CN102540736A - Uniformity compensation device applied to large field-of-view montage illumination - Google Patents
Uniformity compensation device applied to large field-of-view montage illumination Download PDFInfo
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- CN102540736A CN102540736A CN2010105822146A CN201010582214A CN102540736A CN 102540736 A CN102540736 A CN 102540736A CN 2010105822146 A CN2010105822146 A CN 2010105822146A CN 201010582214 A CN201010582214 A CN 201010582214A CN 102540736 A CN102540736 A CN 102540736A
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Abstract
The invention provides a uniformity compensation device applied to large field-of-view montage illumination, which sequentially comprises a light source, a light distribution structure with at least two light outlets and relay lenses with the number of optical fiber light outlets to be identical along the light transmission direction. The uniformity compensation device is characterized by further comprising a light evening optical element and a feedback controller. Light emitted from the light source passes through the light evening optical element, the light distribution structure and the relay lenses to obtain a uniform illumination field of view on a substrate. The feedback controller can adjust positions and/or angles of a mercury lamp according to uniformity signals of the substrate.
Description
Technical field
The present invention relates to large scale integrated circuit manufacturing technology field, especially a kind of uniformity compensating that is used for big field stitching illumination.
Background technology
TFT is the abbreviation of Thin Film Transistor (TFT), is a kind of large-scale semiconductive completely inegrated circuit manufacturing technology that adopts new material and new technology.TFT is that (can certainly on wafer) forms through sputter, chemical deposition process and make the essential various films of circuit on on-monocrystalline sheets such as glass or plastic base, through the processing and fabricating large-scale semiconductive integrated circuit (LSIC) to film.Along with the development of associated electrical consumer product, increasing to the dimensional requirement of TFT, integrated unit is more and more, and single illuminator is difficult to satisfy the demand of TFT photoetching.Usually use is generally 8 inches in the illumination field of view of the maximum of stepping lithographic equipments such as integrated circuit manufacturing, encapsulation, and scanning photoetching also just has bigger visual field in the direction of scanning, generally also is no more than 10 inches.But in present five generations,, above TFT made public the visual field more than 17 inches, so the illumination field of view of single lens can not satisfy the requirement of big visual field photoetching far away.
Adopting a plurality of illuminator splicing scannings is to realize one of solution of big visual field TFT photoetching.In the prior art of TFT photoetching, U.S. Pat 6480262 adopts the mode of 7 camera lenses splicings to realize the exposure of big visual field, and how one of difficult point of this joining method is each cell illumination visual field of assigning to the light average effective of mercury lamp light source outgoing.In order to address this problem, two kinds of technical schemes are provided in this patent.First kind of technical scheme adopted the optical fibre light splitting mode to realize the uniformity requirement of many splicing camera lenses shown in accompanying drawing 1a and accompanying drawing 1b, and a lamp house is to a plurality of illuminations or the corresponding a plurality of illuminations of a plurality of lamp house.First kind of technical scheme adopts the mode of spectroscope beam split shown in accompanying drawing 2a and accompanying drawing 2b.Though above-mentioned two kinds of technical schemes can both solve the even lighting problem of many splicing camera lenses to a certain extent, their drawback is not have the illumination uniformity governor motion in each road illuminator.
U.S. Pat 5579147 can be regulated the homogeneity between each road, and is as shown in Figure 3.The prerequisite of this adjusting is that the homogeneity on each road itself has reached requirement.Even if having quartz pushrod and microlens array to spare light after the beam split,, can not guarantee that all cell illumination visual field homogeneitys reach requirement simultaneously according to the actual experience of debuging.Therefore, a kind of independent homogeneity governor motion in each road of can realizing being provided is the technical matters that presses for solution in the big field stitching illumination uniformity compensation technique.
Summary of the invention
For solving the problems of the technologies described above, the present invention provides a kind of uniformity compensating of big field stitching illumination, makes the visual field of each lighting unit all have the better illumination homogeneity.
The present invention provides a kind of uniformity compensating that is used for big field stitching illumination; Direction along light ray propagation; Comprise successively: the beam-splitting structure that light source, light-emitting window are at least two-way reaches and the consistent relay lens of said beam-splitting structure light-emitting window number; It is characterized in that: said uniformity compensating also comprises even light optical element, and feedback controller; The light that said light source sends obtains even illumination field of view on substrate behind even light optical element, beam-splitting structure and relay lens; Said feedback controller is according to the position and/or the angle of substrate homogeneity Signal Regulation mercury lamp.
