CN102207677A - Radiosensitive composition - Google Patents
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- CN102207677A CN102207677A CN 201010141699 CN201010141699A CN102207677A CN 102207677 A CN102207677 A CN 102207677A CN 201010141699 CN201010141699 CN 201010141699 CN 201010141699 A CN201010141699 A CN 201010141699A CN 102207677 A CN102207677 A CN 102207677A
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Abstract
The invention discloses a radiosensitive composition, which is composed of phenolic resin, a copolymer of a metal ion structure, an acid generator and a radiation absorptive dye and the like. The composition is coated on a proper substrate, and then roasted, exposed and developed to obtain an image. The image has good hardness, wear resistance and adherence and is beneficial to increase of printing capacity.
Description
Technical field
The present invention relates to a kind of radiation sensitive composition that is used for lithographic plate.
Background technology
Lithographic characteristic is that the image area (image area) of inking on the lithographic plate and the non-image district of not inking exist together in one plane.Wherein, image area is an oleophilic drainage, and non-image district then is hydrophilic oleophobic.Lithographic mode of operation, promptly be to utilize oil (oily matter or printing ink (ink)) and the immiscible characteristic of water, water for earlier forme, make non-image district form the moisture film of hydrophilic oleophobic, and then to the forme inking, make image area partly attach printing ink, under the effect of squeegee pressure, the picture and text on the forme are transferred to paper or other stock surface through blanket cylinder.Usually printing ink is transferred to the blanket (blanket) that is commonly referred to as intermediate materials, then, printing ink is transferred to the material surface for the treatment of duplicating image, promptly as surfaces such as paper, cloth, plastics or metals again.
Precoating formula sensing optical activity lithographic plate (Pre-Sensitized Plate, the PS version) manufacture method, roughly be surface process electrolysis or grinding earlier with an aluminium sheet, to form the Grains that a plurality of printshops need, again the radiation sensitive composition of sensing optical activity or thermonasty is coated on the Grains of this aluminium sheet forming a radiation-sensitive coating, and this radiation-sensitive coating is toasted slaking.Then, see through an egative film with predetermined image and literal, the image on this egative film and the literal mode with exposure and develop (develop) is transferred on the radiation-sensitive coating, to make in order to the galley on file with image and text printout.
In recent years, use a computer and handle and the digitizing technique widespread use of image output information, the new image way of output of various correspondences is practicability.On lithography, if can omit the making of egative film, directly with the digital pattern of computing machine via the exposure imaging program, be transferred on the radiation-sensitive coating, to make in order to the galley on file with image and text printout, the plate-making operation is greatly simplified, can significantly be increased printing speed and reducing cost, this kind technology is called Computer To Plate (Computer To Plate, CTP), obtain and how being applicable to that the galley of this technology becomes important problem.
After being coated on the radiation sensitive composition exposure on the employed surface of aluminum plate of lithography, its exposed portion changes alkali-soluble into, thereby at developing process it is removed.This kind version is called the positive type light sensitive version; Otherwise exposed part can harden (curing), changes the alkali insolubility into, then is called the negative photosensitive version.When above-mentioned two situations, residual image area is absorbency or lipophilicity, but not image area is water absorptivity or water wettability.The eurymeric of light sensitive plate or minus depend on the radiation sensitive composition that surface of aluminum plate is coated with.
Above-mentioned radiation sensitive composition mainly is made up of following different materials: radiation absorbability dyestuff (emulsion or sensible heat agent), acid forming agent, phenolics (film forming agent), copolymerization macromolecule, solvent, and other auxiliary agent.
