CN103278913B - Aspheric photoetching coupling object lens - Google Patents
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- CN103278913B CN103278913B CN201310178870.3A CN201310178870A CN103278913B CN 103278913 B CN103278913 B CN 103278913B CN 201310178870 A CN201310178870 A CN 201310178870A CN 103278913 B CN103278913 B CN 103278913B
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Abstract
The invention discloses an aspheric photoetching coupling object lens. The aspheric photoetching coupling object lens comprises a first lens group and a second lens group, which are fixedly connected through a mechanical component according to an interval. The first lens group, the second lens group and a planar reflecting mirror are sequentially arranged on a first optical axis. The reflecting surface of the planar reflecting mirror is positioned on the first optical axis, and forms an angle with the first optical axis. A second optical axis is in the direction of light ray reflected by the planar reflecting mirror, and is perpendicular to the first optical axis. The planar reflecting mirror is positioned between the second lens group and a third lens group which is arranged on the second optical axis. An object space surface is arranged in front of the vertex of the front surface of a first negative lens in the first lens group, the principal light ray of an object space view field is perpendicularly incident into the first lens group, an object space is telecentric, and the principal light of the object space view field enters the second lens group after being refracted through the first lens group. The first and second lens groups are combined into a double-Gauss structure, and light ray emitted from the second lens group is reflected into the third lens group through the planar reflecting mirror. The principal light of an image space view field is perpendicularly incident into an image surface, and an image space is telecentric.
Description
Technical field
The present invention relates to a kind of aspheric surface photoetching coupling object lens, belong to lithographic illumination technical field.
Background technology
The integrated circuit that the seventies in last century occurs is main at the beginning of birth is used as information processing device, from the time of the short decades occurred so far, be subject to the strong traction of social informatization process, integrated circuit successively experienced by a small scale, ultra-large until several developing stage such as great scale, great scale integrated circuit has become the foundation stone of high-tech sector development, from satellite, the aerospace fields such as rocket, to radar, laser-guided bomb national defence, and the every field of people's daily life all be unable to do without great scale integrated circuit, it is not only main information processing device, one of important carrier that the information that simultaneously also develops into stores.And embody the memory capacity of the dynamic RAM of information storage capability and integrated circuit (IC) chip minimal characteristic live width closely bound up, therefore, reducing integrated circuit minimum feature size is improve the important means of storage capacity.A lot of at the equipment of processing and manufacturing integrated circuit, litho machine is the equipment that current technology is the most ripe.The core component of litho machine is projection exposure optical system, and the most important ingredient of this system is illuminator and projection objective system.Illuminator major function is for mask plane provides Uniform Illumination, controls exposure dose and realize light illumination mode.Along with the development of microelectric technique, China has very large demand to feature sizes at the lithographic equipment of nanometer scale, research and develop high NA immersed photoetching machine to all significant national defense safety, scientific-technical progress, illuminator as litho machine important component part is most important to the whole litho machine performance of raising, therefore designs the important step that illuminator has been whole projection exposure optical system.
Photoetching coupling object lens, as the core cell device of illuminator, play critical effect in the illumination system.In early stage lithography illuminating system, even smooth unit exit end direct irradiation mask plate, along with the expansion of illumination field of view, Large-Area-Uniform illumination is difficult to require even smooth unit exit end to ensure, and the size of other lighting units is also along with increase.After adopting step-scan photoetching technique, instantaneous exposure visual field significantly reduces, and reduces the size of illuminator.In order to overcome above deficiency, introduce photoetching coupling object lens in the illumination system, make scanning slit and mask plane instantaneous field of view conjugation, simultaneously by slit diaphragm amplification imaging in mask plane, decrease the size of slit diaphragm, not only shorten the time shutter, decrease the size of other unit of illuminator simultaneously.
Summary of the invention
In order to solve, capacity usage ratio in high NA1.35 immersion lithography (45 nanometer) is not enough, illumination uniformity is not high, incide the large problem of difficulty of processing that the large plated film of plane mirror glazed thread incident angle is difficult and aperture of lens is comparatively large and cause, and the present invention proposes a kind of aspheric surface photoetching coupling object lens.