Further, said even light optical element comprises microlens array and quartz pushrod, and said microlens array and quartz pushrod are successively between said light source and beam-splitting structure.
Further, said uniformity compensating also comprises adjusting washer array.
Further, said adjusting washer array is between said quartz pushrod and said beam-splitting structure.
Further, said feedback controller is according to the position and/or the angle of the said adjusting washer of substrate homogeneity Signal Regulation array.
Further, said uniformity compensating comprises also and the consistent even unit of said beam-splitting structure light-emitting window number that said even unit is positioned at the light-emitting window of said beam-splitting structure, and the light-emitting window of said even unit is provided with said adjusting washer array.
Further, said even light optical element is even unit and adjusting washer array, and said even unit is consistent with said beam-splitting structure light-emitting window number respectively with the number of regulating the washer array.
Further, said uniformity compensating also comprises ellipsoidal reflector, and said light source is placed on the interior along of said ellipsoidal reflector.
Further, said relay lens comprises 8 lens.Group lens, diaphragm and back group lens before said relay lens comprises.
Further, said beam-splitting structure is an optical fiber.Said beam split optical fiber is made up of some fibre cores, and the light inlet bore of said beam split optical fiber is 20mm, and the bright dipping bore of said beam split optical fiber is 5-10mm, and said every core diameter is 0.02-0.07mm.
It is a kind of in the big field stitching exposure system of scan-type of mercury lamp illumination that the present invention provides; The device that the homogeneity of each the unit splicing view field in the illumination visual field is regulated, this device can make the visual field of each lighting unit all have the better illumination homogeneity.Compared with prior art; Device provided by the present invention can make the illumination field of view of big visual field scanning splicing have better illumination uniformity; Can debug etc. under the situation that illumination uniformity that factor makes each cell illumination visual field descends at light source stability, plated film unevenness, optics through simple and effective regulative mode, can also on mask plate, obtain higher illumination uniformity.
Description of drawings
Can graphicly further be understood through following detailed Description Of The Invention and appended about advantage of the present invention and spirit.
Fig. 1 a to Fig. 1 b is one of method that realizes in the prior art big visual field uniform exposure;
Fig. 2 a to Fig. 2 b be realize in the prior art big visual field uniform exposure method two;
Fig. 3 be realize in the prior art big visual field uniform exposure method three;
Fig. 4 is first embodiment of the uniformity compensating of big field stitching illumination provided by the present invention;
Fig. 5 is second embodiment of the uniformity compensating of big field stitching illumination provided by the present invention;
Fig. 6 is the structural representation of adjusting catch involved in the present invention;
Fig. 7 is the 3rd embodiment of the uniformity compensating of big field stitching illumination provided by the present invention;
Fig. 8 is the 4th embodiment of the uniformity compensating of big field stitching illumination provided by the present invention;
Fig. 9 is the structural representation of relay lens involved in the present invention.
Embodiment
Specify specific embodiment of the present invention below in conjunction with accompanying drawing.
The present invention provides a kind of uniformity compensating of big field stitching illumination, makes the visual field of each lighting unit all have the better illumination homogeneity.In order to make each illumination field of view all have the better illumination homogeneity; Technical scheme provided by the present invention is employed in the method for sparing light before the beam split; Promptly between light source and beam split optical fiber, spare light, just before light gets into beam split optical fiber, just spare light with integrating rod or lenticule.Particularly, regulate mercury lamp or cold mirror earlier and make beam split optical fiber porch illumination uniformity reach requirement, behind optical fibre light splitting, the illumination uniformity of each road illumination field of view also can reach requirement.
This uniformity compensating; Direction along light ray propagation; Comprise successively: light source, light-emitting window be at least 2 tunnel beam-splitting structure and with the consistent relay lens of said optical fiber light-emitting window number, in the present invention, said light source employing mercury lamp; Said beam-splitting structure is a beam split optical fiber, it is characterized in that: said uniformity compensating also comprises even light optical element and feedback controller; The ultraviolet light that said mercury lamp light source sends obtains even illumination field of view on substrate behind even light optical element, optical fiber and relay lens; Said feedback controller is according to the position and/or the angle of substrate homogeneity Signal Regulation mercury lamp.