Prior art, for example United States Patent (USP) the 6th, disclose a kind of positive type light sensitive version that is coated with the potpourri of phenolics (novolac) or cresol-formaldehyde resin (cresol-formaldehyde) or polyhydroxystyrene resin (poly (hydroxystyrene)) and infrared ray absorbing dyestuff for 063, No. 544.In addition, United States Patent (USP) the 5th, 372,907,5,372,915,5,340,699,5,491, No. 046, then be coated with the potpourri of novolac type phenolics, cresol type phenolics, infrared ray absorbing dyestuff or pigment and potentiality Bronsted acid (Latent Bronsted acid).When these versions were exposed to infrared radiation, the potentiality Bronsted acid decomposed a kind of different kenel phenolics (for example novolac and cresol) that impel of generation crosslinked material takes place, and makes the mixture cures in the exposure region.Further during the galley of this exposure of heating, filming of this exposure hardened more and it is become be insoluble in the alkaline-based developer, promptly still be not dissolvable in water in the liquid developer solution yet there is exposed areas.United States Patent (USP) the 5th, 919, disclose the radiation sensitive composition of forming by resin glue (binderresin), crosslinking chemical, thermal excitation acid forming agent (thermal-activated acid generator) and infrared absorbent No. 601, after this constituent is exposed to infrared ray, this acid forming agent promptly divides and explains acid, and then causes the cross-linking reaction that resin glue is carried out by crosslinking chemical by this acid.
The common shortcoming of above-mentioned each technology, be exactly after the galley video picture its image area that manifests often be short of integrality (integrity), can't be for long-time effectively printing, so that the sharpness and the printing quality inequality of the printed images that produces.
Yet, constantly be required to improve plate-making efficient and printing quality the printer, under the prerequisite that promotes industrial competitiveness, the sensitivity of the radiation-sensitive coating on the galley is required must be faster, and promptly its required energy that exposes time lower or that its exposure is required is shorter.And exposed portion needs the easier liquid that is developed to wash off when developing, the immersion that unexposed portion then needs more anti-developer solution with wash away, also promptly when developing the temperature of developer solution, concentration, and to soak the tolerance of the conditions such as time of washing away bigger.Simultaneously, also must be able to keep fine resolution, inking, and the abrasion performance of the radiation-sensitive coating of finishing.In addition, the then property of radiation-sensitive coating and aluminium sheet also needs better.
Summary of the invention
Technical matters to be solved by this invention is to provide a kind of radiation sensitive composition, its employed radiation sensitive composition, do not influencing under exposure sensitivity and the development tolerance, can effectively improve hardness, abrasion performance, stickability and the anti-seal amount of radiation-sensitive coating.
For achieving the above object, the present invention proposes a kind of radiation sensitive composition, and be applied on the substrate and form image layer, be the copolymerization macromolecule that contains the metallic ion structural unit at this constituent, its structural unit is shown in general formula I:
General formula I
Wherein M is zinc, magnesium, copper bivalent metal ion, and X can be O, S, N, polyalkylene oxide base, n 〉=1.
Wherein, the reactive monomer of this copolymerization macromolecule metal ion structure can be shown in general formula I I:
General formula I I
R wherein
1With R
2Can be H or CH
3, M is zinc, magnesium, copper bivalent metal ion, X and Y can be O, S, N, polyalkylene oxide base.
Wherein, this radiation sensitive composition also comprises radiation absorbability dyestuff, solvent, surfactant, colorant, wetting agent, acid forming agent or its combination.
Wherein, this substrate is a printing plate.
Effect of the present invention:
Radiation sensitive composition of the present invention, because of containing the copolymerization macromolecule that can improve hardness and follow the particular monomers institute polymerization of characteristic, taking into account under exposure sensitivity and the development tolerance, can obviously improve hardness, abrasion performance and the stickability of radiation-sensitive coating, therefore, can significantly improve lithographic anti-seal amount.
Embodiment
The present invention will contain the copolymerization macromolecule of general formula (I) metallic ion structural unit, be added in the radiation sensitive composition prescription, have high sensitivity and video picture tolerance, and can effectively improve hardness, abrasion performance, stickability and the anti-seal amount of radiation-sensitive coating.
General formula (I)
Wherein M is bivalent metal ions such as zinc, magnesium, copper, and X can be O, S, N, polyalkylene oxide base (polyalkylene oxide group), n 〉=1.
