CN103046026A - CVD equipment with optical heating effect - Google Patents
CVD equipment with optical heating effect Download PDFInfo
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- CN103046026A CN103046026A CN2012105719144A CN201210571914A CN103046026A CN 103046026 A CN103046026 A CN 103046026A CN 2012105719144 A CN2012105719144 A CN 2012105719144A CN 201210571914 A CN201210571914 A CN 201210571914A CN 103046026 A CN103046026 A CN 103046026A
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Abstract
The invention relates to the field of semiconductor production equipment and in particular to CVD equipment with optical heating effect. According to the CVD equipment with the optical heating effect, a roller group is arranged between a housing and a conveyor belt, and the roller group is hermetically connected with the housing and the conveyor belt, so that a dynamic seal is formed between the housing and the conveyor belt; a gas inlet and a gas outlet, into which a working gas flows, are formed in the housing, so that the working gas exists in a high concentration inside the housing before coating, which prevents a to-be-coated material put on the conveyor belt from undergoing chemical reaction with the air. Furthermore, the CVD equipment provided by the invention adopts a mobile photo-thermal mixing device instead of a fixed photo-thermal mixing device, resulting in the miniaturization of the whole photo-thermal mixing device.
Description
Technical field
The present invention relates to the design field of semiconductor production equipment, relate in particular to the CVD equipment that adopts the light heating.
Background technology
Chemical vapour deposition (English: Chemical Vapor Deposition, be called for short CVD) is a kind of chemical technology that is used for producing purity height, solid-state material that performance is good.Semiconductor industry is with this technology film of growing up.Typical CVD processing procedure is that wafer (substrate) is exposed under one or more different precursors, produces the film that wish deposits at substrate surface generation chemical reaction or decomposition.Usually also can produce concomitantly different byproducts in the reaction process, but mostly understand along with air-flow is pulled away, and can not stay in the reaction chamber.
Chemical vapour deposition technique extensively uses in the semiconductor coated film field, because the process need of semiconductor coated film carries out at state that isolation contacts with outside air or under near the state of vacuum.In the prior art, each technical process of semi-conductor integrated manufacturing system all needs to carry out under airtight environment, after finishing a technical process, need semi-conductor half cost is taken out, to carry out next step art breading, but it is had relatively high expectations to the vacuum of space after taking out, and therefore causes the integrated producing apparatus of semi-conductor to make difficulty, factory building huge.Producer's investment is founded the factory need bear a large amount of fund input in early stage on the one hand, usually build the time that the semiconductor integrated manufacturing system needs the several years on the other hand, as seen it is large and of long duration to build at present semiconductor integrated manufacturing system fund input amount, and causes easily the difficulty of producer's turnover of funds.
Summary of the invention
The object of the invention is to overcome the defective of prior art, aim to provide the CVD equipment that adopts the light heating and realize modularization and miniaturized design to realize the relevant device in the CVD process in the semiconductor production equipment, thereby reduce manufacturing cost in the CVD process.
The present invention realizes like this, adopt the CVD equipment of light heating, comprise a housing, described housing both lateral sides is respectively equipped with the entrance and exit that passes through for the transport tape of placing material to be plated, and described transport tape is separated into epicoele and cavity of resorption with described housing, the entrance and exit place of described housing is provided with respectively the cylinder group of the described transport tape of dynamic clamp, each described cylinder group comprises the upper cylinder that is attached at the transport tape upside and the bottom roll that is attached at the transport tape downside, also is provided with the first servomotor that drives described cylinder group running on the described housing; Offer the inlet mouth and the venting port that enter for working gas on the described housing; Be provided with mobile photo-thermal mixing device in the described cavity of resorption, described photo-thermal mixing device has one towards described transport tape and sprays the air nozzle of working gas.
Particularly, be provided with a screw mandrel that rotates in the described cavity of resorption, described photo-thermal mixing device is provided with the threaded hole adaptive with described screw mandrel, and described photo-thermal mixing device is installed on the described screw mandrel by described threaded hole.
Particularly, described photo-thermal mixing device comprises mixing bunker with hybrid chamber, coats the support frame of described mixing bunker and focuses on photo-thermal device on the described support frame.
Particularly, described photo-thermal device comprises the optical cavity of being located at described support frame lower end, be located in the described optical cavity and focus on amasthenic lens and the flexible light pipe of described support frame lower end, one end of described light pipe is inserted in the described optical cavity and towards described amasthenic lens, and the other end is connected with light source.
