CN103176371A - Automated mask management system and method - Google Patents
Automated mask management system and method Download PDFInfo
- Publication number
- CN103176371A CN103176371A CN2013100820608A CN201310082060A CN103176371A CN 103176371 A CN103176371 A CN 103176371A CN 2013100820608 A CN2013100820608 A CN 2013100820608A CN 201310082060 A CN201310082060 A CN 201310082060A CN 103176371 A CN103176371 A CN 103176371A
- Authority
- CN
- China
- Prior art keywords
- mask plate
- state
- mask
- transferred
- geomap
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Images
Abstract
The invention discloses an automated mask management system and method. The system comprises a production management module, a mask management module, a process execution module, a mask processing module and a mask storage module, wherein the production management module can be in data interaction with the mask management module, the process execution module, the mask processing module and the mask storage module respectively through an EAP (Equipment Automatic Program) and a server. According to the system and the method, disclosed by the invention, a mask can be accurately applied to a corresponding photoetching machine, a corresponding photoetching process and a corresponding photoetching product, so that the error ratio caused by human factors is reduced, the range of influence caused after problems occur is reduced, the use conditions of the mask can be effectively monitored, and the mask trace tracking is facilitated; and thus, the subsequent data analysis is facilitated, the feedback speed is accelerated, and then, the management is timesaving and laborsaving, so that the process production cost is reduced, and the problem of yield caused by human errors is solved.
Description
Technical field
The present invention relates to a kind of automated management system, relate in particular to automated management system and the method for mask plate.
Background technology
Relate to the detailed and complicated technique in hundreds of roads in semiconductor fabrication process, must produce device according to strict explained hereafter condition.semiconductor fabrication process comprises photoetching process, etching technics, depositing operation, injection technology and CMP (Chemical Mechanical Polishing) process etc., in whole manufacturing process, yield of devices is had the greatest impact and complicated technique is photoetching process, and must use mask plate to carry out photoetching in photoetching process, mask plate is by photoetching process, the circuit pattern of complexity to be projected to additional device on wafer surface, different mask plates must be assigned to different machines or equipment, and corresponding different technique, therefore, a certain mask plate can be used by certain road technique of certain machine, just become problem very deeply concerned in the semiconductor manufacturing.
At present, the title that the system of the management mask plate that adopts in semiconductor fabrication factory just controls mask plate whether with product in the title that defines be complementary, and follow the trail of the historical record that mask plate uses in litho machine, can only play the effect of an information recording/and tracking, and for the litho machine type of different manufacturers, the litho machine type of Different Light, can only carry out artificial judgement and control, simultaneously, be also to detect by collecting manually historical record, manual analyzing and control service time and the serviceable life for mask plate fully.As everyone knows, in semiconductor was made, artificial error rate was quite high, and then causes the problem of yield.In addition, because time efficiency of semiconductor production etc. all can affect the cost of device, so wait until often that product goes wrong and just can carry out the mask plate determination and analysis afterwards, at this moment, a lot of products has just been arranged through photoetching process, the yield of large-tonnage product goes wrong, and production is caused very large impact.Because the management to mask plate comprises that storage mode and environment etc. are all manual control, randomness is very large, therefore the repair rate of annual mask plate is 6.6% of total use amount, especially the mask plate repair rate of the following technique of 65nm reaches more than 15% especially, and each because mask plate causes the higher problem of product rejection rate, loss is all more than 1,000,000 dollars.Therefore, mask plate must be accomplished zero-fault as the mother matrix that exposes in integrated circuit, and the defect problem that the randomness in existing management system is controlled mask plate does not have management and control action.
Chinese patent (application number: the method and system that 200510092652.2) discloses a kind of intelligent automation management for mask plate, comprise: provide and to process a plurality of files on process equipment, wherein, described a plurality of workpiece is located at described process equipment treating stations before; Before workpiece arrives process equipment, described process equipment is determined the distribution requirements of utility appliance according to the characteristic that described a plurality of workpiece are relevant; And before arriving process equipment, described workpiece sends utility appliance according to described distribution requirements to described process equipment.
Foregoing invention is disclosed is a kind of mask plate priority management system, thereby can specify in the short period of time a certain mask plate to carry out photoetching process to machine, saves the production time.Although the cost yet this invention can save time still exists mask plate to be used in the risk of carrying out photoetching on wrong machine, thereby cause the low problem of yield.
