地,第一管部的只一个或一些部分可与第二管部的对应部分分离开。在随后的结构中,该PIG源可包括第二管部与第一管部的一部分之间的物理连接。该物理连接可使得粒子能够加速离开等离子体柱从而在从等离子体柱逸出而不进入所述物理连接时完成第一转动。
该PIG源可穿过电连接至接地的第一D形电极。电连接至交变电压源的第二D形电极在加速区域处可提供电压。
该粒子加速器可包括基本上封装PIG源的结构。该粒子加速器可包括磁轭,限定容纳加速区域的腔。所述磁轭可用于产生跨过该加速区域的磁场。该磁场可以为至少2特斯拉(T)。例如,该磁场可以为至少10.5T。该电压可包括小于15kv的射频(RF)电压。
该粒子加速器可包括在使粒子加速离开所述粒子加速器中使用的一个或多个电极。至少一个阴极可在产生等离子体柱中使用。用于产生等离子体柱的该至少一个阴极包括冷阴极(例如,不被外部原加热的阴极)。电容电路可将至少一些电压耦合到该阴极。该阴极可配置成使电压脉冲化以在第一管部和第二管部中由气体产生等离子体柱。
可组合前述的特征中的任何特征以形成未在本申请中具体描述实施例。
在附图和以下的说明书描述中公开了一项或多项实施例的技术细节。其它的特征、样式以及优点将从说明书、附图和权利要求中变得清楚明了。
附图说明
图1A为同步回转加速器的横截面图。
图1B为图1A所示的同步回转加速器的侧部横截面图。
图2为可在图1A和1B的同步回转加速器中用于加速带电粒子的理想化波形的图解说明。
图3A为粒子源例如Penning离子计量(gauge)源的侧视图。
图3B为图3A的一部分粒子源通过虚设(dummy)D形电极并相邻于RF的D形电极的特写侧视图。
图4为图3中的粒子源的侧视图,示出来自于由粒子源所产生的等离子体柱的粒子的螺旋形加速。
图5为图4的粒子源的透视图。
图6为图4的粒子源包含用于阻碍一种或多种相的粒子的止挡的透视图。
图7为替代实施例的透视图,其中离子源的大部分被移去。
具体实施方式
下面描述一基于同步回转加速器的系统。但是,下面所描述的电路和方法可用于任一类型的回转加速器或粒子加速器。
参考图1A和1B,同步回转加速器1包括电线圈2a和2b,围绕两个间隔开的铁磁磁极4a和4b,其设计为产生一磁场。磁极4a和4b是由轭6a和6b的两个相对部分(示出为横截面图)限定。磁极4a和4b之间的空间限定真空室8或者分离真空室可安装在磁极4a和4b之间。磁场强度通常是与真空室8中心相隔的距离的函数并且主要由线圈2a和2b的几何形状以及磁极4a和4b的形状和材料的选择来确定。
将加速电极定义为D形电极10和D形电极12,在它们之间具有间隙13。D形电极10连接至交变电压电势,该交变电压电势的频率在一加速循环期间自高变低以实现带电粒子的增加的相对论质量并且由线圈2a和2b及磁极部分4a和4b所产生的沿径向降低的磁场(从真空室8的中心测量)。因此,将D形电极10称为射频(RF)D形电极。图2所示D形电极10和12中的交变电压理想化曲线将在下面进行详细讨论。在本实施例中,RF的D形电极10是半圆柱结构,内部为空心。D形电极12,也称为“虚设D形电极(dummy dee)”,不需要为空心圆柱结构,因为它在真空室壁14处接地。如图1A和1B中所示,D形电极12包含一金属条,例如铜,其具有的狭槽的形状匹配RF的D形电极10中的大致类似的狭槽。D形电极12可以构形为形成RF的D形电极10的表面16的镜像。
离子源18位于大约真空室8的中心,并设计为能在同步回转加速器的中心处提供粒子(例如质子)以用于加速,这一点将在下面描述。抽取电极22指引带电粒子从加速区域进入抽取通道24中,由此形成带电粒子束26。这里,离子源18轴向插入到加速区域中。