As shown in Figure 4, be first embodiment of the uniformity compensating of big field stitching illumination provided by the present invention, utilize quartz pushrod or microlens array before light gets into beam split optical fiber, just to spare light.In this enforcement, the ultraviolet light that mercury lamp light source 1 is sent passes through ellipsoidal reflector 2 optically focused successively, and microlens array 3 and quartz pushrod 4 backs are by evenly modulation.Ultraviolet light after evenly modulating gets into beam split optical fiber 5 and is divided into 2 the tunnel at least.Place a detector (not shown) at the light-emitting window place of relay lens 7 in order to obtain substrate illumination uniformity signal, this signal transfers to feedback controller 6, and according to the position of this Signal Regulation mercury lamp.
This uniformity compensating comprises along the direction of light transmission successively: mercury lamp light source 1, ellipsoidal reflector 2, microlens array 3, quartz pushrod 4, beam split optical fiber 5, relay lens 7.It is three-way that the spectrum that mercury lamp light source 1 sends mainly concentrates on g, h, i, and the spectrum that general TFT photoetching is used is three-way as i line or ghi, need follow-uply leach required wavelength with filter plate, filter plate select the skill of knowing that belongs to those skilled in the art, therefore omission here for use.Ellipsoidal reflector 2 adopts metal material to support, and can bear the light and heat that high-power mercury lamp light source 1 sends, and ellipsoid bowl inside surface is coated with the ultraviolet dielectric reflection film, can the light of the three-way wavelength of most ghi be reflexed in the illuminator.Mercury lamp light source 1 is placed on the interior along of ellipsoidal reflector 2, and quartz pushrod 4 is placed on the outer along of ellipsoid bowl.Be close to quartz pushrod 4 inlet ends and place microlens array 3, can obtain having certain visual field at the quartz pushrod endpiece, the illumination image planes in certain numerical value aperture.Beam split optical fiber 5 is close to the quartz pushrod outlet, perhaps through in the fiber coupler coupled into optical fibres.Beam split optical fiber 5 is silica fibres, can guarantee that ultraviolet light propagates therein and have high permeability, and the light inlet bore of silica fibre can be designed to 20mm, and every core diameter is 0.02-0.07mm, and thinner silica core can guarantee high fill-ratio.The silica fibre light-emitting window can be divided into 2 the tunnel, the 3 tunnel ..., the design bore can be 5-10mm, under the situation that guarantees fiber bending radius, imports to respectively in the follow-up optical system.Silica fibre will be fixedly connected, and optical fiber moves the variation that causes transmission luminous energy in the optical fiber, causes illumination unstable.Feedback controller 6 is accepted substrate illumination uniformity signal, according to the position and/or the angle of this Signal Regulation mercury lamp, thereby on substrate, obtains even illumination field of view.Relay lens 7 is positioned between the light-emitting window and substrate of beam split optical fiber 5, and the emergent light of beam split optical fiber 5 is through behind the relay lens 7, can be effectively on the mask face formation need the visual field of size.
The present invention provides second kind of embodiment simultaneously, discloses even light before getting into beam split optical fiber in this embodiment, can also use integrating rod, lenticule to add the technical scheme of uniformity compensating.Under normal conditions, the technical scheme that is provided among the embodiment one can reach conventional uniformity requirement.If after mercury lamp or cold mirror adjusting; The illumination uniformity that gets into beam split optical fiber inlet still can not reach requirement; Available uniformity compensating is blocking the illumination light intensity on the stronger path of integration on the direction of scanning, makes integration light intensity homogeneity after getting into beam split optical fiber reach requirement.
As shown in Figure 5, in order to prevent on substrate, still to can not get uniform illumination field of view, on the non-direction of scanning that quartz pushrod goes out to hold, place one and tease and ridicule joint catch array 8 through behind the even light of quartz pushrod.The concrete set-up mode of adjusting catch array 8 as shown in Figure 6; If quartz pushrod is long 33mm in non-direction of scanning; The size of regulating catch can be designed to 2mm, can arrange in non-direction of scanning that like this 17 are regulated catch, can be divided into 17 parts to integral uniformity and regulate.Regulate washer B1, B2, B3 ... The control band that Bi is corresponding is K1, K2, K3 ... Ki, when making public in the direction of scanning, the homogeneity of illumination field of view by integral uniformity ∑ I1, ∑ I2, ∑ I3 ... ∑ Ii decision.If control band Km light intensity is bigger, can block a part of control band Km regulating catch Bm, make integration light intensity ∑ Im reduce.In this enforcement, the ultraviolet light that mercury lamp light source 1 is sent passes through ellipsoidal reflector 2 optically focused successively, and microlens array 3, quartz pushrod 4 and adjusting washer array 8 backs are by evenly modulation.Ultraviolet light after evenly modulating gets into beam split optical fiber 5 and is divided into 2 the tunnel at least.Relay lens 7 the light-emitting window place place a detector (not shown) in order to obtain substrate illumination uniformity signal, this signal transfers to feedback controller 6, and according to this Signal Regulation mercury lamp and the position and/or the angle of regulating catch array 8.