The invention provides and on substrate, form the useful a kind of radiation sensitive composition of image layer, and this constituent can be used as the coating use of eurymeric and negative photosensitive version.This constituent is by the phenolics (film forming agent) of (a) 30～95 weight %; (b) the copolymerization macromolecule of 4～70 weight %; (c) the radiation absorbability dyestuff of 0.1～45 weight %; (d) mixing of the acid forming agent of 0.1～15 weight % is formed.The constituent that the present invention advocates more comprises solvent and adjuvant.
The present invention also provides a kind of manufacture method of image, this method comprises: (I) coating one imaging layer (imaging layer) on substrate, and this imaging layer is made of (a) phenolics, (b) copolymerization macromolecule, (c) radiation absorbability dyestuff, (d) acid forming agent.This imaging layer more comprises solvent and adjuvant; (II) make this imaging layer suitably dry; (III) make the imaging area of this imaging layer be exposed to the energy that can fill part outgoing beam, this light beam can be wavelength at the UV/Vis of 320nm～750nm light beam or wavelength at the IR of 750nm～1350nm light beam; And (IV) this imaging area is contacted with developer solution and with exposed part from the removal of this substrate.
Be applicable to phenolics of the present invention, it can be phenol, orthoresol, metacresol, paracresol, beta naphthal, amphyl or above-mentioned two or more potpourri and aldehyde condensation reaction products such as formaldehyde, acetaldehyde, other aliphatic series or aromatic aldehyde.This product (phenolics) should have between being the interior molecular weight of 300～400,000 scope.
Be applicable to copolymerization macromolecule of the present invention, monomer whose can be (methyl) acrylic monomers, as methyl methacrylate (MMA), methacrylic acid (MAA), (methyl) lauryl acrylate, the different hard ester of (methyl) acrylic acid, (methyl) ethyl acrylate, (methyl) butyl acrylate, (methyl) EHA, (methyl) lauryl acrylate etc., styrene (styrene) and derivant thereof, as α-Jia Jibenyixi, para hydroxybenzene ethene (4-hydroxystyrene), to halogen-containing it (methyl) styrene of hydroxymethyl styrene (4-hydroxymethylstyrene) etc., maleic anhydride (Maleic Anhydride), vinyl cyanide (acrylonitrile) and nitrogen substituted maleimide amine monomers (N-substituted maleimidemonomer), wherein nitrogen substituted maleimide amine monomers can be N-phenylmaleimide (N-phenylmaleimide), right-hydroxy phenyl maleimide (4-hydoexyphenylmaleimide), N-2,3 3,5-dimethylphenyl maleimide N-(2,3-dimethylphenyl) Maleimide etc., utilize the high molecular polymerization method that above-mentioned monomer is synthetic according to different compositions and ratio, be applied to light sensitive layer.The copolymerization macromolecule of the containing metal structure that the present invention imported, wherein, the reactive monomer structure of metal ion can be shown in general formula (II):
General formula (II)
R wherein
1With R
2Can be H or CH
3, M is bivalent metal ions such as zinc, magnesium, copper, X and Y can be O, S, N, polyalkylene oxide base (polyalkylene oxide group).Wherein metallic (methyl) acrylic monomers and derivant thereof, can be zinc acrylate resin (Zinc diacrylate, ZDA), zinc methacrylate (Zincdimethacrylate, ZDMA), (methyl) acrylic acid magnesium (Magenesium diacrylate), (methyl) acrylic acid copper (copper diacrylate), sulfo-zinc acrylate resin (Zinc thiodiacrylate) and sulphomethyl zinc acrylate resin (Zinc thiodimethylacrylate) etc.
