CN102534529A - Magnetron sputtering source and magnetron sputtering equipment - Google Patents
Magnetron sputtering source and magnetron sputtering equipment Download PDFInfo
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- CN102534529A CN102534529A CN2010106218543A CN201010621854A CN102534529A CN 102534529 A CN102534529 A CN 102534529A CN 2010106218543 A CN2010106218543 A CN 2010106218543A CN 201010621854 A CN201010621854 A CN 201010621854A CN 102534529 A CN102534529 A CN 102534529A
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Abstract
The invention provides a magnetron sputtering source and magnetron sputtering equipment. The magnetron sputtering source comprises a magnetron and a driving device which are connected, wherein the driving device is used for driving the magnetron to scan the whole target area in a spiral line track, so that when the magnetron sputtering source is applied to a magnetron sputtering process, areas of a target can be effectively sputtered, and a problem that some areas on the target cannot be fully utilized is avoided; and moreover, the retention period of the magnetron in the center and on the edge of the target is effectively adjusted by adjusting the running speed of the driving device, so that the consumption rates of the areas of the target tend to be consistent; and therefore, the utilization rate of the target is effectively improved. The magnetron sputtering equipment also can effectively improve the utilization rate of the target.
Description
Technical field
The present invention relates to the microelectronic processing technique field, particularly, relate to a kind of controlled sputtering source and use the magnetron sputtering equipment of this controlled sputtering source.
Background technology
In the microelectronic product industry, magnetron sputtering technique receives the great attention of lots of manufacturers as one of important means of producing products such as unicircuit, liquid-crystal display, thin-film solar cells and LED.
See also Fig. 1, be a kind of structure principle chart of typical magnetron sputtering equipment.This equipment mainly comprises: processing chamber 1, the electrostatic chuck 3 that is arranged at processing chamber 1 inner lower position, the target 2 that is arranged at processing chamber 1 top and magnetron 4 and driven by magnetron motor 5.In addition, on the lower end of processing chamber 1 or sidewall, also be connected with air extractor 13.Its technological process is following: at first; In processing chamber 1, feed be used to form plasma body process gas (for example; Argon gas etc.), under the electric field in chamber and the acting in conjunction in magnetic field, the surface of the part ion bombardment target 2 in the plasma body; The part of atoms on target 2 surfaces is come off, and deposit to substrate surface to be processed to form required rete.
In each assembly of aforesaid device, the project organization of target and magnetron has important effect for the result of sputtering technology.Especially, to some are dark/wide when filling than (ratio of the finger-hole crack degree of depth and width) higher hole and groove, require the higher metal ionization level of maintenance in the target as sputter process.For obtaining higher ionization level, one of method commonly used is the active area that reduces magnetron, thereby on the unit surface of target, obtains higher power density.Simultaneously, for each zone of guaranteeing target material surface all by sputter, need drive magnetron by a kind of driving mechanism and in the target zone, carry out high-speed mobile scanning, to realize each regional sputter of target, to improve the utilization ratio of target.
See also Fig. 2, be the structural representation of a kind of driven by magnetron mechanism.This mechanism's working process is following: motor drives transmission rod 74 through transmission shaft 70 and is rotated motion; Moving gear 76 on the transmission rod 74 is made circumferential motion with transmission rod 74 around hub 72; Fixed gear 62 is not with transmission shaft 70 rotations, and under the engagement of this fixed gear 62, rotation takes place moving gear 76; Gear 78 is with moving gear 76 engagements and carry out rotation, and drives magnetron 84 through union lever 80 and rotate synchronously with counterweight 86 and gear 78; Thereby driven magnetic keyholed back plate 84 scans target with certain movement locus in the target scope.In addition, the other end of transmission rod 74 also is connected with second counterweight 88, is used for moment, the increase stability of rotation at center of equilibrium axle 72 two ends.
See also Fig. 3, be the running orbit synoptic diagram of magnetron in the driving mechanism shown in Figure 2.As shown in the figure; Not only the track scope under the drive of above-mentioned driving mechanism, moved of magnetron can't cover whole target zone; And both made the density of the track while scan of magnetron in magnetron track institute region covered also inhomogeneous; Be embodied in, closeer near the track of target center, then less near the track density at target edge.For these reasons; Certainly will will cause the difference of wear rate of target, when wear rate after the target zone is used up faster, whole target promptly will cancel; And the zone that is not consumed on the target and is not used up can't be continued to use, thereby causes the serious waste of target.Because the target price is very expensive, will cause huge cost burden to enterprise if can not reach higher target utilization.
