CN102618825A - Housing and manufacturing method thereof - Google Patents
Housing and manufacturing method thereof Download PDFInfo
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- CN102618825A CN102618825A CN2011100315737A CN201110031573A CN102618825A CN 102618825 A CN102618825 A CN 102618825A CN 2011100315737 A CN2011100315737 A CN 2011100315737A CN 201110031573 A CN201110031573 A CN 201110031573A CN 102618825 A CN102618825 A CN 102618825A
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Abstract
The invention provides a housing having a chocolate appearance. The housing comprises a base body and a color layer formed on the surface of the base body, the color layer comprises a chromium oxynitride layer and an alumina layer, and the chroma zone presented by the color layer in a CIE LAB color system is characterized in that L*coordinate is between 56 and 100, a*coordinate is between 8 and 10 and b*coordinate is between 29 and 31. The invention also provides a manufacturing method of the housing. The color layer makes the housing have the chocolate color, so the color of a vacuum coating layer is enriched.
Description
Technical field
The present invention relates to a kind of housing and preparation method thereof, relate in particular to a kind of housing and preparation method thereof with chocolate outward appearance.
Background technology
For the shell that makes electronic installation has rich colors, main at present through prepared decorative coatings such as anodic oxidation, baking vanish, porcelains.Compare these traditional technologys, the environmental protection more of PVD coating technique, and adopt the PVD coating technique to form ornamental color layer on the product casing surface with metal-like.
Yet in the prior art, utilize the color of the rete that the PVD coating technique forms in surface of shell very limited, the PVD rete that can extensively prepare and use at present is mainly colour systems such as golden yellow, black, white, and color that can stably manufactured is less.
Summary of the invention
In view of this, the present invention provides a kind of housing that forms the chocolate outward appearance through plated film.
In addition, the present invention also provides a kind of making method of above-mentioned housing.
A kind of housing; The color layer that it comprises matrix and is formed at matrix surface; This color layer comprises and is formed at nitrogen oxygen chromium layer and alumina layer on the matrix surface successively; Between 56 to 100, the a* coordinate is between 8 to 10 in the L* coordinate of CIE LAB colour system for the chroma areas that this color layer appears, and the b* coordinate is between 29 to 31.
A kind of making method of housing, it comprises the steps:
One matrix is provided;
Surface in this matrix forms color layer, and this color layer comprises the nitrogen oxygen chromium layer that is formed at matrix surface through medium frequency magnetron sputtering, is target with the chromium target; With oxygen and nitrogen is reactant gases; The initial flow of control oxygen is 20sccm, and the initial flow of nitrogen is 15sccm, and the flow of oxygen and nitrogen increases in gradient; Make its Sauerstoffatom and nitrogen-atoms by increasing in gradient, on matrix, form nitrogen oxygen chromium layer near matrix to direction away from matrix;
Magnetically controlled DC sputtering forms alumina layer on nitrogen oxygen chromium layer.Between 56 to 100, the a* coordinate is between 8 to 10 in the L* coordinate of CIE LAB colour system for the chroma areas that said color layer appears, and the b* coordinate is between 29 to 31.
Compared to prior art; The preparation method of said housing is when forming color layer; Through the design of the choosing of target, reactant gases oxygen and nitrogen flow and the control of sputtering time are formed nitrogen oxygen chromium layer, magnetron sputtering alumina layer afterwards is through the overlap action between two retes; Thereby reach the purpose that makes color layer present chocolate; Demonstrate the outward appearance of attractive chocolate with the prepared housing of this method, enriched the color of vacuum coating, improved the outward appearance competitive power of product.
Description of drawings
Fig. 1 is the sectional view of the present invention's one preferred embodiment housing;
Fig. 2 is a used coating equipment schematic top plan view in the making processes of Fig. 1 housing.
The main element nomenclature
Nitrogen oxygen chromium layer 131
Alumina layer 133
Embodiment
See also Fig. 1, the housing 10 of the present invention's one preferred embodiment comprises matrix 11 and is formed at the color layer 13 on matrix 11 surfaces.This color layer 13 presents chocolate.