Be applicable to radiation absorbability dyestuff of the present invention, roughly comprise photosensitivity dye well thermal sensitivity dyestuff.The photosensitivity dyestuff shows 1 greatly, 2-naphthoquinones diazonium-4-sulphonic acid chloride or 1, and the esterification condensation thing of 2-naphthoquinones diazonium-5-sulphonic acid chloride and polyol is main.The thermal sensitivity dyestuff is then based on the dyestuff of absorbing wavelength at 700-900nm, as cyanine dye (Cyanine dye), polymethine dyestuff (polymethine dyes), naphthoquinone dyestuff (naphthoquinone dyes), phthalocyanine dye (phthalocyanine dyes), anthraquinone dye (anthraquinone dyes), or indoaniline premetallized dye (indoaniline metal complexdyes) etc. is main.
Be applicable to acid forming agent of the present invention, can generate Bronsted acid during for a kind of heat that is exposed to infrared spectral regions or luminous energy.The Bronsted acid that generates can be at the photodecomposition of the polymkeric substance in the exposure plot of positive type light sensitive material.This kind material promptly can produce the compound of Bronsted acid by thermochemistry, for example be exposed in No. the 5th, 466,557, the United States Patent (USP), and this patent is intended incorporating this case into and is made for reference.Particularly useful compound is halogenated compounds such as for example halogenation triazine (or S-triazine derivant), halogenation 2-pyrone, halogenation oxazole, halogenation oxadiazoles and halogenation thiazole.These compounds generally have trihalomethyl etc. when being subjected to infrared radiation hot, can generate the poly-halomethyl of desirable halogen acid.The most normal sour product of obtaining can be selected from various trichloromethyl triazines, get final product favourable being selected from, but be not limited to three-trichloromethyl triazine, two-trimethylphenyl triazine, two-trichloromethyl neighbour-or right-anisyl triazine, two-trichloromethyl (3, the 5-dimethoxy) phenyl triazine, two-trichloromethyl naphthyl triazine, two-trichloromethyl 5-methoxy-naphthyl triazine, two-trichloromethyl styryl triazine, two-trichloromethyl styryl triazine and two-trichloromethyl (4-methoxyl) styryl triazine etc.
Solvent used herein can be selected from, for example alcohols, ester class, ketone, ethers, amide-type, fragrant same clan and composition thereof.Particularly 1-methoxyl-2-ethanol, 1-methoxyl-2-propyl alcohol, ethyl glycol acetate, ethyl acetate, acetone, butanone, diisobutyl ketone, methyl isobutyl ketone, cyclohexanone, toluene, dimethylbenzene, just-propyl alcohol, isopropyl alcohol, tetrahydrofuran, butyrolactone, methyl lactate, dimethylformamide and composition thereof.
Adjuvant used in the present invention can be additives such as surfactant, colorant and wetting agent.The use of colorant mainly for the usefulness of galley in the easy resolution image in back that develops, is applicable to that colorant of the present invention can be oil-soluble dyes or base dyestuff.For example crystal violet (Crystal Violet), malachite green (Malachite green), Victoria blue (Victoria Blue), methyl blue (Methylene Blue), ethyl violet (Ethyl Violet), oil blue (Oil Blue 603/613), rhodamine B (Rhodamine B) etc. wherein one or its etc. potpourri.
Below by several embodiment the present invention is described in more detail:
＜embodiment 1〉the copolymerization Polymer Synthesizing
Copolymerization Polymer Synthesizing method of the present invention and monomer ratio are as follows, but non-as limit.
Remarks: PMI=N-phenyl maleimide; The MMA=methyl methacrylate; St=styrene; The AN=vinyl cyanide; The ZDA=zinc acrylate resin
(copolymerization Polymer Synthesizing method)
With 35 gram PMI, 30 gram MMA, 35 gram AN, 1 gram initiator (azoisobutyronitrile (Azobisisobutyronitrile, and 200 gram solvent (dimethyl formamide DimethylFormamide AIBN)), DMF) insert in the 500ml four neck reaction bulbs, four-necked bottle connects paddle, thermometer, nitrogen and recirculatory pipe respectively, temperature is controlled at 70 ℃ of reactions 24 hours, after reaction is finished, cooling is also poured reaction solution in the 6kg water into, the copolymerization macromolecule will be separated out in water, and filtration drying can obtain copolymerization macromolecule (sample code name P-1).Other different copolymerization macromolecules of forming also can obtain by said method.