Chinese patent (application number: 200710041623.3) disclose a kind of mask plate loading technique, be used for mask plate accurately is loaded into the mask plate plummer of litho machine, described litho machine has mask transmission system and mask platform system, described mask platform system comprises mask plate plummer and micropositioner, and this mask plate loading technique comprises following flow process: version is got in (1) version storehouse; (2) thick prealignment; (3) mask plate handing-over; (4) meticulous prealignment.
Adopt foregoing invention that the precision of whole mask plate loading technique is reached: x is to ± 1um, and y is to ± 1um, and rz is to ± 0.05mrad.Simultaneously, the number of times of meticulous prealignment is reduced to 1 time from traditional 3-5 time just can reach the prealignment precision, has greatly improved prealignment efficient, boosts productivity.Yet this invention still fails to overcome because mask plate uses the low problem of yield that causes on wrong machine.
Summary of the invention
Problem for above-mentioned existence, the invention provides automated management system and the method for mask plate, so that mask plate is used on corresponding litho machine and corresponding technique and corresponding product, reduce the probability of makeing mistakes, and save time, laborsaving, make the explained hereafter cost.
To achieve these goals, the technical scheme taked of the present invention is:
A kind of automated management system of mask plate is characterized in that, comprises that mask plate administration module, production management module, technique carries out module, mask plate processing module and mask plate reservoir module;
Described technique is carried out module, described mask plate processing module and described mask plate reservoir module and is all carried out the mutual of described mask plate data message by described production management module and described mask plate administration module; Described production management module is carried out module, described mask plate processing module and described mask plate reservoir module with described technique respectively, and (Equipment Automatic Program is called for short: EAP) carry out the mutual of data message with server by the equipment auto-programming;
Described mask plate administration module comprises data storage cell and read/write cell, and described data storage cell stores the current data message of some mask plates; Described mask plate administration module utilizes EAP and server data storage cell and described production management module can be carried out the mutual of data message by read/write cell;
Described technique is carried out module and is comprised a plurality of lithographic cells and a plurality of detecting unit;
Described mask plate processing module comprises a plurality of cleaning units and a plurality of unit of scrapping;
Described mask plate reservoir module comprises internal storage unit and outside storage unit, and inside and outside storage unit all stores some mask plates.
The automated management system of above-mentioned mask plate, it is characterized in that, when described outside storage unit is stored new mask plate, described outside storage unit obtains the primary data information of this new mask plate, and this primary data information is stored in described data storage cell by described production management module and described read/write cell successively.
the automated management system of above-mentioned mask plate, it is characterized in that, described production management module is the GEOMAP in semiconductor production, this GEOMAP is according to the Production requirement of described lithographic cell or described detecting unit, transfer the data message of the mask plate in described data storage cell by described read/write cell, described internal storage unit or described outside storage unit according to the data message of the mask plate of transferring out with the mask plate of correspondence from described internal storage unit or described outside storage unit be transferred to described lithographic cell or described detecting unit or described cleaning unit or described scrapping the unit.
The automated management system of above-mentioned mask plate, it is characterized in that, when described mask plate carries out photoetching process in described lithographic cell, the data message of the described mask plate of described GEOMAP real time record in described lithographic cell, and by described read/write cell will record data information memory to the described data storage cell.
The automated management system of above-mentioned mask plate is characterized in that described production management module arranges the data message of described mask plate, and this data message comprises parameter attribute and status indicator;
Described parameter attribute comprises device attribute, memory attribute and type attribute;
Define described device attribute according to lithographic equipment and technical recipe (being referred to as Recipe in semiconductor applications), so that different mask plate is applied to corresponding lithographic equipment and corresponding technique Recipe;
Define described memory attribute according to home and clean dry environment, to calculate the serviceable life of mask plate under varying environment;
Define described type attribute according to light source, to calculate mask plate exposure in process of production;
Described status indicator comprises storage state, detected state, use state, dead state, scraps state and cleaning state;
Wherein, described use state comprises idle state, waiting status, subscription state and is using state.
The automated management system of above-mentioned mask plate is characterized in that, when mask plate is in described outside storage unit, is storage state with the status indicator of described mask plate;
When mask plate is in described internal storage unit, be dead state with the status indicator of described mask plate;
When mask plate is in described detecting unit, be detected state with the status indicator of described mask plate;
When mask plate is in described lithographic cell, be the use state with the status indicator of described mask plate;
When mask plate be in described when scrapping in the unit, with the status indicator of described mask plate for scrapping state;
When mask plate is in described cleaning unit, be the cleaning state with the status indicator of described mask plate.