The material of matrix 11 can be stainless steel, glass, pottery or plastics, is preferably stainless steel.
Said nitrogen oxygen chromium layer 131 is that the mode through medium frequency magnetron sputtering forms.
Said alumina layer 133 is that the mode through magnetically controlled DC sputtering forms.
The thickness of this nitrogen chromium oxide layer 131 is 0.3～1.0um.
The thickness of aluminum oxide 133 is 0.1～0.2um.
These color layer 13 naked eyes intuitively present chocolate, and between 56 to 100, the a* coordinate is between 8 to 10 in the L* of CIELAB colour system coordinate for its chroma areas that appears, and the b* coordinate is between 29 to 31.
The quality percentage composition of Cr, O and each element of N is respectively 53%～58%, 36%～40% and 6%～7% in the said nitrogen oxygen chromium layer.
The quality percentage composition of Al, each element of O is respectively 25%～65%, 35%～75% in the said nitrogen oxygen chromium layer.
The making method of housing 10 of the present invention may further comprise the steps:
Matrix 11 is provided.The material of matrix 11 can be stainless steel, glass, pottery or plastics, is preferably stainless steel.
Matrix 11 is put into absolute ethyl alcohol carry out ultrasonic cleaning and dry for standby.
Surface in matrix 11 forms color layer 13.This color layer 13 comprises nitrogen oxygen chromium layer 131 and alumina layer 133.This color layer 13 adopts the mode of magnetron sputtering to form.
In conjunction with consulting Fig. 2, a coating equipment 100 is provided, this coating equipment 100 comprises a coating chamber 20 and is connected in a vacuum pump 30 of coating chamber 20 that vacuum pump 30 is in order to vacuumize coating chamber 20.Be provided with pivoted frame (not shown), the two chromium targets 22 that are oppositely arranged and two aluminium targets 23 in this coating chamber 20, pivoted frame drives matrix 11 along 21 revolution of circular track, and matrix 11 also rotation along track 21 revolution the time.
On matrix 11, form nitrogen oxygen chromium layer 131, vacuumizing the vacuum tightness that makes this coating chamber 20 is 8 * 10
-5Pa; The revolution rotating speed that pivoted frame is set be 0.5rpm (rev/min), it is 120 ℃ that coating chamber 20 temperature are set, the power that chromium target 22 is set is 7～9kw; With the argon gas is working gas; The flow of argon gas is 150～300sccm, the bias voltage that puts on matrix 11 is-250～-200V, the dutycycle that bias voltage is set is 40%～60%; With oxygen and nitrogen is reactant gases, and the flow of control oxygen is 20～80sccm, and the flow of nitrogen is 15～45sccm.During sputter, the initial flow that makes oxygen is 20sccm, and the first flow that makes of nitrogen is 15sccm, and the flow of oxygen and nitrogen is increased in gradient.
The concrete gradient increase mode of oxygen and nitrogen flow is:
In the 0th～5min, the control oxygen flow is 20sccm, and nitrogen flow is 15sccm; In the 5th～10min, the control oxygen flow is 30sccm, and nitrogen flow is 20sccm; In the 10th～15min, the control oxygen flow is 40sccm, and nitrogen flow is 30sccm; In the 15th～30min, the control oxygen flow is 50sccm, and nitrogen flow is 35sccm; During the 30th～45min, the control oxygen flow is 80sccm, and nitrogen flow is 45sccm.
The fluctuations in discharge of above-mentioned oxygen and nitrogen can be referring to table 1:
Table 1
After forming nitrogen oxygen chromium layer 131 on the matrix 11; 80sccm is constant for the control oxygen flow, on nitrogen oxygen chromium layer 131, forms alumina layer 133, and the processing parameter that forms this alumina layer 133 is: the power that aluminium target 22 is set is 3kw; With the argon gas is working gas; The flow of argon gas is 300～400sccm, the bias voltage that puts on matrix 11 is-100～-200V, sputter 20～30min.
