CN103197517A - Workbench balancing-mass mass-center measuring and correcting method - Google Patents

Workbench balancing-mass mass-center measuring and correcting method Download PDF

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Publication number
CN103197517A
CN103197517A CN2012100014221A CN201210001422A CN103197517A CN 103197517 A CN103197517 A CN 103197517A CN 2012100014221 A CN2012100014221 A CN 2012100014221A CN 201210001422 A CN201210001422 A CN 201210001422A CN 103197517 A CN103197517 A CN 103197517A
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mass
barycenter
value
balancing
balance mass
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CN103197517B (en
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吴立伟
董俊清
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Shanghai Micro Electronics Equipment Co Ltd
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Abstract

The invention relates to a workbench balancing-mass mass-center measuring and correcting method comprising the steps that: the balancing-mass is adopted as a testing and correcting object; horizontal X, Y degrees of freedom (DOF) are in opened ring, and an Rz DOF is in a closed ring; a trajectory is provided for the balancing-mass; balancing-mass zero-speed section displacement measurement output is collected; the balancing-mass displacement data is processed, such that balancing-mass horizontal three-DOF displacement values are obtained; the data obtained by processing is introduced into a mass-center measuring and correcting method, such that an eccentricity amount of the balancing-mass mass-center relative to a centroid is obtained. According to the invention, a mass-center deviation of the balancing-mass mass-center relative to a physical sensor measuring center is determined through the measurement values of the balancing-mass physical sensor. The method is simple and practical. With the method, no additional testing device is needed.