Particularly, described mixing bunker comprises the intake section that is positioned at the bottom, be connected with intake section and be positioned at the top and form the mixing section of described hybrid chamber, described intake section is contained in the described support frame, be provided with the air inlet cavity that some and described mixing section gas circuit is communicated with in the described intake section, described air nozzle is located at described mixing section.
Particularly, the elongated slit of described air nozzle, described mixing section comprises by described air nozzle to both sides extended two oblique and with described oblique horizontal plane that is connected with described intake section respectively, the lateral cross section of described mixing section is isosceles triangle; Described air inlet cavity is two, and described intake section is provided with the partition wall that is extended to described mixing section by its bottom, and two described air inlet cavities are enclosed by described partition wall and described intake section sidewall and form.
Particularly, described hybrid chamber has the protuberance that protrudes from described intake section near described intake section.
Particularly, described photo-thermal mixing device also comprises the second servomotor of being located at described housing sidewall and driving described screw mandrel rotation.
Particularly, the surface of each described upper cylinder and bottom roll is provided with elastic layer, press on the surface, both ends of each described upper cylinder and bottom roll mutually elasticity, have the gap of passing through for described transport tape between each described upper cylinder and the bottom roll, and mutual elasticity is pressed between each described upper cylinder and bottom roll and the described transport tape.
Particularly, above-mentioned CVD equipment also comprises Controlling System, also comprises the video monitoring apparatus of System Controlled by Measuring Pressure, the described epicoele of monitoring and the cavity of resorption internal medium of film thickness monitoring system, temperature measuring equipment, the described epicoele of monitoring and lower cavity pressure.
Beneficial effect of the present invention: the CVD equipment of employing light heating provided by the invention arranges described cylinder group by adopting between described housing and described transport tape, utilize the relation of being tightly connected of described cylinder group and housing and described transport tape, reach the dynamic seal design between described housing and the described transport tape; By offer inlet mouth and the venting port that enters for working gas at described housing, when advancing the CVD plated film, make first working gas enter described enclosure interior by described inlet mouth, gas in the described housing is discharged by described venting port, so can in described housing, form the working gas of high density, so that in the coating process, avoid being positioned over material to be coated and air generation chemical reaction on the described transport tape; Simultaneously, CVD equipment of the present invention adopts mobile photo-thermal mixing device, with the mobile fixing photo-thermal mixing device that substitutes, and can be so that whole photo-thermal mixing device be microminiaturized.
Description of drawings
Fig. 1 is the external structure synoptic diagram of one embodiment of the present invention;
Fig. 2 is the structural representation after Fig. 1 removes housing one sidewall;
Fig. 3 is the structural representation after Fig. 1 removes housing;
Fig. 4 is the structural representation of cylinder group and transport tape mutual alignment relation;
Fig. 5 is the structural representation of mixing bunker;
Fig. 6 is the sectional view of Fig. 5 cross section;
Fig. 7 is photo-thermal device cross-sectional view.
Embodiment
In order to make purpose of the present invention, technical scheme and advantage clearer, below in conjunction with drawings and Examples, the present invention is further elaborated.Should be appreciated that specific embodiment described herein only in order to explain the present invention, is not intended to limit the present invention.
Please refer to accompanying drawing 1 ~ 7, adopt the CVD equipment of light heating, comprise a housing 1, described housing 1 both lateral sides is respectively equipped with entrance 11 and the outlet 12 of passing through for the transport tape 2 of placing material to be plated, and described transport tape 2 is separated into epicoele 13 and cavity of resorption 14 with described housing 1, the entrance 11 of described housing 1 and outlet 12 places are provided with respectively the cylinder group 3 of the described transport tape 2 of dynamic clamp, each described cylinder group 3 comprises the upper cylinder 31 that is attached at transport tape 2 upsides and the bottom roll 32 that is attached at transport tape 2 downsides, also is provided with the first servomotor 4 that drives described cylinder group 3 runnings on the described housing 1.By adopting described cylinder group 3 is set between described housing 1 and described transport tape 2, utilizes the relation of being tightly connected of described cylinder group 3 and described housing 1 and described transport tape 2, reach the dynamic seal design between described housing 1 and the described transport tape 2.So, can be convenient to CVD equipment of the present invention and can realize that good sealing is connected by described transport tape 2 with all the other technical modules of semi-conductor integrated manufacturing system.In addition, also be provided with the preheating table 8 that preheats processing to being positioned over material to be plated on the described transport tape 2 in the described epicoele 13.Particularly, described preheating table 8 is arranged at the upside of described transport tape 2, to by the material to be plated on the described transport tape 2 less gap being arranged.The purpose that arranges of described preheating table 8 is to prevent material to be plated is carried out before the coating film treatment, does not require temperature because the temperature of material to be plated reaches corresponding plated film, causes coating effects not good.Wherein, described preheating table 8 adopts the mode of infrared heating or resistive heating.
