CN103221180A - 具有基本平坦颗粒尖端的超研磨工具及其相关方法 - Google Patents

具有基本平坦颗粒尖端的超研磨工具及其相关方法 Download PDF

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CN103221180A
CN103221180A CN201180053648XA CN201180053648A CN103221180A CN 103221180 A CN103221180 A CN 103221180A CN 201180053648X A CN201180053648X A CN 201180053648XA CN 201180053648 A CN201180053648 A CN 201180053648A CN 103221180 A CN103221180 A CN 103221180A
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superabrasive grain
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宋健民
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LAIZUAN TECHNOLOGY Co Ltd
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    • BPERFORMING OPERATIONS; TRANSPORTING
    • B24GRINDING; POLISHING
    • B24BMACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
    • B24B53/00Devices or means for dressing or conditioning abrasive surfaces
    • B24B53/017Devices or means for dressing, cleaning or otherwise conditioning lapping tools
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L23/00Details of semiconductor or other solid state devices
    • H01L23/34Arrangements for cooling, heating, ventilating or temperature compensation ; Temperature sensing arrangements
    • H01L23/36Selection of materials, or shaping, to facilitate cooling or heating, e.g. heatsinks
    • H01L23/373Cooling facilitated by selection of materials for the device or materials for thermal expansion adaptation, e.g. carbon
    • H01L23/3733Cooling facilitated by selection of materials for the device or materials for thermal expansion adaptation, e.g. carbon having a heterogeneous or anisotropic structure, e.g. powder or fibres in a matrix, wire mesh, porous structures
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B24GRINDING; POLISHING
    • B24DTOOLS FOR GRINDING, BUFFING OR SHARPENING
    • B24D18/00Manufacture of grinding tools or other grinding devices, e.g. wheels, not otherwise provided for
    • B24D18/0072Manufacture of grinding tools or other grinding devices, e.g. wheels, not otherwise provided for using adhesives for bonding abrasive particles or grinding elements to a support, e.g. by gluing
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L23/00Details of semiconductor or other solid state devices
