CN102411099A - Measuring equipment for electrical property of substrate - Google Patents

Measuring equipment for electrical property of substrate Download PDF

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Publication number
CN102411099A
CN102411099A CN2010102924947A CN201010292494A CN102411099A CN 102411099 A CN102411099 A CN 102411099A CN 2010102924947 A CN2010102924947 A CN 2010102924947A CN 201010292494 A CN201010292494 A CN 201010292494A CN 102411099 A CN102411099 A CN 102411099A
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China
Prior art keywords
substrate
electro
optic modulation
measured
modulation arrangement
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CN2010102924947A
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Chinese (zh)
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邹永桐
刘定坤
王浩伟
詹智翔
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Industrial Technology Research Institute ITRI
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Industrial Technology Research Institute ITRI
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Priority to CN2010102924947A priority Critical patent/CN102411099A/en
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Abstract

The invention discloses measuring equipment for an electrical property of a substrate. The measuring equipment comprises: a first electro-optic modulation device, which is arranged at a periphery of a first detection roller; a to-be-measured substrate, which is transmitted between a plurality of transmission rollers and is contact with the first electro-optic modulation device; a voltage supply device, which is used for providing a voltage difference between the electro-optic modulation device and the to-be-measured substrate; and a first image capturing system, which is used for receiving a first detection light reflected by a first surface of the to-be-measured substrate.

Description

The measuring equipment that substrate is electrical
Technical field
The present invention relates to the electrical measuring equipment of substrate.
Background technology
Mostly the electrical detection equipment of conventional substrate is to utilize probe contact measured substrate and bestows voltage, checks the electrical situation of substrate to be measured, for example: short circuit, open circuit ... etc.The probe testing apparatus of semiconductor grain manufacture craft and pcb board manufacture craft probe in detecting equipment are general common contact type probe electrical detection equipment.Yet, along with the live width of manufacture craft is dwindled day by day,, certainly will receive the detection limit of probe physical size, and the cost of probe is also quite expensive if will use the mode of conventional probe card to do detection.
On the other hand; Along with the area of substrate manufacture is bigger, also faster to the rate request that detects, especially; Demand to complete detection can get more and more, for example: the detection of the array of display panel (array) manufacture craft end, thin-film solar cells, contact panel and flexible display.Utilize the mode of probe contact to measure the demand that electrical sampling observation mode does not more and more meet actual detected.
As stated, conventional probe contact measured substrate is measured electrical method, and not only required Measuring Time is tediously long; And evolution along with advanced manufacture craft technology; Under the situation that live width is done littler and littler, the size of probe measurement also is restricted, and the manufacturing cost of probe is also quite expensive.U.S. Pat 5,097,201 with US 5; 170,127 disclose the method for contactless electrical measurement, through electrooptic modulator; For example high polymer dispersed liquid crystal material (Polymer Dispersed Liquid Crystal is called for short PDLC) liquid crystal board or optical crystal (like KDP, KD*P or ADP... etc.) makes to keep a particular distance (approximately 10um) between substrate to be measured and the electrooptic modulator; Bestow adding generating positive and negative voltage respectively, make it produce capacity effect, cause induction field; And through this induction field driving electrooptic modulator, and by the induced voltage image on the CCD record electrooptic modulator, through the GTG Strength Changes of voltage image; But the thickness or the residual quantity of the conductive layer after the check pattern manufacture craft (for example ITO); Whether that the conductive materials etching is complete to inspect the background manufacture craft, or surface blemish is to the electrical influence of conductive pattern medium, but use the measuring method of electrooptic modulator to be subject to survey area.
Measure the problem with detection efficiency in order to solve above-mentioned large tracts of land, the background technology for example detection method that disclosed of U.S. Pat 5,504,438 is utilized many CCD photographies, re-uses follow-up image and engages, to increase area of detection and lifting detection efficiency.But, use many CCD can increase manufacturing cost.Again in order to solve the problem that manufacturing cost increases, U.S. Pat 7,466,161 disclose with US 7,468,611 and to use line style CCD collocation gantry bench frameworks, scan through line style, to increase area of detection and to promote detection efficiency.But, need to keep a particular distance (the approximately spacing of 10um) between substrate to be measured and the electrooptic modulator, and must improve automatically controlled precision and the MECHANISM PRECISION that scans platform.
Summary of the invention
For addressing the above problem, one embodiment of the invention provide a kind of substrate electrical measuring equipment, comprising: one first electro-optic modulation arrangement is arranged at one first and detects the roller periphery; One substrate to be measured is transmitted between a plurality of live rollers, and contacts with this first electro-optic modulation arrangement; One voltage supply device provides a voltage to be worse than between this first electro-optic modulation arrangement and this substrate to be measured; And one first image-taking system, receive by one first of one first reflection of this substrate to be measured and detect light.