Description

A kind of work-piece platform balancing quality barycenter detection calibration method
Technical field
The present invention relates to photoetching technique, relate in particular to a kind of work-piece platform balancing quality barycenter detection calibration method.
Background technology
Lithographic equipment is a kind of with the equipment of mask pattern exposure image to the silicon chip.Known lithographic equipment comprises that stepping repeats formula and step-scan formula lithographic equipment.An important aspect weighing these lithographic equipments is exactly accuracy, i.e. the accuracy that can move of the parts that between the light period, will move, and the described parts that will move have: the mask platform of carrying mask pattern, the silicon chip platform of carrying silicon chip.Generally speaking, all can adopt position feedback, utilize standard based on the PID(proportional-integral-differential) control system control.Simultaneously, in order to obtain the position accuracy of Nano grade, and response time fast, just require lithographic equipment that bigger acceleration and the impact less to the measuring basis framework are arranged, and these two indexs are conflicting often, so, in many lithographic equipments, all adopt the structure of silicon chip platform-balance mass, silicon chip platform motor produces bigger acceleration and satisfies the requirement of response fast, the counter-force of silicon chip platform motor is applied on the balance mass, and the balance mass counter motion absorbs the impact of silicon chip platform, satisfies the requirement to the less impact of measuring basis framework.Silicon chip platform-balance mass system satisfies the barycenter conservation in motion process.In the reality, balance mass motor-driven center is center of mass point, but measuring center is often got centroid point, like this, when realizing control, just have the conversion of control signal from the position of form center to the centroid position, this conversion is closely related with the position deviation of barycenter and the centre of form, if barycenter and position of form center are not well surveyed the school, the words that deviation is bigger, control performance just can not reach the precision that needs, and can cause that the excessive of motor exert oneself, and produces big heat power consumption.So in order to obtain lithographic equipment performance preferably, the barycenter of balance mass needs accurately to demarcate.
Summary of the invention
At above-mentioned technical matters, the basic ideas of detection calibration barycenter of the present invention are, in silicon chip platform-balance mass system, balance mass is being moved under the effect of silicon chip platform motor counter-force and under the motor effect of balance mass own, and its moving displacement is detected by corresponding measuring mechanism.Take balance mass as research object separately, balance quality Rz axle and add closed-loop control, its feedback signal is measured conversion by testing agency above-mentioned and is obtained.The X of balance mass and the open loop of Y degree of freedom direction are not controlled.When only giving Rz to injecting the movement locus signal, if the barycenter of balance mass and the centre of form (being the measuring center of measuring mechanism) level is when overlapping fully, the measured value of measuring the balance mass Rz degree of freedom that conversion obtains through measuring mechanism is to follow the input trajectory value, and the measured value of X and Y degree of freedom should be zero.But, when barycenter and the centre of form of balance mass do not overlap, be the relative centre of form of barycenter exist X and (or) during Y-direction eccentric, measure the value that conversion obtains X and (or) Y-direction has certain displacement output, and the off-centre of the angle that the size of this displacement output and Rz rotate and the relative centre of form X of barycenter, Y-direction is relevant, and the rotational movement amount of mobile of the output that we can be by survey sensor and Rz obtains the off-centre of the relative centre of form of barycenter thus.
Accordingly, the present invention proposes a kind of barycenter and survey the method in school, can survey the school by the balance mass position transducer and go out the barycenter of balance mass under centre of form coordinate system, by the barycenter conservation of silicon chip platform-balance mass system, obtain the movement locus of the barycenter of silicon chip platform further.
The work-piece platform balancing quality barycenter detection calibration method that the present invention proposes has following steps:
Step 1, generate N group Rz track at balance mass, set full test number of times M;
Step 2, suppose barycenter deviation when initial
Figure 2012100014221100002DEST_PATH_IMAGE002
,
Figure 2012100014221100002DEST_PATH_IMAGE004
Be zero, set XY to searching threshold spec_x and the spec_y of barycenter;
Step 3, select the test model of X, Y, Rz axle, with this moment
Figure 2012100014221100002DEST_PATH_IMAGE006
,
Figure 592201DEST_PATH_IMAGE004
Value is updated in the test model, selects one group of Rz track, is injected into test model;
Step 4, operation test model obtain the output of balance mass zero-speed section shift measurement, and then obtain the displacement output of XYRz Three Degree Of Freedom
Figure 2012100014221100002DEST_PATH_IMAGE008
,
Figure 2012100014221100002DEST_PATH_IMAGE010
With
Figure 2012100014221100002DEST_PATH_IMAGE012
, according to formula:
Figure 2012100014221100002DEST_PATH_IMAGE014
Calculate at this moment ,
Figure 2012100014221100002DEST_PATH_IMAGE018
Value and record;
Step 5, import next group Rz track, repeating step three and step 4 obtain different
Figure 2012100014221100002DEST_PATH_IMAGE020
, Value and record;
After step 6, the record N sub-value, be averaging, obtain the barycenter deviation after this group test is finished
Figure 2012100014221100002DEST_PATH_IMAGE022
,
Figure DEST_PATH_IMAGE024
Value;
Step 7, judge whether to have finished M test, if do not finish, then to obtaining
Figure DEST_PATH_IMAGE026
,
Figure DEST_PATH_IMAGE028
, compare with the searching threshold spec_x, the spec_y that set respectively, if
Figure 281731DEST_PATH_IMAGE026
,
Figure 865160DEST_PATH_IMAGE004
All less than searching threshold, think that then surveying the school finishes, and confirm that the side-play amount of barycenter is
Figure DEST_PATH_IMAGE030
,
Figure 52558DEST_PATH_IMAGE004
If
Figure 37832DEST_PATH_IMAGE026
,
Figure DEST_PATH_IMAGE032
In at least one great-than search threshold value, with this moment
Figure 285274DEST_PATH_IMAGE002
,
Figure 355998DEST_PATH_IMAGE004
Value substitution test model, repeating step three ~ six, up to
Figure DEST_PATH_IMAGE034
,
Figure 347088DEST_PATH_IMAGE018
Value is finished and is surveyed the school less than the searching threshold of setting; Perhaps up to the testing time M of testing time greater than setting, finish and survey the school.
Wherein, described track is the three rank movement locus that comprise kinematic parameters such as displacement, speed and acceleration.
