CN102253435A - Micromachining method for manufacturing polymer cylindrical microlens by electric field induction - Google Patents
Micromachining method for manufacturing polymer cylindrical microlens by electric field induction Download PDFInfo
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- CN102253435A CN102253435A CN2011101930998A CN201110193099A CN102253435A CN 102253435 A CN102253435 A CN 102253435A CN 2011101930998 A CN2011101930998 A CN 2011101930998A CN 201110193099 A CN201110193099 A CN 201110193099A CN 102253435 A CN102253435 A CN 102253435A
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Abstract
The invention discloses a micromachining method for manufacturing a polymer cylindrical microlens by electric field induction. The method comprises the following steps of: machining on a SiO2 substrate to form a transparent conductive grid structure, spinning an SU-8 photoresist, photoetching and developing a circle of bracket to form a cylindrical electric field contour surface, and evaporating a conductive indium tin oxide (ITO) layer at the bottom of the SiO2 substrate; spinning ultraviolet curing polymer, and pressing a transparent template on the ultraviolet curing polymer to make the bracket made of the SU-8 photoresist pressed into a polymer film; making the conductive grid structure of the plane generate the cylindrical electric field contour surface on the surface of the polymer film by using a direct current power supply, and forming a cylindrical microlens structure; keeping polymer rheology under an electric field with a stabilized voltage value to form the cylindrical microlens structure; and finally, exposing the curing polymer through ultraviolet light, and removing the template to obtain a needed polymer cylindrical microlens array. The method has the advantages of high production efficiency, simple process and low cost.
Description
Technical field
The invention belongs to technical field of micro-nano manufacture, be specifically related to a kind of electric field that utilizes and induce the lenticular micro-processing method of manufacturing polymkeric substance cylinder.
Background technology
Lens are one of basic optical elements that constitute optical system, convergence is arranged, disperse, multiple optical effects such as collimation, imaging.Cylindrical lens is called GRIN Lens again, and referring to have at least a plane of refraction is the lens of cylinder, and the refractive index of its lens radially changes.Lenticule is meant that characteristic dimension is micron-sized micro lens, and it is called microlens array by the array that definite shape is arranged on substrate.The cylindrical microlenses array has advantages such as size is little, in light weight, integration is good, can be used for a plurality of technical fields such as optical information processing, ccd array, light interconnection, laser instrument, light data transmission.Lenticule can be by multiple materials processing, and glass is most widely used material, but glass hard (HRC65 height, flexible poor.Compare the glass lenticule, the micro polymer lens are not only more light, and because its flexibility is good, bigger design freedom arranged, and can be applicable to the flexible optical system.
The technology of existing preparation polymkeric substance cylinder microlens array has laser processing technology and hot-die forming technique.Laser processing technology utilizes the thermal effect of laser directly to process the cylindrical microlenses structure at substrate surface.This method need be processed lenticule one by one, and speed is slow, and production efficiency is low.And the thermal effect of Laser Processing can make polymkeric substance produce melt substance, increases the roughness on lenticule surface, influences its optical effect.The hot-die forming technique processes the cylindrical microlenses structure on master mold, order is heated to the polymkeric substance of molten state and fills mould, obtains the lenticule of replica after the cooling.But hot-die technology one-shot forming large tracts of land microlens array, but the heating cooling procedure can make polymkeric substance occur shrinking, and influences the replica precision.The processing of cylinder microscale mould simultaneously is also very difficult, has influenced this The Application of Technology.
Summary of the invention
In order to overcome the shortcoming of above-mentioned prior art, the object of the present invention is to provide a kind of electric field that utilizes to induce the lenticular micro-processing method of manufacturing polymkeric substance cylinder, easy processing microtrabeculae face, adding can not influence the lenticule precision man-hour, has production efficiency height, technology is simple, cost is low advantage.