A kind of aspheric surface photoetching coupling object lens provided by the invention, comprise object side surface, first lens combination, second lens combination, plane mirror and the 3rd lens combination, wherein: the first lens combination is fixedly connected with by spacing with the mechanical component on the second lens combination scioptics housing, be primary optic axis according to true field chief ray direction, primary optic axis places the first lens combination successively, second lens combination and plane mirror, the reflecting surface of plane mirror to be positioned on primary optic axis and with primary optic axis at angle, be the second optical axis according to plane mirror reflection ray direction, and make primary optic axis vertical with the second optical axis, plane mirror is between the second lens combination and the 3rd lens combination, second optical axis places the 3rd lens combination, object side surface is placed in the first front, negative lens front surface summit of the first lens combination, true field chief ray vertical incidence first lens combination, for the object space heart far away, the second lens combination is entered after the first lens combination refraction, first lens combination and the second lens combination get up for double gauss structure, in order to correct vertical axial aberration-coma, distortion and ratio chromatism, the second lens combination emergent ray enters the 3rd lens combination through plane mirror reflection, image space chief ray vertical incidence image planes, be the image space heart far away, whole system is the object space heart far away and image space telecentric system.
The course of work of aspheric surface photoetching coupling object lens of the present invention is: the front 68.31 millimeters of places, the first negative lens front surface summit object plane and slit diaphragm being placed in aspheric surface couplings mirror system, true field chief ray vertical incidence first lens combination, for the object space heart far away, the second lens combination is entered after the first lens combination refraction, first lens combination and the second lens combination get up for double gauss structure, and the second lens combination emergent ray enters the 3rd lens combination through plane mirror reflection.Image space chief ray vertical incidence image planes, system is the image space heart far away.
The present invention compared with prior art has the following advantages:
The invention provides a kind of aspheric surface coupling object lens, solve capacity usage ratio deficiency in NA1.35 immersion lithography, illumination uniformity is not high, the present invention is coupled compared with object lens with full spherical surface photolithography, energy improves 15%, solve global face coupling object lens and incide the large problem of difficulty of processing that the large plated film of plane mirror glazed thread incident angle is difficult and aperture of lens is comparatively large and cause
The present invention further increases image quality, uses five aspheric surfaces to be reduced within 70 microns by point range figure diameter from 200 during global face micron, and distortion 0.1%, effect is actively promoted in the development for China's chip fabrication techniques.Point range figure diameter of the present invention brings up to 70 μm from 200 μm during global face coupling object lens simultaneously, has increased substantially illumination uniformity.
1, image quality is excellent, and point range figure root mean square diameter is less than 70 nanometers, distorts from 0.5% during global face and is reduced to 0.1%.Compare the object lens that to be coupled with full spherical surface photolithography, image quality significantly improves.
2, lenses number reduces to 11 from 15 and only employs five aspheric surfaces, and photoetching coupling object lens are simplified the structure, and decrease four lens, reduce fused quartz glass buying expenses, energetic transmittance also improves 15% simultaneously.
3, the light maximum incident angle degree incided during global face on plane mirror is 65 degree, this mirror surface plated film reaching 380 millimeters for bore is difficult, adopt aspheric surface photoetching coupling object lens, on plane mirror, maximum incident angle degree is reduced to 57 degree from 65 degree, is conducive to ensureing completing smoothly of coating process on plane mirror.
Accompanying drawing explanation
Fig. 1 is the system architecture schematic diagram of aspheric surface photoetching of the present invention coupling object lens;
Fig. 2 is embodiment aspheric surface photoetching coupling object lens root mean square point range figure;
Fig. 3 is embodiment aspheric surface coupling object lens distortion figure;
Fig. 4 is embodiment each visual field image space telecentricity histogram;
Fig. 5 incides plane mirror glazed thread angle figure in embodiment.
