CN102056969A - 抗反射涂层组合物 - Google Patents
抗反射涂层组合物 Download PDFInfo
- Publication number
- CN102056969A CN102056969A CN2009801207726A CN200980120772A CN102056969A CN 102056969 A CN102056969 A CN 102056969A CN 2009801207726 A CN2009801207726 A CN 2009801207726A CN 200980120772 A CN200980120772 A CN 200980120772A CN 102056969 A CN102056969 A CN 102056969A
- Authority
- CN
- China
- Prior art keywords
- compound
- mercaptan
- contain
- independently
- coating composition
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
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- 0 CC(N(CC1OC1)C(C(CC(C(CC1OC1)=C)=O)=CCC1OC1)=O)=* Chemical compound CC(N(CC1OC1)C(C(CC(C(CC1OC1)=C)=O)=CCC1OC1)=O)=* 0.000 description 4
- VIQRCOQXIHFJND-UHFFFAOYSA-N C(C1)C2C=CC1CC2 Chemical compound C(C1)C2C=CC1CC2 VIQRCOQXIHFJND-UHFFFAOYSA-N 0.000 description 1
Images
Classifications
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- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
- C09D167/00—Coating compositions based on polyesters obtained by reactions forming a carboxylic ester link in the main chain; Coating compositions based on derivatives of such polymers
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G59/00—Polycondensates containing more than one epoxy group per molecule; Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups
- C08G59/18—Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups ; e.g. general methods of curing
- C08G59/20—Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups ; e.g. general methods of curing characterised by the epoxy compounds used
- C08G59/32—Epoxy compounds containing three or more epoxy groups
- C08G59/3236—Heterocylic compounds
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
- C09D163/00—Coating compositions based on epoxy resins; Coating compositions based on derivatives of epoxy resins
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B1/00—Optical elements characterised by the material of which they are made; Optical coatings for optical elements
- G02B1/10—Optical coatings produced by application to, or surface treatment of, optical elements
- G02B1/11—Anti-reflection coatings
- G02B1/111—Anti-reflection coatings using layers comprising organic materials
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/09—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
- G03F7/091—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers characterised by antireflection means or light filtering or absorbing means, e.g. anti-halation, contrast enhancement
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G63/00—Macromolecular compounds obtained by reactions forming a carboxylic ester link in the main chain of the macromolecule
- C08G63/68—Polyesters containing atoms other than carbon, hydrogen and oxygen
- C08G63/685—Polyesters containing atoms other than carbon, hydrogen and oxygen containing nitrogen
- C08G63/6854—Polyesters containing atoms other than carbon, hydrogen and oxygen containing nitrogen derived from polycarboxylic acids and polyhydroxy compounds
Landscapes
- Chemical & Material Sciences (AREA)
- Physics & Mathematics (AREA)
- Organic Chemistry (AREA)
- Engineering & Computer Science (AREA)
- Chemical Kinetics & Catalysis (AREA)
- General Physics & Mathematics (AREA)
- Materials Engineering (AREA)
- Wood Science & Technology (AREA)
- Life Sciences & Earth Sciences (AREA)
- Architecture (AREA)
- Health & Medical Sciences (AREA)
- Medicinal Chemistry (AREA)
- Polymers & Plastics (AREA)
- Optics & Photonics (AREA)
- Structural Engineering (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
- Materials For Photolithography (AREA)
- Paints Or Removers (AREA)
- Surface Treatment Of Optical Elements (AREA)
- Laminated Bodies (AREA)
- Polyesters Or Polycarbonates (AREA)
Abstract
Description
涂层配方实施例 | n | k |
1 | 1.66 | 0.01 |
2 | 1.73 | 0.08 |
3 | 1.78 | 0.13 |
4 | 1.83 | 0.24 |
5 | 1.83 | 0.26 |
6 | 1.91 | 0.30 |
7 | 1.92 | 0.25 |
Claims (15)
Applications Claiming Priority (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US12/133,562 US8221965B2 (en) | 2008-07-08 | 2008-07-08 | Antireflective coating compositions |
US12/133,562 | 2008-07-08 | ||
PCT/IB2009/005458 WO2010004377A1 (en) | 2008-07-08 | 2009-04-29 | Antireflective coating compositions |
Publications (2)
Publication Number | Publication Date |
---|---|
CN102056969A true CN102056969A (zh) | 2011-05-11 |
CN102056969B CN102056969B (zh) | 2014-09-24 |
Family
ID=40886504
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
CN200980120772.6A Active CN102056969B (zh) | 2008-07-08 | 2009-04-29 | 抗反射涂层组合物 |
Country Status (8)