In order to achieve the above object, the technical scheme taked of the present invention is:
A kind of electric field that utilizes is induced the lenticular micro-processing method of manufacturing polymkeric substance cylinder, may further comprise the steps:
1) at SiO
2Process the negative patterning of conductive gate line structure on the base material with photoetching process, using sputtering deposition device sputter one layer thickness on patterned photoresist layer is nano level transparent metal layer, peels off photoresist layer promptly at transparent SiO
2Just formed electrically conducting transparent grid line structure on the base material, spin coating one deck SU-8 glue on graphical template, and photoetching development afterwards forms a coil support around graph area, form cylinder electric field contour surface;
2) use sputtering deposition device at SiO
2The bottom evaporation electroconductive ITO layer of base material;
3) use sol evenning machine that the SiO of electroconductive ITO is arranged at evaporation
2Substrate surface spin coating UV curable polymer film, the thickness of UV curable polymer film is micron order;
4) pressure P with 0.5MPa is pressed in the transparent template that has the conductive gate line structure that the first step prepares on the UV curable polymer, the support that SU-8 glue is made is pressed in the UV curable polymer film, with the distance between control conductive gate line structure and the UV curable polymer film;
5) use direct supply, voltage-regulation scope 0-200V, conductive gate line structure place at transparent template connects positive pole, connect negative pole being coated with the base material place that is covered with the UV curable polymer film, the conductive gate line structure on plane can produce the electric field intensity contour surface that is cylinder at the UV curable polymer film surface, the interior pressure that the static pressure that electrostatic field produces can change the UV curable polymer film distributes, make its distribution carry out rheology, and form the cylindrical microlenses structure by cylinder electric field intensity contour surface;
6) UV curable polymer was kept 20 minutes to 2 hours under the electric field of stable voltage, form the cylindrical microlenses structure until polymeric rheology;
7) ultraviolet light of employing 365nm wavelength, the exposure cure polymer is sloughed template, can obtain required polymkeric substance cylinder microlens array.
The polymkeric substance cylinder microlens array that the electric field inductive technology makes has the advantage that technology is simple, cost is low.The cylinder electric field intensity contour surface that utilizes the conductive gate line structure spatially to produce, induced polymer film are pressed the rheology of cylinder electric field intensity contour surface and are formed cylindrical microlenses.Can adapt the pattern of electric field intensity contour surface by the distance between control voltage swing and grid line structure and the thin polymer film, obtain to have the cylindrical microlenses array of differing heights and radian.Owing to used UV curable polymer as rapidoprint, can realize normal temperature processing, solved the problem that lenticule that the heating cooling procedure causes shrinks.
Because the present invention does not need special processing conditions and complex apparatus, can cut down finished cost; The electric field inductive technology has been simplified the manufacturing procedure of cylindrical microlenses, shortened process time, improved production efficiency, the cylindrical microlenses array that the present invention is prepared can be applicable to multiple optical systems such as various semiconductor laser alignments, laser fiber coupling, photometry calculation, machine vision, three-dimensional imaging.
Description of drawings
Fig. 1 has the synoptic diagram of the template of conductive gate line structure for the present invention.
Fig. 2 is covered with the synoptic diagram of the base material of liquid UV curable polymer film for the present invention is coated with.
The transparent template that Fig. 3 will have a conductive gate line structure for the present invention is pressed into the synoptic diagram of UV curable polymer film.
The cylinder electric field intensity contour surface synoptic diagram that Fig. 4 produces at the UV curable polymer film surface for the transparent template that has the conductive gate line structure behind the impressed voltage of the present invention.
Fig. 5 induces the UV curable polymer film for electric field of the present invention and forms the synoptic diagram of cylindrical microlenses array.
Fig. 6 solidifies the synoptic diagram of the microlens array that has been shaped for the present invention's ultraviolet ray irradiation.
Fig. 7 is the synoptic diagram of the cylindrical microlenses array that obtains after the demoulding of the present invention.
Embodiment
Below in conjunction with accompanying drawing the present invention is done detailed description.