Label declaration:
1-first negative lens, 2-first positive lens, 3-second positive lens,
4-the 3rd positive lens, 5-second positive lens, 6-the 3rd negative lens,
7-the 4th negative lens, 8-the 4th positive lens, 9-the 5th positive lens,
10-plane mirror, 11-the 6th positive lens, 12-the 7th positive lens,
13-object side surface, 14-image interface.
Embodiment
In order to better objects and advantages of the present invention are described, below in conjunction with the drawings and specific embodiments, the invention will be further described.
Fig. 1 illustrates aspheric surface photoetching of the present invention coupling object lens, comprise object side surface 13, first lens combination, second lens combination, plane mirror 10 and the 3rd lens combination, wherein: the first lens combination is fixedly connected with by spacing with the mechanical component on the second lens combination scioptics housing, be primary optic axis according to true field chief ray direction, primary optic axis places the first lens combination successively, second lens combination and plane mirror 10, the reflecting surface of plane mirror 10 to be positioned on primary optic axis and with primary optic axis at angle, be the second optical axis according to plane mirror 10 reflection ray direction, and make primary optic axis vertical with the second optical axis, plane mirror 10 is between the second lens combination and the 3rd lens combination, second optical axis places the 3rd lens combination, object side surface 13 is placed in the first front, negative lens front surface summit of the first lens combination, true field chief ray vertical incidence first lens combination, for the object space heart far away, the second lens combination is entered after the first lens combination refraction, first lens combination and the second lens combination get up for double gauss structure, in order to correct vertical axial aberration-coma, distortion and ratio chromatism, the second lens combination emergent ray enters the 3rd lens combination through plane mirror 10 reflection, image space chief ray vertical incidence image planes surface 14, be the image space heart far away, whole system is the object space heart far away and image space telecentric system.The present invention is coupled compared with object lens with full spherical surface photolithography, energy improves 15%, solve global face coupling object lens and incide the large problem of difficulty of processing that the excessive plated film of plane mirror 10 glazed thread incident angle is difficult and aperture of lens is comparatively large and cause, point range figure diameter brings up to 70 μm from 200 μm during global face coupling object lens simultaneously, has increased substantially illumination uniformity.In the present embodiment, aspheric surface photoetching coupling object lens are made up of three lens cluster group and a slice plane mirror, use 11 lens, a slice plane mirrors altogether, five aspheric surfaces in lens.Require to debug the first lens combination and the second lens according to feasibility and system overall length, and generate the spacing between the first lens combination and the second lens by Optimized System Design, this spacing is arranged also can manual intervention.
As shown in Figure 1, lens 1 are the first lens combination to lens 5, and lens 6 to lens 9 are the second lens combination, and lens 11 are the 3rd lens combination to lens 12, and 13 is object side surface, and 14 is image planes surfaces, and object-side numerical aperture 0.3375, described lens material uses fused quartz.
Described first lens combination lens comprise the first negative lens 1, first positive lens 2, second positive lens 3, 3rd positive lens 4, second negative lens 5 is for placing with optical axis and sequentially arranging, the relative position between described lens is fixed with the mechanical component on lens housing, lighting source emergent ray enters the first negative lens 1 and exports divergent beams, the angle of divergence of the first positive lens 2 to the divergent beams that the first negative lens 1 exports suppresses, still export divergent beams, second positive lens 3 is assembled the divergent beams that the first positive lens 2 exports, export convergent beam, 3rd positive lens 4 is assembled further to the convergent beam that the second positive lens head exports, export convergent beam, second negative lens 5 is dispersed the convergent beam that the 3rd positive lens 4 exports, export divergent beams.
Described second lens combination lens comprise the 3rd negative lens 6, 4th negative lens 7, 4th positive lens 8, 5th positive lens 9 is for also sequentially arranging with optical axis, the relative position between them is fixed with the mechanical component on lens housing, 3rd negative lens 6 exports divergent beams, 4th negative lens 7 is dispersed further to the divergent beams that the 3rd negative lens 6 exports, export divergent beams, 4th positive lens 8 is assembled the divergent beams that the 4th negative lens 7 exports, still export divergent beams, 5th positive lens 9 is assembled further to the divergent beams that the 4th positive lens 8 exports, export convergent beam.