The 3rd embodiment spares light at the diverse location of illuminator to the cell illumination visual field according to embodiment one and embodiment two.Between light source and beam split optical fiber, between beam split optical fiber and single illuminator, all each cell illumination splicing view field is spared light.Between light source and beam split optical fiber, spare light, guarantee that the illumination light intensity just had homogeneity preferably before getting into quartz pushrod with integrating rod or microlens array.Between beam split optical fiber and single illuminator, spare light with uniformity compensating; Just in the even light light path of single illumination splicing system; Such as integrating rod outlet or lenticule exit at single illumination splicing system; Spare light with uniformity compensating, guarantee that light intensity has the better illumination homogeneity before after beam split, shining mask plate.
As shown in Figure 6; This uniformity compensating comprises along the direction of light transmission successively: mercury lamp light source 1, ellipsoidal reflector 2, washer array 803 and relay lens 7 are regulated in the even unit of microlens array 3, quartz pushrod 4, beam split optical fiber 5, cell illumination visual field 9, cell illumination visual field.Feedback controller 6 is accepted substrate illumination uniformity signal, according to the position of this Signal Regulation mercury lamp, thereby on substrate, obtains even illumination field of view.Relay lens 7 is positioned over the control band place that washer array 803 is regulated in the cell illumination visual field, can be effectively on the mask face formation need the visual field of size.Embodiment three all regulates integral uniformity with the property compensation system in usefulness after the beam split in the light path of each cell illumination visual field.This method can better guarantee the integral uniformity of each visual field, unit.
The 4th embodiment spares light at the diverse location of illuminator to the cell illumination visual field according to embodiment one and two.Between beam split optical fiber and single illuminator, light is spared in each lighting unit visual field.In the even light light path of cell illumination visual field, such as in the integrating rod outlet or the lenticule exit of single illumination splicing system, spare light with uniformity compensating, guarantee that light intensity has the better illumination homogeneity before after beam split, shining mask plate.The shortcoming that the 4th embodiment increases for the cost that overcomes enforcement three; Microlens array 3 and quartz pushrod 4 in this embodiment, have been omitted; Only use in the illuminator of the road of each after beam split all and regulate integral uniformity, before beam split, no longer spare light with quartz pushrod or microlens array with the property compensation system.This method can reduce the size of illuminator, reduces system cost.
Accompanying drawing 9 is structural representations of relay lens involved in the present invention.Wherein schematically provided the structure of a relay lens among this figure, but in actual application, can be according to select different types of relay lens without the application scenario.As shown in Figure 9 being somebody's turn to do, this relay lens has 8 eyeglass formula structures, and the group lens are organized lens with the back before wherein being divided into.Along the direction of light transmission, be preceding group of lens 901, diaphragm 902 and back group lens 903 successively.
Compared with prior art; Device provided by the present invention can make the illumination field of view of big visual field scanning splicing have better illumination uniformity; Can debug etc. under the situation that illumination uniformity that factor makes each cell illumination visual field descends at light source stability, plated film unevenness, optics through simple and effective regulative mode, can also on mask plate, obtain higher illumination uniformity.
Described in this instructions is preferred embodiment of the present invention, and above embodiment is only in order to explain technical scheme of the present invention but not limitation of the present invention.All those skilled in the art all should be within scope of the present invention under this invention's idea through the available technical scheme of logical analysis, reasoning, or a limited experiment.
Claims (12)
1. one kind is used for the uniformity compensating that big field stitching throws light on; Direction along light ray propagation; Comprise successively: the beam-splitting structure that light source, light-emitting window are at least two-way reaches and the consistent relay lens of said beam-splitting structure light-emitting window number; It is characterized in that: said uniformity compensating also comprises even light optical element, and feedback controller; The light that said light source sends obtains even illumination field of view on substrate behind even light optical element, beam-splitting structure and relay lens; Said feedback controller is according to the position and/or the angle of substrate homogeneity Signal Regulation mercury lamp.