For addressing the above problem, the mode that the technician takes to adjust motor speed is in the hope of obtaining uniform target wear rate.Specific practice is that the rotating speed of motor that when magnetron operates in the target fringe region, then slows down is to prolong magnetron in this regional residence time; The time then accelerate rotating speed of motor when magnetron operates in the target center zone, shortening magnetron, thereby the wear rate of target center and fringe region is reached unanimity in this regional residence time.But because the magnetron in the above-mentioned driving mechanism scans target to be similar to planetary movement locus, this magnetron carries out constantly back and forth shuttle between target edge and central zone.Therefore; Want to realize the method for above-mentioned electric machine speed regulation, motor will be moved under the frequency of high acceleration, not only have a strong impact on the work-ing life of motor; And since too complicated to the control process of motor, cause the effect of practical application unsatisfactory.
Therefore, need a kind of running orbit of magnetron that can make at present badly and rationally cover whole target plane, can effectively improve the technical scheme of target utilization again.
Summary of the invention
For addressing the above problem, the present invention provides a kind of controlled sputtering source, and it can effectively improve target utilization.
For addressing the above problem, the present invention also provides a kind of magnetron sputtering equipment, and it can effectively improve target utilization equally.
For this reason, the present invention provides a kind of controlled sputtering source, comprises magnetron and drive unit, and said magnetron is connected with said drive unit, and said drive unit is used to drive said magnetron and with spiral yarn shaped track whole target zone is scanned.
Wherein, drive unit comprises hub, portion and radial motion portion rotate in a circumferential direction; Wherein, radial motion portion be used to drive magnetron along hub radially carry out straight reciprocating motion, and the portion of rotating in a circumferential direction is used to drive radially, and rotating part and magnetron are rotated motion around hub; Magnetron is used under the acting in conjunction of portion of rotating in a circumferential direction and radial motion portion, moving with spiral yarn shaped track.
Wherein, rotating in a circumferential direction is provided with the driving section between portion and the radial motion portion, and the driving section is used for the transmission that rotatablely moves of the portion of rotating in a circumferential direction is the radial motion of radial motion portion; And the radial motion of radial motion portion rotatablely moves synchronously with the portion that rotates in a circumferential direction.
Wherein, the portion of rotating in a circumferential direction comprises wheel casing, and wheel casing is around the hub motion that rotates in a circumferential direction; Radial motion portion comprises radially tooth bar, and radially tooth bar carries out the radial translational motion with respect to the portion of rotating in a circumferential direction; The driving section comprises that at least one is arranged at the transmitting gear in the wheel casing, and transmitting gear carries out rotation when rotating in a circumferential direction with wheel casing, and radially tooth bar and transmitting gear are nibbled and carried out the radial translational motion under the driving action that is incorporated in transmitting gear.
Wherein, the driving section also comprises turbine and worm screw, wherein, and scroll bar and spigot shaft coaxle and do not rotate in a circumferential direction with wheel casing; Worm gear rotates in a circumferential direction with wheel casing synchronously, and is meshed with worm screw and rotation takes place; Transmitting gear receives the driving of turbine and rotation takes place, and tooth bar carries out the radial translational motion so that said transmitting gear drives radially.
Wherein, the driving section also comprises at least one pair of twisted spur gear, and wherein, one in a pair of twisted spur gear for to decide twisted spur gear, and with spigot shaft coaxle and do not rotate in a circumferential direction with said wheel casing; Another one in a pair of twisted spur gear rotates in a circumferential direction with wheel casing for moving twisted spur gear, moving twisted spur gear synchronously, and with deciding twisted spur gear to be meshed rotation takes place; Transmitting gear receives moving helical gear driving and rotation takes place, and tooth bar carries out the radial translational motion so that said transmitting gear drives radially.
Wherein, the driving section also comprises a fixed gear, wherein, and fixed gear and spigot shaft coaxle and do not rotate in a circumferential direction with said wheel casing; When transmitting gear rotates in a circumferential direction with wheel casing synchronously and fixed gear be meshed and rotation take place tooth bar carries out the radial translational motion so that said transmitting gear drives radially.
Wherein, drive unit also comprises rotating power source, is used for driving the portion that rotates in a circumferential direction and rotates around hub.
Wherein, controlled sputtering source also comprises control unit, when being used for arriving its rectilinear path terminal in radial motion portion, and the reverse rotation of controls revolution propulsion source.
Wherein, drive unit also comprises the elasticity maintaining part; When control unit is used for arriving its rectilinear path terminal in radial motion portion, reverse rotation again after the controls revolution propulsion source continues to rotate to an angle according to original sense of rotation; The elasticity maintaining part is used for making the end of radial motion portion and transmitting gear keep Elastic Contact in the process of rotating power source according to original sense of rotation continuation rotation.
