CN102858738A - 用于加成法制造的包含三芳基锍硼酸盐阳离子光引发剂的液体可辐射固化树脂 - Google Patents
用于加成法制造的包含三芳基锍硼酸盐阳离子光引发剂的液体可辐射固化树脂 Download PDFInfo
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- CN102858738A CN102858738A CN2010800579423A CN201080057942A CN102858738A CN 102858738 A CN102858738 A CN 102858738A CN 2010800579423 A CN2010800579423 A CN 2010800579423A CN 201080057942 A CN201080057942 A CN 201080057942A CN 102858738 A CN102858738 A CN 102858738A
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- B33Y—ADDITIVE MANUFACTURING, i.e. MANUFACTURING OF THREE-DIMENSIONAL [3-D] OBJECTS BY ADDITIVE DEPOSITION, ADDITIVE AGGLOMERATION OR ADDITIVE LAYERING, e.g. BY 3-D PRINTING, STEREOLITHOGRAPHY OR SELECTIVE LASER SINTERING
- B33Y70/00—Materials specially adapted for additive manufacturing
- B33Y70/10—Composites of different types of material, e.g. mixtures of ceramics and polymers or mixtures of metals and biomaterials
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B33—ADDITIVE MANUFACTURING TECHNOLOGY
- B33Y—ADDITIVE MANUFACTURING, i.e. MANUFACTURING OF THREE-DIMENSIONAL [3-D] OBJECTS BY ADDITIVE DEPOSITION, ADDITIVE AGGLOMERATION OR ADDITIVE LAYERING, e.g. BY 3-D PRINTING, STEREOLITHOGRAPHY OR SELECTIVE LASER SINTERING
- B33Y80/00—Products made by additive manufacturing
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- G—PHYSICS
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- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/0037—Production of three-dimensional images
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- G—PHYSICS
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- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/0045—Photosensitive materials with organic non-macromolecular light-sensitive compounds not otherwise provided for, e.g. dissolution inhibitors
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
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- G—PHYSICS
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- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
- G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
- G03F7/029—Inorganic compounds; Onium compounds; Organic compounds having hetero atoms other than oxygen, nitrogen or sulfur
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- G—PHYSICS
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- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
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- B29—WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
- B29C—SHAPING OR JOINING OF PLASTICS; SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDED FOR; AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING
- B29C33/00—Moulds or cores; Details thereof or accessories therefor
- B29C2033/0005—Moulds or cores; Details thereof or accessories therefor with transparent parts, e.g. permitting visual inspection of the interior of the cavity
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B29—WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
- B29C—SHAPING OR JOINING OF PLASTICS; SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDED FOR; AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING
- B29C35/00—Heating, cooling or curing, e.g. crosslinking or vulcanising; Apparatus therefor
- B29C35/02—Heating or curing, e.g. crosslinking or vulcanizing during moulding, e.g. in a mould
- B29C35/08—Heating or curing, e.g. crosslinking or vulcanizing during moulding, e.g. in a mould by wave energy or particle radiation
- B29C35/0805—Heating or curing, e.g. crosslinking or vulcanizing during moulding, e.g. in a mould by wave energy or particle radiation using electromagnetic radiation
- B29C2035/0827—Heating or curing, e.g. crosslinking or vulcanizing during moulding, e.g. in a mould by wave energy or particle radiation using electromagnetic radiation using UV radiation
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B29—WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
- B29C—SHAPING OR JOINING OF PLASTICS; SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDED FOR; AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING
- B29C35/00—Heating, cooling or curing, e.g. crosslinking or vulcanising; Apparatus therefor
- B29C35/02—Heating or curing, e.g. crosslinking or vulcanizing during moulding, e.g. in a mould