2. the uniformity compensating that is used for big field stitching illumination as claimed in claim 1 is characterized in that said even light optical element comprises microlens array and quartz pushrod, and said microlens array and quartz pushrod are successively between said light source and beam-splitting structure.
3. the uniformity compensating that is used for big field stitching illumination as claimed in claim 2 is characterized in that, said uniformity compensating also comprises regulates the washer array.
4. the uniformity compensating that is used for big field stitching illumination as claimed in claim 3 is characterized in that said adjusting washer array is between said quartz pushrod and said beam-splitting structure.
5. the uniformity compensating that is used for big field stitching illumination as claimed in claim 3 is characterized in that said feedback controller is according to the position and/or the angle of the said adjusting washer of substrate homogeneity Signal Regulation array.
6. the uniformity compensating that is used for big field stitching illumination as claimed in claim 3; It is characterized in that; Said uniformity compensating also comprises and the consistent even unit of said beam-splitting structure light-emitting window number; Said even unit is positioned at the light-emitting window of said beam-splitting structure, and the light-emitting window of said even unit is provided with said adjusting washer array.
7. the uniformity compensating that is used for big field stitching illumination as claimed in claim 1; It is characterized in that; Said even light optical element is even unit and adjusting washer array, and said even unit is consistent with said beam-splitting structure light-emitting window number respectively with the number of regulating the washer array.
8. the uniformity compensating that is used for big field stitching illumination as claimed in claim 1 is characterized in that said uniformity compensating also comprises ellipsoidal reflector, and said light source is placed on the interior along of said ellipsoidal reflector.
9. the uniformity compensating that is used for big field stitching illumination as claimed in claim 1 is characterized in that said relay lens comprises 8 lens.
10. the uniformity compensating that is used for big field stitching illumination as claimed in claim 1 is characterized in that, group lens, diaphragm and back group lens before said relay lens comprises.
11. the uniformity compensating that is used for big field stitching illumination as claimed in claim 1 is characterized in that said beam-splitting structure is a beam split optical fiber.
12. the uniformity compensating that is used for big field stitching illumination as claimed in claim 11; It is characterized in that; Said beam split optical fiber is made up of some fibre cores; The light inlet bore of said beam split optical fiber is 20mm, and the bright dipping bore of said beam split optical fiber is 5-10mm, and said every core diameter is 0.02-0.07mm.
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Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN106933040A (en) * | 2015-12-30 | 2017-07-07 | 上海微电子装备有限公司 | Litho machine splices illuminator and its method of adjustment |
| CN110811500A (en) * | 2019-12-19 | 2020-02-21 | 中国科学院长春光学精密机械与物理研究所 | Inclined-emission annular light-homogenizing optical fiber lighting system for endoscope |
| WO2020143077A1 (en) * | 2019-01-07 | 2020-07-16 | 中国科学院光电技术研究所 | Light intensity distribution modeling method and apparatus, and electronic device and storage medium |
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| US5455144A (en) * | 1990-03-20 | 1995-10-03 | Hitachi, Ltd. | Process for fabricating semiconductor integrated circuit device, and exposing system and mask inspecting method to be used in the process |
| US6480262B1 (en) * | 1993-06-30 | 2002-11-12 | Nikon Corporation | Illumination optical apparatus for illuminating a mask, method of manufacturing and using same, and field stop used therein |
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| Publication number | Priority date | Publication date | Assignee | Title |
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| CN106933040A (en) * | 2015-12-30 | 2017-07-07 | 上海微电子装备有限公司 | Litho machine splices illuminator and its method of adjustment |
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| WO2020143077A1 (en) * | 2019-01-07 | 2020-07-16 | 中国科学院光电技术研究所 | Light intensity distribution modeling method and apparatus, and electronic device and storage medium |
| CN110811500A (en) * | 2019-12-19 | 2020-02-21 | 中国科学院长春光学精密机械与物理研究所 | Inclined-emission annular light-homogenizing optical fiber lighting system for endoscope |
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Address after: 201203 1525 Zhang Dong Road, Zhangjiang hi tech park, Pudong District, Shanghai Patentee after: Shanghai microelectronics equipment (Group) Limited by Share Ltd Address before: 201203 1525 Zhang Dong Road, Zhangjiang hi tech park, Pudong District, Shanghai Patentee before: Shanghai Micro Electronics Equipment Co., Ltd. |