Another embodiment of the present invention provides a kind of substrate electrical measuring equipment, comprising: one first electro-optic modulation arrangement is arranged at one first and detects the roller periphery; One substrate to be measured is transmitted in this first detection roller, one side, and contacts with this first electro-optic modulation arrangement; One voltage supply device provides a voltage to be worse than between this first electro-optic modulation arrangement and this substrate to be measured; And one first light-source system provide one first to detect light on this substrate to be measured, wherein this first light-source system be arranged at this first detect roller inside, cause this first to detect light and penetrate this first electro-optic modulation arrangement and receive by one first image-taking system.
Further embodiment of this invention provides a kind of substrate electrical measuring equipment, comprising: one first electro-optic modulation arrangement is arranged at one first and detects the roller periphery; One substrate to be measured is transmitted in one first live roller, one side, and contacts with this first electro-optic modulation arrangement; One voltage supply device provides a voltage to be worse than between this first electro-optic modulation arrangement and this substrate to be measured; And one first light-source system provide one first to detect light on this substrate to be measured; Wherein this first light source is arranged at the inside of this first live roller, causes this first detection light to penetrate this first electro-optic modulation arrangement and is received by one first inner image-taking system of this first detection roller.
Another embodiment of the present invention provides a kind of substrate electrical measuring equipment, comprising: one first electro-optic modulation arrangement is arranged at one first and detects the roller periphery; One substrate to be measured is transmitted in this first detection roller, one side, and contacts with this first electro-optic modulation arrangement; One voltage supply device provides a voltage to be worse than between this first electro-optic modulation arrangement and this substrate to be measured; And one first light-source system provide one first to detect light on this substrate to be measured; Wherein this first light-source system is arranged at the subtend of this first detection roller with respect to this substrate to be measured, causes this first detection light to penetrate this first electro-optic modulation arrangement and is received by one first inner image-taking system of this first detection roller.
Another embodiment of the present invention provides a kind of substrate electrical measuring equipment, comprising: one first electro-optic modulation arrangement is arranged at one first and detects the roller periphery; One substrate to be measured is transmitted in one first live roller, one side, and contacts with this first electro-optic modulation arrangement; One voltage supply device provides a voltage to be worse than between this first electro-optic modulation arrangement and this substrate to be measured; And one first light-source system provide one first to detect light on this substrate to be measured; Wherein this first light-source system is arranged at the inside of this first detection roller, causes this first detection light to penetrate this first electro-optic modulation arrangement and is received by one first inner image-taking system of this first live roller.
For making the present invention can be more obviously understandable, hereinafter is special lifts embodiment, and cooperates appended accompanying drawing, elaborates as follows:
Description of drawings
Fig. 1 shows the synoptic diagram according to the electrical measuring equipment of reflective substrate of one embodiment of the invention;
Fig. 2 shows the synoptic diagram of the electrical measuring equipment of reflective substrate according to another embodiment of the present invention;
Fig. 3 shows the synoptic diagram of the electrical measuring equipment of reflective substrate according to another embodiment of the present invention;
Fig. 4 shows the synoptic diagram of the electrical measuring equipment of double-sided reflecting formula substrate according to another embodiment of the present invention;
Fig. 5 shows the synoptic diagram of the electrical measuring equipment of reflective substrate according to another embodiment of the present invention;
Fig. 6 shows the synoptic diagram of the electrical measuring equipment of double-sided reflecting formula substrate according to another embodiment of the present invention;
Fig. 7 shows the synoptic diagram according to the electrical measuring equipment of penetration substrate of further embodiment of this invention;
Fig. 8 shows the synoptic diagram according to the electrical measuring equipment of penetration substrate of further embodiment of this invention;
Fig. 9 shows the synoptic diagram according to the electrical measuring equipment of penetration substrate of further embodiment of this invention;
Figure 10 shows the synoptic diagram according to the electrical measuring equipment of penetration substrate of further embodiment of this invention;
Figure 11 shows the synoptic diagram of the electrical measuring equipment of penetration substrate according to another embodiment of the present invention;
Figure 12 shows the synoptic diagram of the electrical measuring equipment of two-sided according to another embodiment of the present invention penetration substrate;
Figure 13 shows the synoptic diagram according to the electrical measuring equipment of penetration substrate of further embodiment of this invention;
Figure 14 shows the synoptic diagram according to the electrical measuring equipment of two-sided penetration substrate of further embodiment of this invention.
The main element symbol description
The measuring equipment that 10a-10n~substrate is electrical;
12a, 12c, 12e~light-source system;
12b, 12d, 12f~secondary light source system;
14a, 14e~electro-optic modulation arrangement;
14b, 14d, 14f~second electro-optic modulation arrangement;
The optic modulating device of 14c~crawler belt pattern;
16a, 16c, 16e~detection roller;
16b, 16d, 16f~second detect roller;
18~substrate to be measured;
20a, 20c, 20e~image-taking system;
20b, 20d, 20f~second image-taking system;
22a, 22c, 22e~optical splitter;
22b, 22d, 22f~second optical splitter;
23,24,25~live roller;
30~rigid substrate to be measured;
52a, 52b, 52c, 52d, 52e, 52g~light-source system;
52f, 52h~secondary light source system;
54a, 54b, 54c, 52d, 54e, 54g~electro-optic modulation arrangement;
54f, 54h~second electro-optic modulation arrangement;
56a, 56b, 56c, 56d, 56e, 56g~detection roller;
56f, 56h~second detect roller;
58~rigid substrate to be measured;
60a, 60b, 60c, 60d, 60e, 60g~image-taking system;
60f, 60h~second image-taking system;
62b, 62d, 62g~live roller;
62h~second live roller;
64c, 64d~opening;
66d~opening;
68~soft substrate to be measured;
S1~first;
S2~second.