Described 3rd lens combination lens comprise the 6th positive lens 11, the 7th positive lens 12, image interface 14; Above lens are arranged as same optical axis in turn and place and sequentially arrange, the relative position between them is fixed with the mechanical component on lens housing, the convergent beam of the 5th positive lens 9 pairs plane mirror 10 reflection is assembled further, export convergent beam, 6th positive lens 11 is assembled further to the convergent beam that the 5th positive lens 9 exports, export convergent beam, the convergent beam that the 6th positive lens 11 exports is converged at image interface 14 by the 7th positive lens 12.
The first described negative lens 1 rear surface is 20 aspheric surfaces.The first described positive lens 2 front surface is 20 aspheric surfaces.The second described positive lens 2 rear surface is 20 aspheric surfaces.The 5th described positive lens 9 front surface is 20 aspheric surfaces.Before the 6th described positive lens, 11 surfaces are 20 aspheric surfaces.
Aspheric surface photoetching coupling object lens first lens combination of the present invention, the second lens combination and 11 lens in the 3rd lens combination and full spherical surface photolithography are coupled compared with object lens, lenses has reduced to 11 from 15, the maximum clear aperture of lens is reduced to 280 millimeters from 320 millimeters, and the spacing of the radius of each lens and thickness and lens has carried out optimization in various degree.The concrete Optimized Measures of the present embodiment is Applied Optics Design software (CODEV) constitution optimization function, and adds aberration and structural limitations parameter, and successive optimization is existing result.
The present embodiment can be realized by following technical measures: the object-side numerical aperture (NA)=0.3375 of lighting source operation wavelength 193.368 nanometer aspheric surface photoetching coupling object lens, true field overall height is 110.2 millimeters, optical system magnification is 1 times, design result distortion is less than 0.1%, point range figure root mean square diameter is less than 70 microns, and image space telecentricity controls within 0.004 degree.
On plane mirror 10, each field rays maximum incident angle degree controls within 57 degree.The design parameter of its each lens is as follows:
| Face number | Radius | Spacing | Glass label |
| Object plane | ∞ | 66.7645 | |
| 1 | -86.8088 | 38.791 | Fused quartz |
| 2 | -168.5318 | 0.288 | |
| 3 | -447.1183 | 55.000 | Fused quartz |
| 4 | -149.6153 | 34.368 | |
| 5 | -263.9103 | 55.000 | Fused quartz |
| 6 | -176.7587 | 0.100 | |
| 7 | 223.7792 | 55.000 | Fused quartz |
| 8 | 966.0297 | 23.197 | |
| 9 | 209.0252 | 55.000 | Fused quartz |
| 10 | 110.3928 | 102.124 | |
| 11 | -131.8007 | 15.000 | Fused quartz |
| 12 | 1865.1054 | 38.957 | |
| 13 | -149.5104 | 29.114 | Fused quartz |
| 14 | -180.1613 | 0.100 | |
| 15 | 1243.5192 | 60.622 | Fused quartz |
| 16 | -245.6569 | 20.315 | |
| 17 | 734.5437 | 41.207 | Fused quartz |
| 18 | -573.7284 | 216.681 | |
| 19 | ∞ | 190.100 | Plane mirror |
| 20 | -330.9604 | 55.000 | Fused quartz |
| 21 | 2761.1374 | 52.148 | |
| 22 | -143.6010 | 49.683 | Fused quartz |
| 23 | -145.1465 | 155.067 | |
| Image planes | ∞ | -0.002 |
The asphericity coefficient of described first negative lens 1, first positive lens 2, second positive lens 2, the 5th positive lens 9, the 6th positive lens is:
Following four kinds of evaluation meanses are adopted to evaluate to the aspheric surface photoetching coupling object lens that the present embodiment makes:
1, point range figure root mean square diameter is evaluated
Point range figure utilizes the Calculation of Optical Path program, and pupil plane is divided into many small patches, calculates the intersection point of light by these bins and image planes, and intersection point forms point range figure.The point range figure of perfect optical system is a point, the point range figure of actual optical system is numerous point, the image quality of optical system is determined by the distribution of these points, the advantage of this method to understand the space trend of light, guestimate light spot shape, this method is the method that assessment illuminator is commonly used, for the aspheric surface photoetching coupling object lens of design, the point range figure of each visual field is as shown in Fig. 2 aspheric surface photoetching coupling object lens root mean square point range figure, point range figure root mean square diameter value is less than 70 microns, provides high uniformity to throw light on when image quality can ensure photoetching.