A kind of automated management system of utilizing described mask plate is carried out the method for technique, it is characterized in that, be applied in the automated management system of above-mentioned mask plate, described method comprises:
Described lithographic cell is sent to GEOMAP according to process requirements with the request msg that needs carry out the mask plate of photoetching process, and described GEOMAP is transferred the data message of the mask plate of storing in described data storage cell by described read/write cell according to this request msg;
When the status indicator in the data message of the mask plate of transferring was stored condition, described outside storage unit was transferred to the mask plate of transferring and carries out defects detection technique in described detecting unit;
The defective mask plate of tool is transferred to described cleaning unit or the described unit of scrapping carries out cleaning or directly scraps, and the mask plate of completing cleaning is repeated defects detection technique;
The mask plate that does not have defective and have a process requirements is transferred to described lithographic cell carries out photoetching process, and the mask plate that continues to complete photoetching process is transferred to described internal storage unit or is transferred to described detecting unit and carries out defects detection technique;
The mask plate that does not have defective and do not have a process requirements is transferred in the internal storage unit stores.
Above-mentioned method, it is characterized in that, after the waiting time T＞A of described mask plate storage state month, wherein, A is the arbitrary value in 12～18, be 12,13,14 etc. as A, when A is 12, i.e. the waiting time T of mask plate storage state＞12 months is 13 months, 14 months, 15 months etc. as waiting time, GEOMAP is transferred to the described unit of scrapping with this mask plate and scraps, and the state of mask plate is set to scrap state simultaneously.
Above-mentioned method is characterized in that, it is characterized in that, described defects detection technique comprises defects detection technique and the particle detection technique of unrepairable;
Described mask plate is carried out the defects detection technique of unrepairable, when this mask plate being detected and have the defective of unrepairable, described GEOMAP is transferred to this mask plate to be scrapped the unit and scraps, and the state of this mask plate is set to scrap state simultaneously;
When this mask plate being detected and do not have the defective of unrepairable, continue described mask plate is carried out particle detection technique;
When this mask plate being detected and have particle, GEOMAP is transferred to cleaning unit with this mask plate and cleans, and the state of this mask plate is set to the cleaning state simultaneously.
Above-mentioned method is characterized in that, it is dead state that described GEOMAP is set the state that mask plate is in described internal storage unit;
When T1 〉=B month dead time of described dead state, wherein, B is the arbitrary value in 6～12, be 6,7,8 etc. as B, when B is 6, i.e. T1 dead time of dead state 〉=6 months is as being dead time 6 months, 7 months, 8 months etc., described GEOMAP is transferred to described outside storage unit with mask plate, and the state of mask plate is set to storage state simultaneously;
When the dead time of described dead state during T1＜6 months, wherein, B is the arbitrary value in 6～12, be 6,7,8 etc. as B, when B is 6, i.e. T1 dead time of dead state＜6 months is as being dead time 3 months, 4 months, 5 months etc., described GEOMAP is transferred to described lithographic cell according to process requirements with mask plate, and the state with mask plate is configured such that the state of using simultaneously
Above-mentioned method is characterized in that, the state that described GEOMAP setting mask plate is in described lithographic cell is the use state;
When T2＜C month service time of described use state, wherein, C is the arbitrary value in 3～9, be 3,4,5 etc. as C, when C is 3, namely use T2 service time of state＜3 months, as being service time 1 month, 2 months, 2.5 months etc., described GEOMAP is transferred to described internal storage unit with mask plate, and the state of mask plate is set to dead state simultaneously;
When T2 〉=C month service time of described use state, wherein, C is the arbitrary value in 3～9, be 3,4,5 etc. as C, when C is 3, namely use T2 service time of state 〉=3 months, as being service time 3 months, 4 months, 5 months etc., described GEOMAP is transferred to described detecting unit with mask plate, and the state of mask plate is set to detected state simultaneously.
Technique scheme has following advantage or beneficial effect:
in semiconductor production process, use automated management system and the method for mask plate provided by the invention, make mask plate can be used for accurately corresponding litho machine, in the photoetching product of corresponding photoetching process and correspondence, thereby reduce the error rate that produces due to human factor, reduce the coverage after the generation problem, and behaviour in service that can the effective monitoring mask plate, facilitate the trace of mask plate to follow the trail of, thereby facilitated follow-up data analysis and accelerated the speed of feeding back, and then save time, laborsaving, make the explained hereafter cost and reduce because the people is the yield problem of makeing mistakes and causing.
Description of drawings
Fig. 1 is the structural representation according to the automated management system of the mask plate of embodiments of the invention 1;
Fig. 2 is the flowage structure schematic diagram according to mask plate in the automated management system of the mask plate of embodiments of the invention 2.