Wherein, elastic joint part comprises spring and the spring stop part that is arranged at wheel casing the same side, and spring is between wheel casing and spring stop part.
Wherein, drive unit also comprises and is arranged at rotating power source and the drive shaft between the portion of rotating in a circumferential direction, drive shaft and spigot shaft coaxle and can rotate to drive the rotation of the said portion of rotating in a circumferential direction with respect to hub.
In addition, the present invention also provides a kind of magnetron sputtering equipment, comprises processing chamber and target, above target, is provided with the controlled sputtering source that the invention described above provides, and is used at magnetron sputtering technique target material surface being carried out uniform magnetic field scanning.
The present invention has following beneficial effect:
Controlled sputtering source provided by the invention comprises magnetron and drive unit, and above-mentioned magnetron can scan whole target zone with spiral yarn shaped track under the driving of drive unit.Therefore, the running orbit of above-mentioned magnetron can effectively cover the All Ranges of target plane, thereby avoids can't being covered the low problem of target utilization that causes by the magnetron track because of the target subregion.And; In the process that magnetron scans target plane; Can be according to target each regional wear rate in the radial direction, and the travelling speed of drive unit when regulating magnetron and moving to this zone, thus magnetron regulated in target each regional residence time in the radial direction; And then the wear rate of respective regions on the adjusting target, so that each regional wear rate reaches unanimity, improves the utilization ratio of target on the target.And; Controlled sputtering source provided by the invention makes magnetron scan target with spiral yarn shaped track; In scanning process to whole target; Only need when magnetron moves to the junction of target edge and central zone, once to regulate operation and get final product motor speed, thus can be to not causing disadvantageous effect the work-ing life of the rotating power source of motor etc.; Therefore, controlled sputtering source provided by the invention can effectively be avoided the influence to electrical machinery life when effectively regulating the sputter rate of motor speed with effective adjusting target center and fringe region.
Magnetron sputtering equipment provided by the invention comprises processing chamber and target, and the controlled sputtering source that application the invention described above provides carries out magnetic field scanning to target.Therefore, magnetron sputtering equipment provided by the invention can make equally that each regional wear rate reaches unanimity on the target, thereby effectively improves the utilization ratio of target.
Description of drawings
Fig. 1 is a kind of structure principle chart of typical magnetron sputtering equipment;
Fig. 2 is the structural representation of a kind of driven by magnetron mechanism;
Fig. 3 is the running orbit synoptic diagram of magnetron in the driving mechanism shown in Figure 2;
Fig. 4 is the running orbit synoptic diagram of magnetron in the controlled sputtering source provided by the invention;
Fig. 5 is the structural representation of first kind of specific embodiment of controlled sputtering source provided by the invention;
Fig. 6 is in the structural representation of different operating state for controlled sputtering source shown in Figure 5;
Fig. 7 is the running orbit synoptic diagram of the magnetron of controlled sputtering source shown in Figure 5;
Fig. 8 is the structural representation of second kind of specific embodiment of controlled sputtering source provided by the invention; And
Fig. 9 is the structural representation of the third specific embodiment of controlled sputtering source provided by the invention.
Embodiment
For making those skilled in the art understand technical scheme of the present invention better, controlled sputtering source provided by the invention and the magnetron sputtering equipment of using this controlled sputtering source are described in detail below in conjunction with accompanying drawing.
Controlled sputtering source provided by the invention comprises magnetron and is used for the drive unit of driven magnetic keyholed back plate.Wherein, magnetron can scan whole target zone with spiral yarn shaped track under the driving of drive unit.
Concrete, can above-mentioned drive unit be set to comprise hub, the structure of rotate in a circumferential direction portion and radial motion portion; Drive magnetron by above-mentioned radial motion portion and radially carry out straight reciprocating motion along hub; And drive simultaneously radially by the above-mentioned portion of rotating in a circumferential direction that rotating part and magnetron are rotated motion around hub, thereby under the acting in conjunction of portion of rotating in a circumferential direction and radial motion portion, make magnetron have spiral yarn shaped running orbit.