Country | Link |
---|---|
US (1) | US8221965B2 (zh) |
EP (1) | EP2300518B1 (zh) |
JP (1) | JP5568791B2 (zh) |
KR (1) | KR101429326B1 (zh) |
CN (1) | CN102056969B (zh) |
MY (1) | MY155242A (zh) |
TW (1) | TWI512063B (zh) |
WO (1) | WO2010004377A1 (zh) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN110998446A (zh) * | 2017-07-26 | 2020-04-10 | Sk新技术株式会社 | 底部抗反射涂层形成用聚合物和包含其的底部抗反射涂层形成用组合物 |
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US20100092894A1 (en) * | 2008-10-14 | 2010-04-15 | Weihong Liu | Bottom Antireflective Coating Compositions |
JP5553027B2 (ja) * | 2009-02-10 | 2014-07-16 | 日産化学工業株式会社 | 長鎖アルキレン基含有エポキシ化合物 |
US9244352B2 (en) * | 2009-05-20 | 2016-01-26 | Rohm And Haas Electronic Materials, Llc | Coating compositions for use with an overcoated photoresist |
US8501383B2 (en) * | 2009-05-20 | 2013-08-06 | Rohm And Haas Electronic Materials Llc | Coating compositions for use with an overcoated photoresist |
US8551686B2 (en) * | 2009-10-30 | 2013-10-08 | Az Electronic Materials Usa Corp. | Antireflective composition for photoresists |
US8507192B2 (en) * | 2010-02-18 | 2013-08-13 | Az Electronic Materials Usa Corp. | Antireflective compositions and methods of using same |
WO2012017948A1 (ja) * | 2010-08-05 | 2012-02-09 | 日産化学工業株式会社 | 窒素含有環を有するエポキシ化合物 |
CN104039862B (zh) * | 2011-12-15 | 2017-12-22 | 太阳化学公司 | 硫化物扩展型环氧树脂及其阻隔涂料应用 |
US9170494B2 (en) * | 2012-06-19 | 2015-10-27 | Az Electronic Materials (Luxembourg) S.A.R.L. | Antireflective compositions and methods of using same |
KR101993472B1 (ko) | 2012-09-12 | 2019-09-30 | 주식회사 동진쎄미켐 | 레지스트 패턴의 하부막 형성용 화합물, 조성물 및 이를 이용한 하부막의 형성방법 |
JP5923472B2 (ja) * | 2013-09-18 | 2016-05-24 | 四国化成工業株式会社 | メルカプトアルキルグリコールウリル類とその利用 |
JP6207424B2 (ja) * | 2014-02-27 | 2017-10-04 | 四国化成工業株式会社 | メルカプトアルキルグリコールウリル類とその利用 |
JP6492509B2 (ja) * | 2014-07-28 | 2019-04-03 | Jsr株式会社 | 液晶配向剤、液晶配向膜、液晶表示素子及び液晶表示素子の製造方法 |
US10203602B2 (en) * | 2016-09-30 | 2019-02-12 | Rohm And Haas Electronic Materials Korea Ltd. | Coating compositions for use with an overcoated photoresist |
KR102414150B1 (ko) * | 2017-10-17 | 2022-06-29 | 에스케이이노베이션 주식회사 | 바닥반사방지막 형성용 중합체, 이를 포함하는 바닥반사방지막 형성용 조성물 및 이를 이용한 바닥반사방지막의 형성방법 |
KR102264693B1 (ko) * | 2018-06-11 | 2021-06-11 | 삼성에스디아이 주식회사 | 레지스트 하층막용 조성물 및 이를 이용한 패턴형성방법 |
WO2020004122A1 (ja) * | 2018-06-26 | 2020-01-02 | 日産化学株式会社 | グリシジルエステル化合物との反応生成物を含むレジスト下層膜形成組成物 |
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KR102288386B1 (ko) * | 2018-09-06 | 2021-08-10 | 삼성에스디아이 주식회사 | 레지스트 하층막용 조성물 및 이를 이용한 패턴 형성 방법 |
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CN117603529B (zh) * | 2024-01-18 | 2024-03-22 | 汕头市嘉祥塑料制品厂有限公司 | 一种抑菌性奶粉盖及其制备方法 |
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ES2610627T3 (es) * | 2008-10-27 | 2017-04-28 | Unilever N.V. | Composiciones antitranspirantes o desodorantes |
DK2414424T3 (en) * | 2009-04-03 | 2019-03-18 | Polynt Composites Usa Inc | THERMOUS COMPOSITIONS CONTAINING ISOCYANUR RINGS |
US8551686B2 (en) * | 2009-10-30 | 2013-10-08 | Az Electronic Materials Usa Corp. | Antireflective composition for photoresists |
US8507192B2 (en) * | 2010-02-18 | 2013-08-13 | Az Electronic Materials Usa Corp. | Antireflective compositions and methods of using same |
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2008
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- 2009-04-29 JP JP2011517253A patent/JP5568791B2/ja not_active Expired - Fee Related
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- 2009-04-29 KR KR1020107027320A patent/KR101429326B1/ko active IP Right Grant
- 2009-04-29 WO PCT/IB2009/005458 patent/WO2010004377A1/en active Application Filing
- 2009-04-29 MY MYPI2011000055A patent/MY155242A/en unknown
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Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN110998446A (zh) * | 2017-07-26 | 2020-04-10 | Sk新技术株式会社 | 底部抗反射涂层形成用聚合物和包含其的底部抗反射涂层形成用组合物 |
CN110998446B (zh) * | 2017-07-26 | 2023-04-07 | Sk新技术株式会社 | 底部抗反射涂层形成用聚合物和包含其的底部抗反射涂层形成用组合物 |
Also Published As
Publication number | Publication date |
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JP5568791B2 (ja) | 2014-08-13 |
TWI512063B (zh) | 2015-12-11 |
KR20110042262A (ko) | 2011-04-26 |
WO2010004377A8 (en) | 2011-03-31 |
CN102056969B (zh) | 2014-09-24 |
US20100009293A1 (en) | 2010-01-14 |
EP2300518B1 (en) | 2012-08-15 |
KR101429326B1 (ko) | 2014-08-12 |
EP2300518A1 (en) | 2011-03-30 |
JP2011527460A (ja) | 2011-10-27 |
TW201002793A (en) | 2010-01-16 |
WO2010004377A1 (en) | 2010-01-14 |
US8221965B2 (en) | 2012-07-17 |
MY155242A (en) | 2015-09-30 |
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