Embodiment
The present invention is further illustrated below in conjunction with accompanying drawing and specific embodiment, but not as limiting to the invention.
Embodiment 1:
Fig. 1 is the structural representation according to the automated management system of the mask plate of embodiments of the invention 1; As shown in the figure, the automated management system of mask plate comprises that production management module, mask plate administration module, technique carries out module, mask plate processing module and mask plate reservoir module, simultaneously, production management module carries out with mask plate administration module, technique module, mask plate processing module and mask plate reservoir module are carried out mask plate by EAP and server data message mutual respectively.
Wherein, production management module is GEOMAP; The mask plate administration module comprises data storage cell and read/write cell, and data storage cell stores the current data message of some mask plates; Technique is carried out module and is comprised a plurality of lithographic cells and a plurality of detecting unit; The mask plate processing module comprises a plurality of cleaning units and a plurality of unit of scrapping; The mask plate reservoir module comprises internal storage unit and outside storage unit, and inside and outside storage unit all stores some mask plates.
Wherein, the data message of mask plate comprises parameter attribute and status indicator; Parameter attribute comprises device attribute, memory attribute and type attribute; Device attribute is to define according to lithographic equipment and technique Recipe, so that different mask plate is applied to corresponding lithographic equipment and corresponding technique Recipe; Memory attribute is to define according to home and clean dry environment, stores as N2 under the clean dry environment, to calculate the serviceable life of corresponding mask plate; Type attribute is to define according to light source, to calculate mask plate exposure in process of production; Status indicator comprises storage state, detected state, use state, dead state, scraps state and cleaning state;
Wherein, the use state also comprises idle state, waiting status, subscription state and is using state.
when lithographic cell needs mask plate to carry out photoetching process, GEOMAP is according to the attribute of lithographic cell, transfer the data message of mask plate from data storage cell by read/write cell, when the status indicator of the data message of the mask plate of transferring out is stored condition, and the waiting time of mask plate storage state＞12 month, it is 13 months as waiting time, 14 months, 15 months etc., according to slip-stick artist's judgement, mask plate is scrapped, simultaneously the current state of mask plate is for scrapping state, perhaps mask plate is continued to store, the current state of mask plate is storage state simultaneously, and the information of this mask plate being scrapped via GEOMAP or the information exchange that continues to store are crossed in the data storage cell that read/write cell is stored to mask plate, perhaps when the waiting time T of stored condition≤12 months, it is 12 months, 11 months, 10 months etc. as waiting time, the data message of the mask plate transferred according to GEOMAP of outside storage unit, the mask plate of correspondence is transferred to detecting unit from outside storage unit detects, the current state of mask plate is detected state, after confirming after testing the mask plate defectiveness, testing result is transferred to GEOMAP, then mask plate is transferred to and scraps in unit or cleaning unit, simultaneously the current state of mask plate is for scrapping state or cleaning state, and the information that simultaneously mask plate is in the state of scrapping or cleaning state is stored in the data storage cell of mask plate via GEOMAP by read/write cell, GEOMAP is transferred the cleaning information of mask plate, after confirming that cleaning is completed, mask plate is transferred to detecting unit to be detected, and the current state of mask plate is detected state, and the detected state information that mask plate is current is stored in the data storage cell of mask plate via GEOMAP by read/write cell, GEOMAP is transferred the detection information of mask plate, after confirming the mask plate zero defect, mask plate is transferred to lithographic cell, the current state of mask plate is the use state simultaneously, and the use status information that mask plate is current is stored in the data storage cell of mask plate via GEOMAP by read/write cell, GEOMAP is transferred the use information of mask plate, when mask plate uses T2 service time of state＜3 months, as being service time 1 month, 2 months, 2.5 months etc., mask plate being transferred to the internal storage unit, and staying cool, perhaps when mask plate uses T2 service time of state 〉=3 months, as being service time 3 months, 4 months, 5 months etc., mask plate is transferred to detecting unit, and detected state, the status indicator information that mask plate is current is stored in the data storage cell of mask plate via GEOMAP by read/write cell simultaneously, GEOMAP is transferred the dead state information of mask plate, when the dead time of mask plate dead state during T1 〉=6 months, as being dead time 6 months, 7 months, 8 months etc., mask plate is transferred to outside storage unit to be stored, and the state of mask plate is storage state simultaneously, perhaps when the dead time of mask plate dead state during T1＜6 months, as being dead time 3 months, 4 months, 5 months etc., mask plate again is transferred to lithographic cell and has the use state, as cocycle, simultaneously be stored in the data storage cell of mask plate by read/write cell via GEOMAP, with the behaviour in service of effective monitoring mask plate, facilitate the trace of mask plate to follow the trail of, thereby facilitate follow-up data analysis and accelerated the speed of feeding back.