See also Fig. 4, be the synoptic diagram of the magnetron running orbit of controlled sputtering source provided by the invention.Can know by figure shown in the figure, use controlled sputtering source provided by the invention and can make magnetron be scanned up to the target center position gradually by the target edge, perhaps, be scanned up to the marginal position of target gradually by target center along certain spiral yarn shaped track; And be not that magnetron track in the background technology as shown in Figure 3 is such; The scanning of shuttling back and forth in target margin and center zone; Therefore; Use controlled sputtering source provided by the invention and can move to the target center zone at magnetron and the time accelerate its travelling speed, shortening the residence time of magnetron, thereby correspondingly reduce the wear rate in target center zone in the target center zone; And its travelling speed that when magnetron moves to the target fringe region, slows down, prolonging magnetron, thereby correspondingly improve the wear rate of target fringe region in the residence time of target fringe region; Wear rate zone through making target margin and center zone after the above-mentioned adjusting is consistent, thereby when avoiding that a certain zone has been used up on the target and the problem that other zone is not fully utilized, to improve the utilization ratio of target.And, because controlled sputtering source provided by the invention makes magnetron scan target with spiral yarn shaped track; Therefore, accomplish once scanning, only need when magnetron moves to the junction of target edge and central zone, once to regulate operation and get final product motor speed to whole target; And the magnetron running orbit in the background technology is planetary track, accomplish once the scanning to whole target, needs continuously several times even tens times motor speed is carried out conversion; This shows that controlled sputtering source provided by the invention can effectively be avoided the influence to electrical machinery life when effectively regulating the sputter rate of motor speed with effective adjusting target center and fringe region.
In practical application, usually can between portion and the radial motion portion driving section be set above-mentioned rotating in a circumferential direction, be the radial motion of radial motion portion by will the rotate in a circumferential direction transmission that rotatablely moves of portion of this driving section; Simultaneously, make the radial motion of radial motion portion and rotatablely moving synchronously of the portion that rotates in a circumferential direction, that is to say that the two is a continuous action relation, have only when the portion of rotating in a circumferential direction is rotated, just can drive radial motion portion and carry out the radial translational motion with it synchronously.The advantage that is provided with like this is, only need can realize the synchronized drive to the portion of rotating in a circumferential direction and radial motion portion for the portion of rotating in a circumferential direction is provided with a rotating power source, thus effective simplified apparatus mechanism, and the manufacturing cost of saving equipment.Certainly, the technician also can be provided with propulsion source respectively for the portion of rotating in a circumferential direction and radial motion portion, thereby can carry out independent control to the running status of portion of rotating in a circumferential direction and radial motion portion, to obtain more flexile magnetron running orbit.But,, preferably, above-mentioned portion and the radial motion portion of rotating in a circumferential direction is synchronized with the movement, and the technical scheme described in following each embodiment is the scheme that is synchronized with the movement in order to obtain good repeatability.
Please consult Fig. 5 and Fig. 6 in the lump, wherein, Fig. 5 is the structural representation of first specific embodiment of controlled sputtering source provided by the invention; Fig. 6 is in the structural representation of different operating state for controlled sputtering source shown in Figure 5.
In the present embodiment, the portion of rotating in a circumferential direction of drive unit comprises wheel casing 17, the drive shaft 23 that is fixedly connected with wheel casing 17; This drive shaft 23 is a hollow structure, and it is sleeved on the outside of hub 22 and around hub 22 motion that rotates in a circumferential direction, thereby drive said gear case 17 carries out circumferential rotatablely moving together.In the practical application, can this drive shaft 23 be connected to a rotating power source such as phonomoter etc. (figure does not show), to realize driving to the portion of rotating in a circumferential direction by this rotating power source.
The radial motion portion of drive unit comprises radially tooth bar 29, this radially tooth bar 29 be connected with magnetron 100 through the union lever 31 that runs through wheel casing 17, and drive magnetron 100 and radially carry out straight reciprocating motion along hub 22.
Driving section in the present embodiment comprises a pair of turbine 18 and scroll bar 20, driving gear 25 and transmitting gear 27.Particularly, worm screw 20 and hub 22 coaxial settings and through with fix such as the structure of fixed support etc. and can not rotate in a circumferential direction with wheel casing 17, turbine 18 is arranged at and carries out synchronous rotating in a circumferential direction in the wheel casing and with wheel casing 17; Turbine 18 receives the engagement of worm screw 20 and rotation takes place when rotating in a circumferential direction; Because driving gear 25 and worm gear 18 are coaxial and the relative position of the two is fixed; Thereby above-mentioned driving gear 25 can carry out rotation with worm gear 18; And then drive above-mentioned transmitting gear 27 and be rotated, finally through this transmitting gear 27 and the meshing relation between the tooth bar 29 radially rotating in a circumferential direction of wheel casing 17 being moved converts the radially translational motion of tooth bar 29 into; Being positioned at radially, the magnetron 100 of tooth bar 29 ends receives the driven in common of the two and finally forms spiral yarn shaped running orbit.