2, distortion is evaluated
When distortion refers to that the actual corners magnification of light chief ray is not equal to+1, when namely image space chief ray discord object space chief ray is parallel, the intersection point discord ideal image point of image space chief ray and desirable image planes overlaps, and this phenomenon is called distortion.When only there is distortion, these points drop in the plane vertical with optical axis, but are not right with the distance of optical axis.When there is distortion, image is very clear, but has dislocation.For the aspheric surface photoetching coupling object lens of design, distortion value is as shown in Fig. 3 aspheric surface coupling object lens distortion figure, and with visual field change, maximum distortion value is 0.1%.
3, image space telecentricity is evaluated
Image space telecentricity refers to the maximum angle of each point chief ray and image planes on image space, and unit is degree.Absolute image space telecentric system each visual field chief ray impinges perpendicularly on image planes.For the aspheric surface photoetching coupling object lens of design, as shown in Figure 4, maximum far heart angle value is 0.004 degree to each visual field telecentricity histogram, can ensure to provide high Uniform Illumination.
4, on plane mirror 10, each visual field maximum incident angle degree is evaluated
For photoetching coupling object lens, add plane mirror 10 in the optical path and to turn back light path, be conducive to the bulk reducing lithography illuminating system, light, to the angular dimension on plane mirror 10, directly affects the technological level of plated film.Incide plane mirror glazed thread angle as shown in Figure 5, for the aspheric surface photoetching coupling object lens of design, the maximum incident angle degree that each field rays incides on plane mirror 10 is reduced to 57 degree, be conducive to ensureing completing smoothly of coating process on plane mirror 10, normal refers to the angular bisector of incident ray and reflection ray as shown in Figure 5, namely normal is perpendicular to plane mirror 10, angle β
1refer to the angle of light 16 and normal, angle β
2refer to the angle of light 15 and normal, angle β
3refer to the angle of light 17 and normal.
Sum up: aspheric surface photoetching coupling object lens of the present invention totally 11 lens and a slice plane mirror 10, wherein containing 5 aspheric surfaces, by optimizing each lens radius and thickness parameter, obtains picture element excellent, the system of the realistic requirement of structural parameters.20 aspheric surfaces that this system uses, the manufacturing capacity of China can meet 20 aspheric manufactures and detection at present substantially, compact conformation, for double telecentric structure and telecentricity is high, high picture element can be good at the requirement meeting current 45 nano-photoetchings of China.
The present invention is using the full spherical surface photolithography couplings mirror system of object-side numerical aperture (i.e. NA) 0.3375 as initial configuration, adopt non-spherical structure, the imaging indicators such as point range figure, distortion and telecentricity are all improved, simultaneously owing to reducing lenses number and glass gross thickness, improve energetic transmittance, ensure that on final arrival silicon chip face, gross energy meets photolithography exposure energy requirement.Therefore, improve image quality and the photoetching coupling object lens energetic transmittance of photoetching coupling object lens, vital effect is all played to whole high uniformity illumination and whole photolithographic exposure Performance of Optical System.
The above; be only the embodiment in the present invention, but protection scope of the present invention is not limited thereto, any people being familiar with this technology is in the technical scope disclosed by the present invention; the conversion or replacement expected can be understood, all should be encompassed in of the present invention comprising within scope.