Wherein, described test model is open loop at the XY axle, is closed loop at the Rz axle.
Wherein, utilize the grating chi to realize the closed loop of described Rz axle.
Wherein, described grating chi is the two-dimensional grating chi.
Barycenter detection calibration method of the present invention is determined the barycenter deviation of the relative physical sensors measuring center of balance mass barycenter by the measured value of balance mass physical sensors, and this method is simple and practical, does not need to increase extra proving installation.
Description of drawings
Can be by following detailed Description Of The Invention and appended graphic being further understood about the advantages and spirit of the present invention.
Figure 1 shows that the structural representation of the silicon chip platform in the used lithographic equipment of method of the present invention;
Figure 2 shows that the fundamental block diagram of the closed-loop control that method of the present invention is used;
Figure 3 shows that the structural representation of the balance mass measuring mechanism that method of the present invention adopts;
Figure 4 shows that balance mass barycenter of the present invention is surveyed the school and online compensation is controlled block diagram;
Figure 5 shows that in the simulation example, to closed loop, join the example of the movement locus of Rz axle at balance mass Rz;
Figure 6 shows that in the above-mentioned simulation example that to closed loop, and when adding the 1mrad movement locus, the balance mass level is to the displacement output map of each degree of freedom at balance mass Rz;
Figure 7 shows that balance mass barycenter test flow chart of the present invention.
Embodiment
Describe specific embodiments of the invention in detail below in conjunction with accompanying drawing.
Figure 1 shows that the structural representation of the silicon chip platform in the used lithographic equipment of method of the present invention.The silicon chip that is exposed is placed on the micropositioner 101, and micropositioner 101 is placed on the coarse motion platform 102, uses auxiliary connection 106 to connect between them, and this auxiliary connection can be multiple auxiliary connections such as air-bearing connection, magnetic bearing connection.Micropositioner 101 can move at the space six degree of freedom.Coarse motion platform 102 is placed on the balance mass 103, uses auxiliary connection 106 to connect between them.Balance mass 103 is placed on the basic framework 104.Also has gage frame 105 on the basic framework 104.All use auxiliary connection 106 to be connected between balance mass 103 and basic framework 104, basic framework 104 and the gage frame 105.Described auxiliary connection 106 can adopt multiple connected modes such as air-bearing connection, magnetic bearing connection.Basic framework 104 directly is placed on the ground 107.
In the present embodiment, in order accurately to locate the silicon chip on the micropositioner 101 fast, gage frame 105 is measured micropositioner 101 with respect to the position of gage frame 105, and feed back, compare with micropositioner 101 movement locus of setting, obtain measured deviation, feedback controller is adjusted amplification to deviation signal, controlled signal, the micropositioner actuator drives micropositioner 101 motions according to control signal, forms close loop control circuit.
But the big stroke motion of the closed loop that only depends on micropositioner 101 does not reach the bearing accuracy that needs often, so add coarse motion platform 102, adopts the mode of rough micro-moving mechanism combination to realize the quick high accuracy location.Adopt balance mass 103 counter motions to reduce the external interference of whole silicon wafer platform system simultaneously.Coarse motion platform 102 and balance mass 103 arrange close loop control circuit equally, utilize optical grating ruler measurement coarse motion platform 102 with respect to the position of balance mass 103, utilize optical grating ruler measurement balance mass 103 with respect to the position of basic framework 104.Concrete closed-loop control loop can be with reference to shown in Figure 2, wherein track setting module 201 is set the movement locus of motion object module 204, survey sensor module 205 is measured the actual motion track of motion object module 204, the movement locus of actual motion track and setting is relatively obtained position error signal 206, position error signal 206 is sent to feedback controller module 202, controlled signal 207 also transfers to executor module 203 with control signal, 204 motions of executor module 203 controlled motion object modules, survey sensor module 205 is measured the actual motion track of motion object module 204 again and is compared with the movement locus of setting, and the repetition said process, until final location.
According to the introduction of front, in order to realize the high-speed, high precision location, need obtain the accurate position of the barycenter relative equilibrium quality centre of form of balance mass.
Figure 3 shows that the structural representation of the balance mass measuring mechanism that method of the present invention adopts, SN1 and SN2 are that balance mass is measured the grating chi among the figure, wherein each grating chi SN1 or SN2 are the two-dimensional grating chis, namely can measure balance mass simultaneously in the displacement of diagram directions X and diagram Y-direction, the ruler of grating chi is installed on the external frame of balance mass lower floor, and its read head is installed on the balance mass.The grey blockage represents to measure initial position among the figure, and white blockage is represented the measuring position after balance mass rotates to an angle.Ly1 and Lx1 are the distance that SN1 arrives X-axis and Y-axis, and Ly2 and Lx2 are the distance that SN2 arrives X-axis and Y-axis.The circle of filling grid among the figure represents the balance mass centroid position,
Figure 124551DEST_PATH_IMAGE016
With
Figure DEST_PATH_IMAGE036
Be respectively the off-centre of the relative centre of form of balance mass barycenter, wherein centroid point is just at coordinate origin.
If: the measured value of balance mass grating chi SN1, SN2 is: x1, y1 and x2, y2
The logic axial translation value of the balance mass centre of form is: x_pos, y_pos, rz_pos
The logic axial translation value of balance mass barycenter is: x_pos_cg, y_pos_cg, rz_pos_cg
When there is not off-centre in balance mass, when namely barycenter and the centre of form overlap,
Figure DEST_PATH_IMAGE038
With
Figure DEST_PATH_IMAGE040
All be zero, the physical measurements values of balance mass SN1 and SN2 (be expressed as x1 respectively, y1 and x2, y2) and shift value (the X-direction shift value x_pos of balance mass barycenter (being the centre of form) logic axle, Y-direction shift value y_pos, Rz is to shift value rz_pos) between the pass be:
Figure DEST_PATH_IMAGE042
Formula (1).
When
Figure DEST_PATH_IMAGE044
With
Figure DEST_PATH_IMAGE046