When the transmitting gear 27 and the position of engagement of tooth bar 29 radially arrive rectilinear path terminal of tooth bar 29 radially; Then make rotating power source carry out reverse rotation; Carry out reverse rotation with the driving portion of rotating in a circumferential direction, driving radially through above-mentioned a series of drive connection simultaneously, tooth bar 29 carries out reverse translational motion.When Fig. 5 and Fig. 6 show transmitting gear 27 respectively and arrive the end positions of tooth bar 29 radially, the location diagram of tooth bar 29 and the magnetron 100 that is attached thereto radially.In practical application, for example can realize reverse control through a kind of control unit is set for drive unit to above-mentioned rotating power source, this control unit for example can adopt micro-chip, PC etc. to have the device of function and realize.In some preferred implementations, the proofing unit of transmitter etc. can also be set, at above-mentioned two ends of carrying out tooth bar 29 so that the transmitting gear 27 and the relative position of tooth bar 29 are radially accurately detected.
In addition, in order to obtain more target as sputter result uniformly, can make the spiral trajectory of the magnetron 100 each runs certain angle that staggers each other, thereby make the magnetron running orbit after the repeatedly scanning can cover whole target zone fully.Specific practice does; Drive when transmitting gear 27 the radially tooth bar 29 that is engaged with to the motion of wheel casing 17 lateral direction after being separated away from the end of magnetron 100 on transmitting gear 27 and the tooth bar 29 radially; Reverse rotation again after the rotating power source continuation is rotated to an angle according to original sense of rotation, some angles thereby magnetron track after making oppositely and previous track stagger each other.What need only explanation is; The above-mentioned angle that staggers each other between the magnetron running orbit of making can be set according to actual needs such as the spacing of the size of actual magnetic keyholed back plate, running orbit and target size flexibly; In the present embodiment, can realize setting through speed of rotation and the time length after radially tooth bar 29 breaks away from transmitting gear 27 of setting rotating power source to above-mentioned angle.And in order to guarantee after the rotating power source reverse rotation, can to make transmitting gear 27 and tooth bar 29 radially effectively to mesh; Can an elasticity maintaining part be set for drive unit; Thereby after transmitting gear 27 arrives the end of tooth bar 29 radially and rotating power source continues in the process according to original sense of rotation rotation, make the end of radial motion portion keep Elastic Contact with transmitting gear 27 all the time by this elasticity maintaining part.In the present embodiment, above-mentioned elasticity maintaining part be specially be sleeved on the union lever 31 and at wheel casing 17 and the spring between the tooth bar 29 40 radially, this spring 40 is arranged at wheel casing 17 inside; Preferably, be provided with spring stop part 41 in the junction of driving rack 29 and union lever 31, spring 40 is limited between wheel casing 17 and this spring stop part 41.In practical application, can above-mentioned spring 40 be fixed on the sidewall of wheel casing 17, spring 40 is free to slide on the union lever 31 between wheel casing 17 and the spring stop part 41.Structure shown in Figure 5 is above-mentioned spring 40 and spring stop part 41 synoptic diagram when being in interacting state.
See also Fig. 7, be the running orbit synoptic diagram of the magnetron of controlled sputtering source shown in Figure 5.For the ease of observing, only show the spiral yarn shaped track of four certain angles that stagger each other among Fig. 7.As shown in the figure, certain angle that staggers between the adjacent magnetron running orbit, and form certain interval.Be understood that easily; When the number of times that the angle that running orbit staggered of each magnetron equates and magnetron scans target is abundant; Can the All Ranges of target evenly be covered; Thereby avoid some zone of target can't obtain the problem of effective sputter, to improve the utilization ratio of target.And; The running orbit of every magnetron is the spiral curve that successively is covered in target center to fringe region; Because the line segment of corresponding target edge of this spiral-line or central zone is continuous segments; Therefore; Speed through adjustment magnetron different positions in moving to this curve can effectively be regulated the residence time of magnetron at target center or fringe region, thereby each regional wear rate of adjustable target and then improves target utilization so that each regional wear rate of target reaches unanimity.And in some preferred embodiments, the hand of spiral of magnetron track and the spirals between adjacent track are adjusted in transmission that can also be through adjusting each transmitting gear when drive connection, thereby help obtaining target track while scan more uniformly.
In the embodiment shown in fig. 5; Since only when tooth bar 29 radially is meshed with transmitting gear 27 away from the end of magnetron (at this moment; Magnetron is positioned at the marginal position of target); Radially tooth bar 29 just can receive the elastic contribution of spring 40 and keep Elastic Contact with transmitting gear 27, so the drive unit among the embodiment shown in Figure 5 can only make magnetron 100 after moving to the target marginal position, just can carry out above-mentioned dislocation operation; And when being meshed with transmitting gear 27 near an end of magnetron on the tooth bar 29 radially (at this moment; Magnetron is positioned at the central position of target); Above-mentioned spring 40 can't play a role; And the reverse rotation immediately of rotating power source this moment, otherwise transmitting gear 27 and spring stop part 41 are bumped.Therefore, each bar magnetron running orbit shown in Figure 7 is magnetron by target boundary scan to target center and the reciprocating path that returned by former road by target center.And, in another embodiment provided by the invention, the elasticity maintaining part in the above-mentioned drive unit has been carried out some improvement in order to obtain magnetron running orbit more uniformly and effectively.