Offer the inlet mouth 15 that enters for working gas and the venting port 16 of discharging on the described housing 1.So, CVD equipment of the present invention is before plated film, can working gas be full of described housing 1 inside by described inlet mouth 15, described housing 1 inner original gas is discharged by described venting port 16, final so that the working gas of described housing 1 interior formation high density, so that in the coating process, avoid being positioned over material to be coated and air generation chemical reaction on the described transport tape 2.Further, described inlet mouth 15 is equipped with respectively inlet mouth valve and drain tap with venting port 16, by controlling the open and-shut mode of described air intake valve and drain tap, and then controls air input and the free air delivery of working gas.
Be provided with mobile photo-thermal mixing device 5 in the described cavity of resorption 14, described photo-thermal mixing device 5 has one towards described transport tape 2 and sprays the air nozzle 51 of working gas.In the prior art, the photo-thermal mixing device normally adopts fixed set-up mode, and so for making jet scope larger, the opening of the air nozzle 51 that designs is also larger, causes like this volume of photo-thermal mixing device also larger, and its manufacturing cost therefore uprises.The present invention adopts portable photo-thermal mixing device 5, and wherein, the move mode of described photo-thermal mixing device 5 can be the movement of linear reciprocating, also can adopt the reciprocating type mobile of XY plane formula, at this its move mode is not done concrete restriction.So, by adopting mobile photo-thermal mixing device 5, with the mobile fixing photo-thermal mixing device that substitutes, can be so that whole photo-thermal mixing device be microminiaturized.
In the present embodiment, be provided with a screw mandrel 52 that rotates in the described cavity of resorption 14, described photo-thermal mixing device 5 is provided with the threaded hole 53 adaptive with described screw mandrel 52, and described photo-thermal mixing device 5 is installed on the described screw mandrel 52 by described threaded hole 53.Wherein, described screw mandrel 52 is parallel with horizontal plane, so, can change in the horizontal direction position of described photo-thermal mixing device 5 by rotating described screw mandrel 52.
In the present embodiment, described photo-thermal mixing device 5 comprises mixing bunker 54 with hybrid chamber 543, coats the support frame 55 of described mixing bunker 54 and focuses on photo-thermal device 56 on the described support frame 55.Wherein, described support frame 55 adopts the better metallic substance of heat conductivility to be made.So, when CVD equipment provided by the invention is in running order, described photo-thermal device 56 provides heat for described support frame 55, heat is through the quick conduction of described support frame 55, make mixing bunker 54 thermally equivalents that are contained in the described support frame 55, the described mixing bunker 54 interior working gass of flowing through like this can obtain more uniform being heated, the coating film thickness that final material to be plated on described transport tape 2 forms is more all even smooth, while can also make fully working gas finish reaction and form plated film on material to be plated, saves the consumption of working gas.
In the present embodiment, described photo-thermal device 56 comprises the optical cavity 561 of being located at described support frame 55 lower ends, be located in the described optical cavity 561 and focus on amasthenic lens 562 and the flexible light pipe 563 of described support frame 55 lower ends, one end of described light pipe 563 is inserted in the described optical cavity 561 and towards described amasthenic lens 562, and the other end is connected with light source.So, can realize the energy of light source is transferred on the described support frame 55 by described light pipe 563, the working gas of the described mixing bunker 54 of flowing through is heated.Because the present invention adopts flexible light pipe 563, can make light pipe 563 together mobile in company with described photo-thermal mixing device 5, so that the setting position of described light source is more flexible.Particularly, described light source is located at the outside of described housing 1, and the end that described light pipe 563 connects light source passes described housing 1 and is connected with described light source.So, can make things convenient for being separated from each other of CVD equipment of the present invention and light source, also be convenient to the maintenance of described CVD equipment.