in addition, when carrying out photoetching process with a random lithography mask version to the lithographic cell, because lithographic cell is to carry out in module in technique, and technique is carried out module and the production management module has the mutual of mask plate data message, when mask plate is placed in lithographic cell, the data message of mask plate can be transferred in the production management module, the production management module accepts the data message of this mask plate and the data message by the mask plate in the data storage element of read/write cell and mask plate mates, if do not mate, the production management module can send an error message to lithographic cell, thereby can't carry out photoetching process, and then prevented the generation of accident, reduced because human factor causes the low problem of yield.
Embodiment 2:
Fig. 2 is the flowage structure schematic diagram according to mask plate in the automated management system of the mask plate of embodiments of the invention 2, as shown in Figure 2, when lithographic cell needs mask plate to carry out photoetching process, GEOMAP is according to the attribute of lithographic cell, transfer the data message of mask plate from data storage cell by read/write cell, when the status indicator of the data message of the mask plate of transferring out is stored condition, waiting time T under the judgement storage state, if waiting time T＞12 month, it is 13 months as waiting time, 14 months, 15 months etc., according to slip-stick artist's judgement, mask plate is transferred to and scraps the unit and scrap, and identify the current state of mask plate for scrapping state, or mask plate is continued to store, the current state of mask plate is storage state simultaneously, if waiting time T≤12 month, it is 12 months, 11 months, 10 months etc. as waiting time, mask plate is transferred to detecting unit and detects, and the current state of sign mask plate is detected state, after detection is completed, if there is expendable defective in testing result, namely can have influence on the defective of product yield, mask plate is transferred to and scraps the unit and scrap, and identify the current state of mask plate for scrapping state, if there is not expendable defective in testing result, but has particle, namely has recoverable defective, mask plate being transferred to cleaning unit cleans, and the current state of sign mask plate is the cleaning state, after cleaning is completed, mask plate is transferred to detecting unit to be detected again, when testing result neither exists expendable defective not have particle again, according to process requirements, mask plate is transferred to lithographic cell or internal storage unit, if having process requirements is transferred to this mask plate and carries out photoetching process in lithographic cell, and the current state of sign mask plate is the use state, when the service time of the mask plate under the use state during T2 〉=3 months, as being service time 3 months, 4 months, 5 months etc., mask plate is transferred to detecting unit to be detected, and the current state of sign mask plate is detected state, as cocycle, if when the service time of the mask plate under the use state during T2＜3 months, as being service time 1 month, 2 months, 2.5 individual month etc., mask plate is transferred to the internal storage unit, and the current state of sign mask plate is dead state, when T1 dead time under dead state＜6 months, as being dead time 3 months, 4 months, 5 months etc., mask plate can be shifted lithographic cell according to need of production and carry out photoetching process, and the state of sign mask plate is the use state, when T1 dead time under dead state 〉=6 months, mask plate is transferred to outside storage unit to be stored, and the current state of sign mask plate is storage state, as cocycle.
in sum, the automated management system of the mask plate that the application of the invention provides and method, make mask plate can be used for accurately corresponding litho machine, in the photoetching product of corresponding photoetching process and correspondence, thereby reduce the error rate that produces due to human factor, reduce the coverage after the generation problem, and behaviour in service that can the effective monitoring mask plate, facilitate the trace of mask plate to follow the trail of, thereby facilitated follow-up data analysis and accelerated the speed of feeding back, and then save time, laborsaving, make the explained hereafter cost and reduce because the people is the yield problem of makeing mistakes and causing.
The above only is preferred embodiment of the present invention, not thereby limits claim of the present invention, so the equivalence that all utilizations instructions of the present invention and diagramatic content have been done changes, all is included in protection scope of the present invention.
Claims (11)
1. the automated management system of a mask plate, is characterized in that, comprises that mask plate administration module, production management module, technique carries out module, mask plate processing module and mask plate reservoir module;
Described technique is carried out module, described mask plate processing module and described mask plate reservoir module and is all carried out the mutual of described mask plate data message by described production management module and described mask plate administration module;
Described mask plate administration module comprises data storage cell and read/write cell, and described data storage cell stores the current data message of some mask plates;
Described technique is carried out module and is comprised a plurality of lithographic cells and a plurality of detecting unit;
Described mask plate processing module comprises a plurality of cleaning units and a plurality of unit of scrapping;
Described mask plate reservoir module comprises internal storage unit and outside storage unit, and inside and outside storage unit all stores some mask plates.