Embodiment
Below specify and be accompanied by the example of description of drawings for each embodiment.In accompanying drawing or instructions description, similar or identical part is all used identical figure number.And in the accompanying drawings, the shape of embodiment or thickness can enlarge, and to simplify or convenient the sign.Moreover; The part of each element will be it should be noted that the element that does not illustrate among the figure or describe to describe explanation respectively in the accompanying drawing; For having the form that common knowledge the knowledgeable is known in the affiliated technical field; In addition, certain embodiments is merely and discloses the hereby that the present invention uses, and it is not in order to limit the present invention.
Major technique characteristic of this exposure and embodiment appearance attitude are utilized a kind of electrooptic modulator that is coated on the roller; It has the effect of gearing and sensing element concurrently; And utilize image-taking system to capture the induced voltage image of said electrooptic modulator, and and analyze this induced voltage image, can be fast and large tracts of land check pattern etching process residual conducting medium whether; Or surface blemish can satisfy the demand that is applied to the full inspection of rapid large-area to the electrical influence of conductive pattern medium.
In one embodiment, the electrical detection device of a large-area substrates is provided, comprises a light-source system; One electrooptic modulator can be PDLC liquid crystal board or optical crystal, and is coated on the detection roller; One image-taking system, as voltage image record usefulness, the surface of substrate to be measured has the transparent conductive medium pattern, for example the ITO pattern.Substrate to be measured be coated on the electrooptic modulator that detects on the roller and closely contact, utilize the voltage feed mechanism on the roller that substrate to be measured and electrooptic modulator are added generating positive and negative voltage respectively then, make substrate to be measured and electrooptic modulator formation capacity effect; Produce induction field; Drive electrooptic modulator, the conductive pattern of substrate to be measured is presented on the electrooptic modulator indirectly, utilize the induced voltage image on the image-taking system acquisition electrooptic modulator again; And through analyzing the induced voltage image; Judge whether residual conducting medium of pattern etching manufacture craft, or surface blemish for example opens circuit or the short circuit influence to the electrical influence of conductive pattern medium.
The measuring principle explanation
According to the embodiment of the invention; The electrical measuring principle of the conductive pattern on the substrate to be measured is: utilize an electrooptic modulator; For example PDLC liquid crystal board or optical crystal (for example KDP, KD*P, ADP or other optical crystal materials that is fit to) closely contact or the interval about 10 μ m in space with substrate to be measured.Through a voltage generator, make ITO pattern and electrooptic modulator on the substrate to be measured form the electric capacity state, produce induction field, drive electrooptic modulator, the ITO pattern on the substrate to be measured is presented on the electrooptic modulator indirectly.Again with light source projects on electrooptic modulator, the induced voltage image of acquisition on the electrooptic modulator through the GTG intensity of voltage image, detects the residual situation of ITO after the etched pattern manufacture craft, confirms whether manufacture craft complete with the ITO etching.Identical ground, the defective that in manufacture craft, is produced also can use said method to detect, and can not produce electrical influence to the ITO circuit really to make the manufacture craft defective.
Measuring framework can be divided into reflection single-point type, reflected image formula, penetrate single-point type and penetrate image-type.Reflective difference with the image-type framework is that the mode of polishing and capture is different; Reflective is that the light that utilizes optical splitter (Beam splitter) to let light-source system produce is projeced into determinand through optical splitter; The light of body reflection to be measured penetrates optical splitter to image-taking system again and obtains measurement result, is positioned at determinand the same side so reflective framework is light-source system and image-taking system.Penetration is to utilize the light-source system polishing, and image-taking system receives measurement result in the opposite side of determinand.The single-point type framework is a mean value of measuring a zone of determinand, if light-source system comprises beam expander (Beam expand) and image-taking system comprises imaging len (Image lens), just forms the image-type framework, can be used in the surface appearance of observing determinand.Framework of measuring and mode are can be according to demand and measurement environment and controlled.