    • H01L23/34Arrangements for cooling, heating, ventilating or temperature compensation ; Temperature sensing arrangements
    • H01L23/36Selection of materials, or shaping, to facilitate cooling or heating, e.g. heatsinks
    • H01L23/373Cooling facilitated by selection of materials for the device or materials for thermal expansion adaptation, e.g. carbon
    • H01L23/3732Diamonds
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2924/00Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
    • H01L2924/0001Technical content checked by a classifier
    • H01L2924/0002Not covered by any one of groups H01L24/00, H01L24/00 and H01L2224/00

Abstract

本发明是关于一种超研磨工具及其制造及使用方法。在本发明的一范例中,例如,一化学机械研磨垫修整器包括:一第一单层超研磨颗粒,设置及耦合于一金属支撑层的一侧;以及一第二单层超研磨颗粒设置及耦合于该金属支撑层的该第一单层的相对一侧。该第二单层超研磨颗粒位于与该第一单层超研磨颗粒具有基本相同分布的位置。

Description

具有基本平坦颗粒尖端的超研磨工具及其相关方法
优先权信息
本申请案主张分别于2010年9月21日及2011年3月29日向美国专利局提出的美国专利第61/384,976号以及第61/468,917号的申请案的优先权,其中该些案所揭露的内容全部并入本案参考。
技术领域
本发明是关于一种超研磨工具及其制造及使用方法。
背景技术
目前半导体产业每年花费超过10亿美金制造呈现相当平整且平滑表面的硅芯片。用于制造平滑及平面化(even-surfaced)硅芯片的现有技术已是相当多样化。最普遍相关的现有方法为化学机械研磨(CMP),其包括结合一研磨浆料及一研磨垫的利用。在各种化学机械研磨方法中,最主要的关键是能够在许多方面表现出高效能水平,如抛光后芯片的一致性、集成电路的平滑度、生产中的移除速率、用于CMP消耗寿命的经济性等。
发明内容
本发明是关于一种超研磨工具及其制造及使用方法。在本发明的一方面中,例如,提供一化学机械研磨垫修整器。此修整器包括:一第一单层超研磨颗粒,设置及耦合于一金属支撑层的一侧;以及一第二单层超研磨颗粒,设置及耦合于该金属支撑层的该第一单层的相对一侧。该第二单层超研磨颗粒位于与该第一单层超研磨颗粒具有基本上相同分布的位置。在另一方面中,该第二单层超研磨颗粒位于与该第一单层超研磨颗粒具有相同分布的位置。在再一方面中,提供一刚性支撑体,可耦合于相对该第一单层的该第二单层超研磨颗粒。
可利用各种材料作为第一单层和/或第二单层超研磨颗粒,并且任何现有的超研磨颗粒材料也可包含在本发明范畴内。超研磨颗粒材料可包括,如,金刚石材料、氮化物材料、陶瓷、及其类似物,或其组合,但不限于此。在一具体方面中,此超研磨颗粒包括一金刚石材料。在另一具体方面中,此超研磨颗粒包括一立方氮化硼材料。
本发明另外提供一种化学机械研磨垫修整器的制作方法,在一方面中,一种化学机械研磨垫修整器的制作方法可包括:设置一第一单层超研磨颗粒于一金属支撑层的一侧;以及,设置一第二单层超研磨颗粒于该金属支撑层的相对该第一单层的一侧;其中,该第二单层超研磨颗粒位于与该第一单层超研磨颗粒基本上相同分布的位置。此制作方法还包括接合该第一单层超研磨颗粒及该第二单层超研磨颗粒于该金属支撑层上,使在第一单层及第二单层间的对称作用力基本上为相似的分布,以防止金属支撑层实质上变形。
可利用各种设想得到的技术,将此第一单层和/或第二单层超研磨颗粒耦合于金属支撑层上。应了解的是,用于耦合超研磨颗粒至支撑层上的任何技术也包含在本发明的范畴内。此技术可包括,如硬焊(brazing)、施压加热(pressurized heating)、烧结(sintering)、电镀(electroplating)、聚合物接合(polymeric binding)、及其类似方法,或其组合,但不限于此。在一具体方面中,至少一第一单层超研磨颗粒或第二单层超研磨颗粒利用一硬焊合金耦合于金属支撑层。在另一具体方面中,第一单层超研磨颗粒及第二单层超研磨颗粒两者都利用一硬焊合金耦合于金属支撑层。在另一方面中,至少一第一单层或第二单层在加热及加压下接合。在再一方面中,至少一第一单层或第二单层直接地加热及加压以接合于金属支撑层。在又一方面中,至少一第一单层或第二单层的接合还包括设置一烧结化合物(sintering compound)于金属支撑层上,并与至少一第一单层或第二单层接触,并烧结此烧结复合物,以接合至少一第一单层或第二单层于金属支撑层。在此方法的一具体方面中,也可包括在接合过程中,以一硬焊材料熔渗入烧结化合物中。