在同步回转加速器中所包含的D形电极10和12以及其它硬件在形成跨越间隙13的振荡电场的振荡电压输入下限定可调节共振电路。结果是真空室8中的共振腔。该共振腔的这一共振频率可通过使正被扫频的频率同步而被调节从而将其Q因数保持为高。在一个例子中,共振腔的共振频率随着时间,例如在超过约1毫秒(ms),在约30兆赫(MHz)和约135MHz的范围(VHF范围)内移动或“扫频”。在另一个例子中,共振腔的共振频率在约1ms内在约95MHz与约135MHz之间移动或扫频。该腔的共振可采用如申请号为No.11/948,359、名称为“Matching A Resonant Frequency Of AResonant Cavity To A Frequency Of An Input Voltage”(律师卷号No.17970-011001)的美国专利申请中所描述的方式来控制。该专利申请的内容如全部公开一样以引入的方式并入本申请中。
Q因子是共振系统的“品质”的测量因素,响应于接近共振频率的频率。在本例子中,Q因子定义为:
Q=1/R×√(L/C),
其中R是共振电路的有效电阻,L是电感,C是共振电路的电容。
调节机构可以是,例如可变电感线圈或可变电容。可变电容器件可以是振动簧片或旋转电容器。在图1A以及1B所示的例子中,该调节机构包括旋转电容器28。旋转电容器28包括由一马达31驱动的旋转叶片30。在马达31的每一循环期间,随着叶片30与叶片32相啮合,包含D形电极10和12以及旋转电容器28的共振电路的电容增加且共振频率减小。随着叶片不啮合,该过程相反。因此,共振频率是通过改变共振电路的电容而改变。这用于以下的目的,通过一大因子减小产生高电压所需的电力,该高电压以加速粒子束所需要的频率而施加在D形电极/虚设电极的间隙处。叶片30和32的形状可经机械加工以生成共振频率所需要的对时间的依赖。
叶片旋转可与RF频率的产生同步,以便由同步回转加速器所限定的共振电路的频率保持接近于施加到共振腔的交变电压电势的频率。这促使高效地将所施加的RF电力转变为RF的D形电极上的RF电压。
真空泵送系统40将真空室8保持在很低压力下,因而不散射加速束(或提供相对较少的散射),并大致防止RF的D形电极的放电。
为在同步回转加速器中实现基本上均匀的加速,D形电极间隙两端的电场的频率和振幅发生变化以实现相对质量增加以及磁场的径向变化,也保持粒子束的聚焦。该磁场的径向变化测量为与带电粒子的向外螺旋形轨迹中心相隔的距离。
图2是在同步回转加速器中加速带电粒子所需要的理想波形的图示。它只显示少数波形循环且无需表示理想频率和振幅调整曲线。图2图示说明同步回转加速器中所使用的波形的时变振幅和频率属性。随着粒子的相对质量增加,粒子速度接近光速的较大百分比,该频率由高变为低。
离子源18布置成接近于同步回转加速器1的磁性中心,以使粒子存在于同步回转加速器的中部平面处,在那里,其通过RF场(电压)施加作用。离子源可具有Penning离子真空计(PIG)几何形状。在该PIG几何形状中,两个高电压阴极放置成几乎彼此相对。例如,一个阴极可在加速区域的一侧上,一个阴极可在加速区域的另一侧上并与磁场线共线。该源组件的虚设D形电极外壳12可处于接地电位。阳极包括朝向加速区域延伸的管。当相对小量的气体(例如氢气/H2)占据在阴极之间的管中的区域时,通过向阴极施加电压而由气体形成等离子体柱。所施加的电压致使电子沿磁场线流动,基本上平行于管壁,并使集中在管内部的气体分子电离,由此形成等离子体柱。