＜embodiment 2〉preparation of radiation sensitive composition and thermosensitive CTP galley
The phenolics of the phenolics-Rezicure5200 of 20 grams (highly purified metacresol phenolics is produced by SpecialCheme company), 6 grams-
(bis-phenol is main phenolics to SD-1508, produce by Hexion company), 9.0 the copolymerization macromolecule (sample code name P-1) of gram, 0.8 the radiation absorbability dyestuff-cyanine dye IR dye 23b[PCAS of gram] (the dyestuff that under the IR wavelength, can react, produce by PCAS company), 0.24 restrain two-trichloromethyl (4-methoxyl) styryl triazine, 0.5 the colorant-Victoria blue of gram, 0.5 the colorant-crystal violet lactone of gram, the solvent ethyl acetate of 6ml, and the solvent-ethyl glycol acetate of 104 grams, be stirred to moltenly entirely, promptly get the sensible heat type radiation sensitive composition of present embodiment.
Prepare the aluminium sheet of a slice through hydrophilic treatment in addition, above-mentioned sensible heat type radiation sensitive composition is coated on this aluminium sheet, coating film thickness is 1.8g/m
2, after 100 ℃, 4 minutes oven dry,, promptly get a positive-working, thermally sensitive CTP galley again through 50 ℃, 24 hours maturation.
Following table is this positive-working, thermally sensitive CTP galley of embodiment 2 gained, use Screen PTR-8600900rpm exposure bench (producing) by screen (Screen) company, exposure number percent 50%～90%, the 5% conditions of exposure exposure of every rank, after exposure, use result's comparison that various developer solutions develop, wherein, developer solution Kodak Premium and Kodak Plus are that Kodak produces, and Agfa Energy is that Agfa Corp. produces.
| Developer solution | ?Kodak?Premium | Kodak?Plus | Agfa?Energy |
| Development temperature (℃) | 23.0 | 23.0 | 24.0 |
| Development time (second) | 30 | 35 | 20 |
| Clarification (%) fully | 60 | 65 | 60 |
| All Pass scope (%) | 60～90 | 70～90 | 60～90 |
＜embodiment 3〉preparation of radiation sensitive composition and thermosensitive CTP galley
Roughly the positive-working, thermally sensitive CTP galley with embodiment 2 is identical, and difference is wherein to use the copolymerization macromolecule of sample number into spectrum as P-2.
＜embodiment 4〉preparation of radiation sensitive composition and thermosensitive CTP galley
Roughly the positive-working, thermally sensitive CTP galley with embodiment 2 is identical, and difference is wherein to use the copolymerization macromolecule of sample number into spectrum as P-3.
＜embodiment 5〉preparation of radiation sensitive composition and thermosensitive CTP galley
Roughly the positive-working, thermally sensitive CTP galley with embodiment 2 is identical, and difference is wherein to use the copolymerization macromolecule of sample number into spectrum as P-4.
＜embodiment 6〉preparation of radiation sensitive composition and thermosensitive CTP galley
Roughly the positive-working, thermally sensitive CTP galley with embodiment 2 is identical, and difference is wherein to use the copolymerization macromolecule of sample number into spectrum as P-5.
＜embodiment 7〉preparation of radiation sensitive composition and thermosensitive CTP galley
Roughly the positive-working, thermally sensitive CTP galley with embodiment 2 is identical, and difference is wherein to use the copolymerization macromolecule of sample number into spectrum as P-6.