Electrooptic modulator kind and making
In various embodiments of the present invention, can use liquid crystal board or optical crystal (for example KDP, KD*P, ADP or other optical crystal materials that is fit to) as the material of making electrooptic modulator.Because the reaction velocity of optical crystal is exceedingly fast, and is approximately the ns grade, corresponding present 3 meters/minute manufacture craft speed, optical crystal is enough to deal with.It should be noted that optical crystal can be done lateral operation and vertically operation.So-called lateral operation is operation electric field and the orthogonal framework of incident light, and vertically operation is the framework that operation electric field and incident light are parallel to each other.In various embodiments of the present invention, the framework of measurement is vertically operation, but also can use lateral operation in the different measuring occasion.Lateral operation or vertical operation all are that the operation electric field changes the polarization of incident light state; Before incident light source; Polaroid need be set, only allow the light of specific polarization angle to pass through, crystal changes the polarization of incident light angle through electric field; Polaroid through placing the different polarization angle before CCD, the light intensity behind the fechtable modulation.The ultimate principle of using the PDLC liquid crystal board is for utilizing the refractive index difference of the PDLC and the macromolecular material wherein that mixes, and when not applying driven, liquid crystal board just presents light tight state; When bestowing voltage; The refractive index of liquid crystal material is close with the refractive index of macromolecular material, presents light transmission state, can reduce the use of polarizer; Or the use of special light sources, like laser.And because the manufacturing cost of PDLC liquid crystal board is cheap, can meet the demand of large-area manufacturing again, the full-size of making at present is 80cm * 75cm.Moreover about 125 volts of the driving voltage of liquid crystal board reduces many than the driving voltage more than several kilovolts of optical crystal.
Measure framework
The measuring principle and different electrooptic modulators mentioned above utilizing, following examples propose several kinds of different measurement frameworks.Fig. 1 shows the synoptic diagram according to the electrical measuring equipment of reflective substrate of one embodiment of the invention.In Fig. 1, the electrical measuring equipment 10a of a kind of substrate comprises an electro-optic modulation arrangement 14a, is arranged at the periphery of a detection roller 16a.For example soft electro-optic modulation arrangement is coated on and detects on the roller.One substrate 18 to be measured is transmitted between two live rollers 23 and 24, and contacts with said electro-optic modulation arrangement 14a.One voltage supply device (not illustrating) provides a voltage to be worse than between said electro-optic modulation arrangement 14a and the substrate to be measured 18.For example with driven mechanism respectively to electro-optic modulation arrangement and substrate to be measured; Bestow generating positive and negative voltage respectively, substrate to be measured and electro-optic modulation arrangement form capacity effect, produce induction field; Drive electro-optic modulation arrangement, the conductive pattern on the substrate to be measured is presented on the electro-optic modulation arrangement indirectly.One light-source system 12a provides one to detect light, arrives on the said substrate to be measured 18 through optical splitter 22a, and wherein said detection light is received by an image-taking system 20a (for example CCD) after reflection.Utilize the induced voltage image that appears on the image-taking system acquisition electrooptic modulator, mat is analyzed the induced voltage image, judge whether residual conducting medium of pattern etching manufacture craft, or surface blemish is to the electrical influence of conductive pattern medium.
In another embodiment; Because the speed of roller coil type manufacture craft is fast; Thereby 2 groups or many group detection rollers and image-taking system capable of using, adopt the mode that segmentation detects, reduce direct process image data amount; Be able to cheap low speed image extraction module and replace expensive high speed image extraction module, reduce hardware cost.For example; See also Fig. 2; The electrical measuring equipment 10b of substrate more comprises one second electro-optic modulation arrangement 14b; Be arranged at one second and detect roller 16b periphery, one second voltage supply device (not illustrating) provides a voltage to be worse than between said second electro-optic modulation arrangement 14b and the substrate to be measured 18, and a 12b of secondary light source system provides one second to detect light; Arrive on the said substrate to be measured 18 through the second optical splitter 22b, this second detection light is received by one second image-taking system 20b after first S1 reflection of substrate 18 to be measured.In another embodiment; See also Fig. 4; The electrical measuring equipment 10d of substrate more comprises one second electro-optic modulation arrangement 14d, is arranged at one second and detects roller 16d periphery, and wherein said first and second electro-optic modulation arrangement 14a and 14d are arranged at the subtend of substrate 18 to be measured respectively; In order to measure the patterned conductive layer on the subtend face on the substrate to be measured electrically; One second voltage supply device (not illustrating) provides a voltage to be worse than between said second electro-optic modulation arrangement 14d and the substrate to be measured 18, and a 12d of secondary light source system provides one second to detect light; Arrive at through optical splitter 22d on second of said substrate to be measured 18, this second detects light and after second S2 reflection of substrate 18 to be measured, is received by one second image-taking system 20d.
Fig. 3 shows the synoptic diagram of the electrical measuring equipment of reflective substrate according to another embodiment of the present invention.In Fig. 3, the electrical measuring equipment 10c of a substrate comprises the optic modulating device 14c of a crawler belt pattern, around the periphery of a plurality of detection roller 16c.One substrate 18 to be measured is transmitted on the optic modulating device 14c of crawler belt pattern, and contacts with electro-optic modulation arrangement.One voltage supply device (not illustrating) provides a voltage to be worse than between said electro-optic modulation arrangement and the substrate to be measured.One light-source system 12c provides one to detect light, arrives on the said substrate to be measured 18 through optical splitter 22c, and wherein said detection light is received by an image-taking system 20c (for example CCD) after reflection.