In the present embodiment, described mixing bunker 54 comprises the intake section 541 that is positioned at the bottom, be connected with intake section 541 and be positioned at the top and form the mixing section 542 of described hybrid chamber 543, described intake section 541 is contained in the described support frame 55, be provided with the air inlet cavity 5411 that some and described mixing section 542 gas circuits are communicated with in the described intake section 541, described tuyere 51 is located at described mixing section 542.So, working gas enters in the described mixing bunker 54 via described intake section 541, working gas is in the process of described intake section 541 of flowing through, via the heating that is arranged at described supporting lever frame 55 with excite, enter again described mixing section 542, can be in the 542 interior sufficient mixing of described mixing section, with the quality that improves final plated film and the use that reduces gas raw material.
In addition, described photo-thermal mixing device 5 also comprises the intake ducting 57 that is connected with described air inlet cavity 5411, the longitudinal side wall that described intake ducting 57 passes described housing 1 is connected with the air feed equipment that is positioned at housing 1 outside, described intake ducting 57 adopts flexible pipe to be made, when described air inlet cavity 5411 has many, described intake ducting 57 can correspondingly arrange the air intake branch 571 that adapts with air inlet cavity 5411, and each air intake branch 571 converges in the air inlet supervisor 572.In addition, based on some working gas unsuitable sounding chemical reaction before mixing, be provided with the air inlet tubule 573 identical with air intake branch 571 quantity in the described intake ducting 57, each described air inlet tubule 573 passes respectively described air inlet supervisor 572 and one air intake branch 571 and provides working gas to a described air inlet cavity 5411.
In the present embodiment, described tuyere 51 elongated slits, described mixing section 542 comprises by described tuyere 51 to both sides extended two oblique 5421 and with described oblique 5421 horizontal plane 5422 that is connected with described intake section 541 respectively, and the lateral cross section of described mixing section 542 is isosceles triangle; Described air inlet cavity 5411 is two, and described intake section 541 is provided with partition wall 5412, the two described air inlet cavities 5411 that extended to described mixing section 542 by its bottom and is enclosed by described partition wall 5412 and described intake section 541 sidewalls and form.So, two described air inlet cavities 5411 of described intake section 541 are two described oblique 5421 of corresponding described mixing section 542 respectively, working gas via described intake section 541 heating with excite after enter described hybrid chamber 543; Under described oblique 5421 guide effect, can obtain better mixed effect, and after described oblique 5421 guiding, the working gas of ejection is more even.
In the present embodiment, described hybrid chamber 543 has the protuberance 5431 that protrudes from described intake section 541 near described intake section 541.So, first excessive via the mitigation of described protuberance 5431 when working gas enters described mixing section 542 via described air inlet cavity 5411, can make mixed effect better.
In the present embodiment, described cylinder group 3 is similar with driving, and described photo-thermal mixing device 5 also comprises to be located at described housing 1 sidewall and to drive the second servomotor 6 that described screw mandrel 52 rotates.Wherein, described the first servomotor 4 and the second servomotor 6 be arranged at respectively described housing 1 relative two to side.So be conducive to whole CVD equipment and be subjected to equilibrium of forces.
In the present embodiment, the surface of each described upper cylinder 31 and bottom roll 32 is provided with elastic layer (not shown in FIG.), press on the surface, both ends of each described upper cylinder 31 and bottom roll 32 mutually elasticity, have the gap of passing through for described transport tape 2 between each described upper cylinder 31 and the bottom roll 32, and mutual elasticity is pressed between each described upper cylinder 31 and bottom roll 32 and the described transport tape 2.Wherein, described elastic layer adopts silicon rubber to be made.Technique scheme has been given the concrete sealing means of described cylinder group 3, be arranged to Elastic Contact by described upper cylinder 31, bottom roll 32 and transport tape 2 being in contact with one another part, so, in described cylinder group 3 operation process of described transport tape 2 companions, can constantly keep good sealing effectiveness, realize dynamic seal.In addition, owing to adopt the mode of shrink-fit between described cylinder group 3 and the described transport tape 2, therefore, will inevitably produce a large amount of heats because of friction each other, for the heat that makes the heat that produces can in time distribute, also be provided with the water-cooling system 7 that described cylinder group 3 is lowered the temperature in the described housing 1.