Claims (9)
1. aspheric surface photoetching coupling object lens, it is characterized in that: comprise object side surface, first lens combination, second lens combination, plane mirror and the 3rd lens combination, wherein: the first lens combination is fixedly connected with by spacing with the mechanical component on the second lens combination scioptics housing, be primary optic axis according to true field chief ray direction, primary optic axis places the first lens combination successively, second lens combination and plane mirror, the reflecting surface of plane mirror to be positioned on primary optic axis and with primary optic axis at angle, be the second optical axis according to plane mirror reflection ray direction, and make primary optic axis vertical with the second optical axis, plane mirror is between the second lens combination and the 3rd lens combination, second optical axis places the 3rd lens combination, object side surface is placed in the first front, negative lens front surface summit of the first lens combination, true field chief ray vertical incidence first lens combination, for the object space heart far away, the second lens combination is entered after the first lens combination refraction, first lens combination and the second lens combination get up for double gauss structure, in order to correct vertical axial aberration-coma, distortion and ratio chromatism, the second lens combination emergent ray enters the 3rd lens combination through plane mirror reflection, image space chief ray vertical incidence image planes, be the image space heart far away, whole system is the object space heart far away and image space telecentric system, lighting source is connected with the first lens combination, described lighting source operation wavelength 193.368 nanometer, true field overall height 110.2 millimeters, object-side numerical aperture=0.3375, enlargement ratio is 1 times, and distortion is less than 0.1%, and point range figure root mean square diameter is less than 70 microns, and image space telecentricity controls within 0.004 degree.
2. as claimed in claim 1 aspheric surface photoetching coupling object lens, it is characterized in that: described first lens combination comprises the first negative lens, first positive lens, second positive lens, 3rd positive lens, second negative lens, described lens are for placing with optical axis and sequentially arranging, the relative position between described lens is fixed with the mechanical component on lens housing, lighting source emergent ray enters the first negative lens and exports divergent beams, the angle of divergence of the first positive lens to the divergent beams that the first negative lens exports suppresses, still export divergent beams, second positive lens is assembled the divergent beams that the first positive lens exports, export convergent beam, 3rd positive lens is assembled further to the convergent beam that the second positive lens head exports, export convergent beam, second negative lens is dispersed the convergent beam that the 3rd positive lens exports, export divergent beams.
3. as claimed in claim 1 aspheric surface photoetching coupling object lens, it is characterized in that: described second lens combination comprises the 3rd negative lens, 4th negative lens, 4th positive lens, 5th positive lens, described lens are for also sequentially arranging with optical axis, the relative position between them is fixed with the mechanical component on lens housing, 3rd negative lens exports divergent beams, 4th negative lens is dispersed further to the divergent beams that the 3rd negative lens exports, export divergent beams, 4th positive lens is assembled the divergent beams that the 4th negative lens exports, still export divergent beams, 5th positive lens is assembled further to the divergent beams that the 4th positive lens exports, export convergent beam.
4. as claimed in claim 3 aspheric surface photoetching coupling object lens, it is characterized in that: described 3rd lens combination comprises the 6th positive lens, the 7th positive lens; Described lens are arranged as same optical axis in turn and place and sequentially arrange, the relative position between them is fixed with the mechanical component on lens housing, 5th positive lens inputs convergent beam to plane mirror, 6th positive lens is assembled further to the convergent beam that plane mirror reflects, export convergent beam, the convergent beam that the 6th positive lens exports is converged at image interface by the 7th positive lens.
5. as claimed in claim 2 aspheric surface photoetching coupling object lens, it is characterized in that: the rear surface of described first negative lens is 20 aspheric surfaces; The front surface of the first described positive lens is 20 aspheric surfaces; The rear surface of the second described positive lens is 20 aspheric surfaces.
6. as claimed in claim 3 aspheric surface photoetching coupling object lens, it is characterized in that: the front surface of the 5th described positive lens is 20 aspheric surfaces.
7. as claimed in claim 4 aspheric surface photoetching coupling object lens, it is characterized in that: the front surface of the 6th described positive lens is 20 aspheric surfaces.