在一方面中,本发明的方法可还包括耦合该第二单层超研磨颗粒于一刚性支撑体。可利用各种设想得到的技术,将刚性支撑体耦合于第二单层,且任何现有技术也包含在本发明的范畴内。此技术的方面可包括,如热压(hot pressing)、硬焊(brazing)、烧结(sintering)、焊接(soldering)、电镀(electroplating)、聚合物接合(polymeric binding)、及其组合,但不限于此。在一具体方面中,将第二单层超研磨颗粒耦合于该刚性支撑体,通过聚合物接合完成。
本发明再提供一种减少化学机械研磨垫修整器在制造过程中变形的方法。在一方面中,此方法可包括在多个超研磨颗粒接合期间,该金属支撑层的相对侧含有基本上相等的变形作用力,其中,由于该相对侧的作用力相等,使金属支撑层在接合期间的变形减少。在一具体的方面中,基本上相等作用力的方式,其包括排列多个超研磨颗粒于金属支撑层的相对侧,以使多个超研磨颗粒在支撑层的每一侧具有基本上相同的分布,使接合期间具有基本上相同的变形作用力。
以上广泛地概述本发明的各种特征,而以下是更详细描述使更能了解本发明,而更可理解本发明相对于现有技术的优越之处。本发明的其他特征将由本发明的详细描述及所附的权利要求变得更清晰,或可通过本发明的实施而学习。
附图说明
图1为根据本发明的一实施例的化学机械研磨垫修整器的侧面示意图。
图2为根据本发明的一实施例的化学机械研磨垫修整器的侧面示意图。
图3为根据本发明的一实施例的化学机械研磨垫修整器的侧面示意图。
图4为根据本发明的一实施例的化学机械研磨垫修整器的侧面示意图。
应了解的是,本发明的图示仅为解说目的的用处,以更进一步了解本发明。此外,以上图例未按比例绘制,因此尺寸、颗粒大小、及其他方面可扩大至使图示清晰呈现。因此,为了制造本发明的散热片,可根据图例所示的特定尺寸及方面变化得之。
具体实施方式
在详细解释本发明前,应了解本发明不限于在此所揭示的该特定结构、方法步骤、或材料,而可扩大延伸至其相等物,如该些具有通常相关现有技术者可推之。并且,应了解在此所用的术语仅用于描述特定实施例,而非限制本发明。
须注意的是,本发明的说明书及所附权利要求中,单数形式的「一(a、an)」及「该(the)」包括多个所指示对象,除非文中另有特别指示。因此,例如关于「一金刚石颗粒」,其包括一个或多个此颗粒;以及关于「该层」,其包括一层或多层。
定义
在本发明的描述及权利要求中,使用根据如下文所定义的专门用语。
在本文中,「修整器(conditioner)」及「修整器(dresser)」可互相交替使用,且意思是用于修整或研磨一垫的工具。例如一化学机械研磨垫。
在本文中,「超研磨料(superabrasive)」用作为意思是任何结晶或多晶材料、或具有莫氏硬度(Mohr’s hardness)为8或以上的混合材料。在一些方面中,一材料可为莫氏硬度约为9.5或以上。此类材料包括,如金刚石(diamond)、多晶金刚石(polycrystalline diamond(PCD))、立方氮化硼(cubic boron nitride(cBN))、多晶立方氮化硼(polycrystalline cubicboron nitride(PcBN))、刚玉(corundum)及蓝宝石(sapphire),以及所属技术领域中普通技术人员已知的其他超研磨材料,但不限于此。超研磨材料可包含本发明中各种形式的方面,其包括颗粒(particles)、砂砾(grits)、薄膜(films)、层状物(layers)、片状物(pieces)、片段(segments)等。
在本文中,「颗粒」意思是一材料的颗粒形式。此颗粒可为各种形状,其包括圆形、椭圆形、正方形、自形(euhedral)等,且可为单晶或多晶,并可具有各种筛孔尺寸。本技术领域中所现有的「筛孔(mesh)」意思是每单位面积所具有的孔洞数目,如美国筛孔(U.S.meshes)为例。本文中所有筛孔大小意思是美国筛孔(U.S.meshes),除非有另行批注,都指美国筛孔大小。此外,由于具有某「筛孔大小」的颗粒实际上是具有一小的尺寸分布范围,因此筛孔大小是指所收集得到的颗粒的平均筛孔尺寸。
在本文中,「硬焊(brazing)」的过程意思是在超研磨颗粒/材料及硬焊材料的原子间形成化学键结。此外,「化学键结」意思是一共价键结,如碳化物或硼化物键结,而不是机械力或较弱的原子间吸引力。因此,当以「硬焊」连接超研磨颗粒时,会形成真正的化学键结。然而,当一般关于金属及金属接和的「硬焊」,在传统认知上此词意思是形成一冶金键结。因此,「硬焊」超研磨颗粒片段至此工具主体上,不需要一碳化物形成物(carbide former)的存在。
在本文中,「烧结(sintering)」意思是连接两个或以上单独颗粒形成一连续的固态块体(solid mass)。烧结过程包含有颗粒的凝固,以消除至少部分颗粒间的空隙。一般利用超高压及存在碳溶剂作为金刚石烧结助剂,以促进金刚石颗粒烧结。