Fig. 5 shows the synoptic diagram of the electrical measuring equipment of reflective substrate according to another embodiment of the present invention.In Fig. 5, the electrical measuring equipment 10e of a substrate comprises an electro-optic modulation arrangement 14e, is arranged at one and detects roller 16e periphery.One rigid substrate 30 to be measured contacts with said electro-optic modulation arrangement 14e.One voltage supply device provides a voltage to be worse than between said electro-optic modulation arrangement 14e and the rigid substrate to be measured 30.One light-source system 12e provides one to detect light, arrives on the said rigid substrate 30 to be measured through optical splitter 22e, and wherein said detection light is received by an image-taking system 20e after reflection.
In another embodiment; Because the speed of roller coil type manufacture craft is fast; Thereby 2 groups or many group detection rollers and image-taking system capable of using, adopt the mode that segmentation detects, reduce direct process image data amount; Be able to cheap low speed image extraction module and replace expensive high speed image extraction module, reduce hardware cost.For example; See also Fig. 6; The electrical measuring equipment 10f of substrate more comprises one second electro-optic modulation arrangement 14f; Be arranged at one second detect roller 16f the periphery, the wherein said first and second electro- optic modulation arrangement 14e and 14f are arranged at the subtend of rigid substrate to be measured 30 respectively, in order to measure the electrical of the patterned conductive layer on the subtend face on the substrate to be measured.One second voltage supply device provides a voltage to be worse than between said second electro-optic modulation arrangement 14f and the rigid substrate to be measured 30.One 12f of secondary light source system provides one to detect light, arrives on the said rigid substrate 30 to be measured through optical splitter 22f, and this detects light and is received by one second image-taking system 20f after reflection.
Fig. 7 shows the synoptic diagram according to the electrical measuring equipment of penetration substrate of further embodiment of this invention.In Fig. 7, the electrical measuring equipment 10g of a kind of substrate comprises an electro-optic modulation arrangement 54a, and it is peripheral to be arranged at a transparent detection roller 56a.For example soft electro-optic modulation arrangement is coated on and detects on the roller.One substrate 68 to be measured is transmitted in this detection roller one side, and contacts with said electro-optic modulation arrangement 54a.One voltage supply device (not illustrating) provides a voltage to be worse than between said electro-optic modulation arrangement 54a and the substrate to be measured 68.For example with driven mechanism respectively to electro-optic modulation arrangement and substrate to be measured; Bestow generating positive and negative voltage respectively, substrate to be measured and electro-optic modulation arrangement form capacity effect, produce induction field; Drive electro-optic modulation arrangement, the conductive pattern on the substrate to be measured is presented on the electro-optic modulation arrangement indirectly.One light-source system 52a is arranged at the inside of transparent detection roller 56a, provides one to detect light, penetrates said detection roller 56a and substrate to be measured 68 and is received by an image-taking system 60a (for example CCD).It should be noted that in another embodiment, the position of said light-source system 52a and image-taking system 60a is interchangeable.
Fig. 8 shows the synoptic diagram according to the electrical measuring equipment of penetration substrate of further embodiment of this invention.In Fig. 8, the electrical measuring equipment 10h of a substrate comprises an electro-optic modulation arrangement 54b, and it is peripheral to be arranged at a transparent detection roller 56b.The outer ring of the live roller 62b that 68 transmission one of one substrate to be measured are transparent also contacts with said electro-optic modulation arrangement 54b.One voltage supply device provides a voltage to be worse than between said electro-optic modulation arrangement 54b and the substrate to be measured 68.One light-source system 52b is arranged at the inside of transparent live roller 62b, provides one to detect light, penetrates said live roller 62b substrate 68 to be measured and detects roller 56b, and the image-taking system 60b (for example CCD) inner by transparent detection roller 56b receives.It should be noted that in another embodiment, the position of said light-source system 52b and image-taking system 60b is interchangeable.
Fig. 9 shows the synoptic diagram according to the electrical measuring equipment of penetration substrate of further embodiment of this invention.In Fig. 9, the electrical measuring equipment 10i of a substrate comprises an electro-optic modulation arrangement 54c, is arranged at the periphery of opaque detection roller 56c, and this detects roller 56c and has an opening 64c.One substrate 68 to be measured is transmitted in this detection roller one side, and contacts with said electro-optic modulation arrangement 54c.One voltage supply device (not illustrating) provides a voltage to be worse than between said electro-optic modulation arrangement 54c and the substrate to be measured 68.One light-source system 52c is arranged at the inside of transparent detection roller 56c, provides one to detect light, penetrates said detection roller 56c and substrate to be measured 68, through opening 64c, is received by image-taking system 60c (for example CCD).It should be noted that in another embodiment, the position of said light-source system 52c and image-taking system 60c is interchangeable.