See also Fig. 8, be the structural representation of second specific embodiment of controlled sputtering source provided by the invention.In the present embodiment; Be respectively arranged with the first spring stop part 411 and the second spring stop part 412 at the two ends of union lever 31; It is inside and outside that this first spring stop part 411 and the second spring stop part 412 lay respectively at wheel casing 17,, is positioned at the both sides of same sidewall on the wheel casing 17 that is; And; Between the wheel casing 17 and the first spring stop part 411, be provided with first spring 401; Between the wheel casing 17 and the second spring stop part 412, be provided with second spring 402, correspondingly, above-mentioned first spring 401 and second spring 402 also lay respectively at the inside and outside of wheel casing 17; Above-mentioned first spring 401, second spring 402, the first spring stop part 411 and the second spring stop part, the 412 common elasticity maintaining parts that constitute in the present embodiments.Be specially; Above-mentioned first spring 401 and the first spring stop part 411 are used for when tooth bar 29 radially becomes the state that is separated with transmitting gear 27 away from an end of magnetron 100 by the state that is meshed with transmitting gear 27; Make the two keep Elastic Contact, thereby can misplace operation when making magnetron 100 arrive the target marginal positions; And second spring 402 and the second spring stop part 412 are used for when tooth bar 29 radially becomes the state that is separated with transmitting gear 27 near an end of magnetron 100 by the state that is meshed with transmitting gear 27; Make the two keep Elastic Contact, thereby can misplace operation when making magnetron 100 arrive the target center positions equally; In addition, the above-mentioned first spring stop part 411 and radially leave the certain intervals distance between the tooth bar 29 is used to avoid the transmitting gear 27 and the first spring stop part 411 to bump and damages.
In addition, present embodiment and above-mentioned Fig. 5 and first kind of specific embodiment difference shown in Figure 6 are that also the drive shaft 23 in the present embodiment is a solid construction, and this drive shaft 23 is fixedly connected with the bottom of wheel casing 17; And hub 22 is hollow structure with worm screw 20, and the two all is sleeved on the outside of drive shaft 23; Hub 22 runs through this wheel casing through the through hole on the wheel casing 17 58, and its upper end is fixedly connected with structure such as fixed support 16 grades and does not rotate synchronously with drive shaft 23, and the lower end of hub 22 is fixedly connected with worm screw 20.Be understood that easily type of drive that the drive mechanism of above-mentioned drive unit is realized and magnetron running orbit have identical or similar characteristics with above-mentioned Fig. 5 and first kind of embodiment shown in Figure 6, thereby repeat no more.
See also Fig. 9, be the structural representation of the 3rd specific embodiment of controlled sputtering source provided by the invention.In the present embodiment, turbine and worm transmission structure in the transmission mechanism in above-mentioned Fig. 5 and the first kind of specific embodiment shown in Figure 6 are replaced with a pair of helical gear structure.In the above-mentioned a pair of twisted spur gear one for deciding twisted spur gear 26, its coaxial with hub 22 and the two be fixedly connected; Wherein, hub 22 is fixedly connected with structure such as fixed support etc. equally; And drive shaft 23 structures in the present embodiment are identical or similar with above-mentioned first kind of specific embodiment.Another one in the above-mentioned twisted spur gear is moving twisted spur gear 16, and this moving twisted spur gear 16 carries out synchronous rotating in a circumferential direction with wheel casing 17, and with deciding twisted spur gear 26 to be meshed rotation takes place, and is rotated thereby drive with moving twisted spur gear 16 co-axial driving gears 25; This driving gear 25 and then drive transmitting gear 27 and be rotated, and drive finally radially that tooth bar 29 carries out the radial translational motion.In addition, in the present embodiment, adopted with embodiment shown in above-mentioned Fig. 8 in identical or similar elasticity maintaining part structure, thereby repeat no more.
Be understood that easily in the drive unit of controlled sputtering source provided by the invention, can also be set to a plurality of extremely gear-driven structures in the driving section, making one of them straight tooth gear is fixed gear, and makes this fixed gear and spigot shaft coaxle setting; Be meshed when other transmitting gear is rotated in a circumferential direction with wheel casing synchronously and with fixed gear and rotation takes place, and then drive radially that tooth bar carries out the radial translational motion.The drive unit of this structure can be realized the magnetron running orbit among above-mentioned each embodiment equally.