图3A和图3B中显示供用于同步回转加速器1中的PIG几何形状离子源18。参照图3A,离子源18包括容纳用于接收气体的气体反馈件38的发射体侧38a和反射体侧38b。如下所述,外壳或管44保持气体。图3B示出穿过虚设D形电极12并相邻于RF的D形电极10的离子源18。在操作中,RF的D形电极10和虚设D形电极12之间的磁场致使粒子(例如质子)向外加速。该加速围绕等离子体柱呈螺旋形,并且粒子到等离子体柱的半径逐渐增大。图5和6描述标记为43的螺旋形加速。螺旋的曲率半径依赖于粒子的质量、由RF场施加给粒子的能量和磁场强度。
在磁场高时,变得很难将足够的能量施加给粒子使其具有足够大的曲率半径,以在加速期间在其初始转动时处理(clear)离子源的实体外壳。在离子源区域中,磁场相对高,例如大约为2特斯拉(T)或更高(例如8T,8.8T,8.9T,9T,10.5T或更多)。由于该相对高的磁场,对于低能量粒子来说初始粒子至粒子源半径相对小,其中低能粒子包含从等离子体柱首先抽取的粒子。举例来说,这个半径可大约为1mm。由于至少在初始时半径非常小,所以一些粒子可与离子源的外壳区接触,由此防止这些粒子向外进一步加速。因此,如图3B所示,离子源18的外壳被间断或分离开以形成两部分。也就是,在加速区域41处,例如大约在粒子被从离子源抽取的点处,离子源外壳的一部分被移去。此间断在图3B中标记为45。还可在加速区域上方或下方的距离移去外壳。还可拆去或不拆去在加速区域处的所有或部分的虚设D形电极12。
在图3A和3B的例子中,外壳44包括一管,该管保持一等离子体柱,等离子体柱包括将被加速的粒子。如图所示,管在不同的点可具有不同直径。管可驻设在虚设D形电极12中,尽管这不是必须的。该管在同步回转加速器的中部平面的一部分被完全拆去,从而导致外壳由两个分开部分组成,这两部分之间具有一间断45。在这个例子中,间断是约1毫米(mm)到3毫米(mm)(例如,拆去管的约1mm至3mm)。管的拆除量可以非常大以允许粒子从等离子体柱加速,但是足够小以阻止等离子体柱在间断部分中产生明显的消散。
通过在粒子加速区拆去实体结构,这里是管,粒子可在诸如相对高磁场存在的情形下以相对小的半径作初始转动,而不与阻止进一步加速的实体结构接触。依靠磁场和RF场的强度,该初始转动甚至可向后跨越穿过等离子体柱。
管可具有一相对小的内径,例如约2mm。这导致相对窄的等离子体柱,并且因此提供相对小的一组原始半径位置,在这些位置粒子可以开始加速。该管距离用于产生等离子体柱的阴极46足够远-在这个例子中距离每一阴极约10mm。这两个特征组合起来,使得流入同步回转加速器中的氢气(H2)量减少为小于每分钟1标准立方厘米(SCCM),由此使得同步回转加速器能够与相对小的真空传导孔一起操作,进入同步回转加速器RF/腔,以及相对小的容量的真空泵送系统,例如约每秒500升。
该管的间断也支持RF场进入等离子体柱中的强化穿透。也就是,由于在间断处不存在物理实体结构,所以RF场能够容易地到达等离子体柱。此外,管中的间断允许使用不同的RF场从等离子体柱加速粒子。例如,可使用较低的RF场来加速粒子。这可减小系统用于产生RF场的电力要求。在一个例子中,20千瓦(KW)RF系统产生15千伏(kv)的RF场来加速来自等离子体柱的粒子。使用较低的RF场会减小RF系统冷却需求和RF电压均衡要求。
在这里描述的同步回转加速器中,使用共振抽取系统来抽取粒子束。也就是,该束的径向振荡振幅由加速器内部的磁性干扰而增加,其与这些振荡共振。在使用共振抽取系统时,抽取效率通过限制内部束的相的空间范围而得到改善。考虑到磁场和RF场产生结构的设计,束在抽取时的相的空间范围是由加速开始时(例如,在从离子源出现时)的相的空间范围来确定。因此,相对小的束可能在进入到抽取通道时丧失,并且来自加速器的背景辐射可被减小。