Figure 10 shows the synoptic diagram according to the electrical measuring equipment of penetration substrate of further embodiment of this invention.In Figure 10, the electrical measuring equipment 10j of a substrate comprises an electro-optic modulation arrangement 54d, is arranged at opaque detection roller 56d periphery.One substrate 68 to be measured is transmitted in the side of opaque live roller 62d, and contacts with said electro-optic modulation arrangement 54b.It should be noted that said detection roller 56d and live roller 62d are all opaque and have an opening respectively, cause this detection light to penetrate this electro-optic modulation arrangement and receive by an image-taking system.One voltage supply device provides a voltage to be worse than between said electro-optic modulation arrangement 54b and the substrate to be measured 68.One light-source system 52d is arranged at the inside of opaque live roller 62d, provides one to detect light, through opening 64d and 66d, penetrates said live roller 62d substrate 68 to be measured and detects roller 56d, and the image-taking system 60d inner by transparent detection roller 56d receives.It should be noted that in another embodiment, the position of said light-source system 52d and image-taking system 60d is interchangeable.
Figure 11 shows the synoptic diagram of the electrical measuring equipment of penetration substrate according to another embodiment of the present invention.In Figure 11, the electrical measuring equipment 10k of a substrate comprises an electro-optic modulation arrangement 54e, is arranged at one and detects roller 56e periphery.One rigid substrate 58 to be measured contacts with said electro-optic modulation arrangement 54e.One voltage supply device provides a voltage to be worse than between said electro-optic modulation arrangement 54e and the rigid substrate to be measured 58.One light-source system 52e is arranged at the inside of transparent detection roller 56e, provides one to detect light, penetrates said detection roller 56e and substrate to be measured 58 and is received by an image-taking system 60e.It should be noted that in another embodiment, the position of said light-source system 52e and image-taking system 60e is interchangeable.
In another embodiment; Because the speed of roller coil type manufacture craft is fast; Thereby 2 groups or many group detection rollers and image-taking system capable of using, adopt the mode that segmentation detects, reduce direct process image data amount; Be able to cheap low speed image extraction module and replace expensive high speed image extraction module, reduce hardware cost.For example; See also Figure 12; The electrical measuring equipment 101 of substrate more comprises one second electro-optic modulation arrangement 54f; Be arranged at one second detect roller 56f the periphery, the wherein said first and second electro-optic modulation arrangement 54e and 54f are arranged at the subtend of rigid substrate to be measured 58 respectively, in order to measure the electrical of the patterned conductive layer on the subtend face on the substrate to be measured.One second voltage supply device provides a voltage to be worse than between said second electro-optic modulation arrangement 54f and the rigid substrate to be measured 58.One 52f of secondary light source system is arranged at the inside of the second detection roller 56f, provides one to detect light, penetrates said second detection roller 56f and substrate to be measured 58 and is received by an image-taking system 60f.It should be noted that in another embodiment, the position of the said secondary light source 52f of system and the second image-taking system 60f is interchangeable.
Figure 13 shows the synoptic diagram according to the electrical measuring equipment of penetration substrate of further embodiment of this invention.In Figure 13, the electrical measuring equipment 10m of a substrate comprises an electro-optic modulation arrangement 54g, and it is peripheral to be arranged at a transparent detection roller 56g.The outer ring of the live roller 62g that 58 transmission one of one rigid substrate to be measured are transparent also contacts with said electro-optic modulation arrangement 54g.One voltage supply device provides a voltage to be worse than between said electro-optic modulation arrangement 54g and the rigid substrate to be measured 58.One light-source system 52g is arranged at the inside of transparent live roller 62g, provides one to detect light, penetrates said live roller 62g, rigid substrate 58 to be measured and detects roller 56g, and the image-taking system 60g (for example CCD) inner by transparent detection roller 56g receives.It should be noted that in another embodiment, the position of said light-source system 52g and image-taking system 60g is interchangeable.
In another embodiment, 2 groups or many group detection rollers and image-taking system capable of using are adopted the mode that segmentation detects, and reduce direct process image data amount, are able to cheap low speed image extraction module and replace expensive high speed image extraction module.For example; See also Figure 14; The electrical measuring equipment 10n of substrate more comprises one second electro-optic modulation arrangement 54h; Be arranged at one second detect roller 56h the periphery, the wherein said first and second electro-optic modulation arrangement 54g and 54h are arranged at the subtend of rigid substrate to be measured 58 respectively, in order to measure the electrical of the patterned conductive layer on the subtend face on the substrate to be measured.Said rigid substrate 58 to be measured is transmitted in the outer ring of the second live roller 62h and contacts with the said second electro-optic modulation arrangement 54h.One second voltage supply device provides a voltage to be worse than between said second electro-optic modulation arrangement 54h and the rigid substrate to be measured 58.One 52h of secondary light source system is arranged at the inside of the second live roller 62h, provides one to detect light, penetrates said second detection roller 56h and substrate to be measured 58 and is received by an image-taking system 60h.It should be noted that in another embodiment, the position of the said secondary light source 52h of system and the second image-taking system 60h is interchangeable.