- B29C35/08—Heating or curing, e.g. crosslinking or vulcanizing during moulding, e.g. in a mould by wave energy or particle radiation
- B29C35/0805—Heating or curing, e.g. crosslinking or vulcanizing during moulding, e.g. in a mould by wave energy or particle radiation using electromagnetic radiation
- B29C2035/0838—Heating or curing, e.g. crosslinking or vulcanizing during moulding, e.g. in a mould by wave energy or particle radiation using electromagnetic radiation using laser
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T428/00—Stock material or miscellaneous articles
- Y10T428/31504—Composite [nonstructural laminate]
- Y10T428/31511—Of epoxy ether
- Y10T428/31515—As intermediate layer
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- Chemical & Material Sciences (AREA)
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- Plasma & Fusion (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Polymerisation Methods In General (AREA)
- Organic Chemistry (AREA)
- Epoxy Resins (AREA)
Abstract
Description
组分 | Comp 8 | Ex 8 | Comp 9 | Ex 9 | Comp 10 | Ex 10 | Ex 11 |
Nanopox A610 | 33.62 | 33.62 | 34.61 | 34.78 | 33.57 | 33.57 | 34.72 |
Heloxy 68 | 5.71 | 5.71 | 5.88 | 5.91 | 5.70 | 5.70 | 5.89 |
OXT-101 | 3.81 | 3.81 | 3.92 | 3.94 | 3.80 | 3.80 | 3.93 |
SR-399LV | 3.42 | 3.42 | 3.52 | 3.54 | 3.42 | 3.42 | 3.54 |
SR-833S | 2.29 | 2.29 | 2.36 | 2.37 | 2.29 | 2.29 | 2.39 |
Chivacure 1176 | 3.80 | 1.00 | 3.80 | ||||
Irgacure PAG-290 | 1.90 | 0.50 | 1.90 | 0.50 | |||
碳酸丙二醇酯 | 1.90 | 1.90 | |||||
Irgacure 184 | 0.40 | 0.40 | 0.40 | 0.40 | 0.40 | 0.40 | 0.40 |
Sunspacer 4.0X-ST-3 | 46.93 | 46.93 | 48.29 | 48.54 | 46.85 | 46.85 | 48.46 |
HQMME | 0.02 | 0.02 | 0.02 | 0.02 | 0.02 | 0.02 | 0.02 |
DG-0071 | 0.15 | 0.15 | 0.15 | ||||
总计 | 100.00 | 100.00 | 100.00 | 100.00 | 100.00 | 100.00 | 100.00 |
所有填料 | 60.38 | 60.38 | 62.13 | 62.45 | 60.28 | 60.28 | 62.35 |
Ec(mJ/cm2) | 8.36 | 6.88 | 17.36 | 6.51 | 6.83 | 5.51 | 12.45 |
Dp(密耳) | 4.90 | 1.73 | 14.82 | 3.92 | 4.38 | 1.37 | 5.12 |
E10(mJ/cm2) | 64.29 | 2209 | 34.09 | 83.41 | 66.78 | 8177 | 87.75 |
光稳定性(hrs,凝胶时间) | 69 | 39 | 79 | 55 | 199 | 199 | No gel |
初始粘度(cps,30℃) | 1693 | 1655 | 2014 | 2227 | 1618 | 1468 | 2089 |
15天粘度(cps,30℃) | 4249 | 2849 | 4084 | 3529 | 2549 | 2111 | 3120 |
15天粘度增加(%) | 250.97 | 172.15 | 202.78 | 158.46 | 157.54 | 143.80 | 149.35 |
24天粘度(cps,30℃) | 6642 | 3312 | 5743 | 3917 | 2927 | 2297 | 3388 |
24天粘度增加(%) | 392.32 | 200.12 | 285.15 | 175.89 | 180.90 | 156.47 | 162.18 |
Claims (19)
Applications Claiming Priority (3)
Application Number | Priority Date | Filing Date | Title |
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US28762009P | 2009-12-17 | 2009-12-17 | |
US61/287,620 | 2009-12-17 | ||
PCT/US2010/060668 WO2011075553A1 (en) | 2009-12-17 | 2010-12-16 | Liquid radiation curable resins for additive fabrication comprising a triaryl sulfonium borate cationic photoinitiator |
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CN102858738A true CN102858738A (zh) | 2013-01-02 |
CN102858738B CN102858738B (zh) | 2015-07-22 |
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CN201080057944.2A Active CN102934026B (zh) | 2009-12-17 | 2010-12-16 | 用于加成法制造的可led固化的液体树脂组合物 |
CN201080057942.3A Active CN102858738B (zh) | 2009-12-17 | 2010-12-16 | 用于加成法制造的包含三芳基锍硼酸盐阳离子光引发剂的液体可辐射固化树脂 |
CN201610479298.8A Active CN106125509B (zh) | 2009-12-17 | 2010-12-16 | 用于加成法制造的可led固化的液体树脂组合物 |
CN201080057939.1A Active CN102666073B (zh) | 2009-12-17 | 2010-12-16 | 基于基材的加成法制造工艺 |
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CN201080057939.1A Active CN102666073B (zh) | 2009-12-17 | 2010-12-16 | 基于基材的加成法制造工艺 |
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US (3) | US20120251841A1 (zh) |
EP (3) | EP2512779B1 (zh) |
JP (2) | JP5699365B2 (zh) |
KR (4) | KR20120109558A (zh) |
CN (4) | CN102934026B (zh) |
BR (2) | BR112012014890B1 (zh) |
WO (3) | WO2011084578A1 (zh) |
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CN112823313A (zh) * | 2018-04-17 | 2021-05-18 | 深圳摩方新材科技有限公司 | 制造三维物体的方法及系统 |
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WO2009047151A1 (en) * | 2007-10-10 | 2009-04-16 | Basf Se | Sulphonium salt initiators |
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