2. the automated management system of mask plate as claimed in claim 1, it is characterized in that, when described outside storage unit is stored new mask plate, described outside storage unit obtains the primary data information of this new mask plate, and this primary data information is stored in described data storage cell by described production management module and described read/write cell successively.
3. the automated management system of mask plate as claimed in claim 1, it is characterized in that, described production management module is the GEOMAP in semiconductor production, this GEOMAP is according to the Production requirement of described lithographic cell or described detecting unit, transfer the data message of the mask plate in described data storage cell by described read/write cell, described internal storage unit or described outside storage unit according to the data message of the mask plate of transferring out with the mask plate of correspondence from described internal storage unit or described outside storage unit be transferred to described lithographic cell or described detecting unit or described cleaning unit or described scrapping the unit.
4. the automated management system of mask plate as claimed in claim 3, it is characterized in that, when described mask plate carries out photoetching process in described lithographic cell, the data message of the described mask plate of described GEOMAP real time record in described lithographic cell, and by described read/write cell will record data information memory to the described data storage cell.
5. the automated management system of mask plate as claimed in claim 1, is characterized in that, described production management module arranges the data message of described mask plate, and this data message comprises parameter attribute and status indicator;
Described parameter attribute comprises device attribute, memory attribute and type attribute;
Define described device attribute according to lithographic equipment and technical recipe, so that different mask plate is applied to corresponding lithographic equipment and corresponding technical recipe;
Define described memory attribute according to home and clean dry environment, to calculate the serviceable life of mask plate under varying environment;
Define described type attribute according to light source, to calculate mask plate exposure in process of production;
Described status indicator comprises storage state, detected state, use state, dead state, scraps state and cleaning state;
Wherein, described use state comprises idle state, waiting status, subscription state and is using state.
6. the automated management system of mask plate as claimed in claim 5, is characterized in that, when mask plate is in described outside storage unit, is storage state with the status indicator of described mask plate;
When mask plate is in described internal storage unit, be dead state with the status indicator of described mask plate;
When mask plate is in described detecting unit, be detected state with the status indicator of described mask plate;
When mask plate is in described lithographic cell, be the use state with the status indicator of described mask plate;
When mask plate be in described when scrapping in the unit, with the status indicator of described mask plate for scrapping state;
When mask plate is in described cleaning unit, be the cleaning state with the status indicator of described mask plate.
7. an automated management system of utilizing described mask plate is carried out the method for technique, it is characterized in that, be applied in the automated management system as the described mask plate of any one in claim 1-6, described method comprises:
Described lithographic cell is sent to GEOMAP according to process requirements with the request msg that needs carry out the mask plate of photoetching process, and described GEOMAP is transferred the data message of the mask plate of storing in described data storage cell by described read/write cell according to this request msg;
When the status indicator in the data message of the mask plate of transferring was stored condition, described outside storage unit was transferred to the mask plate of transferring and carries out defects detection technique in described detecting unit;
The defective mask plate of tool is transferred to described cleaning unit or the described unit of scrapping carries out cleaning or directly scraps, and the mask plate of completing cleaning is repeated defects detection technique;
The mask plate that does not have defective and have a process requirements is transferred to described lithographic cell carries out photoetching process, and the mask plate that continues to complete photoetching process is transferred to described internal storage unit or is transferred to described detecting unit and carries out defects detection technique;
The mask plate that does not have defective and do not have a process requirements is transferred in the internal storage unit stores.
8. method as claimed in claim 7, it is characterized in that, in the time of the waiting time T＞A of described mask plate storage state month, described GEOMAP is transferred to the described unit of scrapping with this mask plate and scraps, and the state of mask plate is set to scrap state simultaneously;
Wherein, A is the arbitrary value in 12～18.
9. method as claimed in claim 7, is characterized in that, described defects detection technique comprises defects detection technique and the particle detection technique of unrepairable;
Described mask plate is carried out the defects detection technique of unrepairable, when this mask plate being detected and have the defective of unrepairable, described GEOMAP is transferred to this mask plate to be scrapped the unit and scraps, and the state of this mask plate is set to scrap state simultaneously;
When this mask plate being detected and do not have the defective of unrepairable, continue described mask plate is carried out particle detection technique;
When this mask plate being detected and have particle, GEOMAP is transferred to cleaning unit with this mask plate and cleans, and the state of this mask plate is set to the cleaning state simultaneously.