Because the substrate to be measured and the electro-optic modulation arrangement that are disclosed in the foregoing description are tight contact measurements, thereby detection speed needn't receive the difficulty of automatically controlled real work and reduces.Moreover; Electrooptic modulator can be PDLC liquid crystal soft board, therefore can large-area manufacturing, reach the function that large tracts of land detects; Manufacturing cost is quite cheap; But and the existing coil type equipment of direct modification, and collocation full-fledged bidimensional image detection technique at present just can reach ITO circuit etching and the detection demand of residual quantity after the rapid large-area detection etched pattern manufacture craft of Roll-to-Roll.
Though the present invention discloses as above with various embodiment; Yet it is not in order to limit scope of the present invention; Be familiar with this operator in the technical field under any, do not breaking away from the spirit and scope of the present invention, can do a little change and retouching; Therefore, protection scope of the present invention should with enclose claim was defined is as the criterion.

Claims (18)

1. measuring equipment that substrate is electrical comprises:
First electro-optic modulation arrangement is arranged at one first and detects the roller periphery;
Substrate to be measured is transmitted between a plurality of live rollers, and contacts with this first electro-optic modulation arrangement;
Voltage supply device provides a voltage to be worse than between this first electro-optic modulation arrangement and this substrate to be measured; And
First image-taking system receives one first detection light by one first reflection of this substrate to be measured.
2. the electrical measuring equipment of substrate as claimed in claim 1 also comprises:
Second electro-optic modulation arrangement is arranged at one second and detects the roller periphery;
Second voltage supply device provides a voltage to be worse than between this second electro-optic modulation arrangement and this substrate to be measured; And
One second image-taking system receives one second detection light by this first reflection of this substrate to be measured.
3. the electrical measuring equipment of substrate as claimed in claim 1, wherein this first electro-optic modulation arrangement is a crawler belt, around the periphery that coats these a plurality of detection rollers.
4. the electrical measuring equipment of substrate as claimed in claim 1 also comprises:
Second electro-optic modulation arrangement is arranged at one second and detects the roller periphery, and wherein this first and second electro-optic modulation arrangement is arranged at the subtend of this substrate to be measured respectively;
Second voltage supply device provides a voltage to be worse than between this second electro-optic modulation arrangement and this substrate to be measured; And
Second image-taking system receives one second detection light by one second reflection of this substrate to be measured.
5. measuring equipment that substrate is electrical comprises:
First electro-optic modulation arrangement is arranged at one first and detects the roller periphery;
Substrate to be measured is transmitted in this first detection roller, one side, and contacts with this first electro-optic modulation arrangement;
Voltage supply device provides a voltage to be worse than between this first electro-optic modulation arrangement and this substrate to be measured; And
First light-source system provides one first to detect light on this substrate to be measured, and wherein this first light-source system is arranged at the inside of this first detection roller, causes this first detection light to penetrate this first electro-optic modulation arrangement and is received by one first image-taking system.
6. measuring equipment that substrate is electrical comprises:
First electro-optic modulation arrangement is arranged at one first and detects the roller periphery:
Substrate to be measured is transmitted in one first live roller, one side, and contacts with this first electro-optic modulation arrangement;
Voltage supply device provides a voltage to be worse than between this first electro-optic modulation arrangement and this substrate to be measured; And
First light-source system provides one first to detect light on this substrate to be measured; Wherein this first light-source system is arranged at the inside of this first live roller, causes this first detection light to penetrate this first electro-optic modulation arrangement and is received by one first inner image-taking system of this first detection roller.
7. the electrical measuring equipment of substrate as claimed in claim 5 also comprises:
Second electro-optic modulation arrangement is arranged at one second and detects the roller periphery, and wherein this first and second electro-optic modulation arrangement is arranged at the subtend of this substrate to be measured respectively;
Second voltage supply device provides a voltage to be worse than between this second electro-optic modulation arrangement and this substrate to be measured; And
The secondary light source system provides one second to detect light on this substrate to be measured, and wherein this secondary light source system is arranged at the inside of this second detection roller, causes this second detection light to penetrate this second electro-optic modulation arrangement and is received by one second image-taking system.
8. the electrical measuring equipment of substrate as claimed in claim 6 also comprises:
Second electro-optic modulation arrangement is arranged at one second and detects the roller periphery, and wherein this first and second electro-optic modulation arrangement is arranged at the subtend of this substrate to be measured respectively;
Second voltage supply device provides a voltage to be worse than between this second electro-optic modulation arrangement and this substrate to be measured; And
The secondary light source system provides one second to detect light on this substrate to be measured; Wherein this secondary light source system is arranged at the inside of this second live roller, causes this second detection light to penetrate this second electro-optic modulation arrangement and detects the inner one second image-taking system reception of roller by one second.