「金属的(metallic)」一词意思是金属及类金属(metalloid)。金属包括一般认知为金属(发现自过度金属、碱金属、及碱土金属在内)的化合物。举例而言,金属可为银(Ag)、金(Au)、铜(Cu)、铝(Al)及铁(Fe)。类金属具体包括硅(Si)、硼(B)、锗Ge、锑(Sb)、砷(As)及碲(Te)。金属材料也包括合金或混合物,其混合物包括金属材料。此合金或混合物可还包括额外的添加物。在本发明中,可包括以碳化物形成物(carbideformer)及碳湿润剂(carbon wetting agent)作为合金或混合物,但预期不会是唯一的金属组成。碳化物形成元素可为如钪(Sc)、钇(Y)、钛(Ti)、锆(Zr)、铪(Hf)、钒(V)、铌(Nb)、铬(Cr)、钼(Mo)、锰(Mn)、钽(Ta)、钨(W)及鎝(Tc)。碳湿润剂可为如钴(Co)、镍(Ni)、锰(Mn)及铬(Cr)。
在本文中,「熔渗(infiltrating)」意思是当一材料加热至其熔点,接着其液态流动经过颗粒间的间隙空洞。
在本文中,「基本上(substantially)」一词意思是一动作、特征、特性、状态、结构、项目、或结果具有完全的或接近完全的范围或程度。举例而言,一「基本上」封闭的物体意思是该物体不是完全地封闭就是接近完全地封闭。相比于绝对的完整,其确切可接受的误差程度可视文中具体情况而定。然而,一般谈到接近完成可视为如同绝对及完全得到具有相同的整体结果。
「基本上(substantially)」一词可同样地应用于一负面含意,其意思是一动作、特征、特性、状态、结构、项目、或结果为完全的或接近完全的缺乏。举例而言,一组成物「基本上没有」颗粒意思是该组成物不是完全地缺乏颗粒,就是接近完全地缺乏颗粒,其影响如同完全地缺乏颗粒一样。换句话说,一「基本上没有」一成分或元素的组成物,只要不具有重要的影响,实际上可仍包含此项目(指该成分或元素)。
在本文中,「约(about)」一词意思是提供一数值范围端点的弹性空间,即一给定值可以「稍微高于」或「稍微低于」此数值端点。
如本文中,多个项目、结构元件、组成元件和/或材料可为了方便以一般的列举呈现。然而,这些清单应被解释为所述清单的每一列举元件可为单独且独特的元件。因此,基于一般呈现而未有相对的其他描述的群组内,此列举的单独元件不需要单独地被解释为事实上相等于其他相同列举出的元件。
在本文中,浓度、总量及其他数值数据可以一范围形式表达或呈现。应了解的是此范围形式仅为方便及简化描述,因此应更具有弹性的解释此范围,其不仅包含明确列举为范围界限的数值,且包括所述范围内包含的所有单独数值或子范围,如同各数值和子范围被明确列举一样。举例而言,一数值范围为「约1至约5」应解释为不仅包括大约1至约5的明确列举的值,还包括在指出的范围内的单独值及子范围。因此,其在该数值范围内包括如2、3、及4的单独值及如自1至3、自2至4、及自3至5等的子范围,以及分别为1、2、3、4及5。此相同的原则适用于一范围,其仅指出一数值为一最小值或一最大值。此外,不论是范围的幅度或特性,此解释应适用于。
本发明
本发明提供了一种超研磨工具及其制造及使用方法。在一方面中,此超研磨工具可包括化学机械研磨垫修整器,其用于修整(即平滑化、研磨、修整)一化学机械研磨垫。根据本发明的方面中的化学机械研磨垫修整器可善用在,例如修整一化学机械研磨垫,该化学机械研磨垫用于抛光、加工或其他方式以处理半导体材料。此修整器可利用包含基本平坦尖端的超研磨颗粒而制成。传统化学机械研磨垫修整器的制造方法,甚至许多是描述关于在固定前将超研磨颗粒尖端平坦化的技术,一般是包含在整个修整器表面上尖端高度的显著变化。通常,将超研磨颗粒固定在化学机械研磨垫修整器支撑体的方法,会破坏各种原已完成的平坦化。例如,利用高温和/或高压的固定技术后,而当修整器冷却时会造成修整器的支撑体变形。因此,除非步骤有采取避免变形,否则该超研磨颗粒无法在后续修整器冷却过程中维持在其平坦状态。此问题将特别攸关于硬焊技术。
此外,减少金属支撑层的扭曲,可维持此加工工具中的超研磨颗粒尖端处在较佳的平坦程度。当利用加热和/或施压以制造一超研磨工具时,金属支撑层的变形会造成尖端水平高度具有极大的变化,甚至是对于那些在加热和/或施压之前已平坦化的颗粒。透过超研磨颗粒的排列,在该金属支持层的两侧上分布有相等或基本上相等的变形作用力,依此作用力可有效地去除彼此在金属支持层中产生的变形程度,因此可减少超研磨颗粒彼此之间相对高度的变动。
本发明的化学机械研磨垫修整器包括一含有基本平坦尖端的超研磨颗粒层,其分布在此加工化学机械研磨垫修整器的工作面上。相比于传统的修整器,一具有此基本平坦尖端的排列的化学机械研磨垫修整器,由于具有更均匀的突出分布,使该超研磨颗粒不太会将基体层拉出,进而可具有低刮伤率。另外,此修整器的更均匀的突出分布可修整化学机械研磨垫,进而不仅能促进良好的研磨速率,同时可延长此修整器的有效工作寿命。在化学机械研磨垫中,上述的优点会受到如一致的粗糙间隙及尺寸分布而影响。
在本发明的一方面中,超研磨尖端的平坦化可藉以变形影响最小的方式制造化学机械研磨垫修整器而达成。例如,一化学机械研磨垫修整器的一方面,可由至少一个二阶段程序制得,其中,第一阶段为减少在过程中平坦化尖端的扰乱的方法,且通常会明显地将超研磨颗粒由一平坦化排列中移除,如,硬焊程序。而第二阶段程序可进一步提升分布在化学机械研磨垫修整器的超研磨颗粒尖端的平坦化。