＜embodiment 8〉preparation of radiation sensitive composition and thermosensitive CTP galley
Roughly the positive-working, thermally sensitive CTP galley with embodiment 2 is identical, and difference is not use the copolymerization macromolecule, relatively to add the high molecular function of copolymerization.24.5 the phenolics of the phenolics-Rezicure5200 of gram, 10.5 grams-
The radiation absorbability dyestuff-cyanine dye IRdye 23b[PCAS of SD-1508,0.8 gram], 0.24 gram two-trichloromethyl (4-methoxyl) styryl triazine, the colorant-Victoria blue of 0.5 gram, the colorant-crystal violet lactone of 0.5 gram, the solvent ethyl acetate of 6ml, and the solvent-ethyl glycol acetate of 104 grams.
The positive-working, thermally sensitive CTP galley that the foregoing description 2 to embodiment 8 makes is carried out the exposure imaging test.The developer solution of test of developing is that the temperature of Kodak premium, developer solution is that 23 ℃, development time are 30 seconds, iCPlate2[X-rite] galley measuring instrument (being produced by X. Rite Inc.) carries out 50% site imaging test.Its etc. result arrangement as following table.
| Numbering/energy value (mJ/cm 2) | 146 | 155 | 165 | 176 | 188 | 203 | 220 |
| Embodiment 2 | 52.5 | 52.0 | 51.3 | 50.4 | 49.5 | 49.1 | 48.0 |
| Embodiment 3 | 52.3 | 51.7 | 51.1 | 50.2 | 49.4 | 48.5 | 47.8 |
| Embodiment 4 | 51.8 | 51.6 | 50.8 | 50.0 | 49.7 | 48.6 | 47.5 |
| Embodiment 5 | 52.6 | 51.7 | 51.4 | 50.4 | 49.4 | 48.8 | 48.2 |
| Embodiment 6 | 52.4 | 51.5 | 51.1 | 49.9 | 49.2 | 48.3 | 47.9 |
| Embodiment 7 | 52.1 | 51.2 | 49.8 | 49.5 | 49.1 | 48.0 | 47.5 |
| Embodiment 8 | 53.0 | 52.5 | 51.4 | 50.8 | 50.1 | 49.8 | 48.5 |
Measure the attenuate difference (being the ratio that reduces before and after the photographic layer) of embodiment 2 to embodiment 8 and drip with alcohol that not have change color at the bottom of the version be benchmark with X-rite 528 colorimetric analysis instruments (producing) by X. Rite Inc., measure the clear point (clean point) of its correspondence such as grade, usually photographic layer contains pigment, blue pigment for example, if residual on the substrate have a photographic layer, alcohol can be with the pigment stripping in the photographic layer, just whether measures on the substrate the residual photographic layer that has without sensitization by alcohol.In addition, because of the contact of finger is to cause the printing surface in contact to come off or the main cause of scratch,,, differentiate product surface hardness with standard pencil hardness sign so product is carried out surperficial scratch test with experiment of hardness.Use 3M#610 type adhesive tape, adhesive tape is affixed on the plating, firmly compresses, and does not have air to remain in adhesive tape and plating bonding place, after having pasted, left standstill one minute, the adhesive tape of tearing after a minute is if plating is a good working condition, then follow OK,, then follow NG if plating is torn.Use the rub resistance machine, the wet type method of testing rubs 100 times back and forth, and the observation surface has or not wearing and tearing, is divided into three grades, is respectively poor, common and good.Finally, test the commercial number to be printed of accepting quality image of this substrate to quicken the abrasion printing condition.Its etc. result arrangement as following table.
| Numbering | Attenuate difference (%) | Clear point | Hardness (H) | Then | Abrasion performance | Anti-seal amount |
| Embodiment 2 | 0.11 | 146mJ/cm 2 | 4H | NG | Difference | 45000 |
| Embodiment 3 | 0.13 | 146mJ/cm 2 | ≥4H | OK | Good | 100000 |
| Embodiment 4 | 0.12 | 146mJ/cm 2 | ≥4H | OK | Good | 120000 |
| Embodiment 5 | 0.12 | 146mJ/cm 2 | 4H | NG | Common | 50000 |
| Embodiment 6 | 0.12 | 146mJ/cm 2 | ≥4H | OK | Good | 110000 |
| Embodiment 7 | 0.13 | 146mJ/cm 2 | ≥4H | OK | Good | 130000 |
| Embodiment 8 | 0.27 | 146mJ/cm 2 | 3H | NG | Difference | 30000 |
By above-mentioned data, can find that positive-working, thermally sensitive CTP galley sensitivity height of the present invention, alkali resistance are good, import sensitivity and alkali resistance that copolymerization macromolecule that zinc acrylate resin (ZDA) synthesized can't influence galley.And in hardness, then, abrasion performance and anti-seal amount all have clear improvement.When not adding the copolymerization macromolecule, its hardness, anti-seal amount be not with then good.