9. measuring equipment that substrate is electrical comprises:
First electro-optic modulation arrangement is arranged at one first and detects the roller periphery;
Substrate to be measured is transmitted in this first detection roller, one side, and contacts with this first electro-optic modulation arrangement;
Voltage supply device provides a voltage to be worse than between this first electro-optic modulation arrangement and this substrate to be measured; And
First light-source system provides one first to detect light on this substrate to be measured; Wherein this first light-source system is arranged at the subtend of this first detection roller with respect to this substrate to be measured, causes this first detection light to penetrate this first electro-optic modulation arrangement and is received by one first inner image-taking system of this first detection roller.
10. the electrical measuring equipment of substrate as claimed in claim 9 also comprises:
Second electro-optic modulation arrangement is arranged at one second and detects the roller periphery, and wherein this first and second electro-optic modulation arrangement is arranged at the subtend of this substrate to be measured respectively;
Second voltage supply device provides a voltage to be worse than between this second electro-optic modulation arrangement and this substrate to be measured; And
The secondary light source system provides one second to detect light on this substrate to be measured; Wherein this secondary light source system is arranged at the subtend of this second detection roller with respect to this substrate to be measured, causes this second detection light to penetrate this second electro-optic modulation arrangement and is received by one second inner image-taking system of this second detection roller.
11. the measuring equipment that substrate is electrical comprises:
First electro-optic modulation arrangement is arranged at one first and detects the roller periphery;
Substrate to be measured is transmitted in one first live roller, one side, and contacts with this first electro-optic modulation arrangement;
Voltage supply device provides a voltage to be worse than between this first electro-optic modulation arrangement and this substrate to be measured; And
First light-source system provides one first to detect light on this substrate to be measured; Wherein this first light-source system is arranged at the inside of this first detection roller, causes this first detection light to penetrate this first electro-optic modulation arrangement and is received by one first inner image-taking system of this first live roller.
12. the measuring equipment that substrate as claimed in claim 11 is electrical also comprises:
Second electro-optic modulation arrangement is arranged at one second and detects the roller periphery, and wherein this first and second electro-optic modulation arrangement is arranged at the subtend of this substrate to be measured respectively;
Second voltage supply device provides a voltage to be worse than between this second electro-optic modulation arrangement and this substrate to be measured; And
The secondary light source system provides one second to detect light on this substrate to be measured; Wherein this secondary light source system is arranged at the inside of this second detection roller, causes this second detection light to penetrate this second electro-optic modulation arrangement and is received by one second inner image-taking system of one second live roller.
13. like claim 1,5,6, the electrical measuring equipment of 9 or 11 described substrates, wherein this substrate to be measured is a rigid substrate or a flexible base plate.
14. like claim 7,8, the electrical measuring equipment of 10 or 12 described substrates, wherein this first and second electro-optic modulation arrangement is soft electro-optic modulation arrangement, and peripheral around coating this first and second detections roller respectively.
15. the measuring equipment that substrate as claimed in claim 7 is electrical, wherein at least one of this a plurality of detection rollers is transparent detection roller, causes these a plurality of detection light to penetrate these a plurality of electro-optic modulation arrangement and received by these a plurality of image-taking systems.
16. the measuring equipment that substrate as claimed in claim 7 is electrical; Wherein at least one of this a plurality of detection rollers is opaque detection roller and has an opening, causes corresponding this a plurality of detection light to penetrate corresponding this a plurality of electro-optic modulation arrangement by these a plurality of image-taking systems receptions accordingly.
17. like claim 7,8, the electrical measuring equipment of 10 or 12 described substrates; Wherein at least one group of these a plurality of detection rollers is transparent detection roller, causes these a plurality of detection light to penetrate these a plurality of electro-optic modulation arrangement and is received by corresponding these a plurality of image-taking systems.
18. like claim 7,8, the electrical measuring equipment of 10 or 12 described substrates; Wherein at least one group of these a plurality of detection rollers is opaque detection roller and has an opening, causes these a plurality of detection light to penetrate these a plurality of electro-optic modulation arrangement by accordingly should a plurality of image-taking systems receptions.
CN2010102924947A 2010-09-25 2010-09-25 Measuring equipment for electrical property of substrate Pending CN102411099A (en)

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CN1963428A (en) * 2005-11-11 2007-05-16 财团法人工业技术研究院 Method and system for testing flexible elements
CN101051619A (en) * 2006-04-03 2007-10-10 三星电子株式会社 Substrate check device and substrate check method
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US5504438A (en) * 1991-09-10 1996-04-02 Photon Dynamics, Inc. Testing method for imaging defects in a liquid crystal display substrate
CN101228450A (en) * 2005-04-22 2008-07-23 光子动力学公司 Direct detect sensor for flat panel displays
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Publication number Priority date Publication date Assignee Title
CN106918733A (en) * 2015-12-24 2017-07-04 昆山工研院新型平板显示技术中心有限公司 Flexible reliability test fixture and flexible reliability on-line testing equipment
US10971042B2 (en) 2015-12-24 2021-04-06 Kunshan New Flat Panel Disp. Tech. Center Co., Ltd Reliability test fixture for flexible display component and online reliability test device for flexible display component

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Application publication date: 20120411