Non-vanishing, when namely the barycenter of balance mass and the centre of form did not overlap, the pass between the measured value of balance mass SN1 and SN2 and the balance mass barycenter logic axial translation value was:
Figure DEST_PATH_IMAGE048
Formula (2).
Formula (1) and formula (2) associating can obtain:
Figure DEST_PATH_IMAGE050
And then can obtain:
Figure DEST_PATH_IMAGE052
Formula (3)
When Rz adds movement locus to closed loop, and X, when Y-direction does not add track (namely setting displacement is zero) and open loop, the displacement x _ pos of X and Y-direction, y_pos are zero.If sensor measurement to balance mass when X or Y-direction have displacement, this displacement since the centre of form do not overlap with barycenter and do not cause that namely the relative centre of form coordinate system of barycenter has displacement.Like this, formula (3) can further be expressed as:
Figure DEST_PATH_IMAGE054
Formula (4)
From formula (4) as can be seen, as long as we obtain under the inclined to one side barycenter, the displacement of balance mass X and Y degree of freedom output, in conjunction with Rz to movement locus, the offset that just can calculate the relative centre of form of balance mass barycenter.
The flow process of barycenter being surveyed the school below in conjunction with the process flow diagram in balance mass barycenter survey school shown in Figure 7 is described.This flow process has following steps:
Step 1, at balance mass generate N(in the present embodiment N be " 5 ") organize the Rz track, this track is the three rank movement locus that comprise kinematic parameters such as displacement, speed and acceleration in the present embodiment, and setting full test number of times M(M in the present embodiment is " 20 ");
Step 2, suppose that the barycenter deviation is zero when initial, namely
Figure DEST_PATH_IMAGE056
,
Figure DEST_PATH_IMAGE058
Be zero; Set XY to searching threshold spec_x and the spec_y of barycenter, this threshold value is used for judging whether to proceed search, after search
Figure DEST_PATH_IMAGE060
,
Figure DEST_PATH_IMAGE062
Value thinks to have searched actual barycenter that search just can finish during less than threshold value; After search
Figure DEST_PATH_IMAGE064
,
Figure DEST_PATH_IMAGE066
Value then continues search during more than or equal to threshold value;
Step 3, select test model according to the balance mass system of reality, this test model is in the open loop of XY axle, and Rz axle closed loop comprises above-mentioned balance mass module and two-dimensional grating chi in the test model, with this moment
Figure 228380DEST_PATH_IMAGE002
,
Figure DEST_PATH_IMAGE068
Value is updated in the test model, selects one group of Rz track, is injected into test model; In the present embodiment, test model is selected online compensation model as shown in Figure 4, and movement locus is the three rank movement locus of describing in the step 1;
Step 4, operation test model, obtain balance mass zero-speed section shift measurement output (the zero-speed section that arrives trajectory planning constantly after through the displacement data of certain stabilization time), through displacement data handle the displacement output that obtains the XYRz Three Degree Of Freedom after (the physical axis shift value that the balance mass sensor is obtained is converted into logic axial translation value),
Figure DEST_PATH_IMAGE070
With
Figure DEST_PATH_IMAGE072
, calculate at this moment according to formula (4) ,
Figure 253284DEST_PATH_IMAGE032
Value and record;
Step 5, import next group Rz track, repeating step three and step 4 obtain different
Figure 947571DEST_PATH_IMAGE020
, Value and record;
After step 6, the record N sub-value, calculate its mean value, obtain the barycenter deviation after this group test is finished
Figure 582132DEST_PATH_IMAGE016
,
Figure DEST_PATH_IMAGE074
Value;
Step 7, judge whether to have finished M test, if do not finish, then to obtaining
Figure 915024DEST_PATH_IMAGE016
,
Figure 463817DEST_PATH_IMAGE036
, compare with the searching threshold spec_x, the spec_y that set respectively, if
Figure 551859DEST_PATH_IMAGE006
, all less than searching threshold, think that then surveying the school finishes, the offset of the relative centre of form of barycenter is
Figure 756575DEST_PATH_IMAGE026
,
Figure 955475DEST_PATH_IMAGE036
If,
Figure 293528DEST_PATH_IMAGE038
,
Figure 552471DEST_PATH_IMAGE004
In at least one great-than search threshold value, with this moment
Figure 306801DEST_PATH_IMAGE038
, Value substitution test model, repeating step three ~ six, up to
Figure DEST_PATH_IMAGE076
,
Figure 504881DEST_PATH_IMAGE004
Value is finished and is surveyed the school less than the searching threshold of setting, and perhaps up to the testing time M of testing time greater than setting, finishes and surveys the school.
Figure 4 shows that the balance mass barycenter is surveyed the school and online compensation is controlled block diagram, namely barycenter is surveyed the synoptic diagram of school and online compensation model.Among the figure, barycenter online compensation model 401 is surveyed the barycenter correction that module 405 acquisitions in school need by barycenter, be input in the online compensation model, calculate the power output of physics motor, feed in motor and the controlled device module 402, two-dimensional grating chi module 403 is measured the displacement of balance mass in real time, obtain the displacement output of balance mass Three Degree Of Freedom by measurement modular converter 404, feeding barycenter surveys in the school module 405, barycenter is surveyed school module 405 bases survey school flow process as shown in Figure 7, obtain the offset of barycenter, be input to again in the online compensation model 401, real-time compensation control.
Figure 5 shows that in the simulation example, to closed loop, join the movement locus of Rz axle at balance mass Rz.
Figure 6 shows that in the simulation example that to closed loop, and when adding the 1mrad movement locus, the balance mass level is to the displacement output map of each degree of freedom at balance mass Rz.First width of cloth figure refers to the displacement output of balance mass X-direction among Fig. 6, and second width of cloth figure refers to the displacement output of balance mass Y-direction, the 3rd width of cloth figure refer to balance mass Rz to displacement output.
In analysis, add one group of test parameter and carry out actual test, parameter designing and test result such as following table
Figure DEST_PATH_IMAGE078
As can be seen, through surveying eccentricity value and the setting value basically identical in school, the survey school barycenter of X-direction and Y-direction and setting barycenter deviation are in the 0.15mm scope, and the primary calibration precision is less than the manufacturing tolerance scope.
Described in this instructions is preferred embodiment of the present invention, and above embodiment is only in order to illustrate technical scheme of the present invention but not limitation of the present invention.All those skilled in the art all should be within the scope of the present invention under this invention's idea by the available technical scheme of logical analysis, reasoning, or a limited experiment.