In the present embodiment, for realizing the automatization control of above-mentioned CVD equipment, above-mentioned CVD equipment also comprises Controlling System, and described Controlling System comprises the film thickness monitoring system that adopts the infrared external reflection principle to be made, temperature measuring equipment, the System Controlled by Measuring Pressure of monitoring described epicoele and lower cavity pressure that employing infrared measurement of temperature method is made, the video monitoring apparatus of monitoring described epicoele and cavity of resorption internal medium.
In the present embodiment, above-mentioned CVD equipment comprises Controlling System, and described Controlling System comprises the film thickness monitoring system that adopts the infrared external reflection principle to be made, temperature measuring equipment, the System Controlled by Measuring Pressure of monitoring described epicoele and lower cavity pressure that employing infrared measurement of temperature method is made, the video monitoring apparatus of monitoring described epicoele and cavity of resorption internal medium.In view of described film thickness monitoring system, temperature measuring equipment, System Controlled by Measuring Pressure and video monitoring apparatus are prior art respectively, carefully do not state at this.In addition, described Controlling System is connected with described air intake valve, drain tap, the first servomotor 4 and the servomotor 6 of being connected, by thickness, temperature and epicoele and the described air intake valve of the data settings such as pressure in the cavity of resorption, drain tap, the first servomotor 4 and the second servomotor 6 corresponding working ordeies of film in the real-time measurement coating process, more preferably control effect thereby reach.
Below further introduce the working process of the CVD equipment that present embodiment provides, the working process of above-mentioned CVD equipment comprises preheating preparatory stage and normal work stage, and details are as follows respectively.
The preheating preparatory stage: Controlling System is opened described drain tap, opens simultaneously described air intake valve, and to described housing 1 input protection gas and the air of discharging in the housing 1; According to the coating process requirement, particularly air pressure and temperature requirement, described Controlling System is according to the measured value of described temperature measuring equipment and System Controlled by Measuring Pressure, and then makes described Controlling System control the free air delivery of the air input of described inlet mouth 15 and described venting port 16 and the heated condition of heating installation that described preheating table 8 is heated; Simultaneously, start 56 pairs of described mixing bunkers 54 of described photo-thermal device and carry out thermal pretreatment.After described preheating table 8 reaches predetermined working temperature, air pressure in the housing 1 and reaches predetermined requirement and described mixing bunker 54 and reach predetermined temperature requirement, enter normal work stage.
Normal work stage: described Controlling System makes the heating installation that described preheating table 8 is heated be adjusted into normal keeping warm mode, and the heated condition of described photo-thermal device 56 is adjusted into normal keeping warm mode; Start simultaneously described the first servomotor 4, the material to be coated that is positioned on the described transport tape 2 can be entered in the described epicoele 13 according to predetermined speed in company with described transport tape 2, and in described epicoele 13 interior movements; Simultaneously, start the relevant valve that carries out of working gas and make the working gas described mixing bunker 54 of flowing through, and spray to described material to be plated by the air nozzle 51 of described mixing bunker 54, to form plated film.
The above is only for preferred embodiment of the present invention, and its structure is not limited to the above-mentioned shape of enumerating, and all any modifications of doing within the spirit and principles in the present invention, is equal to and replaces and improvement etc., all should be included within protection scope of the present invention.
Claims (10)
1. adopt the CVD equipment of light heating, comprise a housing, it is characterized in that: described housing both lateral sides is respectively equipped with the entrance and exit that passes through for the transport tape of placing material to be plated, and described transport tape is separated into epicoele and cavity of resorption with described housing, the entrance and exit place of described housing is provided with respectively the cylinder group of the described transport tape of dynamic clamp, each described cylinder group comprises the upper cylinder that is attached at the transport tape upside and the bottom roll that is attached at the transport tape downside, also is provided with the first servomotor that drives described cylinder group running on the described housing; Offer the inlet mouth and the venting port that enter for working gas on the described housing; Be provided with mobile photo-thermal mixing device in the described cavity of resorption, described photo-thermal mixing device has one towards described transport tape and sprays the air nozzle of working gas.
2. the CVD equipment of employing light according to claim 1 heating, it is characterized in that: be provided with a screw mandrel that rotates in the described cavity of resorption, described photo-thermal mixing device is provided with the threaded hole adaptive with described screw mandrel, and described photo-thermal mixing device is installed on the described screw mandrel by described threaded hole.
3. the CVD equipment of employing light according to claim 1 heating is characterized in that: described photo-thermal mixing device comprises mixing bunker with hybrid chamber, coat the support frame of described mixing bunker and focus on photo-thermal device on the described support frame.