It is pointed out that in the drive unit of controlled sputtering source provided by the invention, be not limited to the transmission type and the gear quantity of the transmitting gear among above-mentioned each embodiment.For example; Can also in same drive unit, use turbine and worm drive and helical gear structure simultaneously; And can use a plurality of turbines and scroll bar or twisted spur gear simultaneously; And various deformation on this basis and improvement, and every distortion of having done based on spirit of the present invention and essence and improve and also all should be regarded as protection scope of the present invention.
In sum; Controlled sputtering source provided by the invention can make magnetron with the mode of many spiral-line running orbits whole target regional extent carried out covering comprehensively and uniformly; And can regulate magnetron in each regional residence time of target, thereby each regional wear rate of adjustment target through the rotating speed of adjusting this drive unit; Therefore, when using controlled sputtering source provided by the invention and carrying out magnetron sputtering technique, each zone of target all is used effectively, and each regional wear rate of target is reached unanimity, thereby effectively improve the homogeneity and the utilization ratio of target as sputter.And, in above-mentioned each embodiment of controlled sputtering source provided by the invention, drive when only using a rotating power source can realize portion of rotating in a circumferential direction and radial motion portion, thus to a certain extent can the simplified apparatus structure and practice thrift equipment cost.
As another kind of technical scheme; The present invention also provides a kind of magnetron sputtering equipment; It comprises processing chamber and target at least, above target, is provided with the controlled sputtering source that the invention described above provides, and is used at magnetron sputtering technique target material surface being carried out uniform magnetic field scanning.
Based on same reason; Magnetron sputtering equipment provided by the invention is when carrying out magnetron sputtering technique; Each zone of target all is used effectively, and each regional wear rate of target is reached unanimity, thereby effectively improve the homogeneity and the utilization ratio of target as sputter.
It is understandable that above embodiment only is the illustrative embodiments that adopts for principle of the present invention is described, yet the present invention is not limited thereto.For the one of ordinary skilled in the art, under the situation that does not break away from spirit of the present invention and essence, can make various modification and improvement, these modification also are regarded as protection scope of the present invention with improving.
Claims (13)
1. a controlled sputtering source is characterized in that, comprises magnetron and drive unit, and said magnetron is connected with said drive unit, and said drive unit is used to drive said magnetron and with spiral yarn shaped track whole target zone is scanned.
2. controlled sputtering source according to claim 1 is characterized in that, said drive unit comprises hub, portion and radial motion portion rotate in a circumferential direction; Wherein,
Said radial motion portion be used to drive said magnetron along said hub radially carry out straight reciprocating motion, and the said portion of rotating in a circumferential direction is used to drive said radially rotating part and said magnetron is rotated motion around said hub;
And said magnetron is used under the acting in conjunction of said rotate in a circumferential direction portion and radial motion portion, moving with spiral yarn shaped track.
3. controlled sputtering source according to claim 2; It is characterized in that; Said rotating in a circumferential direction is provided with the driving section between portion and the said radial motion portion, and said driving section is used for rotatablely moving of the said portion that rotates in a circumferential direction transmitted the radial motion for said radial motion portion; And the radial motion of said radial motion portion and the said portion that rotates in a circumferential direction rotatablely move synchronously.
4. controlled sputtering source according to claim 3 is characterized in that,
The said portion of rotating in a circumferential direction comprises wheel casing, and said wheel casing is around the motion that rotates in a circumferential direction of said hub;
Said radial motion portion comprises radially tooth bar, and said radially tooth bar carries out the radial translational motion with respect to the said portion of rotating in a circumferential direction;
Said driving section comprises that at least one is arranged at the transmitting gear in the said wheel casing; Said transmitting gear carries out rotation when rotating in a circumferential direction with said wheel casing, said radially tooth bar and said transmitting gear are nibbled and carried out the radial translational motion under the driving action that is incorporated in said transmitting gear.
5. controlled sputtering source according to claim 4 is characterized in that said driving section also comprises turbine and worm screw, wherein,
Said scroll bar and said spigot shaft coaxle and do not rotate in a circumferential direction with said wheel casing;
Said worm gear rotates in a circumferential direction with said wheel casing synchronously, and is meshed with said worm screw and rotation takes place;
Said transmitting gear receives the driving of said turbine and rotation takes place, and carries out the radial translational motion so that said transmitting gear drives said radially tooth bar.