10. method as claimed in claim 7, is characterized in that, it is dead state that described GEOMAP is set the state that mask plate is in described internal storage unit;
When T1 〉=B month dead time of described dead state, described GEOMAP is transferred to described outside storage unit with this mask plate, and the state of this mask plate is set to storage state simultaneously;
When T1＜B month dead time of described dead state, described GEOMAP is transferred to described lithographic cell according to the photoetching process demand with mask plate
Wherein, B is the arbitrary value in 6～12.
11. method as claimed in claim 7 is characterized in that, the state that described GEOMAP setting mask plate is in described lithographic cell is the use state;
When T2＜C month service time of described use state, described GEOMAP is transferred to this mask plate in described internal storage unit, and the state of this mask plate is set to dead state simultaneously;
When T2 〉=C month service time of described use state, described GEOMAP is transferred to this mask plate in described detecting unit, and the state of this mask plate is set to detected state simultaneously
Wherein, C is the arbitrary value in 3～9.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201310082060.8A CN103176371B (en) | 2013-03-14 | 2013-03-14 | Automated mask management system and method |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201310082060.8A CN103176371B (en) | 2013-03-14 | 2013-03-14 | Automated mask management system and method |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| CN103176371A true CN103176371A (en) | 2013-06-26 |
| CN103176371B CN103176371B (en) | 2015-04-22 |
Family
ID=48636334
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201310082060.8A Active CN103176371B (en) | 2013-03-14 | 2013-03-14 | Automated mask management system and method |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN103176371B (en) |
Cited By (10)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN103579058A (en) * | 2012-07-24 | 2014-02-12 | 上海宏力半导体制造有限公司 | Method for achieving multi-batch continuous operation |
| CN103645610A (en) * | 2013-11-28 | 2014-03-19 | 上海华力微电子有限公司 | System and method for preventing misuse of working conditions of lithography equipment |
| CN104166317A (en) * | 2014-08-27 | 2014-11-26 | 上海华力微电子有限公司 | Method and system for controlling automatic dispatch of photo-masks |
| CN105974729A (en) * | 2016-05-25 | 2016-09-28 | 京东方科技集团股份有限公司 | Mask plate management system and mask plate use method |
| CN106158684A (en) * | 2015-04-15 | 2016-11-23 | 北大方正集团有限公司 | Quasiconductor light shield atomization detection control method and system |
| CN106486391A (en) * | 2015-08-31 | 2017-03-08 | 北大方正集团有限公司 | Semiconductor manufacturing control method based on MES system and system |
| CN108287454A (en) * | 2018-01-29 | 2018-07-17 | 信利（惠州）智能显示有限公司 | Mask plate Load System |
| CN109239953A (en) * | 2018-11-07 | 2019-01-18 | 成都中电熊猫显示科技有限公司 | The processing system of mask plate |
| CN111797644A (en) * | 2019-03-22 | 2020-10-20 | 芯恩（青岛）集成电路有限公司 | Radio frequency identification management system and method for photomask |
| WO2022028123A1 (en) * | 2020-08-05 | 2022-02-10 | 长鑫存储技术有限公司 | Photomask storage system, query system, storage method, and computer apparatus |
Citations (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO2001057589A1 (en) * | 2000-02-07 | 2001-08-09 | Magna Reflex Holding Gmbh | Electrochromic dimmer system |
| US20030077912A1 (en) * | 1999-09-01 | 2003-04-24 | Ken Matsumoto | Semiconductor manufacturing apparatus and method |
| US20060052889A1 (en) * | 2004-08-20 | 2006-03-09 | International Business Machines Corporation | Method and system for intelligent automated reticle management |
| CN101067727A (en) * | 2007-06-05 | 2007-11-07 | 上海微电子装备有限公司 | Mask loading technology |
-
2013
- 2013-03-14 CN CN201310082060.8A patent/CN103176371B/en active Active
Patent Citations (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US20030077912A1 (en) * | 1999-09-01 | 2003-04-24 | Ken Matsumoto | Semiconductor manufacturing apparatus and method |
| WO2001057589A1 (en) * | 2000-02-07 | 2001-08-09 | Magna Reflex Holding Gmbh | Electrochromic dimmer system |
| US20060052889A1 (en) * | 2004-08-20 | 2006-03-09 | International Business Machines Corporation | Method and system for intelligent automated reticle management |
| CN101067727A (en) * | 2007-06-05 | 2007-11-07 | 上海微电子装备有限公司 | Mask loading technology |
Cited By (15)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN103579058A (en) * | 2012-07-24 | 2014-02-12 | 上海宏力半导体制造有限公司 | Method for achieving multi-batch continuous operation |