Claims (5)

1. work-piece platform balancing quality barycenter detection calibration method has following steps:
Step 1, generate N group Rz track at balance mass, set full test number of times M;
Step 2, suppose barycenter deviation when initial
Figure 2012100014221100001DEST_PATH_IMAGE001
,
Figure 2012100014221100001DEST_PATH_IMAGE002
Be zero, set XY to searching threshold spec_x and the spec_y of barycenter;
Step 3, select the test model of X, Y, Rz axle, with this moment
Figure 2012100014221100001DEST_PATH_IMAGE003
,
Figure 2012100014221100001DEST_PATH_IMAGE004
Value is updated in the test model, selects one group of Rz track, is injected into test model;
Step 4, operation test model obtain the output of balance mass zero-speed section shift measurement, and then obtain the displacement output of XYRz Three Degree Of Freedom
Figure 2012100014221100001DEST_PATH_IMAGE005
,
Figure 2012100014221100001DEST_PATH_IMAGE006
With
Figure 2012100014221100001DEST_PATH_IMAGE007
, according to formula:
Figure 2012100014221100001DEST_PATH_IMAGE008
Calculate at this moment
Figure 2012100014221100001DEST_PATH_IMAGE009
,
Figure 2012100014221100001DEST_PATH_IMAGE010
Value and record;
Step 5, import next group Rz track, repeating step three and step 4 obtain different
Figure DEST_PATH_IMAGE011
,
Figure 544155DEST_PATH_IMAGE010
Value and record;
After step 6, the record N sub-value, be averaging, obtain the barycenter deviation after this group test is finished
Figure 2012100014221100001DEST_PATH_IMAGE012
,
Figure DEST_PATH_IMAGE013
Value;
Step 7, judge whether to have finished M test, if do not finish, then to obtaining ,
Figure 336662DEST_PATH_IMAGE004
, compare with the searching threshold spec_x, the spec_y that set respectively, if
Figure DEST_PATH_IMAGE015
,
Figure 116399DEST_PATH_IMAGE010
All less than searching threshold, think that then surveying the school finishes, and confirm that the side-play amount of barycenter is ,
Figure 263664DEST_PATH_IMAGE010
If ,
Figure 2012100014221100001DEST_PATH_IMAGE016
In at least one great-than search threshold value, with this moment
Figure DEST_PATH_IMAGE017
,
Figure 2012100014221100001DEST_PATH_IMAGE018
Value substitution test model, repeating step three ~ six, up to ,
Figure 427426DEST_PATH_IMAGE013
Value is finished and is surveyed the school less than the searching threshold of setting; Perhaps up to the testing time M of testing time greater than setting, finish and survey the school.
2. work-piece platform balancing quality barycenter detection calibration method according to claim 1, wherein, described track is the three rank movement locus that comprise kinematic parameters such as displacement, speed and acceleration.
3. work-piece platform balancing quality barycenter detection calibration method according to claim 1 and 2, wherein, described test model is open loop at the XY axle, is closed loop at the Rz axle.
4. work-piece platform balancing quality barycenter detection calibration method according to claim 3 wherein, utilizes the grating chi to realize the closed loop of described Rz axle.
5. work-piece platform balancing quality barycenter detection calibration method according to claim 4, wherein, described grating chi is the two-dimensional grating chi.
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Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN104048587A (en) * 2014-06-19 2014-09-17 丹阳市鑫烨光学仪器有限公司 Silicon wafer eccentric tester