Between 56 to 100, the a* coordinate is between 8 to 10 in the L* coordinate of CIE LAB colour system for the chroma areas that said color layer 13 appears, and the b* coordinate is between 29 to 31.The thickness of said color layer 13 can be 0.3～1.0 μ m.
Said color layer 13 through changing in the said nitrogen oxygen chromium layer 131 the quality percentage composition of Al, each element of O in Cr, O, N and the alumina layer 133, can obtain the color layer 13 of different values of chromatism except that above-mentioned preferred embodiment, specifically see also table 2.
Table 2
The preparation method of said housing 10 is when forming color layer 13; Through to the choosing of chromium target 22 and aluminium target 23, reactant gases oxygen and the design of nitrogen flow and the control of sputtering time; Form nitrogen oxygen chromium layer, afterwards, magnetron sputtering alumina layer on nitrogen oxygen chromium layer; Through the overlap action between two retes, thereby reach the purpose that makes color layer 13 present chocolate.Demonstrate the outward appearance of attractive chocolate with the prepared housing 10 of this method, enriched the color of vacuum coating, greatly improved the outward appearance competitive power of product.
Claims (10)
1. housing; The color layer that it comprises matrix and is formed at matrix surface; It is characterized in that: this color layer comprises nitrogen oxygen chromium layer and the alumina layer that is formed at matrix surface successively, and between 56 to 100, the a* coordinate is between 8 to 10 in the L* coordinate of CIE LAB colour system for the chroma areas that this color layer appears; The b* coordinate is between 29 to 31; The quality percentage composition of Cr, O and each element of N is respectively 53%～58% in the said nitrogen oxygen chromium layer, and the quality percentage composition of Al, each element of O is respectively 25%～65%, 35%～75% in 36%～40% and 6%～7% said nitrogen oxygen chromium layer.
2. housing as claimed in claim 1 is characterized in that: in the said nitrogen oxygen chromium layer among Cr, O and the N quality percentage composition of each element be respectively 58%, 36% and 6%, the quality percentage composition of Al, each element of O is respectively 65%, 35% in the said alumina layer.
3. housing as claimed in claim 1 is characterized in that: in the said nitrogen oxygen chromium layer among Cr, O, the N quality percentage composition of each element be respectively 55%, 38% and 7%, the quality percentage composition of Al, each element of O is respectively 55%, 45% in the said alumina layer.
4. housing as claimed in claim 1 is characterized in that: in the said nitrogen oxygen chromium layer among Cr, O, the N mass percentage content of each element be not 53%, 40% and 7%, the quality percentage composition of Al, each element of O is respectively 25%, 75% in the said alumina layer.
5. housing as claimed in claim 1 is characterized in that: the material of said matrix is stainless steel, glass, pottery or plastics.
6. housing as claimed in claim 1 is characterized in that: the thickness of nitrogen chromium oxide layer is 0.3～1.0um in this color layer, and the thickness of aluminum oxide is 0.1～0.2um.
7. housing as claimed in claim 1 is characterized in that: said nitrogen oxygen chromium layer is to form through medium frequency magnetron sputtering, and said alumina layer is to form through magnetically controlled DC sputtering.
8. the making method of a housing, it comprises the steps:
One matrix is provided;
Surface in this matrix forms color layer, and this color layer comprises the nitrogen oxygen chromium layer that is formed at matrix surface through medium frequency magnetron sputtering, is target with the chromium target; With oxygen and nitrogen is reactant gases; The initial flow of control oxygen is 20sccm, and the initial flow of nitrogen is 15sccm, and the flow of oxygen and nitrogen increases in gradient; Make its Sauerstoffatom and nitrogen-atoms by increasing in gradient, on matrix, form nitrogen oxygen chromium layer near matrix to direction away from matrix;
Magnetically controlled DC sputtering forms alumina layer on nitrogen oxygen chromium layer, opens the aluminium target, control oxygen flow 80sccm; Between 56 to 100, the a* coordinate is between 8 to 10 in the L* coordinate of CIE LAB colour system for the chroma areas that said color layer appears, and the b* coordinate is between 29 to 31.