可设置一实体结构或止挡来控制允许从同步回转加速器的中心区域逸出的粒子的相。图6显示止挡51的一个实例。止挡51充当一阻碍具有某些相的粒子的障碍物。也就是,防止撞击止挡的粒子进一步加速,而穿过止挡的粒子继续其加速离开同步回转加速器。如图6中所示,一止挡可接近等离子体柱以在能量低例如小于50kv的情况下,在粒子初始转动期间选择相。可替代地,一止挡可相对于等离子体柱位于任何其它点处。在图6所示的例子中,一单个止挡位于虚设D形电极12上。但是,每一D形电极可具有多于一个的止挡(未示出)。
阴极46可以为“冷”阴极。冷阴极可以是不由外部热源加热的阴极。同样,该冷阴极可被脉冲化,这意味着它们周期性地而非连续性地输出信号冲击/脉冲(burst)。当阴极是冷阴极且使产生脉冲时,阴极不太会经受损耗并因此持续相对长的时间。更进一步,使阴极产生脉冲可消除水冷阴极的需要。在一种实施方式中,阴极46以相对高的电压例如约1kv到约4kv产生脉冲,中峰阴极以约200Hz至约1KHz之间的重复率、以约0.1%到约1%或2%之间的工作循环、放出约50mA到约200mA的电流。
冷阴极有时会引起定时跳动和点燃延迟。也就是,在阴极中缺少足够的热会影响电子响应于所施加电压而放电的时间。举例来说,当阴极没被足够加热时,放电可比希望地晚或长数微秒。这会影响等离子体柱的形成,并且因此影响粒子加速器的操作。为消除这些影响,可将来自腔8中的RF场的电压耦合到阴极。阴极46以其它方式装入一金属中,这样形成一法拉第(Faraday)屏蔽从而大致将阴极屏蔽于RF场外。在一种实施方式中,RF能量的一部分可从RF场耦合到阴极,例如,约100V可从RF场耦合到阴极。图3B显示一实施方案,在其中的电容电路54,此处为电容器,由RF场充电并向阴极46提供电压。可使用一RF扼流圈(choke)以及DC馈送件来对电容器充电。可相应于另一阴极46实现一对应装置(未示出)。在某些实施方案中,所耦合的RF电压可减小定时跳动并将放电延迟减小到约100毫微秒(ns)或者更少。
图7中示出一替代的实施例。在这个实施例中,PIG源外壳的实质部分而非全部已被拆去,从而部分地露出等离子体柱。这样,PIG外壳的部分与其相对应的部分分离开,但是并不像以上情形那样完全分离开。剩余的部分61物理上接触PIG源的第一管部62和第二管部63。在这个实施例中,足够的外壳被移去使得粒子能够实施至少一次转动(轨道),而不会碰撞剩余外壳的部分61。在一个例子中,第一转动半径可以为1mm,虽然也可实施其它转动半径。图7中所示的实施例可与本申请描述的其它技术特征进行组合。
本申请中所记载的粒子源以及随附的技术特征并不限于用于同步回转加速器,而是可用于任何类型的粒子加速器或回转加速器。除在那些具有PIG几何形状的粒子源之外,其它粒子源可用于任何类型的粒子加速器,且可具有间断部、冷阴极、止挡和/或本申请记载的其它任何技术特征。
本申请描述的不同组件实施方案可组合从而形成上面没有具体公开的实施例。本申请中未具体描述的其它实施方式也可处于以下权利要求的范围内。

Claims (19)

1.一种同步回转加速器,其包括:
管,容纳气体;
第一阴极,邻近于该管的第一端;以及
第二阴极,邻近于该管的第二端,该第一阴极和该第二阴极向该管施加电压以由该气体形成等离子体柱;
其中,可从该等离子体柱中抽取粒子以进行加速;以及
电路,用于将来自外部射频RF场的能量耦合到至少一个阴极;