8. as claimed in claim 1 aspheric surface photoetching coupling object lens, it is characterized in that: incide plane mirror glazed thread maximum incident angle degree and control within 57 degree.
9. as claimed in claim 1 aspheric surface photoetching coupling object lens, it is characterized in that: described lens material is fused quartz.
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| CN105467563B (en) * | 2014-09-11 | 2019-02-22 | 玉晶光电(厦门)有限公司 | The small-sized narrow visual field optical imaging lens of portable equipment |
| CN114839741B (en) | 2021-02-02 | 2023-08-29 | 信泰光学(深圳)有限公司 | imaging lens |
| TWI820836B (en) * | 2022-07-29 | 2023-11-01 | 上暘光學股份有限公司 | Lithography projection lens |
Citations (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US4406524A (en) * | 1979-08-14 | 1983-09-27 | Eric Campiche | Afocal optical device |
| US5052763A (en) * | 1990-08-28 | 1991-10-01 | International Business Machines Corporation | Optical system with two subsystems separately correcting odd aberrations and together correcting even aberrations |
| US5067803A (en) * | 1991-03-06 | 1991-11-26 | Fuji Photo Optical Co., Ltd. | Photographic wide angle lens |
| US5694241A (en) * | 1995-01-30 | 1997-12-02 | Nikon Corporation | Catadioptric reduction projection optical system and exposure apparatus employing the same |
| CN101216679A (en) * | 2007-12-28 | 2008-07-09 | 上海微电子装备有限公司 | Edge exposure device |
| EP1959289A1 (en) * | 2007-02-13 | 2008-08-20 | Carl Zeiss SMT AG | Unit magnification projection objective |
| CN101743497A (en) * | 2007-09-14 | 2010-06-16 | 株式会社尼康 | Illumination optical system, exposure apparatus, optical element and manufacturing method thereof, and device manufacturing method |
Family Cites Families (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US7112772B2 (en) * | 1998-05-29 | 2006-09-26 | Carl Zeiss Smt Ag | Catadioptric projection objective with adaptive mirror and projection exposure method |
| DE10104177A1 (en) * | 2001-01-24 | 2002-08-01 | Zeiss Carl | Catadioptric reduction lens |
| US7136220B2 (en) * | 2001-08-21 | 2006-11-14 | Carl Zeiss Smt Ag | Catadioptric reduction lens |
| DE10344943A1 (en) * | 2003-09-27 | 2005-04-21 | Zeiss Carl Jena Gmbh | Stereoscopic microscope objective |
-
2013
- 2013-05-15 CN CN201310178870.3A patent/CN103278913B/en not_active Expired - Fee Related
Patent Citations (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US4406524A (en) * | 1979-08-14 | 1983-09-27 | Eric Campiche | Afocal optical device |
| US5052763A (en) * | 1990-08-28 | 1991-10-01 | International Business Machines Corporation | Optical system with two subsystems separately correcting odd aberrations and together correcting even aberrations |
| US5067803A (en) * | 1991-03-06 | 1991-11-26 | Fuji Photo Optical Co., Ltd. | Photographic wide angle lens |
| US5694241A (en) * | 1995-01-30 | 1997-12-02 | Nikon Corporation | Catadioptric reduction projection optical system and exposure apparatus employing the same |
| EP1959289A1 (en) * | 2007-02-13 | 2008-08-20 | Carl Zeiss SMT AG | Unit magnification projection objective |
| CN101743497A (en) * | 2007-09-14 | 2010-06-16 | 株式会社尼康 | Illumination optical system, exposure apparatus, optical element and manufacturing method thereof, and device manufacturing method |
| CN101216679A (en) * | 2007-12-28 | 2008-07-09 | 上海微电子装备有限公司 | Edge exposure device |
Non-Patent Citations (1)
| Title |
|---|
| 深紫外光刻复杂照明光学系统设计;赵阳;《中国博士学位论文全文数据库信息科技辑》;20101031;第87-96页 * |
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