| CN103579058B (en) * | 2012-07-24 | 2016-08-03 | 上海华虹宏力半导体制造有限公司 | A kind of method of multiple batches of continuous operation |
| CN103645610A (en) * | 2013-11-28 | 2014-03-19 | 上海华力微电子有限公司 | System and method for preventing misuse of working conditions of lithography equipment |
| CN103645610B (en) * | 2013-11-28 | 2015-06-24 | 上海华力微电子有限公司 | System and method for preventing misuse of working conditions of lithography equipment |
| CN104166317A (en) * | 2014-08-27 | 2014-11-26 | 上海华力微电子有限公司 | Method and system for controlling automatic dispatch of photo-masks |
| CN106158684A (en) * | 2015-04-15 | 2016-11-23 | 北大方正集团有限公司 | Quasiconductor light shield atomization detection control method and system |
| CN106486391A (en) * | 2015-08-31 | 2017-03-08 | 北大方正集团有限公司 | Semiconductor manufacturing control method based on MES system and system |
| CN105974729A (en) * | 2016-05-25 | 2016-09-28 | 京东方科技集团股份有限公司 | Mask plate management system and mask plate use method |
| WO2017202134A1 (en) * | 2016-05-25 | 2017-11-30 | 京东方科技集团股份有限公司 | Mask management system and mask use method |
| CN105974729B (en) * | 2016-05-25 | 2020-02-18 | 京东方科技集团股份有限公司 | Mask management system and mask using method |
| CN108287454A (en) * | 2018-01-29 | 2018-07-17 | 信利（惠州）智能显示有限公司 | Mask plate Load System |
| CN109239953A (en) * | 2018-11-07 | 2019-01-18 | 成都中电熊猫显示科技有限公司 | The processing system of mask plate |
| CN109239953B (en) * | 2018-11-07 | 2021-03-05 | 成都中电熊猫显示科技有限公司 | Processing system of mask |
| CN111797644A (en) * | 2019-03-22 | 2020-10-20 | 芯恩（青岛）集成电路有限公司 | Radio frequency identification management system and method for photomask |
| WO2022028123A1 (en) * | 2020-08-05 | 2022-02-10 | 长鑫存储技术有限公司 | Photomask storage system, query system, storage method, and computer apparatus |
Also Published As
| Publication number | Publication date |
|---|---|
| CN103176371B (en) | 2015-04-22 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| CN103176371B (en) | Automated mask management system and method | |
| CN106199276B (en) | The intelligent diagnosis system and method for exception information in a kind of power information acquisition system | |
| CN101907696B (en) | Electric energy meter production detecting system and method | |
| CN102768941B (en) | Method and device for dispatching to batch machine | |
| CN101630534A (en) | Method and device for testing reliability of nonvolatile memories | |
| CN113992153B (en) | Visual real-time monitoring distributed management system of photovoltaic power station | |
| CN103440545B (en) | Product batches hierarchical management system and method | |
| TW201738771A (en) | Method of matching records, method of scheduling maintenance and apparatus | |
| CN109407632A (en) | The method for establishing Discrete Manufacturing Systems logical model using seven tuples and service unit | |
| CN101738992A (en) | Method and device for testing product on line | |
| CN105974729B (en) | Mask management system and mask using method | |
| CN105681070A (en) | Method and system for automatically collecting and analyzing computer cluster node information | |
| CN107679163A (en) | A kind of one step process manufacture factor significant difference analysis system and analysis method | |
| CN112420535A (en) | Chip manufacturing method and system | |
| CN105868409A (en) | Data acquisition system | |
| CN1329950C (en) | System and method for process contamination prevention for semiconductor manufacturing | |
| CN114036911A (en) | Production batch energy copying method, device, equipment and storage medium | |
| CN103885428B (en) | Off-line board utilization rate calculates system and computational methods | |
| CN102053217A (en) | Method for quickly processing wafer after sort interruption under working condition | |
| CN103579058B (en) | A kind of method of multiple batches of continuous operation | |
| CN104157586A (en) | Method of precisely positioning and analyzing repeated structure defects found by electron beam defect detection | |
| Hsu et al. | Main branch decision tree algorithm for yield enhancement with class imbalance | |
| KR20200048646A (en) | Quality control system for Fuel cell stack component and Quality control method using the same | |
| Faruqi et al. | Test wafer management and automated wafer sorting | |
| CN115481982A (en) | Semiconductor dynamic production period data collection method and device |
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| C06 | Publication | ||
| PB01 | Publication | ||
| C10 | Entry into substantive examination | ||
| SE01 | Entry into force of request for substantive examination | ||
| GR01 | Patent grant |