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Publication number Priority date Publication date Assignee Title
US4457664A (en) * 1982-03-22 1984-07-03 Ade Corporation Wafer alignment station
JPH02142158A (en) * 1988-11-22 1990-05-31 Yaskawa Electric Mfg Co Ltd Wafer positioning apparatus and method for returning wafer to original position
CN101075096A (en) * 2007-06-22 2007-11-21 上海微电子装备有限公司 System for balancing and positioning work table of photoetching device
CN101551599A (en) * 2009-04-03 2009-10-07 清华大学 Double-stage switching system of photoetching machine wafer stage
CN102012638A (en) * 2009-09-04 2011-04-13 上海微电子装备有限公司 Photoetching machine worktable with driving device capable of balancing torque

Patent Citations (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4457664A (en) * 1982-03-22 1984-07-03 Ade Corporation Wafer alignment station
US4457664B1 (en) * 1982-03-22 1993-08-24 Ade Corp
JPH02142158A (en) * 1988-11-22 1990-05-31 Yaskawa Electric Mfg Co Ltd Wafer positioning apparatus and method for returning wafer to original position
CN101075096A (en) * 2007-06-22 2007-11-21 上海微电子装备有限公司 System for balancing and positioning work table of photoetching device
CN101551599A (en) * 2009-04-03 2009-10-07 清华大学 Double-stage switching system of photoetching machine wafer stage
CN102012638A (en) * 2009-09-04 2011-04-13 上海微电子装备有限公司 Photoetching machine worktable with driving device capable of balancing torque

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN104048587A (en) * 2014-06-19 2014-09-17 丹阳市鑫烨光学仪器有限公司 Silicon wafer eccentric tester
CN104048587B (en) * 2014-06-19 2016-08-17 丹阳市鑫烨光学仪器有限公司 silicon chip eccentric tester

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