A kind of electric field that utilizes is induced the lenticular micro-processing method of manufacturing polymkeric substance cylinder, may further comprise the steps:
1) negative patterning of conductive gate line structure is designed to micron order grid line structure, according to Numerical Simulation Analysis, the grid line structure of conduction can spatially produce the electric field contour surface of cylinder, adopts sputtering sedimentation, etching system to prepare electrically conducting transparent grid line template, as shown in Figure 1, at SiO
2Base material 1 usefulness photoetching process processes the negative patterning of conductive gate line structure, and is nano level transparent metal layer with sputtering deposition device sputter one layer thickness on patterned photoresist layer, peels off photoresist layer promptly at transparent SiO
2Just formed electrically conducting transparent grid line structure 3 on the base material, spin coating one deck SU-8 glue on graphical template afterwards, and photoetching development, around graph area, form a coil support 2, the thickness k of conductive gate line structure 3 is a nanoscale, the width w of conductive gate line structure 3 is a micron order, and the spacing w1 of conductive gate line structure 3 is a micron order, and the height H of SU-8 support 2 is a micron order;
2) as shown in Figure 2, use sputtering deposition device at SiO
2The bottom 4 evaporation electrical-conductive nanometer indium tin metal oxide ITO layers 5 of base material;
3) as shown in Figure 3, use sol evenning machine at electrical-conductive nanometer indium tin metal oxide ITO layer 5 surperficial spin coating UV curable polymer film 6, the thickness d of UV curable polymer film 6 is a micron order;
4) as shown in Figure 4, pressure P 7 with 0.5MPa is pressed into UV curable polymer film 6 with the transparent template that has the conductive gate line structure that the first step prepares, make being pressed into fully in the UV curable polymer film 6 of support 2 that SU-8 glue makes, guarantee that the height H of the support 2 that the void size between conductive gate line structure 3 and the UV curable polymer film 6 is made for SU-8 glue deducts the thickness d of UV curable polymer film 6;
5) use digital direct supply 8, voltage-regulation scope 0-200V, connect the positive pole of direct supply at conductive gate line structure 3 places of transparent template, connect the negative pole of direct supply at electrical-conductive nanometer indium tin metal oxide ITO layer 5 place, adjust voltage swing, make conductive gate line structure 3 produce the electric field intensity contour surface 9 that is cylinder on UV curable polymer film 6 surfaces, and make electric field intensity big to the obstruction that can overcome UV curable polymer film 6 surface tension and gravity, rheology forms the cylindrical microlenses structure, as shown in Figure 4, there is cylinder electric field contour surface in UV curable polymer film 6 surfaces, by Maxwell's strain theory, being subjected to the internal pressure of the UV curable polymer film 6 that static pressure influences also to be cylinder distributes, because polymkeric substance can produce rheological behaviour by isopressure surface in the rheology process, final UV curable polymer film 6 can rheology form cylindrical microlenses structure 7;
6) as shown in Figure 5, the UV curable polymer film was kept 20 minutes to 2 hours under the electric field intensity contour surface of cylinder, the cylindrical microlenses structure of rheology formation and cylinder electric field contour surface consistent appearance;
7) as shown in Figure 6, adopt commercial ultraviolet curing equipment to produce ultraviolet light 11, UV curable polymer is solidified in exposure, sloughs template, can obtain required cylindrical microlenses structure 10.
Pass through said method, the size combinations of attainable cylindrical microlenses array is: the thickness d of the UV curable polymer film of spin coating on the base material is a micron order, the width w of transparent template conductive gate line structure is a micron order, the spacing w1 of transparent template conductive gate line structure is a micron order, the thickness k of transparent template conductive gate line structure is a nanoscale, the height H of SU-8 support is a micron order, the height d1 of the cylindrical microlenses array that makes is a micron order, the cycle 1 of cylindrical microlenses array is a micron order, the width w2 of single cylindrical microlenses is a micron order, and the radius-of-curvature r of single cylindrical microlenses is a micron order.
The normal temperature electric field of polymkeric substance cylinder microlens array is induced manufacturing process, utilize the conductive gate line structure to produce cylinder electric field contour surface at polymer surfaces, according to Maxwell's strain theory the pressure of liquid polymer film inside is distributed and also be the cylinder distribution, the pressure that makes polymkeric substance press cylinder distributes and produces rheological behaviour, thereby form the cylindrical microlenses structure, the disposable polymkeric substance cylinder microlens array that processes.The principle that tension effect that this manufacture method produces material by electric field and gate line electrode can produce cylinder electric field contour surface realizes the manufacturing of cylindrical microlenses structure, has the advantages such as cylinder mould that technology is simple, equipment cost is low, do not need processed complex.Have and conduct electricity the template of grid line and utilize Maxwell's tension force that electric field produces, do not need directly contact polymkeric substance to be processed, avoided at knockout course the cylindrical microlenses structural damage that is shaped as driving force.The figure of change conductive gate line structure and the size of adjustment impressed voltage can realize the control to size, height and the radius-of-curvature of cylinder microlens structure.