6. controlled sputtering source according to claim 4 is characterized in that said driving section also comprises at least one pair of twisted spur gear, wherein,
One in the said a pair of twisted spur gear for to decide twisted spur gear, and with said spigot shaft coaxle and do not rotate in a circumferential direction with said wheel casing;
Another one in the said a pair of twisted spur gear is moving twisted spur gear, and said moving twisted spur gear rotates in a circumferential direction with said wheel casing synchronously, and decides twisted spur gear and be meshed and rotation takes place with said;
Said transmitting gear receives said moving helical gear driving and rotation takes place, and carries out the radial translational motion so that said transmitting gear drives said radially tooth bar.
7. controlled sputtering source according to claim 4 is characterized in that, said driving section also comprises a fixed gear, wherein,
Said fixed gear and said spigot shaft coaxle and do not rotate in a circumferential direction with said wheel casing;
When said transmitting gear rotates in a circumferential direction with said wheel casing synchronously and said fixed gear be meshed and rotation take place carry out the radial translational motion so that said transmitting gear drives said radially tooth bar.
8. according to any described controlled sputtering source in the claim 2 to 7, it is characterized in that said drive unit also comprises rotating power source, be used to drive the said portion that rotates in a circumferential direction and rotate around said hub.
9. controlled sputtering source according to claim 8 is characterized in that said controlled sputtering source also comprises control unit, when being used for arriving its rectilinear path terminal in said radial motion portion, controls said rotating power source reverse rotation.
10. controlled sputtering source according to claim 9 is characterized in that said drive unit also comprises the elasticity maintaining part;
When said control unit is used for arriving its rectilinear path terminal in said radial motion portion, reverse rotation again after controlling said rotating power source and continuing to rotate to an angle according to original sense of rotation;
Said elasticity maintaining part is used for continuing the process of rotation in said rotating power source according to original sense of rotation, makes the end and said transmitting gear maintenance Elastic Contact of said radial motion portion.
11. controlled sputtering source according to claim 10 is characterized in that, said elastic joint part comprises spring and the spring stop part that is arranged at said wheel casing the same side, and said spring is between said wheel casing and said spring stop part.
12. controlled sputtering source according to claim 8; It is characterized in that; Said drive unit also comprises and is arranged at said rotating power source and the said drive shaft that rotates in a circumferential direction between the portion, said drive shaft and said spigot shaft coaxle and can rotate to drive the rotation of the said portion of rotating in a circumferential direction with respect to said hub.
13. a magnetron sputtering equipment comprises processing chamber and target, it is characterized in that, above said target, is provided with any described controlled sputtering source among the claim 1-12, is used at magnetron sputtering technique target material surface being carried out uniform magnetic field scanning.
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| CN201010621854.3A CN102534529B (en) | 2010-12-24 | 2010-12-24 | Magnetron sputtering source and magnetron sputtering equipment |
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| CN102888590A (en) * | 2012-10-23 | 2013-01-23 | 东莞宏威数码机械有限公司 | Scanning type magnetron sputtering cathode and scanning type magnetron sputtering device |
| CN104046980A (en) * | 2013-03-14 | 2014-09-17 | 三星显示有限公司 | Vacuum powered deposition apparatus |
| CN104120390A (en) * | 2013-04-24 | 2014-10-29 | 北京北方微电子基地设备工艺研究中心有限责任公司 | Driving mechanism used for driving magnetron, and magnetron sputtering processing apparatus |
| CN104746027A (en) * | 2013-12-29 | 2015-07-01 | 北京北方微电子基地设备工艺研究中心有限责任公司 | Magnetron component and magnetron sputtering device |
| CN106086783A (en) * | 2016-06-30 | 2016-11-09 | 京东方科技集团股份有限公司 | A kind of radical occlusion device and occlusion method thereof and deposition system |
| CN108651015A (en) * | 2018-04-23 | 2018-10-16 | 中山市精镀机电设备有限公司 | A kind of thresing machine |
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| CN110643962A (en) * | 2019-09-20 | 2020-01-03 | 深圳市晶相技术有限公司 | Semiconductor device |
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| CN109887879A (en) * | 2017-12-06 | 2019-06-14 | 北京北方华创微电子装备有限公司 | A kind of method and semiconductor processing equipment covering film in hole |
| CN109887879B (en) * | 2017-12-06 | 2021-12-17 | 北京北方华创微电子装备有限公司 | Method for covering film in hole and semiconductor processing equipment |
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Address after: 100176 Beijing economic and Technological Development Zone, Wenchang Road, No. 8, No. Patentee after: Beijing North China microelectronics equipment Co Ltd Address before: 100015, M5 building, No. 1 Jiuxianqiao East Road, Beijing, Chaoyang District, two South Patentee before: Beifang Microelectronic Base Equipment Proces Research Center Co., Ltd., Beijing |