其中,所述管在所述粒子加速的区域被间断从而使所述等离子体柱露出,其中,所述管被间断,使得所述管在加速区域处被完全分为两个部分,或者使得所述管的一部分在粒子加速的区域被物理连接;
其中,在部分所述外壳物理连接的情况下,部分所述外壳具有的结构使得允许从所述等离子体柱加速的粒子执行至少一次转动,而不会碰撞部分所述外壳。
2.如权利要求1所述的同步回转加速器,其中,该第一阴极和第二阴极不由外部热源加热。
3.如权利要求1所述的同步回转加速器,其中,该第一阴极处于该加速区域的不同于第二阴极的侧部上。
4.如权利要求2所述的同步回转加速器,进一步包括:
电压源,用于提供射频RF场,该射频RF场用于在该加速区域处加速来自该等离子体柱的粒子。
5.如权利要求4所述的同步回转加速器,其中,该能量包括由该电压源所提供的该射频RF场的一部分。
6.如权利要求2所述的同步回转加速器,其中,该电路包括电容器,用于将来自于外部场的能量耦合至第一阴极和第二阴极中的至少一个。
7.如权利要求2所述的同步回转加速器,其中,该管包括在加速区域的间断点处完全分离开的第一部分和第二部分。
8.如权利要求2所述的同步回转加速器,进一步包括:
在加速区域处的止挡,该止挡阻挡至少一个相的粒子进行进一步加速。
9.如权利要求2所述的同步回转加速器,进一步包括:
电压源,用于向等离子体柱提供射频RF场,该射频RF场用于在加速区域处加速来自等离子体柱的粒子,其中,该射频RF场包括小于15kv的电压;以及
磁轭,用于提供跨过该加速区域的磁场,该磁场大于约2特斯拉。
10.一种同步回转加速器,其包括:
Penning离子真空计PIG源,其包括第一管部和第二管部,该第一管部以及该第二管部用于保持延伸跨过该加速区域的等离子体柱,粒子从所述加速区域起从所述等离子体柱加速;以及
电压源,用于在加速区域处提供一电压,该电压用于在加速区域处使粒子加速离开该等离子体柱;
其中,在所述加速区域所述第一管部和所述第二管部彼此完全地分离开,或者在所述加速区域所述第一管部和所述第二管部之间存在连接;
其中,在连接存在的情况下,所述连接具有的结构允许从所述等离子体柱加速的粒子执行至少一次转动,而不会碰撞所述连接。
11.如权利要求10所述的同步回转加速器,其中,该PIG源包括第二管部与第一管部的一部分之间的物理连接,该物理连接使得粒子能够加速离开等离子体柱从而在从等离子体柱逸出而不进入所述物理连接时完成第一转动。
12.如权利要求10所述的同步回转加速器,其中,该PIG源穿过电连接至接地的第一D形电极,并且其中,电连接至交变电压源的第二D形电极在加速区域处提供电压。
13.如权利要求10所述的同步回转加速器,进一步包括:
磁轭,限定容纳加速区域的腔,所述磁轭用于产生跨过该加速区域的磁场。
14.如权利要求13所述的同步回转加速器,其中,该磁场为至少2特斯拉。
15.如权利要求14所述的同步回转加速器,其中,该磁场为至少10.5特斯拉。
16.如权利要求15所述的同步回转加速器,其中,该电压包括小于15kv的射频RF电压。
17.如权利要求10所述的同步回转加速器,进一步包括在使粒子加速离开所述粒子加速器中使用的一个或多个电极。
18.如权利要求10所述的同步回转加速器,进一步包括:
在产生等离子体柱中使用的至少一个阴极,至少一个阴极包括冷阴极;以及
电容电路,用于将至少一些电压耦合到至少一个阴极。
19.如权利要求18所述的同步回转加速器,其中,至少一个阴极配置成使电压脉冲化以在第一管部和第二管部中由气体产生等离子体柱。
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