Compare with the cylindrical microlenses array that laser processing technology and hot-die forming technique make, electric field induces the cylindrical microlenses array that makes that the advantage that process time is short, can regulate cylinder height and radius-of-curvature by the adjusting Electric Field Distribution is arranged.Process combination of the present invention has the advantage that procedure of processing is simple, tooling cost is low.Because the characteristic of Electric Field Distribution, the grid line conductive pattern can spatially produce the electric field contour surface that cylinder distributes, the cylindrical microlenses structure that does not need processed complex has reduced the Mould Machining cost as mould, and can disposablely process large tracts of land cylindrical microlenses array.And use UV curable polymer can finish whole technological process at normal temperatures, avoided high-temperature technology and the intensification temperature-fall period destruction to lenticule cylinder surface topography, the cylindrical microlenses array defect that makes still less.
The present invention has overcome the spot heating that exists in the conventional laser process technology and has caused polymer melt to destroy the problem of lenticule pattern, and overcome the difficulty of hot-die forming technique processing cylinder micro-mould, the disposable polymkeric substance cylinder lenticule that makes large tracts of land, low defective.The present invention adopts the conductive gate line structure to form the rheology that cylinder electric field contour surface is induced UV curable polymer in the space, makes it form the cylindrical microlenses structure.The size that can be by changing the conduction grid line and the size and the radius-of-curvature of impressed voltage size control cylindrical microlenses array develop and a kind of new cylindrical microlenses array process technology.
Claims (1)
1. one kind is utilized electric field to induce the lenticular micro-processing method of manufacturing polymkeric substance cylinder, it is characterized in that, may further comprise the steps:
1) at SiO
2Process the negative patterning of conductive gate line structure on the base material with photoetching process, using sputtering deposition device sputter one layer thickness on patterned photoresist layer is nano level transparent metal layer, peels off photoresist layer promptly at transparent SiO
2Just formed electrically conducting transparent grid line structure on the base material, spin coating one deck SU-8 glue on graphical template, and photoetching development afterwards forms a coil support around graph area, form cylinder electric field contour surface;
2) use sputtering deposition device at SiO
2The bottom evaporation electroconductive ITO layer of base material;
3) use sol evenning machine that the SiO of electroconductive ITO is arranged at evaporation
2Substrate surface spin coating UV curable polymer film, the thickness of UV curable polymer film is micron order;
4) pressure P with 0.5MPa is pressed in the transparent template that has the conductive gate line structure that the first step prepares on the UV curable polymer film, the support that SU-8 glue is made is pressed in the UV curable polymer film, with the distance between control conductive gate line structure and the UV curable polymer film;
5) use direct supply, voltage-regulation scope 0-200V, conductive gate line structure place at transparent template connects positive pole, connect negative pole being coated with the base material place that is covered with the UV curable polymer film, the conductive gate line structure on plane can produce the electric field intensity contour surface that is cylinder at the UV curable polymer film surface, the interior pressure that the static pressure that electrostatic field produces can change the UV curable polymer film distributes, make its distribution carry out rheology, and form the cylindrical microlenses structure by cylinder electric field intensity contour surface;
6) UV curable polymer was kept 20 minutes to 2 hours under the electric field of stable voltage, form the cylindrical microlenses structure until polymeric rheology;
7) ultraviolet light of employing 365nm wavelength, the exposure cure polymer is sloughed template, can obtain required polymkeric substance cylinder microlens array.