9. the making method of housing as claimed in claim 8, it is characterized in that: the processing parameter that forms this alumina layer is: vacuum tightness is 8 * 10
-3Pa, the power that the aluminium target is set is 3kw, is working gas with the argon gas, and the flow of argon gas is 300～400sccm, and the bias voltage that puts on matrix is-100～-200V, sputter 20～30min.
10. the making method of housing as claimed in claim 8 is characterized in that: said formation nitrogen oxygen chromium layer to the flow that oxygen and nitrogen gradient increase is: in the 0th～5min, the control oxygen flow is 20sccm, and nitrogen flow is 15sccm; In the 5th～10min, the control oxygen flow is 30sccm, and nitrogen flow is 20sccm; In the 10th～15min, the control oxygen flow is 40sccm, and nitrogen flow is 30sccm; In the 15th～30min, the control oxygen flow is 50sccm, and nitrogen flow is 35sccm; During the 30th～45min, the control oxygen flow is 80sccm, and nitrogen flow is 45sccm.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN2011100315737A CN102618825A (en) | 2011-01-28 | 2011-01-28 | Housing and manufacturing method thereof |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN2011100315737A CN102618825A (en) | 2011-01-28 | 2011-01-28 | Housing and manufacturing method thereof |
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| Publication Number | Publication Date |
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| CN102618825A true CN102618825A (en) | 2012-08-01 |
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| CN2011100315737A Pending CN102618825A (en) | 2011-01-28 | 2011-01-28 | Housing and manufacturing method thereof |
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Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN102817002A (en) * | 2012-08-08 | 2012-12-12 | 四川长虹电器股份有限公司 | Colorized vacuum coating method |
| CN105220161A (en) * | 2015-11-19 | 2016-01-06 | 东莞金稞电子科技有限公司 | Stainless process of surface treatment |
| WO2022258680A1 (en) * | 2021-06-10 | 2022-12-15 | Atotech Deutschland GmbH & Co. KG | Method for electrodepositing a dark chromium layer, substrate comprising same, and electroplating bath thereof |
Citations (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN2154862Y (en) * | 1993-05-06 | 1994-02-02 | 东北大学 | Coated glass with 3-layer film structure |
| US6586114B1 (en) * | 2002-07-24 | 2003-07-01 | Vapor Technologies, Inc. | Coated article having a dark copper color |
| CN101314854A (en) * | 2007-06-01 | 2008-12-03 | 中国科学院金属研究所 | Cr-O-N active diffusion blocking layer and production method thereof |
-
2011
- 2011-01-28 CN CN2011100315737A patent/CN102618825A/en active Pending
Patent Citations (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN2154862Y (en) * | 1993-05-06 | 1994-02-02 | 东北大学 | Coated glass with 3-layer film structure |
| US6586114B1 (en) * | 2002-07-24 | 2003-07-01 | Vapor Technologies, Inc. | Coated article having a dark copper color |
| CN101314854A (en) * | 2007-06-01 | 2008-12-03 | 中国科学院金属研究所 | Cr-O-N active diffusion blocking layer and production method thereof |
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN102817002A (en) * | 2012-08-08 | 2012-12-12 | 四川长虹电器股份有限公司 | Colorized vacuum coating method |
| CN105220161A (en) * | 2015-11-19 | 2016-01-06 | 东莞金稞电子科技有限公司 | Stainless process of surface treatment |
| WO2022258680A1 (en) * | 2021-06-10 | 2022-12-15 | Atotech Deutschland GmbH & Co. KG | Method for electrodepositing a dark chromium layer, substrate comprising same, and electroplating bath thereof |
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Application publication date: 20120801 |