Certainly; the present invention also can have other various embodiments; under the situation that does not deviate from spirit of the present invention and essence thereof; those of ordinary skill in the art work as can make various corresponding changes and distortion according to the present invention, but these corresponding changes and distortion all should belong to the protection domain of the appended claim of the present invention.
Claims (4)
1. a radiation sensitive composition is applied on the substrate and forms image layer, it is characterized in that, and be the copolymerization macromolecule that contains the metallic ion structural unit at this constituent, its structural unit is shown in general formula I:
General formula I
Wherein M is zinc, magnesium, copper bivalent metal ion, and X can be O, S, N, polyalkylene oxide base, n 〉=1.
2. radiation sensitive composition according to claim 1 is characterized in that, the reactive monomer of this copolymerization macromolecule metal ion structure can be shown in general formula I I:
General formula I I
R wherein
1With R
2Can be H or CH
3, M is zinc, magnesium, copper bivalent metal ion, X and Y can be O, S, N, polyalkylene oxide base.
3. radiation sensitive composition according to claim 1 is characterized in that, also comprises radiation absorbability dyestuff, solvent, surfactant, colorant, wetting agent, acid forming agent or its combination.
4. radiation sensitive composition according to claim 1 is characterized in that, this substrate is a printing plate.
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Citations (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US5919601A (en) * | 1996-11-12 | 1999-07-06 | Kodak Polychrome Graphics, Llc | Radiation-sensitive compositions and printing plates |
| EP0956948A1 (en) * | 1998-05-12 | 1999-11-17 | Lastra S.P.A. | IR and UV radiation -sensitive composition and lithographic plate |
| US6063544A (en) * | 1997-03-21 | 2000-05-16 | Kodak Polychrome Graphics Llc | Positive-working printing plate and method of providing a positive image therefrom using laser imaging |
| JP2004151691A (en) * | 2002-09-30 | 2004-05-27 | Rohm & Haas Electronic Materials Llc | Improved photoresist |
| CN1524104A (en) * | 2001-04-09 | 2004-08-25 | 积水化学工业株式会社 | Photoreactive composition |
| CN101098927A (en) * | 2004-04-02 | 2008-01-02 | 惠普开发有限公司 | Chemicals compositions |
-
2010
- 2010-03-29 CN CN201010141699A patent/CN102207677B/en not_active Expired - Fee Related
Patent Citations (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US5919601A (en) * | 1996-11-12 | 1999-07-06 | Kodak Polychrome Graphics, Llc | Radiation-sensitive compositions and printing plates |
| US6063544A (en) * | 1997-03-21 | 2000-05-16 | Kodak Polychrome Graphics Llc | Positive-working printing plate and method of providing a positive image therefrom using laser imaging |
| EP0956948A1 (en) * | 1998-05-12 | 1999-11-17 | Lastra S.P.A. | IR and UV radiation -sensitive composition and lithographic plate |
| CN1524104A (en) * | 2001-04-09 | 2004-08-25 | 积水化学工业株式会社 | Photoreactive composition |
| JP2004151691A (en) * | 2002-09-30 | 2004-05-27 | Rohm & Haas Electronic Materials Llc | Improved photoresist |
| CN101098927A (en) * | 2004-04-02 | 2008-01-02 | 惠普开发有限公司 | Chemicals compositions |
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