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Cited By (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN103064137A (en) * | 2013-01-09 | 2013-04-24 | 西安交通大学 | Electric field induction imprinting method of aspheric surface micro-lens array |
| CN103149607A (en) * | 2013-03-01 | 2013-06-12 | 西安交通大学 | Micro-lens array manufacturing method based on template electric induction forming |
| CN103852972A (en) * | 2014-03-28 | 2014-06-11 | 西安交通大学 | Micrometer impressing and laser induction forming method of double-focus microlens array |
| CN105824063A (en) * | 2016-05-17 | 2016-08-03 | 西安交通大学 | Variable-focus micro lens array structure based on electric actuation and preparation process thereof |
| CN109467046A (en) * | 2018-09-28 | 2019-03-15 | 西安交通大学 | Method for composite material based on the arrangement of nanoparticle three-dimensional micro-nano structureization |
| CN111170270A (en) * | 2020-01-07 | 2020-05-19 | 南昌大学 | Surface microstructure preparation method based on electric field regulation and control morphology |
| CN115437044A (en) * | 2022-07-29 | 2022-12-06 | 深圳通感微电子有限公司 | Microlens preparation method and microlens |
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| US20020005391A1 (en) * | 1999-12-23 | 2002-01-17 | Erik Schaffer | Methods and apparatus for forming submicron patterns on films |
| US6964793B2 (en) * | 2002-05-16 | 2005-11-15 | Board Of Regents, The University Of Texas System | Method for fabricating nanoscale patterns in light curable compositions using an electric field |
| CN1729428A (en) * | 2001-05-16 | 2006-02-01 | 德克萨斯州大学系统董事会 | Method and system for fabricating nanoscale patterns in light curable compositions using an electric field |
| CN101446762A (en) * | 2008-12-31 | 2009-06-03 | 西安交通大学 | Micro-complex type method for inducing electric field under the restrict of non-contact moulding board |
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Patent Citations (4)
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| US20020005391A1 (en) * | 1999-12-23 | 2002-01-17 | Erik Schaffer | Methods and apparatus for forming submicron patterns on films |
| CN1729428A (en) * | 2001-05-16 | 2006-02-01 | 德克萨斯州大学系统董事会 | Method and system for fabricating nanoscale patterns in light curable compositions using an electric field |
| US6964793B2 (en) * | 2002-05-16 | 2005-11-15 | Board Of Regents, The University Of Texas System | Method for fabricating nanoscale patterns in light curable compositions using an electric field |
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Cited By (11)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN103064137A (en) * | 2013-01-09 | 2013-04-24 | 西安交通大学 | Electric field induction imprinting method of aspheric surface micro-lens array |
| CN103064137B (en) * | 2013-01-09 | 2015-07-08 | 西安交通大学 | Electric field induction imprinting method of aspheric surface micro-lens array |
| CN103149607A (en) * | 2013-03-01 | 2013-06-12 | 西安交通大学 | Micro-lens array manufacturing method based on template electric induction forming |
| CN103149607B (en) * | 2013-03-01 | 2015-08-05 | 西安交通大学 | A kind of fabricating method of microlens array be shaped based on template electric induction |
| CN103852972A (en) * | 2014-03-28 | 2014-06-11 | 西安交通大学 | Micrometer impressing and laser induction forming method of double-focus microlens array |
| CN103852972B (en) * | 2014-03-28 | 2016-08-17 | 西安交通大学 | Micron impressing and the induced with laser manufacturing process of a kind of bifocus microlens array |
| CN105824063A (en) * | 2016-05-17 | 2016-08-03 | 西安交通大学 | Variable-focus micro lens array structure based on electric actuation and preparation process thereof |
| CN105824063B (en) * | 2016-05-17 | 2018-03-16 | 西安交通大学 | A kind of zoom microlens array structure and preparation technology based on electric actuation |
| CN109467046A (en) * | 2018-09-28 | 2019-03-15 | 西安交通大学 | Method for composite material based on the arrangement of nanoparticle three-dimensional micro-nano structureization |
| CN111170270A (en) * | 2020-01-07 | 2020-05-19 | 南昌大学 | Surface microstructure preparation method based on electric field regulation and control morphology |
| CN115437044A (en) * | 2022-07-29 | 2022-12-06 | 深圳通感微电子有限公司 | Microlens preparation method and microlens |
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Application publication date: 20111123 |