4. the CVD equipment of employing light according to claim 3 heating, it is characterized in that: described photo-thermal device comprises the optical cavity of being located at described support frame lower end, be located in the described optical cavity and focus on amasthenic lens and the flexible light pipe of described support frame lower end, one end of described light pipe is inserted in the described optical cavity and towards described amasthenic lens, and the other end is connected with light source.
5. the CVD equipment of employing light according to claim 3 heating, it is characterized in that: described mixing bunker comprises the intake section that is positioned at the bottom, be connected with intake section and be positioned at the top and form the mixing section of described hybrid chamber, described intake section is contained in the described support frame, be provided with the air inlet cavity that some and described mixing section gas circuit is communicated with in the described intake section, described air nozzle is located at described mixing section.
6. the CVD equipment of employing light according to claim 5 heating, it is characterized in that: the elongated slit of described air nozzle, described mixing section comprises by described air nozzle to both sides extended two oblique and with described oblique horizontal plane that is connected with described intake section respectively, and the lateral cross section of described mixing section is isosceles triangle; Described air inlet cavity is two, and described intake section is provided with the partition wall that is extended to described mixing section by its bottom, and two described air inlet cavities are enclosed by described partition wall and described intake section sidewall and form.
7. the CVD equipment of employing light according to claim 6 heating, it is characterized in that: described hybrid chamber has the protuberance that protrudes from described intake section near described intake section.
8. the CVD equipment of employing light according to claim 2 heating, it is characterized in that: described photo-thermal mixing device also comprises to be located at described housing sidewall and to drive the second servomotor that described screw mandrel rotates.
9. the CVD equipment of employing light according to claim 1 heating, it is characterized in that: the surface of each described upper cylinder and bottom roll is provided with elastic layer, press on the surface, both ends of each described upper cylinder and bottom roll mutually elasticity, have the gap of passing through for described transport tape between each described upper cylinder and the bottom roll, and mutual elasticity is pressed between each described upper cylinder and bottom roll and the described transport tape.
10. the CVD equipment of each described employing light heating according to claim 1 ~ 9, it is characterized in that: comprise Controlling System, described Controlling System comprises the video monitoring apparatus of System Controlled by Measuring Pressure, the described epicoele of monitoring and the cavity of resorption internal medium of film thickness monitoring system, temperature measuring equipment, the described epicoele of monitoring and lower cavity pressure.
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| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201210571914.4A CN103046026B (en) | 2012-12-25 | 2012-12-25 | CVD equipment with optical heating effect |
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| CN201210571914.4A CN103046026B (en) | 2012-12-25 | 2012-12-25 | CVD equipment with optical heating effect |
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| CN103046026A true CN103046026A (en) | 2013-04-17 |
| CN103046026B CN103046026B (en) | 2014-12-31 |
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Citations (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US4836140A (en) * | 1985-12-23 | 1989-06-06 | Hoshin Kagaku Sangyosho Co., Ltd. | Photo-CVD apparatus |
| CN1048568A (en) * | 1989-06-28 | 1991-01-16 | 佳能株式会社 | Form the microwave plasma chemical vapor deposition method and the equipment of big area film continuously |
| US5397395A (en) * | 1990-10-29 | 1995-03-14 | Canon Kabushiki Kaisha | Method of continuously forming a large area functional deposited film by microwave PCVD and apparatus for the same |
| CN203128656U (en) * | 2012-12-25 | 2013-08-14 | 王奉瑾 | CVD (chemical vapor deposition) device adopting light heating |
-
2012
- 2012-12-25 CN CN201210571914.4A patent/CN103046026B/en not_active Expired - Fee Related
Patent Citations (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US4836140A (en) * | 1985-12-23 | 1989-06-06 | Hoshin Kagaku Sangyosho Co., Ltd. | Photo-CVD apparatus |
| CN1048568A (en) * | 1989-06-28 | 1991-01-16 | 佳能株式会社 | Form the microwave plasma chemical vapor deposition method and the equipment of big area film continuously |
| US5397395A (en) * | 1990-10-29 | 1995-03-14 | Canon Kabushiki Kaisha | Method of continuously forming a large area functional deposited film by microwave PCVD and apparatus for the same |
| CN203128656U (en) * | 2012-12-25 | 2013-08-14 | 王奉瑾 | CVD (chemical vapor deposition) device adopting light heating |
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Granted publication date: 20141231 Termination date: 20171225 |