具有基本平坦尖端的化学机械研磨垫修整器的各种具体结构都可被考虑。在一方面中,例如,一化学机械研磨垫修整器可包括:一第一单层超研磨颗粒,设置及耦合于一金属支撑层的一侧;以及一第二单层超研磨颗粒,设置及耦合于金属支撑层的该第一单层的相对一侧。第二单层超研磨颗粒位于与该第一单层超研磨颗粒具有基本相同分布的位置。在一方面中,一刚性支撑体耦合于相对第一单层的第二单层超研磨颗粒,以提供支撑体作为修整器。一单一超研磨颗粒层设置于金属支撑层的每一侧,可减轻在一高温工艺(如,硬焊)中的热收缩,否则会使在其中一侧的金刚石分布变形。通过将一超研磨层设置于金属支撑层的每一侧,在两侧上的变形作用力,如热运动及压力,可以为相等或基本上相等。据此,该金属或支撑层的变形可被最小化。换句话说,造成变形的作用力为基本上相等地作用于金属支撑层的每一侧,进而减少其发生变形。
在一方面中,如图1所示,例如,将一第一单层超研磨颗粒12排列于一金属支撑层14的一表面上。而将一第二单层超研磨颗粒16排列于相对第一单层的一侧。以下将更进一步的讨论,在一些情况下,将第一及第二单层超研磨颗粒排列,并使透过金属支撑层对应的超研磨颗粒基本上对齐(如图一所示)。在其他情况下,第一及第二单层超研磨颗粒具有基本上相似分布的排列,但可透过金属支撑层基本上彼此对齐,或彼此不对齐。
用于超研磨颗粒的各种材料都可被考虑。用于一化学机械研磨垫修整器的任何现有的超研磨粒,应包含在本发明的范畴内。超研磨颗粒材料的例子可包括如,金刚石材料、氮化物材料、陶瓷、及其类似物,但不限于此。在一方面中,超研磨颗粒包括金刚石材料,该金刚石材料可包括天然或合成金刚石、单晶、多晶、及其类似物。在另一方面中,该超研磨颗粒可包括立方氮化硼。另外,可使用各种大小的金刚石颗粒,包括筛孔大小如10/20、30/40、80/90、90/100、100/120、120/140、140/170、170/200、200/230、230/270、270/325、及325/400。
金属支撑层可为任何在制造超研磨工具时能够支撑单层金刚石的材料。金属支撑层的材料可包括:金属材料、金属合金材料、硬焊合金材料、陶瓷材料、复合材料、及其类似物,或其组合,但不限于此。值得被注意的是金属支撑层可以为各种形态。在一方面中,例如,金属支撑层可为固体金属,如金属板(metal plate)或金属薄片(metal foil)。在另一方面中,金属支撑层可为压制粉末(pressed powder),例如,将金属粉末可放置一模具内,并冷压以形成一金属支撑层。
另外,金属支撑层可为任何能够支持超研磨颗粒的厚度。例如,在一方面中,金属支撑层的厚度可为大于约10毫米。在另一方面中,金属支撑层的厚度可为约2毫米至约10毫米。在再一方面中,金属支撑层的厚度可为约1微米至约200微米。在又一方面中,金属支撑层的厚度可为约1微米至约100微米。在更一方面中,金属支撑层的厚度可为约100微米至约3毫米。在又一方面中,金属支撑层的厚度可为约500微米至约2毫米。
在一些方面中,不论是单面或双面的超研磨颗粒可排列成一预定图案。上述的图案可为均匀分布图案或非均匀分布图案。此外,便于超研磨颗粒排列成预定图案的各种技术都可被考虑。「预定」应理解为意思是非随意图案,而是在排列超研磨颗粒前就已经预期的图案。在一方面中,预定图案也可适用于颗粒间的预定间距,该技术可包括:利用一模板排列;利用点黏排列;排列一图案于一第一衬底,随后将特定图案由第一衬底转移至金属支撑层;及其类似方式,或包括其组合,但不限于此。可利用各种技术将任一单层的超研磨颗粒暂时握持在预定图案的位置上,其技术包括:黏着剂、在金属支撑基体上设凹穴位置、支撑化合物(supportingcompound)(如,蜡)、及其类似方式,或包括其组合,但不限于此。在一具体方面中,利用黏着剂将超研磨颗粒暂时接着于金属支撑层,接着在修整器的制造过程中挥发并移除。
将一单层的超研磨颗粒层设置于金属支撑层的每一侧,因此可调节硬焊温度产生的热收缩,否则排列在其中一面的超研磨颗粒的分布会变形。通过将一单层铺设于金属支撑层的每一侧,在两侧面的变形作用力,如热运动及压力,可以为相等或基本上相等。据此,该金属支撑层的变形可被最小化。换句话说,造成变形的作用力为基本上相等地作用于金属支撑层的每一侧,可因此至少部分地相互抵消,进而减少变形的发生。在一些方面中,在金属支撑层每一侧的超研磨颗粒可具有彼此相配的构形、图案、或方向性。依照此方式,金属支撑层每一侧的超研磨颗粒可具有基本上相配的间隙排列。在另一方面中,构形、图案、或方向性可以彼此不相同或多变的(varied),或为部分相配。在再一方面中,金属支撑层的一侧的超研磨颗粒的图案配置可基本上对齐金属支撑层的另一侧的超研磨颗粒的图案配置,以使颗粒位置彼此相配。在一些方面中,在金属支撑层一侧的超研磨颗粒的空间定位与金属支撑层另一侧的超研磨颗粒的空间定位间可直接相对应。在另一方面中,超研磨颗粒的图案可彼此相配或基本上相配,但在金属支撑层的相对侧可能具有偏差,使颗粒位置彼此不相配。
在另一方面中,如图2所示,将一第一单层超研磨颗粒22排列于一金属支撑层24的一表面上。而将一第二单层超研磨颗粒26排列于相对第一单层的一侧。以一接合材料28将第一单层及第二单层稳固于金属支撑层24,该接合材料可以为任何能够稳固第一及第二单层于金属支撑层的材料。在一些方面中,用于稳固第一单层及第二单层的接合材料可为相同,同时在其他方面中,用于稳固第一单层及第二单层的接合材料可为不相同。接合材料可为任何能够稳固超研磨颗粒于其中的材料。接合材料可包括:如金属焊料、金属焊料合金、有机基质材料、烧结材料、电镀材料、及其类似物,或包括其组合,但不限于此。
在一方面中,例如,超研磨颗粒可硬焊于金属支撑层,因此接合材料可为金属焊料或金属焊料合金。金属硬焊技术为本技术领域中普通技术人员所现有的技术。一绿色硬焊材料可应用于金属支撑层之上或超研磨颗粒的周围。金属焊料可适用于任何现有的结构,包括焊片、粉末、膏状物、喷雾状物、及其类似物,或包括其组合。一旦铺设于金属支撑层,焊料可被加热并熔融涂布于金属支撑层的至少一部分,进而接合超研磨颗粒。加热温度可视所使用的硬焊材料而变化,然而在一方面中,加热温度可为约700℃至约1200℃。为了减少变形,在第一及第二单层的超研磨颗粒如此排列,使得在加热及冷却过程中,施加于金属支撑层的热作用力(thermalforce)为基本上相等。
在一非限定实施例中,可通过以一镍基合金硬焊,将超研磨颗粒接合于金属支撑层,其中,镍基合金可包含铬或不包含铬。在另一实施例中,为了将超研磨颗粒尖端平坦化,在硬焊可包括以一平坦陶瓷材料挤压超研磨颗粒,且该平坦陶瓷材料不会与焊料接合。可利用各种焊接合金,如,BNi2、BNi7、及其类似物,但不限于此。
此外,在一方面中,至少一第一及第二单层超研磨颗粒可通过电沉积方式耦合于金属支撑层,因此接合材料可以为一电沉积金属材料。在一方面中,一单层的超研磨颗粒可沉积于金属支撑层,接着置于一包含金属离子的离子溶液中。导入一电流于上述的离子溶液,以使一金属层可被电镀在金属支撑层,用以稳固超研磨颗粒。因此通过上述方式,可将超研磨颗粒耦合于金属支撑层。在电沉积程序之前及期间,一个用于定位及保持超研磨材料的适当方式,可例如使用一个包括绝缘材料的模具,其中,该绝缘材料可有效地防止电沉积材料在成型表面(molding surface)的聚集。超研磨颗粒可因此在电沉积过程中握持在模具的成型表面。据此,可防止在颗粒尖端及研磨垫修整器衬底的工作表面上产生电沉积材料的聚集。上述的技术已揭示美国专利申请号11/292,938,申请日为2005年12月2日,于此纳入本发明以供参考。
在另一方面中,超研磨颗粒可通过烧结方式接合于金属支撑层,因此接合材料可包括一烧结材料。举例而言,将超研磨颗粒接合于金属支撑层可包括设置一烧结化合物于金属支撑层,并与至少一个第一单层或第二单层接触,并烧结该烧结化合物,以接合超研磨颗粒于金属支撑层。适用的烧结方法可通过本发明所属领域的通常技艺而轻易地被理解。基本上,烧结化合物可涂布在超研磨颗粒周围,并与金属支撑层接触。该烧结化合物可为任何现有的烧结材料,其用于稳固超研磨颗粒于基材。烧结材料可包括:金属及金属合金粉末、陶瓷粉末、及其类似物,但不限于此。烧结化合物的具体例子为钴粉末,并不限于此。当烧结化合物涂布于超研磨颗粒周围及金属支撑基材,接着加热且在一些情况下可提供压力,以进行烧结。在一些方面中,在接合过程中,可将焊料或焊料合金熔渗入该烧结化合物,进而强化对材料基质的接合。
在另一方面中,如图3所示,加热及加压可应用于将第一单层超研磨颗粒32和/或第二单层超研磨颗粒36直接接合于该金属支撑层34。因此,在其上面加热及加压后,该金属支撑层34会软化或部分熔融。接着,将一个或多个单层中的超研磨颗粒被挤压入金属支撑层。当将超研磨颗粒被挤压入金属支撑层时,可利用一平坦化的平坦表面施加压力于单层上,以维持超研磨颗粒尖端的平坦性质。冷却后,金属支撑层任一侧的超研磨颗粒分布,其作用于金属支撑层的热作用力至少部分相等,并进而减少变形。此外,用于制造此装置的温度及压力可根据所用的材料及设备而变化。在一方面中,例如,加热温度为约700℃至1000℃。在另一方面中,施加的压力为约10MPa至约50Mpa。
在再一方面中,如图4所示,一化学机械研磨垫修整器可包括一第一单层超研磨颗粒42及一第二单层超研磨颗粒46耦合于金属支撑层44。超研磨颗粒可直接地耦合于金属支撑层或通过接合材料耦合于金属支撑层。第二单层超研磨颗粒46耦合于一刚性支撑体48。在图4中,移除刚性支撑体48的一部分,以露出第二单层。刚性支撑体48可便于化学机械研磨垫修整器的操作及使用。通过接合第二单层超研磨颗粒于刚性支撑体上,使第一单层超研磨颗粒在化学机械研磨垫的操作状态时仍可维持露出。
刚性支撑体可由任何适用于研磨或修整程序的材料。其此材料可包括高分子材料、金属材料、陶瓷材料、玻璃、复合材料、及其类似物。在一方面中,刚性支撑体可为高分子材料,并可利用加热、挤压、黏着剂等方式将第二单层超研磨颗粒嵌入刚性支撑体中。在一些方面中,刚性支撑体可为非高分子材料,如金属材料。在上述情况下,可通过黏着剂黏附、焊锡、硬焊、电镀、及其类似方式,以将超研磨颗粒接合于刚性支撑体。关于硬焊技术,在加热及冷却过程中须注意减少或排除金属支撑层的变形。在另一方面中,可设置一个或多个磁性元件于刚性支撑体中,以吸引或固定化学机械研磨垫修整器于适当的位置,因此形成暂时性的附着。在使用的期间,可利用一选择性锁定机制进一步固定化学机械研磨垫修整器于刚性支撑体。在一些方面中,刚性支撑体可包括表面形态,使其在对化学机械研磨垫的旋转运动期间,可保持修整器于适当的位置。刚性支撑体可具有与金属支撑层大致相同的直径、大于金属支撑层的直径、或一些情况下具有小于金属支撑层的直径。
各种高分子材料可被考虑作为刚性支撑体,适用的材料包括:胺基树脂(amino resins)、丙烯酸酯树脂(acrylate resins)、醇酸树脂(alkyd resins)、聚酯树脂(polyester resins)、聚酰胺树脂(polyamide resins)、聚酰亚胺树脂(polyimide resins)、聚胺基甲酸酯树脂(polyurethane resins)、酚醛树脂(phenolic resins)、酚醛/乳胶树脂(phenolic/latex resins)、环氧树脂(epoxyresins)、异氰酸酯树脂(isocyanate resins)、异三聚氰酸树脂(isocyanurateresins)、聚硅氧烷树脂(polysiloxane resins)、反应性乙烯基树脂(reactivevinyl resins)、聚乙烯树脂(polyethylene resins)、聚丙烯树脂(polypropyleneresins)、聚苯乙烯树脂(polystyrene resins)、苯氧基树脂(phenoxy resins)、苝树脂(perylene resins)、聚砜树脂(polysulfone resins)、丙烯腈-丁二烯-苯乙烯树脂(acrylonitrile-butadiene-styrene resins)、丙烯酸树脂(acrylicresins)、聚碳酸酯树脂(polycarbonate resins)、聚酰亚胺树脂(polyimideresins)、及其混合物,但不限于此。在一具体方面中,高分子材料可为环氧树脂。在另一方面中,高分子材料可为聚酰亚胺树脂。在再一方面中,高分子材料可为聚胺基甲酸酯树脂。
在使用高分子材料时,用于固化高分子材料的方法可以为本技术领域具有通常知识着所熟知的各种方法,可使高分子材料至少自柔软状态相转变成刚性状态。固化的发生可通过将高分子材料暴露于热、电磁辐射(如,紫外光、红外光、及微波辐射)、颗粒冲击(如,电子束)、有机催化剂、无机催化剂、或任何其他现有的固化方法,但不限于此。
在本发明的一方面中,高分子材料可为热塑性材料,分别通过冷却与加热,可使热塑性材料呈现可逆性的硬化及软化。在一方面中,高分子材料层可为热固性材料,无法如同热塑性材料呈现可逆性的硬化及软化。换句话说,一旦发生固化,此过程基本上是不可逆的。
此外,在一方面中,可涂布一耦合剂或有机金属化合物在超研磨材料的表面,通过化学键以促进超研磨颗粒维持在高分子材料中。本技术领域中普通技术人员所现有的各种有机及有机金属化合物都可被利用。有机金属耦合剂可于超研磨材料及高分子材料间形成化学键结,因此增加在第二单层超研磨颗粒与高分子材料间的接合。依照上述方式,有机金属耦合剂可作一桥梁,以在高分子材料与超研磨材料表面间形成键结。在一方面中,有机耦合剂可为钛酸盐(titanate)、锆酸盐(zirconate)、硅烷(silane)、或其混合物。有机金属耦合剂的含量的使用可视耦合剂及超研磨材料的表面积而定。在一方面中,有机金属耦合剂的含量占高分子材料层的0.05至10重量百分比就足够。
在本发明的另一方面中,一种化学机械研磨垫修整器的制作方法可包括:设置一第一单层超研磨颗粒于一金属支撑层;以及,设置一第二单层超研磨颗粒于该金属支撑层的相对该第一单层的一侧。第二单层超研磨颗粒位于与该第一单层超研磨颗粒基本上相同分布的位置。此制作方法可还包括接合第一单层超研磨颗粒及第二单层超研磨颗粒于金属支撑层上,以使在第一单层及第二单层间的对称作用力基本上为相似的分布,可用以防止金属支撑层实质上变形。
在再一方面中,设置至少一第一单层超研磨颗粒或第二单层超研磨颗粒的步骤包括:将多个超研磨颗粒黏着至黏着转印片(adhesive transfersheet),并通过一模板(template)的空隙设置一预定图案,接着,自将模板自黏着转印片移除,以使多个超研磨颗粒以一预定图案保持黏着于黏着转印片。之后,将多个超研磨颗粒随着黏着转印片而转换至金属支撑层,并将黏着转印片由多个超研磨颗粒中移除,进而形成至少一第一单层超研磨颗粒或第二单层超研磨颗粒。
在本发明的又一方面中,一种减少化学机械研磨垫修整器在制造过程中变形的方法,其包括在接合多个超研磨颗粒期间在金属支撑层的相对侧含有基本上相等的变形作用力,其中,由于相对两侧的作用力相等,使金属支撑层在接合期间的变形减少。在一方面中,基本上相等作用力的方式,其包括排列多个超研磨颗粒于金属支撑层的相对侧,以使多个超研磨颗粒在支撑层的每一侧具有基本上相同的分布,使接合期间具有基本上相同的变形作用力。
须注意的是,尽管上述揭露主要是指化学机械研磨垫修整器,其它精密研磨(grinding)和/或研磨(abrading)工具也包含在本发明的范畴内。据此,本文中所揭露的技术及教导可同时应用于类似的工具中。
以下是以各种方式制作本发明的散热器的实施例。这些实施例仅用于说明,并不会限缩本发明的范围。
实施例
实施例1
一薄金属层(如,100微米厚的铜)具有一黏着层(即,3M生产,25微米,易变化(即,易挥发而不会残留碳))于每一侧。将涂布钛的金刚石颗粒(如,约50微米)分散于两侧面以在每一侧制作出单层金刚石颗粒,并移除多余的金刚石。将层配置于覆盖了铜粉末薄层的石墨模具内。再加另一层铜粉末薄层在该层上。然后,将此组件(assembly)在真空或惰性气体下热压(如,900℃,20分钟),以形成具有金刚石颗粒突出于两侧的碟盘。因钛涂层的存在,使铜与金刚石颗粒更稳固地结合。此碟盘的平整度可通过平坦的模具表面而维持。
实施例2
如同实施例1,除了薄金属铜层具有硬焊合金层(如,Cu-Sn-Ti或Ag-Cu-Ti)耦合至每一侧。未涂布的金刚石颗粒以黏着剂设置于硬焊合金层的暴露侧。将该组件在真空炉加热融熔焊料,形成一铜层覆盖于在两侧的金刚石颗粒。
实施例3
将实施例2的金刚石附着层悬浮在连接至阴极的CuSO4电解质溶液。该阳极为一铜电极。在将电流通过电解质后,铜会被电镀在铜层以及金刚石颗粒间的间隙,进而增强金刚石颗粒至铜金属层的接合。
实施例4
如同实施例2,除了铜层以薄镍层取代,且硬焊层为Ni-Cr-B-Si(BNi2,如Wall Colmonoy所生产的Nichrobraze LM),而金刚石颗粒(如,150微米)以网状图案排列(如,间距为500微米)。
实施例5
将实施例4所形成的对象,对一平面衬底(108毫米直径,6.5毫米厚度)挤压,并加热配置于其间的一热塑性黏着剂(如,150℃,10分钟)。结果获得一工具,如具有平坦表面的化学机械研磨垫修整器。该修整器的每一侧的单层可调节由该硬焊温度(如,1020℃,10分钟)所产生的热收缩,其中,该硬焊温度会造成其中一侧的金刚石分布不对称。
当然,应了解上述配置仅为说明本发明原理的应用。在不偏离本发明精神和范围情况下,通过所属领域的技术可设计出许多修改和替代配置,且所附权利要求将要包含这些修饰和配置。于是,尽管已使用当前认为是本发明最实际且优选的实施例来特定且详细地在上面描述了本发明,但是显然对所属领域的一般技术来说,在不偏离本文所阐明的原理和概念的情况下可进行许多修改,所述修改包括尺寸、材料、形状、形式、功能和操作方式、装配和用途的变化,但不限于这些。

Claims (23)

1.一种化学机械研磨垫修整器,包括:
一第一单层超研磨颗粒,设置及耦合于一金属支撑层的一侧;以及
一第二单层超研磨颗粒,设置及耦合于该金属支撑层的第一单层的相对侧;其中,该第二单层超研磨颗粒位于与该第一单层超研磨颗粒具有基本相同分布的位置。
2.根据权利要求1所述的修整器,其中,该第一单层超研磨颗粒包括一成份,其选自由:金刚石材料、氮化物材料、陶瓷、或其组合所组成的群组。
3.根据权利要求1所述的修整器,其中,该第一单层超研磨颗粒为一金刚石材料。
4.根据权利要求1所述的修整器,其中,该第一单层超研磨颗粒为一立方氮化硼材料。
5.根据权利要求1所述的修整器,其中,该第二单层超研磨颗粒包括一成份,其选自由:金刚石材料、氮化物材料、陶瓷、或其组合所组成的群组。
6.根据权利要求1所述的修整器,其中,该第二单层超研磨颗粒为一金刚石材料。
7.根据权利要求1所述的修整器,其中,该第二单层超研磨颗粒为一立方氮化硼材料。
8.根据权利要求1所述的修整器,还包括一刚性支撑体,其耦合于相对该第一单层的该第二单层超研磨颗粒。
9.根据权利要求1所述的修整器,其中,至少一该第一单层超研磨颗粒或该第二单层超研磨颗粒利用一焊料合金耦合于该金属支撑层。
10.根据权利要求1所述的修整器,其中,该第一单层超研磨颗粒及该第二单层超研磨颗粒两者都利用一焊料合金耦合于该金属支撑层。
11.根据权利要求1所述的修整器,其中,该第二单层超研磨颗粒位于与该第一单层超研磨颗粒具有基本相同分布的位置。
12.一种化学机械研磨垫修整器的制作方法,包括:
设置一第一单层超研磨颗粒于一金属支撑层;
设置一第二单层超研磨颗粒于该金属支撑层的相对该第一单层的一侧;其中,该第二单层超研磨颗粒位于与该第一单层超研磨颗粒基本相同的分布的位置;以及
接合该第一单层超研磨颗粒及该第二单层超研磨颗粒于该金属支撑层,使在该第一单层及该第二单层间的对称作用力为基本相似的分布,以防止该金属支撑层实质上变形。
13.根据权利要求12所述的制作方法,其中,至少一该第一单层或该第二单层的接合为利用一焊料合金进行硬焊。
14.根据权利要求12所述的制作方法,其中,至少一该第一单层或该第二单层的接合在加热及加压下进行。
15.根据权利要求14所述的制作方法,其中,至少一该第一单层或该第二单层的接合还包括:
设置一烧结化合物于该金属支撑层上,并与至少一该第一单层或该第二单层接触;以及
烧结该烧结化合物,以接合至少一该第一单层或该第二单层于该金属支撑层。
16.根据权利要求15所述的制作方法,其还包括在接合过程中,以一硬焊材料熔渗入该烧结化合物。
17.根据权利要求15所述的制作方法,其中,至少一该第一单层或该第二单层直接地加热及加压以结合于该金属支撑层。
18.根据权利要求12所述的制作方法,其中,该第二单层超研磨颗粒位于对齐于该第一单层的该超研磨颗粒的位置。
19.根据权利要求12所述的制作方法,还包括耦合该第二单层超研磨颗粒于一刚性支撑体。
20.根据权利要求19所述的制作方法,其中,该第二单层超研磨颗粒耦合于该刚性支撑体,利用一选自由下述技术完成,如,热压、硬焊、烧结、焊锡、电镀、聚合物接合、及其组合所组成的群组。
21.根据权利要求19所述的制作方法,其中,该第二单层超研磨颗粒耦合于该刚性支撑体,利用聚合物接合完成。
22.一种减少化学机械研磨垫修整器在制造过程中变形的方法,包括:
在接合多个超研磨颗粒于一金属支撑层期间,在该金属支撑层的相对侧为基本上相等的变形作用力,其中,由于在相对侧的为相等的作用力,使接合期间在支撑层的变形减少。
23.根据权利要求22所述的方法,其中,基本上相等作用力的方式,其包括排列多个超研磨颗粒于该金属支撑层的相对侧,以使该多个超研磨颗粒在该支撑层的每一侧具有基本相同的分布,使接合期间具有基本上相等的变形作用力。
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